WO2004088715A3 - Tapered structure for providing coupling between external optical device and planar optical waveguide and method of forming the same - Google Patents

Tapered structure for providing coupling between external optical device and planar optical waveguide and method of forming the same Download PDF

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Publication number
WO2004088715A3
WO2004088715A3 PCT/US2004/009086 US2004009086W WO2004088715A3 WO 2004088715 A3 WO2004088715 A3 WO 2004088715A3 US 2004009086 W US2004009086 W US 2004009086W WO 2004088715 A3 WO2004088715 A3 WO 2004088715A3
Authority
WO
WIPO (PCT)
Prior art keywords
tapered
silicon
substrate
coupling
forming
Prior art date
Application number
PCT/US2004/009086
Other languages
French (fr)
Other versions
WO2004088715A2 (en
Inventor
Vipulkumar Kantilal Patel
Prakash Gothoskar
Robert Keith Montgomery
Margaret Ghiron
Original Assignee
Si Optical Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/775,872 external-priority patent/US6993225B2/en
Application filed by Si Optical Inc filed Critical Si Optical Inc
Publication of WO2004088715A2 publication Critical patent/WO2004088715A2/en
Publication of WO2004088715A3 publication Critical patent/WO2004088715A3/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/42—Coupling light guides with opto-electronic elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/1228—Tapered waveguides, e.g. integrated spot-size transformers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/136—Integrated optical circuits characterised by the manufacturing method by etching
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/26—Optical coupling means
    • G02B6/30—Optical coupling means for use between fibre and thin-film device
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12166—Manufacturing methods
    • G02B2006/12195—Tapering
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/26—Optical coupling means
    • G02B6/34—Optical coupling means utilising prism or grating
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/42—Coupling light guides with opto-electronic elements
    • G02B6/4201—Packages, e.g. shape, construction, internal or external details
    • G02B6/4204—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms
    • G02B6/4214—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms the intermediate optical element having redirecting reflective means, e.g. mirrors, prisms for deflecting the radiation from horizontal to down- or upward direction toward a device

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optical Integrated Circuits (AREA)
  • Optical Couplings Of Light Guides (AREA)

Abstract

Methods of forming a tapered evanescent coupling region for use with a relatively thin silicon optical waveguide formed with, for example, an SOI structure. A tapered evanescent coupling region (16) is formed in a silicon substrate (20) that is used as a coupling substrate, the coupling substrate thereafter joined to the SOI structure. A gray-scale photolithography process is used to define a tapered region in photoresist, the tapered pattern thereafter transferred into the silicon substrate. A material exhibiting pattern thereafter transferred into the silicon optical waeguide layer is then used to fill the tapered opening in the substrate. Conventional silicon processing steps may be used to form coupling facets in the silicon in an appropriate relation to the tapered evanescent coupling region. The coupling facets may be formed contiguous with the tapered evanescent coupling region, or formed through the opposing side of the silicon substrate.
PCT/US2004/009086 2003-03-28 2004-03-25 Tapered structure for providing coupling between external optical device and planar optical waveguide and method of forming the same WO2004088715A2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US45850303P 2003-03-28 2003-03-28
US60/458,503 2003-03-28
US10/775,872 2004-02-10
US10/775,872 US6993225B2 (en) 2004-02-10 2004-02-10 Tapered structure for providing coupling between external optical device and planar optical waveguide and method of forming the same

Publications (2)

Publication Number Publication Date
WO2004088715A2 WO2004088715A2 (en) 2004-10-14
WO2004088715A3 true WO2004088715A3 (en) 2005-09-09

Family

ID=33135101

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2004/009086 WO2004088715A2 (en) 2003-03-28 2004-03-25 Tapered structure for providing coupling between external optical device and planar optical waveguide and method of forming the same

Country Status (1)

Country Link
WO (1) WO2004088715A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7454102B2 (en) * 2006-04-26 2008-11-18 Honeywell International Inc. Optical coupling structure
JP6730801B2 (en) * 2015-12-03 2020-07-29 新光電気工業株式会社 Method of manufacturing optical waveguide
EP3339923B1 (en) 2016-12-22 2022-03-09 IMEC vzw Optical interconnect with high tolerance

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5513288A (en) * 1992-06-15 1996-04-30 Robert Bosch Gmbh Optical polymer element for coupling photoelements onto integrated-optical circuits
US5515464A (en) * 1992-07-06 1996-05-07 Sheem Sang K Optical fiber interconnections using self-aligned core-extensions
US5910012A (en) * 1995-11-30 1999-06-08 Nec Corporation Waveguide type semiconductor photodetecting device method for fabricating
US6760529B2 (en) * 2001-12-11 2004-07-06 Intel Corporation Three-dimensional tapered optical waveguides and methods of manufacture thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5513288A (en) * 1992-06-15 1996-04-30 Robert Bosch Gmbh Optical polymer element for coupling photoelements onto integrated-optical circuits
US5515464A (en) * 1992-07-06 1996-05-07 Sheem Sang K Optical fiber interconnections using self-aligned core-extensions
US5910012A (en) * 1995-11-30 1999-06-08 Nec Corporation Waveguide type semiconductor photodetecting device method for fabricating
US6760529B2 (en) * 2001-12-11 2004-07-06 Intel Corporation Three-dimensional tapered optical waveguides and methods of manufacture thereof

Also Published As

Publication number Publication date
WO2004088715A2 (en) 2004-10-14

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