WO1998011461A1 - Anordnung zum aneinanderkoppeln von wellenleitern - Google Patents
Anordnung zum aneinanderkoppeln von wellenleitern Download PDFInfo
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- WO1998011461A1 WO1998011461A1 PCT/DE1997/002031 DE9702031W WO9811461A1 WO 1998011461 A1 WO1998011461 A1 WO 1998011461A1 DE 9702031 W DE9702031 W DE 9702031W WO 9811461 A1 WO9811461 A1 WO 9811461A1
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- Prior art keywords
- waveguide
- core layer
- optical
- arrangement according
- rib
- Prior art date
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12004—Combinations of two or more optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1228—Tapered waveguides, e.g. integrated spot-size transformers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/125—Bends, branchings or intersections
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/12097—Ridge, rib or the like
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12133—Functions
- G02B2006/12147—Coupler
Definitions
- the invention relates to an arrangement for coupling together at least two waveguides according to the preamble of patent claim 1.
- Arrangements for coupling optical waveguides to one another have a variety of applications in the implementation of components and for providing connections between optical components in the integrated optics.
- Component properties are particularly large, since optimization is only possible to a limited extent, e.g. through the use of mechanically clamped quantum wells and barriers or partial rearrangement (disordering) of quantum wells.
- the object of the invention specified in claim 1 is to provide an arrangement for coupling optical waveguides to one another which is compatible with planar waveguides, in particular ribbed waveguides.
- the arrangement according to the invention connects vertically superimposed waveguides.
- the waveguides each have at least one core layer. At least one of the waveguides is designed as a ridge or rib waveguide.
- the waveguides are spatially separated by a cladding layer with a lower refractive index than the core layers.
- the cladding layer effects an optical coupling of the two waveguides, so that the performance of the basic optical mode of the coupling structure in both
- Waveguides is guided. If at least part of the core layer or a cladding layer of a waveguide is removed or added, the optical power is forced into one of the two waveguides. If the construction of the coupling arrangement along the axis of the wave propagation is changed sufficiently weakly, the spatial shift of the optical power in the coupler takes place adiabatically, i.e. without losses due to optical radiation.
- the arrangement according to the invention advantageously produces a transition from phase mismatch to phase match between the two waveguides.
- the cross-sectional taper within the overlap region of the two waveguides causes the transition from phase mismatch to phase adaptation between the two waveguides.
- phase matching in particular the phase velocities of the optical waves each guided in the two waveguides are the same.
- the arrangement according to the invention can be used on all substrates, for example substrates made of SiO 2 , Si 3 N 4 , Al 2 O 3 , SiGe, with suitability for optical components.
- substrates made of SiO 2 , Si 3 N 4 , Al 2 O 3 , SiGe
- laser-active material such as GaN, GaAs, InP or more complex mixed crystals
- PLC planar lightwave circuit
- FTTL fiber-to-the-loop
- the invention advantageously also provides an arrangement for coupling at least two optical components, each of which has a core layer belonging to an optical waveguide for guiding an optical wave of a certain wavelength, which has the features specified in the characterizing part of claim 11.
- This arrangement is particularly advantageously suitable for the optical connection of optical components with a ribbed waveguide structure. Certain laser diodes in particular have such a structure.
- Preferred and advantageous embodiments of the arrangement according to claim 11 emerge from claims 12 to 17.
- Overlap area not essential. Also, phase matching in an overlap area is not essential, so that the overlapping core layers can be the core layers of single-mode waveguides.
- An arrangement according to one of claims 11 to 17 greatly simplifies the integration of the components. Since the optical field can be expanded to a greater extent in the waveguide 4 containing the further core layer, the coupling of the arrangement to glass fiber waveguides is advantageously facilitated.
- FIG. 1 shows a cross section perpendicular to the axis of the wave propagation through the overlap area of a first exemplary embodiment of the arrangement according to the invention
- FIG. 2 shows a plan view of the first exemplary embodiment, the cross section according to FIG. 1 being taken along the section line III-III in this FIG. 2,
- Figure 3 shows a longitudinal section through the first
- FIGS. 4a-4f cross sections through the exemplary embodiment according to FIGS. 1 to 3 along the section lines I-I to V-V and IIV-IIV in FIG. 2,
- FIG. 5 shows a top view of a high-power laser diode in which an arrangement according to the invention is used
- FIG. 6 shows a longitudinal section through the laser diode according to FIG. 5 along the axis of the wave propagation
- FIG. 7 shows a plan view of a DBR laser diode in which an arrangement according to the invention is used
- FIG. 8 shows a longitudinal section through the DBR laser diode according to FIG. 7 along the axis of the wave propagation
- Figure 9 is a plan view of a DFB laser diode to which an optical modulator according to the invention
- Figure 10 shows a longitudinal section through the DFB laser diode
- FIG. 11 shows a plan view of a bidirectional module with laser diode and photodiodes, in which an arrangement according to the invention is used,
- Figure 12 is a cross section perpendicular to the axis of wave propagation through the
- Figure 13 is a cross section perpendicular to the axis of wave propagation through the
- FIG. 14 shows a cross section perpendicular to the axis of wave propagation through the overlap region of an embodiment of the arrangement according to the invention similar to the first exemplary embodiment, in which the other waveguide is formed in the rib of the rib waveguide, and
- FIG. 15 shows an arrangement similar to the arrangement according to FIGS. 1 to 3 and shown in the same representation as in FIG. 2, in which an optical waveguide forms a waveguide fork with at least two waveguide branches, one component being arranged in each waveguide branch.
- Exemplary embodiments are the arrangement according to the invention, generally designated 1, for coupling together at least two waveguides, if necessary. integrated on the surface 20 of a substrate 2 together with other devices such as laser diodes, modulators, photodiodes etc.
- the two waveguides of the arrangement 1 are designated 3 and 4 and each have a core layer for guiding an optical wave, the core layer of the waveguide 3 being designated 30 and the core layer of the waveguide 4 being designated 40.
- the core layers 30 and 40 are arranged parallel to the surface 20 of the substrate 2, the core layer 30 of the waveguide 3 being arranged at a greater vertical distance from the surface 20 than the core layer 40 of the waveguide 4. As a result, the core layers 30 and 40 are arranged at a vertical distance d34 from one another to these layers 30 and 40.
- the distance d34 between the two core layers 30 and 40 is to be chosen so large that an optical wave guided in one of the waveguides 3 or 4 does not substantially overlap in the other waveguides 4 or 3 when entering the overlap region 6 mentioned below.
- the distance d34 should be at least equal to half the wavelength ⁇ of an optical wave carried in a core layer 30 and / or 40.
- the two core layers 30 and 40 overlap one another in an overlap region 6 and are separated from one another in the overlap region 6 by a cladding layer 7 with a lower refractive index relative to the core layers 30 and 40, through which one in the core layer of a waveguide, for example the core layer 30 of the waveguide 3 guided optical wave can be coupled into the core layer 40 of the other waveguide 4.
- At least one of the two waveguides 3 and / or 4 is a rib waveguide, in which a rib 8 is formed on at least one flat side of its core layer 30 and / or 40, which runs along a core layer 30 and / or 40 and thus runs along the longitudinal axis 80 parallel to the surface 20 of the substrate 2.
- the longitudinal axis 80 defines the direction of an axis 31 and / or 41 of the propagation of an optical wave guided in the core layer 30 and / or 40 of the rib waveguide 3 and / or 4.
- Rib waveguide can be in a certain direction r of the longitudinal axis 80 and thus the axis 81 of the wave propagation a cross-sectional taper 9, which advantageously causes a transition from phase mismatch to phase matching between the two waveguides 3 and 4 takes place within the overlap region 6.
- phase mismatch in particular the phase velocities of the waves running in the two waveguides 3 and 4 are of equal size, as a result of which the coupling of optical power between the
- Waveguides 3 and 4 is advantageously particularly efficient.
- the section line III-III perpendicular to the axis 31 or 41 of the wave propagation of the cross section shown in FIG. 1 through the overlap region 6 lies in the area where the optical wave or the optical field in the waveguide 3 and waveguide 4 is performed.
- waveguide 3 consists of the cladding layers 32 and 7 and the core layer 30 arranged between these cladding layers 32 and 7 and is designed as a ribbed or ridge waveguide.
- His rib 8 is on the of the flat side 301 of the core layer 30 facing away from the surface 20 of the substrate 2 and protrudes upward from the cladding layer 32 covering the core layer 30 on this flat side 301, which like the cladding layer 7 has a lower refractive index than the core layer 30.
- the waveguide 4 consists of the cladding layers 7 and 42 and the core layer 40 arranged between these cladding layers 7 and 42, that is to say it has the cladding layer 7 in common with the waveguide 3, and is buried as one
- Ribbed waveguide formed. Its rib 8 is formed on the flat side 401 of the core layer 40 facing away from the surface 20 of the substrate 2 as part of this core layer 40 and projects upwards into the cladding layer 7.
- the cladding layer 42 which like the cladding layer 7 separating the core layers 30 and 40 from one another a lower refractive index than this core layer 40 is applied, for example, to the surface 20 of the substrate 2.
- the core layer 30 contains the
- Waveguide 3 at least one mixed crystal made of InGaAsP, the average refractive index of core layer 30 at a wavelength ⁇ of 1.55 ⁇ m being 3.46 and core layer 3 having a thickness d3 of 0.175 ⁇ m, for example.
- the core layer 40 of the waveguide 4 has a thickness d4 of 0.1 ⁇ m outside the rib 8 and 0.125 ⁇ m in the region of the rib 8, contains a mixed crystal made of InGaAsP with a band edge wavelength of 1.46 ⁇ m and has an average optical refractive index the wavelength ⁇ of 1.55 ⁇ m from 3.46.
- the cladding layer 32 of the waveguide 3 consists of p-doped InP with a thickness d32 of 75 n outside of the
- the two Waveguides 3 and 4 common cladding layer 7 consists of n-doped InP and has a thickness d34 of 1.3 ⁇ m and the cladding layer 42 of the waveguide 4 consists of n-doped InP.
- the rib 8 of the waveguide 3 has a cover layer 81 made of the p-doped ternary mixed crystal InGaAs and is not required for the function of the coupling device, but should, for example, enable the injection of optical carriers for laser operation. In this case, the
- Core layer 30 of the waveguide 3 contain a multi-quantum well layer (MQW layer).
- MQW layer multi-quantum well layer
- the exemplary coupling device 1 according to FIG. 1 is designed for an operating wavelength of 1.55 ⁇ m. Since the
- Waveguide 3 is a ridge waveguide, it can be designed like an MCRW laser diode, i.e. have a double heterostructure with p or n-doped cladding layers, have a strained MQW layer as core layer 30, have a distributed feedback grating (DFB grating) 82 indicated by grating lines 820 in FIG. 2, and with dielectric cover layers and contacts Electricity injection.
- a further waveguide 4 is integrated by inserting the other core layer 4.
- the DFB grating 82 is not required for the function of the arrangement 1, but should, if necessary, the frequency selection e.g. enable in a laser diode.
- the section lines II to VII-VII in FIG. 3 identify different areas, essentially only the areas lying between the section lines II-II, III-III and IV-IV are required for the coupling from the waveguide 3 into the waveguide 4.
- the area between the cutting lines II and II-II is the undisturbed rib waveguide 3, ie there is no further waveguide under the waveguide 3 in this area.
- the areas between the cutting lines VV, VI-VI and VII-VII are at the end of the coupling device if the rib 8 of the waveguide 3 is removed when the core layer 40 is exposed or when only the lower buried rib waveguide 4 is present.
- the areas between the intersection lines VV, VI-VI and VII -VII therefore describe the transition from the disturbed to the undisturbed rib waveguide 4, which lies in the area to the right of the intersection line VII-VII.
- the undisturbed rib waveguide 4 is a rib waveguide without an overlying waveguide.
- FIGS. 4a to 4f and taken along section lines II to VV and VII-VII through the exemplary embodiment according to FIGS. 1 to 3 show optical intensity distributions 91 to 96 in these cross sections, only a cross section through section line VI- VI is not shown in Figure 3.
- the optical field is transferred from the waveguide 3 into the waveguide 4 in the direction r.
- the undisturbed waveguide 4 in the area between II and II-II and the undisturbed waveguide 4 in the area to the right of VII-VII a certain Difference in the optical effective refractive indices must have, ie in the coupling zone in the area between III-III and IV-IV in the overlap area 6 there must be an asymmetrical optical coupler.
- the waveguide 3 in the overlap region 6 changes little. If the width W of the rib 8 of the upper waveguide 3 is reduced, the effective refractive index of this waveguide 3 is reduced. If this effective index is approximately equal to or less than the effective refractive index of the lower waveguide 4, the optical power in the lower waveguide 4 coupled over. If this reduction in the width W of the rib 8 of the waveguide 3 takes place over a sufficiently long distance, this power transition is adiabatic, i.e. ideally without
- a coupling device 1 suitable for a laser diode with a rib waveguide requires a difference between the effective refractive indices or refractive indices of the undisturbed waveguides 3, 4 of approximately 0.01 or greater. Adhering to certain values for the effective refractive index is a common requirement for the manufacturer of DFB lasers, since a bandwidth for the effective refractive index of ⁇ 0.001 is required to keep the emission wavelength in the range of ⁇ 1.6 nm (distance between two wavelength division multiplex channels).
- Laser diode 50 has an anti-reflective layer 51 and a coupling device 1 according to the invention on the light exit side and mirroring layers 52 on the back and formed on a substrate 2 made of n-doped GaAs.
- the core layer 30 of the waveguide 3 is a laser-active MQW layer made of AlGaAs / GaAs to form the double heterostructure is surrounded by p-doped AlGaAs and n-doped AlGaAs of type 1.
- a further n-doped layer is made as the lower core layer layer 40
- Type 2 AlGaAs embedded which has a lower Al content than the surrounding layer of AlGaAs.
- the surrounding layer of AlGaAs forms the cladding layer 7 between the core layers 30 and 40 and the cladding layer 42 between the core layer 40 and the surface 20 of the substrate 2.
- the overlap region 6 of the core layers 30 and 40 extends in the direction of the laser diode over the entire length Axis 31 or 41 of the wave propagation. With 53 a connection contact is designated.
- a window structure is attached on the light exit side, which forces the optical field into the lower waveguide 4.
- the optical power density at the end of the optically reinforcing upper core layer 30 is thereby greatly reduced and excessive heating due to absorption at the end of the upper core layer 30 is avoided.
- DBR laser diode distributed Bragg reflector laser diode
- FIGS. 7 and 8 an arrangement 1 according to the invention is provided on each of the two radiation sides of the diode 60.
- the grid lines 601 symbolize a distributed grid 61, similar to that in FIG. 2.
- the two reflectors 63 and 64 are connected to the electrically pumped laser-active core layer 30 via the coupling devices 1.
- the core layer 40 of the lower waveguide 40 is designed as a thin layer, as in the example according to FIGS. This core layer 40 carries the Bragg grating 61.
- the DBR diode 60 is formed on the surface 20 of a substrate 2 from n-doped InP, its core layer 40 consists of InGaAsP, its core layer 30 is an MQW layer and its cladding layer 7 and cladding layer 32 with rib 8 consist of InP, whereby the cladding layer and rib 8 are p-doped.
- the diode is designated 70 and the modulator 90
- the grid lines 701 in the area of the rib 8 of the rib waveguide 3 of the diode 70 symbolize a DFB grating 71 similar to that in FIG. 2.
- the rib waveguide 3 with rib 8 of the modulator 90 is constructed similarly to the rib waveguide 3 of the diode 70, but contains a different core layer 30, eg an MQW layer for the implementation of an electro absorption modulator.
- the components 70 and 90 are arranged on a common n-doped InP substrate 2.
- the core layer 40 of the lower waveguide 4 consists of InGaAsP and, as in FIG. 1, is designed as a thin layer in order to be able to use planar structuring techniques.
- the core layers 30 are MQW layers.
- the cladding layer 7 and cladding layers 32 with rib 8 consist of p-doped InP.
- the core layers 30 and 40 and the p-doped parts are implemented as electrically insulated islands. This form of electrical insulation is advantageously made possible by the use of the arrangements 1 according to the invention.
- dielectric insulation layers and contacts are still required, which are sufficiently described in Literaur.
- optical connections are arranged in a common plane below the components, which can therefore be called the optical rear wall in analogy to the speech control in device construction.
- the bidirectional module shown in FIG. 11 consists of a laser diode 110 for, for example, 1.5 ⁇ m wavelength, a grating coupler 120 for 1.5 ⁇ m wavelength and photodiodes 130.
- the grating coupler 120 is coupled to the laser diode 110 by an arrangement according to the invention, which is not shown in detail in the lower waveguide 4 this
- the photodiodes 130 are also coupled to the grating coupler 120 by arrangements according to the invention.
- the incoming light has a wavelength of 1.3 ⁇ m, for example, the light emitted by the diode 110 has a wavelength of 1.5 ⁇ m.
- the module according to FIG. 11 is an optical circuit with an optical rear wall, which also contains a planar coupler and curved waveguides. In Figure 11, the optical back wall is not only used to connect components, but other components are also included in the back wall.
- the arrangement 1 shown in cross section in FIG. 12 is designed for polarization-independent function overlap region 6, strictly speaking in the region where the optical field is guided in the upper waveguide 3 and lower waveguide 4.
- the upper waveguide 3 is a
- the lower waveguide 4 is a buried rib waveguide in which, in contrast to FIG. 1, the core layer 40 of the lower waveguide 4 is made thicker and with a mixed crystal made of InGaAsP with a lower refractive index.
- the band edge wavelength of the mixed crystal made of InGaAsP is, for example, 1.05 ⁇ m.
- the two waveguides 3 and 4 common cladding layer 7 made of n-doped InP is somewhat thinner than in FIG. 1 and has a thickness d34 of 1.1 ⁇ m, for example.
- the intensity distribution is also shown and designated 200.
- the lower waveguide 4 is a polarization-independent waveguide. Since its core layer 40 is thicker and its refractive index lower, the waveguide properties index and absorption are less dependent on the polarization of the optical field with the same fill factor. Filters, power dividers, etc. can then be implemented in the lower waveguide level. If the optical field in the lower waveguide 4 has a larger field diameter in the vertical direction or the -3 dB line of constant intensity is less elliptical than in the upper waveguide, ie more circular, Coupling into the lower waveguide 4 improves the coupling to an optical fiber, ie a mode transformer or taper is implemented. If contacts are implemented on the lower waveguide 4, a phase modulator for a Mach-Zehnder interferometer can be implemented there, for example.
- the cross section is taken in the area where the optical field is guided in the upper waveguide 3 and lower waveguide 4.
- the upper waveguide 3 is a buried heterostructure waveguide (BH waveguide)
- the lower waveguide 4 contains two core layers 40 and 41, one of which, for example the core layer 40, has a rib 8 so that the waveguide 4 is buried
- Ribbed waveguide is.
- the core layer 30 of the upper waveguide 3 contains a mixed crystal made of InGaAsP.
- the thickness d3 of this core layer 30 is z. B. 0.4 ⁇ m, the average refractive index of this
- Core layer 3 at a wavelength of 1.55 ⁇ m is, for example, 3.52.
- the core layers 40 and 41 of the lower waveguide 4 contain a mixed crystal made of InGaAsP.
- the thickness d41 of the core layer 41 is, for example, 0.55 ⁇ m, and the thickness d4 of the core layer 40 in the region of the rib 8, for example
- the mixed crystal made of InGaAsP for example, has a band edge wavelength of 1.05 ⁇ m.
- the mean optical refractive index of the core layers 41 and 40 is 3.25 at a wavelength of 1.55 ⁇ m.
- the upper cladding layer 32 consists of p-doped InP and has a thickness d32 of, for example, 2 ⁇ m, the two waveguides 3 and 4 common cladding layer 7 and the cladding layer 414 between the core layers 41 and 40 of the lower waveguide 4 consist of n-doped InP .
- the thickness d414 of the cladding layer 414 is, for example, equal to 1.1 ⁇ m and below that
- the core layer 40 lying cladding layers also consists of n-doped InP.
- the arrangement 1 according to FIG. 13 is designed for an operating wavelength of 1.5 ⁇ m. Since the upper waveguide 4 is a BH waveguide, it can be designed like a BH laser diode, i.e. a
- cladding layers 32 and 7 have double heterostructure with p or n-doped cladding layers 32 and 7, as core layer 3 have an InGaAsP layer with a band edge wavelength of 1.5 ⁇ m, and be provided with dielectric cover layers and contacts for current injection.
- a lower waveguide 4 is integrated by inserting two further core layers 41 and 40. By narrowing the width b of the core layer 3 of the upper waveguide 4 from approximately 1 ⁇ m to approximately ⁇ 0.3 ⁇ m, light is coupled out downward in the direction of the waveguide 4.
- the embodiment of Figure 14 differs from the example of Figures 1 to 3 essentially only in that the waveguide 4 is a rib waveguide with a rib 8 which protrudes from the cladding layer 7, and that the waveguide 3 with its core layer 3 in the Rib 8 of the waveguide 4 is formed.
- the exemplary embodiment according to FIGS. 9 and 10 and the exemplary embodiment according to FIG. 11 can each be designed as an arrangement for coupling together at least two optical components, in the first-mentioned example a semiconductor laser 70 and an optical modulator 90, in the second-mentioned example a semiconductor laser 110 and two optical detectors 130, are understood, each component 70, 90, 110, 130 each having a core layer 30 belonging to an optical waveguide 3 for guiding an optical wave of a specific wavelength ⁇ , this
- the optical waveguide 4 having the further core layer 40 forms a waveguide fork with at least two waveguide branches 4 'and 4' '. In each waveguide branch 4 ', 4' 'overlap similarly to the
- each component consists of one
- the waveguide fork 4 acts as an optical combiner which receives the light generated by each of the two components 70 or 110 in the relevant waveguide fork 4 'or 4' 'and feeds a main waveguide 4' '' of the fork 4.
- the two semiconductor lasers 70 can be designed such that they emit at different wavelengths. This can be achieved by a slight difference in the spacing of the grid lines 701 of a distributed feedback grid 71 of the two semiconductor lasers 70. As a result, for example, the emission wavelengths of the two semiconductor lasers 70 in the 1.55 ⁇ m wavelength band can vary e.g. 60 GHz different from each other.
- the arrangement according to FIG. 15 can advantageously be used as a component for optical millimeter wave generation, as will be required for future mobile communication systems (see, for example, [12]), one semiconductor laser 70 functioning as a signal laser and the other as a reference laser.
- the arrangement according to the invention greatly simplifies the integration of the two semiconductor lasers 70 or other components. Since the optical field in the waveguide 4 containing the core layer 40 is more extensive (see FIG. 4), the coupling of the arrangement to the glass fiber waveguide is advantageously facilitated.
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Abstract
Description
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Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10513153A JP2001500280A (ja) | 1996-09-13 | 1997-09-11 | 導波体の相互結合のための装置 |
EP97909128A EP0925520A1 (de) | 1996-09-13 | 1997-09-11 | Anordnung zum aneinanderkoppeln von wellenleitern |
US09/254,741 US6282345B1 (en) | 1996-09-13 | 1997-09-11 | Device for coupling waveguides to one another |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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DE19637396A DE19637396A1 (de) | 1996-09-13 | 1996-09-13 | Koppelanordnung zum Aneinanderkoppeln von Wellenleitern |
DE19637396.4 | 1996-09-13 |
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WO1998011461A1 true WO1998011461A1 (de) | 1998-03-19 |
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PCT/DE1997/002031 WO1998011461A1 (de) | 1996-09-13 | 1997-09-11 | Anordnung zum aneinanderkoppeln von wellenleitern |
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US (1) | US6282345B1 (de) |
EP (1) | EP0925520A1 (de) |
JP (1) | JP2001500280A (de) |
DE (1) | DE19637396A1 (de) |
WO (1) | WO1998011461A1 (de) |
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KR100759805B1 (ko) * | 2005-12-07 | 2007-09-20 | 한국전자통신연구원 | 광증폭 듀플렉서 |
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JP5764776B2 (ja) * | 2010-10-08 | 2015-08-19 | 国立研究開発法人産業技術総合研究所 | 光学変換素子 |
US9040919B2 (en) * | 2010-10-25 | 2015-05-26 | Thomas E. Darcie | Photomixer-waveguide coupling tapers |
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WO2013010058A1 (en) | 2011-07-13 | 2013-01-17 | Innolume Gmbh | Adiabatic mode-profile conversion by selective oxidation for photonic integrated circuit |
GB2492996B (en) * | 2011-07-19 | 2018-01-10 | Huawei Tech Co Ltd | Coupled waveguide apparatus and structures therefor |
US9091819B2 (en) | 2013-04-11 | 2015-07-28 | International Business Machines Corporation | Grating edge coupler and method of forming same |
US9690122B2 (en) | 2014-02-26 | 2017-06-27 | National Institute Of Advanced Industrial Science And Technology | Optical semiconductor device |
EP3091379B1 (de) | 2015-05-05 | 2020-12-02 | Huawei Technologies Co., Ltd. | Schema zur optischen kopplung |
EP3145037B1 (de) * | 2015-09-21 | 2021-04-07 | Huawei Technologies Co., Ltd. | Optische halbleitervorrichtung |
JP7306125B2 (ja) * | 2019-07-18 | 2023-07-11 | 住友電気工業株式会社 | スポットサイズ変換器およびその製造方法 |
US11480734B2 (en) * | 2019-09-25 | 2022-10-25 | Nexus Photonics, Inc | Active-passive photonic integrated circuit platform |
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JPH0843651A (ja) * | 1994-08-04 | 1996-02-16 | Hoechst Japan Ltd | 光導波路素子 |
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1996
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-
1997
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- 1997-09-11 JP JP10513153A patent/JP2001500280A/ja active Pending
- 1997-09-11 US US09/254,741 patent/US6282345B1/en not_active Expired - Lifetime
- 1997-09-11 WO PCT/DE1997/002031 patent/WO1998011461A1/de not_active Application Discontinuation
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Also Published As
Publication number | Publication date |
---|---|
DE19637396A1 (de) | 1998-03-19 |
US6282345B1 (en) | 2001-08-28 |
EP0925520A1 (de) | 1999-06-30 |
JP2001500280A (ja) | 2001-01-09 |
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