WO2006022096A1 - 液体用レギュレータ - Google Patents
液体用レギュレータ Download PDFInfo
- Publication number
- WO2006022096A1 WO2006022096A1 PCT/JP2005/013131 JP2005013131W WO2006022096A1 WO 2006022096 A1 WO2006022096 A1 WO 2006022096A1 JP 2005013131 W JP2005013131 W JP 2005013131W WO 2006022096 A1 WO2006022096 A1 WO 2006022096A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- diaphragm
- pressure
- diaphragm chamber
- liquid
- secondary side
- Prior art date
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 47
- 239000012530 fluid Substances 0.000 claims abstract description 25
- 238000005192 partition Methods 0.000 claims abstract description 14
- 238000007789 sealing Methods 0.000 claims description 7
- 230000003014 reinforcing effect Effects 0.000 claims description 5
- 230000004044 response Effects 0.000 claims description 3
- 230000000903 blocking effect Effects 0.000 claims 2
- 230000002452 interceptive effect Effects 0.000 claims 1
- 230000004043 responsiveness Effects 0.000 abstract description 7
- 239000000126 substance Substances 0.000 description 9
- 238000004140 cleaning Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000004891 communication Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 235000012489 doughnuts Nutrition 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K31/00—Actuating devices; Operating means; Releasing devices
- F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
- F16K31/126—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a diaphragm, bellows, or the like
- F16K31/1268—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a diaphragm, bellows, or the like with a plurality of the diaphragms
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/01—Control of flow without auxiliary power
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/01—Control of flow without auxiliary power
- G05D7/0106—Control of flow without auxiliary power the sensing element being a flexible member, e.g. bellows, diaphragm, capsule
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/7722—Line condition change responsive valves
- Y10T137/7781—With separate connected fluid reactor surface
- Y10T137/7784—Responsive to change in rate of fluid flow
- Y10T137/7787—Expansible chamber subject to differential pressures
- Y10T137/7788—Pressures across fixed choke
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/7722—Line condition change responsive valves
- Y10T137/7781—With separate connected fluid reactor surface
- Y10T137/7793—With opening bias [e.g., pressure regulator]
- Y10T137/7801—Balanced valve
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/7722—Line condition change responsive valves
- Y10T137/7781—With separate connected fluid reactor surface
- Y10T137/7793—With opening bias [e.g., pressure regulator]
- Y10T137/7822—Reactor surface closes chamber
- Y10T137/7823—Valve head in inlet chamber
- Y10T137/7825—Rectilinear valve stem rigid with reactor surface
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/7722—Line condition change responsive valves
- Y10T137/7781—With separate connected fluid reactor surface
- Y10T137/7793—With opening bias [e.g., pressure regulator]
- Y10T137/7822—Reactor surface closes chamber
- Y10T137/7823—Valve head in inlet chamber
- Y10T137/7826—With valve closing bias
Definitions
- the present invention relates to a liquid regulator capable of performing constant liquid flow rate control and pressure reduction control corresponding to not only primary side pressure fluctuations but also secondary side pressure fluctuations.
- liquid regulators flow control valves
- the general configuration of such a liquid regulator is such that the diaphragm is subjected to pressure fluctuations on the primary side (upstream side), and a valve body that operates integrally with the diaphragm adjusts the opening of the liquid flow path to adjust the flow rate. It comes to perform control.
- the pressure fluctuation on the secondary side refers to the influence of back pressure caused by, for example, the merging of multiple flow paths and the pressure fluctuation on the main flow side, and the load fluctuation caused by changes in fluid viscosity accompanying temperature changes. That is.
- Patent Document 1 Japanese Patent Application Laid-Open No. 11 85287
- Patent Document 1 reduces the pressure fluctuation on the secondary side by utilizing the operating force of the valve opening generated by the difference in the area of the diaphragm subjected to the same pressure fluctuation. Since it is configured so as to correspond, it is necessary to ensure a sufficient area difference in order to perform flow control that reliably reflects the pressure fluctuation on the secondary side. That is, the upper and lower diaphragms When the rams are subjected to the same pressure fluctuations, they generate forces in the opposite directions that counteract each other (forces in the opposite direction in the opening and closing direction of the valve body), so the area difference and pressure fluctuations are small! There is a concern that the operating force required to change the opening cannot be sufficiently obtained, resulting in problems in the responsiveness of the flow rate control.
- a liquid regulator used for controlling the flow rate of chemical injection in a wafer cleaning line of a semiconductor manufacturing apparatus may be used for a flow path having a small pipe diameter (name: about 1Z4 inch to 4Z3 inch). Therefore, it is extremely difficult to secure a sufficient area difference because the regulator itself is also small.
- the present invention has been made in view of the above circumstances.
- the purpose of the present invention is to provide a secondary-side pressure that can be achieved only by a pressure fluctuation on the primary side, even if a comparatively small liquid regulator is used.
- An object of the present invention is to provide a liquid regulator that exhibits excellent flow rate control responsiveness to fluctuations and enables highly accurate flow rate control.
- the present invention employs the following means in order to solve the above problems.
- the liquid regulator according to the present invention is a liquid regulator that adjusts the valve opening to control the flow rate of the passing liquid to be constant.
- a first diaphragm chamber for generating an adjusting force; a second diaphragm chamber for generating a valve opening adjusting force by receiving the pressure fluctuation of the liquid introduced from the secondary side by the diaphragm; and the first and first diaphragm chambers.
- a shaft portion that receives the adjusting force generated in each of the two diaphragm chambers and slides in the axial direction; a valve body that operates integrally with the shaft portion to adjust the valve opening; and the first diaphragm chamber; A partition wall that blocks the second diaphragm chamber so as not to interfere with each other, and a sealing means that blocks fluid flow between the first diaphragm chamber and the second diaphragm chamber; Comprising It is characterized in.
- the first diaphragm chamber that receives the operating pressure of the gas in the diaphragm and generates the adjustment force of the valve opening, and the pressure fluctuation of the liquid introduced from the secondary side
- a second diaphragm chamber that receives a diaphragm to generate an adjustment force of the valve opening, and a shaft portion that slides in the axial direction by receiving the adjustment force generated in each of the first and second diaphragm chambers.
- a valve body that operates integrally with the shaft portion to adjust the valve opening; and A partition wall that blocks the first diaphragm chamber and the second diaphragm chamber so as not to interfere with each other, and a fluid flow between the first diaphragm chamber and the second diaphragm chamber. Therefore, the pressure fluctuation on the secondary side is not blocked by the partition wall and the sealing means and does not affect the first diaphragm chamber side. For this reason, almost all of the pressure fluctuation on the secondary side introduced into the second diaphragm chamber acts on the shaft as an adjustment force of the valve opening caused by the pressure fluctuation on the secondary side. It can reduce or minimize the force in the opposite direction that cancels the force.
- the diaphragm includes a reinforcing member, whereby damage and deformation of the diaphragm can be prevented.
- the pressure fluctuation on the secondary side is prevented or minimized from acting as a reverse force that adversely affects the adjustment force of the valve opening. Even with a relatively small liquid regulator, it exhibits excellent flow control responsiveness to secondary side pressure fluctuations that can be achieved with only primary side pressure fluctuations, enabling highly accurate flow rate control. A remarkable effect is obtained.
- FIG. 1 is a cross-sectional view showing an embodiment of a liquid regulator according to the present invention, in a state in which the flow rate is being controlled.
- FIG. 2 is a cross-sectional view showing a state in which the liquid regulator shown in FIG. 1 is fully closed.
- FIG. 3 is a system diagram showing an example of a wafer cleaning line of a semiconductor manufacturing apparatus as an application example of the liquid regulator of the present invention.
- FIG. 4 is a diagram showing experimental results for verifying the performance of a liquid regulator according to the present invention.
- FIG. 5 is a cross-sectional view showing a modified example of the liquid regulator according to the present invention in a fully closed state.
- FIG. 1 and FIG. 2 are cross-sectional views showing a configuration example of a liquid regulator that adjusts the valve opening to control the flow rate of liquid passing therethrough.
- Fig. 1 shows the state during flow control
- Fig. 2 shows the fully closed state.
- a liquid regulator (hereinafter referred to as “regulator”) 10 is provided with a valve body 13 that adjusts the cross-sectional area of the liquid flow path by opening and closing integrally with the shaft portion 12 in the housing 11. Yes.
- the shaft part 12 is divided into two parts in the upper and lower parts, and the upper part of the upper diaphragm 12A is fixedly supported by the central part of the first diaphragm 14, and the lower part of the lower shaft 12B is fixed by the central part of the second diaphragm 15. It is supported.
- the inside of the first diaphragm chamber 16 is divided into upper and lower spaces by fixing and supporting the periphery of the first diaphragm 14 to the housing 11 over the entire circumference.
- an operation pressure connection port 19 for supplying an operation gas such as air is provided in the upper surface side space 16A of the first diaphragm 14.
- An operating gas supply pipe (not shown) is connected to the operating pressure connection port 19, and an inert gas such as nitrogen is used. In the following description, air is used as the operating gas supplied by the operating gas supply pipe.
- the central portion 14a of the first diaphragm 14 is thick and fixedly supported on a disk-shaped diaphragm bed 20 formed integrally with the upper shaft 12A.
- the diaphragm bed 20 is a rigid member that functions as a reinforcing member for the first diaphragm 14.
- a thin-walled portion 14b that receives the reinforcement of the diaphragm bed 20 is provided in a donut shape on the outer peripheral portion of the first diaphragm 14 to enable smooth vertical movement.
- the diaphragm bed 20 is preferably made as large as possible within a range that does not hinder the vertical movement of the first diaphragm 14 so that the operating pressure can be received as effectively as possible and the thin portion 14b can be reinforced.
- the diaphragm bed 20 needs to have a diameter that is at least larger than the central portion 14a that is the thick portion of the first diaphragm 14.
- the lower surface side space 16B of the first diaphragm 14 is a communication port 2 penetrating the housing 11. 1 is open to the atmosphere. Therefore, in the first diaphragm chamber 16, the upper surface of the first diaphragm 14 receives the downward operation pressure P supplied from the operation pressure communication port 19, and the lower surface side of the first diaphragm 14 is opened to the atmosphere. Therefore, the operating force (valve opening adjustment force) obtained by the product of the operating pressure P and the pressure receiving area acts on the upper shaft 12A.
- the above-described upper shaft 12A passes through the partition wall 11a provided between the first diaphragm chamber 16 and the second diaphragm chamber 17, and is placed on the upper end surface of the second diaphragm 15.
- the upper shaft 12A that penetrates the partition wall 11a is inserted with a bellows 22 that functions as a sealing means and is suitable for vertical movement, and generates very little dust even when it moves up and down.
- the partition wall 11a exists in order to effectively operate the operating pressure applied from the operation pressure communication port 19 without affecting the first diaphragm chamber 20 to the pressure fluctuation received from the secondary side described later.
- the partition wall 11a It is better to make the through-hole l ib that can be made inside the inside small.
- the through hole l ib is too small considering the strength of the shaft 12a.
- the insertion of the bellows 22 affects the flow of fluid (liquid introduced from the secondary side described later and its pressure fluctuation) between the first diaphragm chamber 16 and the second diaphragm chamber 17. Can be prevented.
- the first diaphragm chamber 16 can be isolated from the fluid, it is not necessary to consider chemical resistance, and the first diaphragm chamber 16 can be made of an inexpensive general-purpose resin.
- sealing members such as a force O-ring using the bellows 22 as a sealing means can be used.
- the interior of the second diaphragm chamber 17 is divided into upper and lower spaces by fixing and supporting the periphery of the second diaphragm 15 to the housing 11 over the entire circumference.
- the upper surface side space 17A of the second diaphragm 15 is provided with a secondary pressure co-inlet 23 through which the secondary side liquid that has passed through the flow rate control chamber 18 is introduced.
- a branch pipe 24 is connected to the secondary pressure inlet 23. This branch pipe 24 also branches the downstream force of the orifice 26 provided in the secondary outlet pipe 25 of the regulator 10.
- the orifice 26 is used by appropriately selecting an orifice diameter corresponding to a desired set flow rate.
- the central portion 15a of the second diaphragm 15 is thick, and is integrated so as to overlap the upper surface of the central portion, and a disc-shaped diaphragm bed 27 is fixed.
- This diaphragm bed 2 A rigid member 7 functions as a reinforcing member for the second diaphragm 15.
- a thin-walled portion 15b for reinforcing the diaphragm bed 27 is provided in a donut shape on the outer peripheral portion of the second diaphragm 15 so as to enable smooth vertical movement.
- the diaphragm bed 27 is provided with a roundness 27a at the tip so as to provide clearance with the second diaphragm 15 so as not to disturb the vertical movement of the second diaphragm 15.
- the lower shaft 12B is connected to the central portion 15a of the second diaphragm 15.
- the lower shaft 12B is provided with a valve body 13 on the lower end side.
- the operating force (valve opening adjusting force) generated by the pressure fluctuation on the secondary side acting on the second diaphragm 15 acts on the lower shaft 12B.
- the lower surface side space 17B of the second diaphragm 15 communicates with the flow rate control chamber 18 via the opening area of the liquid flow path (gap S) formed between the valve body 13 and the valve seat 28. is doing.
- a lower valve shaft 30 is connected to the lower end side of the valve body 13 via a lower bellows 29.
- a lower spring 31 is disposed between the housing 11 and the lower end portion of the lower valve shaft 30, and as a result, the valve body 13 is configured to constantly receive upward bias from the lower spring 31.
- Reference numeral 32 in the figure denotes a primary side liquid introduction pipe communicating with the flow control chamber 18.
- FIG. 3 shows an example of a wafer cleaning line of a semiconductor manufacturing apparatus incorporating the regulator 10.
- a regulator 10 is attached to a main pipe 1 through which pure water flows, and an orifice 26 is provided on the downstream side of the regulator 10.
- the branch pipe 24 branches from the main pipe 1 and is connected to the second diaphragm chamber 17 of the regulator 10.
- the main pipe 1 includes an on-off valve 2 on the downstream side of the branch portion of the branch pipe 24, and three chemical liquids for supplying different chemical liquids A to C to the downstream side of the on-off valve 2 respectively.
- Pipes 3, 4, and 5 are joined.
- Each chemical solution pipe is provided with an on-off valve 3a, 4a, 5a.
- reference numeral 6 is a pressure gauge for measuring the primary side pressure of the regulator
- 7 is a pressure gauge for measuring the secondary side pressure of the regulator.
- the first diaphragm 14 is pushed down by a certain air pressure (operating pressure P) in order to flow a fluid and obtain a desired pressure or flow rate.
- the operating force generated by this air pressure is transmitted to the shaft 12, and the second diaphragm 15 is further pushed down to open the valve body 13 through the shaft 12, so that a desired set flow rate or set pressure is set to the secondary side of the regulator 10.
- the operation pressure by air pressure acts on the upper surface of the second diaphragm 15 as a force for pushing down the second diaphragm 15 via the first diaphragm 14 and the shaft 12, and the lower surface of the second diaphragm 15
- the sum of the biasing force of the lower spring 31 that lifts the valve element 13 upward (fully closed direction) and the fluid pressure on the primary side acts as a force that pushes up the second diaphragm 15, and in this state the balance is maintained. While supplying fluid to the secondary side.
- valve body 13 since the lower spring 31 exists in the lower part of the valve body 13, when the operation pressure P does not act, the valve body 13 will be in a fully closed position.
- the second diaphragm 15 is supplied in the direction of pushing down the second diaphragm 15 through the first diaphragm 14 and the shaft 12 supplied from the operating pressure connection port 19.
- the force acting on the upper surface is the sum of the force of the lower spring 31 that lifts the valve body 13 upward and the fluid pressure on the primary side, and pushes up the second diaphragm 15 from the lower surface of the second diaphragm 15 It becomes larger than the acting force.
- the second diaphragm 15 is deformed in the direction of pushing down the valve body 13, and the fluid flow path (gap S) formed by the valve body 13 and the valve seat 28 is automatically expanded and expanded. ! Adjusted.
- the fluctuating pressure fed back from the secondary introduction port 23 also acts on the first diaphragm 14 in the same manner, and as a result, moves in the direction of decreasing the opening of the valve.
- the partition wall 11a is provided, and the through-hole l ib of the partition wall 11a is made as small as possible, so that the influence on the first diaphragm 14 is reduced as much as possible.
- the force that increases, that is, the fluctuating pressure on the secondary side that is feed-knocked only on the upper surface of the second diaphragm 15 acts, whereby the same constant flow rate can be obtained on the secondary side.
- the shaft portion 12 penetrates the partition wall 11a provided so as not to affect the pressure fluctuation on the secondary side on the first diaphragm 14, and is divided into two vertically. It is. At that time, a gap is created between the lower end surface 22a of the bellows 22 inserted in the upper shaft 12A (see FIG. 1 (b)) and the second diaphragm 15, and this portion has the same pressure in both the upper and lower directions. Will act. For this reason, the valve opening adjustment force of the second diaphragm 15 with respect to the pressure fluctuation on the secondary side is reduced, but the cross-sectional area of the shaft portion 12 is considerably smaller than the pressure receiving area of the diaphragm. Reflecting the pressure fluctuation on the secondary side, sufficient operating force can be obtained, and there is no problem in terms of responsiveness.
- the effective area of the secondary diaphragm 15 that generates the operating force in response to the pressure fluctuation on the secondary side is increased, and the primary diaphragm chamber 16 and the secondary side on the primary side are increased. Block the flow of fluid to and from the second diaphragm chamber 17 on the side, and unify the influence of each other by unifying the shaft section 12, or minimize the influence even when divided Becomes important.
- an umbrella-shaped shape (a cross section is substantially T-shaped) in which the rigid diaphragm bed 20 and the upper shaft 12A are integrally connected is adopted, and the inside of the partition wall 11a is as small as possible. Since the through-hole l ib is provided and the bellows 22 which is advantageous for vertical movement is adopted, the downward operating force generated by the operating pressure P is hardly lost. The valve body 13 can be reliably transmitted and operated.
- FIG. 4 shows experimental results for verifying the performance of the regulator 10 having the above-described configuration.
- the relationship with Q) was measured.
- the initial settings were set to 300 kPa for the primary pressure (P1) and 8 mm for the diameter of Hodifice 26.
- the flow rate (Q) is almost constant even if the back pressure (P2) increases even if the three operating pressures P are different. You can see that they are kept. That is, by using the regulator 10 having the above-described configuration, the valve opening degree is appropriately adjusted according to the pressure fluctuation on the secondary side, and excellent responsiveness is maintained so as to maintain a desired flow rate (Q). It can be seen that the constant flow control is performed. In addition, since such constant flow control has a correlation between the flow rate and pressure, it is possible to perform pressure reduction control by appropriately adjusting the valve opening according to the pressure fluctuation on the secondary side. I mean and speak.
- This modification shows a configuration example in the case where the orifice 26 and the branch pipe 24 provided in the secondary side outlet pipe 25 outside the housing 11 are built in the housing 11.
- the illustrated regulator 10 ′ shows a configuration example of the regulator 10 ′ in the case where an orifice 26 ′ and a branch pipe 24 ′ are built in the housing 11 / on the downstream side of the flow control chamber 18.
- Such an integrated configuration facilitates assembly and handling on the line.
- the pressure fluctuation on the secondary side acts as a reverse force that adversely affects the adjustment force of the valve opening. Therefore, even for relatively small liquid regulators, excellent flow rate control response to pressure fluctuations on the secondary side, as well as pressure fluctuations on the primary side, can be achieved. Demonstrates high-precision flow control.
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- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Mechanical Engineering (AREA)
- Control Of Fluid Pressure (AREA)
- Flow Control (AREA)
- Fluid-Driven Valves (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/660,049 US8297306B2 (en) | 2004-08-26 | 2005-07-15 | Fluid regulator |
EP20050766295 EP1793298B1 (en) | 2004-08-26 | 2005-07-15 | Liquid regulator |
KR1020067027665A KR101112511B1 (ko) | 2004-08-26 | 2005-07-15 | 액체용 레귤레이터 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004247162A JP4330505B2 (ja) | 2004-08-26 | 2004-08-26 | 液体用レギュレータ |
JP2004-247162 | 2004-08-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2006022096A1 true WO2006022096A1 (ja) | 2006-03-02 |
Family
ID=35967316
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2005/013131 WO2006022096A1 (ja) | 2004-08-26 | 2005-07-15 | 液体用レギュレータ |
Country Status (5)
Country | Link |
---|---|
US (1) | US8297306B2 (ja) |
EP (1) | EP1793298B1 (ja) |
JP (1) | JP4330505B2 (ja) |
KR (1) | KR101112511B1 (ja) |
WO (1) | WO2006022096A1 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4765746B2 (ja) * | 2006-04-17 | 2011-09-07 | 日立金属株式会社 | 遮断弁装置及びこれを組み込んだ質量流量制御装置 |
JP4668119B2 (ja) * | 2006-05-08 | 2011-04-13 | シーケーディ株式会社 | 流量制御装置 |
IT1398346B1 (it) * | 2010-02-23 | 2013-02-22 | Omvl S P A | Dispositivo riduttore di pressione di tipo compensato, particolarmente per impianti a gas combustibile di alimentazione di motori a combustione interna per auto-trazione. |
JP5744476B2 (ja) * | 2010-11-04 | 2015-07-08 | 東京瓦斯株式会社 | 減圧装置 |
RU2468408C1 (ru) * | 2011-04-18 | 2012-11-27 | Сергей Николаевич Новосельцев | Дроссель регулируемый прямопроходной и дросселирующий узел |
JP5889649B2 (ja) * | 2012-01-26 | 2016-03-22 | サーパス工業株式会社 | 流量調整装置 |
CN105247269B (zh) * | 2013-03-15 | 2017-09-12 | 斯科特科技公司 | 用于填充气瓶的*** |
US20160003367A1 (en) * | 2014-07-01 | 2016-01-07 | HCT Group Holdings Limited | Springless regulator |
KR101994425B1 (ko) | 2017-09-29 | 2019-07-01 | 세메스 주식회사 | 기판 처리 장치 및 방법 |
JP7357639B2 (ja) * | 2018-11-30 | 2023-10-06 | 旭有機材株式会社 | ダイヤフラム弁 |
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Publication number | Priority date | Publication date | Assignee | Title |
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JPH1185287A (ja) * | 1997-09-10 | 1999-03-30 | Advance Denki Kogyo Kk | 流量コントロールバルブ |
JP2004070746A (ja) * | 2002-08-07 | 2004-03-04 | Surpass Kogyo Kk | 流量調整装置 |
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US2627703A (en) * | 1948-05-13 | 1953-02-10 | Theodore N Spencer | Flow responsive pressure regulator |
US3654948A (en) * | 1970-11-02 | 1972-04-11 | Honeywell Inc | Balanced pressure regulator |
US5595209A (en) * | 1995-03-29 | 1997-01-21 | Airtrol Components Inc. | Fluid pressure regulator establishing a stable output fluid pressure |
GB2308892B (en) * | 1996-01-04 | 1999-10-13 | Siemens Measurements Ltd | Improvements in or relating to meters |
US6026849A (en) * | 1998-06-01 | 2000-02-22 | Thordarson; Petur | High pressure regulated flow controller |
JP2001187145A (ja) * | 1999-12-28 | 2001-07-10 | Kofurotsuku Kk | 定流量バルブを装備した医療用酸素濃縮器 |
JP3913048B2 (ja) * | 2001-11-29 | 2007-05-09 | 株式会社エー・シー・イー | 背圧制御弁 |
JP4201536B2 (ja) * | 2002-07-03 | 2008-12-24 | サーパス工業株式会社 | 流量調整装置 |
KR200408144Y1 (ko) * | 2005-11-21 | 2006-02-07 | 주식회사 다다 | 샤워기용 드레인 밸브 |
-
2004
- 2004-08-26 JP JP2004247162A patent/JP4330505B2/ja not_active Expired - Fee Related
-
2005
- 2005-07-15 US US11/660,049 patent/US8297306B2/en active Active
- 2005-07-15 WO PCT/JP2005/013131 patent/WO2006022096A1/ja active Application Filing
- 2005-07-15 KR KR1020067027665A patent/KR101112511B1/ko active IP Right Grant
- 2005-07-15 EP EP20050766295 patent/EP1793298B1/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1185287A (ja) * | 1997-09-10 | 1999-03-30 | Advance Denki Kogyo Kk | 流量コントロールバルブ |
JP2004070746A (ja) * | 2002-08-07 | 2004-03-04 | Surpass Kogyo Kk | 流量調整装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20070045154A (ko) | 2007-05-02 |
EP1793298A1 (en) | 2007-06-06 |
EP1793298B1 (en) | 2013-05-15 |
US8297306B2 (en) | 2012-10-30 |
JP4330505B2 (ja) | 2009-09-16 |
JP2006065575A (ja) | 2006-03-09 |
EP1793298A4 (en) | 2011-12-14 |
KR101112511B1 (ko) | 2012-02-27 |
US20070251583A1 (en) | 2007-11-01 |
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