WO2002097854A3 - Plasma reactor - Google Patents

Plasma reactor Download PDF

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Publication number
WO2002097854A3
WO2002097854A3 PCT/RU2002/000236 RU0200236W WO02097854A3 WO 2002097854 A3 WO2002097854 A3 WO 2002097854A3 RU 0200236 W RU0200236 W RU 0200236W WO 02097854 A3 WO02097854 A3 WO 02097854A3
Authority
WO
WIPO (PCT)
Prior art keywords
input unit
power input
discharge chamber
sections
electrical conductor
Prior art date
Application number
PCT/RU2002/000236
Other languages
French (fr)
Other versions
WO2002097854A2 (en
Inventor
Andrei F Alexandrov
Gleb E Bugrov
Konstantin V Vavilin
Sergei G Kondranin
Elena A Kralkina
Vladimir B Pavlov
Anri A Rukhadze
Original Assignee
Plasma Tech Co Ltd
Andrei F Alexandrov
Gleb E Bugrov
Konstantin V Vavilin
Sergei G Kondranin
Elena A Kralkina
Vladimir B Pavlov
Anri A Rukhadze
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plasma Tech Co Ltd, Andrei F Alexandrov, Gleb E Bugrov, Konstantin V Vavilin, Sergei G Kondranin, Elena A Kralkina, Vladimir B Pavlov, Anri A Rukhadze filed Critical Plasma Tech Co Ltd
Priority to AU2002309361A priority Critical patent/AU2002309361A1/en
Publication of WO2002097854A2 publication Critical patent/WO2002097854A2/en
Publication of WO2002097854A3 publication Critical patent/WO2002097854A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Treatment Of Fiber Materials (AREA)

Abstract

A plasma reactor comprises a discharge chamber with a gas distributor (3), a substance treatment chamber, a magnetic system (6, 7) for generating in the discharge chamber of a stationary inhomogeneous magnetic field, and a RF power input unit (8) composed of two sections. According to the first embodiment of the invention, the first section is made in the form of parts of electrical conductor connected in series and arranged on the outside of dielectric wall (2) of the discharge chamber. The second section is made in the form of spiral electrical conductor. According to the second embodiment of the invention, the first and second sections of the RF power input unit (8) are made in the form of oppositely directed spirals. The shape of the RF power input unit (8) allows a formation with spatially homogeneous, dense plasma to be generated, which may be used for uniform material treatment.
PCT/RU2002/000236 2001-05-30 2002-05-17 Plasma reactor WO2002097854A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2002309361A AU2002309361A1 (en) 2001-05-30 2002-05-17 Plasma reactor

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
RU2001114393A RU2196395C1 (en) 2001-05-30 2001-05-30 Plasma reactor and plasma generating device (alternatives)
RU2001114393 2001-05-30

Publications (2)

Publication Number Publication Date
WO2002097854A2 WO2002097854A2 (en) 2002-12-05
WO2002097854A3 true WO2002097854A3 (en) 2003-07-31

Family

ID=20250089

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/RU2002/000236 WO2002097854A2 (en) 2001-05-30 2002-05-17 Plasma reactor

Country Status (3)

Country Link
AU (1) AU2002309361A1 (en)
RU (1) RU2196395C1 (en)
WO (1) WO2002097854A2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007131944A2 (en) * 2006-05-16 2007-11-22 Oerlikon Trading Ag, Trübbach Arc source and magnet arrangement
DE102008022181B4 (en) * 2008-05-05 2019-05-02 Arianegroup Gmbh Ion engine
RU2670249C1 (en) * 2017-12-22 2018-10-19 Открытое акционерное общество "Научно-исследовательский институт точного машиностроения" Reactor for plasma processing of semiconductor structures
RU2677323C1 (en) * 2018-02-26 2019-01-16 Общество с ограниченной ответственностью "ПлазЭйр" Plasma air activator

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0553704A1 (en) * 1992-01-30 1993-08-04 International Business Machines Corporation Radio frequency induction plasma processing system utilizing a uniform field coil
EP0633713A1 (en) * 1993-07-05 1995-01-11 Alcatel Cit Plasma reactor for a deposition and etching method
US5731565A (en) * 1995-07-27 1998-03-24 Lam Research Corporation Segmented coil for generating plasma in plasma processing equipment
US6164241A (en) * 1998-06-30 2000-12-26 Lam Research Corporation Multiple coil antenna for inductively-coupled plasma generation systems

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0553704A1 (en) * 1992-01-30 1993-08-04 International Business Machines Corporation Radio frequency induction plasma processing system utilizing a uniform field coil
EP0633713A1 (en) * 1993-07-05 1995-01-11 Alcatel Cit Plasma reactor for a deposition and etching method
US5731565A (en) * 1995-07-27 1998-03-24 Lam Research Corporation Segmented coil for generating plasma in plasma processing equipment
US6164241A (en) * 1998-06-30 2000-12-26 Lam Research Corporation Multiple coil antenna for inductively-coupled plasma generation systems

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
MUNSAT T ET AL: "TWO NEW PLANAR COIL DESIGNS FOR A HIGH PRESSURE RADIO FREQUENCY PLASMA SOURCE", APPLIED PHYSICS LETTERS, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, vol. 66, no. 17, 24 April 1995 (1995-04-24), pages 2180 - 2182, XP000507740, ISSN: 0003-6951 *

Also Published As

Publication number Publication date
RU2196395C1 (en) 2003-01-10
WO2002097854A2 (en) 2002-12-05
AU2002309361A1 (en) 2002-12-09

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