USD916037S1 - Cover of seal cap for reaction chamber for semiconductor - Google Patents
Cover of seal cap for reaction chamber for semiconductor Download PDFInfo
- Publication number
- USD916037S1 USD916037S1 US29/670,537 US201829670537F USD916037S US D916037 S1 USD916037 S1 US D916037S1 US 201829670537 F US201829670537 F US 201829670537F US D916037 S USD916037 S US D916037S
- Authority
- US
- United States
- Prior art keywords
- cover
- semiconductor
- reaction chamber
- seal cap
- view
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Description
The broken lines are included for the purpose of illustrating portions of the article that form no part of the claimed design.
Claims (1)
- We claim the ornamental design for a cover of seal cap for reaction chamber for semiconductor, as shown and described.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP2018-010931 | 2018-05-18 | ||
JPD2018-10931F JP1624334S (en) | 2018-05-18 | 2018-05-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD916037S1 true USD916037S1 (en) | 2021-04-13 |
Family
ID=65269280
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/670,537 Active USD916037S1 (en) | 2018-05-18 | 2018-11-16 | Cover of seal cap for reaction chamber for semiconductor |
Country Status (3)
Country | Link |
---|---|
US (1) | USD916037S1 (en) |
JP (1) | JP1624334S (en) |
TW (1) | TWD201038S (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD947914S1 (en) * | 2020-11-23 | 2022-04-05 | Applied Materials, Inc. | Base plate for a processing chamber substrate support |
USD980813S1 (en) * | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas flow control plate for substrate processing apparatus |
USD980814S1 (en) * | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas distributor for substrate processing apparatus |
USD981972S1 (en) * | 2021-03-22 | 2023-03-28 | Kokusai Electric Corporation | Adiabatic plate for substrate processing appratus |
US11887878B2 (en) | 2019-06-28 | 2024-01-30 | Applied Materials, Inc. | Detachable biasable electrostatic chuck for high temperature applications |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWD230332S (en) | 2021-04-12 | 2024-03-11 | 美商蘭姆研究公司 (美國) | Pedestal for a substrate processing system |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD616390S1 (en) * | 2009-03-06 | 2010-05-25 | Tokyo Electron Limited | Quartz cover for manufacturing semiconductor wafers |
USD654883S1 (en) * | 2010-10-21 | 2012-02-28 | Tokyo Electron Limited | Top plate for reactor for manufacturing semiconductor |
USD654884S1 (en) * | 2010-10-21 | 2012-02-28 | Tokyo Electron Limited | Top plate for reactor for manufacturing semiconductor |
JP1579504S (en) | 2016-07-26 | 2017-06-19 | ||
USD797067S1 (en) * | 2015-04-21 | 2017-09-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
JP1598442S (en) | 2017-08-09 | 2018-02-26 | ||
USD813181S1 (en) * | 2016-07-26 | 2018-03-20 | Hitachi Kokusai Electric Inc. | Cover of seal cap for reaction chamber of semiconductor |
USD855027S1 (en) * | 2018-01-22 | 2019-07-30 | Kokusai Electric Corporation | Cover of seal cap for reaction chamber of semiconductor |
-
2018
- 2018-05-18 JP JPD2018-10931F patent/JP1624334S/ja active Active
- 2018-10-29 TW TW107306363F patent/TWD201038S/en unknown
- 2018-11-16 US US29/670,537 patent/USD916037S1/en active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD616390S1 (en) * | 2009-03-06 | 2010-05-25 | Tokyo Electron Limited | Quartz cover for manufacturing semiconductor wafers |
USD654883S1 (en) * | 2010-10-21 | 2012-02-28 | Tokyo Electron Limited | Top plate for reactor for manufacturing semiconductor |
USD654884S1 (en) * | 2010-10-21 | 2012-02-28 | Tokyo Electron Limited | Top plate for reactor for manufacturing semiconductor |
USD797067S1 (en) * | 2015-04-21 | 2017-09-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
JP1579504S (en) | 2016-07-26 | 2017-06-19 | ||
USD813181S1 (en) * | 2016-07-26 | 2018-03-20 | Hitachi Kokusai Electric Inc. | Cover of seal cap for reaction chamber of semiconductor |
JP1598442S (en) | 2017-08-09 | 2018-02-26 | ||
USD872037S1 (en) * | 2017-08-09 | 2020-01-07 | Kokusai Electric Corporation | Cover of seal cap for reaction chamber for semiconductor manufacturing |
USD855027S1 (en) * | 2018-01-22 | 2019-07-30 | Kokusai Electric Corporation | Cover of seal cap for reaction chamber of semiconductor |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11887878B2 (en) | 2019-06-28 | 2024-01-30 | Applied Materials, Inc. | Detachable biasable electrostatic chuck for high temperature applications |
USD947914S1 (en) * | 2020-11-23 | 2022-04-05 | Applied Materials, Inc. | Base plate for a processing chamber substrate support |
USD960216S1 (en) * | 2020-11-23 | 2022-08-09 | Applied Materials, Inc. | Base plate for a processing chamber substrate support |
USD981972S1 (en) * | 2021-03-22 | 2023-03-28 | Kokusai Electric Corporation | Adiabatic plate for substrate processing appratus |
USD980813S1 (en) * | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas flow control plate for substrate processing apparatus |
USD980814S1 (en) * | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas distributor for substrate processing apparatus |
Also Published As
Publication number | Publication date |
---|---|
TWD201038S (en) | 2019-11-21 |
JP1624334S (en) | 2019-02-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FEPP | Fee payment procedure |
Free format text: ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: BIG.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |