WO2003075061A1 - Adaptateur de mode optique pourvu de deux canaux distincts - Google Patents
Adaptateur de mode optique pourvu de deux canaux distincts Download PDFInfo
- Publication number
- WO2003075061A1 WO2003075061A1 PCT/FR2003/000646 FR0300646W WO03075061A1 WO 2003075061 A1 WO2003075061 A1 WO 2003075061A1 FR 0300646 W FR0300646 W FR 0300646W WO 03075061 A1 WO03075061 A1 WO 03075061A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- channel
- adapter
- mask
- channels
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/14—Mode converters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12035—Materials
- G02B2006/12038—Glass (SiO2 based materials)
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12173—Masking
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12176—Etching
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12178—Epitaxial growth
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12183—Ion-exchange
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12188—Ion implantation
Definitions
- the present invention relates to an optical mode adapter having two separate channels.
- the field of the invention is that of integrated optics, a field in which an objective is to produce a plurality of modules on the same substrate.
- An essential element of these devices is the waveguide which routes light energy between the different modules.
- the waveguide has dimensions as small as possible and therefore supports a reduced propagation mode.
- this device should be connected to any external equipment, which is generally done by means of an optical fiber.
- the optical fiber is a waveguide which supports an extended propagation mode whose spatial extension is much greater than that of the reduced mode adopted in the integrated device.
- the adapter comprises a first and a second channel on an optical substrate for the connection of a first and a second waveguide respectively at its first and at its second end, these two channels being covered by at least one guiding layer and the refractive index of the first channel is lower than that of the second channel.
- the index is adapted to the desired geometric characteristics of the distinct propagation modes in the two channels.
- the width of the first channel is a little greater than that of the second channel.
- the adapter includes an adapter cell in which the two channels are in contact, the first respectively the second end of this cell being disposed near the first respectively the second end of the adapter, the width of the first decreasing channel from the first to the second end of the adaptation cell.
- the width of the first channel is zero at the second end of this adaptation cell.
- the width of the second channel decreases from the second to the first end of the adaptation cell, possibly becoming zero at the first end of this adaptation cell.
- the second end of the adapter cell coincides with the second end of the adapter.
- the refractive index of the guide layer is higher than that of the substrate.
- the adapter comprises at least one covering layer disposed on the guiding layer, the index of this covering layer being lower than that of the guiding layer and that of the channels.
- At least one of these channels is integrated into the substrate.
- the index of the guiding layer is equal to that of the substrate multiplied by a factor greater than 1.001.
- the thickness of all of the guiding layers is between 1 and 20 microns.
- the invention also relates to a first method of manufacturing an adapter which comprises the following steps:
- a second method includes the following steps:
- these first two methods include a step of annealing the substrate which follows the step of ion implantation.
- a third method includes the following steps: - production of a mask on the substrate comprising mobile ions to define the pattern of at least one of the channels,
- a fourth method includes the following steps:
- FIG. 4 the manufacture of an adapter according to a first variant
- FIG. 5 the manufacture of an adapter according to a second variant
- the adapter 1 delimited by a first 11 and a second 12 ends comprises an adaptation cell 2 having a first 21 and a second 22 ends 5 arranged opposite the corresponding ends of adapter 1.
- the second end 22 of the adapter cell merges with the second end 12 of the adapter.
- a first channel C1 of rectangular shape extends along a longitudinal axis from the first end 11 of the adapter to the second end 22 of the adaptation cell.
- a second channel C2, of width less than that of the first channel C1, also of rectangular shape, extends along the same longitudinal axis from the second end 12 of the adapter to the first end 21 of the adaptation cell.
- the part of the second channel C2 which appears in the adaptation cell 2 encroaches on the first channel C1, determining a coupling section S.
- the refractive index of the first channel C1 is lower than that of the second channel C2.
- the width of the second channel C2, which is here less than that of the first channel C1, could possibly be equal to it, or even be slightly greater.
- adaptation cell 2 is not essential, it makes it possible to significantly reduce the coupling losses between the two channels.
- an alignment mark 23 is defined which takes the form of a straight line perpendicular to the axis of the adapter and disposed between the two ends 21, 22 of the adaptation cell.
- the width of the external contour of the first channel C1 decreases from the first end 21 of this cell to the alignment mark 23.
- the decrease is here linear but it could be parabolic, exponential, or of any other nature.
- This width is then substantially constant between the alignment mark 23 and the second end 22 of the adaptation cell, slightly exceeding the width of the second channel C2 outside this cell.
- the residual width of the first channel C1 which is equal to the width of its outer contour reduced by the width of the second channel C2 can even be canceled.
- the width of the second channel C2 is substantially constant between the second end 22 of the adaptation cell and the alignment mark 23. It then decreases to the first end 21 of the adaptation cell, which can even cancel out in this location.
- adaptation cell 2 can take any shape, the important point being that the two channels C1, C2 are in contact or in quasi-contact on at least one of their faces. So these channels which are overlapping in FIGS. 1 and 2 could alternatively be juxtaposed, superimposed or else overlap along at least one common face.
- the adapter is produced using the technique of ion implantation.
- the substrate is made of silica or else it is made of silicon on which either a thermal oxide has been grown or a layer of silicon dioxide or of another material has been deposited. It thus has an upper face or optical substrate 31, commonly made of silicon dioxide, with a thickness of 5 to 20 microns, for example.
- the first channel C1 produced by ion implantation is here integrated into the optical substrate which is itself covered with a guiding layer 33.
- the refractive index of the channel is naturally higher than that of silicon dioxide.
- the guide layer 5 microns thick for example, is made of doped silicon dioxide and has a higher refractive index than that of the optical substrate, for example 0.3%. It can possibly result from a stack of thin layers.
- a covering layer 34 which may also consist of a stack of thin layers is provided on the guiding layer 33.
- This covering layer also 5 microns thick, has a lower index than that of the guiding layer and to that of the canal; in this case it is made of undoped silicon dioxide.
- a first method of manufacturing the adapter comprises a first step which consists in producing a first mask 42 on the optical substrate 31, this by means of a conventional photolithography method.
- This mask 42 is made of resin, metal or any other material capable of constituting an insurmountable barrier for ions during implantation.
- the mask can be obtained by a direct writing process. It reproduces a pattern M which corresponds to the union of the two channels C1, C2. Referring to Figure 4b, the pattern M is produced by ion implantation of the masked substrate.
- the implantation dose D1 desired for the first channel C1 is between 10 16 / cm 2 and 10 18 / cm 2 while the energy is between a few tens and a few hundreds of KeV.
- the first mask is removed, for example by means of a chemical etching process.
- the next step consists in producing a second mask on the optical substrate 31 which reproduces the shape of the second channel C2.
- This second channel is produced by ion implantation of the masked substrate at a dose (D2 - D1) of between 10 16 / cm 2 and 10 ⁇ / cm, so that it has a resultant implantation dose D2.
- the mask is removed.
- the width of the first channel 01 between the alignment mark 23 and the second end 22 of the adaptation cell slightly exceeds the width of the second channel 02 outside of this cell.
- the width of the second channel 02 at the first end 21 of the adaptation cell is not entirely zero because it is practically impossible to achieve a perfect tip on a mask.
- the substrate is then annealed to reduce propagation losses within the two channels.
- the temperature is between 400 and 500 ° C
- the atmosphere is controlled or it is free air, while the duration is of the order of a few tens of hours.
- the guiding layer 33 is then deposited on the substrate 31 by means of any of the known techniques provided that this leads to a low loss material whose refractive index can be easily controlled .
- the covering layer 34 is possibly deposited on the guiding layer 18.
- the refractive index of the first channel 01 is relatively low, 1.56 for example, so that the extended propagation mode GM extends widely in the guiding layer 33.
- the width of this channel 7.5 microns for example, and the thickness of this guiding layer are chosen so that the propagation mode GM is as close as possible to that of single-mode optical fibers.
- the effective index of the guided mode is lower than the refractive index of the guiding layer and that of the channel; it is greater than the refractive index of the upper face 31 and that of the covering layer 34.
- the second channel 02 supports a reduced propagation mode PM, close to that which is encountered on the guides installed without a guide layer.
- the channel index should therefore be relatively high, 1.90 for example.
- the width of this channel can be significantly reduced.
- the effective index of the guided mode is here higher than that of the guiding layer and lower than that of the canal.
- the lateral confinement of the reduced PM mode is very important.
- the optical silicon dioxide substrate has a refractive index which has little or no variation, it follows that very high accuracy can be obtained on the index of the channels. For example, for an implanted dose of titanium of
- a second method of manufacturing the adapter comprises a first step which consists in implanting the entire optical substrate 31.
- the dose D1 and the implantation energy correspond to those provided for the first channel 01 .
- the next step consists in making a mask identical to the second mask of the above method on the optical substrate 31. This second channel is then implanted at the dose (D2 - D1) and the mask is removed. With reference to FIG. 5b, the next step consists in making a new mask 51 on the substrate 31. This mask defines a pattern complementary to that of the first mask used during the first method but it must not undergo step d implantation.
- the pattern 25 is obtained by etching the optical substrate over a depth at least equal to the implantation depth. Any of the known etching techniques is suitable provided that this leads to acceptable geometric characteristics, in particular the profile and the surface condition of the sidewalls.
- the first method has the advantage of defining a waveguide whose structure is perfectly planar since it does not include an etching step.
- a first step consists in implanting the entire optical substrate 31 at a dose (D2 -D1).
- the next step consists of making a mask defining the second channel C2 and then etching the substrate to delimit this second channel.
- the substrate is then implanted at the dose D1 and the next step consists in making the mask which defines a pattern complementary to that of the first mask used during the first method.
- the substrate is then etched, and the guide layer is deposited.
- a third method uses ion exchange technology.
- the substrate is a glass containing mobile ions at relatively low temperature, a glass silicates containing sodium oxide, for example.
- the substrate is provided with a mask and, compared to the first method, the implantation step is replaced by a step of immersion in a bath containing polarizable ions such as silver or potassium.
- the pattern is thus produced by increasing the refractive index following the exchange of polarizable ions with the mobile ions of the substrate.
- the channel is buried by application of an electric field perpendicular to the face of the substrate.
- This third method is very simple. However, it requires the selection of a particular substrate which does not necessarily have all the desired characteristics. In addition, due to a large lateral diffusion of the ions, the spatial resolution is limited.
- a fourth method uses thin film technology.
- the upper face of the substrate is made of silicon dioxide.
- a first layer 61 with an index higher than that of silicon dioxide is deposited on the optical substrate by means of any known technique such as flame hydrolysis deposition ("Flame Hydrolysis Deposition" in English terminology) chemical deposition in high or low pressure vapor phase and assisted or not by plasma, evaporation under vacuum, sputtering or deposition by centrifugation.
- This layer is often doped silicon dioxide, silicon oxy-nitride, silicon nitride and it is also possible to use polymers or sol-gels.
- a mask defining the first channel C1 including the coupling section S is then applied to the deposited layer 61.
- this channel is produced by a chemical etching or dry etching process such as plasma etching, reactive ion etching or etching by ion beam.
- the mask is removed after etching, and a second layer 62 is deposited.
- Another mask defining the second channel 02 is then applied on the second layer 62 before a new etching step.
- the guiding layer 33 is then deposited on the two channels.
- the mask used to etch the first layer 61 defines the first channel 01 without the coupling section S.
- This method requires an etching operation which is difficult to control both in terms of spatial resolution and in terms of the surface condition of the flanks of the channel, characteristics which directly condition the losses to the propagation of the adapter.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Integrated Circuits (AREA)
- Optical Couplings Of Light Guides (AREA)
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2003222950A AU2003222950A1 (en) | 2002-03-01 | 2003-02-28 | Optical mode adapter provided with two separate channels |
US10/506,864 US20050069259A1 (en) | 2002-03-01 | 2003-02-28 | Optical mode adapter provided with two separate channels |
CA002476179A CA2476179A1 (fr) | 2002-03-01 | 2003-02-28 | Adaptateur de mode optique pourvu de deux canaux distincts |
EP03718916A EP1481273A1 (fr) | 2002-03-01 | 2003-02-28 | Adaptateur de mode optique pourvu de deux canaux distincts |
JP2003573466A JP2005519322A (ja) | 2002-03-01 | 2003-02-28 | 2つの別個のチャネルを備えた光学モードアダプタ |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR02/02588 | 2002-03-01 | ||
FR0202588A FR2836724B1 (fr) | 2002-03-01 | 2002-03-01 | Adaptateur de mode optique pourvu de deux canaux distincts |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2003075061A1 true WO2003075061A1 (fr) | 2003-09-12 |
Family
ID=27741341
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/FR2003/000646 WO2003075061A1 (fr) | 2002-03-01 | 2003-02-28 | Adaptateur de mode optique pourvu de deux canaux distincts |
Country Status (8)
Country | Link |
---|---|
US (1) | US20050069259A1 (fr) |
EP (1) | EP1481273A1 (fr) |
JP (1) | JP2005519322A (fr) |
CN (1) | CN1639604A (fr) |
AU (1) | AU2003222950A1 (fr) |
CA (1) | CA2476179A1 (fr) |
FR (1) | FR2836724B1 (fr) |
WO (1) | WO2003075061A1 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8548287B2 (en) * | 2011-11-10 | 2013-10-01 | Oracle International Corporation | Direct interlayer optical coupler |
WO2021071573A1 (fr) | 2019-10-09 | 2021-04-15 | Massachusetts Institute Of Technology | Connexions électriques et optiques simultanées pour ensemble puce retournée |
CN113948965B (zh) * | 2021-10-18 | 2023-08-22 | 中国工程物理研究院应用电子学研究所 | 一种纯增益耦合分布反馈式半导体激光器及制备方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1005120A1 (fr) * | 1998-11-24 | 2000-05-31 | Alcatel | Composant optique à semi-conducteur comportant un adaptateur de mode |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3944327A (en) * | 1971-07-14 | 1976-03-16 | Siemens Aktiengesellschaft | Connection between two light conducting glass fibers |
US4773720A (en) * | 1986-06-03 | 1988-09-27 | General Electric Company | Optical waveguide |
JP2598533B2 (ja) * | 1989-01-26 | 1997-04-09 | 日本板硝子株式会社 | 光導波路の形成方法 |
FR2684823B1 (fr) * | 1991-12-04 | 1994-01-21 | Alcatel Alsthom Cie Gle Electric | Composant optique semi-conducteur a mode de sortie elargi et son procede de fabrication. |
FR2715478B1 (fr) * | 1994-01-27 | 1996-02-16 | Alcatel Nv | Transition de guide optique et procédé de sa réalisation. |
GB2306694A (en) * | 1995-10-17 | 1997-05-07 | Northern Telecom Ltd | Strip-loaded planar optical waveguide |
JPH09153638A (ja) * | 1995-11-30 | 1997-06-10 | Nec Corp | 導波路型半導体受光装置およびその製造方法 |
JP3104650B2 (ja) * | 1997-08-06 | 2000-10-30 | 日本電気株式会社 | 光結合デバイス及び光結合方法 |
KR100333900B1 (ko) * | 1999-01-21 | 2002-04-24 | 윤종용 | 모드모양 변환기, 그 제작 방법 및 이를 구비한 집적광학 소자 |
US6167172A (en) * | 1999-03-05 | 2000-12-26 | Trw Inc. | Tapered amplitude optical absorber for waveguide photodetectors and electro-absorption modulators |
US6330378B1 (en) * | 2000-05-12 | 2001-12-11 | The Trustees Of Princeton University | Photonic integrated detector having a plurality of asymmetric waveguides |
US6631225B2 (en) * | 2000-07-10 | 2003-10-07 | Massachusetts Institute Of Technology | Mode coupler between low index difference waveguide and high index difference waveguide |
US6870987B2 (en) * | 2002-08-20 | 2005-03-22 | Lnl Technologies, Inc. | Embedded mode converter |
US7076135B2 (en) * | 2002-09-20 | 2006-07-11 | Nippon Telegraph And Telephone Corporation | Optical module and manufacturing method therefor |
US20050123244A1 (en) * | 2003-12-03 | 2005-06-09 | Block Bruce A. | Embedded optical waveguide coupler |
US7013067B2 (en) * | 2004-02-11 | 2006-03-14 | Sioptical, Inc. | Silicon nanotaper couplers and mode-matching devices |
-
2002
- 2002-03-01 FR FR0202588A patent/FR2836724B1/fr not_active Expired - Fee Related
-
2003
- 2003-02-28 JP JP2003573466A patent/JP2005519322A/ja active Pending
- 2003-02-28 WO PCT/FR2003/000646 patent/WO2003075061A1/fr not_active Application Discontinuation
- 2003-02-28 CA CA002476179A patent/CA2476179A1/fr not_active Abandoned
- 2003-02-28 US US10/506,864 patent/US20050069259A1/en not_active Abandoned
- 2003-02-28 EP EP03718916A patent/EP1481273A1/fr not_active Withdrawn
- 2003-02-28 AU AU2003222950A patent/AU2003222950A1/en not_active Abandoned
- 2003-02-28 CN CN03805040.4A patent/CN1639604A/zh active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1005120A1 (fr) * | 1998-11-24 | 2000-05-31 | Alcatel | Composant optique à semi-conducteur comportant un adaptateur de mode |
Non-Patent Citations (2)
Title |
---|
See also references of EP1481273A1 * |
T.BRENNER ET AL.: "HIGHLY EFFICIENT FIBER-WAVEGUIDE COUPLING ACHIEVED BY InGaAsP/InP INTEGRATED OPTICAL MODE SHAPE ADAPTERS", 19TH.ECOC 93, 12 September 1993 (1993-09-12) - 16 September 1993 (1993-09-16), ,, pages 329 - 332, XP000444457 * |
Also Published As
Publication number | Publication date |
---|---|
AU2003222950A1 (en) | 2003-09-16 |
US20050069259A1 (en) | 2005-03-31 |
FR2836724B1 (fr) | 2004-07-23 |
CN1639604A (zh) | 2005-07-13 |
FR2836724A1 (fr) | 2003-09-05 |
JP2005519322A (ja) | 2005-06-30 |
CA2476179A1 (fr) | 2003-09-12 |
EP1481273A1 (fr) | 2004-12-01 |
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