WO1997030933A1 - Pure fused silica, furnace and method - Google Patents
Pure fused silica, furnace and method Download PDFInfo
- Publication number
- WO1997030933A1 WO1997030933A1 PCT/US1997/001681 US9701681W WO9730933A1 WO 1997030933 A1 WO1997030933 A1 WO 1997030933A1 US 9701681 W US9701681 W US 9701681W WO 9730933 A1 WO9730933 A1 WO 9730933A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- refractory
- accordance
- fumace
- halogen
- fused silica
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1407—Deposition reactors therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1484—Means for supporting, rotating or translating the article being formed
- C03B19/1492—Deposition substrates, e.g. targets
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/53—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone involving the removal of at least part of the materials of the treated article, e.g. etching, drying of hardened concrete
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/50—Multiple burner arrangements
- C03B2207/52—Linear array of like burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/50—Multiple burner arrangements
- C03B2207/54—Multiple burner arrangements combined with means for heating the deposit, e.g. non-deposition burner
Definitions
- An article of relatively pure fused silica and a furnace and method for producing the article.
- Relatively pure metal oxides are produced by thermal decomposition of precursors and deposition ofthe resulting oxides.
- the precursor may take the form of a vapor, or may be carried by a vapor. It may be decomposed by either flame hydrolysis or pyrolysis.
- One such process is production of fused silica by hydrolysis or pyrolysis of silicon tetrachloride.
- Early patents disclosing such processes for producing silica are United States Patent No. 2,239,551 (Nordberg) and 2,272,342 (Hyde).
- a commercial application of flame hydrolysis involves forming and depositing particles of fused silica to form large bodies (boules). Such boules may be used individually, or may be finished and integrated together into large optical bodies, such as telescope mirrors.
- SiCl 4 is hydrolyzed, and the hydrolyzed vapor is passed into a flame to form molten particles of fused silica.
- the particles are continuously deposited on a bait, or in a crucible, known as a cup, to form a boule.
- these measures constituted providing a purer zircon refractory for use in constructing a furnace in which the fused silica was deposited to form a boule.
- dispersants, binders and water relatively free of sodium ions in producing zircon refractory components for the fumace.
- UV wavelength radiation from an excimer type laser This laser emits radiation at about 193 nm and 248 nm wavelengths.
- One aspect ofthe present invention resides in an improved method of producing a fused silica body by introducing a silicon-containing compound into a flame to form molten silica particles and collecting those particles in the form of a fused silica body in a fumace constructed of refractory materials, the improvement comprising constructing at least a portion ofthe furnace from refractory materials that have been exposed to a reactive, halogen-containing gas to react with and thereby cleanse the refractory of contaminating metals.
- a further aspect ofthe invention resides in a relatively pure fused silica material in which the fused silica has a transmittance value of at least 99.5% for 248 nm radiation, a transmittance value of at least 98% for 193 nm radiation, at least a substantial portion of the body has an acceptable fluorescence level when exposed to such radiation, and the fused silica material has a content of contaminating metal ions less than 100 ppb.
- the invention further resides in a refractory fumace for collecting molten silica particles in the form of a solid body, at least a portion ofthe fumace being constructed of a refractory that contains metal contaminants in an amount less than 300 ppm.
- FIGURE in the accompanying drawing is a schematic representation of an apparatus and process for depositing a large body of fused silica.
- the conventional boule process used in making fused silica is a one-step process.
- a carrier gas is bubbled through a SiCl 4 feedstock that is maintained at a specified low temperature.
- the vaporous SiCl 4 is entrained in the carrier gas and is thereby transported to the reaction site.
- the reaction site is comprised of a number of burners that combust and oxidize the vaporous SiCl 4 to deposit silica at a temperature greater than 1600° C.
- the apparatus and transfer system be capable of vaporizing the feedstock and delivering the vaporized feedstock to a burner in the vapor state.
- the apparatus and process may remain substantially unchanged with one major exception.
- the SiCl 4 feedstock is replaced by a polymethylsiloxane.
- Use of this substitute feedstock may require some minor adjustments, such as a somewhat higher delivery temperature (e.g., 100-150° C). This is due to the siloxane having a somewhat lower vapor pressure than SiCl 4 .
- FIGURE 1 in the accompanying drawing is a schematic representation of an apparatus and process for producing and depositing molten silica particles to build up a large, fused silica boule.
- the apparatus generally designated by the numeral 10, includes a feedstock source 12. Nitrogen, or a nitrogen/oxygen mixture, is used as the carrier gas.
- a bypass stream of nitrogen 14 is introduced to prevent saturation ofthe vaporous stream.
- the vaporous reactant is passed through a distribution mechamsm to the reaction site wherein a number of burners 18 are present in close proximity to a furnace crown 20.
- the reactant is combined with a fuel oxygen mixture 22 at these burners, and is combusted and oxidized to deposit silica at a temperature greater than 1 00° C.
- High purity metal oxide soot and heat are directed downwardly through the refractory fumace crown 20.
- the silica is immediately deposited and consolidated to a non-porous mass 24 on hot cup 26.
- Contaminating metals can be present in the raw materials employed in production of fumace refractories.
- the metals may also be entrained during sintering ofthe refractory, or during any subsequent operations, such as sawing or grinding.
- Zircon is a relatively clean refractory, particularly when prepared as described in the Sempoiinski et al. patents.
- the superior transmission properties required for such demanding uses as microlithography applications require control of all metal contaminants at a level below 100 parts per billion (ppb).
- this degree of contaminating metal control in a collection fumace can be achieved by constructing the furnace of refractory materials containing less than 300 parts per million (ppm) ofthe contaminating metals.
- ppm parts per million
- zircon refractories used in a collection furnace for fused silica deposition This desirable end is accomplished, in accordance with the present invention, by firing the fumace refractories in a halogen-containing atmosphere. The halogen reacts with and removes the contaminating metals from at least the exposed surface ofthe refractory.
- the cleansing gas can be used in essentially pure form. However, we have found it convenient, and effective, to employ as little as 5% ofthe cleansing gas in an inert gas, such as helium or argon, with a somewhat longer treatment time.
- the cleansing treatment may employ a continuous flow ofthe halogen gas. Alternatively, a pulsed type treatment may be used wherein gas is repeatedly introduced into the firing chamber and subsequently exhausted.
- the cleansing action can occur at a temperature as low as 700°C. However, it is usually preferred to employ somewhat higher temperatures in the range of 1100 to 1500°C. Above 1500°C, zircon starts to thermally dissociate, thereby resulting in a weaker refractory body.
- the invention is here described with reference to treatment of zircon refractory fumace elements. However, it will be appreciated that it is also applicable to cleansing contaminating metals from other types of refractory articles.
- the cleansing process on a refractory body may be carried out either prior to assembly into a fumace or after assembly.
- the treatment may also be carried out during production ofthe refractory.
- High temperature refractories, such as zircon are sintered in air at temperatures in excess of 1500°C. As the sintered furnace components are being cooled, the cooling step can be interrupted at an appropriate temperature, for example, 1200°C.
- the sintering fumace is then switched to a halogen-containing atmosphere, and the temperature maintained for the necessary time to cleanse the refractory ofthe contaminating metals.
- the use of refractories chemically cleaned in accordance with the invention provides several advantages.
- the cleaner deposition fumace provides a fused silica product of high purity. It provides high, consistent yields of fused silica glass having an acceptably high transmission of short wavelength UV radiation and a low level of fluorescence. Further, the glass is less prone to increases in radiation damage and fluorescence in service. These desired ends are achieved without requiring change in, or compromise of, either the fumace design or the silica forming and deposition process.
- the effectiveness ofthe cleansing treatment was demonstrated by comparing two sets of fused silica test pieces. One set was taken from boules deposited in an untreated collection fumace. A second set was taken from boules deposited in a treated fumace.
- the fiirnaces were constructed in essentially identical design with sintered zircon refractory crowns and cup liners.
- the refractories in the treated fumace were soaked for eight hours in a furnace operating at 1300°C. A flowing atmosphere of 5.7% Cl 2 and
- the fused silica boules described above were also analyzed to determine the percentage of boule depth that exhibited an acceptable low level of fluorescence.
- Fluorescence is determined by integrating the intensities measured over the range of 400- 700 nm. To be acceptable, a glass test piece must exhibit a value, as so determined, that is below 4.2x10' 9 watts/cm 2 when the glass is exposed to an emitting laser operating at 15 mj/cm 2 and 200 Hz. Glass from the untreated fumace was completely unacceptable. There was no portion ofthe boule in which the fluorescence value was acceptably low. Glass from the treated fumace had acceptable glass to a depth of 3.53 inches. This represented 59.3% of the total depth.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Structural Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP97905726A EP0881987A4 (en) | 1996-02-21 | 1997-02-11 | Pure fused silica, furnace and method |
US09/117,980 US6096761A (en) | 1996-02-15 | 1997-02-11 | Esters of 3-hydroxy-piperidinemethanol derivatives |
US09/125,208 US6174509B1 (en) | 1997-02-11 | 1997-02-11 | Pure fused silica, furnace and method |
JP9530179A JP2000505036A (en) | 1996-02-21 | 1997-02-11 | Pure fused silica, furnace and method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US1199796P | 1996-02-21 | 1996-02-21 | |
US60/011,997 | 1996-02-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1997030933A1 true WO1997030933A1 (en) | 1997-08-28 |
Family
ID=21752895
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1997/001681 WO1997030933A1 (en) | 1996-02-15 | 1997-02-11 | Pure fused silica, furnace and method |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0881987A4 (en) |
JP (1) | JP2000505036A (en) |
WO (1) | WO1997030933A1 (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1030822A1 (en) * | 1997-09-24 | 2000-08-30 | Corning Incorporated | FUSED SiO 2?-TiO 2? GLASS METHOD |
EP1160209A2 (en) * | 2000-05-30 | 2001-12-05 | Tosoh Quartz Corporation | Method and apparatus for manufacturing quartz glass ingot |
US6410192B1 (en) | 1999-11-15 | 2002-06-25 | Corning Incorporated | Photolithography method, photolithography mask blanks, and method of making |
EP1358132A1 (en) * | 2000-12-21 | 2003-11-05 | Corning Incorporated | Refractories for fused silica production furnaces |
US9399585B2 (en) | 2010-12-02 | 2016-07-26 | Saint-Gobain Ceramics & Plastics, Inc. | Zircon components |
CN107873049A (en) * | 2015-06-10 | 2018-04-03 | 康宁股份有限公司 | The method that metal deposit is removed from glass |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2239551A (en) * | 1939-04-22 | 1941-04-22 | Corning Glass Works | Method of making sealing glasses and seals for quartz lamps |
US2272342A (en) * | 1934-08-27 | 1942-02-10 | Corning Glass Works | Method of making a transparent article of silica |
JPS54134721A (en) * | 1978-04-11 | 1979-10-19 | Nippon Telegraph & Telephone | Manufacture of anhydrous glass parent material for optical fiber |
JPS54160414A (en) * | 1978-06-08 | 1979-12-19 | Nippon Telegraph & Telephone | Production of optical communication fiber material |
US4552576A (en) * | 1983-08-22 | 1985-11-12 | The Furukawa Electric Co., Ltd. | Method of fabricating optical glass base material and apparatus for fabricating the same |
US4956059A (en) * | 1988-10-29 | 1990-09-11 | Heraeus Quarzschmelze Gmbh | Process for the purification of granular silicon dioxide |
US5043002A (en) * | 1990-08-16 | 1991-08-27 | Corning Incorporated | Method of making fused silica by decomposing siloxanes |
US5332702A (en) * | 1993-04-16 | 1994-07-26 | Corning Incorporated | Low sodium zircon refractory and fused silica process |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA936790A (en) * | 1971-03-31 | 1973-11-13 | J. Kriegler Rudolph | Sio2 structure having resistance to mobile ion contaminates and method for obtaining same |
-
1997
- 1997-02-11 WO PCT/US1997/001681 patent/WO1997030933A1/en not_active Application Discontinuation
- 1997-02-11 JP JP9530179A patent/JP2000505036A/en not_active Ceased
- 1997-02-11 EP EP97905726A patent/EP0881987A4/en not_active Ceased
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2272342A (en) * | 1934-08-27 | 1942-02-10 | Corning Glass Works | Method of making a transparent article of silica |
US2239551A (en) * | 1939-04-22 | 1941-04-22 | Corning Glass Works | Method of making sealing glasses and seals for quartz lamps |
JPS54134721A (en) * | 1978-04-11 | 1979-10-19 | Nippon Telegraph & Telephone | Manufacture of anhydrous glass parent material for optical fiber |
JPS54160414A (en) * | 1978-06-08 | 1979-12-19 | Nippon Telegraph & Telephone | Production of optical communication fiber material |
US4552576A (en) * | 1983-08-22 | 1985-11-12 | The Furukawa Electric Co., Ltd. | Method of fabricating optical glass base material and apparatus for fabricating the same |
US4956059A (en) * | 1988-10-29 | 1990-09-11 | Heraeus Quarzschmelze Gmbh | Process for the purification of granular silicon dioxide |
US5043002A (en) * | 1990-08-16 | 1991-08-27 | Corning Incorporated | Method of making fused silica by decomposing siloxanes |
US5332702A (en) * | 1993-04-16 | 1994-07-26 | Corning Incorporated | Low sodium zircon refractory and fused silica process |
US5395413A (en) * | 1993-04-16 | 1995-03-07 | Corning Incorporated | Method for producing fused silica with low sodium ion contamination level |
Non-Patent Citations (1)
Title |
---|
See also references of EP0881987A4 * |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1030822A1 (en) * | 1997-09-24 | 2000-08-30 | Corning Incorporated | FUSED SiO 2?-TiO 2? GLASS METHOD |
EP1030822A4 (en) * | 1997-09-24 | 2004-12-15 | Corning Inc | FUSED SiO2-TiO2 GLASS METHOD |
US6410192B1 (en) | 1999-11-15 | 2002-06-25 | Corning Incorporated | Photolithography method, photolithography mask blanks, and method of making |
US6475682B2 (en) | 1999-11-15 | 2002-11-05 | Corning Incorporated | Photolithography method, photolithography mask blanks, and method of making |
EP1160209A2 (en) * | 2000-05-30 | 2001-12-05 | Tosoh Quartz Corporation | Method and apparatus for manufacturing quartz glass ingot |
EP1160209A3 (en) * | 2000-05-30 | 2002-07-03 | Tosoh Quartz Corporation | Method and apparatus for manufacturing quartz glass ingot |
EP1358132A1 (en) * | 2000-12-21 | 2003-11-05 | Corning Incorporated | Refractories for fused silica production furnaces |
EP1358132A4 (en) * | 2000-12-21 | 2004-12-29 | Corning Inc | Refractories for fused silica production furnaces |
US6923021B2 (en) | 2000-12-21 | 2005-08-02 | Corning Incorporated | Method and apparatus for fused silica production |
US9399585B2 (en) | 2010-12-02 | 2016-07-26 | Saint-Gobain Ceramics & Plastics, Inc. | Zircon components |
US9403689B2 (en) | 2010-12-02 | 2016-08-02 | Saint-Gobain Ceramics & Plastics, Inc. | Zircon components |
CN107873049A (en) * | 2015-06-10 | 2018-04-03 | 康宁股份有限公司 | The method that metal deposit is removed from glass |
Also Published As
Publication number | Publication date |
---|---|
JP2000505036A (en) | 2000-04-25 |
EP0881987A4 (en) | 1999-05-12 |
EP0881987A1 (en) | 1998-12-09 |
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