WO2008084834A1 - Gan semiconductor light emitting element - Google Patents

Gan semiconductor light emitting element Download PDF

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Publication number
WO2008084834A1
WO2008084834A1 PCT/JP2008/050213 JP2008050213W WO2008084834A1 WO 2008084834 A1 WO2008084834 A1 WO 2008084834A1 JP 2008050213 W JP2008050213 W JP 2008050213W WO 2008084834 A1 WO2008084834 A1 WO 2008084834A1
Authority
WO
WIPO (PCT)
Prior art keywords
contact layer
type gan
gan contact
light emitting
emitting element
Prior art date
Application number
PCT/JP2008/050213
Other languages
French (fr)
Japanese (ja)
Inventor
Yukio Shakuda
Original Assignee
Rohm Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co., Ltd. filed Critical Rohm Co., Ltd.
Publication of WO2008084834A1 publication Critical patent/WO2008084834A1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/40Materials therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/26Materials of the light emitting region
    • H01L33/30Materials of the light emitting region containing only elements of group III and group V of the periodic system
    • H01L33/32Materials of the light emitting region containing only elements of group III and group V of the periodic system containing nitrogen

Abstract

Provided is a GaN semiconductor light emitting element wherein Au diffusion is prevented in a transparent electrode composed of a metal multilayer film including an Au film. On a sapphire substrate (1), a GaN buffer layer (2), an n-type GaN contact layer (3), an MQW active layer (4) and a p-type GaN contact layer (5) are laminated in sequence. An n-side pad electrode (8) is formed on a surface from which the n-type GaN contact layer (3) is exposed. A metal multilayer film transparent electrode (6) arranged over the entire p-type GaN contact layer (5) is, for instance, composed of Ni/Au/Ti/Ni from the side of the P-type GaN contact layer (5). Diffusion of Au is prevented by having Ti as an Au diffusion preventing metal layer.
PCT/JP2008/050213 2007-01-11 2008-01-10 Gan semiconductor light emitting element WO2008084834A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-003457 2007-01-11
JP2007003457A JP2008171997A (en) 2007-01-11 2007-01-11 Gan-based semiconductor light-emitting element

Publications (1)

Publication Number Publication Date
WO2008084834A1 true WO2008084834A1 (en) 2008-07-17

Family

ID=39608721

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/050213 WO2008084834A1 (en) 2007-01-11 2008-01-10 Gan semiconductor light emitting element

Country Status (3)

Country Link
JP (1) JP2008171997A (en)
TW (1) TW200835000A (en)
WO (1) WO2008084834A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008182050A (en) * 2007-01-24 2008-08-07 Mitsubishi Chemicals Corp GaN-BASED LIGHT-EMITTING DIODE ELEMENT

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5211996B2 (en) * 2008-09-30 2013-06-12 豊田合成株式会社 Light emitting device
KR101761834B1 (en) * 2011-01-28 2017-07-27 서울바이오시스 주식회사 Wafer level led package and method of fabricating the same
JP2012175089A (en) 2011-02-24 2012-09-10 Fujitsu Ltd Semiconductor device and method of manufacturing semiconductor device
KR101737981B1 (en) 2011-05-17 2017-05-22 한국전자통신연구원 GAlIUM-NITRIDE LIGHT EMITTING DEVICE OF MICROARRAY TYPE STRUCTURE AND MANUFACTURING THEREOF
CN103489887B (en) * 2013-09-14 2016-04-13 江苏新广联科技股份有限公司 For insulation system and the manufacturing process thereof of GaN base semi-conductor LED chips
JP2016103646A (en) * 2015-12-14 2016-06-02 富士通株式会社 Semiconductor device and method of manufacturing semiconductor device
CN112885717A (en) * 2021-01-15 2021-06-01 广州爱思威科技股份有限公司 Metal electrode of semiconductor device, method for manufacturing the same, and use thereof

Citations (8)

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Publication number Priority date Publication date Assignee Title
JPH11145076A (en) * 1997-11-11 1999-05-28 Sony Corp Ohmic electrode, its forming method and laminate for ohmic electrode
JPH11150297A (en) * 1997-11-14 1999-06-02 Nichia Chem Ind Ltd Nitride semiconductor light-emitting element
JPH11274554A (en) * 1998-03-26 1999-10-08 Toshiba Corp P-side electrode of iii-v group compound semiconductor light emitting element and iii-v group compound semiconductor light emitting element
JP3068914U (en) * 1999-11-11 2000-05-26 洲磊科技股▲ふん▼有限公司 Flip-chip light emitting device
US20020000643A1 (en) * 1996-05-31 2002-01-03 Toshiya Uemura Devices related to electrode pads for p-type group iii nitride compound semiconductors
EP1276186A1 (en) * 2000-02-16 2003-01-15 Nichia Corporation Nitride semiconductor laser device
JP2004040061A (en) * 2002-07-08 2004-02-05 Sumitomo Chem Co Ltd Electrode for group iii-v compound semiconductor, manufacturing method thereof, and semiconductor light emitting element using the same
US20060081834A1 (en) * 2004-10-18 2006-04-20 Sanken Electric Co., Ltd. Semiconductor luminescent device and manufacturing method thereof

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020000643A1 (en) * 1996-05-31 2002-01-03 Toshiya Uemura Devices related to electrode pads for p-type group iii nitride compound semiconductors
JPH11145076A (en) * 1997-11-11 1999-05-28 Sony Corp Ohmic electrode, its forming method and laminate for ohmic electrode
JPH11150297A (en) * 1997-11-14 1999-06-02 Nichia Chem Ind Ltd Nitride semiconductor light-emitting element
JPH11274554A (en) * 1998-03-26 1999-10-08 Toshiba Corp P-side electrode of iii-v group compound semiconductor light emitting element and iii-v group compound semiconductor light emitting element
JP3068914U (en) * 1999-11-11 2000-05-26 洲磊科技股▲ふん▼有限公司 Flip-chip light emitting device
EP1276186A1 (en) * 2000-02-16 2003-01-15 Nichia Corporation Nitride semiconductor laser device
JP2004040061A (en) * 2002-07-08 2004-02-05 Sumitomo Chem Co Ltd Electrode for group iii-v compound semiconductor, manufacturing method thereof, and semiconductor light emitting element using the same
US20060081834A1 (en) * 2004-10-18 2006-04-20 Sanken Electric Co., Ltd. Semiconductor luminescent device and manufacturing method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008182050A (en) * 2007-01-24 2008-08-07 Mitsubishi Chemicals Corp GaN-BASED LIGHT-EMITTING DIODE ELEMENT

Also Published As

Publication number Publication date
JP2008171997A (en) 2008-07-24
TW200835000A (en) 2008-08-16

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