WO2007002170A3 - Microdischarge light source configuration and illumination system - Google Patents

Microdischarge light source configuration and illumination system Download PDF

Info

Publication number
WO2007002170A3
WO2007002170A3 PCT/US2006/024104 US2006024104W WO2007002170A3 WO 2007002170 A3 WO2007002170 A3 WO 2007002170A3 US 2006024104 W US2006024104 W US 2006024104W WO 2007002170 A3 WO2007002170 A3 WO 2007002170A3
Authority
WO
WIPO (PCT)
Prior art keywords
source configuration
microdischarge
light source
illumination system
generation
Prior art date
Application number
PCT/US2006/024104
Other languages
French (fr)
Other versions
WO2007002170A2 (en
Inventor
Brian E Jurczyk
Robert Stubbers
Original Assignee
Starfire Industries Llc
Brian E Jurczyk
Robert Stubbers
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Starfire Industries Llc, Brian E Jurczyk, Robert Stubbers filed Critical Starfire Industries Llc
Publication of WO2007002170A2 publication Critical patent/WO2007002170A2/en
Publication of WO2007002170A3 publication Critical patent/WO2007002170A3/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)

Abstract

A novel plasma source configuration system based on an arrangement of microdischarges is presented with particular emphasis on the generation of radiation for next-generation lithographic integrated circuit manufacturing, microscopy and medical/biological imaging. The present invention makes substantive improvements to the current state-of-the-art by specifically addressing known deficiencies, problems limiting high-volume manufacturing and cost-of-ownership considerations. In particular, the present invention enables a series of innovative illumination configurations that can improve lithographic tool design and performance.
PCT/US2006/024104 2005-06-21 2006-06-21 Microdischarge light source configuration and illumination system WO2007002170A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US69244505P 2005-06-21 2005-06-21
US60/692,445 2005-06-21

Publications (2)

Publication Number Publication Date
WO2007002170A2 WO2007002170A2 (en) 2007-01-04
WO2007002170A3 true WO2007002170A3 (en) 2009-04-23

Family

ID=37595786

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/024104 WO2007002170A2 (en) 2005-06-21 2006-06-21 Microdischarge light source configuration and illumination system

Country Status (1)

Country Link
WO (1) WO2007002170A2 (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7696493B2 (en) * 2006-12-13 2010-04-13 Asml Netherlands B.V. Radiation system and lithographic apparatus
JP5218994B2 (en) * 2007-02-20 2013-06-26 カール・ツァイス・エスエムティー・ゲーエムベーハー Optical element having a plurality of primary light sources
US8785881B2 (en) 2008-05-06 2014-07-22 Massachusetts Institute Of Technology Method and apparatus for a porous electrospray emitter
US10125052B2 (en) 2008-05-06 2018-11-13 Massachusetts Institute Of Technology Method of fabricating electrically conductive aerogels
KR101642269B1 (en) 2008-07-18 2016-07-26 코닌클리케 필립스 엔.브이. Extreme uv radiation generating device comprising a contamination captor
JP2013519211A (en) 2010-02-09 2013-05-23 エナジェティック・テクノロジー・インコーポレーテッド Laser-driven light source
US8450051B2 (en) * 2010-12-20 2013-05-28 Varian Semiconductor Equipment Associates, Inc. Use of patterned UV source for photolithography
US10308377B2 (en) 2011-05-03 2019-06-04 Massachusetts Institute Of Technology Propellant tank and loading for electrospray thruster
US9358556B2 (en) 2013-05-28 2016-06-07 Massachusetts Institute Of Technology Electrically-driven fluid flow and related systems and methods, including electrospinning and electrospraying systems and methods
WO2017114653A1 (en) 2015-12-30 2017-07-06 Asml Netherlands B.V. Method and apparatus for direct write maskless lithography
KR102135316B1 (en) 2015-12-30 2020-09-17 에이에스엠엘 네델란즈 비.브이. Method and apparatus for direct write maskless lithography
US10712669B2 (en) 2015-12-30 2020-07-14 Asml Netherlands B.V. Method and apparatus for direct write maskless lithography
US10141855B2 (en) 2017-04-12 2018-11-27 Accion Systems, Inc. System and method for power conversion
US11545351B2 (en) 2019-05-21 2023-01-03 Accion Systems, Inc. Apparatus for electrospray emission
US11587781B2 (en) 2021-05-24 2023-02-21 Hamamatsu Photonics K.K. Laser-driven light source with electrodeless ignition

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6016027A (en) * 1997-05-19 2000-01-18 The Board Of Trustees Of The University Of Illinois Microdischarge lamp
US6038279A (en) * 1995-10-16 2000-03-14 Canon Kabushiki Kaisha X-ray generating device, and exposure apparatus and semiconductor device production method using the X-ray generating device
US6414438B1 (en) * 2000-07-04 2002-07-02 Lambda Physik Ag Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it
US6665051B2 (en) * 1998-02-27 2003-12-16 Nikon Corporation Illumination system and exposure apparatus and method
US6667484B2 (en) * 2000-07-03 2003-12-23 Asml Netherlands B.V. Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby
US20040108473A1 (en) * 2000-06-09 2004-06-10 Melnychuk Stephan T. Extreme ultraviolet light source
US6804327B2 (en) * 2001-04-03 2004-10-12 Lambda Physik Ag Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
US20040256575A1 (en) * 1998-05-05 2004-12-23 Carl Zeiss Smt Ag Illumination system with a plurality of light sources
US20050140945A1 (en) * 2003-12-31 2005-06-30 Asml Netherlands B.V. Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6038279A (en) * 1995-10-16 2000-03-14 Canon Kabushiki Kaisha X-ray generating device, and exposure apparatus and semiconductor device production method using the X-ray generating device
US6016027A (en) * 1997-05-19 2000-01-18 The Board Of Trustees Of The University Of Illinois Microdischarge lamp
US6194833B1 (en) * 1997-05-19 2001-02-27 The Board Of Trustees Of The University Of Illinois Microdischarge lamp and array
US6665051B2 (en) * 1998-02-27 2003-12-16 Nikon Corporation Illumination system and exposure apparatus and method
US20040256575A1 (en) * 1998-05-05 2004-12-23 Carl Zeiss Smt Ag Illumination system with a plurality of light sources
US20040108473A1 (en) * 2000-06-09 2004-06-10 Melnychuk Stephan T. Extreme ultraviolet light source
US6667484B2 (en) * 2000-07-03 2003-12-23 Asml Netherlands B.V. Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby
US6414438B1 (en) * 2000-07-04 2002-07-02 Lambda Physik Ag Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it
US6804327B2 (en) * 2001-04-03 2004-10-12 Lambda Physik Ag Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
US20050140945A1 (en) * 2003-12-31 2005-06-30 Asml Netherlands B.V. Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris

Also Published As

Publication number Publication date
WO2007002170A2 (en) 2007-01-04

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