WO2006062300A1 - Silicon-based light emitting diode - Google Patents
Silicon-based light emitting diode Download PDFInfo
- Publication number
- WO2006062300A1 WO2006062300A1 PCT/KR2005/003847 KR2005003847W WO2006062300A1 WO 2006062300 A1 WO2006062300 A1 WO 2006062300A1 KR 2005003847 W KR2005003847 W KR 2005003847W WO 2006062300 A1 WO2006062300 A1 WO 2006062300A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- led
- layer
- type
- reflective
- silicon
- Prior art date
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 30
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 30
- 239000010703 silicon Substances 0.000 title claims abstract description 30
- 239000000758 substrate Substances 0.000 claims abstract description 38
- 239000004065 semiconductor Substances 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 4
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 3
- 229910021419 crystalline silicon Inorganic materials 0.000 claims description 3
- 239000011810 insulating material Substances 0.000 claims description 3
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- 238000000295 emission spectrum Methods 0.000 description 5
- 239000000969 carrier Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 3
- 238000005401 electroluminescence Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/34—Materials of the light emitting region containing only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
- H01L33/46—Reflective coating, e.g. dielectric Bragg reflector
Definitions
- the present invention relates to a method of manufacturing a semiconductor device, and more particularly, to a silicon-based light emitting diode (LED) including a distributed Bragg reflector (DBR).
- LED silicon-based light emitting diode
- DBR distributed Bragg reflector
- a DBR with a high reflectance is used in various photoelectronic devices designed for light-emission, photo detection, light modulation, and other functions.
- a DBR is a multi-layer mirror composed of alternating layers of two materials having different refractive indices, and reflects light using the difference between the refractive indices of the layers. Disclosure of Invention
- the present invention provides a silicon-based LED designed to achieve high emission efficiency and narrow emission spectrum using an n-type doping layer and a distributed Bragg reflector (DBR) without the need to inject a doping material directly into the DBR.
- DBR distributed Bragg reflector
- LED including a substrate having a p-type mesa substrate structure.
- An active layer is formed on the substrate and has a first surface and a second surface opposite the first surface.
- a first reflective layer faces the first surface of the active layer while a second reflective layer faces the second surface of the active layer.
- the second reflective layer is located on either side of the p-type substrate structure.
- An n-type doping layer is sandwiched between the active layer and the first reflective layer.
- a first electrode is electrically connected to the n-type doping layer while a second electrode is electrically connected to the p-type substrate structure.
- the p-type substrate structure penetrates the second reflective layer and contacts the second surface of the active layer.
- the first electrode may surround the first reflective layer, and the p-type substrate structure may be located below the portion of the first reflective layer surrounded by the first electrode.
- the first electrode may have a top of ring shape or polygonal shape. A light-emitting region is confined within the portion of the first reflective layer surrounded by the first electrode.
- the first and second reflective layers may each include a Distributed Bragg
- DBR Downlink Reflector
- the silicon-based LED uses only the n-type doping layer to form a reflective layer on both surfaces of the active layer, thereby offering high emission efficiency, narrow emission spectrum, and improved electroluminescence characteristics.
- FIG. 1 is a cross-sectional view of a main portion of a silicon-based light emitting diode (LED) according to a preferred embodiment of the present invention
- FIG. 2 is a plan view of a portion of FIG. 1;
- FIG. 3 is a plan view of a main portion of a silicon-based LED according to another preferred embodiment of the present invention.
- a silicon-based light emitting diode includes a substrate 100, for example, p-type silicon substrate, and an active layer 104 that is formed on the substrate 100 and has a first surface 104a and a second surface 104b opposite the first surface 104a.
- the substrate 100 has a p-type mesa structure 108.
- the active layer 104 is formed of crystalline or amorphous silicon nano-size dots, and may have a thickness of 10 nm to 100 ⁇ m.
- a first reflective layer 110 faces the first surface 104a of the active layer 104, while a second reflective layer 120 faces the second surface 104b.
- the second reflective layer 120 is located on either side of the p-type substrate structure 108.
- the p-type substrate structure 108 penetrates the second reflective layer 120 and has a top surface contacting the second surface 104b of the active layer 104.
- a first electrode 122 is shaped to completely surround the first reflective layer 110. While FIG. 2 shows that the first electrode 122 has a top of circular shape, it may have a ring shape of circular or elliptical, or have a polygonal shape. FIG. 3 shows a rectangular first electrode 122'. Like reference numerals in FIGS. 2 and 3 denote like elements, and thus their description will be omitted to avoid redundancy. Unless otherwise described, the description of the elements shown in FIG. 2 will apply to elements shown in FIG. 3.
- the p-type substrate structure 108 is located below a portion of the first reflective layer 110 surrounded by the first electrode 122.
- the p-type substrate structure 108 may have a width W of 0.01 to 10 mm.
- the portion of the first reflective layer 110 surrounded by the first electrode 122 corresponds to a light-emitting region 200.
- a portion of the light-emitting region 200 in proximity to the first electrode 122 may be a highly efficient light-emitting region 210.
- the highly efficient light-emitting region 210 may have a width of 10 nm to 1 ⁇ m.
- An n-type doping layer 106 sandwiched between the active layer 104 and the first reflective layer 110 is made of an n-type compound semiconductor such as ZnO, InSnO, NiO, SiC, or SnO .
- a reference numeral 130 in FIG. 1 denotes an insulating layer.
- the first electrode 122 is electrically connected to the n-type doping layer 106, while a second electrode 124 is electrically connected to the p-type substrate structure 108.
- the first and second electrodes 122 and 124 may be made of metal and have a thickness of 100 ⁇ m to 5 mm.
- the first and second reflective layers 110 and 120 each consist of a distributed Bragg reflector (DBR) composed of a sequence of alternating silicon-containing insulating layers having different compositions.
- the refractive index difference between the alternating insulating layers may be 0.1 to 0.5.
- the DBR is formed from a repeated stack of alternating layers of SiO and SiN.
- the DBR may include 2 to 20 pairs of alternating layers of SiO and SiN.
- the first electrode 122 surrounding the first reflective layer 110 acts to transport electrons into the n-type doping layer 106. Furthermore, holes injected through the second electrode 124 are moved into the p-type substrate structure 108 through the p- type substrate 100.
- electrons injected through the first electrode 122 pass through the first reflective layer 110 to reach the n-type doping layer 106, and are stably injected into the first surface 104a of the active layer 104 through the n-type doping layer 106.
- Holes injected through the second electrode 124 reach the p-type substrate 100 and the p-type substrate structure 108, and are then injected into the second surface 104b of the active layer 104.
- the active layer 104 then emits light using silicon nano-size dots.
- the light confined between the first and second reflective layers 110 and 120 oscillates so as to selectively amplify and emit a narrow spectrum.
- the light-emitting region 200 of the silicon-based LED according to the present invention may be limited to the portion of the first reflective layer 110 enclosed by the first electrode 122 or 122'.
- the light-emitting region 200 is the entire region of the first reflective layer 110 surrounded by the first electrode 122 or 122' and the highly efficient light-emitting region 210 is located around the outer edge portion of the light-emitting region 200 in proximity to the first electrode 122 or 122'.
- a silicon-based LED with silicon nano-size dots used as an active layer according to the present invention uses an n-type doping layer and a reflective layer including a DBR that are easy to manufacture, to achieve improved performance.
- the silicon- based LED offers high emission efficiency, narrow emission spectrum, stable operation characteristics, and improved electroluminescence properties.
- the silicon-based LED can be widely used in various optical devices for light- emission, photodetection, light modulation, and other functions.
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007545359A JP4612053B2 (en) | 2004-12-08 | 2005-11-14 | Silicon-based light emitting diode |
US11/720,987 US7671377B2 (en) | 2004-12-08 | 2005-11-14 | Silicon based light emitting diode |
EP05820850A EP1820222A1 (en) | 2004-12-08 | 2005-11-14 | Silicon-based light emitting diode |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20040102956 | 2004-12-08 | ||
KR10-2004-0102956 | 2004-12-08 | ||
KR1020050037623A KR100590775B1 (en) | 2004-12-08 | 2005-05-04 | Silicon-based light emitting diode |
KR10-2005-0037623 | 2005-05-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2006062300A1 true WO2006062300A1 (en) | 2006-06-15 |
Family
ID=36578094
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2005/003847 WO2006062300A1 (en) | 2004-12-08 | 2005-11-14 | Silicon-based light emitting diode |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP1820222A1 (en) |
WO (1) | WO2006062300A1 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008135013A2 (en) * | 2007-05-04 | 2008-11-13 | Osram Opto Semiconductors Gmbh | Semiconductor chip and method for producing a semiconductor chip |
CN101981715A (en) * | 2008-07-21 | 2011-02-23 | Lg伊诺特有限公司 | Light emitting diode and method of manufacturing the same, and light emitting device and method of manufacturing the light emitting device |
EP2372791A3 (en) * | 2010-03-10 | 2012-07-18 | LG Innotek Co., Ltd. | Light emitting diode |
EP2498304A2 (en) * | 2009-11-06 | 2012-09-12 | Semileds Optoelectronics Co., Ltd. | Vertical light emitting diode having an outward frame-type electrode and equipment thereof |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5533031A (en) * | 1978-08-30 | 1980-03-08 | Hitachi Ltd | Light-detecting semiconductor device |
US5491350A (en) * | 1993-06-30 | 1996-02-13 | Hitachi Cable Ltd. | Light emitting diode and process for fabricating the same |
JPH11261157A (en) * | 1998-03-16 | 1999-09-24 | Furukawa Electric Co Ltd:The | Surface emitting type semiconductor laser device and manufacture thereof |
JP2000031589A (en) * | 1998-07-08 | 2000-01-28 | Oki Electric Ind Co Ltd | Semiconductor light emitting device |
-
2005
- 2005-11-14 WO PCT/KR2005/003847 patent/WO2006062300A1/en active Application Filing
- 2005-11-14 EP EP05820850A patent/EP1820222A1/en not_active Withdrawn
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5533031A (en) * | 1978-08-30 | 1980-03-08 | Hitachi Ltd | Light-detecting semiconductor device |
US5491350A (en) * | 1993-06-30 | 1996-02-13 | Hitachi Cable Ltd. | Light emitting diode and process for fabricating the same |
JPH11261157A (en) * | 1998-03-16 | 1999-09-24 | Furukawa Electric Co Ltd:The | Surface emitting type semiconductor laser device and manufacture thereof |
JP2000031589A (en) * | 1998-07-08 | 2000-01-28 | Oki Electric Ind Co Ltd | Semiconductor light emitting device |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008135013A2 (en) * | 2007-05-04 | 2008-11-13 | Osram Opto Semiconductors Gmbh | Semiconductor chip and method for producing a semiconductor chip |
WO2008135013A3 (en) * | 2007-05-04 | 2009-02-19 | Osram Opto Semiconductors Gmbh | Semiconductor chip and method for producing a semiconductor chip |
US8526476B2 (en) | 2007-05-04 | 2013-09-03 | Osram Opto Semiconductors Gmbh | Semiconductor chip and method for manufacturing a semiconductor chip |
CN101981715A (en) * | 2008-07-21 | 2011-02-23 | Lg伊诺特有限公司 | Light emitting diode and method of manufacturing the same, and light emitting device and method of manufacturing the light emitting device |
US8823028B2 (en) | 2008-07-21 | 2014-09-02 | Lg Innotek Co., Ltd. | Light emitting diode and method of manufacturing the same, and light emitting device and method of manufacturing the light emitting device |
US9680064B2 (en) | 2008-07-21 | 2017-06-13 | Lg Innotek Co., Ltd. | Light emitting diode and method of manufacturing the same, and light emitting device and method of manufacturing the light emitting device |
EP2498304A2 (en) * | 2009-11-06 | 2012-09-12 | Semileds Optoelectronics Co., Ltd. | Vertical light emitting diode having an outward frame-type electrode and equipment thereof |
EP2498304A4 (en) * | 2009-11-06 | 2014-03-05 | Semileds Optoelectronics Co | Vertical light emitting diode having an outward frame-type electrode and equipment thereof |
EP2372791A3 (en) * | 2010-03-10 | 2012-07-18 | LG Innotek Co., Ltd. | Light emitting diode |
US8653547B2 (en) | 2010-03-10 | 2014-02-18 | Lg Innotek Co., Ltd | Light emitting device and light emitting device package |
US9455377B2 (en) | 2010-03-10 | 2016-09-27 | Lg Innotek Co., Ltd. | Light emitting device |
US9899567B2 (en) | 2010-03-10 | 2018-02-20 | Lg Innotek Co., Ltd. | Light emitting device |
Also Published As
Publication number | Publication date |
---|---|
EP1820222A1 (en) | 2007-08-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7671377B2 (en) | Silicon based light emitting diode | |
JP6722221B2 (en) | Light emitting diode | |
US8076686B2 (en) | Light emitting diode and manufacturing method thereof | |
US7714343B2 (en) | Light emitting device | |
US9825203B2 (en) | Light emitting diode chip and fabrication method | |
KR20090043057A (en) | Light emitting diode | |
JPWO2008155960A1 (en) | Semiconductor light emitting device | |
JP2014041886A (en) | Semiconductor light-emitting element | |
TW202015254A (en) | Led utilizing internal color conversion with light extraction enhancements | |
KR100576718B1 (en) | Silicon-based light emitting diode | |
KR101115570B1 (en) | Light emitting device and method of fabricating the same | |
US20180198029A1 (en) | Semiconductor light emitting device including reflective element and method of making same | |
EP1820222A1 (en) | Silicon-based light emitting diode | |
KR101165253B1 (en) | Light emitting diode | |
CN112670386B (en) | Light emitting diode and manufacturing method thereof | |
KR100832070B1 (en) | GaN type light emitting diode device | |
KR100699056B1 (en) | Light emitting diode having a plurality of light emitting cells and mehod for fabricating the same | |
KR20120029284A (en) | Light emitting device | |
CN101834252B (en) | Light emitting device, fabrication method thereof, and light emitting apparatus | |
JP2005347493A (en) | Semiconductor light emitting element | |
KR100654079B1 (en) | Light emitting diode having p-type electrode-pad with improved electrical characteristic and adhesion | |
US20140097457A1 (en) | Semiconductor device | |
KR101165255B1 (en) | High efficiency light emitting diode and method of fabricating the same | |
JP2014041999A (en) | Semiconductor light-emitting element | |
KR101654341B1 (en) | Light emitting device and fabrication method thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KM KN KP KZ LC LK LR LS LT LU LV LY MA MD MG MK MN MW MX MZ NA NG NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SM SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LT LU LV MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2005820850 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 11720987 Country of ref document: US Ref document number: 2007545359 Country of ref document: JP |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
WWP | Wipo information: published in national office |
Ref document number: 2005820850 Country of ref document: EP |