WO1998038475A1 - Apparatus for precise length measurement calibration - Google Patents

Apparatus for precise length measurement calibration Download PDF

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Publication number
WO1998038475A1
WO1998038475A1 PCT/GB1998/000365 GB9800365W WO9838475A1 WO 1998038475 A1 WO1998038475 A1 WO 1998038475A1 GB 9800365 W GB9800365 W GB 9800365W WO 9838475 A1 WO9838475 A1 WO 9838475A1
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WIPO (PCT)
Prior art keywords
interferometer
length
artifact
optical length
etalon
Prior art date
Application number
PCT/GB1998/000365
Other languages
French (fr)
Inventor
Noel William Frank Stephens
Original Assignee
Aberlink Technology Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aberlink Technology Limited filed Critical Aberlink Technology Limited
Priority to AU59970/98A priority Critical patent/AU5997098A/en
Publication of WO1998038475A1 publication Critical patent/WO1998038475A1/en

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/0209Low-coherence interferometers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02055Reduction or prevention of errors; Testing; Calibration
    • G01B9/0207Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
    • G01B9/02072Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/25Fabry-Perot in interferometer, e.g. etalon, cavity

Definitions

  • This invention relates to apparatus for precise length measurement calibration.
  • Diode lasers are inexpensive, small and compact, efficient, and will run on low voltage current drives. Their main disadvantages are: propensity to mode hopping; wavelength changes with temperature
  • their lasing cavities are sensitive to small amounts of light reflected back into the cavity, for example off optical surfaces; and the coherence of their emitted light is restricted.
  • This invention is aimed at calibrating relatively unstable incremental length measuring apparatus and is specifically, but not exclusively, directed towards calibrating laser based length measuring interferometers which use diode lasers. This invention addresses the problem of achieving high accuracy when using a relatively unstable laser wavelength. It also, by default, eliminates the need
  • optical cell which acts as standard length artifact or optical length artifact (OLA).
  • OVA optical length artifact
  • a suitable beam may be
  • the cell produces collimating light emitted from, for example, a standard light emitting diode of the Gallium Aluminium Arsenide type, or a filament lamp.
  • the cell operates by (although not exclusively) interference to impose a cyclically varying intensity profile across the wavelength spectrum of the light it transmits.
  • a cell capable of producing this effect is a Fabry Perot etalon. The appropriate spectral properties are
  • a Fabry Perot etalon cell imposed on the beam after passing it through a Fabry Perot etalon cell.
  • Perot etalon is a multi-beam interferometer and as such produces a non-sinusoidal
  • a two beam interferometer A two beam interferometer
  • the Fabry Perot etalon provides a convenient means of producing the desired effect.
  • An advantage of the Fabry Perot etalon is that a fixed mass of gas (air) may conveniently be sealed in a volume between its two reflectors (between which multiple reflections occur). This means that the optical path between the two reflectors (which defines the length of the optical artifact) will not be affected by changes in atmospheric conditions to a very high degree of accuracy. The only significant change
  • optical path length will be due to thermal expansion of the etalon which is accurately predictable using for example fused silica spacers.
  • Erskine and Holmes use two similar, fixed path difference, interferometers in tandem.
  • a low coherence light beam passes through each of the interferometers in turn with a measurement arm situated between the two interferometers.
  • Measurement ranges of laser based interferometers are inherently linear because they in effect count in wavelengths of
  • wavelength of light from diode lasers is prone to vary with small changes in temperature and drive current, typically 70 parts per million per degree Celsius.
  • the wavelength can be different each time the diode is switched on and stabilised at a fixed temperature and drive current.
  • the wavelength of the laser light is not actually required to be known, prior to taking measurements, in this invention. This is a distinguishing feature of the
  • a cyclically varying spectral profile may alternatively be produced using any suitable stable filtering means, for example, Sole or Lyot filter types.
  • a broad band (white light) light source has very low coherence and as such
  • the spectrum of broad band light is modified by first passing it through a filter, such as an interferometer of fixed path difference, for example a Fabry Perot etalon, then subsequent positions of detectable interference are found at path differences
  • a filter such as an interferometer of fixed path difference, for example a Fabry Perot etalon
  • This invention requires detectable interference to occur at at least two path differences, one of which may be the zero path condition, in order to derive at least two reference signatures.
  • the physical separation of any two reference may be the zero path condition, in order to derive at least two reference signatures.
  • the finesse of the Fabry Perot etalon may be any suitable finesse of the Fabry Perot etalon.
  • Low finesse is also an advantage in terms of transmission of broad band radiation, which is proportional to the inverse of the finesse of the etalon.
  • spectral composition of a light source may also be understood with reference to the field of Fourier transform spectroscopy.
  • apparatus for precise length measurement calibration comprising a linear length measuring interferometer
  • a measurement beam having a broad spectral band source, a collimating means for producing a collimated incident beam, a beam splitter for producing part beams which, in use, pass along a reference arm and a measurement arm of the interferometer respectively, a reference reflector for reflecting the part beam passing along the reference arm, a measurement
  • combining means for recombining the part beams reflected by the reference reflector and the measurement reflector, the measurement reflector being moveable to provide a measuring range; an optical length artifact for modifying the spectral composition of the incident beam or of one of the part beams or of a recombined beam in a way that imposes a cyclically varying spectral intensity with changing wavelength across the broad spectral range of the light source; and fringe detection means providing at least two reference signatures throughout the measuring range spaced apart by an amount determined by the optical length artifact.
  • FIG. 1 illustrates the salient features of one embodiment of the invention
  • FIG. 2 illustrates another embodiment of the invention
  • FIG 3 shows typical reference signatures generated in the detection means of Figures 1 and 2
  • Figure 4 shows a Fabry Perot etalon adapted as an optical length artifact with sealed cavity
  • Figure 5 shows a Fabry Perot etalon whose cavity is exposed to atmospheric changes
  • Figure 6 shows modified broad spectral band after transmission through the
  • Figure 7 shows one embodiment of the invention incorporating a laser based
  • Figure 8 shows an alternative site for the optical length artifact
  • Figure 9 shows a further site for the optical length artifact
  • Figure 10 shows another embodiment of the invention incorporating a laser based length measuring interferometer
  • FIG 11 shows the salient features of the preferred embodiment.
  • Figure 12 shows the optical length artifact in the reference arm, reflecting light directly back to the beam splitter/combiner.
  • a light emitting diode is collimated by lens 2 before being modified by an optical length artifact 11 in the form of a Fabry Perot etalon shown in Figures 4 and 5.
  • the Fabry Perot etalon imposes a cyclically varying profile across the broad spectral band of the light source as illustrated in Figure 6.
  • the light After being modified by its passage through the Fabry Perot etalon, the light enters a measuring interferometer of the Michelson type, having a beam splitter 4 for producing part beams 5R and 5M
  • reflector 7M is movable over a measurement range 10. Normally, a measuring
  • interferometer of this type produces detectable fringes only over a small measuring range, typically 5-10 microns, when using a broad spectral band source.
  • a small measuring range typically 5-10 microns
  • short bursts of detectable fringes are produces at several places along the measuring range 10, as illustrated in Figure 3.
  • the central maxima of the detectable fringes is located by
  • the Fabry Perot etalon 11 may be used as an optical length artifact in two distinct ways: either a fixed mass of gas is sealed in the etalon cavity as illustrated in
  • the former can be used in conjunction with atmospheric monitoring to enable a correction to be made to measured displacements.
  • the Fabry Perot etalon cell In the preferred embodiment of the invention, the Fabry Perot etalon cell
  • FIG. 5 comprises two partially reflecting and partially transmitting surfaces 21,24 which may be plane or configured as a confocal resonator, supported on an appropriate substrates 20, for example fused silica.
  • the partially reflecting surfaces 21,24 may be plane or configured as a confocal resonator, supported on an appropriate substrates 20, for example fused silica.
  • mirrors are spaced apart by a convenient distance (eg. 50 mm) by a spacer tube 22 also fabricated in fused silica.
  • the etalon mirrors are
  • An air filter 25 is located in the breather tube to prevent contamination of the etalon mirrors.
  • Figure 4 shows the mirror substrates hard sealed 23, or fused, to the spacer
  • Fused silica is cited for its low and predictable coefficient of thermal
  • mirror substrates Any other material with appropriate properties may be used for mirror substrates and spacer tube.
  • the measured distance between successive reference signatures is an optical distance in the measuring range which is precisely equal to the optical separation between the etalon mirrors. If the etalon is sealed, as shown in Figure 4, its optical length only varies with the thermal expansion of its mirror spacer. Its optical length must therefore be determined at an accurately known temperature, so
  • the length is always equal to the separation of successive reference signatures in the measuring range. In this case either: the physical length (not optical length) of the
  • etalon must be measured at a known temperature; or the separation between reference signatures in the measuring range accurately determined using an auxiliary precision interferometer, for example an atmospheric corrected Iodine stabilised helium-neon
  • Figure 2 shows a length measuring interferometer incorporating an
  • the optical length artifact shown in Figure 2 represents any form of two beam fixed path difference interferometer.
  • the general fixed path interferometer may be variations or combinations of any of the following types: Michelson
  • interferometer This is facilitated using cube corner retroreflector 7R and 7M in the reference arm 6R and measurement arm 6M respectively.
  • Retroreflectors in the respective arms of the interferometer are, used
  • Cube corner reflectors may also be used to spatially separate the
  • the retroreflectors 7R and 7M are 90 degree porro type reflecting prisms.
  • FIGS 8 and 9 show alternative sites for the optical length artifact in the
  • Figure 10 shows the combining of the laser and broad band beams prior to entering the measuring interferometer, and their subsequent separation prior to their respective fringe detection.
  • beam combiner 18 and separator 17 are
  • optical length artifact could be located between the beam combiner 8 and the separator 17 instead of in the incident beam or the reference
  • FIG 11 shows the preferred embodiment of the invention in which the
  • etalon is located in the reference arm of a Michelson interferometer.
  • Michelson interferometer In the preferred
  • the etalon is reflective, which returns the light back along the same path in the reference arm.
  • the measuring arm of the interferometer has a corresponding
  • Such an arrangement is commonly referred to as a double pass interferometer and has the advantage that, once set up, fringe visibility is unaffected by lateral displacement or rotation of cube corner retroreflectors in either arm of the interferometer. Because it is double path, interference signatures produced in the Michelson interferometer by virtue of the etalon are separated in distance along the measuring arm by half the length of the etalon.
  • Figure 12 shows an embodiment of the invention in which the optical length artifact is located in the reference arm, with its mirrors reflecting light back to the beam splitter/recombiner, without the use of additional reflecting surfaces in the reference arm.
  • This embodiment retains double pass in the measuring arm which benefits from displacement tolerance of the associated retroreflector.
  • the beam combiner 8 used in the preferred embodiment of this invention, and also in any laser length measuring interferometer used in conjunction with this invention, is a non-polarising type proposed by Raines and Downs (Optica Acta,
  • Phase quadrature signals are used for up and down incremental counting and form the basis of position measurement known in the art.
  • the 90 degree phase delay is also useful when deriving a reference
  • the fringe detection means 9 detects fringes
  • the laser length interferometer is calibrated by counting the number of
  • the invention may be adapted for use with polarising length measuring interferometers known in the art.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)

Abstract

An apparatus for the calibration of laser length measuring interferometers using a broad spectral band light source (1) whose spectral composition is modified by a filter (11). The light passes through a length measuring interferometer so that short bursts of fringes are detected at more than one position along a measuring range (10). In the preferred embodiment of the invention, the filter is a Fabry Perot interferometer (11) whose mirror separation sets the interval along the measuring range between which fringe bursts are detected. The fringe bursts are converted into electrical reference signatures by fringe detection means (9) and their positions located with extreme precision by known electronic detection circuitry. The separation of short bursts of detectable fringes in the measuring range have a precise correspondence with separation of the mirrors of the Fabry Perot etalon. The cavity length of the etalon therefore provides an optical length artifact by which the measuring range (10) is calibrated.

Description

APPARATUS FOR PRECISE LENGTH MEASUREMENT CALIBRATION
This invention relates to apparatus for precise length measurement calibration.
The application of laser interferometry to precise length measurement is well known and several systems are commercially available from manufacturers such as Hewlett Packard, Spindler & Hoyer, and Renishaw. Most commercial interferometer systems currently available, make use of helium-neon lasers. Helium- neon lasers may be designed to operate in single longitudinal mode with a high degree of wavelength stability.
With the advent of diode lasers there are now strong commercial pressures to replace helium-neon lasers with diode lasers. Diode lasers are inexpensive, small and compact, efficient, and will run on low voltage current drives. Their main disadvantages are: propensity to mode hopping; wavelength changes with temperature
and drive current; their lasing cavities are sensitive to small amounts of light reflected back into the cavity, for example off optical surfaces; and the coherence of their emitted light is restricted.
This invention is aimed at calibrating relatively unstable incremental length measuring apparatus and is specifically, but not exclusively, directed towards calibrating laser based length measuring interferometers which use diode lasers. This invention addresses the problem of achieving high accuracy when using a relatively unstable laser wavelength. It also, by default, eliminates the need
for correcting changes in wavelength brought about by changes in refractive index of air due to changes in atmospheric conditions, normally employed in the art.
By selecting an appropriate diode laser structure (for example index guided double heterostructure) mode hopping can normally be prevented by driving the diode
with a stable pre-selected current and stabilising its operating temperature.
The basis of the invention is an optical cell which acts as standard length artifact or optical length artifact (OLA). The cell is used in conjunction with a
collimated beam of light having a broad spectral band width. A suitable beam may be
produced by collimating light emitted from, for example, a standard light emitting diode of the Gallium Aluminium Arsenide type, or a filament lamp. The cell operates by (although not exclusively) interference to impose a cyclically varying intensity profile across the wavelength spectrum of the light it transmits. A cell capable of producing this effect is a Fabry Perot etalon. The appropriate spectral properties are
imposed on the beam after passing it through a Fabry Perot etalon cell. A Fabry
Perot etalon is a multi-beam interferometer and as such produces a non-sinusoidal
intensity profile across the spectrum of its output beam. A two beam interferometer
(for example the Michelson) produces sinusoidal variations across the spectrum of the output beam. Virtually any interferometer type may be considered for use as a measurement artifact in this invention. The Fabry Perot etalon provides a convenient means of producing the desired effect. An advantage of the Fabry Perot etalon is that a fixed mass of gas (air) may conveniently be sealed in a volume between its two reflectors (between which multiple reflections occur). This means that the optical path between the two reflectors (which defines the length of the optical artifact) will not be affected by changes in atmospheric conditions to a very high degree of accuracy. The only significant change
in optical path length will be due to thermal expansion of the etalon which is accurately predictable using for example fused silica spacers.
It further may be an advantage in an embodiment of the invention for the space between the mirrors of an optical length artifact to be exposed or open to the
atmosphere in order that its optical length is modified according to atmospheric
conditions.
The effect is exploited in a different way and for a different purpose from the present invention by Erskine and Holmes (Nature, 1995, volume 377 page 317).
Erskine and Holmes use two similar, fixed path difference, interferometers in tandem. A low coherence light beam passes through each of the interferometers in turn with a measurement arm situated between the two interferometers. The instrument
measures velocity by detecting a shift in the fringe pattern at the output of the second
interferometer, by virtue of the Doppler effect. It is evident that the optical effect,
exploited both in this invention and by Erskine and Holmes, cannot alone provide continuous linear incremental fringe counting required for linear distance measurement over reasonable measurement ranges. This invention exploits the effect of passing a low coherence light beam through a fixed path difference interferometer purely as a means of providing a very accurate, built in, calibration for any incremental length measuring apparatus. It is
more specifically suited to providing reference points and calibration for use with laser based distance measurement interferometers . Measurement ranges of laser based interferometers are inherently linear because they in effect count in wavelengths of
light (normally half wavelengths). Measurements made, however, may not be accurate especially when the laser light is provided by a diode laser. This is because the
wavelength of light from diode lasers is prone to vary with small changes in temperature and drive current, typically 70 parts per million per degree Celsius.
Indeed the wavelength can be different each time the diode is switched on and stabilised at a fixed temperature and drive current.
It is an object of this invention to provide at least two fiducial or reference
positions in the measuring range of the interferometer whose separations are known to a high degree of accuracy. This is provided by the optical length artifact. It is the
intention of this invention to not only provide accurate reference points in the
measurement range but also to provide on-board self calibration of linear measuring systems such as diode laser based interferometers.
The wavelength of the laser light is not actually required to be known, prior to taking measurements, in this invention. This is a distinguishing feature of the
invention. Known arrangements strive to obtain knowledge of wavelength in order to obtain accurate length measurement. A cyclically varying spectral profile may alternatively be produced using any suitable stable filtering means, for example, Sole or Lyot filter types.
A broad band (white light) light source has very low coherence and as such
produces interference fringes only over a very short range of path differences. This small range may be utilised as a reference signature since the centre of the range is
easily located by means of photo sensors to sense fringes. Only one such signature is normally generated in a variable path interferometer when using a broad spectral
band light source. This occurs at the position of equal path lengths. When, however,
the spectrum of broad band light is modified by first passing it through a filter, such as an interferometer of fixed path difference, for example a Fabry Perot etalon, then subsequent positions of detectable interference are found at path differences
comparable with multiples of the spacing between the etalon mirrors. The number of different multiples of the spacing between the etalon mirrors corresponding to path
differences at which subsequent detectable interference occurs, is comparable with the finesse of the etalon. This invention requires detectable interference to occur at at least two path differences, one of which may be the zero path condition, in order to derive at least two reference signatures. The physical separation of any two reference
signatures is therefore determined by the geometrical and physical optical properties of the filter.
It should be noted that since only at least two positions of detectable interference are required for this invention, the finesse of the Fabry Perot etalon may
be relatively low (eg. between 3 to 6) and in consequence does not require high grade optics normally demanded in the construction of Fabry Perot etalons. Low finesse is also an advantage in terms of transmission of broad band radiation, which is proportional to the inverse of the finesse of the etalon.
It may be desirable, in some circumstances, to provide many reference signatures (for example ten) in the measuring range to provide ready calibration at any point along the measurement range. This would require the finesse of the etalon to be of the order of 10.
The principle of generating at least two reference signatures, by modifying
spectral composition of a light source, may also be understood with reference to the field of Fourier transform spectroscopy.
According to the present invention there is provided apparatus for precise length measurement calibration comprising a linear length measuring interferometer
having a broad spectral band source, a collimating means for producing a collimated incident beam, a beam splitter for producing part beams which, in use, pass along a reference arm and a measurement arm of the interferometer respectively, a reference reflector for reflecting the part beam passing along the reference arm, a measurement
reflector for reflecting the part beam passing along the measurement arm, beam
combining means for recombining the part beams reflected by the reference reflector and the measurement reflector, the measurement reflector being moveable to provide a measuring range; an optical length artifact for modifying the spectral composition of the incident beam or of one of the part beams or of a recombined beam in a way that imposes a cyclically varying spectral intensity with changing wavelength across the broad spectral range of the light source; and fringe detection means providing at least two reference signatures throughout the measuring range spaced apart by an amount determined by the optical length artifact.
Preferred and/or optional features of the invention are set forth in claims
2 to 24.
The invention will now be described in more detail with reference to the following figures:
Figure 1 illustrates the salient features of one embodiment of the invention,
Figure 2 illustrates another embodiment of the invention,
Figure 3 shows typical reference signatures generated in the detection means of Figures 1 and 2,
Figure 4 shows a Fabry Perot etalon adapted as an optical length artifact with sealed cavity,
Figure 5 shows a Fabry Perot etalon whose cavity is exposed to atmospheric changes, Figure 6 shows modified broad spectral band after transmission through the
optical length artifact,
Figure 7 shows one embodiment of the invention incorporating a laser based
length measuring interferometer,
Figure 8 shows an alternative site for the optical length artifact,
Figure 9 shows a further site for the optical length artifact,
Figure 10 shows another embodiment of the invention incorporating a laser based length measuring interferometer,
Figure 11 shows the salient features of the preferred embodiment.
Figure 12 shows the optical length artifact in the reference arm, reflecting light directly back to the beam splitter/combiner.
Referring to Figure 1 , which illustrates the salient features of one
embodiment of the invention, light emitted by a broad spectral band light source 1 ,
conveniently a light emitting diode, is collimated by lens 2 before being modified by an optical length artifact 11 in the form of a Fabry Perot etalon shown in Figures 4 and 5. The Fabry Perot etalon imposes a cyclically varying profile across the broad spectral band of the light source as illustrated in Figure 6. After being modified by its passage through the Fabry Perot etalon, the light enters a measuring interferometer of the Michelson type, having a beam splitter 4 for producing part beams 5R and 5M
which pass along a reference arm 6R and a measurement arm 6M of the interferometer respectively, a reference reflector 7R for reflecting the part beam 5R passing along the reference arm 6R, a measurement reflector 7M for reflecting the part beam passing along the measurement arm 6M, beam combining means 8 for recombining the part beams 5R and 5M and a fringe detector 9. The measurement
reflector 7M is movable over a measurement range 10. Normally, a measuring
interferometer of this type produces detectable fringes only over a small measuring range, typically 5-10 microns, when using a broad spectral band source. When the spectrum of the source is modified using a Fabry Perot interferometer, short bursts of detectable fringes are produces at several places along the measuring range 10, as illustrated in Figure 3. The central maxima of the detectable fringes is located by
electronic means known in the art.
The Fabry Perot etalon 11 may be used as an optical length artifact in two distinct ways: either a fixed mass of gas is sealed in the etalon cavity as illustrated in
Figure 4; or the etalon cavity is exposed or open to the atmosphere to allow the refractive index of the air within the cavity to change with change in atmospheric conditions as illustrated in Figure 5. In the former case the measured optical separation between the reference signatures is precisely related to the separation of
the Fabry Perot etalon mirrors. In the latter case the measured physical separation
between the reference signatures is precisely related to the separation of the Fabry Perot etalon mirrors. The latter is generally favoured as it automatically compensates for changes in the refractive index of air. The former can be used in conjunction with atmospheric monitoring to enable a correction to be made to measured displacements.
In the preferred embodiment of the invention, the Fabry Perot etalon cell
shown in Figure 5 comprises two partially reflecting and partially transmitting surfaces 21,24 which may be plane or configured as a confocal resonator, supported on an appropriate substrates 20, for example fused silica. The partially reflecting
surfaces (mirrors) are spaced apart by a convenient distance (eg. 50 mm) by a spacer tube 22 also fabricated in fused silica. In this embodiment, the etalon mirrors are
exposed to changes in the atmosphere by providing a breather tube 26. An air filter 25 is located in the breather tube to prevent contamination of the etalon mirrors.
Since displacement of the measuring reflector 7M produces a change in path
length of twice the displacement of the reflector, reference signatures are separated
by 50 mm, in the measuring range, when the separation of the mirrors in the optical
length artifact (Fabry Perot etalon) are 50 mm. Reflectance values of the etalon mirrors of 0.6 (0.4 transmitting) produce a suitable etalon finesse of around 6.
Figure 4 shows the mirror substrates hard sealed 23, or fused, to the spacer
tube in order to trap a fixed mass of air (or gas) in the etalon cavity.
Fused silica is cited for its low and predictable coefficient of thermal
expansion and also because it may be fabricated as a tube and is fusible to the mirror
substrates. Any other material with appropriate properties may be used for mirror substrates and spacer tube.
The measured distance between successive reference signatures is an optical distance in the measuring range which is precisely equal to the optical separation between the etalon mirrors. If the etalon is sealed, as shown in Figure 4, its optical length only varies with the thermal expansion of its mirror spacer. Its optical length must therefore be determined at an accurately known temperature, so
that its optical length can be calculated for any operating temperature.
If the etalon is open to atmosphere, as shown in Figure 5, its physical
length is always equal to the separation of successive reference signatures in the measuring range. In this case either: the physical length (not optical length) of the
etalon must be measured at a known temperature; or the separation between reference signatures in the measuring range accurately determined using an auxiliary precision interferometer, for example an atmospheric corrected Iodine stabilised helium-neon
laser, from which the physical length of the etalon is deduced at the measured
temperature. The apparatuses of Figures 1 or 7 may be adapted for this purpose.
Figure 2 shows a length measuring interferometer incorporating an
alternative optical length artifact 11 in the form of a general fixed path difference
interferometer. The optical length artifact shown in Figure 2 represents any form of two beam fixed path difference interferometer. The general fixed path interferometer may be variations or combinations of any of the following types: Michelson
Mach-Zehnder
Cyclic
Semi-cyclic
Grating
Shear plate
Figure 7 (a) and (b) shows two views of the above described apparatus
integrated into a laser length measuring interferometer. In this embodiment, the laser
source is a diode laser 16 located within a temperature controlled enclosure 14 which prevents mode hopping. A collimated beam 15 from this laser enters the measuring interferometer without necessarily, and preferably not, passing through the etalon. The two views in Figure 7 show how the respective beams from the diode laser and
from the broad band source are kept separate while sharing the same measuring
interferometer. This is facilitated using cube corner retroreflector 7R and 7M in the reference arm 6R and measurement arm 6M respectively.
Retroreflectors in the respective arms of the interferometer are, used
typically in the art, cube corner reflectors, which are insensitive to angular
misalignment. Cube corner reflectors may also be used to spatially separate the
incident beam from the return beam. This fact is used, in the embodiment shown in Figure 7, as a means of separating the measuring (laser) beam from the broad band beam. Alternatively, the respective beams from the diode laser and the broad band
source may be laterally displaced (out of the plane of the diagram). In this case, the retroreflectors 7R and 7M are 90 degree porro type reflecting prisms.
Figures 8 and 9 show alternative sites for the optical length artifact in the
reference arm and measurement arms of the measuring interferometer respectively.
Figure 10 shows the combining of the laser and broad band beams prior to entering the measuring interferometer, and their subsequent separation prior to their respective fringe detection. In this case beam combiner 18 and separator 17 are
appropriate dichroic filters. The optical length artifact could be located between the beam combiner 8 and the separator 17 instead of in the incident beam or the reference
or measurement arms.
Figure 11 shows the preferred embodiment of the invention in which the
etalon is located in the reference arm of a Michelson interferometer. In the preferred
embodiment, the etalon is reflective, which returns the light back along the same path in the reference arm. The measuring arm of the interferometer has a corresponding
mirror 30 which similarly reflects light back along the same path in the measuring
arm, and the light in this arm is subsequently recombined with the light in the
reference arm at the beam splitter/combiner in order for interference to occur, and
be detectable by the detector 9. Such an arrangement is commonly referred to as a double pass interferometer and has the advantage that, once set up, fringe visibility is unaffected by lateral displacement or rotation of cube corner retroreflectors in either arm of the interferometer. Because it is double path, interference signatures produced in the Michelson interferometer by virtue of the etalon are separated in distance along the measuring arm by half the length of the etalon.
Figure 12 shows an embodiment of the invention in which the optical length artifact is located in the reference arm, with its mirrors reflecting light back to the beam splitter/recombiner, without the use of additional reflecting surfaces in the reference arm. This embodiment retains double pass in the measuring arm which benefits from displacement tolerance of the associated retroreflector.
The beam combiner 8 used in the preferred embodiment of this invention, and also in any laser length measuring interferometer used in conjunction with this invention, is a non-polarising type proposed by Raines and Downs (Optica Acta,
1978, volume 25, number 7, pages 549 to 558) which imparts an optical phase delay such that reflected and transmitted fringe modulations are at 90 degrees to each other,
ie. they are in phase quadrature. Phase quadrature signals are used for up and down incremental counting and form the basis of position measurement known in the art.
The 90 degree phase delay is also useful when deriving a reference
signature of the type shown in Figure 3. The fringe detection means 9 detects fringes
generated at the beam combiner 8 both transmitted and reflected by the beam
combiner. These two signals are subsequently subtracted to provide reference signatures shown in Figure 3. By imparting a phase delay of 90 degrees between the two signals as provided by the method of Raines and Downs, the central region of a reference signature is made to pass through zero which, it is known in the art, provides a very accurate means of position detection.
The laser length interferometer is calibrated by counting the number of
signals generated by the laser length interferometer as the measurement reflector 7M is moved between detectable fringes produced by the optical length artefact.
The invention may be adapted for use with polarising length measuring interferometers known in the art.

Claims

1. Apparatus for precise length measurement calibration comprising a linear length measuring interferometer having a broad spectral band light source (1), a collimating means (2) for producing a collimated incident light beam (3), a beam splitter (4) for producing part beams (5R, 5M) which, in use, pass along a reference arm (6R) and a measurement arm (6M) of the interferometer respectively, a reference
reflector (7R) for reflecting the part beam passing along the reference arm, a measurement reflector (7M) for reflecting the part beam passing along the
measurement arm, beam combining means (8) for recombining the part beams (5R and 5M) reflected by the reference reflector and the measurement reflector, the
measurement reflector being movable to provide a measuring range (10); an optical
length artifact (11) for modifying the spectral composition of the incident light beam,
or of one of the part beams, or of a recombined beam, in a way that imposes a cyclically varying spectral intensity with wavelength across the broad spectral band of light originating from the light source; and the fringe detection means (9) providing at least two position reference signatures throughout the measuring range spaced
apart by an amount determined by the optical length artifact (11).
2. Apparatus according to claim 1 , in which the optical length artifact (11) is
a multiple beam interferometer.
3. Apparatus according to claim 2, in which the optical length artifact (11) is a Fab re Perot interferometer.
4. Apparatus according to claim 1 , in which the optical length artifact (11) is a two beam interferometer.
5. Apparatus according to claim 4, in which the optical length artifact (11) is
a two beam interferometer, having fixed path difference, of any of the generic types:
Michelson; Mach-Zehnder; Cyclic; Semicyclic; Grating; Shear plate.
6. Apparatus according to claim 3, in which the mirrors (21 ,24) of the Fabry Perot interferometer are separated using a stable material (22) whose coefficient of
thermal expansion is known to an appropriately good degree of accuracy.
7. Apparatus according to claim 6, in which the mirrors (21 ,24) are separated by a cylindrical tube (22).
8. Apparatus according to claim 6 or claim 7, in which the stable material is fused silica.
9. Apparatus according to claim 6 or claim 7, in which the stable material is a proprietary low expansion material such as ULE and Zerodur.
10. Apparatus according to any one of the claims 7, 8 or 9, in which the cylindrical tube (22), together with the etalon mirrors (21 ,24), seal and enclose a
fixed mass of gas inside the etalon cavity.
11. Apparatus according to any one of claims 1 to 9, in which the gas which determines the optical path length of the optical length artifact is representative of the
ambient air conditions, in terms of refractive index.
12. Apparatus according to any one of the claims 7, 8, or 9, in which the
cylindrical tube (21 ,24), together with the etalon mirrors, enclose a fixed volume of
gas inside the etalon cavity, but whose condition is allowed to vary as the ambient air
conditions so that the refractive index of the gas between the mirrors is representative of the refractive index of the ambient air in which interferometric length measurement is made.
13. Apparatus according to claim 12, in which an atmospheric breather tube
(26) is provided to allow the air volume inside the etalon cavity to communicate with the ambient atmosphere.
14. Apparatus according to claim 13, in which the atmospheric breather tube
(26) is fitted with an air filter (25) to prevent contamination of the etalon mirrors.
15. Apparatus according to any one of the preceding claims, in which the optical length artifact (11) is located to modify the spectral composition of the incident
beam.
16. Apparatus according to any one of claims 1 to 14, in which the optical length artifact (11) is located to modify the spectral composition of one of the part beams (5R or 5M).
17. Apparatus according to any one of claims 1 to 14, in which the optical
length artifact is located to modify the spectral composition of a recombined part
beam.
18. Apparatus according to any one of the preceding claims, in combination
with a laser interferometer comprising a laser source (16) for providing a collimated
laser beam (15) which, in use, passes, together with the broad band light beam,
through a common length measuring interferometer, for the purpose of obtaining continuous trains of cyclical quadrature signals, in the measuring range, from which incremental length measurements are made; at the same time obtaining at least two position reference signatures from the broad band light, in said range.
19. Apparatus according to claim 18, in which the laser source (16) is a
helium-neon laser.
20. Apparatus according to claim 18, in which the laser source (16) is a diode laser having a mode structure which endows the laser beam with an appropriate level
of coherence for the purpose of interferometric length measurement.
21. Apparatus according to claim 1, in which the optical length artifact (11) is an optical filter
22. Apparatus according to claim 21 , in which the optical length artifact (11) is a polarising optical filter of the Lyot or Sole types.
PCT/GB1998/000365 1997-02-25 1998-02-05 Apparatus for precise length measurement calibration WO1998038475A1 (en)

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GB9703928.3 1997-02-25

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CN109000567A (en) * 2018-10-22 2018-12-14 中国计量大学 The linearity comparison device and method of Fabry Perot etalon micro-displacement measuring system based on PSD
WO2019191698A3 (en) * 2018-03-30 2019-12-05 Si-Ware Systems Self-referenced spectrometer

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WO2004033986A1 (en) * 2002-10-11 2004-04-22 Agilent Technologies, Inc. Interferometer monitoring
US7423760B2 (en) 2002-10-11 2008-09-09 Agilent Technologies, Inc. Method and apparatus for monitoring an interferometer
EP1696201A1 (en) * 2005-02-23 2006-08-30 Leica Geosystems AG Phase noise compensation for an interferometer measuring absolute distance
WO2006089845A1 (en) * 2005-02-23 2006-08-31 Leica Geosystems Ag Phase noise compensation for interferometric absolute distance measuring
US7619719B2 (en) 2005-02-23 2009-11-17 Leica Geosystems Ag Phase noise compensation for interferometric absolute rangefinders
EP2816315A1 (en) * 2013-06-18 2014-12-24 Hexagon Technology Center GmbH Interferometric determination of distance change with laser diode, high bandwidth detection and fast signal processing
CN104237894A (en) * 2013-06-18 2014-12-24 赫克斯冈技术中心 Interferometric determination of distance change with laser diode
US9310178B2 (en) 2013-06-18 2016-04-12 Hexagon Technology Center Gmbh Interferometric determination of distance change with laser diode, high bandwidth detection and fast signal processing
US9645044B2 (en) 2014-09-30 2017-05-09 Corning Optical Communications LLC Controlled-contact method of measuring insertion loss in optical fiber connectors
DE102017101580A1 (en) 2017-01-26 2018-07-26 Picofine GmbH Measuring head for a laser interferometer and related measuring method
WO2019191698A3 (en) * 2018-03-30 2019-12-05 Si-Ware Systems Self-referenced spectrometer
US11085825B2 (en) 2018-03-30 2021-08-10 Si-Ware Systems Self-referenced spectrometer
CN108827162A (en) * 2018-09-10 2018-11-16 中国计量大学 The linearity comparison device and method of Fabry Perot etalon micro-displacement measuring system based on capacitance sensor
CN108827162B (en) * 2018-09-10 2023-08-18 中国计量大学 Device and method for comparing linearity of Fabry-Perot etalon micro-displacement measurement system based on capacitance sensor
CN109000567A (en) * 2018-10-22 2018-12-14 中国计量大学 The linearity comparison device and method of Fabry Perot etalon micro-displacement measuring system based on PSD
CN109000567B (en) * 2018-10-22 2023-08-18 中国计量大学 Linearity comparison device and method of Fabry-Perot etalon micro-displacement measurement system based on PSD

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