WO1994028464A1 - Chelateurs degradables derives de l'acide succinique, leurs utilisations et leurs compositions - Google Patents
Chelateurs degradables derives de l'acide succinique, leurs utilisations et leurs compositions Download PDFInfo
- Publication number
- WO1994028464A1 WO1994028464A1 PCT/US1994/005674 US9405674W WO9428464A1 WO 1994028464 A1 WO1994028464 A1 WO 1994028464A1 US 9405674 W US9405674 W US 9405674W WO 9428464 A1 WO9428464 A1 WO 9428464A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- disuccinic acid
- solution
- acid
- polyamino
- copper
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title description 25
- 150000003443 succinic acid derivatives Chemical class 0.000 title description 2
- 239000002253 acid Substances 0.000 claims abstract description 127
- 239000000243 solution Substances 0.000 claims abstract description 101
- 239000013522 chelant Substances 0.000 claims abstract description 77
- 229910052751 metal Inorganic materials 0.000 claims abstract description 69
- 239000002184 metal Substances 0.000 claims abstract description 69
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 49
- 229910052802 copper Inorganic materials 0.000 claims abstract description 49
- 239000010949 copper Substances 0.000 claims abstract description 49
- 238000000034 method Methods 0.000 claims abstract description 47
- 239000007864 aqueous solution Substances 0.000 claims abstract description 31
- 239000012530 fluid Substances 0.000 claims abstract description 27
- 239000007844 bleaching agent Substances 0.000 claims abstract description 23
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims abstract description 20
- 238000004061 bleaching Methods 0.000 claims abstract description 17
- 239000000463 material Substances 0.000 claims abstract description 12
- 238000007747 plating Methods 0.000 claims abstract description 12
- 230000008021 deposition Effects 0.000 claims abstract description 10
- 150000001879 copper Chemical class 0.000 claims abstract description 9
- VKZRWSNIWNFCIQ-WDSKDSINSA-N (2s)-2-[2-[[(1s)-1,2-dicarboxyethyl]amino]ethylamino]butanedioic acid Chemical compound OC(=O)C[C@@H](C(O)=O)NCCN[C@H](C(O)=O)CC(O)=O VKZRWSNIWNFCIQ-WDSKDSINSA-N 0.000 claims description 50
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 44
- -1 oxyethylenenitrilo Chemical class 0.000 claims description 36
- 229910052757 nitrogen Inorganic materials 0.000 claims description 34
- 150000003839 salts Chemical group 0.000 claims description 21
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 17
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 16
- 125000004432 carbon atom Chemical group C* 0.000 claims description 13
- 239000008139 complexing agent Substances 0.000 claims description 9
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 8
- 125000002947 alkylene group Chemical group 0.000 claims description 8
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 claims description 7
- 239000003638 chemical reducing agent Substances 0.000 claims description 7
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 7
- 239000001384 succinic acid Substances 0.000 claims description 7
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 238000007772 electroless plating Methods 0.000 claims description 6
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 claims description 5
- 150000004820 halides Chemical class 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical class [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 150000002500 ions Chemical class 0.000 claims description 4
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 claims description 4
- 229920000768 polyamine Polymers 0.000 claims description 3
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 claims description 2
- 229910001447 ferric ion Inorganic materials 0.000 claims description 2
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 claims description 2
- 125000001424 substituent group Chemical group 0.000 claims description 2
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 claims description 2
- VKZRWSNIWNFCIQ-UHFFFAOYSA-N 2-[2-(1,2-dicarboxyethylamino)ethylamino]butanedioic acid Chemical compound OC(=O)CC(C(O)=O)NCCNC(C(O)=O)CC(O)=O VKZRWSNIWNFCIQ-UHFFFAOYSA-N 0.000 claims 1
- 150000007513 acids Chemical class 0.000 abstract description 37
- 230000003750 conditioning effect Effects 0.000 abstract description 5
- 150000004698 iron complex Chemical class 0.000 abstract description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 71
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 39
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 33
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 33
- 229910052742 iron Inorganic materials 0.000 description 32
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 30
- 239000007789 gas Substances 0.000 description 20
- 239000002250 absorbent Substances 0.000 description 19
- 230000002745 absorbent Effects 0.000 description 19
- 150000001875 compounds Chemical class 0.000 description 19
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 17
- 239000002738 chelating agent Substances 0.000 description 16
- 238000012545 processing Methods 0.000 description 16
- 229910021645 metal ion Inorganic materials 0.000 description 15
- 150000002739 metals Chemical class 0.000 description 14
- 230000003647 oxidation Effects 0.000 description 14
- 238000007254 oxidation reaction Methods 0.000 description 14
- 230000000087 stabilizing effect Effects 0.000 description 14
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 13
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 13
- 229910052717 sulfur Inorganic materials 0.000 description 12
- 239000011593 sulfur Substances 0.000 description 12
- 238000005406 washing Methods 0.000 description 12
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 10
- 239000008367 deionised water Substances 0.000 description 9
- 229910021641 deionized water Inorganic materials 0.000 description 9
- 229910052709 silver Inorganic materials 0.000 description 9
- 239000004332 silver Substances 0.000 description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 8
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 8
- 229910052783 alkali metal Inorganic materials 0.000 description 8
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 8
- 235000011114 ammonium hydroxide Nutrition 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 8
- 239000003054 catalyst Substances 0.000 description 8
- 239000001301 oxygen Substances 0.000 description 8
- 229910052760 oxygen Inorganic materials 0.000 description 8
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- 238000012360 testing method Methods 0.000 description 8
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 7
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 6
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 6
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 6
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 6
- 239000000654 additive Substances 0.000 description 6
- 239000011785 micronutrient Substances 0.000 description 6
- 235000013369 micronutrients Nutrition 0.000 description 6
- 239000007800 oxidant agent Substances 0.000 description 6
- 239000011591 potassium Substances 0.000 description 6
- 229910052700 potassium Inorganic materials 0.000 description 6
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 230000002829 reductive effect Effects 0.000 description 6
- 239000002689 soil Substances 0.000 description 6
- 238000011282 treatment Methods 0.000 description 6
- 229910052725 zinc Inorganic materials 0.000 description 6
- 239000011701 zinc Substances 0.000 description 6
- 241000196324 Embryophyta Species 0.000 description 5
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 5
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 5
- 150000003863 ammonium salts Chemical class 0.000 description 5
- 230000015556 catabolic process Effects 0.000 description 5
- 238000006731 degradation reaction Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 235000014413 iron hydroxide Nutrition 0.000 description 5
- NCNCGGDMXMBVIA-UHFFFAOYSA-L iron(ii) hydroxide Chemical compound [OH-].[OH-].[Fe+2] NCNCGGDMXMBVIA-UHFFFAOYSA-L 0.000 description 5
- 229910052748 manganese Inorganic materials 0.000 description 5
- 239000011572 manganese Substances 0.000 description 5
- 238000001556 precipitation Methods 0.000 description 5
- 239000000376 reactant Substances 0.000 description 5
- 239000011734 sodium Substances 0.000 description 5
- 159000000000 sodium salts Chemical class 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical class OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- 239000006096 absorbing agent Substances 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 4
- 239000011976 maleic acid Substances 0.000 description 4
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 230000001590 oxidative effect Effects 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 239000010802 sludge Substances 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- 229910000029 sodium carbonate Inorganic materials 0.000 description 4
- 235000017550 sodium carbonate Nutrition 0.000 description 4
- 239000002594 sorbent Substances 0.000 description 4
- 239000003381 stabilizer Substances 0.000 description 4
- 239000004753 textile Substances 0.000 description 4
- 238000004448 titration Methods 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- XWSGEVNYFYKXCP-UHFFFAOYSA-N 2-[carboxymethyl(methyl)amino]acetic acid Chemical compound OC(=O)CN(C)CC(O)=O XWSGEVNYFYKXCP-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical class OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 3
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical class [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 3
- 239000012670 alkaline solution Substances 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 239000000872 buffer Substances 0.000 description 3
- 239000006172 buffering agent Substances 0.000 description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 description 3
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 3
- 230000009920 chelation Effects 0.000 description 3
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 3
- 239000003599 detergent Substances 0.000 description 3
- 239000003814 drug Substances 0.000 description 3
- 238000004043 dyeing Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000003546 flue gas Substances 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 150000002505 iron Chemical class 0.000 description 3
- 150000002506 iron compounds Chemical class 0.000 description 3
- MVFCKEFYUDZOCX-UHFFFAOYSA-N iron(2+);dinitrate Chemical compound [Fe+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MVFCKEFYUDZOCX-UHFFFAOYSA-N 0.000 description 3
- 239000003446 ligand Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- WVMQIHZGHLSOGC-UHFFFAOYSA-N n'-(2-aminoethyl)ethane-1,2-diamine;butanedioic acid Chemical compound NCCNCCN.OC(=O)CCC(O)=O.OC(=O)CCC(O)=O WVMQIHZGHLSOGC-UHFFFAOYSA-N 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 230000008929 regeneration Effects 0.000 description 3
- 238000011069 regeneration method Methods 0.000 description 3
- 239000001632 sodium acetate Substances 0.000 description 3
- 235000017281 sodium acetate Nutrition 0.000 description 3
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 2
- XZXYQEHISUMZAT-UHFFFAOYSA-N 2-[(2-hydroxy-5-methylphenyl)methyl]-4-methylphenol Chemical compound CC1=CC=C(O)C(CC=2C(=CC=C(C)C=2)O)=C1 XZXYQEHISUMZAT-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- JJLJMEJHUUYSSY-UHFFFAOYSA-L Copper hydroxide Chemical compound [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 2
- 239000005750 Copper hydroxide Substances 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- 241001465754 Metazoa Species 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 229920002873 Polyethylenimine Polymers 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical class OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 description 2
- 229940107816 ammonium iodide Drugs 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 238000006065 biodegradation reaction Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910021538 borax Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
- 239000003518 caustics Substances 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000003926 complexometric titration Methods 0.000 description 2
- 229910001956 copper hydroxide Inorganic materials 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 239000008151 electrolyte solution Substances 0.000 description 2
- 239000003623 enhancer Substances 0.000 description 2
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- 239000012209 synthetic fiber Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 150000003567 thiocyanates Chemical class 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- DHCDFWKWKRSZHF-UHFFFAOYSA-L thiosulfate(2-) Chemical compound [O-]S([S-])(=O)=O DHCDFWKWKRSZHF-UHFFFAOYSA-L 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/48—Sulfur compounds
- B01D53/50—Sulfur oxides
- B01D53/507—Sulfur oxides by treating the gases with other liquids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/1456—Removing acid components
- B01D53/1468—Removing hydrogen sulfide
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/48—Sulfur compounds
- B01D53/52—Hydrogen sulfide
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/54—Nitrogen compounds
- B01D53/56—Nitrogen oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C7/00—Multicolour photographic processes or agents therefor; Regeneration of such processing agents; Photosensitive materials for multicolour processes
- G03C7/30—Colour processes using colour-coupling substances; Materials therefor; Preparing or processing such materials
- G03C7/42—Bleach-fixing or agents therefor ; Desilvering processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/26—Processes using silver-salt-containing photosensitive materials or agents therefor
- G03C5/40—Chemically transforming developed images
- G03C5/44—Bleaching; Bleach-fixing
Definitions
- This invention relates to chelants, particularly uses of certain degradable chelants.
- Chelants or chelating agents are compounds which form coordinate covalent bonds with a metal ion to form chelates.
- Chelates are coordination compounds in which a central metal atom is bonded to two or more other atoms in at least one other molecule or ion (called ligand) such that at least one heterocyclic ring is formed with the metal atom as part of each ring.
- Chelants are used in a variety of applications including food processing, soaps, detergents, cleaning products, personal care products, pharmaceuticals, pulp and paper processing, water treatment, metalworking and metal plating solutions, textile processing solutions, fertilizers, animal feeds, herbicides, rubber and polymer chemistry, photofinishing, and oil field chemistry. Some of these activities result in chelants entering the environment. For instance, agricultural uses or detergent uses may result in measurable quantities of the chelants being in water. It is, therefore, desirable that chelants degrade after use.
- Biodegradability that is susceptibility to degradation by microbes, is particularly useful because the microbes are generally naturally present in environments into which the chelants may be introduced.
- Commonly used chelants like EDTA ethylenediamine tetraacetic acid
- EDTA ethylenediamine tetraacetic acid
- Tiedje "Microbial Degradation of Ethylenediaminetetraacetate in Soils and Sediments," Applied Microbiology, Aug. 1975, pp. 327-329.
- chelant compounds While degradation of the chelant compounds themselves is an important factor in ascertaining their fate in the environment, it is also important to consider the form(s) in which the compound is likely to be found in a natural environment like a lake, river or soil. In contact with such environments, chelants can frequently be expected to be in the form of their chelates with metals present in the environment or metals acquired in use of the chelant. The specific metal chelated depends on the metals present, their relative concentrations and availability, and the relative affinity (e.g.
- Some chelants are at least somewhat biodegradable, but have other disadvantages that reduce their suitability for applications that may result in their presence in water.
- Polyamino disuccinic acids have been recognized as having some chelating properties but have not received wide usage. For instance, a better known member of the family, namely ethylenediamine disuccinic acid (EDDS), has not been widely used because it has less ability to chelate certain metal ions such as calcium and magnesium than more widely used chelants.
- EDDS ethylenediamine disuccinic acid
- the preparation of polyamino disuccinic acids is discussed by Kezerian et al. in U.S. Patent 3,158,635 where their use in rust removal is disclosed. Atkinson in U.S. Patent 4,704,233 disclose use of EDDS in detergents to enhance removal of organic stains and mention its biodegradability.
- Biodegradation is of particular interest in photography, but finding a commercially useful biodegradable chelant has been difficult.
- Chelates are particularly useful in the photographic industry as iron complexes used as oxidizing agents, commonly referred to as bleaching agents, for removing silver halide images.
- the chelating agents that are most useful do not biodegrade in a desirable time (e.g. ethylenediaminetetraacetic acid, N- hydroxyethylethlyenediaminetriacetic acid, diethylenetriaminepentaacetic acid, cyclohexanediaminetetraacetic acid, and propylenediaminetetraacetic acid all biodegrade less than 80% in 28 days using the semicontinu ⁇ us activated sludge test.
- Chelating ability is not indicative of redox ability of chelates of metal ions capable of more than one valence state. Nor can redox ability be predicted from structure as explained by R. Wichmann et al in "A New Bleaching Agent,” presented at Imaging Science and Technology's 7th International Symposium on Photofinish ing Technology, and published in R. Wichmann et al. "Advance Printing of Paper Summaries; Seventh International Symposium on
- a chelant useful in photographic processes and in other redox applications particularly as a bleaching agent in photography, which chelant is greater than 80 percent biodegradable within less than 28 days according to the semicontinuous activated sludge test (ASTM D-2667-82).
- ferric chelates of polyamino disuccinic acids such as EDDS have been found to be excellent oxidizing agents for use in photographic bleach, bleach-fixing solutions for the bleaching of photographic silver.
- the invention includes a method of bleaching or bleach-fixing a photographic material which comprises contacting said material with a bleaching solution containing a bleaching agent comprising a ferric complex of a polyamino disuccinic acid.
- a bleaching solution containing a bleaching agent comprising a ferric complex of a polyamino disuccinic acid.
- This invention includes the use of a ferric complex of a polyamino disuccinic acid in bleaching or bleach-fixing a photographic material.
- the invention includes an aqueous photographic bleaching solution comprising a water-soluble halide and as the bleaching agent a ferric complex of a polyamino disuccinic acid.
- the invention also includes methods of electroless plating using various metals, especially copper. It includes a method of electroless deposition of copper upon a non-metallic surface receptive to the deposited copper characterized in that the non-metallic surface is contacted with an aqueous solution comprising a soluble copper salt and a polyamino disuccinic acid. Also included is a method of eldctroless copper plating which comprises immersing a receptive surface to be plated in an alkaline, autocatalytic copper bath comprising water, a water soluble copper salt, and a polyamino disuccinic acid complexing agent for cupric ion.
- the invention includes a bath for the electroless plating of copper characterized in that, a polyamino disuccinic acid is used as complexing agent for cupric ions.
- Another aspect of the invention includes a method for removing iron oxide deposits from a surface characterized in that the deposits are contacted with a solution comprising an ammoniated polyamino disuccinic acid.
- the invention includes a method of removing H2S from a fluid comprising contacting said fluid with an aqueous solution at a pH suitable for removing H2S characterized in that said solution contains at least one higher valence polyvalent metal chelate of a polyamino disuccinic acid.
- Another aspect of the gas conditioning invention includes a method of removing NO x from a fluid chaaracterized in that the fluid is contacted with an aqueous solution of at least one lower valence state polyvalent metal chelate of a polyamino disuccinic acid.
- Polyamino disuccinic acids are compounds having at least two amine groups to of at least two of which is attached a succinic acid (or salt) group, preferably only two nitrogen atoms each have one succinic acid (or salt) group attached thereto. That is, the compounds have at least two nitrogen atoms to which a succinic acid or salt group is attached and may optionally have additional nitrogen atoms with or without succinic groups.
- the compound has at least 2 nitrogen atoms, and due to the commercial availability of the amine, preferably has no more than 10 nitrogen atoms, more preferably no more than 6, most preferably 2 nitrogen atoms.
- no more tha'n 4 nitrogen atoms are substituted with succinic acid groups.
- Remaining nitrogen atoms most preferably are substituted with hydrogen atoms.
- the succinic acid groups are on terminal nitrogen atoms, most preferably each of which nitrogens also has a hydrogen substituent. Because of steric hindrance of two succinic groups on one nitrogen, it is preferred that each nitrogen having a succinic group has only one such group.
- Remaining bonds on nitrogens having a succinic acid group are preferably filled by hydrogens or alkyl or alkylene groups (linear, branched or cyclic including cyclic structures joining more than one nitrogen atom or more than one bond of a single nitrogen atom, preferably linear) or such groups having ether or thioether linkages, all of preferably from 1 to 10 carbon atoms, more preferably from 1 to 6 , most preferably from 1 to 3 carbon atoms, but most preferably hydrogen. More preferably, the nitrogen atoms are linked by alkylene groups, preferably each of from 2 to 12 carbon atoms, more preferably from 2 to 10 carbon atoms, even more preferably from 2 to 8, most preferably from 2 to 6 carbon atoms.
- the polyamino disuccinic acid compound preferably has at least 10 carbon atoms and preferably has at most 50, more preferably at most 40, most preferably at most 30 carbon atoms.
- succinic acid is used herein for the acid and salts thereof; the salts include metal cation (e.g. potassium, sodium) and ammonium or amine salts.
- Polyamino disuccinic acids useful in the practice of the invention are unsubstituted (preferably) or inertly substituted, that is substituted with groups that do not undesirably interfere with the activity of the polyamino disuccinic acid in a selected application, particularly photographic uses.
- Such inert substitutents include but are not limited to alkyl groups (preferably of from 1 to 6 carbon atoms); and aryl groups including arylalkyl and alkylaryl groups (preferably of from 6 to 12 carbon atoms), with alkyl groups preferred among these and methyl and ethyl groups preferred among alkyl groups.
- Inert substituents are suitably on any portion of the molecule, preferably on carbon atoms, more preferably on alkylene groups, for example alkylene groups between nitrogen atoms or between carboxylic acid groups, most preferably on alkylene groups between nitrogen groups.
- Preferred polyamino disuccinic acids include ethylenediamine N.N'- disuccinic acid, diethylenetriamine N,N"-disuccinic acid, triethylenetetraamine N,N'"-disuccinic acid, 1,6-hexamethylenediamine N,N'-disuccinic acid, tetraethylenepentamine N,N""-disuccinic acid, 2-hydroxypropylene-1,3-diamine N,N'-disuccinic acid, 1 ,2-propylenediamine N, N'-disuccinic acid, 1 ,3- propylenediamine N.N'-disuccinic acid, cis-cyclohexanediamine N, N'-disuccinic acid, trans-cyclohexanediamine N, N'-disuccinic acid, and ethylenebis(oxyethylenenitrilo)-N,N'-disuccinic acid.
- Such polyamino disuccinic acids can be prepared, for instance, by the process disclosed by Kezerian et al. in U.S. Patent 3,158,635 which is incorporated herein by reference in its entirety.
- Kezerian et al disclose reacting maleic anhydride (or ester or salt) with a polyamine corresponding to the desired polyamino disuccinic acid under alkaline conditions.
- the reaction yields a number of optical isomers, for example, the reaction of ethylenediamine with maleic anhydride yields a mixture of three optical isomers [R,R], [S.S] and [S,R] ethylenediamine disuccinic acid (EDDS) because there are two asymmetric carbon atoms in ethylenediamine disuccinic acid.
- EDDS ethylenediamine disuccinic acid
- [S.S] isomers are prepared by reaction of such acids as L-aspartic acid with such compounds as 1 ,2-dibromoethane as described by Neal and Rose, "Stereospecific Ligands and Their Complexes of Ethylenediaminedisuccinic Acid", Inorganic Chemistry, v. 7. (1968), pp. 2405-2412.
- the invention includes use of iron complexes of polyamino disuccinic acids such as ethylenediamine disuccinic acid (EDDS), especially in photography.
- the ferric complexes are also useful in abatement of hydrogen sulfide and other acid gases and as a source of iron in plant nutrition.
- other metal complexes such as the copper, zinc and manganese complexes supply those trace metals in plant nutrition.
- the ferrous complexes are useful in nitrogen oxide abatement.
- Iron complexes of polyamino disuccinic acid are conveniently formed by mixing an iron compound with an aqueous solution of the polyamino disuccinic acid (or salt).
- the pH of the resulting iron chelate solution is preferably adjusted with an alkaline material such as ammonia solution, sodium carbonate, or dilute caustic (NaOH).
- Water soluble iron compounds are conveniently used.
- Exemplary iron compounds include iron nitrate, iron sulfate, and iron chloride.
- the final pH of the iron chelate solution is preferably in the range of 4 to 9, more preferably in the range of 5 to 8.
- the polyamino disuccinic acid is preferably heated with the iron oxide in an aqueous medium at an acidic pH.
- an ammoniated polyamino disuccinic acid solution is particularly effective.
- Ammoniated polyamino disuccinic acid chelants are conveniently formed by combining ammonium or aqueous ammonia solutions and aqueous solutions or slurries of polyamino disuccinic acids in the acid (rather than salt) form.
- Polyamino disuccinic acids are effective as chelants especially for metals such as iron and copper. Effectiveness as a chelant is conveniently measured by complexing the chelant with a metal such as copper such as by mixing an aqueous solution of known concentration of the chelant with an aqueous solution containing copper (II) ions of known concentration and measuring chelation capacity by titrating the chelant with copper in the presence of an indicator dye, using as an endpoint detector a photosensitive electrode.
- Chelating capacity is not, however, a direct indicator of effectiveness in activities such as bleach fixing solutions for photography.
- N- methyliminodiacetic acid MIDA
- MIDA N- methyliminodiacetic acid
- ferric complex of MIDA is a strong bleaching agent.
- Ethylenediamine disuccinic acid is biodegradable using a standardized test such as ASTM D-2667-82.
- ASTM D-2667-82 a standardized sludge containing municipal waste treatment plant organisms is used to biodegrade the chelant in the presence of metal ions representative of those found in the environment including iron.
- Such a test simulates the environment encountered in a municipal waste treatment plant for screening the inherent biodegradability of non-volatile, water-soluble compounds.
- EDDS in this test was found to be greater than 80 percent biodegradable in less than 28 days.
- Polyamino disuccinic acids are preferably employed iri the form of water-soluble salts, notably alkali metal salts, ammonium salts, or alkyl ammonium salts.
- the alkali metal salts can involve one or a mixture of alkali metal salts although the potassium or sodium salts, especially the partial or complete sodium salts of the acids are preferred because of their relatively low cost and enhanced effectiveness
- Polyamino disuccinic acids are particularly useful in photography, especially as a bleaching agent in bleach fixing solutions in the form of their iron (III) complexes.
- the solutions are used to bleach a photographic material preferably having at least one silver halide layer or component.
- Polyamino disuccinic acids used as bleaching agents which are components of the bleaching compositions and bleach-fixing compositions of this invention are preferably utilized in the form of water-soluble salts, such as ammonium or alkali metal salts, of a ferric polyamino disuccinic acid complex.
- the ferric complex of the present invention is used as free acid (hydrogen), alkali metal salt such as sodium salt, potassium salt, lithium salt, or ammonium salt, or a water soluble amine salt such as triethanolamine salt.
- the potassium salt, sodium salt or ammonium salt is used. It is optional to use the ferric complex in combination with one more aminopolycarboxylic compounds.
- the amount of polyamino disuccinic acid to be used depends on the amount of silver and the silver halide composition in the light-sensitive material to be processed. It is preferred to employ 0.01 mole or more, more preferably 0.05 to 1.0 mole, per liter of solution employed; preferably there is a molar ratio of polyamino disuccinic acid to ferric ion of from 1 :1 to 5:1. In a supplemental solution, for supplying a smaller amount of more concentrated solution, the solution is conveniently employed at the maximum concentration permitted by the solubility of the polyamino disuccinic acid compound.
- the bleach compositions of this invention preferably contain 5 to 400 grams per liter of the polyamino disuccinic acid bleaching agent, more preferably 10 to 200 grams per liter.
- the bleach-fixing solution of the present invention is preferably used in a pH range of 2.0 to 10.0, more preferably 3.0 to 9.5, most preferably 4.0 to 9.0.
- the temperature for processing is conveniently 80° C or lower, more desirably 55° C or lower, for the purpose of suppressing evaporation.
- the bleach-fixing processing time is preferably within 8 minutes, more preferably with 6 minutes.
- the bleach or bleach-fix compositions optionally contain other additives within the skill in the art, such as amines, sulfites, mercaptotriazoles, alkali metal bromides, alkali metal iodides, thiols and the like.
- An additional silver halide solvent such as water-soluble thiocyanate or potassium thiocyanate is optionally included in the bleach-fix compositions.
- the bleach-fix composition optionally also contains a non-chelated salt of an aminopolycarboxylic acid, e.g., sodium salts of EDDS acid, in addition to the ferric salt.
- additives which can contribute to bleach-fixing characteristics it is desirable to include alkali metal halides or ammonium halides, such as potassium bromide, sodium bromide, sodium chloride, ammonium bromide, ammonium iodide, sodium iodide, potassium iodide, and the like.
- alkali metal halides or ammonium halides such as potassium bromide, sodium bromide, sodium chloride, ammonium bromide, ammonium iodide, sodium iodide, potassium iodide, and the like.
- solublizing agents such as triethanolamine, within the skill in the art for use in bleaching solutions such as acetylacetone, phosphonocarboxylic acid, polyphosphoric acid, organic phosphonic acid, oxycarboxylic acid, polycarboxylic acid, alkylamines, polyethyleneoxides, and the like.
- bleach-fixing solutions such as a bleach fixing solution comprising a composition in which a halide such as potassium bromide is added in a small amount, or alternatively a bleach-fixing solution in which a halide such as potassium bromide, ammonium bromide and/or ammonium iodide, or potassium iodide is added in a large amount, and, in addition, a bleach-fixing solution with a composition comprising a combination of the bleaching agent of the present invention and a large amount of a halide such as potassium bromide is within the scope of the invention.
- a bleach fixing solution comprising a composition in which a halide such as potassium bromide is added in a small amount
- a bleach-fixing solution in which a halide such as potassium bromide, ammonium bromide and/or ammonium iodide, or potassium iodide is added in a large amount
- a bleach-fixing solution with a composition comprising a
- Silver halide fixing agents suitable for incorporation in the bleach-fixing solutions of the present invention are preferably compounds within the skill in the art for fixing processing which can react with a silver halide to form a water soluble complex, and include thiosulfates such as potassium'thiosulfate, sodium thiosulfate, and ammonium thiosulfate; thiocyanates such as potassium thiocyanate, sodium thiocyanate, ammonium thiocyanate, thiourea, thioether; highly concentrated bromides and iodides.
- thiosulfates such as potassium'thiosulfate, sodium thiosulfate, and ammonium thiosulfate
- thiocyanates such as potassium thiocyanate, sodium thiocyanate, ammonium thiocyanate, thiourea, thioether
- highly concentrated bromides and iodides are particularly concentrated bromides and iodides
- fixing agents are conveniently used in amounts within the range which can be dissolved, namely 5 g/liter or more, preferably 50 g/liter or more, more preferably 70 g/liter or more; more preferably there are less than 400, most preferably less than 200 grams per liter.
- the bleach-fixing solution of the present invention optionally also contains various pH buffers such as boric acid, borax, sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, acetic acid, sodium acetate, and ammonium hydroxide, either singly or in a combination of two or more compounds.
- Optional ingredients include various fluorescent whitening agents, defoaming agents, antifungal agents, preservatives such as hydroxylamine, hydrazine, sulfites, metabisulfites, bisulfite adducts of aldehyde or ketone compounds, or other additives.
- Organic solvents such as methanol, dimethylformamide, and dimethyl sulfoxide are optionally included. Addition of a polymer or a copolymer having a vinyl pyrrolidone nucleus as disclosed in Japanese Provisional Patent Publication No. 10303/1985 is also within the scope of the invention.
- bleach-fixing solution of the present invention for accelerating bleach-fixing characteristics, include tetramethylurea, phosphoric trisdimethylamide, ⁇ -caprolactam, N-methylpyrrolidone, N- methylmorpholine, tetraethyleneglycol monophenyl ether, acetonitrile, and glycol monomethyl ether.
- the bleach-fixing step of the present invention is performed immediately after color developing, but optionally, alternatively, following processing such as water washing, or rising or stopping after color developing. Most preferably the bleach-fixing processing of the present invention is conducted, after pre-fixing processing after color developing. Bleach-fixing processing is optionally followed by stabilizing the processing with or without washing with water before or after stabilizing processing. In addition to the listed steps, there are optionally various auxiliary steps such as steps of film hardening, neutralization, black-and-white developing, reversal, and washings with a small amount of water, if desired. Typical examples of preferable processing methods may include the various steps as shown below:
- processing steps those of (3), (4), (5), (8) and (9) are preferably employed in the present invention, with processing steps of (4), (5), (8) and (9) most preferred.
- chelating agents and/or ferric complexes thereof outside the scope of the present invention are optionally added.
- ferric complex outside the scope of the present invention at a proportion of 0.45 mole percent or less relative to the organic acid ferric complexes of the present invention.
- the reduced product of the iron complex formed in use of the bleach- fixing solution is optionally returned to the oxidized state, preferably by an oxidation treatment.
- Oxidation treatments include, for instance, introducing air or oxygen bubbles for example into the processing solution in the bleaching solution tank or the bleach-fixing solution tank, e.g., in an automatic developing machine, or by natural contact of the air on the liquid surface.
- effective contact of air or oxygen and solution is needed. Such contact is within the skill in the art and achieved by such means as stirring.
- Polyamino disuccinic acids are also useful, for instance, in food products vulnerable to metal-catalyzed spoilage or discoloration; in cleaning products for removing metal ions, that may reduce the effectiveness, appearance, stability, rinsibility, bleaching effectiveness, germicidal effectiveness or other property of the cleaning agents; in personal care products like creams, lotions, deodorants and ointments to avoid deletrious effects such as metal-catalyzed oxidation, rancidity, turbidity, and reduced shelf-life ; in pulp and paper processing to enhance or maintain bleaching effectiveness; in pipes, vessels, heat exchangers, evaporators, filters and other equipment to avoid or remove scaling, in pharmaceuticals; in metal working; in textile preparation, desizing, scouring, bleaching, dyeing ; in agriculture as in chelated micronutrients or herbicides; in polymerization or stabilization of polymers; in the oil field such as for drilling, production, recovery, hydrogen sulfide abatement.
- the chelants can be used in industrial processes whenever metal ions such as iron or copper are a nuisance and are to be prevented.
- the polyamine disuccinic acids are also useful in processes for the electroless deposition of metals such as nickel and copper.
- Electroless plating is the controlled autocatalytic deposition of a continuous film of metal without the assistance of an external supply of electrons such as described in U.S. Patents 3,119,709 (Atkinson) and 3,257,215 (Schneble et al.).
- Non-metallic surfaces are pretreated by means within the skill in the art to make them receptive or autocatalytic for deposition. All or selected portions of a surface are suitably pretreated.
- Complexing agents are used to chelate a metal being deposited and prevent the metal from being precipitated from solution (that is as the hydroxide).
- Electroless plating solutions are complex and contain a variety of ingredients.
- an illustrative electroless copper solution would advantageously contain copper salts, a reducing agent, a material for the adjustment of the pH, a complexing agent, a buffer, and various additives to control qualities such as stability, film properties, deposition rates.
- Typical copper salts include the water soluble salts such as copper sulfate, chloride, nitrate and acetate. Other organic and inorganic salts of copper may also be used.
- Typical of the reducing agents that can be used in alkaline electroless copper plating baths are formaldehyde and formaldehyde precursors such as glyoxal and paraform aldehyde.
- Borohydrides such as sodium or potassium borohydride and boranes such as amino boranes are also useful.
- hypophosphites such as sodium or potassium hypophosphite are used.
- acids such as sulfuric may be employed.
- the pH adjustment is used to regulate the plating potential of the bath.
- a polyamino disuccinic acid is preferably used to chelate the copper.
- a typical aqueous bath utilizing the polyamino disuccinic acids advantageously contains from 0.002 to 0.60 moles of a water soluble copper salt, the polyamino disuccinic acid at a molar ratio of approximately 1 to 2 times that required to complex the copper, an alkali metal hydroxide in sufficient amounts to give a pH of from 10 to 14, and for example formaldehyde from 0.03 to 1.3 moles per liter.
- One particularly important need in the electroless metal plating baths are for chemicals of high purity. This can be extremely important since the surfaces being plated must be autocatalytically active. Many impurities poison the catalytic surface even when present in very small amounts. When this is the case, it is important that the chelating agents that are used be of high purity.
- Polyamino disuccinic acids that are especially effective and lend themselves to being easily purified by isolation as the water insoluble acid form include ethylenediamine disuccinic acid, diethylenetriamine disuccinic acid, and hexamethylenediamine disuccinic acid.
- Ethylenediamine disuccinic acid is a particularly preferred chelant.
- Used plating solutions, especially copper plating solutions may be difficult to treat since they contain strong complexes such as EDTA (ethylenediaminetetraacetic acid) that are slowly biodegraded.
- EDTA ethylenediaminetetraacetic acid
- the use of more biodegradable chelants such as EDDS are particularly useful in this regard.
- polyamino disuccinic acids are suitably used for preparing for example the redox catalysts used therein. They additionally prevent the precipitation of such compounds as iron hydroxide in an alkaline polymerization medium.
- the chelants are suitably used for removing metal traces during the manufacture and dyeing of natural and synthetic fibers, thereby preventing many problems, such as dirt spots and stripes on the textile material, loss of luster, poor wettability, unlevelness and off-shade dyeings.
- Exemplary of various other uses are applications in pharmaceuticals, cosmetics and foodstuffs where metal catalyzed oxidation of olefinic double bonds and hence rancidification of goods is prevented.
- the chelates are also useful as catalysts for organic syntheses (for example air oxidation of paraffins, hydroformylation of olefins to alcohols).
- Metal chelates are important in agriculture because they supply micronutrients (trace metals such as iron, zinc, manganese, and copper) which are vital in the metabolism of both plants and animals. Plant problems previously ascribed to disease and drought are now recognized as possible symptoms of micronutrient deficiencies.
- the iron, copper, zinc, and manganese chelates of the polyamino disuccinic acids such as EDDS can be used to deliver these metals to the plant. Because of the excellent solubility, these metal chelates are more readily utilized by the plant than are the inorganic forms of the metals. This is especially true in highly competitive ionic systems. As a result, the micronutrients that are chelated to the polyamino disuccinic acids are more efficient than when compared to the inorganic sources.
- the iron chelates of irori, manganese, copper, and zinc with the biodegradable polyamino disuccinic acid EDDS are particularly preferred. Biodegradable chelants would have less residence time in soil.
- polyamino disuccinic acids include gas washing, conditioning or scrubbing (of for example flue, geothermal, sour, synthesis, process, fuel, or hydrocarbon gas) to remove at least one acidic gas, preferably the removal of NO x from flue gases, H2S oxidation and metal extraction.
- gas washing, conditioning or scrubbing of for example flue, geothermal, sour, synthesis, process, fuel, or hydrocarbon gas
- Polyvalent metal chelates of polyamino disuccinic acids are particularly useful in removing H2S from a fluid, particularly a gas, containing H2S, by (directly or indirectly) contacting the fluid with at least one chelate of at least one, preferably one polyvalent metal in a higher valence state such that sulfur is formed along with the chelate of the metal in a lower valence state.
- the chelate of any oxidizing polyvalent metal capable of being reduced by reaction with H2S or hydrosulfide and/or sulfide ions and, preferably which can be regenerated by oxidation, is suitable.
- the chelates are water soluble.
- Exemplary metals include lead, mercury, nickel, chromium, cobalt, tungsten, tin, vanadium, titanium, tantalum, platinum, palladium, zirconium, molybdenum, preferably iron, copper, or manganese, most preferably iron.
- Polyamino disuccinic acids are suitably used in any process of removal of H2S within the skill in the art such as those exemplified by United States Patents 4,421 ,733; 4,614,644; 4,629,608; 4,683,076; 4,696,802; 4,774,071 ; 4,816,238; and 4,830,838, which are incorporated by reference herein.
- the polyvalent metal chelates are readily formed in aqueous solution by reaction of an appropriate salt, oxide or hydroxide of the polyvalent metal and the chelating agent in the acid form or an alkali metal or ammonium salt thereof.
- the more preferred range is from 6.5 to 9 and the most preferred range of pH is from 7 to 9.
- operation at the highest portion of the range is preferred in order to operate at a high efficiency of hydrogen sulfide absorption.
- the hydrogen sulfide is an acid gas, there is a tendency for the hydrogen sulfide to lower the pH of the aqueous alkaline solution. Lower pH is preferable in the presence of carbon dioxide to reduce absorption thereof.
- Optimum pH also depends upon stability of a particular polyvalent metal chelate.
- Buffering agents optionally useful as components of aqueous alkaline scrubbing solutions of the invention include those which are capable of maintaining the aqueous alkaline solution at a pH generally in a operating pH range of 6 to 10.
- the buffering agents are advantageously water soluble at the concentration in which they are effective.
- suitable buffering agents include the ammonium or alkali metal salts of carbonates, bicarbonates, or borates, including sodium carbonate, bicarbonate or sodium borate, particularly carbonates and bicarbonates when used in the presence of CO2 (carbon dioxide).
- temperatures employed in a contacting or absorption-contact zone are not generally critical, except that the reaction is carried out below the melting point of sulfur. In many commercial applications, absorption at ambient temperatures is desired. In general, temperatures from 10°C to 80°C are suitable, and temperatures from 20°C to 45°C are preferred. Contact times conveniently range from 1 second to 270 seconds or longer, with contact times of 2 seconds to 120 seconds being preferred.
- Suitable pressure conditions vary widely, depending on the pressure of the gas to be treated.
- pressures in a contacting zone may vary from one atmosphere up to one hundred fifty or even two hundred atmospheres, with from one atmosphere to one hundred atmospheres preferred.
- H2S removal preferably at least an amount of chelate in a higher valence state stoichiometric with the H2S to be removed is used.
- Preferred mole ratios of chelate to H2S are from 1 :1 to 15:1. more preferably from 2:1 to 5:1.
- an iron chelate it is preferably present in an amount from 100 to 100,000 ppm iron in the higher valence state most preferably from 1000 to 50,000 ppm by weight iron in the higher valence state.
- the circulation rate of the chelate solution depends upon the hydrogen sulfide level in the H2S containing fluid. In general, the circulation rate should be sufficient to provide from 1 to 6 moles and preferably 2-4 moles of high valence (e.g. ferric) chelate for every mole of H2S entering the reaction zone.
- the contact time of the reactants should be at least 0.05 second or more and preferably in the range from 0.02 to 1.0 seconds.
- Polyamino disuccinic acids are preferably used in combination with additives such as rate enhancers (or catalysts, for example for conversion of H2S to sulfur) and/or stabilizers for the chelates.
- Cationic polymeric catalysts are advantageous and include polyethyieneamines, poly(2-hydroxypropyl-1-N-methylammonium chloride) and the 1,1-dimethyl analogue, poly[N-(dimethylaminomethyl) acrylamide], poly(2-vinylimidazolinum bisulfate), poly(diallyldimethyl ammonium chloride) and poly(N-dimethyl aminopropy -methacrylamide. These cationic polymers are well known and are commercially available under various tradenames.
- Preferred catalysts include polyethylene amines and poly (diallyldimethyl ammonium chloride).
- Preferred concentration ranges for the polymeric catalysts are from 0.75 to 5.0 weight percent, and from 1.0 to 3.0 weight percent is the most preferred range.
- the amount of polymeric catalyst is sufficient to provide a weight ratio of iron or other polyvalent metal in the range from 0.2 to 10:1. Concentrations of from 10 to 25 ppm in solution are preferred.
- Stabilizing agents include, for example bisulfite ions such as sodium, potassium, lithium, ammonium bisulfite and mixtures thereof. They are used in stabilizing amounts, that is amounts sufficient to reduce or inhibit rate of degradation of the chelate, preferably from 0.01 to 0.6 equivalents per liter of solution, more preferably from 0.05 to 0.3 equivalents/liter.
- the chelate of lower valence state is produced from that of higher valence state, it is preferably oxidized back to the higher valence state and recycled. Oxidation is suitably by any means within the skill in the art, for example electrochemical ly, but preferably by contact with an oxygen-containing gas, for example air. If CO2 is absorbed, it is preferably removed before contact with the oxygen-containing gas.
- the oxygen in whatever form supplied) is advantageously supplied in a stoichiometric equivalent or excess with respect to the amount of lower valence state metal ion of the chelate or chelates present in the mixture.
- the oxygen is supplied in an amount from 1.2 to 3 fold excess and in a concentration of from 1 percent to 100 percent by volume, more preferably from 5 percent to 25 percent by volume.
- Temperatures and pressures are suitably varied widely, but generally those used in the contacting zone(s) are preferred, preferably temperatures of from 10°C to 80°C more preferable from 20°C to 45°C with pressures from 0.5 atmosphere to 3 or 4 atmospheres preferred. Mild oxidizing conditions are generally preferred to avoid degradation of chelating agent. Such conditions are within the skill in the art.
- Sulfur produced by reaction of H2S with the polyvalent metal chelate is optionally solubilized, for example by oxidation. Oxidation is suitably by any means within the skill in the art.
- SO2 is present or easily generated by oxidation of H2S (e.g. using oxygen or electrochemical means) it is a preferred oxidizing agent to produce, for example thiosulfates from the sulfur.
- suitable oxidizing agents include for example alkali metal or ammonium salts of inorganic oxidizing acids such as perchloric, chloric, hypochlorous, and permanganic acids.
- the sulfur is optionally recovered by means within the skill in the art including flocculation, settling, centrifugation, filtration, flotation .
- Processes of the invention include, for instance: a process for removing at least a portion of H2S from a fluid stream containing H2S which comprises (A) contacting said fluid stream (optionally in a first reaction zone) with an aqueous solution at a pH range suitable for removing H2S wherein said solution comprises at least one higher valence polyvalent metal chelate of a polyamino disuccinic acid whereby said higher valence polyvalent metal chelate is reduced to a lower valence polyvalent metal chelate.
- the aqueous solution additionally comprises an oxidizing agent capable of oxidizing elemental sulfur to soluble sulfur compounds, and/or one or more water soluble cationic polymeric catalysts and/or a stabilizing amount of a stabilizing agent each as bisulfite ion.
- the process optionally includes at least one additional step such as: (B) contacting said solution containing the lower valence polyvalent chelate in a second reaction zone with an oxygen-containing gas stream whereby said chelate is reoxidized;
- compositions of the invention include aqueous solutions of polyvalent metal chelates of the invention (in one or more oxidation states) with at least one of: H2S, sulfide or bisulfide ions, rate enhancers such as poly(dimethyldiallyl ammonium chloride) and/or polyethyleneamines, and/or stabilizers such as bisulfite ions.
- rate enhancers such as poly(dimethyldiallyl ammonium chloride) and/or polyethyleneamines
- stabilizers such as bisulfite ions.
- polyamino disuccinic acids are used in removal of nitrogen oxides, preferably nitric oxide (NO), from fluids containing them.
- nitrogen oxides (NO ⁇ ) and SO2 can be removed from flue gas streams by absorbing the SO2 using an absorbent or reactant therefor, particularly an amine based absorbent such as a nitrogen-containing heterocyclic compound preferably having at least one carbonyl group such as a piperazinone; piperidinone, piperidine, piperazine or triazine having a carbonyl group; hydantoin; cyclic urea, oxazolidone or morpholinone in conjunction with a chelate of a polyvalent metal.
- an absorbent or reactant therefor particularly an amine based absorbent such as a nitrogen-containing heterocyclic compound preferably having at least one carbonyl group such as a piperazinone; piperidinone, piperidine, piperazine or triazine having a carbonyl group; hydantoin; cyclic urea, oxazolidone or morpholinone in conjunction with a chelate of a polyvalent metal.
- Representative metal ions are chromium, cobalt, copper, iron, lead, manganese, mercury, molybdenum, nickel, palladium, platinum, tin, titanium, tungsten, and vanadium; preferably iron, copper, and/or nickel all preferably with a valence of +2, the more preferably iron, most preferably iron in the ferrous state.
- Such chelates are conveniently prepared by admixing a water soluble salt of the metal, such as a sulfate or acetate with a water soluble form of the chelating agent, for example a salt, advantageously in water.
- the chelates are useful in any process within the skill in the art such as those disclosed in United States Patents 4,732,744 to Chang et al.; 4,612,175 to Harkness et al.; 4,708,854 to Grinstead; 4,615,780 to Walker; 4,126,529 to DeBerry; 4,820,391 to Walker; and 4,957,716 to Cichanowicz et al.
- SO2 absorbent When an SO2 absorbent is used, it is preferably regenerated, more preferably thermally regenerated, and preferably recycled.
- the concentration of NO ⁇ in the fluid (directly or indirectly) contacting the chelate is preferably from 1 ppm to 15,000 ppm by volume such as is found, for instance, in flue gases from burning for example coal.
- the metal chelate is advantageously present in the solution which contacts the NO ⁇ containing fluid at a metal ion concentration greater than 100 ppm with a chelating agent to metal ion molecular ratio of greater than or equal to one.
- the metal chelate is preferably present at a metal ion concentration of 1,000 to 10,000 ppm and a chelating agent to metal ion molecular ratio between 1:1 and 10:1. The optimum amounts depend on the chelating agent generally with preferred ratios between 1:1 and to 5:1.
- An absorber is suitably operated at a temperature of from 0° to 120°C, but is preferably operated at a temperature of from 5° to 95°C.
- both absorber and (optionally) a stripper are typically operated at a pressure of from atmospheric to 10 atmospheres (e.g. 0 to 69 Pa gauge), however, atmospheric pressure is preferred for the convenience of lower equipment and operating costs and reduced SO2 absorbent losses. Higher temperatures and pressures are not deleterious so long as they are below the decomposition temperature of the chelate and absorbent, if present.
- the absorber is preferably maintained at a pH between 3 and 8 to retain NO x absorbence in the absorber.
- Chelates absorb NO x or act as stoichiometric reactants to increase the solubility of NO x in aqueous solution.
- sulfite and/or bisulfite ions collectively referred to herein as "sulfites" are also present.
- Such ions react with the NO ⁇ -chelate complex to form iminodisulfonate salts and free the chelate for NO x absorption.
- suitable soluble sulfite salts include sodium, potassium, lithium, magnesium and/or ammonium sulfite and/or bisulfite.
- SO2 in aqueous solution forms sulfurous acid
- concentration of sulfites in the absorbent is generally sufficient for iminodisulfonate formation without replenishment, but sulfites may be added, if necessary, to maintain a concentration of at least 0.05 to 1 g-moles/l absorbent, preferably at least 0.1 g-moles/l.
- a sulfite salt is, thus, preferably present with the chelate.
- the chelate promotes absorption of NO ⁇ which may be converted to such compounds as HNO2 and HNO3 which react with HSO3, if present, to form hydroxylamine-disulfonate (HON(S03H)2, abbreviated HADS) and related compounds, which are preferably subsequently converted to soluble ammonium and sulfate ions advantageously at a pH of 4.2 or less, preferably 4. More preferably the ammonium ions are subsequently removed, for example by absorption, and most preferably, the sulfate ions are precipitated.
- the polyvalent metal chelate In removing NO ⁇ from a fluid, the polyvalent metal chelate is oxidized from a lower to a higher valence state.
- the lower valence metal chelate is preferably replenished, for example by replacement of the polyvalent metal ion of the chelate, but more preferably by reduction of the metal by any means within the skill in the art, such as by contact with a reducing agent, or preferably by electrochemical means (at a cathode).
- the chelate is, then, preferably recycled.
- the solution containing the higher valence polyvalent metal chelate (which solution is preferably first (advantageously thermally) stripped of SO2) is preferably directed to a cathode compartment of an electrochemical cell comprised of an anode in an anode compartment separated, preferably by a membrane, from a cathode in a cathode compartment.
- An electrical potential is imposed across the anode and cathode to reduce inactive oxidized chelates to an active state.
- an anionic exchange membrane is used. Heat stable amine salts may also be converted to free amine sorbent in the cathode compartment and soluble salt anions diffuse from the cathode compartment through the anion exchange membrane into the anode department.
- regenerated absorbent solution from the cathode compartment is recycled to the NO x containing fluid contacting step.
- the process more preferably additionally comprises a step of adjusting the pH of the regenerated recycle absorbent to from 3 to 8.
- compositions of the invention include aqueous solutions of the polyvalent metal polyamino disuccinic acids with at least one of NO ⁇ ( at least one (water soluble) sulfite, or at least one absorbent for SO2.
- NO ⁇ at least one (water soluble) sulfite
- absorbent for SO2 at least one absorbent for SO2.
- Processes of the invention include a process for removing at least a portion of NO ⁇ , preferably NO, from a fluid containing NO ⁇ , said fluid preferably also containing SO2 and said fluid preferably being a gas, but suitably being in a form such as a liquid, suspension, or condensate comprising the step of
- (A) (directly or indirectly) contacting the fluid with an aqueous solution comprising at least one lower valence state polyvalent metal chelate of a polyamino disuccinic acid and optionally additionally containing an absorbent for SO2 and/or a sulfite.
- the process optionally additionally comprises at least one of the following steps:
- EXAMPLE 1 PREPARATION OF ETHYLENEDIAMINEDISUCCINIC ACID FROM ETHYLENEDIAMINE AND MALEIC ACID AND PREPARATION OF THE FERRIC CHELATE
- the resulting solution was transferred to a 1 liter stainless steel autoclave vessel using 40 mL of deionized water as rinse.
- the carbon NMR and proton NMR of the reaction mixture indicated essentially no remaining ethylenediamine and a very small amount of residual maleic acid.
- the reaction mixture was adjusted to a pH of approximately 2.0 with 36-37 percent hydrochloric acid (commercially available from Aldrich Chemical Co.).
- a powdery white precipitate developed and was filtered with Whatman #41 filter paper in a Buchner funnel.
- the precipitated solid was washed twice with 300 mL of deionized water.
- the resulting solids were dried overnight in a vacuum over at 60°C. Approximately 108 grams of product were obtained (74 percent yield of acid).
- the carbon NMR and proton NMR indicated essentially pure ethylenediaminedisuccinic acid.
- An approximately 0.01 M iron (ferric) - ethylenediaminedisuccinic acid chelate solution was prepared by adding 1.63 grams of ethylenediaminedisuccinic acid and 200 mL of deionized water to a beaker. The slurry was stirred with a magnetic stirrer bar, and the pH was adjusted to 10.0 with 1.43 grams of 50 percent NaOH solution. A sample, 2.4 grams, of iron nitrate solution (11.75 percent iron), commercially available from Shepherd Chemical Company, were added with stirring. The pH of the solution, which drops to 1.7, was adjusted to 6.6 with aqueous ammonia (29 percent concentration) solution (commercially available from J. T. Baker Chemical Co.).
- the iron chelate solution was then diluted in a volumetric flask to a final volume of 500 mL. Fifty gram aliquots of the solution were then placed in four 2 oz. (0.059 I) bottles and the pH of each was adjusted to 7.0, 8.05, 9.1 and 10.0 respectively with a few drops of an aqueous ammonia solution. One 50 gram aliquot was adjusted to a pH of 6.0 with a few drops of dilute hydrochloric acid, and one 50 gram aliquot was adjusted to a pH of 10.5 with a 10 percent solution of sodium carbonate (8.5 g). The sample that was pH 10.5 develops an iron hydroxide precipitate almost immediately. The sample at pH 10.0 begins to form iron hydroxide after 4 hours.
- Diethylenetriamine disuccinic acid was prepared and isolated by the procedure of Example 1 except that 51.5 g of diethylenetriamine were used in place of ethylenediamine and 116.1 g of maleic acid were used. Also, 160.0 g of 50 percent sodium hydroxide solution were used. The ability to complex iron at various pH values was determined in the same manner as was described for EDDS in Example 1 with the results in Table 2.
- diethylenetriamine N,N"-disuccinic acid is an excellent chelating agent for iron and enables iron to remain soluble and available for reaction for the uses described in the invention.
- Copper titration value was used to measure the extent of biodegradation of the chelating agents during the procedure. Titration was performed using ammonium purpurate (indicator for complexometric titration commercially available from Aldrich Chemical Co., Inc. under the trade designation Murexide) as the indicator at approximately pH 8, and using sodium acetate as buffer. Titration of EDDS in 100 mL water with 0.01 molar copper chloride resulted in a 1:1 (molar) chelation of copper. Analyses were performed daily for a period of 28 days.
- EDDS was found to be greater than 80 percent biodegradable in less than 28 days.
- a control was used to verify the absence of interfering chelating substances in the test.
- EXAMPLE 4 AND COMPARATIVE SAMPLES A REDOX POTENTIALS FOR EDDS AND EDTA
- the solutions were 0.1 molar in NaCl ⁇ 4, and adjusted to pH 5 with NaOH and/or HCIO4 as needed to reach the stated pH, diluted with the same electrolyte solution.
- Perchlorate electrolyte was used because perchlorate was 'non-coordinating', that was it can not interact with the ferric center and interfere in the experiment.
- the polarographic data shows that Fe(EDDS) gives a very good reversible reduction.
- the Fe(EDDS) was 10 millivolts easier to reduce than the commercially used Fe(EDTA). This indicates that the Fe(EDDS) complex will oxidize silver in the photographic bleach process but was not sufficiently strong as an oxidizing agent to initiate bleach-fixer stability problem ⁇ .
- a 2000 mL sample of 2 percent Fe (III) solution prepared from ethylenediamine disuccinic acid and iron nitrate (pH adjusted to ⁇ 7 with aqueous ammonia) was placed in a four liter kettle equipped with a stirrer, thermometer, heating mantle, temperature controller, gas lines, caustic scrubber lines, pump, and sulfur filter, and allowed to equilibrate. The temperature was maintained at 120°C.
- a gas monitor was engaged and lead acetate tape placed around the flask joints and gas fittings. Air at approximately 500 standard cubic feet per minute (scfm) (14,160 liters per minute) was sparged into the bottom of the flask through a 7 ⁇ stainless steel frit using 1/4 (0.64 cm.) stainless steel tubing.
- Air sparging was done for 30 minutes to assure there was little ferrous iron present. After the sparging was completed, 100 scfm (2832 liters per minute) of a mixture of H2S and N2 gases were introduced for 10 minutes to the reaction mixture through the 7 ⁇ sparge frit. After the addition of gas mixture, some sulfur particles were noted forming on the surface of the reaction mixture. No breakthrough of the H2S gas was determined at the 10 ppm level by the monitor and no darkening of the lead acetate paper was observed. The gas was shut off and the sulfur filtered from the solution.
- Ethylenediamine disuccinic acid and diethylenetriamine disuccinic acid were titrated with standard 0.01 M copper chloride solution. The titrations were performed using ammonium purpurate (indicator for complexometric titration commercially available from Aldrich Chemical Co., Inc. under the trade designation Murexide) at a pH of approximately 8 using sodium acetate as buffer. Both polyamino disuccinic acids complexed copper at a molar ratio of 1 mole of copper per mole of polyamino disuccinic acid.
- a chelating agent To be effective in an electroless copper plating bath, a chelating agent must maintain the copper in a soluble form in the pH range of 10 to 14. An especially preferred range is 11 to 12.5.
- a 0.05 M copper chelate solution of ethylenediamine disuccinic acid was prepared from copper chloride, ethylenediamine disuccinic acid and sodium hydroxide. Approximately 70.0 gram portions were adjusted with sodium hydroxide solution to pH values of 10, 12, and 14. The ethylenediamine disuccinic acid was observed to maintain the copper in solution at these pH values preventing the precipitation of insoluble copper hydroxide.
- a 0.05 M copper solution prepared without the polyamino disuccinic acid ligand, used in the same manner at a pH of 10 ,12 and 14 resulted in precipitation of insoluble copper hydroxide from the solutions almost immediately.
- the zinc chelate of ethylenediamine disuccinic acid was prepared by dissolving 0.0055 moles (1.64 g) of ethylenediamine disuccinic acid in 6.0 grams of deionized water and 3.2 grams of 25 percent NaOH (sodium hydroxide). A sample, 0.005 moles (0.68 g), of zinc chloride was added with stirring. The final pH was adjusted with 25 percent aqueous NaOH solution to a pH of 7.6 and deionized water was added to obtain a final solution containing 2.8 percent chelated zinc.
- the manganese chelate of ethylenediamine disuccinic acid was prepared by dissolving 0.0055 moles of ethylenediamine disuccinic acid in 5.8 grams of deionized water and 2.6 grams of 25 percent NaOH solution. A sample, 0.005 moles, of MnC.2'4H2 ⁇ (1.0 g) was added with stirring. The pH was adjusted to 6.7 with 25 percent NaOH solution, and water was added to give a final solution containing 2.4 percent chelated manganese.
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Abstract
Les acides polyaminodisucciniques sont des chélateurs efficaces utilisés en photographie et dans le conditionnement du gaz (dans ces deux applications, l'acide polyaminodisuccinique se présentant sous forme de métal, de préférence de complexe ferreux). Les chélateurs au cuivre sont également utiles dans le cuivrage auto-catalytique. Pour la photographie, l'invention concerne un procédé qui consiste à blanchir ou blanchir par fixage un support photographique par mise en contact dudit support avec une solution de blanchiment contenant un agent de blanchiment constitué d'un complexe ferrique d'acide polyaminodisuccinique et la solution ainsi utilisée. Pour ce qui concerne le dépôt auto-catalytique, l'invention se rapporte à un procédé qui consiste à déposer de manière auto-catalytique du cuivre sur une surface non métallique réceptive au cuivre déposé par mise en contact de la surface non métallique avec une solution aqueuse constituée d'un sel de cuivre soluble et d'un acide polyaminodisuccinique, et de bains de plaquage appropriés. L'invention porte également sur un procédé d'enlèvement des dépôts d'oxyde de fer d'une surface qui consiste à mettre lesdits dépôts en contact avec une solution contenant un acide polyaminodisuccinique ammoniaqué. L'invention couvre également le conditionnement de gaz dont un procédé qui consiste à enlever le H2S d'un fluide par mise en contact dudit fluide avec une solution aqueuse de pH approprié pour enlever le H2S, ladite solution contenant au moins un chélate de métal polyvalent de valence élevée d'acide polyaminodisuccinique, et procédé d'élimination de NOx d'un fluide qui consiste à mettre le fluide en contact avec une solution aqueuse d'au moins un chélate de métal polyvalent de valence faible d'acide polyaminodisuccinique.
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GB9523005A GB2293020B (en) | 1993-05-20 | 1994-05-20 | Succinic acid derivative degradable chelants, uses and compositions thereof |
DE4493718T DE4493718T1 (de) | 1993-05-20 | 1994-05-20 | Abbaubare Succinsäurederivatchelanten, Verwendungen und Zusammensetzungen davon |
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US6532493A | 1993-05-20 | 1993-05-20 | |
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Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
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WO1996015290A1 (fr) * | 1994-11-11 | 1996-05-23 | The Associated Octel Company Limited | Emploi d'un compose |
US5585226A (en) * | 1995-08-30 | 1996-12-17 | Eastman Kodak Company | Polyamino monoesuccinates for use in photographic processes |
WO1997008288A1 (fr) * | 1995-08-30 | 1997-03-06 | The Dow Chemical Company | Chelatants degradables derives de l'acide succinique, leurs utilisations et compositions |
WO1997008287A2 (fr) * | 1995-08-30 | 1997-03-06 | The Dow Chemical Company | Chelatants degradables derives d'acides polyamino-monosucciniques, leurs utilisations et compositions |
US5652085A (en) * | 1995-08-30 | 1997-07-29 | Eastman Kodak Company | Succinic acid derivative degradable chelants, uses and composition thereof |
WO1998004775A1 (fr) * | 1996-07-26 | 1998-02-05 | Basf Aktiengesellschaft | Utilisation d'agents complexants pour le blanchiment de la cellulose et du bois, pour la fabrication du papier et le desencrage de vieux papiers |
WO1998011056A1 (fr) * | 1996-09-12 | 1998-03-19 | The Dow Chemical Company | Procede pour preparer des solutions de chelates ferriques d'acides polyaminosucciniques de metaux alcalins |
US5733858A (en) * | 1995-08-30 | 1998-03-31 | The Dow Chemical Company | Succinic acid derivative degradable chelants, uses and compositions thererof |
EP0840168A2 (fr) * | 1996-10-31 | 1998-05-06 | Fuji Photo Film Co., Ltd. | Agent chélatant à base d'un acide polyaminocarboxylique, chélate d'un métal lourd le contenant et additif photographique et procédé de traitement photographique |
WO1999027178A1 (fr) * | 1997-11-25 | 1999-06-03 | Amylum Belgium N.V. | Perfectionnements apportes au procede de blanchiment de la pate chimique et dispersions intermediaires de pate |
WO1999039045A1 (fr) * | 1998-01-31 | 1999-08-05 | The Procter & Gamble Company | Compositions aqueuses comprenant des agents de complexion, et leurs utilisations |
WO1999046441A1 (fr) * | 1998-03-10 | 1999-09-16 | Solvay (Societe Anonyme) | Procede de blanchiment et/ou de delignification de pates a papier |
US6300510B1 (en) * | 1997-10-31 | 2001-10-09 | Mitsubishi Rayon Co., Ltd. | Iron alkali salt of S,S-ethylenediamine-N,N′-disuccinic acid and process for producing the same |
EP1153914A1 (fr) * | 2000-05-08 | 2001-11-14 | The Associated Octel Company Limited | Procédé pour la préparation de complexe d'alkylènediamine-N,N'-disuccinique-fer-base avec contrôle du pH |
US7405069B2 (en) | 2002-04-08 | 2008-07-29 | Akzo Nobel N.V. | Method for removing a nitrogen oxide from a gas |
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- 1994-05-20 DE DE4493718T patent/DE4493718T1/de not_active Withdrawn
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WO1996015290A1 (fr) * | 1994-11-11 | 1996-05-23 | The Associated Octel Company Limited | Emploi d'un compose |
US5846925A (en) * | 1995-08-30 | 1998-12-08 | The Dow Chemical Company | Succinic acid derivative degradable chelants, uses and compositions thereof |
US5585226A (en) * | 1995-08-30 | 1996-12-17 | Eastman Kodak Company | Polyamino monoesuccinates for use in photographic processes |
WO1997008288A1 (fr) * | 1995-08-30 | 1997-03-06 | The Dow Chemical Company | Chelatants degradables derives de l'acide succinique, leurs utilisations et compositions |
WO1997008287A2 (fr) * | 1995-08-30 | 1997-03-06 | The Dow Chemical Company | Chelatants degradables derives d'acides polyamino-monosucciniques, leurs utilisations et compositions |
WO1997008287A3 (fr) * | 1995-08-30 | 1997-05-15 | Dow Chemical Co | Chelatants degradables derives d'acides polyamino-monosucciniques, leurs utilisations et compositions |
US5652085A (en) * | 1995-08-30 | 1997-07-29 | Eastman Kodak Company | Succinic acid derivative degradable chelants, uses and composition thereof |
US5733858A (en) * | 1995-08-30 | 1998-03-31 | The Dow Chemical Company | Succinic acid derivative degradable chelants, uses and compositions thererof |
WO1998004775A1 (fr) * | 1996-07-26 | 1998-02-05 | Basf Aktiengesellschaft | Utilisation d'agents complexants pour le blanchiment de la cellulose et du bois, pour la fabrication du papier et le desencrage de vieux papiers |
WO1998011056A1 (fr) * | 1996-09-12 | 1998-03-19 | The Dow Chemical Company | Procede pour preparer des solutions de chelates ferriques d'acides polyaminosucciniques de metaux alcalins |
US5885757A (en) * | 1996-10-31 | 1999-03-23 | Fuji Photo Film Co., Ltd. | Aminopolycarboxylic acid chelating agent, heavy metal chelate compound thereof, photographic additive and processing method |
EP0840168A3 (fr) * | 1996-10-31 | 1998-05-13 | Fuji Photo Film Co., Ltd. | Agent chélatant à base d'un acide polyaminocarboxylique, chélate d'un métal lourd le contenant et additif photographique et procédé de traitement photographique |
EP0840168A2 (fr) * | 1996-10-31 | 1998-05-06 | Fuji Photo Film Co., Ltd. | Agent chélatant à base d'un acide polyaminocarboxylique, chélate d'un métal lourd le contenant et additif photographique et procédé de traitement photographique |
US6340560B1 (en) | 1996-10-31 | 2002-01-22 | Fuji Photo Film Co., Ltd. | Aminopolycarboxylic acid chelating agent, heavy metal chelate compound thereof, photographic additive and processing method |
US6300510B1 (en) * | 1997-10-31 | 2001-10-09 | Mitsubishi Rayon Co., Ltd. | Iron alkali salt of S,S-ethylenediamine-N,N′-disuccinic acid and process for producing the same |
US6515159B2 (en) | 1997-10-31 | 2003-02-04 | Mitsubishi Rayon Co., Ltd. | S,S-ethylenediamine-N,N′-disuccinic acid iron alkali salt and a process for production thereof |
WO1999027178A1 (fr) * | 1997-11-25 | 1999-06-03 | Amylum Belgium N.V. | Perfectionnements apportes au procede de blanchiment de la pate chimique et dispersions intermediaires de pate |
WO1999039045A1 (fr) * | 1998-01-31 | 1999-08-05 | The Procter & Gamble Company | Compositions aqueuses comprenant des agents de complexion, et leurs utilisations |
WO1999046441A1 (fr) * | 1998-03-10 | 1999-09-16 | Solvay (Societe Anonyme) | Procede de blanchiment et/ou de delignification de pates a papier |
BE1011785A3 (fr) * | 1998-03-10 | 2000-01-11 | Solvay | Procede de blanchiment et/ou de delignification de pates a papier chimiques. |
EP1153914A1 (fr) * | 2000-05-08 | 2001-11-14 | The Associated Octel Company Limited | Procédé pour la préparation de complexe d'alkylènediamine-N,N'-disuccinique-fer-base avec contrôle du pH |
JP2002003457A (ja) * | 2000-05-08 | 2002-01-09 | Assoc Octel Co Ltd:The | プロセス |
US6472548B2 (en) | 2000-05-08 | 2002-10-29 | Associated Octel Company Limited | Process for preparing a complex of a ligand, metal and base |
JP4643851B2 (ja) * | 2000-05-08 | 2011-03-02 | イノスペック リミテッド | プロセス |
US7405069B2 (en) | 2002-04-08 | 2008-07-29 | Akzo Nobel N.V. | Method for removing a nitrogen oxide from a gas |
Also Published As
Publication number | Publication date |
---|---|
GB2293020A (en) | 1996-03-13 |
DE4493718T1 (de) | 1996-08-22 |
GB2293020B (en) | 1997-08-27 |
GB9523005D0 (en) | 1996-01-10 |
CA2160701A1 (fr) | 1994-12-08 |
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