WO2001089666A8 - Composition and method for rendering halogen-containing gas harmless - Google Patents

Composition and method for rendering halogen-containing gas harmless

Info

Publication number
WO2001089666A8
WO2001089666A8 PCT/JP2001/004364 JP0104364W WO0189666A8 WO 2001089666 A8 WO2001089666 A8 WO 2001089666A8 JP 0104364 W JP0104364 W JP 0104364W WO 0189666 A8 WO0189666 A8 WO 0189666A8
Authority
WO
WIPO (PCT)
Prior art keywords
gas
halogen
containing gas
harm
composition
Prior art date
Application number
PCT/JP2001/004364
Other languages
French (fr)
Other versions
WO2001089666A1 (en
Inventor
Yuji Hayasaka
Hitoshi Atobe
Yoshio Furuse
Original Assignee
Showa Denko Kk
Yuji Hayasaka
Hitoshi Atobe
Yoshio Furuse
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000156236A external-priority patent/JP3840877B2/en
Application filed by Showa Denko Kk, Yuji Hayasaka, Hitoshi Atobe, Yoshio Furuse filed Critical Showa Denko Kk
Priority to AU58830/01A priority Critical patent/AU5883001A/en
Priority to US10/030,248 priority patent/US6649082B2/en
Publication of WO2001089666A1 publication Critical patent/WO2001089666A1/en
Publication of WO2001089666A8 publication Critical patent/WO2001089666A8/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/685—Halogens or halogen compounds by treating the gases with solids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86—Catalytic processes
    • B01D53/8659—Removing halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/18—Carbon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
    • B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
    • B01J23/78—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with alkali- or alkaline earth metals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/10—Inorganic adsorbents
    • B01D2253/102—Carbon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/10—Inorganic adsorbents
    • B01D2253/106—Silica or silicates
    • B01D2253/108—Zeolites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/10—Inorganic adsorbents
    • B01D2253/112—Metals or metal compounds not provided for in B01D2253/104 or B01D2253/106
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/30—Physical properties of adsorbents
    • B01D2253/302—Dimensions
    • B01D2253/304—Linear dimensions, e.g. particle shape, diameter
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/30—Physical properties of adsorbents
    • B01D2253/302—Dimensions
    • B01D2253/306—Surface area, e.g. BET-specific surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2255/00—Catalysts
    • B01D2255/20—Metals or compounds thereof
    • B01D2255/207—Transition metals
    • B01D2255/20738—Iron
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Environmental & Geological Engineering (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • General Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biomedical Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Treating Waste Gases (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)

Abstract

The present invention intends to provide an agent and a method for removing harmful gas, which exhibits high harm-removing ability per unit volume for harmful halogen-containing gas such as that contained in the exhaust gas from the etching or cleaning step in the manufacturing process of a semiconductor device, and which is inexpensive.The invention is characterized in that halogen-containing gas is removed using a harm-removing agent comprising iron oxide, an alkaline earth metal compound and activated carbon. In the case where the exhaust gas contains halogen gas such as chlorine or a gas such as sulfur dioxide, the gas is rendered harmless by additionally using a harm removing agent comprising activated carbon or zeolite.
PCT/JP2001/004364 2000-05-26 2001-05-24 Composition and method for rendering halogen-containing gas harmless WO2001089666A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
AU58830/01A AU5883001A (en) 2000-05-26 2001-05-24 Harm-removing agent and method for rendering halogen-containing gas harmless anduses thereof
US10/030,248 US6649082B2 (en) 2000-05-26 2001-05-24 Harm-removing agent and method for rendering halogen-containing gas harmless and uses thereof

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2000156236A JP3840877B2 (en) 2000-05-26 2000-05-26 Halogen-based gas detoxifying agent, detoxifying method and use thereof
JP2000-156236 2000-05-26
US21651600P 2000-07-06 2000-07-06
US60/216,516 2000-07-06

Publications (2)

Publication Number Publication Date
WO2001089666A1 WO2001089666A1 (en) 2001-11-29
WO2001089666A8 true WO2001089666A8 (en) 2002-03-14

Family

ID=26592690

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2001/004364 WO2001089666A1 (en) 2000-05-26 2001-05-24 Composition and method for rendering halogen-containing gas harmless

Country Status (4)

Country Link
KR (1) KR100481584B1 (en)
CN (1) CN1241672C (en)
AU (1) AU5883001A (en)
WO (1) WO2001089666A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100891597B1 (en) * 2001-10-12 2009-04-08 아사히 가라스 가부시키가이샤 Method for removing halogen-containing gas
DE10210786A1 (en) 2002-03-12 2003-10-02 Bayer Ag Mixtures of adsorber materials
JP3871127B2 (en) * 2002-11-29 2007-01-24 関東電化工業株式会社 Vent gas removal method and treatment agent
TW200628212A (en) * 2004-12-15 2006-08-16 Sintokogio Ltd Method and apparatus for the treatment of exhaust gas
JP4212106B2 (en) * 2005-04-19 2009-01-21 オルガノ株式会社 Gas separation device and gas separation method
GB0520468D0 (en) * 2005-10-07 2005-11-16 Boc Group Plc Fluorine abatement
KR100772022B1 (en) * 2006-02-28 2007-10-31 고등기술연구원연구조합 Natural zeolite catalyzer and method of making the same for cleaning N2O
CN101269293B (en) * 2007-03-20 2012-02-01 财团法人工业技术研究院 Scavenging agent for processing corrosive gas and scavenging method
KR101097394B1 (en) * 2009-07-29 2011-12-23 코아텍주식회사 A Depurator for Harmfulness Gas Removal and Its Manufacturing Method
KR101305452B1 (en) 2011-01-07 2013-09-06 주식회사 코캣 Adsorbents for exhaust gas and method for treating exhaust gas using the same
KR101533623B1 (en) * 2013-06-13 2015-07-24 에코위자드 (주) Poisonous Gas Treatment System for Semiconductor Equipment and Method thereof
CN106098525B (en) * 2016-07-06 2018-01-30 武汉华星光电技术有限公司 Dry ecthing equipment
JP6975537B2 (en) * 2017-02-07 2021-12-01 クラリアント触媒株式会社 Halogen gas remover, its manufacturing method, halogen gas removing method using it, and halogen gas removing system

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06104183B2 (en) * 1989-06-09 1994-12-21 三井・デュポンフロロケミカル株式会社 Catalytic decomposition method of chlorofluoroalkane
JPH04110035A (en) * 1990-08-30 1992-04-10 Yajima Takehiko Treating agent for adsorbing and decomposing contaminant and its production
JPH04156919A (en) * 1990-10-19 1992-05-29 Ebara Res Co Ltd Treatment of exhaust gas containing halogen compound
JPH07308538A (en) * 1994-03-24 1995-11-28 Japan Pionics Co Ltd Cleaner for harmful gas
EP0702078B1 (en) * 1994-09-14 2001-12-05 Toda Kogyo Corporation Method of incinerating combustible wastes and chlorine scavenger
US5755977A (en) * 1996-07-03 1998-05-26 Drexel University Continuous catalytic oxidation process
US6436868B1 (en) * 1999-07-09 2002-08-20 Toda Kogyo Corporation Composite catalyst composition for inhibiting generation of dioxin

Also Published As

Publication number Publication date
KR100481584B1 (en) 2005-04-08
AU5883001A (en) 2001-12-03
WO2001089666A1 (en) 2001-11-29
KR20020026548A (en) 2002-04-10
CN1372488A (en) 2002-10-02
CN1241672C (en) 2006-02-15

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