WO2006116776A3 - Chemical vapor deposition system and method - Google Patents

Chemical vapor deposition system and method Download PDF

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Publication number
WO2006116776A3
WO2006116776A3 PCT/US2006/016992 US2006016992W WO2006116776A3 WO 2006116776 A3 WO2006116776 A3 WO 2006116776A3 US 2006016992 W US2006016992 W US 2006016992W WO 2006116776 A3 WO2006116776 A3 WO 2006116776A3
Authority
WO
WIPO (PCT)
Prior art keywords
vapor deposition
chemical vapor
deposition system
substrate
depositing
Prior art date
Application number
PCT/US2006/016992
Other languages
French (fr)
Other versions
WO2006116776A2 (en
Inventor
Eunsung Park
Catherine E Talor
Kevin Casey
Original Assignee
Medtronic Inc
Eunsung Park
Catherine E Talor
Kevin Casey
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Medtronic Inc, Eunsung Park, Catherine E Talor, Kevin Casey filed Critical Medtronic Inc
Publication of WO2006116776A2 publication Critical patent/WO2006116776A2/en
Publication of WO2006116776A3 publication Critical patent/WO2006116776A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using ion beam radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

A method of forming a coating on the surface of a substrate comprising depositing on the substrate a first chemical moiety using a plasma-enhanced chemical vapor deposition, and approximately simultaneously depositing on the substrate a second chemical moiety using a low energy direct ion beam deposition.
PCT/US2006/016992 2005-04-28 2006-04-27 Chemical vapor deposition system and method WO2006116776A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US67562105P 2005-04-28 2005-04-28
US60/675,621 2005-04-28

Publications (2)

Publication Number Publication Date
WO2006116776A2 WO2006116776A2 (en) 2006-11-02
WO2006116776A3 true WO2006116776A3 (en) 2007-05-03

Family

ID=37057163

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/016992 WO2006116776A2 (en) 2005-04-28 2006-04-27 Chemical vapor deposition system and method

Country Status (1)

Country Link
WO (1) WO2006116776A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007009095A1 (en) 2007-02-24 2008-08-28 Gfe Nanomedical International Ag A method of treating biological tissues of animal or human origin, such as porcine, bovine pericardial or human coronary heart valves, and appropriately treated biological tissue
CN108261597A (en) * 2018-01-22 2018-07-10 上海长海医院 A kind of T-shaped trachea cannula with the anti-hyperblastosis of antibacterial
CN115637419A (en) * 2022-10-12 2023-01-24 厦门中材航特科技有限公司 Preparation method of tantalum-tantalum carbide composite coating and product thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0555194A (en) * 1991-08-26 1993-03-05 Nissin Electric Co Ltd Apparatus for forming thin film
JPH06291046A (en) * 1992-07-24 1994-10-18 Nissin Electric Co Ltd Method for forming silicon compound film
EP0903204A2 (en) * 1997-09-22 1999-03-24 SANYO ELECTRIC Co., Ltd. Sliding member, inner and outer blades of an electric shaver and film-forming method
US20030134122A1 (en) * 2002-01-14 2003-07-17 Paul Wickboldt High conductivity transparent conductor formed using pulsed energy process

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0555194A (en) * 1991-08-26 1993-03-05 Nissin Electric Co Ltd Apparatus for forming thin film
JPH06291046A (en) * 1992-07-24 1994-10-18 Nissin Electric Co Ltd Method for forming silicon compound film
EP0903204A2 (en) * 1997-09-22 1999-03-24 SANYO ELECTRIC Co., Ltd. Sliding member, inner and outer blades of an electric shaver and film-forming method
US20030134122A1 (en) * 2002-01-14 2003-07-17 Paul Wickboldt High conductivity transparent conductor formed using pulsed energy process

Also Published As

Publication number Publication date
WO2006116776A2 (en) 2006-11-02

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