USD958401S1 - Ion shield plate for plasma processing device - Google Patents

Ion shield plate for plasma processing device Download PDF

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Publication number
USD958401S1
USD958401S1 US29/759,815 US202029759815F USD958401S US D958401 S1 USD958401 S1 US D958401S1 US 202029759815 F US202029759815 F US 202029759815F US D958401 S USD958401 S US D958401S
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United States
Prior art keywords
plasma processing
shield plate
processing device
ion shield
ion
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US29/759,815
Inventor
Kazuumi Tanaka
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Hitachi High Tech Corp
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Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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Assigned to HITACHI HIGH-TECH CORPORATION reassignment HITACHI HIGH-TECH CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: TANAKA, KAZUUMI
Assigned to HITACHI HIGH-TECH CORPORATION reassignment HITACHI HIGH-TECH CORPORATION CORRECTIVE ASSIGNMENT TO CORRECT THE EXECUTION DATE PREVIOUSLY RECORDED ON REEL 054827 FRAME 0829. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT OF THE ASSIGNORS' INTEREST. Assignors: KAZUUMI, TANAKA
Assigned to HITACHI HIGH-TECH CORPORATION reassignment HITACHI HIGH-TECH CORPORATION CORRECTIVE ASSIGNMENT TO CORRECT THE ORDER OF THE INVENTOR'S NAME PREVIOUSLY RECORDED ON REEL 055602 FRAME 0969. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT OF THE ASSIGNORS' INTEREST. Assignors: TANAKA, KAZUUMI
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FIG. 1 is a front, top, and right side perspective view of an ion shield plate for plasma processing apparatus according to the design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a top plan view thereof;
FIG. 4 is a bottom plan view thereof;
FIG. 5 is a right side elevational view thereof;
FIG. 6 is a left side elevational view thereof;
FIG. 7 is a rear elevational view thereof;
FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 2; and,
FIG. 9 is an enlarged view of the portion shown in box 9 in FIG. 8.
The broken lines shown in FIGS. 8 and 9 represent the boundary of enlarged view and form no part of the claimed design.

Claims (1)

    CLAIM
  1. The ornamental design for an ion shield plate for plasma processing apparatus, as shown and described.
US29/759,815 2020-05-27 2020-11-25 Ion shield plate for plasma processing device Active USD958401S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPD2020-10384F JP1678330S (en) 2020-05-27 2020-05-27
JP2020-010384D 2020-05-27

Publications (1)

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USD958401S1 true USD958401S1 (en) 2022-07-19

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ID=74312455

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US29/759,815 Active USD958401S1 (en) 2020-05-27 2020-11-25 Ion shield plate for plasma processing device

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US (1) USD958401S1 (en)
JP (1) JP1678330S (en)
TW (1) TWD212326S (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1005245S1 (en) * 2021-04-19 2023-11-21 Hitachi High-Tech Corporation Electrode cover for a plasma processing apparatus
USD1008986S1 (en) * 2021-04-26 2023-12-26 Hitachi High-Tech Corporation Ion shield plate for plasma processing apparatus
USD1031079S1 (en) * 2021-10-07 2024-06-11 iRoma Scents A.B. Ltd. Multi-chamber canister

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* Cited by examiner, † Cited by third party
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USD997893S1 (en) 2021-09-28 2023-09-05 Applied Materials, Inc. Shadow ring lift plate
USD997894S1 (en) 2021-09-28 2023-09-05 Applied Materials, Inc. Shadow ring lift assembly
JP1713113S (en) 2021-11-26 2022-04-20
JP1712507S (en) 2021-11-26 2022-04-13
TWD228948S (en) 2022-05-31 2023-12-11 荷蘭商Asm Ip私人控股有限公司 Susceptor
TWD228949S (en) 2022-05-31 2023-12-11 荷蘭商Asm Ip私人控股有限公司 Susceptor

Citations (16)

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USD638550S1 (en) * 2009-11-13 2011-05-24 3M Innovative Properties Company Sample processing disk cover
USD638951S1 (en) * 2009-11-13 2011-05-31 3M Innovative Properties Company Sample processing disk cover
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD675330S1 (en) * 2010-07-23 2013-01-29 Apollo Industrial Co., Ltd. Plate valve for bubble generator
US20160122995A1 (en) * 2014-11-03 2016-05-05 Micah Corder Drain cover
USD776295S1 (en) * 2014-11-04 2017-01-10 Charles River Laboratories, Inc. Base
USD794753S1 (en) * 2016-04-08 2017-08-15 Applied Materials, Inc. Showerhead for a semiconductor processing chamber
USD868993S1 (en) * 2017-08-31 2019-12-03 Hitachi High-Technologies Corporation Electrode plate for a plasma processing apparatus
USD877931S1 (en) * 2018-05-09 2020-03-10 Moleculight, Inc. Dispenser for a darkening drape
USD891636S1 (en) * 2018-10-25 2020-07-28 Hitachi High-Tech Corporation Ring for a plasma processing apparatus
USD900760S1 (en) * 2018-07-24 2020-11-03 Hitachi High-Tech Corporation Ion shield plate for semiconductor manufacturing apparatus
USD901407S1 (en) * 2018-07-24 2020-11-10 Hitachi High-Tech Corporation Integrated type ion shield for semiconductor manufacturing apparatus
USD901714S1 (en) * 2017-12-05 2020-11-10 Hamamatsu Photonics K.K. Cover for culture vessel
USD907235S1 (en) * 2017-09-18 2021-01-05 University Of Hertfordshire Higher Education Corporation Enclosure for dissolution system
USD924824S1 (en) * 2018-07-24 2021-07-13 Hitachi High-Tech Corporation Ion shield plate base for semiconductor manufacturing apparatus
USD927015S1 (en) * 2019-10-02 2021-08-03 Anthony Joseph Thomas Skirted petri dish

Patent Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD638550S1 (en) * 2009-11-13 2011-05-24 3M Innovative Properties Company Sample processing disk cover
USD638951S1 (en) * 2009-11-13 2011-05-31 3M Innovative Properties Company Sample processing disk cover
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD675330S1 (en) * 2010-07-23 2013-01-29 Apollo Industrial Co., Ltd. Plate valve for bubble generator
US20160122995A1 (en) * 2014-11-03 2016-05-05 Micah Corder Drain cover
USD776295S1 (en) * 2014-11-04 2017-01-10 Charles River Laboratories, Inc. Base
USD794753S1 (en) * 2016-04-08 2017-08-15 Applied Materials, Inc. Showerhead for a semiconductor processing chamber
USD868993S1 (en) * 2017-08-31 2019-12-03 Hitachi High-Technologies Corporation Electrode plate for a plasma processing apparatus
USD907235S1 (en) * 2017-09-18 2021-01-05 University Of Hertfordshire Higher Education Corporation Enclosure for dissolution system
USD901714S1 (en) * 2017-12-05 2020-11-10 Hamamatsu Photonics K.K. Cover for culture vessel
USD877931S1 (en) * 2018-05-09 2020-03-10 Moleculight, Inc. Dispenser for a darkening drape
USD900760S1 (en) * 2018-07-24 2020-11-03 Hitachi High-Tech Corporation Ion shield plate for semiconductor manufacturing apparatus
USD901407S1 (en) * 2018-07-24 2020-11-10 Hitachi High-Tech Corporation Integrated type ion shield for semiconductor manufacturing apparatus
USD924824S1 (en) * 2018-07-24 2021-07-13 Hitachi High-Tech Corporation Ion shield plate base for semiconductor manufacturing apparatus
USD891636S1 (en) * 2018-10-25 2020-07-28 Hitachi High-Tech Corporation Ring for a plasma processing apparatus
USD927015S1 (en) * 2019-10-02 2021-08-03 Anthony Joseph Thomas Skirted petri dish

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Clean your SEM/TEM Samples and TEM Specimen Holders: Evactron® Easy Plasma SoftClean (EPSC). Online, published date unknown. Retrieved on Mar. 28, 2022 from URL: https://www.azom.com/equipment-details.aspx?EquipID=7728. *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1005245S1 (en) * 2021-04-19 2023-11-21 Hitachi High-Tech Corporation Electrode cover for a plasma processing apparatus
USD1008986S1 (en) * 2021-04-26 2023-12-26 Hitachi High-Tech Corporation Ion shield plate for plasma processing apparatus
USD1031079S1 (en) * 2021-10-07 2024-06-11 iRoma Scents A.B. Ltd. Multi-chamber canister

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Publication number Publication date
TWD212326S (en) 2021-06-21
JP1678330S (en) 2021-02-01

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