WO2005070005A3 - Pyrolyzed thin film carbon - Google Patents

Pyrolyzed thin film carbon Download PDF

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Publication number
WO2005070005A3
WO2005070005A3 PCT/US2005/002254 US2005002254W WO2005070005A3 WO 2005070005 A3 WO2005070005 A3 WO 2005070005A3 US 2005002254 W US2005002254 W US 2005002254W WO 2005070005 A3 WO2005070005 A3 WO 2005070005A3
Authority
WO
WIPO (PCT)
Prior art keywords
thin film
hydrocarbon
cavity
carbon thin
carbon
Prior art date
Application number
PCT/US2005/002254
Other languages
French (fr)
Other versions
WO2005070005A2 (en
Inventor
Yu-Chong Tai
Matthieu Liger
Theodore Harder
Satoshi Konishi
Scott Miserendino
Original Assignee
California Inst Of Techn
Yu-Chong Tai
Matthieu Liger
Theodore Harder
Satoshi Konishi
Scott Miserendino
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/973,938 external-priority patent/US7238941B2/en
Application filed by California Inst Of Techn, Yu-Chong Tai, Matthieu Liger, Theodore Harder, Satoshi Konishi, Scott Miserendino filed Critical California Inst Of Techn
Publication of WO2005070005A2 publication Critical patent/WO2005070005A2/en
Publication of WO2005070005A3 publication Critical patent/WO2005070005A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/05—Preparation or purification of carbon not covered by groups C01B32/15, C01B32/20, C01B32/25, C01B32/30
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment

Abstract

A method of making carbon thin films comprises depositing a catalyst on a substrate, depositing a hydrocarbon in contact with the catalyst and pyrolyzing the hydrocarbon. A method of controlling a carbon thin film density comprises etching a cavity into a substrate, depositing a hydrocarbon into the cavity, and pyrolyzing the hydrocarbon while in the cavity to form a carbon thin film. Controlling a carbon thin film density is achieved by changing the volume of the cavity. Methods of making carbon containing patterned structures are also provided. Carbon thin films and carbon containing patterned structures can be used in NEMS, MEMS, liquid chromatography, and sensor devices.
PCT/US2005/002254 2004-01-23 2005-01-24 Pyrolyzed thin film carbon WO2005070005A2 (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US53859404P 2004-01-23 2004-01-23
US53882004P 2004-01-23 2004-01-23
US60/538,820 2004-01-23
US60/538,594 2004-01-23
US10/973,938 US7238941B2 (en) 2003-10-27 2004-10-25 Pyrolyzed-parylene based sensors and method of manufacture
US10/973,938 2004-10-25

Publications (2)

Publication Number Publication Date
WO2005070005A2 WO2005070005A2 (en) 2005-08-04
WO2005070005A3 true WO2005070005A3 (en) 2006-04-13

Family

ID=34812081

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/002254 WO2005070005A2 (en) 2004-01-23 2005-01-24 Pyrolyzed thin film carbon

Country Status (1)

Country Link
WO (1) WO2005070005A2 (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5703051A (en) * 1988-09-13 1997-12-30 Biosource Technologies, Inc. Therapeutic uses of melanin
US5830332A (en) * 1995-01-26 1998-11-03 International Business Machines Corporation Sputter deposition of hydrogenated amorphous carbon film and applications thereof
US6339281B2 (en) * 2000-01-07 2002-01-15 Samsung Sdi Co., Ltd. Method for fabricating triode-structure carbon nanotube field emitter array
US20020160111A1 (en) * 2001-04-25 2002-10-31 Yi Sun Method for fabrication of field emission devices using carbon nanotube film as a cathode
US6658722B1 (en) * 1998-12-28 2003-12-09 Sony Chemicals Corporation Process for producing magnetic head suspension

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5703051A (en) * 1988-09-13 1997-12-30 Biosource Technologies, Inc. Therapeutic uses of melanin
US5830332A (en) * 1995-01-26 1998-11-03 International Business Machines Corporation Sputter deposition of hydrogenated amorphous carbon film and applications thereof
US6658722B1 (en) * 1998-12-28 2003-12-09 Sony Chemicals Corporation Process for producing magnetic head suspension
US6339281B2 (en) * 2000-01-07 2002-01-15 Samsung Sdi Co., Ltd. Method for fabricating triode-structure carbon nanotube field emitter array
US20020160111A1 (en) * 2001-04-25 2002-10-31 Yi Sun Method for fabrication of field emission devices using carbon nanotube film as a cathode

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
KONISHI S ET AL: "Parylene-Pyrolyzed Carbon for MEMS Applications.", 17TH IEEE INTL MEMS CONF., 15 January 2004 (2004-01-15), pages 161 - 164, XP010767845 *

Also Published As

Publication number Publication date
WO2005070005A2 (en) 2005-08-04

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