WO2008071480A1 - Sonde de taux de rotation - Google Patents

Sonde de taux de rotation Download PDF

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Publication number
WO2008071480A1
WO2008071480A1 PCT/EP2007/060966 EP2007060966W WO2008071480A1 WO 2008071480 A1 WO2008071480 A1 WO 2008071480A1 EP 2007060966 W EP2007060966 W EP 2007060966W WO 2008071480 A1 WO2008071480 A1 WO 2008071480A1
Authority
WO
WIPO (PCT)
Prior art keywords
axis
electrode
along
substrate
rotation rate
Prior art date
Application number
PCT/EP2007/060966
Other languages
German (de)
English (en)
Inventor
Burkhard Kuhlmann
Joerg Hauer
Udo-Martin Gomez
Kersten Kehr
Original Assignee
Robert Bosch Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch Gmbh filed Critical Robert Bosch Gmbh
Publication of WO2008071480A1 publication Critical patent/WO2008071480A1/fr

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/5719—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using planar vibrating masses driven in a translation vibration along an axis
    • G01C19/5733—Structural details or topology
    • G01C19/574—Structural details or topology the devices having two sensing masses in anti-phase motion
    • G01C19/5747—Structural details or topology the devices having two sensing masses in anti-phase motion each sensing mass being connected to a driving mass, e.g. driving frames

Definitions

  • the present invention relates to a rotation rate sensor according to the preamble of patent claim 1.
  • Such a rotation rate sensor which is known from DE 102 37 411, has a movable element which is arranged above an upper surface of a substrate and can be driven to oscillate by a drive device along a first axis which runs along the surface which is deflectable along a second axis under the action of a Coriolis force, and compensating means arranged to compensate for undesirable vibrations of the movable member along the second axis caused by the driving means.
  • the second axis runs along the surface of the substrate.
  • the yaw rate sensor is thus suitable only for detecting a Coriolis force which arises due to a rotation about an axis perpendicular to the surface of the substrate.
  • a plurality of fingers are formed on the movable element as electrodes, which engage in corresponding fingers which are formed in the substrate.
  • the change in the capacitance between the fingers is used to determine the Coriolis force.
  • the unwanted vibrations along the second axis are detected as so-called quadrature signals and distort the measurement results.
  • Cause of the quadrature signals are typically asymmetries of the sensor structure, as they are caused by manufacturing tolerances.
  • the unwanted vibrations along the second axis have the same fre- like the vibrations along the first axis. Their direction is determined by the type / shape of the asymmetry.
  • the present invention has for its object to provide a rotation rate sensor with a compensation device which is arranged, a Coriolis force which is directed perpendicular to the substrate, and thus a corresponding rotation about an axis which extends along the surface of the substrate, capture.
  • the second axis is perpendicular to the surface.
  • a rotation rate sensor with a compensation device for quadrature signals with respect to the direction of the sensing axis can be provided with unusual dimensions.
  • the rotation rate sensor can then be integrated to save space, in particular in a vehicle.
  • the rotation rate sensor can also be integrated on a chip together with further rotation rate sensors which are suitable for detecting rotations about differently oriented rotation axes.
  • the compensation takes place on the sensor element itself, whereby the evaluation is facilitated.
  • the compensation means comprises at least one electrode provided on the substrate.
  • the at least one electrode is arranged to exert an electrical force along the second axis on the movable element, the amount of which depends on a deflection of the movable element due to the oscillations of the movable element along the first axis.
  • the compensation device comprises a further electrode, which is provided on the substrate.
  • this allows a simple compensation of differently directed unwanted vibrations.
  • the further electrode exerts a further electrical force along the second axis on the movable element, the amount of which depends on the deflection of the movable element due to the vibrations of the movable element along the first axis.
  • the electrode and the further electrode are formed such that the force exerted by the electrode for the deflection of the movable element increases, while the force exerted by the further electrode decreases.
  • the electrode and the further electrode form an electrode pair, and a plurality of electrode pairs are provided on the substrate.
  • each of the electrode pairs is disposed at each one protrusion formed along the first axis on the movable member.
  • FIG. 1 is a view of a rotation rate sensor with a compensation device
  • FIG. 2a is a view of a pair of electrodes of the compensation device with a non-deflected detection mass element
  • FIG. 2b shows a view of a pair of electrodes of the compensation device with a detection mass element deflected in one direction
  • FIG. 2c shows a view of an electrode pair of the compensation device with a detection mass element deflected in an opposite direction.
  • Fig. 1 shows a view of a rotation rate sensor.
  • the rotation rate sensor comprises two identical structures 1, 2 with a constant thickness, which is arranged above a substrate which extends in the plane of the paper.
  • the structures 1, 2 are produced, for example, by depositing an electrically conductive polysilicon layer on an oxide layer, which in turn is provided on a silicon substrate. In the oxide layer recesses are formed so that arise in these recesses connections from the polysilicon layer to the silicon substrate. The structures are then defined and the oxide layer removed in an etching process. The polysilicon layer remains connected to the silicon substrate.
  • Each of the structures 1, 2 has two drive mass elements 3.
  • the drive mass elements 3 are connected via four drive mass springs 4 at the ends 5 to the underlying substrate.
  • two drive mass springs 4 which connect the same drive mass element 3 to the underlying substrate, lie in a y-direction, which runs along the surface of the substrate.
  • the deflections of the drive mass elements 3 are thus limited by the opposite ends 5 relative to the underlying substrate in the y-direction.
  • the drive mass springs 4 are each arranged in a quadrangular recess 6 in one of the drive mass elements 3.
  • the springs 4 are stretchable due to the orientation of their folds, especially in the y-direction, while vibrations of the drive mass elements 3 are suppressed in the x direction. Due to the attachment of the drive mass springs 4 in the recesses 6, there is still sufficient space on the sides of the drive mass elements 3 to dispose comb drives 9 with which the drive mass elements 3 can be set into oscillation in the y direction.
  • the two drive mass elements 3 of each structure 1, 2 are connected via eight detection mass springs 7 to a substantially rectangular detection mass element 8 (two springs 7 on each side).
  • the detection element 8 may be provided with through holes (eg perforation).
  • the two drive mass elements 3 almost completely surround the detection mass element 8, but leave room to connect a coupling spring 10 and a substrate spring 11 to the detection mass element 8.
  • Each two of the detection mass springs 7 are mounted opposite to two sides of the detection mass element 8. By the formation and attachment of the detection mass springs 7, vibrations of the detection mass element 8 to the drive elements 3 in the y direction and in the x direction are suppressed, while a relative movement of the detection mass element 8 in a z direction perpendicular to the surface is easily possible.
  • the detection mass elements 8 are coupled together via the coupling spring 10.
  • the sensing mass elements 8 are connected to the underlying substrate for stabilization via substrate springs 11 at the ends 12 of the substrate springs 11.
  • the drive mass elements 3 for all embodiments are excited by the comb drives 9 to oscillate along the y-axis.
  • the Coriolis force is then directed in the z-direction perpendicular to the surface of the substrate.
  • the frequency of the comb drives 9 is preferably chosen so that the detection mass elements 8 are excited due to the coupling to antiphase oscillations.
  • an electrode is in each case formed in the substrate as a detection device. If the detection mass elements 8 are vibrated in the z direction by the Coriolis force, the capacitances between the electrodes change to the overlying detection mass elements. By subtracting the signals from the electrodes, spurious accelerations can be easily subtracted.
  • suitable dimensioning of the drive mass elements. 3 and sensing mass elements 8 ensure that their common focus is time-invariant.
  • FIG. FIG. 2A shows a pair of electrodes of the compensation device, which are arranged under the undeflected detection mass element 8.
  • an overlapping area between the electrode 15 and the protrusion 14 and an overlapping area between the electrode 16 and the protrusion 14 are equal.
  • FIG. 2B shows a view of a pair of electrodes 15, 16 of the compensation device with a detection mass element 8 deflected in one direction.
  • an overlapping area between the electrode 15 and the projection 14 is smaller than an overlapping area between the electrode 16 and the projection 14. Therefore, the electrode 16 now has a greater influence on the detection mass element 8 than in the undeflected position on.
  • FIG. 2C shows a view of a pair of electrodes 15, 16 of the compensation device with a detection mass element 8 deflected in an opposite direction.
  • Yo + ⁇ Y an overlapping area between the electrode 15 and the projection 14 is greater than an overlapping area between the electrode 16 and the pros Therefore, the electrode 15 has a greater influence on the detection mass element 8 than in the undeflected position.
  • the electrode pairs 15, 16 (or the at least one electrode) need not necessarily be provided below the detection mass elements 8, since further movable oscillating mass elements can be provided in differently constructed rotation rate sensors.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Gyroscopes (AREA)

Abstract

La présente invention concerne une sonde de taux de rotation qui est dotée d'un élément mobile (8) qui est disposé au-dessus de la surface d'un substrat, qu'un dispositif d'entraînement (9) peut mettre en vibration le long d'un premier axe (y) qui s'étend le long de la surface et qui peut être dévié suivant un deuxième axe (z) sous l'action de la force de Coriolis. Un dispositif de compensation (15, 16) conçu pour compenser les vibrations indésirables de l'élément mobile (8) provoquées par le dispositif d'entraînement (9) le long du deuxième axe (z) est prévu. En disposant le deuxième axe (z) perpendiculairement à la surface, on peut intégrer sur une puce la sonde de taux de rotation en même temps que d'autres sondes de taux de rotation qui permettent de déterminer des rotations autour d'axes de rotation autrement orientés.
PCT/EP2007/060966 2006-12-12 2007-10-15 Sonde de taux de rotation WO2008071480A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102006058746.4 2006-12-12
DE200610058746 DE102006058746A1 (de) 2006-12-12 2006-12-12 Drehratensensor

Publications (1)

Publication Number Publication Date
WO2008071480A1 true WO2008071480A1 (fr) 2008-06-19

Family

ID=38866813

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2007/060966 WO2008071480A1 (fr) 2006-12-12 2007-10-15 Sonde de taux de rotation

Country Status (2)

Country Link
DE (1) DE102006058746A1 (fr)
WO (1) WO2008071480A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8650954B2 (en) 2008-11-25 2014-02-18 Robert Bosch Gmbh Quadrature compensation for a rotation-rate sensor

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009001847B4 (de) 2009-03-25 2022-07-28 Robert Bosch Gmbh Mikromechanisches Bauteil, Sensorvorrichtung mit einem mikromechanischen Bauteil und Verfahren zum Betreiben eines mikromechanischen Bauteils

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10237411A1 (de) * 2002-01-12 2003-07-24 Bosch Gmbh Robert Drehratensensor
US20060213265A1 (en) * 2005-03-22 2006-09-28 Honeywell International Inc Quadrature reduction in mems gyro devices using quad steering voltages

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10237411A1 (de) * 2002-01-12 2003-07-24 Bosch Gmbh Robert Drehratensensor
US20060213265A1 (en) * 2005-03-22 2006-09-28 Honeywell International Inc Quadrature reduction in mems gyro devices using quad steering voltages

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8650954B2 (en) 2008-11-25 2014-02-18 Robert Bosch Gmbh Quadrature compensation for a rotation-rate sensor

Also Published As

Publication number Publication date
DE102006058746A1 (de) 2008-06-19

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