WO2001080308A3 - Method for cutting out at least a thin layer in a substrate or ingot, in particular made of semiconductor material(s) - Google Patents
Method for cutting out at least a thin layer in a substrate or ingot, in particular made of semiconductor material(s) Download PDFInfo
- Publication number
- WO2001080308A3 WO2001080308A3 PCT/FR2001/001179 FR0101179W WO0180308A3 WO 2001080308 A3 WO2001080308 A3 WO 2001080308A3 FR 0101179 W FR0101179 W FR 0101179W WO 0180308 A3 WO0180308 A3 WO 0180308A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- ingot
- substrate
- thin layer
- cutting out
- semiconductor material
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 2
- 239000000463 material Substances 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 230000002045 lasting effect Effects 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
- 230000005693 optoelectronics Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76251—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques
- H01L21/76254—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques with separation/delamination along an ion implanted layer, e.g. Smart-cut, Unibond
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/16—Composite materials, e.g. fibre reinforced
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
- Recrystallisation Techniques (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Light Receiving Elements (AREA)
Abstract
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001577603A JP2003531492A (en) | 2000-04-14 | 2001-04-17 | Method of cutting at least one thin layer from a substrate or ingot, especially made of semiconductor material |
KR1020027013794A KR100742790B1 (en) | 2000-04-14 | 2001-04-17 | Method for cutting out at least a thin layer in a substrate or ingot, in particular made of semiconductor materials |
EP01927984A EP1273035B1 (en) | 2000-04-14 | 2001-04-17 | Method for cutting out at least a thin layer in a substrate or ingot, in particular made of semiconductor material(s) |
AU2001254866A AU2001254866A1 (en) | 2000-04-14 | 2001-04-17 | Method for cutting out at least a thin layer in a substrate or ingot, in particular made of semiconductor material(s) |
US10/268,776 US6951799B2 (en) | 2000-04-14 | 2002-10-11 | Cutting thin layer(s) from semiconductor material(s) |
US11/140,910 US7169686B2 (en) | 2000-04-14 | 2005-06-01 | Cutting thin layer(s) from semiconductor material(s) |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0005549 | 2000-04-14 | ||
FR00/05549 | 2000-04-14 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/268,776 Continuation US6951799B2 (en) | 2000-04-14 | 2002-10-11 | Cutting thin layer(s) from semiconductor material(s) |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2001080308A2 WO2001080308A2 (en) | 2001-10-25 |
WO2001080308A3 true WO2001080308A3 (en) | 2002-02-07 |
Family
ID=8849773
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/FR2001/001179 WO2001080308A2 (en) | 2000-04-14 | 2001-04-17 | Method for cutting out at least a thin layer in a substrate or ingot, in particular made of semiconductor material(s) |
Country Status (7)
Country | Link |
---|---|
US (2) | US6951799B2 (en) |
EP (1) | EP1273035B1 (en) |
JP (1) | JP2003531492A (en) |
KR (1) | KR100742790B1 (en) |
CN (1) | CN100337319C (en) |
AU (1) | AU2001254866A1 (en) |
WO (1) | WO2001080308A2 (en) |
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FR2773261B1 (en) * | 1997-12-30 | 2000-01-28 | Commissariat Energie Atomique | METHOD FOR THE TRANSFER OF A THIN FILM COMPRISING A STEP OF CREATING INCLUSIONS |
FR2811807B1 (en) * | 2000-07-12 | 2003-07-04 | Commissariat Energie Atomique | METHOD OF CUTTING A BLOCK OF MATERIAL AND FORMING A THIN FILM |
JP4659300B2 (en) | 2000-09-13 | 2011-03-30 | 浜松ホトニクス株式会社 | Laser processing method and semiconductor chip manufacturing method |
FR2830983B1 (en) * | 2001-10-11 | 2004-05-14 | Commissariat Energie Atomique | METHOD FOR MANUFACTURING THIN FILMS CONTAINING MICROCOMPONENTS |
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US7176108B2 (en) * | 2002-11-07 | 2007-02-13 | Soitec Silicon On Insulator | Method of detaching a thin film at moderate temperature after co-implantation |
FR2847075B1 (en) * | 2002-11-07 | 2005-02-18 | Commissariat Energie Atomique | PROCESS FOR FORMING A FRAGILE ZONE IN A SUBSTRATE BY CO-IMPLANTATION |
TWI520269B (en) | 2002-12-03 | 2016-02-01 | Hamamatsu Photonics Kk | Cutting method of semiconductor substrate |
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FR2848336B1 (en) * | 2002-12-09 | 2005-10-28 | Commissariat Energie Atomique | METHOD FOR PRODUCING A STRESS STRUCTURE FOR DISSOCIATING |
FR2852250B1 (en) | 2003-03-11 | 2009-07-24 | Jean Luc Jouvin | PROTECTIVE SHEATH FOR CANNULA, AN INJECTION KIT COMPRISING SUCH ANKLE AND NEEDLE EQUIPPED WITH SUCH ANKLE |
US8685838B2 (en) * | 2003-03-12 | 2014-04-01 | Hamamatsu Photonics K.K. | Laser beam machining method |
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FR2858875B1 (en) * | 2003-08-12 | 2006-02-10 | Soitec Silicon On Insulator | METHOD FOR MAKING THIN LAYERS OF SEMICONDUCTOR MATERIAL FROM A DONOR WAFER |
US7052978B2 (en) * | 2003-08-28 | 2006-05-30 | Intel Corporation | Arrangements incorporating laser-induced cleaving |
FR2861497B1 (en) | 2003-10-28 | 2006-02-10 | Soitec Silicon On Insulator | METHOD FOR CATASTROPHIC TRANSFER OF A FINE LAYER AFTER CO-IMPLANTATION |
US7772087B2 (en) * | 2003-12-19 | 2010-08-10 | Commissariat A L'energie Atomique | Method of catastrophic transfer of a thin film after co-implantation |
JP4694795B2 (en) * | 2004-05-18 | 2011-06-08 | 株式会社ディスコ | Wafer division method |
FR2880189B1 (en) * | 2004-12-24 | 2007-03-30 | Tracit Technologies Sa | METHOD FOR DEFERRING A CIRCUIT ON A MASS PLAN |
FR2886051B1 (en) | 2005-05-20 | 2007-08-10 | Commissariat Energie Atomique | METHOD FOR DETACHING THIN FILM |
US7427554B2 (en) * | 2005-08-12 | 2008-09-23 | Silicon Genesis Corporation | Manufacturing strained silicon substrates using a backing material |
FR2889887B1 (en) | 2005-08-16 | 2007-11-09 | Commissariat Energie Atomique | METHOD FOR DEFERING A THIN LAYER ON A SUPPORT |
FR2891281B1 (en) | 2005-09-28 | 2007-12-28 | Commissariat Energie Atomique | METHOD FOR MANUFACTURING A THIN FILM ELEMENT |
KR100858983B1 (en) * | 2005-11-16 | 2008-09-17 | 가부시키가이샤 덴소 | Semiconductor device and dicing method for semiconductor substrate |
FR2899378B1 (en) | 2006-03-29 | 2008-06-27 | Commissariat Energie Atomique | METHOD FOR DETACHING A THIN FILM BY FUSION OF PRECIPITS |
US9362439B2 (en) * | 2008-05-07 | 2016-06-07 | Silicon Genesis Corporation | Layer transfer of films utilizing controlled shear region |
FR2910179B1 (en) | 2006-12-19 | 2009-03-13 | Commissariat Energie Atomique | METHOD FOR MANUFACTURING THIN LAYERS OF GaN BY IMPLANTATION AND RECYCLING OF A STARTING SUBSTRATE |
FR2925221B1 (en) | 2007-12-17 | 2010-02-19 | Commissariat Energie Atomique | METHOD FOR TRANSFERRING A THIN LAYER |
FR2947098A1 (en) | 2009-06-18 | 2010-12-24 | Commissariat Energie Atomique | METHOD OF TRANSFERRING A THIN LAYER TO A TARGET SUBSTRATE HAVING A THERMAL EXPANSION COEFFICIENT DIFFERENT FROM THAT OF THE THIN LAYER |
JP5839538B2 (en) * | 2011-03-17 | 2016-01-06 | リンテック株式会社 | Manufacturing method of thin semiconductor device |
RU2469433C1 (en) * | 2011-07-13 | 2012-12-10 | Юрий Георгиевич Шретер | Method for laser separation of epitaxial film or layer of epitaxial film from growth substrate of epitaxial semiconductor structure (versions) |
US8673733B2 (en) * | 2011-09-27 | 2014-03-18 | Soitec | Methods of transferring layers of material in 3D integration processes and related structures and devices |
US8841742B2 (en) | 2011-09-27 | 2014-09-23 | Soitec | Low temperature layer transfer process using donor structure with material in recesses in transfer layer, semiconductor structures fabricated using such methods |
JP5725430B2 (en) * | 2011-10-18 | 2015-05-27 | 富士電機株式会社 | Method for peeling support substrate of solid-phase bonded wafer and method for manufacturing semiconductor device |
FR2993095B1 (en) * | 2012-07-03 | 2014-08-08 | Commissariat Energie Atomique | DETACHMENT OF A SILICON-FREE LAYER <100> |
US9499921B2 (en) | 2012-07-30 | 2016-11-22 | Rayton Solar Inc. | Float zone silicon wafer manufacturing system and related process |
FR3002687B1 (en) * | 2013-02-26 | 2015-03-06 | Soitec Silicon On Insulator | PROCESS FOR TREATING A STRUCTURE |
FR3007892B1 (en) * | 2013-06-27 | 2015-07-31 | Commissariat Energie Atomique | METHOD FOR TRANSFERRING A THIN LAYER WITH THERMAL ENERGY SUPPLY TO A FRAGILIZED AREA VIA AN INDUCTIVE LAYER |
US10068795B2 (en) * | 2014-02-07 | 2018-09-04 | Globalwafers Co., Ltd. | Methods for preparing layered semiconductor structures |
JP5885768B2 (en) * | 2014-03-17 | 2016-03-15 | キヤノン株式会社 | Biopsy device |
FR3020175B1 (en) * | 2014-04-16 | 2016-05-13 | Soitec Silicon On Insulator | METHOD OF TRANSFERRING A USEFUL LAYER |
CN106548972B (en) | 2015-09-18 | 2019-02-26 | 胡兵 | A method of bulk semiconductor substrate is separated with functional layer thereon |
JP6444462B2 (en) * | 2017-08-03 | 2018-12-26 | キヤノン株式会社 | Biopsy device |
FR3076067B1 (en) | 2017-12-21 | 2020-01-10 | Universite De Franche-Comte | METHOD FOR MANUFACTURING ULTRA-PLANE THIN FILM COMPOSITE |
US11414782B2 (en) | 2019-01-13 | 2022-08-16 | Bing Hu | Method of separating a film from a main body of a crystalline object |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2666759A1 (en) * | 1990-09-19 | 1992-03-20 | Bourgogne Technologies | Device for ablating, through the transparency of a plastic film, using a laser, and applications to spraying and to marking |
SU1324525A1 (en) * | 1985-07-01 | 1992-05-30 | Научно-исследовательский институт ядерной физики при Томском политехническом институте им.С.М.Кирова | Method of treating semiconducting material |
EP0792731A2 (en) * | 1996-03-01 | 1997-09-03 | PIRELLI COORDINAMENTO PNEUMATICI S.p.A. | Method and apparatus for cleaning vulcanization moulds for elastomer material articles |
JPH11312811A (en) * | 1998-02-25 | 1999-11-09 | Seiko Epson Corp | Thin-film exfoliation method, thin-film device transfer method, thin-film device, active matrix substrate and liquid crystal displaying device |
EP0961312A2 (en) * | 1998-05-15 | 1999-12-01 | Canon Kabushiki Kaisha | SOI Substrate formed by bonding |
Family Cites Families (8)
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---|---|---|---|---|
FR2681472B1 (en) | 1991-09-18 | 1993-10-29 | Commissariat Energie Atomique | PROCESS FOR PRODUCING THIN FILMS OF SEMICONDUCTOR MATERIAL. |
CN1132223C (en) * | 1995-10-06 | 2003-12-24 | 佳能株式会社 | Semiconductor substrate and producing method thereof |
FR2748851B1 (en) | 1996-05-15 | 1998-08-07 | Commissariat Energie Atomique | PROCESS FOR PRODUCING A THIN FILM OF SEMICONDUCTOR MATERIAL |
US6159824A (en) | 1997-05-12 | 2000-12-12 | Silicon Genesis Corporation | Silicon-on-silicon wafer bonding process using a thin film blister-separation method |
US6033974A (en) * | 1997-05-12 | 2000-03-07 | Silicon Genesis Corporation | Method for controlled cleaving process |
SG87916A1 (en) | 1997-12-26 | 2002-04-16 | Canon Kk | Sample separating apparatus and method, and substrate manufacturing method |
US6503321B2 (en) | 1998-02-17 | 2003-01-07 | The Trustees Of Columbia University In The City Of New York | Slicing of single-crystal films using ion implantation |
FR2785217B1 (en) | 1998-10-30 | 2001-01-19 | Soitec Silicon On Insulator | METHOD AND DEVICE FOR SEPARATING IN A TWO WAFERS A PLATE OF MATERIAL, PARTICULARLY A SEMICONDUCTOR |
-
2001
- 2001-04-17 KR KR1020027013794A patent/KR100742790B1/en active IP Right Grant
- 2001-04-17 JP JP2001577603A patent/JP2003531492A/en active Pending
- 2001-04-17 AU AU2001254866A patent/AU2001254866A1/en not_active Abandoned
- 2001-04-17 EP EP01927984A patent/EP1273035B1/en not_active Expired - Lifetime
- 2001-04-17 CN CNB018092756A patent/CN100337319C/en not_active Expired - Lifetime
- 2001-04-17 WO PCT/FR2001/001179 patent/WO2001080308A2/en active Application Filing
-
2002
- 2002-10-11 US US10/268,776 patent/US6951799B2/en not_active Expired - Lifetime
-
2005
- 2005-06-01 US US11/140,910 patent/US7169686B2/en not_active Expired - Lifetime
Patent Citations (6)
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SU1324525A1 (en) * | 1985-07-01 | 1992-05-30 | Научно-исследовательский институт ядерной физики при Томском политехническом институте им.С.М.Кирова | Method of treating semiconducting material |
FR2666759A1 (en) * | 1990-09-19 | 1992-03-20 | Bourgogne Technologies | Device for ablating, through the transparency of a plastic film, using a laser, and applications to spraying and to marking |
EP0792731A2 (en) * | 1996-03-01 | 1997-09-03 | PIRELLI COORDINAMENTO PNEUMATICI S.p.A. | Method and apparatus for cleaning vulcanization moulds for elastomer material articles |
JPH11312811A (en) * | 1998-02-25 | 1999-11-09 | Seiko Epson Corp | Thin-film exfoliation method, thin-film device transfer method, thin-film device, active matrix substrate and liquid crystal displaying device |
EP1014452A1 (en) * | 1998-02-25 | 2000-06-28 | Seiko Epson Corporation | Method of detaching thin-film device, method of transferring thin-film device, thin-film device, active matrix substrate, and liquid crystal display |
EP0961312A2 (en) * | 1998-05-15 | 1999-12-01 | Canon Kabushiki Kaisha | SOI Substrate formed by bonding |
Non-Patent Citations (3)
Title |
---|
DATABASE WPI Section Ch Week 199317, Derwent World Patents Index; Class L03, AN 1993-141287, XP002179817 * |
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 02 29 February 2000 (2000-02-29) * |
YOUTSOS A G, KIRIAKOPOULOS M, TIMKE TH: "Experimental and theoretical/numerical investigations of thin films bonding strength", THEORETICAL AND APPLIED FRACTURE MECHANICS, vol. 31, no. 1, February 1999 (1999-02-01) - March 1999 (1999-03-01), pages 47 - 59, XP001031851 * |
Also Published As
Publication number | Publication date |
---|---|
KR100742790B1 (en) | 2007-07-25 |
EP1273035B1 (en) | 2012-09-12 |
KR20030022108A (en) | 2003-03-15 |
JP2003531492A (en) | 2003-10-21 |
US7169686B2 (en) | 2007-01-30 |
CN100337319C (en) | 2007-09-12 |
US20030162367A1 (en) | 2003-08-28 |
EP1273035A2 (en) | 2003-01-08 |
WO2001080308A2 (en) | 2001-10-25 |
CN1428005A (en) | 2003-07-02 |
US6951799B2 (en) | 2005-10-04 |
AU2001254866A1 (en) | 2001-10-30 |
US20050227456A1 (en) | 2005-10-13 |
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