WO1993002787A1 - Procede de production de materiaux en poudre ultrafins - Google Patents

Procede de production de materiaux en poudre ultrafins Download PDF

Info

Publication number
WO1993002787A1
WO1993002787A1 PCT/GB1992/001301 GB9201301W WO9302787A1 WO 1993002787 A1 WO1993002787 A1 WO 1993002787A1 GB 9201301 W GB9201301 W GB 9201301W WO 9302787 A1 WO9302787 A1 WO 9302787A1
Authority
WO
WIPO (PCT)
Prior art keywords
reactor
target material
plasma
plasma arc
electrodes
Prior art date
Application number
PCT/GB1992/001301
Other languages
English (en)
Inventor
Hélène AGEORGES
Jean-Marie Baronnet
Charles Peter Heanley
John Kenneth Williams
Original Assignee
Tetronics Research & Development Co. Limited
Universite De Limoges
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tetronics Research & Development Co. Limited, Universite De Limoges filed Critical Tetronics Research & Development Co. Limited
Publication of WO1993002787A1 publication Critical patent/WO1993002787A1/fr

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
    • B01J12/002—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor carried out in the plasma state
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J15/00—Chemical processes in general for reacting gaseous media with non-particulate solids, e.g. sheet material; Apparatus specially adapted therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00—Making metallic powder or suspensions thereof
    • B22F9/02—Making metallic powder or suspensions thereof using physical processes
    • B22F9/12—Making metallic powder or suspensions thereof using physical processes starting from gaseous material
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/14—Methods for preparing oxides or hydroxides in general
    • C01B13/20—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state
    • C01B13/22—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides
    • C01B13/28—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides using a plasma or an electric discharge
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/14—Methods for preparing oxides or hydroxides in general
    • C01B13/32—Methods for preparing oxides or hydroxides in general by oxidation or hydrolysis of elements or compounds in the liquid or solid state or in non-aqueous solution, e.g. sol-gel process
    • C01B13/326—Methods for preparing oxides or hydroxides in general by oxidation or hydrolysis of elements or compounds in the liquid or solid state or in non-aqueous solution, e.g. sol-gel process of elements or compounds in the liquid state
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/072—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with aluminium
    • C01B21/0722—Preparation by direct nitridation of aluminium
    • C01B21/0724—Preparation by direct nitridation of aluminium using a plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer

Definitions

  • the present invention relates to a process for the production of nano-sized powders and, in particular, to a process for the production of very pure nano-sized aluminium nitride.
  • the process of the present invention may be used to produce many types of powders, such as Zr ⁇ 2 , v 2 ° 3 ' A1 2° 3 and additionally metals such as
  • the present invention provides a process for the production of powdered materials having a particle size in the range of from 10 to 2 00 nanometres, which process comprises coupling at least two plasma arcs of opposite polarity in a reactor to form a plasma arc coupling zone, subjecting a target material to heating by means of the plasma arc coupling zone thereby causing the target material to fume, optionally subjecting the target material to a chemical reaction to form a product material, entraining the fumed target material or product material in a gas stream, cooling the said gas stream and collecting the powdered target material or product material.
  • the plasma arcs are usually generated by a system comprising at least two plasma electrodes of opposite polarity, one electrode acting as the cathode and one electrode acting as the anode.
  • a plurality of electrodes of opposite polarity may also be used, if desired.
  • the plasma electrodes are preferably inclined at an angle to one another, preferably in a symmetrical disposition. A wide range of electrode angles are possible ranging from the torches being parallel to each other to pointing at each other. It is preferred to have the electrodes pointing downstream with the angle between the electrodes being in the range of from 80° to 130°, i.e. the electrodes being at an angle of from 40° to 65° to the vertical.
  • the electrode tips may be in close proximity or they may be widely spaced depending upon the electrode sizing and input power. whilst all gases can be ionized to form a plasma, preferred gases for use when no chemical reaction of the fumed target material is being effected are He, Ne, Ar and N2, or mixtures or combinations thereof, with argon and nitrogen being the most preferred gases for use.
  • the current to the plasma arc torches used in the present invention may conveniently be in the range of from 100 to 1000 amps at a voltage of from 50 to 300 volts.
  • the gas flows through the anode plasma torch and the cathode plasma torch may conveniently be in the range of from 10 to 80 litres per minute.
  • the fumed product produced according to the process of the invention is of high purity and is ultra-fine, of a particle size in the range of from 10 to 200nm in diameter.
  • the degree of purity depends upon the plasma gases and initial feedstock purity and, when a chemical reaction is being carried out, upon the purity of the reactant.
  • the process of the present invention enables ultra-fine powders 10 to 200 nanometres in diameter to be produced.
  • the process may be operated as a batch process in which the target material is placed below the plasma arc coupling zone in a reactor, or as a continuous process in which granules of the target material are fed to a reactor to replenish the target material consumed.
  • the target material may optionally be subjected to a chemical reaction during the process of the present invention by reaction with a reactive gas.
  • a reactive gas For example, various metals may be reacted with a source of N atoms to form the metal nitrides. It is preferred that the source of N atoms for the formation of nitrides is nitrogen and/or ammonia.
  • the reactor in which the process of the present invention is carried out preferably comprises a water cooled outer shell.
  • the fumed target material or product material is entrained in a gas stream which is then cooled and the particulate material collected therefrom.
  • the gas stream will comprise the gases from the plasma formation and any gases which are used for reaction with the fumed target material.
  • the gas stream is exhausted from the reactor and cooled, for example in a water-cooled heat exchanger.
  • granules of the aluminium target material are fed to the reactor.
  • the aluminium target material is fed in the form of granules into a crucible which can be moved downwardly in the vertical direction.
  • the aluminium target material consumed in the reaction to form ultra-fine powdered aluminium nitride, but as the crucible is moved vertically downwards, an aluminium nitride log is formed in the crucible.
  • the present invention also includes within its scope an apparatus for the production of powdered materials which comprises: i) a water-cooled reactor; ii) at least one anodic plasma arc electrode and at least one cathodic plasma arc electrode, contained within the reactor, the electrodes being arranged in such a manner that the plasma arcs produced when the electrodes are in use couple together in a coupling zone; iii) a crucible contained within the reactor adapted to contain a target material; iv) means to exhaust gases from the reactor; v) a heat exchanger for cooling the exhaust gases from the reactor; and vi) means for the collection of the powdered material from the exhaust gases.
  • the apparatus of the present invention is provided with means to adjust the angle of inclination of the plasma arc torches.
  • the apparatus will also preferably include means for the introduction of a reactive gas into the reactor.
  • the means for the collection of the powdered material will generally comprise at least one bag filter, more preferably a plurality of bag filters arranged in parallel.
  • the apparatus may also comprise means for moving the crucible vertically in an upwards or downwards direction.
  • the process of the present invention is particularly suitable for the production of ultra- fine aluminium nitride.
  • the cathode and anode arcs are coupled above a target of aluminium, for example an aluminium ingot.
  • the gases used in the formation of the plasma arcs are preferably nitrogen at the cathode and argon at the anode.
  • an ammonia stream is directed at the aluminium surface in order to increase the rate of reaction.
  • the plasma arcs are transferred onto the aluminium target and due to the thermal energy of the plasma, the metal is melted and metal atoms are vaporised from the metal surface.
  • the nitrogen used as the plasma gas gives N atoms, N + ions, electrons and small amounts of N 2 .
  • the aluminium melt becomes supersaturated with nitrogen atoms which escape out of the arc and react into the vapour phase with aluminium vapor to produce aluminium nitride.
  • the fumed product is then entrained in the gas stream and collected, for example in a bag filter.
  • Figure 1 is a schematic diagram of the reactor for producing aluminium nitride
  • Figure 2 is a partial view of the apparatus of Figure 1 during operation
  • Figure 3 is a partial view of the apparatus of Figure 1 after operation for a further period of time;
  • Figure 4 is a schematic layout of the powder production operation, and
  • Figures 5a to 5f are schematic diagrams of the use of a moving crucible in the production of an aluminium nitride log as well as ultra-fine aluminium nitride powder.
  • two plasma arc torches, 1 and 2 are housed within a stainless steel reactor shell generally shown at 3, the reactor shell being water cooled.
  • Plasma arc torch 1 acts as the anode and plasma arc torch 2 acts as the cathode.
  • the arcs from the plasma arc torches 1 and 2 are coupled together in a coupling zone 4.
  • a graphite crucible 5 is placed beneath the coupling zone 4, the graphite crucible 5 containing a source 6 of the target material.
  • the plasma arc torch 1 preferably comprises an argon plasma arc column with a secondary stream of nitrogen injected via the shroud of the plasma arc torch into the argon plasma arc column.
  • the use of nitrogen as a primary anode gas was found to give excessive erosion and hence product contamination.
  • the nitrogen torch shroud produced a satisfactory product without consumption of the electrode.
  • the cathode torch 2 preferably uses nitrogen as its plasma gas and, for symmetry, incorporates a nitrogen shroud. Gas and water connections to the plasma arc torches 1 and 2 are made via ports 30 and 31, respectively.
  • the plasma arc torches 1 and 2 are pivoted in the reactor shell by pivot means 7 and 8.
  • the pivot means 7 and 8 enable the angles of the plasma arc torches to be varied, as required. As illustrated the torches are at an angle of approximately 120° to one another.
  • ammonia gas is injected into the reactor 3 via two water cooled stainless steel nozzles: a water cooled stainless steel nozzle 9 and a toroidal tube nozzle 10.
  • the primary flow of ammonia is via nozzle 9, with secondary ammonia flow being injected through the toroidal tube 10 positioned below the reactor throat 12.
  • Nozzle 9 is positioned directly above the plasma arc coupling zone and ammonia is directed at the intercept of the centres of the twin plasma arc torches, as shown.
  • the plasma to plasma centre distance is set at about 75mm for plasma start and transfer of the twin plasma arcs.
  • the stainless steel reactor 3 may be considered to be divided into three sections - zone A contains the target material, preferably aluminium, in a graphite crucible.
  • zone B the twin plasma arcs couple and impinge upon the target to produce a fumed product which expands into zone B where additional ammonia jets impinge directly across the reactor throat.
  • the fumed product is then carried in the gas streams via the reactor throat into an expansion zone C (see Figure 4) where the chamber is expanded to allow an increased residence time of the fumed products.
  • the course of the reaction may be examined at any time by. means of a sight port 13 introduced in the wall of the stainless steel reactor shell 3.
  • aluminium nitride crystals 14 is shown on the surface of the molten aluminium 6, the aluminium nitride crystals 14 being formed shortly after the plasma arc reaction begins.
  • the next stage in the reaction to produce aluminium nitride is illustrated in Figure 2.
  • a mushroom growth 20 from the surface of the aluminium reservoir is formed.
  • the mushroom growth 20 was found to consist of aluminium nitride in an aluminium matrix.
  • the mushroom development ceased at a distance of about 100 mm from the plasma torch centres.
  • the fume rate increased as the mushroom approached the plasma arc coupling zone and then decreased until a balance of growth to vaporisation occurred.
  • Figure 3 illustrates the reaction after a further period of time when a cavity 21 is formed in the mushroom 20 so that a type of "cocoon" is formed.
  • the cavity 21 formed in the mushroom 20 develops as the aluminium reservoir is consumed and it develops around the tail flame of the plasma arcs. Fuming continues as the plasma arc columns impinge on and within the growing cocoon.
  • FIG. 4 of the accompanying drawings shows a schematic layout for the production of ultra-fine powder.
  • the water cooled reactor 3 is positioned on a trolley 40, or other suitable means of support.
  • the reactor has an inlet 41 for the additional supply of gas to the reactor, for example a supply of nitrogen.
  • the reactor is equipped with an exhaust 42 which is connected to a water-cooled heat exchanger 43.
  • the heat exchanger 43 is provided with a baffle plate 44 which prevents the escape of large particles from the heat exchanger.
  • the heat exchanger is connected via pipe 45, flow valve 46 and ball valve 47 to two bag filters 48 which are arranged in parallel.
  • the bag filters are gas permeable and may be made, for example, from Gortex or from Nomex fibre coated with a fine layer of polytetrafluoroethylene. Twin bag filters are used in parallel to allow off-line collection of the product.
  • the fumed product which exits from the reactor via exhaust 42 is about 300°C lower in temperature than the product in zone B of the reactor. This is the result of the expansion in zone C, as previously discussed.
  • Gases are vented from the bag filter collection unit 48 via line 49.
  • the vented gases comprise approximately 30% hydrogen, 7% argon and the remainder nitrogen. They are then vented via a water trap (not shown) to the atmosphere.
  • Figure 5a shows plasma arc torches 50 and 51 coupling above an aluminium reservoir 52 in a crucible 53. After some minutes of operation, as shown in Figure 5b, a cavity 54 forms in the aluminium reservoir 52.
  • Aluminium feedstock material is then fed in a stream 55 into the cavity 54 and the crucible 53 is moved downwardly, as shown by the arrow in Figure 5c.
  • the crucible 53 continues to be lowered in a downwardly direction, whilst the aluminium feedstock continues to be fed to the crucible 53 as a stream 55.
  • An aluminium nitride log begins to be formed at 56.
  • the crucible 53 continues to be lowered as shown in Figure 5e and the aluminium nitride log increases in size.
  • the final aluminium nitride log produced is shown in Figure 5f.
  • ultra-fine aluminium nitride powder is produced by the method as particularly described with reference to Figures 1 and 4.
  • the aluminium nitride log is thus produced as a by-product of the production of ultra-fine aluminium nitride powder.
  • aluminium nitride was produced under the following conditions.
  • Argon was used as the primary gas for the anode torch, with a secondary shroud of nitrogen, whilst nitrogen was used as both the primary anode gas and secondary shroud for the cathode torch.
  • the gas flows were as follows:
  • the apex angle between the plasma torches was 120° and the plasma centre to centre distance was set at 75mm for plasma start and transfer of the twin arcs.
  • Ammonia was directed at the intercept of the centres of the twin torches as shown in Figure 1, the ammonia flow rate being 70 N litres/minute.
  • Secondary ammonia was injected across the throat of the reactor from nozzles 10 and 11 at a rate of 70 N 1itres/minute.
  • the plasma current was in the range of from 350 to 420 amps, although a higher current was used initially to heat up the aluminium target material. Under these conditions, aluminium nitride was produced and collected in the bag filters. The aluminium nitride had a particle size in the range of from 12 to 100 nanometres.
  • the aluminium nitride was produced at a rate of approximately 3 kilograms per hour.

Abstract

Procédé de production de matériaux en poudre présentant une grosseur particulaire comprise entre 10 et 200 nanomètres, ce procédé consistant à coupler au moins deux arcs de plasma de polarité opposée dans un réacteur pour produire une zone de couplage d'arc de plasma, à chauffer un matériau cible par l'intermédiaire de la zone de couplage d'arc de plasma de sorte que le matériau cible émette de la fumée, à soumettre éventuellement le matériau cible à une réaction chimique pour former un produit, à entraîner le matériau cible émettant de la fumée, ou le produit, dans un courant gazeux, à refroidir ledit courant gazeux et à recueillir le matériau cible ou le produit en poudre.
PCT/GB1992/001301 1991-07-31 1992-07-16 Procede de production de materiaux en poudre ultrafins WO1993002787A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB919116446A GB9116446D0 (en) 1991-07-31 1991-07-31 A twin plasma torch process for the production of ultra-fine aluminium nitride
GB9116446.7 1991-07-31

Publications (1)

Publication Number Publication Date
WO1993002787A1 true WO1993002787A1 (fr) 1993-02-18

Family

ID=10699236

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/GB1992/001301 WO1993002787A1 (fr) 1991-07-31 1992-07-16 Procede de production de materiaux en poudre ultrafins

Country Status (2)

Country Link
GB (1) GB9116446D0 (fr)
WO (1) WO1993002787A1 (fr)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0645207A2 (fr) * 1993-09-29 1995-03-29 Ykk Corporation Particules métalliques ultrafines amorphes et leur procédé de préparation
WO1996001786A1 (fr) * 1994-07-11 1996-01-25 University Of Cincinnati Procede de production de nitrure en poudre
WO1996006700A2 (fr) * 1994-08-25 1996-03-07 Qqc, Inc. Particules nanometriques et leurs utilisations
EP0711217A1 (fr) * 1993-07-27 1996-05-15 Nanophase Technologies Corporation Procede et appareil de production de materiaux nanostructures
WO2000005017A1 (fr) * 1998-07-21 2000-02-03 Commonwealth Scientific And Industrial Research Organisation Procede et appareil de production de vapeurs de materiaux
WO2003042625A1 (fr) 2001-11-14 2003-05-22 Qinetiq Limited Revetement de cone de charge creuse
EP2320025A1 (fr) 2003-10-10 2011-05-11 Qinetiq Limited Améliorations de ou associées aux perforateurs de puits de pétrole
RU2492027C1 (ru) * 2012-04-06 2013-09-10 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Казанский национальный исследовательский технологический университет" (ФГБОУ ВПО "КНИТУ") Плазмохимический способ получения модифицированного ультрадисперсного порошка
RU2727436C1 (ru) * 2019-08-01 2020-07-21 Федеральное государственное бюджетное научное учреждение "Федеральный исследовательский центр "Красноярский научный центр Сибирского отделения Российской академии наук" Способ синтеза порошков со структурой ядро-оболочка
CN111470481A (zh) * 2020-05-19 2020-07-31 四川大学 一种等离子体反应雾化制备高纯氮化铝球形粉末的方法
RU2762455C1 (ru) * 2021-04-13 2021-12-21 федеральное государственное бюджетное образовательное учреждение высшего образования "Казанский национальный исследовательский технический унивреситет им. А.Н. Туполева - КАИ" Способ создания структурно-градиентных порошковых материалов
TWI787148B (zh) * 2015-06-05 2022-12-21 加拿大商匹若堅尼斯加拿大股份有限公司 透過電漿原子化從焊線生產粉末的裝置和方法，以及其生產的粉末

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2647590A1 (de) * 1976-10-21 1978-04-27 Berghaus Ionit Anstalt Stromdurchfuehrung
US4472254A (en) * 1983-05-02 1984-09-18 Olin Corporation Electric plasma discharge combustion synthesis of chlorine dioxide
EP0161563A1 (fr) * 1984-04-27 1985-11-21 Hitachi, Ltd. Procédé et appareil pour la fabrication de particules ultrafines
JPS6111140A (ja) * 1984-06-26 1986-01-18 High Frequency Heattreat Co Ltd 高純度セラミツクス超微粒子の製造方法
JPS61141606A (ja) * 1984-12-13 1986-06-28 Japan Metals & Chem Co Ltd 超微粉金属窒化物の製造方法ならびに製造装置
US4642207A (en) * 1983-06-04 1987-02-10 National Research Institute For Metals Process for producing ultrafine particles of ceramics
EP0220420A2 (fr) * 1985-10-30 1987-05-06 Hitachi, Ltd. Installation pour la préparation de poudres ultrafines

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2647590A1 (de) * 1976-10-21 1978-04-27 Berghaus Ionit Anstalt Stromdurchfuehrung
US4472254A (en) * 1983-05-02 1984-09-18 Olin Corporation Electric plasma discharge combustion synthesis of chlorine dioxide
US4642207A (en) * 1983-06-04 1987-02-10 National Research Institute For Metals Process for producing ultrafine particles of ceramics
EP0161563A1 (fr) * 1984-04-27 1985-11-21 Hitachi, Ltd. Procédé et appareil pour la fabrication de particules ultrafines
JPS6111140A (ja) * 1984-06-26 1986-01-18 High Frequency Heattreat Co Ltd 高純度セラミツクス超微粒子の製造方法
JPS61141606A (ja) * 1984-12-13 1986-06-28 Japan Metals & Chem Co Ltd 超微粉金属窒化物の製造方法ならびに製造装置
EP0220420A2 (fr) * 1985-10-30 1987-05-06 Hitachi, Ltd. Installation pour la préparation de poudres ultrafines

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 10, no. 335 (C-384)13 November 1986 & JP,A,61 141 606 ( JAPAN METALS & CHEM. CO., LTD. ) 28 June 1986 *
Section Ch, Week 8609, Derwent Publications Ltd., London, GB; Class L02, AN 86-059215 & JP,A,61 011 140 (KOSHUHA NETSUREN K.K.) 18 January 1986 *

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0711217A4 (fr) * 1993-07-27 1996-09-04 Nanophase Tech Corp Procede et appareil de production de materiaux nanostructures
EP0711217A1 (fr) * 1993-07-27 1996-05-15 Nanophase Technologies Corporation Procede et appareil de production de materiaux nanostructures
EP0645207A2 (fr) * 1993-09-29 1995-03-29 Ykk Corporation Particules métalliques ultrafines amorphes et leur procédé de préparation
EP0645207A3 (fr) * 1993-09-29 1996-09-11 Ykk Corp Particules métalliques ultrafines amorphes et leur procédé de préparation.
WO1996001786A1 (fr) * 1994-07-11 1996-01-25 University Of Cincinnati Procede de production de nitrure en poudre
EP0777550A4 (fr) * 1994-08-25 1998-04-08 Qqc Inc Particules nanometriques et leurs utilisations
WO1996006700A3 (fr) * 1994-08-25 1996-03-28 Qqc Inc Particules nanometriques et leurs utilisations
EP0777550A2 (fr) * 1994-08-25 1997-06-11 Qqc, Inc. Particules nanometriques et leurs utilisations
WO1996006700A2 (fr) * 1994-08-25 1996-03-07 Qqc, Inc. Particules nanometriques et leurs utilisations
WO2000005017A1 (fr) * 1998-07-21 2000-02-03 Commonwealth Scientific And Industrial Research Organisation Procede et appareil de production de vapeurs de materiaux
WO2003042625A1 (fr) 2001-11-14 2003-05-22 Qinetiq Limited Revetement de cone de charge creuse
US7261036B2 (en) 2001-11-14 2007-08-28 Qinetiq Limited Shaped charge liner
EP2320025A1 (fr) 2003-10-10 2011-05-11 Qinetiq Limited Améliorations de ou associées aux perforateurs de puits de pétrole
RU2492027C1 (ru) * 2012-04-06 2013-09-10 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Казанский национальный исследовательский технологический университет" (ФГБОУ ВПО "КНИТУ") Плазмохимический способ получения модифицированного ультрадисперсного порошка
TWI787148B (zh) * 2015-06-05 2022-12-21 加拿大商匹若堅尼斯加拿大股份有限公司 透過電漿原子化從焊線生產粉末的裝置和方法，以及其生產的粉末
RU2727436C1 (ru) * 2019-08-01 2020-07-21 Федеральное государственное бюджетное научное учреждение "Федеральный исследовательский центр "Красноярский научный центр Сибирского отделения Российской академии наук" Способ синтеза порошков со структурой ядро-оболочка
CN111470481A (zh) * 2020-05-19 2020-07-31 四川大学 一种等离子体反应雾化制备高纯氮化铝球形粉末的方法
CN111470481B (zh) * 2020-05-19 2023-09-19 四川大学 一种等离子体反应雾化制备高纯氮化铝球形粉末的方法
RU2762455C1 (ru) * 2021-04-13 2021-12-21 федеральное государственное бюджетное образовательное учреждение высшего образования "Казанский национальный исследовательский технический унивреситет им. А.Н. Туполева - КАИ" Способ создания структурно-градиентных порошковых материалов

Also Published As

Publication number Publication date
GB9116446D0 (en) 1991-09-11

Similar Documents

Publication Publication Date Title
CA2581806C (fr) Synthese plasmique de nanopoudres
EP1115523B1 (fr) Procede et systeme de plasma a arc transfere pour la production de poudres fines et ultra-fines
Fauchais et al. Reactive thermal plasmas: ultrafine particle synthesis and coating deposition
EP0282291B1 (fr) Procédé de préparation de particules extrêmement fines de métaux, de composés de métal et de céramique, et dispositif utilisé
US5407458A (en) Fine-particle metal powders
KR101785440B1 (ko) 나노분말의 합성 및 재료 가공용 플라즈마 반응기
US4897282A (en) Thin film coating process using an inductively coupled plasma
US5403375A (en) Fine-particle metal powders
CA2034459C (fr) Depot par pulverisation en radiofrequence a basse frequence
JP3274740B2 (ja) 金属およびセラミツク微粉末を製造するための装置及び方法
US20040065170A1 (en) Method for producing nano-structured materials
US3211548A (en) Process for the production of tantalum or niobium in a hydrogen plasma jet
WO1993002787A1 (fr) Procede de production de materiaux en poudre ultrafins
RU2455119C2 (ru) Способ получения наночастиц
US3625846A (en) Chemical process and apparatus utilizing a plasma
US5384306A (en) Fine-particle oxide ceramic powders
AU2002332200B2 (en) Method for carrying out homogeneous and heterogeneous chemical reactions using plasma
Munz et al. Application of transferred arcs to the production of nanoparticles
JPS60224706A (ja) 金属超微粒子の製造法
WO2000005017A1 (fr) Procede et appareil de production de vapeurs de materiaux
Venkatramani Thermal plasmas in material processing
JPS6111140A (ja) 高純度セラミツクス超微粒子の製造方法
JP2646438B2 (ja) ダイヤモンド気相合成方法
JP2841715B2 (ja) ダイヤモンド膜の製造装置および製造方法
JP2806548B2 (ja) 熱プラズマ蒸発法による成膜方法

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): JP KR US

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): AT BE CH DE DK ES FR GB GR IT LU MC NL SE

DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
122 Ep: pct application non-entry in european phase