WO2005114281A3 - Method for fabricating three-dimensional photonic crystals using a single planar etch mask and deep reactive-ion/plasma etching - Google Patents

Method for fabricating three-dimensional photonic crystals using a single planar etch mask and deep reactive-ion/plasma etching Download PDF

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Publication number
WO2005114281A3
WO2005114281A3 PCT/US2004/021567 US2004021567W WO2005114281A3 WO 2005114281 A3 WO2005114281 A3 WO 2005114281A3 US 2004021567 W US2004021567 W US 2004021567W WO 2005114281 A3 WO2005114281 A3 WO 2005114281A3
Authority
WO
WIPO (PCT)
Prior art keywords
voids
dimensional photonic
fabricating
ion
plasma etching
Prior art date
Application number
PCT/US2004/021567
Other languages
French (fr)
Other versions
WO2005114281A2 (en
Inventor
Garrett Schneider
Janusz Murakowski
Sriram Venkataraman
Dennis W Prather
Original Assignee
Univ Delaware
Garrett Schneider
Janusz Murakowski
Sriram Venkataraman
Dennis W Prather
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Delaware, Garrett Schneider, Janusz Murakowski, Sriram Venkataraman, Dennis W Prather filed Critical Univ Delaware
Publication of WO2005114281A2 publication Critical patent/WO2005114281A2/en
Publication of WO2005114281A3 publication Critical patent/WO2005114281A3/en

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/1225—Basic optical elements, e.g. light-guiding paths comprising photonic band-gap structures or photonic lattices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape

Abstract

A three dimensional photonic crystal including a matrix formed of a contiguous solid material and method of manufacturing. The matrix surrounds a plurality of substantially spherical voids. The voids are arranged in a predetermined pattern which forms a plurality of planar layers. These plurality of layers are stacked so that the voids in each layer are aligned to form vertical columns with voids from at least a subset of the other layers. The voids in each vertical column have openings between adjacent voids in the column.
PCT/US2004/021567 2003-07-03 2004-07-06 Method for fabricating three-dimensional photonic crystals using a single planar etch mask and deep reactive-ion/plasma etching WO2005114281A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US48483303P 2003-07-03 2003-07-03
US60/484,833 2003-07-03

Publications (2)

Publication Number Publication Date
WO2005114281A2 WO2005114281A2 (en) 2005-12-01
WO2005114281A3 true WO2005114281A3 (en) 2006-02-23

Family

ID=35276978

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2004/021567 WO2005114281A2 (en) 2003-07-03 2004-07-06 Method for fabricating three-dimensional photonic crystals using a single planar etch mask and deep reactive-ion/plasma etching

Country Status (1)

Country Link
WO (1) WO2005114281A2 (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5600483A (en) * 1994-05-10 1997-02-04 Massachusetts Institute Of Technology Three-dimensional periodic dielectric structures having photonic bandgaps
JP2001074954A (en) * 1999-08-31 2001-03-23 Nippon Telegr & Teleph Corp <Ntt> Production of three dimensional photonic crystal structure
US6274293B1 (en) * 1997-05-30 2001-08-14 Iowa State University Research Foundation Method of manufacturing flexible metallic photonic band gap structures, and structures resulting therefrom
US20020062782A1 (en) * 2000-11-28 2002-05-30 Norris David J. Self-assembled photonic crystals and methods for manufacturing same
JP2002314194A (en) * 2001-04-17 2002-10-25 Nippon Telegr & Teleph Corp <Ntt> Photonic crystal laser

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5600483A (en) * 1994-05-10 1997-02-04 Massachusetts Institute Of Technology Three-dimensional periodic dielectric structures having photonic bandgaps
US6274293B1 (en) * 1997-05-30 2001-08-14 Iowa State University Research Foundation Method of manufacturing flexible metallic photonic band gap structures, and structures resulting therefrom
JP2001074954A (en) * 1999-08-31 2001-03-23 Nippon Telegr & Teleph Corp <Ntt> Production of three dimensional photonic crystal structure
US20020062782A1 (en) * 2000-11-28 2002-05-30 Norris David J. Self-assembled photonic crystals and methods for manufacturing same
JP2002314194A (en) * 2001-04-17 2002-10-25 Nippon Telegr & Teleph Corp <Ntt> Photonic crystal laser

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 20 10 July 2001 (2001-07-10) *
PATENT ABSTRACTS OF JAPAN vol. 2003, no. 02 5 February 2003 (2003-02-05) *
VENKATARAMAN ET AL.: "Fabrication of 3D silicon photonic crystal structures using conventional micromachining technology", MICROMACHINING TECHNOLOGY FOR MICRO-OPTICS AND NANO OPTICS II : PROCEEDINGS OF SPIEP, vol. 5347, January 2004 (2004-01-01), Bellingham USA, XP002354493 *

Also Published As

Publication number Publication date
WO2005114281A2 (en) 2005-12-01

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