WO2005124274A3 - Kalibrierverfahren, messverfahren, optische messvorrichtung und betriebsverfahren für eine senderanordnung - Google Patents
Kalibrierverfahren, messverfahren, optische messvorrichtung und betriebsverfahren für eine senderanordnung Download PDFInfo
- Publication number
- WO2005124274A3 WO2005124274A3 PCT/EP2005/006577 EP2005006577W WO2005124274A3 WO 2005124274 A3 WO2005124274 A3 WO 2005124274A3 EP 2005006577 W EP2005006577 W EP 2005006577W WO 2005124274 A3 WO2005124274 A3 WO 2005124274A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- elements
- measuring
- calibrating
- measuring device
- examined
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
- G01B21/02—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
- G01B21/04—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness by measuring coordinates of points
- G01B21/042—Calibration or calibration artifacts
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Testing Or Calibration Of Command Recording Devices (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Arrangements For Transmission Of Measured Signals (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US58011204P | 2004-06-17 | 2004-06-17 | |
US60/580,112 | 2004-06-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2005124274A2 WO2005124274A2 (de) | 2005-12-29 |
WO2005124274A3 true WO2005124274A3 (de) | 2006-03-30 |
Family
ID=34970372
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2005/006577 WO2005124274A2 (de) | 2004-06-17 | 2005-06-17 | Kalibrierverfahren, messverfahren, optische messvorrichtung und betriebsverfahren für eine senderanordnung |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO2005124274A2 (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006021965A1 (de) * | 2006-05-04 | 2007-11-15 | Carl Zeiss Smt Ag | Kalibrierverfahren, Verwendung und Messvorrichtung |
US7403290B1 (en) | 2006-06-30 | 2008-07-22 | Carl Zeiss Smt Ag | Method and means for determining the shape of a rough surface of an object |
US8416412B2 (en) | 2006-11-09 | 2013-04-09 | Carl Zeiss Sms Gmbh | Method for determination of residual errors |
DE102007009244A1 (de) * | 2007-02-22 | 2008-08-28 | Sick Ag | Verfahren zur Überprüfung der Funktionsweise und/oder Justierung einer optoelektronischen Sensoranordnung und optoelektronische Sensoranordnung |
DE102007039262B4 (de) * | 2007-08-20 | 2021-01-28 | Endress+Hauser Conducta Gmbh+Co. Kg | Verfahren zum Betreiben eines Messgerätes |
DE102011075371A1 (de) * | 2011-05-05 | 2012-05-16 | Carl Zeiss Smt Gmbh | Anordnung mit Projektionsobjektiv für die Mikrolithographie sowie Messvorrichtung zur Vermessung von Justageparametern |
DE102017213107A1 (de) | 2017-07-31 | 2019-01-31 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zum Bestimmen von durch eine Projektionsobjektiv verursachten Wellenfrontaberrationen |
CN113483663A (zh) * | 2021-07-13 | 2021-10-08 | 中国工程物理研究院应用电子学研究所 | 一种三维大尺寸拼接多阵面测试标校***及标校方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4583298A (en) * | 1984-03-07 | 1986-04-22 | Hewlett-Packard Company | Auto calibration method suitable for use in electron beam lithography |
US5640240A (en) * | 1991-07-25 | 1997-06-17 | British Technology Group Ltd. | Probe for surface measurement |
US5798947A (en) * | 1996-09-25 | 1998-08-25 | The Board Of Trustees Of The Leland Stanford, Jr. University | Methods, apparatus and computer program products for self-calibrating two-dimensional metrology stages |
-
2005
- 2005-06-17 WO PCT/EP2005/006577 patent/WO2005124274A2/de active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4583298A (en) * | 1984-03-07 | 1986-04-22 | Hewlett-Packard Company | Auto calibration method suitable for use in electron beam lithography |
US5640240A (en) * | 1991-07-25 | 1997-06-17 | British Technology Group Ltd. | Probe for surface measurement |
US5798947A (en) * | 1996-09-25 | 1998-08-25 | The Board Of Trustees Of The Leland Stanford, Jr. University | Methods, apparatus and computer program products for self-calibrating two-dimensional metrology stages |
Non-Patent Citations (1)
Title |
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MICHAEL T. TAKAC, JUN YE, MICHAEL R. RAUGH A.O.: "Self-calibration in two dimensions: the experiment", SPIE - METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY X, vol. 2725, 13 March 1996 (1996-03-13), Santa Clara, CA, USA, pages 130 - 146, XP002360280 * |
Also Published As
Publication number | Publication date |
---|---|
WO2005124274A2 (de) | 2005-12-29 |
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