WO2006090870A3 - Image forming device and method - Google Patents

Image forming device and method Download PDF

Info

Publication number
WO2006090870A3
WO2006090870A3 PCT/JP2006/303533 JP2006303533W WO2006090870A3 WO 2006090870 A3 WO2006090870 A3 WO 2006090870A3 JP 2006303533 W JP2006303533 W JP 2006303533W WO 2006090870 A3 WO2006090870 A3 WO 2006090870A3
Authority
WO
WIPO (PCT)
Prior art keywords
stage
work
standard
image forming
forming device
Prior art date
Application number
PCT/JP2006/303533
Other languages
French (fr)
Other versions
WO2006090870A2 (en
Inventor
Akihiro Hashiguchi
Original Assignee
Fujifilm Corp
Akihiro Hashiguchi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp, Akihiro Hashiguchi filed Critical Fujifilm Corp
Publication of WO2006090870A2 publication Critical patent/WO2006090870A2/en
Publication of WO2006090870A3 publication Critical patent/WO2006090870A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7096—Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Sustainable Development (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

An image forming device and method by which images can be formed with high positioning precision is provided. The image forming device comprises a stage on which a work is mounted, and a drawing device detecting a standard mark on the work mounted on the stage and forming an image on the basis of the position of the detected standard mark as the standard, wherein stage reciprocates relatively to the drawing device, and the drawing device obtains positional data of the standard mark while the stage is moving in the outward route, and forms an image on the work based on the obtained positional data when the stage is moving in the return route, and a standard positioning member for positioning the work by touching the side that is last to be exposed among a pair of the sides of the work extending along the outward and return directions of the stage is provided on the stage.
PCT/JP2006/303533 2005-02-25 2006-02-21 Image forming device and method WO2006090870A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005-051610 2005-02-25
JP2005051610A JP4485381B2 (en) 2005-02-25 2005-02-25 Image forming apparatus and image forming method

Publications (2)

Publication Number Publication Date
WO2006090870A2 WO2006090870A2 (en) 2006-08-31
WO2006090870A3 true WO2006090870A3 (en) 2007-10-25

Family

ID=36927841

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2006/303533 WO2006090870A2 (en) 2005-02-25 2006-02-21 Image forming device and method

Country Status (4)

Country Link
JP (1) JP4485381B2 (en)
KR (1) KR20070106620A (en)
CN (1) CN101120286A (en)
WO (1) WO2006090870A2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4485381B2 (en) * 2005-02-25 2010-06-23 富士フイルム株式会社 Image forming apparatus and image forming method
NL2003414A (en) * 2008-10-07 2010-04-08 Asml Netherlands Bv Substrate measurement method and apparatus.
CN105424563A (en) * 2014-09-18 2016-03-23 苏州汉如电子科技有限公司 Differential type dust sensor based on local pressure intensity difference
CN105938621A (en) * 2016-06-12 2016-09-14 深圳市海目星激光科技有限公司 Shooting alignment method and shooting alignment apparatus
JP7045890B2 (en) * 2018-03-20 2022-04-01 株式会社Ｓｃｒｅｅｎホールディングス Pattern drawing device and pattern drawing method
CN112925175A (en) * 2021-01-29 2021-06-08 深圳市大族数控科技股份有限公司 Exposure machine
CN117289556A (en) * 2023-09-14 2023-12-26 深圳市海目芯微电子装备科技有限公司 Display panel edge exposure apparatus

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000275863A (en) * 1999-03-24 2000-10-06 Asahi Optical Co Ltd Scanning type drawing device
US6552775B1 (en) * 1999-11-26 2003-04-22 Nikon Corporation Exposure method and apparatus
EP1450398A2 (en) * 2003-02-20 2004-08-25 Applied Materials, Inc. A method and an apparatus for positioning a substrate relative to a support stage
EP1482373A1 (en) * 2003-05-30 2004-12-01 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006232477A (en) * 2005-02-24 2006-09-07 Fuji Photo Film Co Ltd Sheet body positioning fixture and drawing device using it

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3253226B2 (en) * 1995-01-30 2002-02-04 東芝機械株式会社 Fixing device for workpiece
JPH09134859A (en) * 1995-11-08 1997-05-20 Sanee Giken Kk Method and device for alignment in exposure
JPH09197682A (en) * 1996-01-18 1997-07-31 Toyo Commun Equip Co Ltd Exposing jig
JPH09325309A (en) * 1996-06-03 1997-12-16 Nikon Corp Device and method for prealignment
JPH11124230A (en) * 1997-10-23 1999-05-11 Nikon Corp Method and device for conveying substrate
JP2001356488A (en) * 2000-06-14 2001-12-26 Asahi Optical Co Ltd Laser drawing system
JP4279053B2 (en) * 2002-06-07 2009-06-17 富士フイルム株式会社 Exposure head and exposure apparatus
JP2004031799A (en) * 2002-06-27 2004-01-29 Orc Mfg Co Ltd Temporarily positioning mechanism of work and method for temporarily positioning work
JP2004163798A (en) * 2002-11-15 2004-06-10 Fuji Photo Film Co Ltd Exposure apparatus
JP4485381B2 (en) * 2005-02-25 2010-06-23 富士フイルム株式会社 Image forming apparatus and image forming method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000275863A (en) * 1999-03-24 2000-10-06 Asahi Optical Co Ltd Scanning type drawing device
US6552775B1 (en) * 1999-11-26 2003-04-22 Nikon Corporation Exposure method and apparatus
EP1450398A2 (en) * 2003-02-20 2004-08-25 Applied Materials, Inc. A method and an apparatus for positioning a substrate relative to a support stage
EP1482373A1 (en) * 2003-05-30 2004-12-01 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006232477A (en) * 2005-02-24 2006-09-07 Fuji Photo Film Co Ltd Sheet body positioning fixture and drawing device using it

Also Published As

Publication number Publication date
JP4485381B2 (en) 2010-06-23
CN101120286A (en) 2008-02-06
KR20070106620A (en) 2007-11-02
WO2006090870A2 (en) 2006-08-31
JP2006235370A (en) 2006-09-07

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