USRE37299E1 - Atomic force microscopy - Google Patents
Atomic force microscopy Download PDFInfo
- Publication number
- USRE37299E1 USRE37299E1 US08/791,445 US79144597A USRE37299E US RE37299 E1 USRE37299 E1 US RE37299E1 US 79144597 A US79144597 A US 79144597A US RE37299 E USRE37299 E US RE37299E
- Authority
- US
- United States
- Prior art keywords
- cantilever beam
- tip
- laser
- cantilever
- force microscope
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q20/00—Monitoring the movement or position of the probe
- G01Q20/02—Monitoring the movement or position of the probe by optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
- Y10S977/86—Scanning probe structure
- Y10S977/868—Scanning probe structure with optical means
- Y10S977/87—Optical lever arm for reflecting light
Definitions
- the present invention relates to atomic force microscopy and specifically to an atomic force microscope which employs a micromachined cantilever beam in order to achieve atomic resolution.
- the atomic force microscope is capable of operation in vacuum, air or liquid environments, of scanning a large surface area and of providing common mode rejection for improved operation.
- Atomic force microscopy is based upon the principle of sensing the forces between a sharp stylus or tip and the surface to be investigated.
- the interatomic forces induce the displacement of the stylus mounted on the end of a cantilever beam.
- a tunneling junction was used to detect the motion of the stylus attached to an electrically conductive cantilever beam.
- optical interferometry was used to detect cantilever beam deflection.
- a sharply pointed tip is attached to a spring-like cantilever beam to scan the profile of a surface to be investigated.
- the attractive or repulsive forces occurring between the atoms at the apex of the tip and those of the surface result in tiny deflections of the cantilever beam.
- the deflection is measured by means of a tunneling microscope. That is, an electrically conductive tunnel tip is disposed within the tunnel distance from the back of the cantilever beam, and the variations of the tunneling current are indicative of the beam deflection.
- the forces occurring between the tip and the surface under investigation are determined from the measured beam deflection and the characteristics of the cantilever beam.
- the atomic force microscope has a promising future in research and development and in manufacturing environments because of its unique capabilities of imaging insulators and measuring minute forces.
- the atomic force microscope should be versatile, i.e., operate in vacuum, air or aqueous environments and be reliable, simple, and compact.
- atomic resolution and the ability to scan larger areas are additional requirements.
- a piezoelectric tube is used for scanning a surface and a micromachined cantilever beam is used for supporting the tip.
- the micromachined cantilever beam orientation is sensed by reflecting a laser beam from the back of the cantilever beam and detecting the reflected laser beam with a position-sensitive detector, preferably a bicell.
- the laser beam source is preferably, but not necessarily, a single-mode diode laser operating in the visible range.
- the laser output is coupled into a single-mode optical fiber whose output is focussed onto the back of the cantilever beam.
- the laser beam is focussed onto the arm or arms in the region of the tip.
- the term focussed onto the back of the cantilever will be understood to encompass both focussed onto the back of the cantilever beam itself or onto the arm or arms in the region of the tip.
- the angle of deflection of the reflected beam is detected with the bicell.
- Common mode rejection of intensity fluctuations is achieved by symmetrically positioning the bicell with respect to the incoming beam. In the present invention, the positioning is achieved, remotely, by means of an inertial mover as will be described below. Remote positioning of the bicell in ultrahigh vacuum environments is essential.
- common mode rejection can be achieved electronically, e.g., by attaching a variable resistance, in series, to each segment of the bicell to equalize the voltage drop across the resistances, thus providing an electronic equivalent of centering the reflected laser beam on the face of the bicell.
- the output of the bicell is provided to a computer for processing the data for providing an image of the surface to be investigated with atomic resolution.
- the present invention relies upon the measurement of the cantilever beam orientation rather than displacement. A change in position is transformed into an angular change which is inversely proportional to the length of the cantilever.
- the length of the cantilever beam has been on the order of 1 mm.
- the micromachined cantilever beam employed in the present invention is on the order of 100 microns in length thereby enabling atomic resolution of the surface to be investigated.
- the output of the visible diode laser is an elliptical beam with an aspect ratio in the range of approximately 5 to 7:1. While such ellipiticity is generally considered undesirable requiring optical correction, the asymmetric beam shape is advantageously used in practicing the present invention.
- An additional advantage of the elliptical beam resides in the ability to use a laser with higher laser power, without exceeding the saturation limit of the bicell, and thereby achieve higher measurement sensitivity. It is also possible to reduce the distance between the cantilever beam and the bicell, thus making the atomic force microscope even more compact.
- a cylindrical lens can be used to achieve the advantageous elliptical shape.
- a principal object of the present invention is, therefore, the provision of sensing the orientation of a micromachined cantilever beam of an atomic force microscope with optical-beam-deflection.
- An object of the present invention is the provision of an atomic force microscope employing an inertial mover coupled to a position-sensitive detector.
- Another object of the present invention is the provision of a method for combining the use of optical-beam-deflection techniques with the use of microfabricated cantilever beams, including the use of optical fibers to implement the optical-beam-deflection technique.
- FIG. 1 is a schematic representation of a portion of an atomic force microscope
- FIG. 2 is a schematic diagram of a portion of an atomic force microscope comprising the present invention
- FIG. 3 is a schematic diagram of a preferred position-sensitive detector useful for practicing the present invention.
- FIG. 4 is an illustration of an elliptical laser beam spot focussed on a micromachined cantilever beam forming a part of an atomic force microscope
- FIG. 5 is an illustration of an elliptical laser beam spot received at a position-sensitive detector.
- Atomic force microscopes are known in the art as described, for example, in U.S. Pat. No. 4,724,318 issued to G. Binnig and assigned to the same assignee or the present invention, which patent is incorporated herein by reference. While the Binnig patent describes a method of measuring the tip to surface distance by means of monitoring the tunneling current, the present invention measures the tip orientation by optical-beam-deflection, as will be described hereinafter.
- the present invention is most advantageous for operation in an inaccessible environment, such as in a vacuum or an ultrahigh vacuum, due to the provision of a remotely positionable position-sensitive detector.
- a stylus-cantilever system includes a cantilever beam 10 made of, e.g., silicon or silicon nitride, having a tip 12 of a length in the range between 1 and 10 microns, and preferably 5 micrometers in length disposed at the end of a pair of supporting arms 14 .
- the tip 12 can be disposed at the end of single supporting arm extending from end of cantilever beam 10 .
- a laser 18 transmits a laser beam through lens 20 where the beam is focussed directly onto the back of the arms 14 in the region of the tip.
- the laser beam is focussed onto the back of the cantilever beam; or, alternatively, onto a reflector 16 attached to the back of the cantilever beam for the purpose of enhancing reflective properties.
- the term “onto the back of the cantilever” will be understood to mean a laser beam transmitted onto the back of the cantilever beam itself, onto the back of a reflector coupled to the back of the cantilever beam, or onto one or more tip supporting arms in the region of the tip.
- the laser beam is reflected onto a position-sensitive detector 22 .
- the output of the detector 22 is provided as one input to a general purpose computer.
- the x-axis and y-axis positions of the tip as the tip is scanned over the workpiece surface are also provided as inputs to the computer as is known in the art.
- the computer processes the data in a known manner for providing a topographical image of the surface at atomic resolution.
- the image can be displayed on a screen or on a strip chart, be in tabular form or otherwise provided in a visual format.
- the laser 18 is a compact single-mode diode laser operating preferably in the visible light spectrum, preferably at 670 nm, for ease of alignment. However, a laser operating in the infrared or ultraviolet range will perform equally as well.
- the preferred position-sensitive detector is a silicon bicell.
- an atomic force microscope detects the motion of the tip toward and away from a surface to be inspected 24 .
- the motion of the tip is proportional to the interaction force between the tip and surface of the workpiece w.
- the orientation of the cantilever beam supporting the tip is measured.
- the measurements can be performed in a vacuum or ultrahigh vacuum, in an aqueous environment or in air depending upon the application.
- the general atomic force microscope configuration for each environment is well known to those skilled in the art.
- FIG. 2 illustrates a modification to a conventional atomic force microscope which is most useful when performing measurements in an ultrahigh vacuum environment. However, the microscope will perform in water and in non-vacuum environments equally as well with the modification.
- the laser beam from laser 18 is coupled to a single mode optical fiber 26 whose output is focussed via lens 28 to a reflector 30 disposed on the back of a cantilever beam.
- the laser beam is reflected from the reflector to a position sensitive detector.
- the side of the cantilever beam including the tip is referred to as the front side of the cantilever beam and the oppositely disposed side of the cantilever beam containing the reflector is referred to as the back of the cantilever beam.
- a piezoelectric tube 32 is used as a scanner.
- the cantilever beam which is micromachined, has a length in the range between 100 and 200 microns and preferably is 100 microns long, and has a width in the range between 5 and 30 microns and preferably is 20 microns wide.
- the length and width dimensions are dependent upon the material comprising the cantilever beam and are selected in order to achieve a soft lever configuration of the stylus-cantilever system having a force constant in the range between 0.01 and 100 Newton/meter and preferably having a force constant of 0.1 N/m.
- the cantilever beam is coupled to the tube scanner 32 .
- micromachined cantilever beam of small dimension enables imaging at atomic resolution as contrasted with the heretofore employed cantilever beams which were typically on the order of one millimeter in length and were limited in terms of resolution.
- the described arrangement ensures a high scanning speed and imposes virtually no restriction on the size of a surface to be investigated.
- the maximum scanning speed is determined by the resonance frequency of the cantilever beam, typically 100 kHz, or by the resonance frequency of the tube scanner, typically 10 kHz.
- a preferred position sensitive detector is a bicell and preferably a silicon bicell for detecting the angle of deflection of the laser beam.
- An inertial mover as shown in FIG. 3, ensures the rejection of intensity fluctuations of the light falling on the bicell by remotely positioning the bicell symmertrically with respect to the laser beam deflected from the cantilever beam.
- the inertial mover includes a piezoelectric bar 36 whose length is varied by the application of a saw-tooth waveform voltage signal to the bar as is known in the art.
- a piezoelectric bar 36 mounteded on a sapphire plate 38 located near one end of the piezoelectric bar 36 is a bicell 40 .
- the bicell can readily slide responsive to an appropriate saw-tooth waveform voltage signal applied to the piezoelectric bar 36 via conductors (not shown) as is known in the art.
- the sapphire plate 38 and the bicell 40 coupled thereto will move as the saw-toothed waveform voltage signal is applied to the bar. In this manner, the position of the bicell 40 can be remotely controlled in steps as small as 100 angstroms.
- the inertial mover is compact and fully computer-controllable which is particularly advantageous for use in ultrahigh vacuum environments.
- a scanner and detector of the types described in FIGS. 2 and 3, namely micron-sized micromachined cantilever beams and laser beam deflection results in an atomic force microscope apparatus that measures the orientation of the cantilever beam rather than its displacement. That is, a change of the cantilever beam position is transformed into an angular change which change is inversely proportional to the length of the cantilever beam, hence making full use of the small size dimensions.
- Another advantage of the present atomic force microscope design is that all required alignments and adjustments are in excess of 10 microns, a range which is easily achieved with simple standard mechanical tools.
- the optical fiber 26 can be eliminated in order to provide a more compact design. It is possible to eliminate the inertial mover when operating in a non-vacuum environment.
- a primary function of the inertial mover is to provide the ability to remotely position the bicell in a vacuum chamber. For example, in situ tip replacement can be incorporated in the atomic force microscope design, a feature that could result in significant misalignment of the optical path requiring repositioning of the bicell.
- the output of a visible diode laser is an elliptical beam having an aspect ratio in the range of approximately 5 to 7:1.
- the ellipticity is eliminated by the use of suitable optics.
- the asymmetric beam shape is an important aspect of an alternative preferred embodiment of the invention.
- the elliptical beam spot reflects from the cantilever beam in accordance with the same aspect ratio and the resultant reflected spot size is approximately six times smaller in the direction perpendicular to the longitudinal axis of the cantilever beam.
- the elongated, or other than circular, shape (e.g., elliptical or asymmetric ) light spot of the reflected laser beam 46 at bicell 40 moves in a direction transverse to its elongation dimension when the atomic forces deflect the cantilever beam 44 .
- the size of the reflected laser beam 46 received at the bicell 40 is 5 to 7 times larger in the direction perpendicular to the deflection direction as shown in FIG. 5, thereby enabling the use of higher laser power, without exceeding the saturation limit of the bicell, and correspondingly achieving higher measurement sensitivity.
- the distance between the cantilever beam and bicell can be decreased, thus resulting in an even more compact microscope.
Abstract
An atomic force microscope includes a tip mounted on a micromachined cantilever. As the tip scans a surface to be investigated, interatomic forces between the tip and the surface induce displacement of the tip. A laser beam is transmitted to and reflected from the cantilever for measuring the cantilever orientation. In a preferred embodiment the laser beam has an elliptical shape. The reflected laser beam is detected with a position-sensitive detector, preferably a bicell. The output of the bicell is provided to a computer for processing of the data for providing a topographical image of the surface with atomic resolution.
Description
This reissue application is a continuation of reissue application No. 08/692,653, filed on Aug. 6, 1996, now abandoned, which is a continuation of reissue application No. 08/601,487, filed on Feb. 14, 1996, now abandoned, which is a continuation of reissue application No. 08/301,856, filed Sep. 7, 1994, now abandoned, which is a reissue application for the reissue of U.S. Pat. No. 5,144,833 granted Sep. 8, 1992 upon U.S. patent application No. 07/588,795, filed Sep. 27, 1990.
The present invention relates to atomic force microscopy and specifically to an atomic force microscope which employs a micromachined cantilever beam in order to achieve atomic resolution. In addition, the atomic force microscope is capable of operation in vacuum, air or liquid environments, of scanning a large surface area and of providing common mode rejection for improved operation.
Atomic force microscopy is based upon the principle of sensing the forces between a sharp stylus or tip and the surface to be investigated. The interatomic forces induce the displacement of the stylus mounted on the end of a cantilever beam. In its original implementation, a tunneling junction was used to detect the motion of the stylus attached to an electrically conductive cantilever beam. Subsequently, optical interferometry was used to detect cantilever beam deflection.
As described by G. Binnig et al, in Phys. Rev. Lett., vol. 56, No. 9, March 1986, pp. 930-933, a sharply pointed tip is attached to a spring-like cantilever beam to scan the profile of a surface to be investigated. The attractive or repulsive forces occurring between the atoms at the apex of the tip and those of the surface result in tiny deflections of the cantilever beam. The deflection is measured by means of a tunneling microscope. That is, an electrically conductive tunnel tip is disposed within the tunnel distance from the back of the cantilever beam, and the variations of the tunneling current are indicative of the beam deflection. The forces occurring between the tip and the surface under investigation are determined from the measured beam deflection and the characteristics of the cantilever beam.
In articles by G. McClelland et al, entitled “Atomic Force Microscopy: General Principles and a New Implementation”, Rev. Progr. Quart. Non-destr. Eval., vol. 6, 1987, p. 1307 and Y. Martin et al, entitled “Atomic force microscope-force mapping and profiling on a sub 100- Å scale”, J. Appl. Phys., vol. 61, no. 10, May 15, 1987, pp 4723-4729, there is described the use of a laser interferometer to measure tip displacement. The advantages of optical detection over tunneling detection of the cantilever beam deflection are increased reliability and ease of implementation, insensitivity to the roughness of the beam, and a smaller sensitivity to thermal drift.
The atomic force microscope has a promising future in research and development and in manufacturing environments because of its unique capabilities of imaging insulators and measuring minute forces. In order to fulfill the promise, the atomic force microscope should be versatile, i.e., operate in vacuum, air or aqueous environments and be reliable, simple, and compact. Moreover, for certain applications atomic resolution and the ability to scan larger areas are additional requirements.
According to the present invention, a piezoelectric tube is used for scanning a surface and a micromachined cantilever beam is used for supporting the tip. The micromachined cantilever beam orientation is sensed by reflecting a laser beam from the back of the cantilever beam and detecting the reflected laser beam with a position-sensitive detector, preferably a bicell. The laser beam source is preferably, but not necessarily, a single-mode diode laser operating in the visible range. The laser output is coupled into a single-mode optical fiber whose output is focussed onto the back of the cantilever beam. In an alternative embodiment where the tip is supported by one or more arms extending from the end of the cantilever, the laser beam is focussed onto the arm or arms in the region of the tip. The term focussed onto the back of the cantilever will be understood to encompass both focussed onto the back of the cantilever beam itself or onto the arm or arms in the region of the tip. The angle of deflection of the reflected beam is detected with the bicell. Common mode rejection of intensity fluctuations is achieved by symmetrically positioning the bicell with respect to the incoming beam. In the present invention, the positioning is achieved, remotely, by means of an inertial mover as will be described below. Remote positioning of the bicell in ultrahigh vacuum environments is essential. Alternatively, in cases where deviation from the center position on the bicell are small compared to the laser beam diameter, common mode rejection can be achieved electronically, e.g., by attaching a variable resistance, in series, to each segment of the bicell to equalize the voltage drop across the resistances, thus providing an electronic equivalent of centering the reflected laser beam on the face of the bicell. The output of the bicell is provided to a computer for processing the data for providing an image of the surface to be investigated with atomic resolution.
The present invention relies upon the measurement of the cantilever beam orientation rather than displacement. A change in position is transformed into an angular change which is inversely proportional to the length of the cantilever. In prior art atomic force microscopes the length of the cantilever beam has been on the order of 1 mm. The micromachined cantilever beam employed in the present invention is on the order of 100 microns in length thereby enabling atomic resolution of the surface to be investigated. When practicing the invention in an environment not requiring a vacuum, simplifications to the arrangement are possible. For example, the optical fiber can be eliminated, resulting in a more compact design. Also, the inertial mover is not required since the microscope components are accessible.
Preferably, the output of the visible diode laser is an elliptical beam with an aspect ratio in the range of approximately 5 to 7:1. While such ellipiticity is generally considered undesirable requiring optical correction, the asymmetric beam shape is advantageously used in practicing the present invention. By appropriately focussing the laser beam on a rectangular cantilever beam, increased sensitivity of the laser beam deflection measurement and a simplified alignment procedure are achieved. An additional advantage of the elliptical beam resides in the ability to use a laser with higher laser power, without exceeding the saturation limit of the bicell, and thereby achieve higher measurement sensitivity. It is also possible to reduce the distance between the cantilever beam and the bicell, thus making the atomic force microscope even more compact. In cases where the beam is not inherently elliptical, as in the case of the light output from an optical fiber, a cylindrical lens can be used to achieve the advantageous elliptical shape.
A principal object of the present invention is, therefore, the provision of sensing the orientation of a micromachined cantilever beam of an atomic force microscope with optical-beam-deflection.
An object of the present invention is the provision of an atomic force microscope employing an inertial mover coupled to a position-sensitive detector.
Another object of the present invention is the provision of a method for combining the use of optical-beam-deflection techniques with the use of microfabricated cantilever beams, including the use of optical fibers to implement the optical-beam-deflection technique.
Further and still other objects of the present invention will become more clearly apparent when the following description is read in conjunction with the accompanying drawings.
FIG. 1 is a schematic representation of a portion of an atomic force microscope;
FIG. 2 is a schematic diagram of a portion of an atomic force microscope comprising the present invention;
FIG. 3 is a schematic diagram of a preferred position-sensitive detector useful for practicing the present invention;
FIG. 4 is an illustration of an elliptical laser beam spot focussed on a micromachined cantilever beam forming a part of an atomic force microscope; and
FIG. 5 is an illustration of an elliptical laser beam spot received at a position-sensitive detector.
Atomic force microscopes are known in the art as described, for example, in U.S. Pat. No. 4,724,318 issued to G. Binnig and assigned to the same assignee or the present invention, which patent is incorporated herein by reference. While the Binnig patent describes a method of measuring the tip to surface distance by means of monitoring the tunneling current, the present invention measures the tip orientation by optical-beam-deflection, as will be described hereinafter. The present invention is most advantageous for operation in an inaccessible environment, such as in a vacuum or an ultrahigh vacuum, due to the provision of a remotely positionable position-sensitive detector.
Referring now to the figures and to FIG. 1 in particular, there is shown a schematic representation of a cantilever beam deflection detection scheme. A stylus-cantilever system includes a cantilever beam 10 made of, e.g., silicon or silicon nitride, having a tip 12 of a length in the range between 1 and 10 microns, and preferably 5 micrometers in length disposed at the end of a pair of supporting arms 14. Alternatively, the tip 12 can be disposed at the end of single supporting arm extending from end of cantilever beam 10. A laser 18 transmits a laser beam through lens 20 where the beam is focussed directly onto the back of the arms 14 in the region of the tip. In an alternative embodiment (not shown) where the tip extends directly from the cantilever beam, the laser beam is focussed onto the back of the cantilever beam; or, alternatively, onto a reflector 16 attached to the back of the cantilever beam for the purpose of enhancing reflective properties. As used herein, the term “onto the back of the cantilever” will be understood to mean a laser beam transmitted onto the back of the cantilever beam itself, onto the back of a reflector coupled to the back of the cantilever beam, or onto one or more tip supporting arms in the region of the tip. The laser beam is reflected onto a position-sensitive detector 22. The output of the detector 22 is provided as one input to a general purpose computer. The x-axis and y-axis positions of the tip as the tip is scanned over the workpiece surface are also provided as inputs to the computer as is known in the art. The computer, in turn, processes the data in a known manner for providing a topographical image of the surface at atomic resolution. The image can be displayed on a screen or on a strip chart, be in tabular form or otherwise provided in a visual format.
In a preferred embodiment, the laser 18 is a compact single-mode diode laser operating preferably in the visible light spectrum, preferably at 670 nm, for ease of alignment. However, a laser operating in the infrared or ultraviolet range will perform equally as well. The preferred position-sensitive detector is a silicon bicell.
Generally, an atomic force microscope detects the motion of the tip toward and away from a surface to be inspected 24. The motion of the tip is proportional to the interaction force between the tip and surface of the workpiece w. However, in accordance with the present invention, the orientation of the cantilever beam supporting the tip is measured. The measurements can be performed in a vacuum or ultrahigh vacuum, in an aqueous environment or in air depending upon the application. The general atomic force microscope configuration for each environment is well known to those skilled in the art.
FIG. 2 illustrates a modification to a conventional atomic force microscope which is most useful when performing measurements in an ultrahigh vacuum environment. However, the microscope will perform in water and in non-vacuum environments equally as well with the modification.
As shown in FIG. 2, the laser beam from laser 18 is coupled to a single mode optical fiber 26 whose output is focussed via lens 28 to a reflector 30 disposed on the back of a cantilever beam. The laser beam is reflected from the reflector to a position sensitive detector. For reference purposes, the side of the cantilever beam including the tip is referred to as the front side of the cantilever beam and the oppositely disposed side of the cantilever beam containing the reflector is referred to as the back of the cantilever beam.
A piezoelectric tube 32 is used as a scanner. The cantilever beam, which is micromachined, has a length in the range between 100 and 200 microns and preferably is 100 microns long, and has a width in the range between 5 and 30 microns and preferably is 20 microns wide. The length and width dimensions are dependent upon the material comprising the cantilever beam and are selected in order to achieve a soft lever configuration of the stylus-cantilever system having a force constant in the range between 0.01 and 100 Newton/meter and preferably having a force constant of 0.1 N/m. The cantilever beam is coupled to the tube scanner 32. Use of a micromachined cantilever beam of small dimension enables imaging at atomic resolution as contrasted with the heretofore employed cantilever beams which were typically on the order of one millimeter in length and were limited in terms of resolution. The described arrangement ensures a high scanning speed and imposes virtually no restriction on the size of a surface to be investigated. The maximum scanning speed is determined by the resonance frequency of the cantilever beam, typically 100 kHz, or by the resonance frequency of the tube scanner, typically 10 kHz.
A preferred position sensitive detector is a bicell and preferably a silicon bicell for detecting the angle of deflection of the laser beam. An inertial mover, as shown in FIG. 3, ensures the rejection of intensity fluctuations of the light falling on the bicell by remotely positioning the bicell symmertrically with respect to the laser beam deflected from the cantilever beam.
The inertial mover includes a piezoelectric bar 36 whose length is varied by the application of a saw-tooth waveform voltage signal to the bar as is known in the art. Mounted on a sapphire plate 38 located near one end of the piezoelectric bar 36 is a bicell 40. In the position shown, the bicell can readily slide responsive to an appropriate saw-tooth waveform voltage signal applied to the piezoelectric bar 36 via conductors (not shown) as is known in the art. The sapphire plate 38 and the bicell 40 coupled thereto will move as the saw-toothed waveform voltage signal is applied to the bar. In this manner, the position of the bicell 40 can be remotely controlled in steps as small as 100 angstroms. The inertial mover is compact and fully computer-controllable which is particularly advantageous for use in ultrahigh vacuum environments.
The use of a scanner and detector of the types described in FIGS. 2 and 3, namely micron-sized micromachined cantilever beams and laser beam deflection, results in an atomic force microscope apparatus that measures the orientation of the cantilever beam rather than its displacement. That is, a change of the cantilever beam position is transformed into an angular change which change is inversely proportional to the length of the cantilever beam, hence making full use of the small size dimensions. Another advantage of the present atomic force microscope design is that all required alignments and adjustments are in excess of 10 microns, a range which is easily achieved with simple standard mechanical tools.
In certain applications, operation in an inaccessible environment such as a vacuum environment is neither required nor desired and the above described design can be simplified. Since the atomic force microscope components are accessible in either a liquid or gas, the optical fiber 26 can be eliminated in order to provide a more compact design. It is possible to eliminate the inertial mover when operating in a non-vacuum environment. A primary function of the inertial mover is to provide the ability to remotely position the bicell in a vacuum chamber. For example, in situ tip replacement can be incorporated in the atomic force microscope design, a feature that could result in significant misalignment of the optical path requiring repositioning of the bicell.
The output of a visible diode laser is an elliptical beam having an aspect ratio in the range of approximately 5 to 7:1. In the prior art, the ellipticity is eliminated by the use of suitable optics. To the contrary, the asymmetric beam shape is an important aspect of an alternative preferred embodiment of the invention.
As shown in FIG. 4, by focussing a spot 42 of an elliptical shaped laser beam on a cantilever beam 44 so that the major axis of the ellipse is substantially parallel to the longitudinal axis of the cantilever beam, the elliptical beam spot reflects from the cantilever beam in accordance with the same aspect ratio and the resultant reflected spot size is approximately six times smaller in the direction perpendicular to the longitudinal axis of the cantilever beam. The result is a geometry which adds the potential for increased sensitivity of the beam deflection arrangement as well as providing for a simplified alignment procedure. The elongated, or other than circular, shape (e.g., elliptical or asymmetric) light spot of the reflected laser beam 46 at bicell 40 moves in a direction transverse to its elongation dimension when the atomic forces deflect the cantilever beam 44. Moreover, the size of the reflected laser beam 46 received at the bicell 40 is 5 to 7 times larger in the direction perpendicular to the deflection direction as shown in FIG. 5, thereby enabling the use of higher laser power, without exceeding the saturation limit of the bicell, and correspondingly achieving higher measurement sensitivity. Alternatively, the distance between the cantilever beam and bicell can be decreased, thus resulting in an even more compact microscope.
While there have been described and illustrated an atomic force microscope and several modifications and variations thereof, it will be apparent to those skilled in the art that further modifications and variations are possible without deviating from the broad spirit of the present invention which shall be limited solely by the scope of the claims appended hereto.
Claims (50)
1. A method for generating a topographical image of a surface of a workpiece comprising the steps of:
moving a tip which is fixed to one end of a front side of a micromachined cantilever beam toward a surface of a workpiece to be inspected at a distance where the forces occurring between the atoms at the tip and on the workpiece surface deflect the cantilever;
transmitting a laser beam onto a back of the cantilever beam;
detecting the laser beam reflected from the cantilever beam with position-sensitive detection means for converting the reflected beam into an output signal indicative of an angular change of the cantilever beam which change is inversely proportional to the length of the cantilever beam;
scanning the tip relative to the surface, and
processing the output signal for providing a topographical image of the workpiece surface.
2. The method as set forth in claim 1, wherein said transmitting a laser beam comprises coupling the laser beam to an optical fiber.
3. The method as set forth in claim 1, wherein said laser beam is transmitted to a reflector coupled to the back of the cantilever beam.
4. The method as set forth in claim 1, wherein said laser beam is transmitted to at least one arm supporting the tip in the region of the tip.
5. The method as set forth in claim 1, wherein said position-sensitive detector comprises a bicell.
6. The method as set forth in claim 5, wherein said bicell is a silicon bicell.
7. The method as set forth in claim 1, wherein said laser beam is in the visible light spectrum.
8. The method as set forth in claim 1, wherein the position sensitive detector is remotely positioned from the cantilevered beam.
9. The method as set forth in claim 8, A method for generating a topographical image of a surface of a workpiece comprising:
moving a tip which is fixed to one end of a front side of a micromachined cantilever beam toward a surface of a workpiece to be inspected at a distance where the forces occurring between the atoms at the tip and on the workpiece surface deflect the cantilever;
transmitting a laser beam onto a back of the cantilever beam;
detecting the laser beam reflected from the cantilever beam with position-sensitive detection means for converting the reflected beam into an output signal indicative of an angular change of the cantilever beam which change is inversely proportional to the length of the cantilever beam;
scanning the tip relative to the surface, and
processing the output signal for providing the topographical image of the workpiece surface,
wherein the position sensitive detector is remotely positioned from the cantilevered beam, and
wherein an inertial mover remotely positions the detector.
10. The method as set forth in claim 9, wherein said moving and said detector are performed in an inaccessible environment.
11. The method as set forth in claim 10, wherein said inaccessible environment is a vacuum or ultrahigh vacuum.
12. The method as set forth in claim 8, wherein said moving and said detecting are performed in an inaccessible environment.
13. The method as set forth in claim 12, wherein said inaccessible environment is a vacuum or ultrahigh vacuum.
14. The method as set forth in claim 1A method for generating a topographical image of a surface of a workpiece comprising:
moving a tip which is fixed to one end of a front side of a micromachined cantilever beam toward a surface of a workpiece to be inspected at a distance where the forces occurring between the atoms at the tip and on the workpiece surface deflect the cantilever;
transmitting a laser beam onto a back of the cantilever beam;
detecting the laser beam reflected from the cantilever beam with position-sensitive detection means for converting the reflected beam into an output signal indicative of an angular change of the cantilever beam which change is inversely proportional to the length of the cantilever beam;
scanning the tip relative to the surface, and
processing the output signal for providing the topographical image of the workpiece surface,
wherein said transmitted reflected laser beam has an elliptical beam shape at said detection means.
15. An atomic force microscope for generating a topographical image of a surface of a workpiece wherein the improvement comprises:
a tip fixed to one end of a front side of a micromachined cantilever beam adapted for being positioned in proximity to the surface of the workpiece where the forces between the atoms of said tip and the surface deflect the cantilever beam;
laser means for transmitting a laser beam to a back of the cantilever beam;
position-sensitive detection means for receiving said laser beam after being reflected from the cantilever beam and for converting the reflected beam into an output signal indicative of an angular change of the cantilever beam which change is inversely proportional to the length of the cantilever beam;
means for causing the tip and surface to undergo relative scanning motion, and
computing means coupled to said detection means for generating a topographical image of the surface.
16. An atomic force microscope as set forth in claim 15, wherein said laser means comprises an optical fiber for coupling said laser beam to said cantilever beam.
17. An atomic force microscope as set forth in claim 15, further comprising reflective means coupled to the back of the cantilever beam for reflecting the transmitted laser beam.
18. An atomic force microscope as set forth in claim 15, wherein said tip is fixed to the micromachined cantilever beam by means of at least one arm and said laser means transmits a laser beam to said at least one arm in the region of said tip.
19. An atomic force microscope as set forth in claim 15, wherein said position sensitive detection means comprises a bicell.
20. An atomic force microscope as set forth in claim 19, wherein said bicell is a silicon bicell.
21. An atomic force microscope as set forth in claim 15, wherein said laser means operates in the visible light spectrum.
22. An atomic force microscope as set forth in claim 21, where said laser means comprises a single-mode diode laser.
23. An atomic force microscope as set forth in claim 15, wherein said position-sensitive detection means is remotely positionable from the cantilever beam.
24. An atomic force microscope as set forth in claim 23, for generating a topographical image of a surface of a workpiece wherein the improvement comprises:
a tip fixed to one end of a front side of a micromachined cantilever beam adapted for being positioned in proximity to the surface of the workpiece where the forces between the atoms of said tip and the surface deflect the cantilever beam;
laser means for transmitting a laser beam to a back of the cantilever beam;
position-sensitive detection means for receiving said laser beam after being reflected from the cantilever beam and for converting the reflected beam into an output signal indicative of an angular change of the cantilever beam, which change is inversely proportional to the length of the cantilever beam, said position-sensitive detection means being remotely positionable from the cantilever beam, and wherein said position-sensitive detection means comprises an inertial mover;
means for causing the tip and surface to undergo relative scanning motion; and
computing means coupled to said detection means for generating the topographical image of the surface.
25. An atomic force microscope as set forth in claim 15, wherein said tip and said position-sensitive detection means are disposed in an inaccessible environment.
26. An atomic force microscope as set forth in claim 25, wherein said inaccessible environment is a vacuum or ultrahigh vacuum.
27. An atomic force microscope as set forth in claim 15, for generating a topographical image of a surface of a workpiece, comprising:
a tip fixed to one end of a front side of a micromachined cantilever beam adapted for being positioned in proximity to the surface of the workpiece where the forces between the atoms of said tip and the surface deflect the cantilever beam;
laser means for transmitting a laser beam to a back of the cantilever beam;
position-sensitive detection means for receiving said laser beam after being reflected from the cantilever beam and for converting the reflected beam into an output signal indicative of an angular change of the cantilever beam, which change is inversely proportional to the length of the cantilever beam;
means for causing the tip and surface to undergo relative scanning motion, and
computing means coupled to said detection means for generating the topographical image of the surface,
wherein said laser means transmits a laser beam having an elliptical shape to the back of the cantilever beam and wherein said reflected laser beam has an elliptical shape at said detection means.
28. An atomic force microscope as set forth in claim 15, further comprising display means coupled to said computing means for displaying a topographical image of the surface.
29. An atomic force microscope for generating a topographical image of a surface of a workpiece comprising:
a tip fixed to one end of a front side of a micromachined cantilever beam adapted for being positioned in proximity to the surface of the workpiece where the forces between the atoms of said tip and the surface deflect the cantilever beam;
laser means for transmitting a laser beam to a back of the cantilever beam;
position-sensitive detection means for receiving said laser beam after being reflected from the cantilever beam and for converting the reflected beam into an output signal indicative of an angular change of the cantilever beam, which change is inversely proportional to the length of the cantilever beam;
means for causing the tip and surface to undergo relative scanning motion; and
computing means coupled to said detection means for generating the topographical image of the surface,
wherein said laser means operates in the visible light spectrum,
wherein said laser means comprises a single-mode diode laser, and
wherein said reflected beam has a shape other than circular.
30. An atomic force microscope for generating a topographical image of a surface of a workpiece, comprising:
a tip fixed to one end of a front side of a micromachined cantilever beam adapted for being positioned in proximity to the surface of the workpiece where forces between atoms of said tip and the surface deflect the cantilever beam;
laser means for transmitting a laser beam to a back of the cantilever beam;
position-sensitive detection means for receiving said laser beam after being reflected from the cantilever beam and for converting the reflected beam into an output signal indicative of an angular change of the cantilever beam, which change is inversely proportional to the length of the cantilever beam, wherein the reflected laser beam has an elongated shaped light spot when incident upon the detection means;
means for causing the tip and the surface to undergo relative scanning motion; and
computing means, coupled to said detection means, for generating the topographical image of the surface.
31. The atomic force microscope of claim 30, wherein the elongated shaped light spot at said detection means moves in a direction transverse to its elongation dimension when the forces deflect the cantilever.
32. The atomic force microscope of claim 30, wherein said elongated shaped light spot is elliptical.
33. The atomic force microscope of claim 30, wherein said elongated shaped light spot is asymmetric.
34. The atomic force microscope of claim 30, wherein the laser means comprises a diode laser.
35. The atomic force microscope of claim 30, wherein the laser means produces an elongated shaped light spot when incident on said cantilever.
36. A force microscope for generating an image of a surface of a workpiece, comprising:
a tip fixed to one end of a front side of a micromachined cantilever beam adapted for being positioned in proximity to the surface of the workpiece where forces between atoms of said tip and the surface deflect the cantilever beam;
laser means for transmitting a laser beam to a back of the cantilever beam;
position-sensitive detection means for receiving said laser beam after being reflected from the cantilever beam and for converting the reflected beam into an output signal indicative of an angular change of the cantilever beam, which change is inversely proportional to the length of the cantilever beam, wherein the reflected laser beam has an elongated shaped light spot when incident upon the detection means;
means for causing the tip and the surface to undergo relative scanning motion; and
computing means, coupled to said detection means, for generating the image of the surface.
37. The force microscope of claim 36, wherein the elongated shaped light spot at said detection means moves in a direction transverse to its elongated dimension when the forces deflect the cantilever.
38. The force microscope of claim 36, wherein said elongated shaped light spot is elliptical.
39. The force microscope of claim 36, wherein said elongated shaped light spot is asymmetric.
40. The force microscope of claim 36, wherein the laser means comprises a diode laser.
41. The force microscope of claim 36, wherein the image comprises a topographical image.
42. The force microscope of claim 36, wherein the laser means produces an elongated shaped light spot when incident on said cantilever.
43. The force microscope of claim 36, wherein the force microscope comprises an atomic force microscope.
44. A method for generating an image of a surface of a workpiece comprising the steps of:
positioning a tip fixed to one end of a front side of a micromachined cantilever beam in proximity to the surface of the workpiece where the forces between the atoms of said tip and the surface deflect the cantilever beam;
transmitting a laser beam onto a back of the cantilever beam;
detecting the laser beam reflected from the cantilever beam with position-sensitive detection means for converting the reflected beam into an output signal indicative of an angular change of the cantilever beam, which change is inversely proportional to the length of the cantilever beam, wherein said reflected light beam produces an elongated shaped light spot when striking said position-sensitive detection means;
scanning the tip relative to the surface, and;
processing the output signal for providing an image of the surface of the workpiece.
45. The method of claim 44, wherein the elongated shaped light spot at said position-sensitive detection means moves in a direction transverse to its elongated dimension when the cantilever moves due to the forces.
46. The method of claim 44, wherein said elongated shaped light spot is asymmetrical.
47. The method of claim 44, wherein said elongated shaped light spot is elliptical.
48. The method of claim 44, wherein said transmitted laser beam is a beam from a diode laser.
49. The method of claim 44, wherein said transmitted laser beam produces an elongated shaped light spot when striking said cantilever.
50. The method of claim 44, wherein the image is a topographical image.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/791,445 USRE37299E1 (en) | 1990-09-27 | 1997-01-27 | Atomic force microscopy |
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/588,795 US5144833A (en) | 1990-09-27 | 1990-09-27 | Atomic force microscopy |
US30185694A | 1994-09-07 | 1994-09-07 | |
US60148796A | 1996-02-14 | 1996-02-14 | |
US69265396A | 1996-08-06 | 1996-08-06 | |
US08/791,445 USRE37299E1 (en) | 1990-09-27 | 1997-01-27 | Atomic force microscopy |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US07/588,795 Reissue US5144833A (en) | 1990-09-27 | 1990-09-27 | Atomic force microscopy |
Publications (1)
Publication Number | Publication Date |
---|---|
USRE37299E1 true USRE37299E1 (en) | 2001-07-31 |
Family
ID=24355333
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US07/588,795 Ceased US5144833A (en) | 1990-09-27 | 1990-09-27 | Atomic force microscopy |
US08/791,445 Expired - Lifetime USRE37299E1 (en) | 1990-09-27 | 1997-01-27 | Atomic force microscopy |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US07/588,795 Ceased US5144833A (en) | 1990-09-27 | 1990-09-27 | Atomic force microscopy |
Country Status (4)
Country | Link |
---|---|
US (2) | US5144833A (en) |
EP (1) | EP0480136B1 (en) |
JP (1) | JP2516292B2 (en) |
DE (1) | DE69122343T2 (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6437343B1 (en) * | 1998-03-13 | 2002-08-20 | Olympus Optical Co., Ltd. | Scanner system and piezoelectric micro-inching mechansim used in scanning probe microscope |
US20020114229A1 (en) * | 1999-12-27 | 2002-08-22 | Noriaki Nishi | Optical head, light-emitting/receiving device, and apparatus for recording/reproducing optical recording/recorded medium |
US20050109925A1 (en) * | 2003-11-26 | 2005-05-26 | El Rifai Osamah M. | Height calibration of scanning probe microscope actuators |
US20070010097A1 (en) * | 2005-07-05 | 2007-01-11 | International Business Machines Corporation | Apparatus and method for selected site backside unlayering of silicon, gaas, gaxalyasz of soi technologies for scanning probe microscopy and atomic force probing characterization |
US20070215804A1 (en) * | 2004-04-21 | 2007-09-20 | Japan Science And Technology Agency | Quantum Beam Aided Atomic Force Microscopy and Quantum Beam Aided Atomic Force Microscope |
US8726410B2 (en) | 2010-07-30 | 2014-05-13 | The United States Of America As Represented By The Secretary Of The Air Force | Atomic force microscopy system and method for nanoscale measurement |
US10466271B2 (en) * | 2015-09-01 | 2019-11-05 | Hitachi High-Tech Science Corporation | Scanning probe microscope and optical axis adjustment method for scanning probe microscope |
Families Citing this family (63)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5157251A (en) * | 1991-03-13 | 1992-10-20 | Park Scientific Instruments | Scanning force microscope having aligning and adjusting means |
DE69212062T2 (en) * | 1991-04-30 | 1996-11-28 | Matsushita Electric Ind Co Ltd | Scanning scanning microscope, molecular processing method using the microscope and method for perceiving the DNA base arrangement |
US5155361A (en) * | 1991-07-26 | 1992-10-13 | The Arizona Board Of Regents, A Body Corporate Acting For And On Behalf Of Arizona State University | Potentiostatic preparation of molecular adsorbates for scanning probe microscopy |
JPH0540034A (en) * | 1991-08-08 | 1993-02-19 | Nikon Corp | Compound microscope |
US5298975A (en) * | 1991-09-27 | 1994-03-29 | International Business Machines Corporation | Combined scanning force microscope and optical metrology tool |
US5537372A (en) * | 1991-11-15 | 1996-07-16 | International Business Machines Corporation | High density data storage system with topographic contact sensor |
DE69309318T2 (en) * | 1992-01-10 | 1997-10-30 | Hitachi Ltd | Method and device for observing a surface |
US5291775A (en) * | 1992-03-04 | 1994-03-08 | Topometrix | Scanning force microscope with integrated optics and cantilever mount |
US5448399A (en) * | 1992-03-13 | 1995-09-05 | Park Scientific Instruments | Optical system for scanning microscope |
US5376790A (en) * | 1992-03-13 | 1994-12-27 | Park Scientific Instruments | Scanning probe microscope |
JP3000500B2 (en) * | 1992-09-02 | 2000-01-17 | セイコーインスツルメンツ株式会社 | Atomic force microscope |
JP2704601B2 (en) * | 1993-04-12 | 1998-01-26 | セイコーインスツルメンツ株式会社 | Scanning near-field atomic force microscope, probe used in the microscope, and method of manufacturing the probe |
US5463897A (en) * | 1993-08-17 | 1995-11-07 | Digital Instruments, Inc. | Scanning stylus atomic force microscope with cantilever tracking and optical access |
US5450746A (en) * | 1993-10-12 | 1995-09-19 | The University Of North Carolina | Constant force stylus profiling apparatus and method |
US5388452A (en) * | 1993-10-15 | 1995-02-14 | Quesant Instrument Corporation | Detection system for atomic force microscopes |
US5416327A (en) * | 1993-10-29 | 1995-05-16 | Regents Of The University Of California | Ultrafast scanning probe microscopy |
US5410910A (en) * | 1993-12-22 | 1995-05-02 | University Of Virginia Patent Foundation | Cryogenic atomic force microscope |
US5440920A (en) * | 1994-02-03 | 1995-08-15 | Molecular Imaging Systems | Scanning force microscope with beam tracking lens |
US5753814A (en) * | 1994-05-19 | 1998-05-19 | Molecular Imaging Corporation | Magnetically-oscillated probe microscope for operation in liquids |
US5866805A (en) * | 1994-05-19 | 1999-02-02 | Molecular Imaging Corporation Arizona Board Of Regents | Cantilevers for a magnetically driven atomic force microscope |
US5513518A (en) * | 1994-05-19 | 1996-05-07 | Molecular Imaging Corporation | Magnetic modulation of force sensor for AC detection in an atomic force microscope |
US5515719A (en) * | 1994-05-19 | 1996-05-14 | Molecular Imaging Corporation | Controlled force microscope for operation in liquids |
JP3229914B2 (en) * | 1994-12-12 | 2001-11-19 | 日本電子株式会社 | Scanning probe microscope |
US5675154A (en) * | 1995-02-10 | 1997-10-07 | Molecular Imaging Corporation | Scanning probe microscope |
US5750989A (en) * | 1995-02-10 | 1998-05-12 | Molecular Imaging Corporation | Scanning probe microscope for use in fluids |
US5621210A (en) * | 1995-02-10 | 1997-04-15 | Molecular Imaging Corporation | Microscope for force and tunneling microscopy in liquids |
DE19504855A1 (en) * | 1995-02-15 | 1996-08-22 | Basf Ag | Process for chemically differentiating imaging using atomic force microscopy |
US5874668A (en) * | 1995-10-24 | 1999-02-23 | Arch Development Corporation | Atomic force microscope for biological specimens |
US5654546A (en) * | 1995-11-07 | 1997-08-05 | Molecular Imaging Corporation | Variable temperature scanning probe microscope based on a peltier device |
US5821545A (en) * | 1995-11-07 | 1998-10-13 | Molecular Imaging Corporation | Heated stage for a scanning probe microscope |
US5834644A (en) * | 1995-11-13 | 1998-11-10 | The University Of Virginia Patent Foundation | Automatic atomic force microscope with piezotube scanner |
US5812266A (en) * | 1995-12-15 | 1998-09-22 | Hewlett-Packard Company | Non-contact position sensor |
US5886787A (en) * | 1995-12-15 | 1999-03-23 | Hewlett-Packard Company | Displacement sensor and method for producing target feature thereof |
US6118124A (en) * | 1996-01-18 | 2000-09-12 | Lockheed Martin Energy Research Corporation | Electromagnetic and nuclear radiation detector using micromechanical sensors |
US5908981A (en) * | 1996-09-05 | 1999-06-01 | Board Of Trustees Of The Leland Stanford, Jr. University | Interdigital deflection sensor for microcantilevers |
US5825020A (en) * | 1996-09-06 | 1998-10-20 | The Regents Of The University Of California | Atomic force microscope for generating a small incident beam spot |
US5866806A (en) * | 1996-10-11 | 1999-02-02 | Kla-Tencor Corporation | System for locating a feature of a surface |
US6459492B1 (en) | 1997-03-14 | 2002-10-01 | Agilent Technologies, Inc. | Non-contact position sensor |
WO1998041814A1 (en) * | 1997-03-14 | 1998-09-24 | Hewlett-Packard Company | Non-contact position sensor |
US5861550A (en) | 1997-10-14 | 1999-01-19 | Raymax Technology, Incorporated | Scanning force microscope |
US6138503A (en) * | 1997-10-16 | 2000-10-31 | Raymax Technology, Inc. | Scanning probe microscope system including removable probe sensor assembly |
US5874669A (en) * | 1997-10-16 | 1999-02-23 | Raymax Technology, Inc. | Scanning force microscope with removable probe illuminator assembly |
US6050722A (en) * | 1998-03-25 | 2000-04-18 | Thundat; Thomas G. | Non-contact passive temperature measuring system and method of operation using micro-mechanical sensors |
US5992226A (en) * | 1998-05-08 | 1999-11-30 | The United States Of America As Represented By The Secretary Of The Navy | Apparatus and method for measuring intermolecular interactions by atomic force microscopy |
WO2000020823A2 (en) | 1998-10-07 | 2000-04-13 | Massachusetts Institute Of Technology | Atomic force microscope for profiling high aspect ratio samples |
US5958701A (en) * | 1999-01-27 | 1999-09-28 | The United States Of America As Represented By The Secretary Of The Navy | Method for measuring intramolecular forces by atomic force |
EP1204842A4 (en) * | 1999-08-19 | 2003-04-02 | Univ California | Apparatus and method for visually identifying micro-forces with a palette of cantilever array blocks |
US6642517B1 (en) | 2000-01-25 | 2003-11-04 | Veeco Instruments, Inc. | Method and apparatus for atomic force microscopy |
US6479820B1 (en) | 2000-04-25 | 2002-11-12 | Advanced Micro Devices, Inc. | Electrostatic charge reduction of photoresist pattern on development track |
US6587600B1 (en) * | 2000-08-15 | 2003-07-01 | Floor Corporation | Methods and apparatus for producing topocompositional images |
WO2003009305A2 (en) * | 2001-07-18 | 2003-01-30 | The Regents Of The University Of California | Measurement head for atomic force microscopy and other applications |
US20030154149A1 (en) * | 2002-02-13 | 2003-08-14 | Dilip Gajendragadkar | System and method of creating and executing a restricted stock sale plan |
US6912892B2 (en) * | 2002-04-30 | 2005-07-05 | Hewlett-Packard Development Company, L.P. | Atomic force microscope |
US7230719B2 (en) * | 2003-12-02 | 2007-06-12 | National University Of Singapore | High sensitivity scanning probe system |
US20100294927A1 (en) * | 2005-09-12 | 2010-11-25 | Nanolnk, Inc. | High throughput inspecting |
US9189728B2 (en) | 2009-07-23 | 2015-11-17 | I-Property Holding Corp. | Method for the authentication of dosage forms |
ITTO20120692A1 (en) * | 2012-08-02 | 2014-02-03 | Microla Optoelectronics S R L | OSCILLATING STRUCTURE MEASUREMENT SYSTEM |
US9383386B2 (en) | 2013-03-14 | 2016-07-05 | Oxford Instruments Asylum Research, Inc. | Optical beam positioning unit for atomic force microscope |
US10705114B2 (en) | 2014-03-12 | 2020-07-07 | Oxford Instruments Asylum Research Inc | Metrological scanning probe microscope |
US9804193B2 (en) | 2014-03-12 | 2017-10-31 | Oxford Instruments Asylum Research, Inc | Metrological scanning probe microscope |
DE102014010417A1 (en) * | 2014-07-14 | 2016-01-14 | Nanosurf Ag | Position measuring system for the nanometer range |
CN106353535A (en) * | 2016-10-10 | 2017-01-25 | 中国科学院深圳先进技术研究院 | In-situ photoelectric multifunctional coupling atomic force microscope testing system |
CN111811939B (en) * | 2020-07-21 | 2022-08-02 | 上海交通大学 | High-precision nano-mechanics detection system in ultralow temperature environment |
Citations (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1976337A (en) * | 1931-03-06 | 1934-10-09 | Floyd A Firestone | Apparatus for determining roughness of surfaces |
US2048154A (en) * | 1935-05-27 | 1936-07-21 | Univ Michigan | Apparatus for determining roughness of surfaces |
US2171433A (en) * | 1937-02-09 | 1939-08-29 | Electronic Controls Corp | Smoothness gauge |
US2205517A (en) * | 1938-03-31 | 1940-06-25 | Pittsburgh Plate Glass Co | Profilograph |
US2686101A (en) * | 1951-06-11 | 1954-08-10 | John E Davis | Apparatus and method for reproducing surface contours |
US3251135A (en) * | 1962-07-09 | 1966-05-17 | Rank Precision Ind Ltd | Apparatus for measuring or indicating lack of straightness of a surface |
US3335367A (en) * | 1963-05-03 | 1967-08-08 | Westinghouse Electric Corp | Current responsive light varying means and light sensitive means responsive to the variations |
US3571579A (en) * | 1968-04-25 | 1971-03-23 | Rank Organisation Ltd | Assessing of surface profiles |
US3617131A (en) * | 1968-07-24 | 1971-11-02 | Konishiroku Photo Ind | System for detection of minute inclination |
US3782205A (en) * | 1972-11-09 | 1974-01-01 | Nasa | Temperature compensated digital inertial sensor |
US3798449A (en) * | 1972-05-23 | 1974-03-19 | G Reinheimer | Automatic microscope focussing device |
US4102577A (en) * | 1977-01-04 | 1978-07-25 | Fuji Photo Optical Co., Ltd. | Method of forming moire contour lines |
US4267732A (en) * | 1978-11-29 | 1981-05-19 | Stanford University Board Of Trustees | Acoustic microscope and method |
US4596925A (en) * | 1982-10-27 | 1986-06-24 | The Foxboro Company | Fiber optic displacement sensor with built-in reference |
US4659219A (en) * | 1983-10-27 | 1987-04-21 | Societe Anonyme De Telecommunications | System for detecting the angular position of a mechanical device |
US4711578A (en) * | 1984-06-14 | 1987-12-08 | National Research Development Corporation | Optical displacement sensors |
US4724318A (en) * | 1985-11-26 | 1988-02-09 | International Business Machines Corporation | Atomic force microscope and method for imaging surfaces with atomic resolution |
US4739161A (en) * | 1985-06-13 | 1988-04-19 | Hitachi, Ltd. | Fine displacement transducer employing plural optical fibers |
US4745270A (en) * | 1985-04-26 | 1988-05-17 | Olympus Optical Co., Ltd. | Photoelectric microscope using position sensitive device |
US4762996A (en) * | 1987-04-20 | 1988-08-09 | International Business Machines Corporation | Coarse approach positioning device |
US4770533A (en) * | 1984-09-11 | 1988-09-13 | Nippon Kogaku K. K. | Apparatus for detecting position of an object such as a semiconductor wafer |
US4782239A (en) * | 1985-04-05 | 1988-11-01 | Nippon Kogaku K. K. | Optical position measuring apparatus |
JPS63304103A (en) * | 1987-06-05 | 1988-12-12 | Hitachi Ltd | Scanning surface microscope |
US4800274A (en) * | 1987-02-02 | 1989-01-24 | The Regents Of The University Of California | High resolution atomic force microscope |
US4806755A (en) * | 1986-10-03 | 1989-02-21 | International Business Machines Corporation | Micromechanical atomic force sensor head |
US4823004A (en) * | 1987-11-24 | 1989-04-18 | California Institute Of Technology | Tunnel and field effect carrier ballistics |
US4827091A (en) * | 1988-09-23 | 1989-05-02 | Automotive Systems Laboratory, Inc. | Magnetically-damped, testable accelerometer |
US4837435A (en) * | 1987-06-25 | 1989-06-06 | Seiko Instruments Inc. | Tunneling scanning microscope having light source |
EP0320326A1 (en) * | 1987-12-09 | 1989-06-14 | Societe Nationale D'etude Et De Construction De Moteurs D'aviation "Snecma" | Process and means for contactless controlling the geometric outlines |
US4851671A (en) * | 1987-05-12 | 1989-07-25 | International Business Machines Corporation | Oscillating quartz atomic force microscope |
WO1989007256A1 (en) * | 1988-01-27 | 1989-08-10 | The Board Of Trustees Of The Leland Stanford Junio | An integrated mass storage device |
US4861990A (en) * | 1988-02-09 | 1989-08-29 | California Institute Of Technology | Tunneling susceptometry |
US4873401A (en) * | 1988-09-19 | 1989-10-10 | Bendix Electronics Limited | Electromagnetic damped inertia sensor |
US4878114A (en) * | 1988-05-10 | 1989-10-31 | University Of Windsor | Method and apparatus for assessing surface roughness |
US4889988A (en) * | 1988-07-06 | 1989-12-26 | Digital Instruments, Inc. | Feedback control for scanning tunnel microscopes |
US4894537A (en) * | 1988-07-21 | 1990-01-16 | Canadian Patents & Development Ltd. | High stability bimorph scanning tunneling microscope |
US4896044A (en) * | 1989-02-17 | 1990-01-23 | Purdue Research Foundation | Scanning tunneling microscope nanoetching method |
WO1990004753A1 (en) * | 1988-10-21 | 1990-05-03 | Ferrell Thomas L | Photon scanning tunneling microscopy |
US4935634A (en) * | 1989-03-13 | 1990-06-19 | The Regents Of The University Of California | Atomic force microscope with optional replaceable fluid cell |
USRE33387E (en) * | 1985-11-26 | 1990-10-16 | International Business Machines Corporation | Atomic force microscope and method for imaging surfaces with atomic resolution |
US4992728A (en) * | 1989-12-21 | 1991-02-12 | International Business Machines Corporation | Electrical probe incorporating scanning proximity microscope |
US5003815A (en) * | 1989-10-20 | 1991-04-02 | International Business Machines Corporation | Atomic photo-absorption force microscope |
US5015850A (en) * | 1989-06-20 | 1991-05-14 | The Board Of Trustees Of The Leland Stanford Junior University | Microfabricated microscope assembly |
US5051379A (en) * | 1989-08-16 | 1991-09-24 | International Business Machines Corporation | Method of producing micromechanical sensors for the AFM/STM profilometry and micromechanical AFM/STM sensor head |
US5053588A (en) * | 1990-02-20 | 1991-10-01 | Trw Technar Inc. | Calibratable crash sensor |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61133843A (en) * | 1984-12-05 | 1986-06-21 | Hitachi Electronics Eng Co Ltd | Surface inspector |
JPS62156515A (en) * | 1985-12-27 | 1987-07-11 | Mitsubishi Electric Corp | Displacement measuring instrument |
-
1990
- 1990-09-27 US US07/588,795 patent/US5144833A/en not_active Ceased
-
1991
- 1991-07-24 EP EP91112362A patent/EP0480136B1/en not_active Expired - Lifetime
- 1991-07-24 DE DE69122343T patent/DE69122343T2/en not_active Expired - Lifetime
- 1991-08-27 JP JP3238906A patent/JP2516292B2/en not_active Expired - Fee Related
-
1997
- 1997-01-27 US US08/791,445 patent/USRE37299E1/en not_active Expired - Lifetime
Patent Citations (46)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1976337A (en) * | 1931-03-06 | 1934-10-09 | Floyd A Firestone | Apparatus for determining roughness of surfaces |
US2048154A (en) * | 1935-05-27 | 1936-07-21 | Univ Michigan | Apparatus for determining roughness of surfaces |
US2171433A (en) * | 1937-02-09 | 1939-08-29 | Electronic Controls Corp | Smoothness gauge |
US2205517A (en) * | 1938-03-31 | 1940-06-25 | Pittsburgh Plate Glass Co | Profilograph |
US2686101A (en) * | 1951-06-11 | 1954-08-10 | John E Davis | Apparatus and method for reproducing surface contours |
US3251135A (en) * | 1962-07-09 | 1966-05-17 | Rank Precision Ind Ltd | Apparatus for measuring or indicating lack of straightness of a surface |
US3335367A (en) * | 1963-05-03 | 1967-08-08 | Westinghouse Electric Corp | Current responsive light varying means and light sensitive means responsive to the variations |
US3571579A (en) * | 1968-04-25 | 1971-03-23 | Rank Organisation Ltd | Assessing of surface profiles |
US3617131A (en) * | 1968-07-24 | 1971-11-02 | Konishiroku Photo Ind | System for detection of minute inclination |
US3798449A (en) * | 1972-05-23 | 1974-03-19 | G Reinheimer | Automatic microscope focussing device |
US3782205A (en) * | 1972-11-09 | 1974-01-01 | Nasa | Temperature compensated digital inertial sensor |
US4102577A (en) * | 1977-01-04 | 1978-07-25 | Fuji Photo Optical Co., Ltd. | Method of forming moire contour lines |
US4267732A (en) * | 1978-11-29 | 1981-05-19 | Stanford University Board Of Trustees | Acoustic microscope and method |
US4596925A (en) * | 1982-10-27 | 1986-06-24 | The Foxboro Company | Fiber optic displacement sensor with built-in reference |
US4659219A (en) * | 1983-10-27 | 1987-04-21 | Societe Anonyme De Telecommunications | System for detecting the angular position of a mechanical device |
US4711578A (en) * | 1984-06-14 | 1987-12-08 | National Research Development Corporation | Optical displacement sensors |
US4770533A (en) * | 1984-09-11 | 1988-09-13 | Nippon Kogaku K. K. | Apparatus for detecting position of an object such as a semiconductor wafer |
US4782239A (en) * | 1985-04-05 | 1988-11-01 | Nippon Kogaku K. K. | Optical position measuring apparatus |
US4745270A (en) * | 1985-04-26 | 1988-05-17 | Olympus Optical Co., Ltd. | Photoelectric microscope using position sensitive device |
US4739161A (en) * | 1985-06-13 | 1988-04-19 | Hitachi, Ltd. | Fine displacement transducer employing plural optical fibers |
US4724318A (en) * | 1985-11-26 | 1988-02-09 | International Business Machines Corporation | Atomic force microscope and method for imaging surfaces with atomic resolution |
USRE33387E (en) * | 1985-11-26 | 1990-10-16 | International Business Machines Corporation | Atomic force microscope and method for imaging surfaces with atomic resolution |
US4806755A (en) * | 1986-10-03 | 1989-02-21 | International Business Machines Corporation | Micromechanical atomic force sensor head |
US4800274A (en) * | 1987-02-02 | 1989-01-24 | The Regents Of The University Of California | High resolution atomic force microscope |
US4762996A (en) * | 1987-04-20 | 1988-08-09 | International Business Machines Corporation | Coarse approach positioning device |
US4851671A (en) * | 1987-05-12 | 1989-07-25 | International Business Machines Corporation | Oscillating quartz atomic force microscope |
JPS63304103A (en) * | 1987-06-05 | 1988-12-12 | Hitachi Ltd | Scanning surface microscope |
US4883959A (en) * | 1987-06-05 | 1989-11-28 | Hitachi, Ltd. | Scanning surface microscope using a micro-balance device for holding a probe-tip |
US4837435A (en) * | 1987-06-25 | 1989-06-06 | Seiko Instruments Inc. | Tunneling scanning microscope having light source |
US4823004A (en) * | 1987-11-24 | 1989-04-18 | California Institute Of Technology | Tunnel and field effect carrier ballistics |
EP0320326A1 (en) * | 1987-12-09 | 1989-06-14 | Societe Nationale D'etude Et De Construction De Moteurs D'aviation "Snecma" | Process and means for contactless controlling the geometric outlines |
WO1989007256A1 (en) * | 1988-01-27 | 1989-08-10 | The Board Of Trustees Of The Leland Stanford Junio | An integrated mass storage device |
US4861990A (en) * | 1988-02-09 | 1989-08-29 | California Institute Of Technology | Tunneling susceptometry |
US4878114A (en) * | 1988-05-10 | 1989-10-31 | University Of Windsor | Method and apparatus for assessing surface roughness |
US4889988A (en) * | 1988-07-06 | 1989-12-26 | Digital Instruments, Inc. | Feedback control for scanning tunnel microscopes |
US4894537A (en) * | 1988-07-21 | 1990-01-16 | Canadian Patents & Development Ltd. | High stability bimorph scanning tunneling microscope |
US4873401A (en) * | 1988-09-19 | 1989-10-10 | Bendix Electronics Limited | Electromagnetic damped inertia sensor |
US4827091A (en) * | 1988-09-23 | 1989-05-02 | Automotive Systems Laboratory, Inc. | Magnetically-damped, testable accelerometer |
WO1990004753A1 (en) * | 1988-10-21 | 1990-05-03 | Ferrell Thomas L | Photon scanning tunneling microscopy |
US4896044A (en) * | 1989-02-17 | 1990-01-23 | Purdue Research Foundation | Scanning tunneling microscope nanoetching method |
US4935634A (en) * | 1989-03-13 | 1990-06-19 | The Regents Of The University Of California | Atomic force microscope with optional replaceable fluid cell |
US5015850A (en) * | 1989-06-20 | 1991-05-14 | The Board Of Trustees Of The Leland Stanford Junior University | Microfabricated microscope assembly |
US5051379A (en) * | 1989-08-16 | 1991-09-24 | International Business Machines Corporation | Method of producing micromechanical sensors for the AFM/STM profilometry and micromechanical AFM/STM sensor head |
US5003815A (en) * | 1989-10-20 | 1991-04-02 | International Business Machines Corporation | Atomic photo-absorption force microscope |
US4992728A (en) * | 1989-12-21 | 1991-02-12 | International Business Machines Corporation | Electrical probe incorporating scanning proximity microscope |
US5053588A (en) * | 1990-02-20 | 1991-10-01 | Trw Technar Inc. | Calibratable crash sensor |
Non-Patent Citations (15)
Title |
---|
"Compact Interferometric Force Sensor", IBM Technical Disclosure Bulletin, vol. 32, No. 2, Jul. 1, 1989, New York, pp. 416-417. * |
"Surface Emitting Semiconductor Lasers"; IEEE Journal of Quantum Electronics; vol. 24, No. 9, pp. 1845-1855; Sep. 1988; Kenichi Iga et al.* |
A.L. Weisenhorn et al "Forces in Atomic Force Microscopy in air and water", Appl.Phys. Lett., 54(26 ), Jun. 26, 1989, pp. 2651-2653.* |
B. Drake et al., "Imaging Crystals, Polymers and Processes in Water with the Atomic Force Microscope", Science, vol. 243, pp. 1586-1589, Mar. 24, 1989.* |
Binnig et al, "Atomic Force Microscope", Phys. Rev. Lett. vol. 56, No. 9, Mar. 1986, pp. 930-933.* |
D. Ruger et al, "Force Microscope Using A Fiber-Optic Displacement Sensor", Review of Scientific Instruments, vol. 59, No. 11, Nov. 1, 1988, New York, pp. 2337-2340.* |
D. Ruger et al, "Improved Fiber-Optic Interferometer For Atomic Force Microscopy", Applied Physics Letters, vol. 55, No. 25, Dec. 18, 1989, New York, pp. 2588-2590.* |
G. Meyer et al, "Novel Optical Approach to Atomic Force Microscopy", Appl. Phys. Lett., 53(12), Sep. 19, 1988, pp. 1045-1047.* |
G.M. McClelland et al, "Atomic Force Microscopy, General Principles and New Implementation", IBM Research Report, RJ5368, Nov. 4, 1986 pp. 1-8.* |
H. Wickramasinghe, "Scanned-Probe Microscopes", Scientific American, Oct. 1989, pp. 98-105.* |
IBM TDB "Lateral Forces and Topography Using the Scanning Tunneling Microscope and Optical Densing of the Tip Position", vol. 32, No. 3A, Aug. 1989 pp. 250-251.* |
S. Alexander et al, "An atomic-resolution atomic-force microscope implemented using an optical lever", J. Appl. Phys., 65(1), Jan. 1, 1989, pp. 164-167.* |
S.A. Chalmers et al, "Determination of Tilted Superlattice Structure By Atomic Force Microscopy", Applied Physics Letters, vol. 55, No. 24, Dec. 11, 1989, New York, pp. 2491-2493.* |
Y. Martin et al, Atomic force microscope-force mapping and profiling on a sub 100-Å scale, J. Appl. Phys., 61,(10), May 15, 1987, pp. 4723-4729.* |
Y. Martin et al, Atomic force microscope—force mapping and profiling on a sub 100-Å scale, J. Appl. Phys., 61,(10), May 15, 1987, pp. 4723-4729.* |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6437343B1 (en) * | 1998-03-13 | 2002-08-20 | Olympus Optical Co., Ltd. | Scanner system and piezoelectric micro-inching mechansim used in scanning probe microscope |
US20020114229A1 (en) * | 1999-12-27 | 2002-08-22 | Noriaki Nishi | Optical head, light-emitting/receiving device, and apparatus for recording/reproducing optical recording/recorded medium |
US6940789B2 (en) * | 1999-12-27 | 2005-09-06 | Sony Corporation | Optical pickup device that corrects the spot shape of reflected light beams |
US20050109925A1 (en) * | 2003-11-26 | 2005-05-26 | El Rifai Osamah M. | Height calibration of scanning probe microscope actuators |
US7041963B2 (en) | 2003-11-26 | 2006-05-09 | Massachusetts Institute Of Technology | Height calibration of scanning probe microscope actuators |
US20070215804A1 (en) * | 2004-04-21 | 2007-09-20 | Japan Science And Technology Agency | Quantum Beam Aided Atomic Force Microscopy and Quantum Beam Aided Atomic Force Microscope |
US7534999B2 (en) * | 2004-04-21 | 2009-05-19 | Japan Science And Technology Agency | Quantum beam aided atomic force microscopy and quantum beam aided atomic force microscope |
US20070010097A1 (en) * | 2005-07-05 | 2007-01-11 | International Business Machines Corporation | Apparatus and method for selected site backside unlayering of silicon, gaas, gaxalyasz of soi technologies for scanning probe microscopy and atomic force probing characterization |
US7205237B2 (en) | 2005-07-05 | 2007-04-17 | International Business Machines Corporation | Apparatus and method for selected site backside unlayering of si, GaAs, GaxAlyAszof SOI technologies for scanning probe microscopy and atomic force probing characterization |
US8726410B2 (en) | 2010-07-30 | 2014-05-13 | The United States Of America As Represented By The Secretary Of The Air Force | Atomic force microscopy system and method for nanoscale measurement |
US10466271B2 (en) * | 2015-09-01 | 2019-11-05 | Hitachi High-Tech Science Corporation | Scanning probe microscope and optical axis adjustment method for scanning probe microscope |
Also Published As
Publication number | Publication date |
---|---|
DE69122343T2 (en) | 1997-04-10 |
EP0480136A1 (en) | 1992-04-15 |
EP0480136B1 (en) | 1996-09-25 |
DE69122343D1 (en) | 1996-10-31 |
JP2516292B2 (en) | 1996-07-24 |
US5144833A (en) | 1992-09-08 |
JPH04233404A (en) | 1992-08-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
USRE37299E1 (en) | Atomic force microscopy | |
US8528110B2 (en) | Probe detection system | |
US5253516A (en) | Atomic force microscope for small samples having dual-mode operating capability | |
US5524479A (en) | Detecting system for scanning microscopes | |
US5298975A (en) | Combined scanning force microscope and optical metrology tool | |
EP0410131B1 (en) | Near-field lorentz force microscopy | |
US5324935A (en) | Scanning probe microscope having a directional coupler and a Z-direction distance adjusting piezoelectric element | |
US6642517B1 (en) | Method and apparatus for atomic force microscopy | |
US5861550A (en) | Scanning force microscope | |
US7581438B2 (en) | Surface texture measuring probe and microscope utilizing the same | |
JP3073268B2 (en) | Small displacement detection method | |
US7319527B2 (en) | Sensor with cantilever and optical resonator | |
US10564181B2 (en) | Atomic force microscope with optical guiding mechanism | |
KR20080110229A (en) | The head module of atomic force microscope | |
JPH07198359A (en) | Fine movement mechanism and scanning probe microscope | |
JPH03296612A (en) | Atomic force microscope | |
JPH07234119A (en) | Finely adjusting mechanism, scanning type probe microscope and infinitesimal displacement detecting method | |
JPH06258068A (en) | Interatomic force microscope | |
JP3242787B2 (en) | Photon scanning tunneling microscope | |
JPH04162341A (en) | Sample surface picture forming method and device thereof | |
JPH03259709A (en) | Inter-atomic force measuring microscope | |
JP2001013057A (en) | Scanning probe microscope | |
JPH06258067A (en) | Interatomic force microscope | |
JPH08201463A (en) | Surface charge measuring apparatus | |
JPH09133690A (en) | Z-displacement detecting mechanism for scanning probe microscope |