WO2007072758A1 - Film roll production method and device, and film roll - Google Patents

Film roll production method and device, and film roll Download PDF

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Publication number
WO2007072758A1
WO2007072758A1 PCT/JP2006/325080 JP2006325080W WO2007072758A1 WO 2007072758 A1 WO2007072758 A1 WO 2007072758A1 JP 2006325080 W JP2006325080 W JP 2006325080W WO 2007072758 A1 WO2007072758 A1 WO 2007072758A1
Authority
WO
WIPO (PCT)
Prior art keywords
film
roll
spacer
film substrate
substrate
Prior art date
Application number
PCT/JP2006/325080
Other languages
French (fr)
Japanese (ja)
Inventor
Yohsuke Kanzaki
Hirohiko Nishiki
Original Assignee
Sharp Kabushiki Kaisha
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Kabushiki Kaisha filed Critical Sharp Kabushiki Kaisha
Priority to CN2006800364938A priority Critical patent/CN101277886B/en
Priority to US12/090,107 priority patent/US20090277983A1/en
Publication of WO2007072758A1 publication Critical patent/WO2007072758A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H18/00—Winding webs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H18/00—Winding webs
    • B65H18/08—Web-winding mechanisms
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2301/00—Handling processes for sheets or webs
    • B65H2301/40—Type of handling process
    • B65H2301/41—Winding, unwinding
    • B65H2301/412—Roll
    • B65H2301/4127—Roll with interleaf layer, e.g. liner
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2301/00—Handling processes for sheets or webs
    • B65H2301/40—Type of handling process
    • B65H2301/41—Winding, unwinding
    • B65H2301/414—Winding
    • B65H2301/4143—Performing winding process
    • B65H2301/41432—Performing winding process special features of winding process
    • B65H2301/414324—Performing winding process special features of winding process involving interleaf web/sheet, e.g. liner
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133305—Flexible substrates, e.g. plastics, organic film
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133351—Manufacturing of individual cells out of a plurality of cells, e.g. by dicing

Definitions

  • the present invention relates to a film roll manufacturing method and manufacturing apparatus, and a film roll, and in particular, used for manufacturing a display panel such as a liquid crystal display or an organic EL display. It is about.
  • Patent Document 1 discloses a method for producing a conductive film roll in which a transparent conductive film is mounted on the core from a force S without supplying a spacer to both ends thereof. Among them, since the pressure applied to the transparent conductive film can be lowered by the supplied spacer, even if foreign matter is mixed between the films, the conductive film is less likely to cause dents due to the foreign matter. Are listed.
  • Patent Document 1 Japanese Unexamined Patent Application Publication No. 2004-199643
  • the present invention has been made in view of the points to be applied, and an object of the present invention is to suppress the diameter expansion of the film roll and to ensure that the substrate surfaces are not in contact with each other.
  • strip-shaped spacers are respectively arranged along the longitudinal direction of the film substrate at both ends of the film substrate and at an intermediate portion between the both ends. It is a thing.
  • a method for producing a film roll according to the present invention is a method for producing a film roll on which a film substrate is mounted, and includes both end portions of the film substrate and intermediate portions between the both end portions.
  • the film substrates are easily brought into contact with each other when the film substrates are mounted, and the spacers are arranged in the intermediate portion in the width direction of the film substrates. Therefore, even if the film substrate is installed in the installation process, contact with the film substrate is suppressed.
  • the same spacer as the spacers disposed at both ends of the film substrate is disposed in the middle portion of the film substrate, so that expansion of the film roll is suppressed. . Therefore, it is possible to reliably prevent the substrate surfaces from contacting each other by suppressing the diameter expansion of the film roll.
  • a plurality of display panel forming portions for forming a display panel are arranged in a matrix, and the spacer in the intermediate portion is arranged between the plurality of display panel forming portions. May be.
  • the spacer in the intermediate portion of the film substrate is disposed between the plurality of display panel forming portions, the spacer is disposed even if the spacer is disposed on the film substrate. Has a smaller effect on the film substrate constituting the film roll.
  • the width of the spacer at the intermediate portion may be narrower than the width of each spacer at the both end portions.
  • a fine conductive element is formed in the intermediate portion of the film substrate as compared with both end portions thereof, so that a narrow spacer is provided in the intermediate portion of the film substrate.
  • the width of the spacer may be 1 mm or more and 50 mm or less.
  • the width of the spacer is smaller than lmm, it is difficult to place the spacer at a predetermined position on the film substrate, and the width of the spacer is 50 mm. In the case where the width is larger than that, a lot of loss areas are arranged on the film substrate.
  • the spacer may have a thickness of 0.25 mm or more and lmm or less.
  • the film roll manufacturing apparatus is a film roll manufacturing apparatus that manufactures a film roll on which a film substrate is mounted, and is rotatable for mounting the film substrate.
  • a core roll and strip spacers are mounted on each of the core rolls, and provided on both ends of the film substrate mounted on the core roll and an intermediate portion between the both ends.
  • a spacer introduction reel for introducing each of the spacers described above is provided between the film substrates mounted on the core roll.
  • the film substrates are mounted by the spacer introduction reel, the film substrates are easily brought into contact with each other, and the spacer is disposed at the intermediate portion in the width direction of the film substrate. Therefore, even if a film substrate is mounted on the core roll, contact between the film substrates is suppressed.
  • the same spacer as the spacers arranged at both ends of the plate is arranged in the middle part of the film substrate, the diameter expansion of the film roll is suppressed. Therefore, it is possible to reliably prevent the substrate surfaces from contacting each other by suppressing the diameter expansion of the film roll.
  • Each of the spacer introduction reels may be movable in parallel to the rotation axis of the core roll.
  • the position of the spacer can be changed in accordance with the position of the conductive element formed on the film substrate, so that the spacer constitutes a film roll. The effect on the substrate is reduced.
  • the film roll according to the present invention is a film roll in which a film substrate is mounted, and strip-like spacers are provided at both end portions of the film substrate and intermediate portions between the both end portions. It is characterized by being arranged along the longitudinal direction of the substrate.
  • the spacer is disposed in the intermediate portion in the width direction of the film substrates that are easy to contact with each other when the film substrates are mounted, Even if the film substrates are equipped, contact between the film substrates is suppressed.
  • the same spacer as the spacers arranged at both ends of the film substrate is arranged in the middle part of the film substrate, so that the expansion of the film roll is suppressed. Is done. Therefore, the diameter of the film roll can be suppressed and the substrate surfaces can be reliably brought into contact with each other.
  • the strip spacers are respectively arranged along the longitudinal direction of the film substrate at both ends of the film substrate and at an intermediate portion between the both ends, By suppressing the diameter, the substrate surfaces can be reliably brought into non-contact with each other.
  • FIG. 1 is a schematic cross-sectional view of a wet etching apparatus 30a according to a first embodiment.
  • FIG. 2 is a perspective view of a spacer introduction reel 13 constituting a wet etching apparatus 30a.
  • FIG. 3 is a perspective view of a film roll 3b according to Embodiment 1.
  • FIG. 4 is a graph showing the contact state between the core roll and the film substrate in the example. is there.
  • FIG. 5 is a schematic cross-sectional view of a coating apparatus 30b according to Embodiment 2.
  • FIG. 6 is a perspective view of a film roll 3c according to another embodiment.
  • FIG. 7 is a perspective view of a film roll 3d according to another embodiment.
  • FIG. 8 is a perspective view of a film roll 3e according to another embodiment.
  • FIG. 9 is a graph showing a contact state between the core roll and the film substrate in a comparative example.
  • Embodiment 1 of a film roll manufacturing method and manufacturing apparatus and film roll according to the present invention show Embodiment 1 of a film roll manufacturing method and manufacturing apparatus and film roll according to the present invention.
  • a film roll manufacturing apparatus a roll 'toe' roll type wet etching apparatus is illustrated.
  • FIG. 1 is a schematic cross-sectional view of the wet etching apparatus 30a of the present embodiment.
  • the second roll storage chamber 24 in which the subsequent film roll 3b is stored is provided so as to be successively connected in a row.
  • the film constituting the film roll 3a The side wall between the first roll storage chamber 21 and the etching chamber 22 and the side wall between the etching chamber 22 and the rinsing chamber 23 so that the substrate 1 can be conveyed through the guide rolls 14a to 14j in order. Openings are provided on the side walls between the rinsing chamber 23 and the second roll storage chamber 24, respectively.
  • the first roll storage chamber 21 includes a spacer scraping roll 10, a film substrate unwinding roll 11 and a guide roll 14a, which are arranged so that their rotation axes are parallel to each other and are rotatably provided.
  • the film unwinding roll 11 is equipped with a film substrate 1 via strip-shaped spacers 2a arranged at both ends.
  • the film roll 3a is constituted by the film substrate 1 that is mounted and the spacer 2a that is sandwiched between the film substrate 1 and the film roll 3a.
  • the etching chamber 22 includes four guide rolls 14b to 14e that are arranged so that their rotational axes are parallel to each other and are rotatable, and an etching tank 15 in which an etching solution is contained to perform a wet etching process. And an air knife 17 that blows compressed air onto the surface of the film substrate 1 and cuts off the etching solution attached to the surface.
  • the rinsing chamber 23 includes four guide rolls 14f to 14i that are arranged so that their rotational axes are parallel to each other and are rotatable, and a rinsing liquid such as pure water is accommodated in the rinsing chamber 23. And an air knife 17 that blows compressed air onto the surface of the film substrate 1 to cut off the rinse liquid adhering to the surface.
  • the second roll storage chamber 24 includes a guide roll 14j, a core roll 12 and a spacer introduction reel 13 that are arranged so that their rotation axes are parallel to each other and are rotatable.
  • a guide roll 14j a guide roll 14j
  • a core roll 12 a spacer introduction reel 13 that are arranged so that their rotation axes are parallel to each other and are rotatable.
  • three spacer introduction reels 13 are provided so as to be rotatably arranged on a shaft 13c provided in parallel with the rotation axis of the core roll 12.
  • FIG. 2 is a perspective view of the spacer introduction reel 13 as viewed from the arrow A in FIG.
  • Each spacer introduction reel 13 is provided so as to sandwich the core portion 13a on which the spacer 2b (2c) is mounted and the winding core portion 13a, and the spacer 2b (2c) And a pair of disk-shaped guide portions 13b for suppressing displacement. Further, each spacer introduction reel 13 is movable in parallel with the rotation axis of the core roll 12. According to this, the position of the spacer 2b (2c) is changed in accordance with the position of each display panel forming portion P described later on the film substrate 1. Therefore, the influence of the spacer 2b (2c) on the film substrate 1 constituting the film roll 3b is reduced.
  • the spacer introduction reel 13 is preliminarily equipped with a strip-like spacer 2b (2c).
  • the spacer introduction reel 13 in the center of FIG. 2 is equipped with a spacer 2c that is narrower than the spacer 2b installed on the spacer introduction reel 13 arranged on both sides thereof. Has been.
  • the film substrate 1 constituting the film roll 3 a on the film unwinding roll 11 is unwound toward the guide roll 14 a and conveyed to the etching processing chamber 22.
  • the spacer 2 a constituting the film roll 3 a is unwound toward the spacer take-up roll 10 and is taken up by the spacer take-up roll 10.
  • the film substrate 1 conveyed from the first roll storage chamber 21 is lowered by the guide rolls 14b and 14c, and then immersed in the etching solution in the etching tank 15. Etching is performed during the process. Subsequently, the film substrate 1 subjected to the etching process is pulled up from the etching liquid by the guide rolls 14d and 14e, and the etching liquid is removed by the air knife 17 while the bow I is being lifted up. Thereafter, the drained film substrate 1 is conveyed to the rinse treatment chamber 23 via the guide roll 14e.
  • the film substrate 1 conveyed from the etching chamber 22 is lowered by the guide rolls 14f and 14g and then immersed in the rinsing liquid in the rinsing tank 16. Rinse processing is performed. Subsequently, the film substrate 1 is pulled up from the rinse liquid by the guide rolls 14h and 14i, and the rinse liquid is drained by the air knife 17 in the middle of the pulling up. Thereafter, the drained film substrate 1 is conveyed to the second roll storage chamber 24 via the guide roll 14i.
  • FIG. 3 is a perspective view of the film roll 3b as viewed from the arrow B in FIG.
  • the film roll manufacturing method of the present embodiment includes a preparation process, a film roll housing process, an etching process, a rinse process, and a winding process (spacer placement process and equipping process).
  • Roll A metal film such as aluminum or titanium was formed on a flexible film-like resin substrate by sputtering using the 'to-roll' method, and then a resist pattern was formed on the metal thin film. Thereafter, the film substrate 1 having a metal thin film and a resist pattern is formed by mounting the resin substrate on a core roll (film unwinding roll 11) while sandwiching the linear spacer 2a at both ends. Prepare the loaded film roll 3a.
  • the film substrate 1 constituting the film roll 3a has flexibility such as polyester (PET) resin, polyimide (PI) resin, polyethersulfone (PES), and the like. It is made of resin or glass Z epoxy-based glass fiber reinforced resin.
  • the film substrate 1 has a thickness of 0.1 mm to 0.3 mm and a width of 600 mm, for example. Further, as shown in FIG. 3, the film substrate 1 is provided with a plurality of display panel forming portions P for forming a display panel in a matrix.
  • the spacers 2a, 2b and 2c are made of polyester (PET) resin, polyimide (PI) resin, polyethersulfone (PES) resin film or dustproof paper.
  • the spacers 2a, 2b and 2c have, for example, a thickness of 0.25 mm or more and 1 mm or less and a width of 1 mm or more and 50 mm or less.
  • the widths of the spacers 2a, 2b and 2c are narrower than lmm, it is difficult to place the spacers 2a, 2b and 2c at the predetermined positions on the film substrate 1, and the spacers 2a
  • the widths of 2b and 2c are larger than 50 mm, for example, the effective area of the film substrate 1 on which the display panel forming portion P can be arranged becomes narrow.
  • Spacers 2a, 2b and 2c are thinner than 0.25mm In this case, the thickness of the spacers 2a, 2b, and 2c in which the film substrates 1 can easily come into contact with each other is larger than lmm. In this case, the diameter of the film roll 3a and the produced film roll 3b is increased. End up.
  • the spacer 2 a is unwound from the force of the film roll 3 a and the tip thereof is attached to the spacer scraping roll 10.
  • the film substrate 1 is similarly unwound from the film roll 3a, and the leading end thereof is sent to the guide roll 14a. Further, the spacer scraping roll 10 and the film unwinding roll 11 are driven.
  • the film substrate 1 supplied from the guide roll 14a is received by the guide roll 14b, the film substrate 1 is transported along the guide rolls 14c and 14d in the etching tank 15, and the film substrate 1 is etched. . At this time, the exposed metal thin film on the resist pattern force on the film substrate 1 is removed, and the metal thin film is notched. Then, the film substrate 1 after the etching process is pulled up from the etching tank 15, and the etching solution adhering to the surface is removed by the air knife 17, and then the film substrate 1 is sent to the guide roll 14e.
  • the film substrate 1 supplied from the guide roll 14e is received by the guide roll 14f
  • the film substrate 1 is transported along the guide rolls 14g and 14h in the rinsing tank 16 to rinse the film substrate 1. Do.
  • the surface of the film substrate 1 is washed with rinse water, and the etching solution remaining on the surface of the film substrate 1 is removed with rinse water.
  • the film substrate 1 after the rinsing process is pulled up from the rinse 16 tank and the rinse water adhering to the surface is removed by the air knife 17, and then the film substrate 1 is sent to the guide roll 14i.
  • the film roll 3b in which the strip-like spacers 2b and 2c are respectively disposed along the longitudinal direction of the film substrate 1 at both end portions and intermediate portions of the film substrate 1. it can.
  • a film substrate in which a titanium thin film is formed on one side of a core roll having a conductive film on the peripheral surface thereof is opposed to the conductive film of the core roll.
  • it is further equipped with a spacer having a predetermined thickness, and a continuity test between the conductive film of the core roll and the titanium thin film of the film substrate is performed.
  • Contact Z Non-contact state was confirmed. The contact Z non-contact state between the core roll and the film substrate is replaced with the contact Z non-contact state between the substrate surfaces when the film substrate is mounted.
  • the core roll has a diameter of 150 mm.
  • the film substrate is made of glass Z-epoxy glass fiber reinforced resin and has a thickness of 0.1 nm! ⁇ 0.3 mm, width 600 mm, Young's modulus 5 GPa ⁇ 15 GPa, specific gravity 1.0 gZcm 3 ⁇ 2. OgZcm 3 were used.
  • As the spacers six types of spacers made of polyimide resin and having a thickness of 0.125 mm to 0.750 mm were used.
  • a spacer having a width of 10 mm was disposed at each end of the film substrate, and a spacer having a width of 5 mm was disposed at the center thereof.
  • a spacer having a width of 10 mm was disposed only at both ends of the film substrate.
  • FIGS. 4 and 9 show the tension in the longitudinal direction of the film substrate, the thickness of the spacer, and the core roller in the examples and comparative examples, respectively. It is a graph which shows the relationship with the contact state of a film and a film substrate.
  • the white circles in the graph indicate that the conductive film of the core roll and the titanium thin film of the film substrate do not conduct and the core roll and the film substrate are not in contact with each other.
  • the black triangle mark in the graph indicates that the conductive film of the core roll and the titanium thin film of the film substrate are electrically connected, and the core roll and the film substrate are in contact with each other.
  • the non-contact state between the core roll and the film substrate was held when the thickness of the spacer was 0.25 mm.
  • the comparative example as shown in FIG. 9, when the thickness of the spacer was 0.40 mm, a non-contact state between the core roll and the film substrate was maintained.
  • the thickness of the spacer required to maintain the non-contact state between the core roll and the film substrate can be reduced.
  • the diameter expansion of a film roll can be suppressed and the surfaces of a film substrate can be reliably made non-contact.
  • the non-contact state between the core roll and the film substrate is maintained. If the material of the film substrate is more rigid, that is, When the Young's modulus is large, the non-contact state between the core roll and the film substrate can be maintained even if the thickness of the spacer is less than 0.25 mm.
  • the spacer arrangement process when the film substrate 1 is mounted, the intermediate portions in the width direction of the film substrate 1 that are easily in contact with each other.
  • the spacer 2c since the spacer 2c is disposed, contact between the film substrates 1 can be suppressed even if the film substrate 1 is equipped in the fitting process.
  • the spacer 2c having the same thickness as the spacer 2b disposed at both ends of the film substrate 1 is disposed in the middle portion of the film substrate 1, so that the film The diameter of the roll 3b can be suppressed. Therefore, the diameter increase of the film roll 3b can be suppressed, and the surfaces of the film substrate 1 can be reliably brought into non-contact.
  • FIG. 5 shows Embodiment 2 of the film roll manufacturing apparatus according to the present invention.
  • a roll “toe-to-one” roll type coating apparatus is exemplified as a film roll manufacturing apparatus.
  • the same parts as in FIGS. The same reference numerals are used and detailed description thereof is omitted.
  • FIG. 5 is a schematic cross-sectional view of the coating apparatus 30b of the present embodiment.
  • a first roll storage chamber 21 in which a film roll before processing is accommodated, a coating chamber 25 for performing coating, a heat processing chamber 26 for performing heat treatment, and a film roll after processing.
  • the second roll storage chamber 24 in which are accommodated in a row.
  • the coating chamber 25 has a resist material on the surface of the film substrate 1 that is transported on the guide rolls 14k and 141 that are arranged so that their rotation axes are parallel to each other and are rotatable. And a slit coater 18 for coating a thin film.
  • the heat treatment chamber 26 includes five guide rolls 14m to 14q that are arranged so that their rotation axes are parallel to each other and are rotatable, and a film substrate 1 that is conveyed along the guide rolls 14m to 14q. And a heater (not shown) for firing the thin film on the film substrate 1.
  • the film roll 3a is accommodated in the first roll accommodating chamber 21 and the film roll 3a is configured in the coating chamber 25 as in the first embodiment.
  • the thin film is baked in the heat treatment chamber 26, and finally the film substrate 1 is placed on the core core 12 in the second roll storage chamber 24 as in the first embodiment.
  • the film roll 3b is manufactured by rigging.
  • the present invention may be configured as follows for each of the above embodiments. 6 to 8 show other embodiments of the film roll according to the present invention! / Speak.
  • the present invention is not limited to this, for example, FIG. Film rolls 3c-3e as shown in FIG. Specifically, in the film roll 3c shown in FIG. 6, the width of the spacer 2c at the intermediate portion of the film substrate 1 and the width of the spacers 2b at both ends are substantially uniform.
  • each spacer introduction reel 13 in FIG. 2 is moved in parallel with the rotation axis of the core roll 12, so that the middle part of the film substrate 1 is moved.
  • the position of the spacer 2c is shifted to the right from the center of the film substrate 1.
  • the width of the spacer 2c at the intermediate portion of the film substrate 1 is narrower than the width of the spacers 2b at both ends.
  • the force exemplified by the film rolls 3b to 3e in which one spacer 2c is disposed between both end portions of the film substrate 1 is not limited to this.
  • a plurality of spacers may be arranged between both ends of the substrate 1.
  • the present invention suppresses the expansion of the film roll and can reliably bring the substrate surfaces into non-contact with each other. Therefore, the display panel using the roll-to-roll method is used. It is useful for the production of

Abstract

A method of producing a film roll (3b) formed by rolling up a film substrate (1). The method has a spacer placement step for individually placing belt-like spacers (2b, 2c) in the longitudinal direction of the film substrate (1), the spacers being placed at both end sections and at an intermediate section of the film substrate (1), and also has a rolling up step for rolling up the film substrate (1) with the spacers (2b, 2c) placed between layers of the rolled film substrate.

Description

明 細 書  Specification
フィルムロールの製造方法及び製造装置、並びにフィルムロール 技術分野  Film roll manufacturing method and manufacturing apparatus, and film roll technical field
[0001] 本発明は、フィルムロールの製造方法及び製造装置、並びにフィルムロールに関し 、特に、液晶ディスプレイや有機 ELディスプレイなどの表示パネルの製造に用いられ 、フィルムロールを構成するフィルム基板の卷装技術に関するものである。  TECHNICAL FIELD [0001] The present invention relates to a film roll manufacturing method and manufacturing apparatus, and a film roll, and in particular, used for manufacturing a display panel such as a liquid crystal display or an organic EL display. It is about.
背景技術  Background art
[0002] 近年、液晶ディスプレイや有機 ELディスプレイなどの分野では、プラスチック基板な どの可撓性基板を用いたフレキシブルな表示パネルが開発されて 、る。このフレキシ ブルな表示パネルの製造には、生産性の面力 可撓性基板を連続して処理できる口 ール'トウ1 ~ ·ロール（ロール 'ッ^ ~ ·ロール）方式が好適である。 In recent years, flexible display panels using a flexible substrate such as a plastic substrate have been developed in fields such as a liquid crystal display and an organic EL display. This production of flexi-configurable display panel, mouth Lumpur 'toe 1 roll (roll' to the productivity of the surface force the flexible substrate can be processed continuously Tsu ^ ~ roll) method is preferred.
[0003] このロール'トウ一'ロール方式では、例えば、数百 mの長尺のフィルム基板が巻き 出しロール及び巻き取りロールに卷装されるので、フィルム基板の表面同士が接触し たり、異物が混入した状態で巻かれたりすることによって、基板表面に形成された薄 膜などを損傷させる虞れがある。  [0003] With this roll-to-roll method, for example, a long film substrate of several hundreds of meters is mounted on a winding roll and a winding roll, so that the surfaces of the film substrates are in contact with each other or foreign matter There is a risk of damaging the thin film formed on the surface of the substrate by being wound in a state in which is mixed.
[0004] そこで、フィルム基板の表面同士を接触させな 、ように、フィルム基板にスぺーサを 供給しながら、フィルム基板を卷装してフィルムロールを製造する方法が提案されて いる。  [0004] Therefore, a method has been proposed in which a film roll is manufactured by equipping a film substrate while supplying a spacer to the film substrate so that the surfaces of the film substrates do not contact each other.
[0005] 例えば、特許文献 1では、透明導電性フィルムをその両端部にスぺーサを供給しな 力 Sら卷芯に卷装させる導電性フィルムロールの製造方法が開示されている。その中 では、供給されたスぺーサによって、透明導電性フィルムにかかる圧力を下げること ができるため、異物がフィルム間に混入しても、導電性フィルムにおいて異物に起因 する打痕が生じにくくなると記載されている。  [0005] For example, Patent Document 1 discloses a method for producing a conductive film roll in which a transparent conductive film is mounted on the core from a force S without supplying a spacer to both ends thereof. Among them, since the pressure applied to the transparent conductive film can be lowered by the supplied spacer, even if foreign matter is mixed between the films, the conductive film is less likely to cause dents due to the foreign matter. Are listed.
特許文献 1：特開 2004— 199643号公報  Patent Document 1: Japanese Unexamined Patent Application Publication No. 2004-199643
発明の開示  Disclosure of the invention
発明が解決しょうとする課題  Problems to be solved by the invention
[0006] ところで、フレキシブルな表示パネルの製造においては、精細なパターユングがな されるので、フィルム基板の表面同士が接触することにより、基板表面に形成された 導電素子などが損傷して表示品位が低下してしまう虞れがある。例えば、特許文献 1 のようにフィルム基板の両端部にスぺーサを配置させただけでは、基板自体の橈み などによって基板表面同士が接触することにより、基板表面の導電素子が損傷して、 表示パネルの表示品位が低下してしまう虞れがある。 [0006] By the way, in manufacturing a flexible display panel, there is no fine patterning. Therefore, when the surfaces of the film substrates are brought into contact with each other, there is a possibility that the conductive elements formed on the substrate surface are damaged and the display quality is deteriorated. For example, just placing spacers at both ends of the film substrate as in Patent Document 1, the substrate surfaces come into contact with each other due to the stagnation of the substrate itself, and the conductive elements on the substrate surface are damaged. The display quality of the display panel may be degraded.
[0007] これを解決するためにに、スぺーサを厚くする方法も考えられる力 そのスぺーサの 厚さが増えた分だけフィルム基板を卷装して製造されたフィルムロールの径が大きく なってしまうので、製造装置の大型化が余儀なくされる。この製造装置の大型化は、 特に、真空系の製造装置にとって重要な問題であるので、スぺーサを厚くすることは 好ましくない。  [0007] In order to solve this problem, a method of increasing the thickness of the spacer is also conceivable. The diameter of the film roll manufactured by equipping the film substrate with the increase in the thickness of the spacer is increased. As a result, the manufacturing apparatus must be increased in size. This increase in size of the manufacturing apparatus is an important problem particularly for vacuum manufacturing apparatuses, so it is not preferable to increase the thickness of the spacer.
[0008] 本発明は、力かる点に鑑みてなされたものであり、その目的とするところは、フィルム ロールの拡径を抑制して、基板表面同士を確実に非接触にすることにある。  [0008] The present invention has been made in view of the points to be applied, and an object of the present invention is to suppress the diameter expansion of the film roll and to ensure that the substrate surfaces are not in contact with each other.
課題を解決するための手段  Means for solving the problem
[0009] 上記目的を達成するために、本発明は、フィルム基板の両端部及びそれら両端部 の間の中間部に帯状のスぺーサをそのフィルム基板の長手方向に沿ってそれぞれ 配置するようにしたものである。 [0009] In order to achieve the above object, according to the present invention, strip-shaped spacers are respectively arranged along the longitudinal direction of the film substrate at both ends of the film substrate and at an intermediate portion between the both ends. It is a thing.
[0010] 具体的に本発明に係るフィルムロールを製造する方法は、フィルム基板が卷装され たフィルムロールを製造する方法であって、上記フィルム基板の両端部及び該両端 部の間の中間部に帯状のスぺーサを該フィルム基板の長手方向に沿ってそれぞれ 配置するスぺーサ配置工程と、上記配置された各スぺーサを介して上記フィルム基 板を卷装する卷装工程とを備えることを特徴とする。 [0010] Specifically, a method for producing a film roll according to the present invention is a method for producing a film roll on which a film substrate is mounted, and includes both end portions of the film substrate and intermediate portions between the both end portions. A spacer arrangement step of arranging the strip spacers along the longitudinal direction of the film substrate, and an installation step of installing the film substrate via each of the arranged spacers. It is characterized by providing.
[0011] 上記の方法によれば、スぺーサ配置工程において、フィルム基板が卷装されたとき にフィルム基板同士が接触し易 、フィルム基板の幅方向における中間部に、スぺー サを配置するので、卷装工程においてフィルム基板が卷装されても、フィルム基板同 士の接触が抑制される。また、フィルム基板同士の接触を抑制するために、フィルム 基板の両端部に配置するスぺーサと同じスぺーサをフィルム基板の中間部に配置す るので、フィルムロールの拡径が抑制される。したがって、フィルムロールの拡径を抑 制して、基板表面同士を確実に非接触にすることが可能になる。 [0012] 上記フィルム基板には、表示パネルを形成するための表示パネル形成部がマトリク ス状に複数配設され、上記中間部のスぺーサは、上記複数の表示パネル形成部の 間に配置してもよい。 [0011] According to the above method, in the spacer arrangement step, the film substrates are easily brought into contact with each other when the film substrates are mounted, and the spacers are arranged in the intermediate portion in the width direction of the film substrates. Therefore, even if the film substrate is installed in the installation process, contact with the film substrate is suppressed. In addition, in order to suppress contact between the film substrates, the same spacer as the spacers disposed at both ends of the film substrate is disposed in the middle portion of the film substrate, so that expansion of the film roll is suppressed. . Therefore, it is possible to reliably prevent the substrate surfaces from contacting each other by suppressing the diameter expansion of the film roll. [0012] In the film substrate, a plurality of display panel forming portions for forming a display panel are arranged in a matrix, and the spacer in the intermediate portion is arranged between the plurality of display panel forming portions. May be.
[0013] 上記の方法によれば、フィルム基板の中間部にあるスぺーサが複数の表示パネル 形成部の間に配置するので、フィルム基板上にスぺーサを配置しても、スぺーサがフ イルムロールを構成するフィルム基板に与える影響が小さくなる。  [0013] According to the above method, since the spacer in the intermediate portion of the film substrate is disposed between the plurality of display panel forming portions, the spacer is disposed even if the spacer is disposed on the film substrate. Has a smaller effect on the film substrate constituting the film roll.
[0014] 上記中間部のスぺーサの幅は、上記両端部の各スぺーサの幅よりも狭くてもよい。  [0014] The width of the spacer at the intermediate portion may be narrower than the width of each spacer at the both end portions.
[0015] 上記の方法によれば、一般的にフィルム基板の中間部は、その両端部に比べて微 細な導電素子が形成されるので、フィルム基板の中間部に狭幅のスぺーサを配置す ることによって、本発明の具体的な作用効果が奏される。 [0015] According to the above-described method, generally, a fine conductive element is formed in the intermediate portion of the film substrate as compared with both end portions thereof, so that a narrow spacer is provided in the intermediate portion of the film substrate. By arranging, the specific effects of the present invention are exhibited.
[0016] 上記スぺーサの幅は、 1mm以上且つ 50mm以下であってもよい。 [0016] The width of the spacer may be 1 mm or more and 50 mm or less.
[0017] 上記の方法によれば、スぺーサの幅が lmmよりも狭い場合には、スぺーサをフィル ム基板の所定位置に配置することが困難であり、スぺーサの幅が 50mmよりも広い場 合には、フィルム基板にロスとなる領域が多く配設される。 [0017] According to the above method, if the width of the spacer is smaller than lmm, it is difficult to place the spacer at a predetermined position on the film substrate, and the width of the spacer is 50 mm. In the case where the width is larger than that, a lot of loss areas are arranged on the film substrate.
[0018] 上記スぺーサの厚さは、 0. 25mm以上且つ lmm以下であってもよい。 [0018] The spacer may have a thickness of 0.25 mm or more and lmm or less.
[0019] 上記の方法によれば、スぺーサの厚さが 0. 25mmよりも薄い場合には、フィルム基 板同士が接触し易ぐスぺーサの厚さが lmmよりも厚い場合には、フィルム基板を卷 装させたフィルムロールの径が大きくなつてしまう。 [0019] According to the above method, when the thickness of the spacer is thinner than 0.25 mm, when the thickness of the spacer that makes it easy for the film substrates to come into contact with each other is larger than lmm. The diameter of the film roll on which the film substrate is mounted becomes large.
[0020] また、本発明に係るフィルムロールの製造装置は、フィルム基板が卷装されたフィル ムロールを製造するフィルムロールの製造装置であって、上記フィルム基板を卷装す るための回転可能な卷芯ロールと、各々帯状のスぺーサが卷装され、上記卷芯ロー ルに卷装されるフィルム基板の両端部及び該両端部の間の中間部に対してそれぞ れ設けられ、上記卷芯ロールに卷装されるフィルム基板の間に上記各スぺーサを導 入するスぺーサ導入リールとを備えて 、ることを特徴とする。 The film roll manufacturing apparatus according to the present invention is a film roll manufacturing apparatus that manufactures a film roll on which a film substrate is mounted, and is rotatable for mounting the film substrate. A core roll and strip spacers are mounted on each of the core rolls, and provided on both ends of the film substrate mounted on the core roll and an intermediate portion between the both ends. A spacer introduction reel for introducing each of the spacers described above is provided between the film substrates mounted on the core roll.
[0021] 上記の構成によれば、スぺーサ導入リールによって、フィルム基板が卷装されたとき にフィルム基板同士が接触し易 、フィルム基板の幅方向における中間部に、スぺー サが配置されるので、卷芯ロールにフィルム基板が卷装されても、フィルム基板同士 の接触が抑制される。また、フィルム基板同士の接触を抑制するために、フィルム基 板の両端部に配置するスぺーサと同じスぺーサがフィルム基板の中間部に配置され るので、フィルムロールの拡径が抑制される。したがって、フィルムロールの拡径を抑 制して、基板表面同士を確実に非接触にすることが可能になる。 [0021] According to the above configuration, when the film substrates are mounted by the spacer introduction reel, the film substrates are easily brought into contact with each other, and the spacer is disposed at the intermediate portion in the width direction of the film substrate. Therefore, even if a film substrate is mounted on the core roll, contact between the film substrates is suppressed. In order to suppress contact between film substrates, Since the same spacer as the spacers arranged at both ends of the plate is arranged in the middle part of the film substrate, the diameter expansion of the film roll is suppressed. Therefore, it is possible to reliably prevent the substrate surfaces from contacting each other by suppressing the diameter expansion of the film roll.
[0022] 上記各スぺーサ導入リールは、上記卷芯ロールの回転軸に対して平行に移動可能 であってもよい。  [0022] Each of the spacer introduction reels may be movable in parallel to the rotation axis of the core roll.
[0023] 上記の構成によれば、例えば、フィルム基板に形成された導電素子の位置に合わ せて、スぺーサの位置の変更が可能になるので、スぺーサがフィルムロールを構成 するフィルム基板に与える影響が小さくなる。  [0023] According to the above configuration, for example, the position of the spacer can be changed in accordance with the position of the conductive element formed on the film substrate, so that the spacer constitutes a film roll. The effect on the substrate is reduced.
[0024] また、本発明に係るフィルムロールは、フィルム基板が卷装されたフィルムロールで あって、上記フィルム基板の両端部及び該両端部の間の中間部に帯状のスぺーサ が該フィルム基板の長手方向に沿ってそれぞれ配置されて ヽることを特徴とする。  [0024] Further, the film roll according to the present invention is a film roll in which a film substrate is mounted, and strip-like spacers are provided at both end portions of the film substrate and intermediate portions between the both end portions. It is characterized by being arranged along the longitudinal direction of the substrate.
[0025] 上記構成によれば、フィルム基板が卷装されたときにフィルム基板同士が接触し易 いフィルム基板の幅方向における中間部に、スぺーサが配置されているので、卷芯 ロールにフィルム基板が卷装されても、フィルム基板同士の接触が抑制される。また、 フィルム基板同士の接触を抑制するために、フィルム基板の両端部に配置するスぺ ーサと同じスぺーサがフィルム基板の中間部に配置されているので、フィルムロール の拡径が抑制される。したがって、フィルムロールの拡径を抑制して、基板表面同士 を確実に非接触にすることが可能になる。  [0025] According to the above configuration, since the spacer is disposed in the intermediate portion in the width direction of the film substrates that are easy to contact with each other when the film substrates are mounted, Even if the film substrates are equipped, contact between the film substrates is suppressed. In addition, in order to suppress contact between the film substrates, the same spacer as the spacers arranged at both ends of the film substrate is arranged in the middle part of the film substrate, so that the expansion of the film roll is suppressed. Is done. Therefore, the diameter of the film roll can be suppressed and the substrate surfaces can be reliably brought into contact with each other.
発明の効果  The invention's effect
[0026] 本発明によれば、フィルム基板の両端部及びそれら両端部の間の中間部に帯状の スぺーサをそのフィルム基板の長手方向に沿ってそれぞれ配置するため、フィルム口 ールの拡径を抑制して、基板表面同士を確実に非接触にすることができる。  [0026] According to the present invention, since the strip spacers are respectively arranged along the longitudinal direction of the film substrate at both ends of the film substrate and at an intermediate portion between the both ends, By suppressing the diameter, the substrate surfaces can be reliably brought into non-contact with each other.
図面の簡単な説明  Brief Description of Drawings
[0027] [図 1]図 1は、実施形態 1に係るウエットエッチング装置 30aの断面模式図である。  FIG. 1 is a schematic cross-sectional view of a wet etching apparatus 30a according to a first embodiment.
[図 2]図 2は、ウエットエッチング装置 30aを構成するスぺーサ導入リール 13の斜視図 である。  FIG. 2 is a perspective view of a spacer introduction reel 13 constituting a wet etching apparatus 30a.
[図 3]図 3は、実施形態 1に係るフィルムロール 3bの斜視図である。  FIG. 3 is a perspective view of a film roll 3b according to Embodiment 1.
[図 4]図 4は、実施例における卷芯ロールとフィルム基板との接触状態を示すグラフで ある。 FIG. 4 is a graph showing the contact state between the core roll and the film substrate in the example. is there.
[図 5]図 5は、実施形態 2に係るコーティング装置 30bの断面模式図である。  FIG. 5 is a schematic cross-sectional view of a coating apparatus 30b according to Embodiment 2.
[図 6]図 6は、その他の実施形態に係るフィルムロール 3cの斜視図である。  FIG. 6 is a perspective view of a film roll 3c according to another embodiment.
[図 7]図 7は、その他の実施形態に係るフィルムロール 3dの斜視図である。  FIG. 7 is a perspective view of a film roll 3d according to another embodiment.
[図 8]図 8は、その他の実施形態に係るフィルムロール 3eの斜視図である。  FIG. 8 is a perspective view of a film roll 3e according to another embodiment.
[図 9]図 9は、比較例における卷芯ロールとフィルム基板との接触状態を示すグラフで ある。  FIG. 9 is a graph showing a contact state between the core roll and the film substrate in a comparative example.
符号の説明  Explanation of symbols
[0028] P 表示パネル形成部 [0028] P display panel forming section
1 フィルム基板  1 Film substrate
2a, 2b, 2c スぺーサ  2a, 2b, 2c spacer
3a, 3b, 3c, 3d, 3e フィルムロール  3a, 3b, 3c, 3d, 3e film roll
12 卷芯ロール  12 core roll
13 スぺーサ導入リール  13 Spacer introduction reel
30a ウエットエッチング装置（フィルムロール製造装置）  30a Wet etching equipment (film roll production equipment)
30b コーティング装置（フィルムロール製造装置）  30b Coating equipment (film roll production equipment)
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
[0029] 以下、本発明の実施形態を図面に基づいて詳細に説明する。なお、本発明は、以 下の実施形態に限定されるものではない。  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. The present invention is not limited to the following embodiment.
[0030] 《発明の実施形態 1》  [Embodiment 1 of the Invention]
図 1〜図 3は、本発明に係るフィルムロールの製造方法及び製造装置、並びにフィ ルムロールの実施形態 1を示している。本実施形態では、フィルムロールの製造装置 として、ロール'トウ一'ロール方式のウエットエッチング装置を例示する。  1 to 3 show Embodiment 1 of a film roll manufacturing method and manufacturing apparatus and film roll according to the present invention. In this embodiment, as a film roll manufacturing apparatus, a roll 'toe' roll type wet etching apparatus is illustrated.
[0031] 図 1は、本実施形態のウエットエッチング装置 30aの断面模式図である。  FIG. 1 is a schematic cross-sectional view of the wet etching apparatus 30a of the present embodiment.
[0032] このウエットエッチング装置 30aでは、処理前のフィルムロール 3aが収容される第 1 ロール収容室 21と、エッチング処理を行うエッチング処理室 22と、リンス処理を行うリ ンス処理室 23と、処理後のフィルムロール 3bが収容される第 2ロール収容室 24とが 順に一列に連なるように設けられている。そして、フィルムロール 3aを構成するフィル ム基板 1がガイドロール 14a〜14jを順に経由して搬送できるように、第 1ロール収容 室 21とエッチング処理室 22との間の側壁、エッチング処理室 22とリンス処理室 23と の間の側壁、及びリンス処理室 23と第 2ロール収容室 24との間の側壁には、開口部 がそれぞれ設けられて ヽる。 [0032] In this wet etching apparatus 30a, a first roll storage chamber 21 in which the unprocessed film roll 3a is stored, an etching processing chamber 22 for performing an etching process, a rinse processing chamber 23 for performing a rinsing process, and a processing The second roll storage chamber 24 in which the subsequent film roll 3b is stored is provided so as to be successively connected in a row. And the film constituting the film roll 3a The side wall between the first roll storage chamber 21 and the etching chamber 22 and the side wall between the etching chamber 22 and the rinsing chamber 23 so that the substrate 1 can be conveyed through the guide rolls 14a to 14j in order. Openings are provided on the side walls between the rinsing chamber 23 and the second roll storage chamber 24, respectively.
[0033] 第 1ロール収容室 21は、互いの回転軸が平行に配置すると共に回転可能にそれ ぞれ設けられたスぺーサ卷き取りロール 10、フィルム基板巻き出しロール 11及びガ イドロール 14aを備えている。ここで、フィルム巻き出しロール 11には、両端部にそれ ぞれ配置された帯状のスぺーサ 2aを介してフィルム基板 1が卷装されている。そして 、卷装されたフィルム基板 1とそのフィルム基板 1の間に挟持されたスぺーサ 2aとによ つてフィルムロール 3aが構成されて!、る。  [0033] The first roll storage chamber 21 includes a spacer scraping roll 10, a film substrate unwinding roll 11 and a guide roll 14a, which are arranged so that their rotation axes are parallel to each other and are rotatably provided. I have. Here, the film unwinding roll 11 is equipped with a film substrate 1 via strip-shaped spacers 2a arranged at both ends. Then, the film roll 3a is constituted by the film substrate 1 that is mounted and the spacer 2a that is sandwiched between the film substrate 1 and the film roll 3a.
[0034] エッチング処理室 22は、互いの回転軸が平行に配置すると共に回転可能に設けら れた 4本のガイドロール 14b〜14eと、エッチング液が収容されてウエットエッチング 処理を行うエッチング槽 15と、フィルム基板 1の表面に圧縮空気を噴出して表面に付 着したエッチング液を切るエアナイフ 17とを備えて 、る。  [0034] The etching chamber 22 includes four guide rolls 14b to 14e that are arranged so that their rotational axes are parallel to each other and are rotatable, and an etching tank 15 in which an etching solution is contained to perform a wet etching process. And an air knife 17 that blows compressed air onto the surface of the film substrate 1 and cuts off the etching solution attached to the surface.
[0035] リンス処理室 23は、互いの回転軸が平行に配置すると共に回転可能に設けられた 4本のガイドロール 14f〜14iと、純水などのリンス液が収容されてリンス処理を行うリ ンス槽 16と、フィルム基板 1の表面に圧縮空気を噴出して表面に付着したリンス液を 切るエアナイフ 17とを備えて 、る。  [0035] The rinsing chamber 23 includes four guide rolls 14f to 14i that are arranged so that their rotational axes are parallel to each other and are rotatable, and a rinsing liquid such as pure water is accommodated in the rinsing chamber 23. And an air knife 17 that blows compressed air onto the surface of the film substrate 1 to cut off the rinse liquid adhering to the surface.
[0036] 第 2ロール収容室 24は、互いの回転軸が平行に配置すると共に回転可能にそれ ぞれ設けられたガイドロール 14j、卷芯ロール 12及びスぺーサ導入リール 13を備え ている。スぺーサ導入リール 13は、例えば、図 2に示すように、卷芯ロール 12の回転 軸と平行に設けられたシャフト 13cに回転可能に 3個並んで設けられている。ここで、 図 2は、図 1中の矢印 Aからみたスぺーサ導入リール 13の斜視図である。また、各ス ぺーサ導入リール 13は、スぺーサ 2b (2c)が卷装される卷芯部 13aと、その巻き芯部 13aを挟持するように設けられ、スぺーサ 2b (2c)のずれを抑制するための一対の円 盤状のガイド部 13bとを備えている。さらに、各スぺーサ導入リール 13は、卷芯ロー ル 12の回転軸に対して平行に移動可能である。これによれば、フィルム基板 1上の 後述する各表示パネル形成部 Pの位置に合わせて、スぺーサ 2b (2c)の位置を変更 できるので、スぺーサ 2b (2c)がフィルムロール 3bを構成するフィルム基板 1に与える 影響が小さくなる。なお、スぺーサ導入リール 13には、予め、帯状のスぺーサ 2b (2c )が卷装されている。ここで、図 2の中央のスぺーサ導入リール 13には、その両側に 配置されたスぺーサ導入リール 13に卷装されたスぺーサ 2bよりも狭幅なスぺーサ 2c が卷装されている。 [0036] The second roll storage chamber 24 includes a guide roll 14j, a core roll 12 and a spacer introduction reel 13 that are arranged so that their rotation axes are parallel to each other and are rotatable. For example, as shown in FIG. 2, three spacer introduction reels 13 are provided so as to be rotatably arranged on a shaft 13c provided in parallel with the rotation axis of the core roll 12. Here, FIG. 2 is a perspective view of the spacer introduction reel 13 as viewed from the arrow A in FIG. Each spacer introduction reel 13 is provided so as to sandwich the core portion 13a on which the spacer 2b (2c) is mounted and the winding core portion 13a, and the spacer 2b (2c) And a pair of disk-shaped guide portions 13b for suppressing displacement. Further, each spacer introduction reel 13 is movable in parallel with the rotation axis of the core roll 12. According to this, the position of the spacer 2b (2c) is changed in accordance with the position of each display panel forming portion P described later on the film substrate 1. Therefore, the influence of the spacer 2b (2c) on the film substrate 1 constituting the film roll 3b is reduced. The spacer introduction reel 13 is preliminarily equipped with a strip-like spacer 2b (2c). Here, the spacer introduction reel 13 in the center of FIG. 2 is equipped with a spacer 2c that is narrower than the spacer 2b installed on the spacer introduction reel 13 arranged on both sides thereof. Has been.
[0037] 次に、上記構成のウエットエッチング装置 30aの動作について説明する。  Next, the operation of the wet etching apparatus 30a configured as described above will be described.
[0038] 最初に動作する第 1ロール収容室 21では、フィルム巻き出しロール 11上のフィルム ロール 3aを構成するフィルム基板 1がガイドロール 14aの方に巻き出されると共にェ ツチング処理室 22に搬送され、同じくフィルムロール 3aを構成するスぺーサ 2aがス ぺーサ巻き取りロール 10の方に巻き出されると共にそのスぺーサ卷き取りロール 10 に巻き取られる。 In the first roll accommodating chamber 21 that operates first, the film substrate 1 constituting the film roll 3 a on the film unwinding roll 11 is unwound toward the guide roll 14 a and conveyed to the etching processing chamber 22. Similarly, the spacer 2 a constituting the film roll 3 a is unwound toward the spacer take-up roll 10 and is taken up by the spacer take-up roll 10.
[0039] 2番目に動作するエッチング処理室 22では、第 1ロール収容室 21から搬送された フィルム基板 1がガイドロール 14b及び 14cによって下降された後に、エッチング槽 1 5内のエッチング液に浸漬されている間にエッチング処理がなされる。続いて、その エッチング処理がなされたフィルム基板 1がガイドロール 14d及び 14eによってエッチ ング液から引き上げられ、その弓 Iき上げられる途中にお 、てエアナイフ 17によるエツ チング液の液切りが行われる。その後、液切りされたフィルム基板 1がガイドロール 14 eを経由してリンス処理室 23に搬送される。  [0039] In the etching chamber 22 operating second, the film substrate 1 conveyed from the first roll storage chamber 21 is lowered by the guide rolls 14b and 14c, and then immersed in the etching solution in the etching tank 15. Etching is performed during the process. Subsequently, the film substrate 1 subjected to the etching process is pulled up from the etching liquid by the guide rolls 14d and 14e, and the etching liquid is removed by the air knife 17 while the bow I is being lifted up. Thereafter, the drained film substrate 1 is conveyed to the rinse treatment chamber 23 via the guide roll 14e.
[0040] 3番目に動作するリンス室 23では、エッチング処理室 22から搬送されたフィルム基 板 1がガイドロール 14f及び 14gによって下降された後に、リンス槽 16内のリンス液に 浸漬されている間にリンス処理がなされる。続いて、そのフィルム基板 1がガイドロー ル 14h及び 14iによってリンス液から引き上げられ、その引き上げられる途中におい てエアナイフ 17によるリンス液の液切りが行われる。その後、液切りされたフィルム基 板 1がガイドロール 14iを経由して第 2ロール収容室 24に搬送される。  [0040] In the rinsing chamber 23 that operates third, the film substrate 1 conveyed from the etching chamber 22 is lowered by the guide rolls 14f and 14g and then immersed in the rinsing liquid in the rinsing tank 16. Rinse processing is performed. Subsequently, the film substrate 1 is pulled up from the rinse liquid by the guide rolls 14h and 14i, and the rinse liquid is drained by the air knife 17 in the middle of the pulling up. Thereafter, the drained film substrate 1 is conveyed to the second roll storage chamber 24 via the guide roll 14i.
[0041] 最後に動作する第 2ロール収容室 24では、リンス処理室 23から搬送されたフィルム 基板 1がガイドロール 14jを経由して、図 3に示すように、卷芯ロール 12に巻き取られ ると共に、巻き重ねられるフィルム基板 1の間に各スぺーサ導入リール 13からスぺー サ 2b及び 2cが導入される。ここで、フィルム基板 1の両端部には広幅なスぺーサ 2b 力 その両端部の間の中間部には、狭幅なスぺーサ 2cがそれぞれ配置される。なお 、図 3は、図 1中の矢印 Bからみたフィルムロール 3bの斜視図である。 [0041] In the second roll storage chamber 24 that operates last, the film substrate 1 conveyed from the rinse treatment chamber 23 is wound around the core roll 12 via the guide roll 14j as shown in FIG. At the same time, the spacers 2b and 2c are introduced from the spacer introduction reels 13 between the film substrates 1 to be wound. Here, wide spacers 2b are attached to both ends of the film substrate 1. Force Spacers 2c having a narrow width are respectively arranged in the intermediate portion between the both end portions. FIG. 3 is a perspective view of the film roll 3b as viewed from the arrow B in FIG.
[0042] 次に、上記構成のウエットエッチング装置 30aを用いたフィルムロールの製造方法 について、説明する。本実施形態のフィルムロールの製造方法は、準備工程、フィル ムロール収容工程と、エッチング処理工程と、リンス処理工程と、巻き取り工程 (スぺ ーサ配置工程及び卷装工程)とを備えて ヽる。  [0042] Next, a film roll manufacturing method using the wet etching apparatus 30a having the above-described configuration will be described. The film roll manufacturing method of the present embodiment includes a preparation process, a film roll housing process, an etching process, a rinse process, and a winding process (spacer placement process and equipping process). The
[0043] く準備工程 >  [0043] Ku preparation process>
ロール 'トゥー'ロール方式によって、可撓性を有するフィルム状の榭脂基板上に、 アルミニウムやチタンなどの金属薄膜をスパッタリング法で成膜し、続いて、その金属 薄膜上にレジストパターンを形成した後に、その榭脂基板を両端部に線状のスぺー サ 2aを挟持させながら卷芯ロール (フィルム巻き出しロール 11)に卷装することにより 、金属薄膜及びレジストパターンを有するフィルム基板 1が卷装されたフィルムロール 3aを準備する。  Roll A metal film such as aluminum or titanium was formed on a flexible film-like resin substrate by sputtering using the 'to-roll' method, and then a resist pattern was formed on the metal thin film. Thereafter, the film substrate 1 having a metal thin film and a resist pattern is formed by mounting the resin substrate on a core roll (film unwinding roll 11) while sandwiching the linear spacer 2a at both ends. Prepare the loaded film roll 3a.
[0044] ここで、フィルムロール 3aを構成するフィルム基板 1は、例えば、ポリエステル（PET )系榭脂、ポリイミド (PI)系榭脂、ポリエーテルスルホン (PES)系などの可撓性を有 する榭脂や、ガラス Zエポキシ系のガラス繊維強化榭脂などにより構成されて ヽる。 また、フィルム基板 1は、例えば、その厚さが 0. 1mm以上且つ 0. 3mm以下で、その 幅が 600mmである。また、フィルム基板 1には、図 3に示すように、各々表示パネル を形成するための複数の表示パネル形成部 Pがマトリクス状に配設されている。  [0044] Here, the film substrate 1 constituting the film roll 3a has flexibility such as polyester (PET) resin, polyimide (PI) resin, polyethersulfone (PES), and the like. It is made of resin or glass Z epoxy-based glass fiber reinforced resin. The film substrate 1 has a thickness of 0.1 mm to 0.3 mm and a width of 600 mm, for example. Further, as shown in FIG. 3, the film substrate 1 is provided with a plurality of display panel forming portions P for forming a display panel in a matrix.
[0045] また、スぺーサ 2b及び 2cがそれぞれ卷装されたスぺーサ導入リール 13を準備する 。ここで、スぺーサ 2a、 2b及び 2cは、ポリエステル（PET)系榭脂、ポリイミド（PI)系榭 脂、ポリエーテルスルホン (PES)系などの榭脂フィルムや防塵紙などにより構成され ている。さらに、スぺーサ 2a、 2b及び 2cは、例えば、その厚さが 0. 25mm以上且つ lmm以下であり、その幅が lmm以上且つ 50mm以下である。ここで、スぺーサ 2a、 2b及び 2cの幅が lmmよりも狭い場合には、スぺーサ 2a、 2b及び 2cをフィルム基板 1の所定位置に配置することが困難であり、スぺーサ 2a、 2b及び 2cの幅が 50mmよ りも広い場合には、例えば、表示パネル形成部 Pが配置可能なフィルム基板 1の有効 領域が狭くなつてしまう。また、スぺーサ 2a、 2b及び 2cの厚さが 0. 25mmよりも薄い 場合には、フィルム基板 1同士が接触し易ぐスぺーサ 2a、 2b及び 2cの厚さが lmm よりも厚 、場合には、フィルムロール 3a及び製造されるフィルムロール 3bの径が大き くなつてしまう。 In addition, a spacer introduction reel 13 on which the spacers 2b and 2c are respectively equipped is prepared. Here, the spacers 2a, 2b and 2c are made of polyester (PET) resin, polyimide (PI) resin, polyethersulfone (PES) resin film or dustproof paper. . Furthermore, the spacers 2a, 2b and 2c have, for example, a thickness of 0.25 mm or more and 1 mm or less and a width of 1 mm or more and 50 mm or less. Here, when the widths of the spacers 2a, 2b and 2c are narrower than lmm, it is difficult to place the spacers 2a, 2b and 2c at the predetermined positions on the film substrate 1, and the spacers 2a When the widths of 2b and 2c are larger than 50 mm, for example, the effective area of the film substrate 1 on which the display panel forming portion P can be arranged becomes narrow. Spacers 2a, 2b and 2c are thinner than 0.25mm In this case, the thickness of the spacers 2a, 2b, and 2c in which the film substrates 1 can easily come into contact with each other is larger than lmm. In this case, the diameter of the film roll 3a and the produced film roll 3b is increased. End up.
[0046] 以下の各工程は、ロール'トウ一'ロール方式によって連続して行われるものである 力 以下の実施形態では各工程毎に分けて説明する。  [0046] The following steps are performed continuously by the roll 'toe' roll method. In the following embodiments, each step will be described separately.
[0047] <フィルムロール収容工程 >  [0047] <Film roll accommodation process>
まず、第 1ロール収容室 21にフィルムロール 3aを収容した後、フィルムロール 3a力 らスぺーサ 2aを巻き出し、その先端をスぺーサ卷き取りロール 10に取り付ける。次い で、同じくフィルムロール 3aからフィルム基板 1を巻き出し、その先端をガイドロール 1 4aに送る。さらに、スぺーサ卷き取りロール 10及びフィルム巻き出しロール 11を駆動 させる。  First, after the film roll 3 a is accommodated in the first roll accommodating chamber 21, the spacer 2 a is unwound from the force of the film roll 3 a and the tip thereof is attached to the spacer scraping roll 10. Next, the film substrate 1 is similarly unwound from the film roll 3a, and the leading end thereof is sent to the guide roll 14a. Further, the spacer scraping roll 10 and the film unwinding roll 11 are driven.
[0048] <エッチング処理工程 >  [0048] <Etching process>
ガイドロール 14aから供給されたフィルム基板 1をガイドロール 14bで受けた後に、 そのフィルム基板 1をエッチング槽 15内のガイドロール 14c及び 14dに沿って搬送さ せて、フィルム基板 1のエッチング処理を行う。このとき、フィルム基板 1上のレジストパ ターン力 露出した金属薄膜が除去され、金属薄膜がノターユングされる。そして、 エッチング処理後のフィルム基板 1をエッチング槽 15から引き上げると共に、その表 面に付着したエッチング液をエアナイフ 17によって除去した後、そのフィルム基板 1 をガイドロール 14eに送る。  After the film substrate 1 supplied from the guide roll 14a is received by the guide roll 14b, the film substrate 1 is transported along the guide rolls 14c and 14d in the etching tank 15, and the film substrate 1 is etched. . At this time, the exposed metal thin film on the resist pattern force on the film substrate 1 is removed, and the metal thin film is notched. Then, the film substrate 1 after the etching process is pulled up from the etching tank 15, and the etching solution adhering to the surface is removed by the air knife 17, and then the film substrate 1 is sent to the guide roll 14e.
[0049] <リンス処理工程 >  [0049] <Rinsing process>
ガイドロール 14eから供給されたフィルム基板 1をガイドロール 14fで受けた後に、そ のフィルム基板 1をリンス槽 16内のガイドロール 14g及び 14hに沿って搬送させて、フ イルム基板 1のリンス処理を行う。このとき、フィルム基板 1の表面がリンス水によって 洗浄され、フィルム基板 1の表面に残留したエッチング液がリンス水によって除去され る。そして、リンス処理後のフィルム基板 1をリンス 16槽から引き上げると共に、その表 面に付着したリンス水をエアナイフ 17によって除去した後、そのフィルム基板 1をガイ ドローノレ 14iに送る。  After the film substrate 1 supplied from the guide roll 14e is received by the guide roll 14f, the film substrate 1 is transported along the guide rolls 14g and 14h in the rinsing tank 16 to rinse the film substrate 1. Do. At this time, the surface of the film substrate 1 is washed with rinse water, and the etching solution remaining on the surface of the film substrate 1 is removed with rinse water. Then, the film substrate 1 after the rinsing process is pulled up from the rinse 16 tank and the rinse water adhering to the surface is removed by the air knife 17, and then the film substrate 1 is sent to the guide roll 14i.
[0050] <卷き取り工程 > まず、ガイドロール 14 も供給されたフィルム基板 1をガイドロール 14jで受けた後 に、その先端を卷芯ロール 12に取り付ける。次いで、予め、第 2ロール収容室 24に 収容させた各スぺーサ導入リール 13から卷装されたスぺーサ 2b及び 2cを巻き出し、 図 3に示すように、その各先端を卷芯ロール 12上のフィルム基板 1の両端部及び中 間部に配置する (スぺーサ配置工程)。さらに、卷芯ロール 12及び各スぺーサ導入リ ール 13を駆動させて、各スぺーサ 2b及び 2cを介してフィルム基板 1を卷芯ロール 12 に卷装する (卷装工程)。 [0050] <Scraping process> First, after the film substrate 1 supplied with the guide roll 14 is received by the guide roll 14j, the tip is attached to the core roll 12. Next, the spacers 2b and 2c fitted out from the respective spacer introduction reels 13 previously accommodated in the second roll accommodating chamber 24 are unwound, and as shown in FIG. 12 is placed on both ends and middle of the film substrate 1 on top (spacer placement step). Further, the core roll 12 and the spacer introduction reels 13 are driven, and the film substrate 1 is mounted on the core roll 12 via the spacers 2b and 2c (mounting process).
[0051] 以上のようにして、フィルム基板 1の両端部及び中間部に帯状のスぺーサ 2b及び 2 cがフィルム基板 1の長手方向に沿ってそれぞれ配置されたフィルムロール 3bを製造 することができる。  [0051] As described above, it is possible to manufacture the film roll 3b in which the strip-like spacers 2b and 2c are respectively disposed along the longitudinal direction of the film substrate 1 at both end portions and intermediate portions of the film substrate 1. it can.
[0052] 次に、具体的に行った実験について説明する。  [0052] Next, a specific experiment will be described.
[0053] 本発明の実施例及び比較例として、周面に導電膜を有する卷芯ロールに、片面に チタン薄膜を成膜させたフィルム基板をそのチタン薄膜が卷芯ロールの導電膜と対 面するように、所定厚さのスぺーサを介して一層卷装させ、卷芯ロールの導電膜とフ イルム基板のチタン薄膜との間の導通テストを行って、卷芯ロールとフィルム基板との 接触 Z非接触の状態を確認した。なお、卷芯ロールとフィルム基板との接触 Z非接 触の状態は、フィルム基板が卷装されたときの基板表面同士の接触 Z非接触の状態 に置き換えられるものである。  [0053] As an example and a comparative example of the present invention, a film substrate in which a titanium thin film is formed on one side of a core roll having a conductive film on the peripheral surface thereof is opposed to the conductive film of the core roll. As shown in the figure, it is further equipped with a spacer having a predetermined thickness, and a continuity test between the conductive film of the core roll and the titanium thin film of the film substrate is performed. Contact Z Non-contact state was confirmed. The contact Z non-contact state between the core roll and the film substrate is replaced with the contact Z non-contact state between the substrate surfaces when the film substrate is mounted.
[0054] ここで、卷芯ロールは、直径が 150mmである。フィルム基板としては、ガラス Zェポ キシ系のガラス繊維強化樹脂からなり、厚さが 0. lmn！〜 0. 3mm、幅が 600mm、 ヤング率が 5GPa〜15GPa、比重が 1. 0gZcm3〜2. OgZcm3のもの用いた。また 、スぺーサとしては、ポリイミド榭脂からなり、厚さが 0. 125mm〜0. 750mmのもの を 6種類用いた。 [0054] Here, the core roll has a diameter of 150 mm. The film substrate is made of glass Z-epoxy glass fiber reinforced resin and has a thickness of 0.1 nm! ˜0.3 mm, width 600 mm, Young's modulus 5 GPa˜15 GPa, specific gravity 1.0 gZcm 3 ˜2. OgZcm 3 were used. As the spacers, six types of spacers made of polyimide resin and having a thickness of 0.125 mm to 0.750 mm were used.
[0055] そして、実施例では、フィルム基板の両端部にそれぞれ幅 10mmのスぺーサを、そ の中央部に幅 5mmのスぺーサをそれぞれ配置させた。一方、比較例では、フィルム 基板の両端部のみにそれぞれ幅 10mmのスぺーサを配置させた。  [0055] In the example, a spacer having a width of 10 mm was disposed at each end of the film substrate, and a spacer having a width of 5 mm was disposed at the center thereof. On the other hand, in the comparative example, a spacer having a width of 10 mm was disposed only at both ends of the film substrate.
[0056] 結果は、図 4及び図 9のグラフの通りである。ここで、図 4及び図 9は、それぞれ実施 例及び比較例におけるフィルム基板の長手方向の張力及びスぺーサの厚さと卷芯ロ ール及びフィルム基板の接触状態との関係を示すグラフである。図 4及び図 9にお ヽ て、グラフ中の白抜き丸印は、卷芯ロールの導電膜とフィルム基板のチタン薄膜とが 導通せずに卷芯ロールとフィルム基板とが非接触状態であることを示し、グラフ中の 黒三角印は、卷芯ロールの導電膜とフィルム基板のチタン薄膜とが導通して卷芯ロ ールとフィルム基板とが接触状態であることを示している。 [0056] The results are as shown in the graphs of FIGS. Here, FIGS. 4 and 9 show the tension in the longitudinal direction of the film substrate, the thickness of the spacer, and the core roller in the examples and comparative examples, respectively. It is a graph which shows the relationship with the contact state of a film and a film substrate. In FIG. 4 and FIG. 9, the white circles in the graph indicate that the conductive film of the core roll and the titanium thin film of the film substrate do not conduct and the core roll and the film substrate are not in contact with each other. The black triangle mark in the graph indicates that the conductive film of the core roll and the titanium thin film of the film substrate are electrically connected, and the core roll and the film substrate are in contact with each other.
[0057] 具体的に実施例では、図 4に示すように、スぺーサの厚さが 0. 25mmのときに卷芯 ロールとフィルム基板との間の非接触状態が保持され出した。一方、比較例では、図 9に示すように、スぺーサの厚さが 0. 40mmのときに卷芯ロールとフィルム基板との 間の非接触状態が保持され出した。このように、本実施例によれば、卷芯ロールとフ イルム基板との間の非接触状態を保持するのに必要なスぺーサの厚さを薄くできるこ とが確認された。これにより、フィルムロールの拡径を抑制して、フィルム基板の表面 同士を確実に非接触にすることができる。なお、本実施例では、スぺーサの厚さが 0 . 25mmのときに、卷芯ロールとフィルム基板との間の非接触状態が保持され出した 力 フィルム基板の材質がさらに堅い場合、すなわち、ヤング率が大きい場合には、 スぺーサの厚さを 0. 25mmよりも薄くしても、卷芯ロールとフィルム基板との間の非接 触状態を保持することができる。  Specifically, in the example, as shown in FIG. 4, the non-contact state between the core roll and the film substrate was held when the thickness of the spacer was 0.25 mm. On the other hand, in the comparative example, as shown in FIG. 9, when the thickness of the spacer was 0.40 mm, a non-contact state between the core roll and the film substrate was maintained. Thus, according to this example, it was confirmed that the thickness of the spacer required to maintain the non-contact state between the core roll and the film substrate can be reduced. Thereby, the diameter expansion of a film roll can be suppressed and the surfaces of a film substrate can be reliably made non-contact. In this example, when the thickness of the spacer is 0.25 mm, the non-contact state between the core roll and the film substrate is maintained. If the material of the film substrate is more rigid, that is, When the Young's modulus is large, the non-contact state between the core roll and the film substrate can be maintained even if the thickness of the spacer is less than 0.25 mm.
[0058] 以上説明したように、本実施形態によれば、スぺーサ配置工程において、フィルム 基板 1が卷装されたときにフィルム基板 1同士が接触し易いフィルム基板 1の幅方向 における中間部に、スぺーサ 2cを配置するので、卷装工程においてフィルム基板 1 が卷装されても、フィルム基板 1同士の接触を抑制することができる。また、フィルム基 板 1同士の接触を抑制するために、フィルム基板 1の両端部に配置するスぺーサ 2b と同じ厚さのスぺーサ 2cをフィルム基板 1の中間部に配置するので、フィルムロール 3 bの拡径を抑制することができる。したがって、フィルムロール 3bの拡径を抑制して、 フィルム基板 1の表面同士を確実に非接触にすることができる。  [0058] As described above, according to the present embodiment, in the spacer arrangement process, when the film substrate 1 is mounted, the intermediate portions in the width direction of the film substrate 1 that are easily in contact with each other. In addition, since the spacer 2c is disposed, contact between the film substrates 1 can be suppressed even if the film substrate 1 is equipped in the fitting process. In addition, in order to suppress contact between the film substrates 1, the spacer 2c having the same thickness as the spacer 2b disposed at both ends of the film substrate 1 is disposed in the middle portion of the film substrate 1, so that the film The diameter of the roll 3b can be suppressed. Therefore, the diameter increase of the film roll 3b can be suppressed, and the surfaces of the film substrate 1 can be reliably brought into non-contact.
[0059] 《発明の実施形態 2》  [Embodiment 2 of the Invention]
図 5は、本発明に係るフィルムロールの製造装置の実施形態 2を示している。本実 施形態では、フィルムロールの製造装置として、ロール'トウ一'ロール方式のコーティ ング装置を例示する。なお、以下の各実施形態において図 1〜図 3と同じ部分につ いては同じ符号を付して、その詳細な説明を省略する。 FIG. 5 shows Embodiment 2 of the film roll manufacturing apparatus according to the present invention. In the present embodiment, a roll “toe-to-one” roll type coating apparatus is exemplified as a film roll manufacturing apparatus. In the following embodiments, the same parts as in FIGS. The same reference numerals are used and detailed description thereof is omitted.
[0060] 図 5は、本実施形態のコーティング装置 30bの断面模式図である。  FIG. 5 is a schematic cross-sectional view of the coating apparatus 30b of the present embodiment.
[0061] このコーティング装置 30bでは、処理前のフィルムロールが収容される第 1ロール収 容室 21と、コーティングを行うコーティング室 25と、加熱処理を行う加熱処理室 26と 、処理後のフィルムロールが収容される第 2ロール収容室 24とが順に一列に連なるよ うに設けられている。そして、フィルムロールを構成するフィルム基板 1がガイドロール 14a〜14jを経由して搬送できるように、第 1ロール収容室 21とコーティング室 25との 間の側壁、コーティング室 25と加熱処理室 26との間の側壁、及び加熱処理室 26と 第 2ロール収容室 24との間の側壁には、開口部がそれぞれ設けられている。 [0061] In this coating apparatus 30b, a first roll storage chamber 21 in which a film roll before processing is accommodated, a coating chamber 25 for performing coating, a heat processing chamber 26 for performing heat treatment, and a film roll after processing. And the second roll storage chamber 24 in which are accommodated in a row. The side wall between the first roll storage chamber 21 and the coating chamber 25, the coating chamber 25, the heat treatment chamber 26, and the like so that the film substrate 1 constituting the film roll can be conveyed via the guide rolls 14a to 14j. Openings are respectively provided in the side wall between and the side wall between the heat treatment chamber 26 and the second roll storage chamber 24.
[0062] コーティング室 25は、互いの回転軸が平行に配置すると共に回転可能に設けられ たガイドロール 14k及び 141と、ガイドロール 14k及び 141上に搬送されるフィルム基 板 1の表面にレジスト材料などの薄膜をコーティングするためのスリットコーター 18と を備えている。 [0062] The coating chamber 25 has a resist material on the surface of the film substrate 1 that is transported on the guide rolls 14k and 141 that are arranged so that their rotation axes are parallel to each other and are rotatable. And a slit coater 18 for coating a thin film.
[0063] 加熱処理室 26は、互いの回転軸が平行に配置すると共に回転可能に設けられた 5 本のガイドロール 14m〜14qと、ガイドロール 14m〜14qに沿って搬送されるフィル ム基板 1を加熱して、フィルム基板 1上の薄膜を焼成するためのヒーター (不図示）と を備えている  [0063] The heat treatment chamber 26 includes five guide rolls 14m to 14q that are arranged so that their rotation axes are parallel to each other and are rotatable, and a film substrate 1 that is conveyed along the guide rolls 14m to 14q. And a heater (not shown) for firing the thin film on the film substrate 1.
上記構成のコ一ティング装置 30bでは、上記実施形態 1と同様に第 1ロール収容室 21の内部にフィルムロール 3aを収容して、コ一ティング室 25にお!/、てフィルムロール 3aを構成するフィルム基板 1上に薄膜を成膜した後に、加熱処理室 26においてその 薄膜を焼成して、最後に第 2ロール収容室 24において上記実施形態 1と同様に卷芯 コール 12にフィルム基板 1が卷装されてフィルムロール 3bが製造される。  In the coating apparatus 30b configured as described above, the film roll 3a is accommodated in the first roll accommodating chamber 21 and the film roll 3a is configured in the coating chamber 25 as in the first embodiment. After forming a thin film on the film substrate 1 to be fired, the thin film is baked in the heat treatment chamber 26, and finally the film substrate 1 is placed on the core core 12 in the second roll storage chamber 24 as in the first embodiment. The film roll 3b is manufactured by rigging.
[0064] 《その他の実施形態》  [0064] << Other Embodiments >>
本発明は、上記各実施形態について、以下のような構成としてもよい。図 6〜図 8は 、本発明に係るフィルムロールのその他の実施形態を示して！/ヽる。  The present invention may be configured as follows for each of the above embodiments. 6 to 8 show other embodiments of the film roll according to the present invention! / Speak.
[0065] 上記各実施形態では、フィルム基板 1の中間部に狭幅のスぺーサ 2cが配置された フィルムロール 3bを例示した力 本発明はこれに限定されることなぐ例えば、図 6〜 図 8に示すようなフィルムロール 3c〜3eであってもよい。 [0066] 具体的に図 6に示すフィルムロール 3cでは、フィルム基板 1の中間部のスぺーサ 2c の幅と両端部の各スぺーサ 2bの幅とがほぼ揃っている。 [0065] In each of the above embodiments, the force illustrating the film roll 3b in which the spacer 2c having a narrow width is arranged in the middle portion of the film substrate 1. The present invention is not limited to this, for example, FIG. Film rolls 3c-3e as shown in FIG. Specifically, in the film roll 3c shown in FIG. 6, the width of the spacer 2c at the intermediate portion of the film substrate 1 and the width of the spacers 2b at both ends are substantially uniform.
[0067] また、図 7に示すフィルムロール 3dでは、図 2における各スぺーサ導入リール 13を 卷芯ロール 12の回転軸に対して平行に移動させることによって、フィルム基板 1の中 間部のスぺーサ 2cの位置がフィルム基板 1の中央より右側にずれている。 Further, in the film roll 3d shown in FIG. 7, each spacer introduction reel 13 in FIG. 2 is moved in parallel with the rotation axis of the core roll 12, so that the middle part of the film substrate 1 is moved. The position of the spacer 2c is shifted to the right from the center of the film substrate 1.
[0068] さらに、図 8に示すフィルムロール 3eでは、フィルム基板 1の中間部のスぺーサ 2c の幅が両端部の各スぺーサ 2bの幅よりも狭くなつている。 Further, in the film roll 3e shown in FIG. 8, the width of the spacer 2c at the intermediate portion of the film substrate 1 is narrower than the width of the spacers 2b at both ends.
[0069] このように、フィルム基板 1の中間部のスぺーサ 2cを、フィルム基板 1上の表示パネ ル形成部 Pの位置に合わせて配置することによって、スぺーサ 2cがフィルム基板 1に 与える影響を小さくすることができる。 [0069] In this way, by arranging the spacer 2c in the middle portion of the film substrate 1 in accordance with the position of the display panel forming portion P on the film substrate 1, the spacer 2c is placed on the film substrate 1. The influence given can be reduced.
[0070] なお、上記各実施形態では、フィルム基板 1の両端部の間に 1本のスぺーサ 2cを 配置させたフィルムロール 3b〜3eを例示した力 本発明はこれに限定されず、フィル ム基板 1の両端部の間に複数本のスぺーサを配置させてもよい。 [0070] In the above-described embodiments, the force exemplified by the film rolls 3b to 3e in which one spacer 2c is disposed between both end portions of the film substrate 1 is not limited to this. A plurality of spacers may be arranged between both ends of the substrate 1.
産業上の利用可能性  Industrial applicability
[0071] 以上説明したように、本発明は、フィルムロールの拡径を抑制して、基板表面同士 を確実に非接触にすることができるので、ロール'トゥー ·ロール方式を用いた表示パ ネルの製造について有用である。 [0071] As described above, the present invention suppresses the expansion of the film roll and can reliably bring the substrate surfaces into non-contact with each other. Therefore, the display panel using the roll-to-roll method is used. It is useful for the production of

Claims

請求の範囲 The scope of the claims
[1] フィルム基板が卷装されたフィルムロールを製造する方法であって、  [1] A method for producing a film roll equipped with a film substrate,
上記フィルム基板の両端部及び該両端部の間の中間部に帯状のスぺーサを該フィ ルム基板の長手方向に沿ってそれぞれ配置するスぺーサ配置工程と、  A spacer disposing step of disposing strip-shaped spacers along the longitudinal direction of the film substrate at both end portions of the film substrate and an intermediate portion between the both end portions;
上記配置された各スぺーサを介して上記フィルム基板を卷装する卷装工程とを備 えることを特徴とするフィルムロールの製造方法。  A film roll manufacturing method comprising: an outfitting step of outfitting the film substrate through each of the arranged spacers.
[2] 請求項 1に記載されたフィルムロールの製造方法にぉ 、て、  [2] A method for producing a film roll according to claim 1, wherein
上記フィルム基板には、表示パネルを形成するための表示パネル形成部がマトリク ス状に複数配設され、  A plurality of display panel forming portions for forming a display panel are arranged in a matrix on the film substrate.
上記中間部のスぺーサは、上記複数の表示パネル形成部の間に配置することを特 徴とするフィルムロールの製造方法。  The method for producing a film roll, wherein the spacer in the intermediate portion is disposed between the plurality of display panel forming portions.
[3] 請求項 1に記載されたフィルムロールの製造方法にぉ 、て、 [3] A method for producing a film roll according to claim 1, wherein
上記中間部のスぺーサの幅は、上記両端部の各スぺーサの幅よりも狭いことを特 徴とするフィルムロールの製造方法。  The method of manufacturing a film roll, wherein a width of the spacer at the intermediate portion is narrower than a width of each spacer at the both end portions.
[4] 請求項 1に記載されたフィルムロールの製造方法にぉ 、て、 [4] A method for producing a film roll according to claim 1, wherein
上記スぺーサの幅は、 1mm以上且つ 50mm以下であることを特徴とするフィルム口 ールの製造方法。  The method for producing a film mouth, wherein the spacer has a width of 1 mm or more and 50 mm or less.
[5] 請求項 1に記載されたフィルムロールの製造方法にぉ 、て、 [5] A method for producing a film roll according to claim 1, wherein
上記スぺーサの厚さは、 0. 25mm以上且つ lmm以下であることを特徴とするフィ ルムロールの製造方法。  The method of manufacturing a film roll, wherein the spacer has a thickness of 0.25 mm or more and 1 mm or less.
[6] フィルム基板が卷装されたフィルムロールを製造するフィルムロールの製造装置で あって、  [6] A film roll manufacturing apparatus for manufacturing a film roll equipped with a film substrate,
上記フィルム基板を卷装するための回転可能な卷芯ロールと、  A rotatable core roll for dressing the film substrate;
各々帯状のスぺーサが卷装され、上記卷芯ロールに卷装されるフィルム基板の両 端部及び該両端部の間の中間部に対してそれぞれ設けられ、上記卷芯ロールに卷 装されるフィルム基板の間に上記各スぺーサを導入するスぺーサ導入リールとを備 えて 、ることを特徴とするフィルムロールの製造装置。  Each of the strip spacers is mounted on each end of the film substrate mounted on the core roll and an intermediate portion between the both ends, and is mounted on the core roll. A film roll manufacturing apparatus comprising a spacer introduction reel for introducing each of the spacers between film substrates.
[7] 請求項 6に記載されたフィルムロールの製造装置にぉ 、て、 上記各スぺーサ導入リールは、上記卷芯ロールの回転軸に対して平行に移動可能 であることを特徴とするフィルムロールの製造装置。 [7] The film roll manufacturing apparatus according to claim 6, wherein The apparatus for manufacturing a film roll, wherein each of the spacer introduction reels is movable in parallel with the rotation axis of the core roll.
フィルム基板が卷装されたフィルムロールであって、  A film roll equipped with a film substrate,
上記フィルム基板の両端部及び該両端部の間の中間部に帯状のスぺーサが該フ イルム基板の長手方向に沿ってそれぞれ配置されて ヽることを特徴とするフィルム口 一ノレ,  A film mouth, wherein a strip-like spacer is disposed along the longitudinal direction of the film substrate at both ends of the film substrate and at an intermediate portion between the both ends.
PCT/JP2006/325080 2005-12-20 2006-12-15 Film roll production method and device, and film roll WO2007072758A1 (en)

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