WO2008084853A1 - 着色組成物、カラーフィルタ、及びその製造方法 - Google Patents

着色組成物、カラーフィルタ、及びその製造方法 Download PDF

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Publication number
WO2008084853A1
WO2008084853A1 PCT/JP2008/050276 JP2008050276W WO2008084853A1 WO 2008084853 A1 WO2008084853 A1 WO 2008084853A1 JP 2008050276 W JP2008050276 W JP 2008050276W WO 2008084853 A1 WO2008084853 A1 WO 2008084853A1
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WO
WIPO (PCT)
Prior art keywords
color filter
filter segment
coating film
black matrix
colored composition
Prior art date
Application number
PCT/JP2008/050276
Other languages
English (en)
French (fr)
Inventor
Isao Shigemori
Morihide Miyamura
Toshio Waku
Yusuke Iida
Kenro Sunahara
Kohei Matsui
Takeshi Ikeda
Hideyo Tanaka
Eishi Aoki
Genki Harada
Original Assignee
Toyo Ink Mfg. Co., Ltd.
Toppan Printing Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2007302009A external-priority patent/JP5459949B2/ja
Application filed by Toyo Ink Mfg. Co., Ltd., Toppan Printing Co., Ltd. filed Critical Toyo Ink Mfg. Co., Ltd.
Priority to CN200880002129.9A priority Critical patent/CN101595406B/zh
Publication of WO2008084853A1 publication Critical patent/WO2008084853A1/ja
Priority to US12/458,383 priority patent/US8216750B2/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/006—Preparation of organic pigments
    • C09B67/0065—Preparation of organic pigments of organic pigments with only non-macromolecular compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)

Abstract

　基板上に、顔料、エチレン性不飽和二重結合を有するモノマーおよび光重合開始剤を含有する着色組成物を用いて着色塗膜を形成する工程と、前記着色塗膜のフィルタセグメントまたはブラックマトリックスとなる部分に、積算露光量が１～１５０ｍJ／ｃｍ2になるように波長３０８ｎｍ(ＸｅＣＬ)のエキシマレーザを照射して硬化させる工程と、前記着色塗膜の未硬化部分を除去してフィルタセグメントまたはブラックマトリックスを形成する工程とを複数回繰り返し、少なくとも２色のフィルタセグメント及び／又はブラックマトリックスを形成するカラーフィルタの製造方法、および該カラーフィルタの製造方法に用いられる、顔料、エチレン性不飽和二重結合を有するモノマーおよび光重合開始剤を含有する着色組成物。
PCT/JP2008/050276 2007-01-12 2008-01-11 着色組成物、カラーフィルタ、及びその製造方法 WO2008084853A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN200880002129.9A CN101595406B (zh) 2007-01-12 2008-01-11 着色组合物、滤色器及其制造方法
US12/458,383 US8216750B2 (en) 2007-01-12 2009-07-09 Colored composition, color filter and manufacturing method thereof

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2007-004205 2007-01-12
JP2007004205 2007-01-12
JP2007-106741 2007-04-16
JP2007106741 2007-04-16
JP2007-302009 2007-11-21
JP2007302009A JP5459949B2 (ja) 2007-11-21 2007-11-21 着色組成物、カラーフィルタ及びその製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/458,383 Continuation US8216750B2 (en) 2007-01-12 2009-07-09 Colored composition, color filter and manufacturing method thereof

Publications (1)

Publication Number Publication Date
WO2008084853A1 true WO2008084853A1 (ja) 2008-07-17

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Country Status (5)

Country Link
US (1) US8216750B2 (ja)
KR (1) KR20090122184A (ja)
CN (1) CN101595406B (ja)
TW (1) TWI413858B (ja)
WO (1) WO2008084853A1 (ja)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010002457A (ja) * 2008-06-18 2010-01-07 Toppan Printing Co Ltd 感光性着色組成物及びカラーフィルタ基板及び半透過型液晶表示装置
JP2010072633A (ja) * 2008-08-19 2010-04-02 Fujifilm Corp カラーフィルタ、カラーフィルタの製造方法、及び液晶表示装置
CN101807002A (zh) * 2009-02-18 2010-08-18 Jsr株式会社 着色放射线敏感性组合物、滤色器及彩色液晶显示元件
JP2010224267A (ja) * 2009-03-24 2010-10-07 Toyo Ink Mfg Co Ltd 青色着色組成物、カラーフィルタの製造方法およびカラーフィルタ
JP2010256768A (ja) * 2009-04-28 2010-11-11 Toppan Printing Co Ltd 青色感光性樹脂組成物、カラーフィルタ及び液晶表示装置
WO2011040083A1 (ja) * 2009-09-29 2011-04-07 富士フイルム株式会社 着色感光性樹脂組成物、カラーフィルター、および液晶表示装置
JP2012022189A (ja) * 2010-07-15 2012-02-02 Dainippon Printing Co Ltd 光学積層体、偏光板及び画像表示装置
CN102520585A (zh) * 2010-08-20 2012-06-27 株式会社田村制作所 碱溶性透明树脂组合物

Families Citing this family (10)

* Cited by examiner, † Cited by third party
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WO2009145032A1 (ja) * 2008-05-28 2009-12-03 凸版印刷株式会社 カラーフィルタの製造方法、パターン付き基板の製造方法及び小型フォトマスク
DE102009055099A1 (de) 2009-12-21 2011-06-22 tesa SE, 20253 Hitzeaktiviert verklebbare Flächenelemente
US20130279038A1 (en) * 2012-04-20 2013-10-24 Shenzhen China Star Optoelectronics Technology Co., Ltd. Color filter and manufacturing method thereof
CN103819625A (zh) * 2013-06-09 2014-05-28 江阴摩尔化工新材料有限公司 可紫外光固化的改性氯化聚丙烯的合成方法
JP6178164B2 (ja) * 2013-08-23 2017-08-09 富士フイルム株式会社 感光性着色組成物、カラーフィルタ、カラーフィルタの製造方法、有機ｅｌ液晶表示装置
KR20220148301A (ko) * 2014-05-21 2022-11-04 아사히 가세이 가부시키가이샤 감광성 수지 조성물 및 회로 패턴의 형성 방법
US10946670B1 (en) 2015-04-09 2021-03-16 Get Group Holdings Limited Compositions, apparatus, methods, and substrates for making images and text
CN105425388B (zh) * 2015-12-25 2017-12-19 深圳市国华光电科技有限公司 一种电润湿显示器中间隔物的制备方法
CN107340688B (zh) * 2016-04-29 2022-05-06 东友精细化工有限公司 硬掩模用组合物
WO2020040043A1 (ja) * 2018-08-22 2020-02-27 富士フイルム株式会社 着色組成物、硬化膜、パターン形成方法、カラーフィルタ、固体撮像素子および画像表示装置

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JPH10253815A (ja) * 1997-03-12 1998-09-25 Mitsubishi Chem Corp カラーフィルター用光重合性組成物及びカラーフィルター
JPH10253817A (ja) * 1997-03-12 1998-09-25 Mitsubishi Chem Corp カラーフィルター用光重合性組成物及びカラーフィルター
JPH10253816A (ja) * 1997-03-12 1998-09-25 Mitsubishi Chem Corp カラーフィルター用黒色光重合性組成物
JP2000249822A (ja) * 1999-02-26 2000-09-14 Showa Denko Kk カラーフィルタ用光重合開始剤、感光性着色組成物およびカラーフィルタ
JP2004198542A (ja) * 2002-12-16 2004-07-15 Showa Denko Kk カラーフィルターブラックマトリックスレジスト組成物及びその組成物に用いる感光性組成物
JP2005314633A (ja) * 2003-09-26 2005-11-10 Dainippon Printing Co Ltd 光ラジカル発生剤、感光性樹脂組成物及び、物品
JP2006133378A (ja) * 2004-11-04 2006-05-25 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物、およびこれを用いた感光性ドライフィルム

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010002457A (ja) * 2008-06-18 2010-01-07 Toppan Printing Co Ltd 感光性着色組成物及びカラーフィルタ基板及び半透過型液晶表示装置
JP2010072633A (ja) * 2008-08-19 2010-04-02 Fujifilm Corp カラーフィルタ、カラーフィルタの製造方法、及び液晶表示装置
CN101807002A (zh) * 2009-02-18 2010-08-18 Jsr株式会社 着色放射线敏感性组合物、滤色器及彩色液晶显示元件
JP2010224267A (ja) * 2009-03-24 2010-10-07 Toyo Ink Mfg Co Ltd 青色着色組成物、カラーフィルタの製造方法およびカラーフィルタ
JP2010256768A (ja) * 2009-04-28 2010-11-11 Toppan Printing Co Ltd 青色感光性樹脂組成物、カラーフィルタ及び液晶表示装置
WO2011040083A1 (ja) * 2009-09-29 2011-04-07 富士フイルム株式会社 着色感光性樹脂組成物、カラーフィルター、および液晶表示装置
JP2011095716A (ja) * 2009-09-29 2011-05-12 Fujifilm Corp 着色感光性樹脂組成物、着色樹脂パターンの製造方法、カラーフィルター、および液晶表示装置
CN102576190A (zh) * 2009-09-29 2012-07-11 富士胶片株式会社 着色感光性树脂组合物、滤色器及液晶显示装置
JP2012022189A (ja) * 2010-07-15 2012-02-02 Dainippon Printing Co Ltd 光学積層体、偏光板及び画像表示装置
CN102520585A (zh) * 2010-08-20 2012-06-27 株式会社田村制作所 碱溶性透明树脂组合物

Also Published As

Publication number Publication date
TWI413858B (zh) 2013-11-01
US8216750B2 (en) 2012-07-10
KR20090122184A (ko) 2009-11-26
CN101595406A (zh) 2009-12-02
CN101595406B (zh) 2011-05-04
US20090311479A1 (en) 2009-12-17
TW200903158A (en) 2009-01-16

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