US8565559B2 - Optical device and optical modulation apparatus - Google Patents

Optical device and optical modulation apparatus Download PDF

Info

Publication number
US8565559B2
US8565559B2 US13/278,156 US201113278156A US8565559B2 US 8565559 B2 US8565559 B2 US 8565559B2 US 201113278156 A US201113278156 A US 201113278156A US 8565559 B2 US8565559 B2 US 8565559B2
Authority
US
United States
Prior art keywords
optical waveguide
bias
electrode
optical
voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active, expires
Application number
US13/278,156
Other languages
English (en)
Other versions
US20120328228A1 (en
Inventor
Hideo Hara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advantest Corp
Original Assignee
Advantest Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advantest Corp filed Critical Advantest Corp
Publication of US20120328228A1 publication Critical patent/US20120328228A1/en
Application granted granted Critical
Publication of US8565559B2 publication Critical patent/US8565559B2/en
Assigned to ADVANTEST CORPORATION reassignment ADVANTEST CORPORATION CHANGE OF ADDRESS Assignors: ADVANTEST CORPORATION
Active legal-status Critical Current
Adjusted expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/0121Operation of devices; Circuit arrangements, not otherwise provided for in this subclass
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/29Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
    • G02F1/31Digital deflection, i.e. optical switching
    • G02F1/313Digital deflection, i.e. optical switching in an optical waveguide structure
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/21Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  by interference
    • G02F1/225Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  by interference in an optical waveguide structure
    • G02F1/2255Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  by interference in an optical waveguide structure controlled by a high-frequency electromagnetic component in an electric waveguide structure

Definitions

  • the present invention relates to an optical device and an optical modulation apparatus.
  • a Mach-Zehnder optical device uses a lead lanthanum titanium zirconium oxide (a PbLaZrTiO-type complex oxide, shortened hereinafter to “PLZT”) crystal, in which the change in refractive index with respect to applied electric field strength differs from that of LiNbO 3 (LN), as shown in Patent Document 1, for example.
  • PbLaZrTiO-type complex oxide shortened hereinafter to “PLZT”
  • Such an optical device applies a bias voltage and a control voltage to two electrodes outside the Mach-Zehnder waveguide, to function as an optical modulator, as shown in Non-Patent Document 1, for example.
  • This optical device applies a high-speed control signal to the two electrodes outside the Mach-Zehnder waveguide.
  • the electrode within the Mach-Zehnder optical waveguide functions as a GND, and therefore there are problems involved in designing the electrode such as, when a high-frequency electric field is applied, the surface area of the electrode is insufficient for achieving the GND function.
  • an optical device comprising a substrate; a dielectric film that is formed on the substrate and includes a first optical waveguide and a second optical waveguide that run parallel to each other; a transmission line that is formed on the dielectric film and includes a signal line arranged between the first optical waveguide and the second optical waveguide, a first bias electrode, and a second bias electrode, the first bias electrode and the second bias electrode arranged respectively in a first region that is on a side of the first optical waveguide opposite the second optical waveguide and a second region on a side of the second optical waveguide opposite the first optical waveguide; and a drive circuit section that respectively applies a first bias voltage and a second bias voltage differing from each other to the first bias electrode and the second bias electrode, and applies a control voltage that is between the first bias voltage and the second bias voltage to the signal line.
  • FIG. 1 shows an exemplary configuration of an optical device section 100 according to the present embodiment, along with a drive circuit section 200 .
  • FIG. 2 shows a cross section over the line A-A′ in FIG. 1 , along with the drive circuit section 200 .
  • FIG. 3 shows exemplary change in the refractive index with respect to the applied electric field of the dielectric film 20 according to the present embodiment.
  • FIG. 4 shows an exemplary drive voltage V RF of the drive circuit section 200 according to the present embodiment.
  • FIG. 5 shows an exemplary inter-electrode voltage of the optical device section 100 according to the present embodiment.
  • FIG. 6 shows an exemplary modification of the optical device section 100 according to the present embodiment, along with the drive circuit section 200 .
  • FIG. 1 shows an exemplary configuration of an optical device section 100 according to the present embodiment, along with a drive circuit section 200 .
  • the optical device section 100 includes a Mach-Zehnder optical waveguide formed by a ferroelectric crystal, which has a refractive index change relative to applied electric field strength differing from that of LiNbO 3 (LN), and a coplanar electrode that has a signal line and two bias applying electrodes sandwiching the signal line.
  • the optical device section 100 efficiently applies a modulated electric field to the Mach-Zehnder optical waveguide to modulate input light according to the modulated electric field, and outputs the resulting light.
  • the optical device section 100 includes a first optical waveguide 110 , a second optical waveguide 120 , a signal line 130 , a first bias electrode 132 , a second bias electrode 134 , a first photocoupler 140 , and a second photocoupler 142 .
  • the first optical waveguide 110 and the second optical waveguide 120 have a ridge structure in which a cross section of a dielectric material is convex, and transmit light input thereto.
  • the first optical waveguide 110 and the second optical waveguide 120 may be formed to have a convex shape with a height and width corresponding to the wavelength of light transmitted thereby.
  • the signal line 130 is arranged between the first optical waveguide 110 and the second optical waveguide 120 .
  • One end of the signal line 130 is connected to the frequency signal source 260 , the other end of the signal line 130 is connected to the termination resistance 250 , and the signal line 130 transmits a frequency signal input to one end thereof to the other.
  • the first bias electrode 132 is arranged in a region on the side of the first optical waveguide 110 opposite the second optical waveguide 120 and the signal line 130 .
  • the first bias electrode 132 has a first bias voltage applied thereto.
  • the second bias electrode 134 is arranged in a region that is on the side of the second optical waveguide 120 opposite the first optical waveguide 110 and the signal line 130 .
  • the second bias electrode 134 has a second bias voltage applied thereto.
  • the signal line 130 , the first bias electrode 132 , and the second bias electrode 134 form a coplanar transmission line.
  • the line width of the signal line 130 , the interval between the signal line 130 and the first bias electrode 132 , and the interval between the signal line 130 and the second bias electrode 134 are set to predetermined values according to the frequency of the signal transmitted by the signal line 130 .
  • the signal line 130 can transmit a signal with a high frequency up to tens of GHz.
  • the first photocoupler 140 branches the light input to the optical device section 100 , and guides the light to the first optical waveguide 110 and the second optical waveguide 120 .
  • the second photocoupler 142 multiplexes the light from the first optical waveguide 110 and the second optical waveguide 120 .
  • the second photocoupler 142 outputs the multiplexed light as the output light of the optical device section 100 .
  • the first photocoupler 140 and the second photocoupler 142 may each be a 3 dB photocoupler with two inputs and two outputs that branches, in a one-to-one manner, light input thereto from either of two input sections and outputs the light from each of the two output sections.
  • the first photocoupler 140 may be an optical branching coupler with one input and two outputs and the second photocoupler 142 may be an optical multiplexing coupler with two inputs and one output.
  • the first photocoupler 140 and the second photocoupler 142 may each be a multimode interferometer (MMI) coupler.
  • MMI multimode interferometer
  • the first optical waveguide 110 , the second optical waveguide 120 , the first photocoupler 140 , and the second photocoupler 142 form a Mach-Zehnder optical waveguide.
  • the optical device section 100 branches input light into two beams with the first photocoupler 140 , transmits the two beams respectively to the first optical waveguide 110 and the second optical waveguide 120 , multiplexes the two beams with the second photocoupler 142 , and outputs the multiplexed light.
  • the optical device section 100 modulates the phase of the light being transmitted, by applying an electric field to the first optical waveguide 110 and the second optical waveguide 120 according to a signal applied to the coplanar transmission path from the drive circuit section 200 , and multiplexes the light with the second photocoupler 142 , to output light that is intensity-modulated according to a phase difference.
  • the drive circuit section 200 applies a first bias voltage and a second bias voltage, which are different from each other, to the first bias electrode 132 and the second bias electrode 134 , and applies a control voltage that is between the first bias voltage and the second bias voltage to the signal line 130 .
  • the drive circuit section 200 includes a reference voltage 210 , a first power supply section 220 , a second power supply section 222 , a first inductor 230 , a second inductor 232 , a first capacitor 240 , a second capacitor 242 , a termination resistance 250 , and a frequency signal source 260 .
  • the reference voltage 210 supplies a predetermined voltage.
  • the reference voltage 210 supplies a GND voltage of 0 V.
  • the first power supply section 220 supplies the first bias electrode 132 with the first bias voltage, via the first inductor 230 .
  • the first inductor 230 is connected between the first bias electrode 132 and the first power supply section 220 outputting the first bias voltage.
  • the first capacitor 240 is connected between the reference voltage 210 and the first bias electrode 132 .
  • the first bias electrode 132 connects the drive frequency component to the GND voltage, which is the reference voltage, with a low resistance while blocking the DC component.
  • the second power supply section 222 supplies the second bias electrode 134 with the second bias voltage, via the second inductor 232 .
  • the second inductor 232 is connected between the second bias electrode 134 and the second power supply section 222 outputting the second bias voltage.
  • the second capacitor 242 is connected between the reference voltage 210 and the second bias electrode 134 .
  • the second bias electrode 134 connects the drive frequency component to the GND voltage, which is the reference voltage, with a low resistance while blocking the DC component.
  • the termination resistance 250 is the termination of the signal line 130 .
  • the signal line 130 may be a transmission line with a characteristic impedance of 50 ⁇ and the resistance value of the termination resistance 250 may be 50 ⁇ .
  • the frequency signal source 260 supplies the signal line 130 with a control signal that is a frequency signal having a predetermined frequency.
  • the frequency signal source 260 may supply a frequency signal with a frequency up to tens of GHz.
  • the first bias electrode 132 and the second bias electrode 134 are connected to the GND voltage with high frequency while the first bias voltage and the second bias voltage are being supplied, and the signal line 130 has one end that is a termination and another end from which a high frequency signal is supplied.
  • the signal line 130 , the first bias electrode 132 , and the second bias electrode 134 function as a coplanar transmission line at the drive frequency supplied by the frequency signal source 260 .
  • FIG. 2 shows a cross section over the line A-A′ in FIG. 1 , along with the drive circuit section 200 .
  • the optical device section 100 includes a substrate 10 , a dielectric film 20 , and an insulating film 30 .
  • the substrate 10 is formed of a single-crystal material.
  • the substrate 10 may be an Al 2 O 3 (sapphire) substrate or a MgO substrate.
  • the substrate 10 may be a so-called R-cut sapphire substrate obtained by cutting and polishing such that the (1102) plane of a sapphire substrate is the primary surface.
  • the substrate 10 may be formed by layering some type of layers on a substrate.
  • the substrate 10 since the dielectric film 20 is deposited on the surface of the substrate 10 , the substrate 10 may include a buffer layer for preventing scattering of the substrate material to the dielectric film 20 and/or for lattice matching with the dielectric film 20 .
  • the dielectric film 20 is formed on the substrate 10 and includes the first optical waveguide 110 and the second optical waveguide 120 running parallel to each other.
  • the dielectric film 20 includes the first photocoupler 140 and the second photocoupler 142 connected respectively to the first optical waveguide 110 and the second optical waveguide 120 .
  • the dielectric film 20 is a ferroelectric thin film.
  • the dielectric film 20 may be formed using epitaxial growth.
  • the dielectric film 20 may be a thin film with a thickness of 10 ⁇ m or less, for example.
  • the dielectric film 20 may form a core material of an optical waveguide that transmits light having a wavelength used in 850 nm band, 1300 nm band, and 1500 nm band optical communication.
  • the dielectric film 20 may have a thickness that is determined based on the wavelength of the light to be transmitted.
  • the dielectric film 20 is a ferroelectric thin film such as a PZT thin film, a PLZT thin film, or a BaTiO 3 thin film.
  • a PLZT crystal, a PZT crystal, and a BaTiO 3 crystal are ferroelectric crystals having a Perovskite structure, which is one type of crystal structure, that changes to a tetragonal crystal, an orthorhombic crystal, a rhombohedral crystal, or a cubic crystal depending on temperature and material composition.
  • the lattice constant of the substrate material differs from the lattice constant of the bulk single crystal substrate, and therefore the crystal structure can change when stress is applied to the thin film.
  • the PLZT thin film when a PLZT thin film is formed as the dielectric film 20 on a sapphire ( 1102 ) substrate, the PLZT thin film has a preferred orientation in the ⁇ 110> direction.
  • the dielectric film 20 when the dielectric film 20 is formed as a crystal with a suitable structure on a substrate 10 selected to have a suitable crystal orientation direction, the crystal becomes oriented parallel to the surface of the substrate 10 , and therefore the direction of the intrinsic polarization can be made parallel to the surface of the substrate 10 .
  • the optical device section 100 can provide a substrate suitable for a device that applies an electric field parallel to the easy axis of polarization of the PLZT thin film.
  • the insulating film 30 is formed on the dielectric film 20 .
  • the insulating film 30 may include SiO 2 or SiN x .
  • the insulating film 30 may be a low-dielectric-constant film that has a lower dielectric constant than the dielectric film 20 .
  • the substrate 10 may also have a lower dielectric constant than the dielectric film 20 .
  • the insulating film 30 and the substrate 10 may each have a dielectric constant of 10 or less, and the dielectric film 20 may have a dielectric constant that is from several hundred to several thousand.
  • the dielectric film 20 having a high dielectric constant is formed between the substrate 10 and the insulating film 30 having low dielectric constants and low refractive indexes, thereby forming the first optical waveguide 110 and the second optical waveguide 120 that can efficiently capture light.
  • the optical device section 100 can perform speed matching of matching the transmission speed of the modulated signal to the transmission speed of a light wave transmitted through the first optical waveguide 110 and the second optical waveguide 120 , by changing the thickness and material of the substrate 10 and the insulating film 30 to obtain an effective dielectric constant.
  • the substrate 10 and the insulating film 30 can set the characteristic impedance of the transmission line on which the modulated signal is transmitted to be a predetermined value such as 50 ⁇ , for example.
  • the coplanar transmission line including the signal line 130 , the first bias electrode 132 , and the second bias electrode 134 is formed on the insulating film.
  • the transmission line may be formed of metal, including gold.
  • the transmission line applies an electric field that is parallel to the surface of the substrate 10 to the first optical waveguide 110 and the second optical waveguide 120 .
  • the signal line 130 and the first bias electrode 132 may apply an electric field corresponding to the inter-electrode voltage shown by V 1 in FIG. 2 to the first optical waveguide 110
  • the signal line 130 and the second bias electrode 134 apply an electric field corresponding to the inter-electrode voltage shown by V 2 in FIG. 2 to the second optical waveguide 120 .
  • FIG. 3 shows exemplary change in the refractive index with respect to the applied electric field of the dielectric film 20 according to the present embodiment.
  • the horizontal axis indicates the strength of the applied electrical field generated according to the voltage applied to the dielectric film 20
  • the vertical axis indicates change of the refractive index relative to the applied electric field of the dielectric film 20 .
  • the dielectric film 20 which is formed of PLZT crystal, PZT crystal, or BaTiO 3 crystal, for example, exhibits polarization inversion according to the applied electric field, and therefore, unlike LN crystal or the like in which the change in refractive index is linear with respect to the applied electric field, the dielectric film 20 exhibits a complicated refractive index change, such as a butterfly shape, with respect to the applied electric field. Accordingly, when a sinusoidal voltage is applied to the dielectric film 20 as the control signal, the change in the refractive index is distorted from the form of a sinusoidal wave, unless an offset voltage is added.
  • a dielectric film that has intrinsic polarization and polarity that inverts with respect to the applied electric field is referred to as a “ferroelectric film.”
  • LN crystal or the like that exhibits linear refractive index change in a positive and negative applied electric field range is used as an optical modulator by forming a Mach-Zehnder optical waveguide
  • a known method for modulation that includes forming a coplanar transmission line that includes ground (G), signal (S), and ground (G) electrodes.
  • the S electrode is arranged between the two optical waveguides running parallel in the Mach-Zehnder optical waveguide to apply a control signal, and the two parallel optical waveguides respectively have electric fields in opposite directions applied thereto.
  • the light beams passed through the two parallel optical waveguides have their phases changed in opposite directions, thereby achieving the optical modulation.
  • the slope of the refractive index in a positive applied electric field range and the slope of the refractive index in a negative applied electric field range change in almost the same manner, with respect to change in the absolute value of the applied electric field strength.
  • An optical device using such a ferroelectric causes electric fields having the same direction to be applied to the two parallel optical waveguides when the optical device is used in a GSG coplanar transmission line in the same manner as the LN optical modulator.
  • the light beams passed by the two parallel optical waveguides each undergo a phase change in the same direction, and so there is no phase difference therebetween. Therefore, the optical device using a ferroelectric such as PLZT exhibits unreliable operation when used as an optical modulator or an optical switch, or cannot achieve such operation at all.
  • the drive circuit section 200 of the present embodiment adds a bias voltage V b , which is an offset voltage, to the control signal and applies the resulting signal to the dielectric film 20 .
  • the bias voltage V b may be determined in advance such that, even if the bias voltage is increased or decreased by the voltage amplitude of the control signal, the refractive index change of the dielectric film 20 remains almost linear. For example, when the voltage amplitude of the control signal is 20 V, V b is set to 100 V such that the refractive index change of the dielectric film 20 is approximately linear in a range from 80 V to 120 V.
  • the dielectric film 20 can exhibit a refractive index change characteristic that resembles the applied control signal.
  • the dielectric film 20 shown in the example of FIG. 3 exhibits a refractive index change with a negative slope relative to the applied electric field, and therefore the phase inverts with respect to a sinusoidal control signal applied to the dielectric film 20 .
  • FIG. 4 shows an exemplary drive voltage V RF of the drive circuit section 200 according to the present embodiment.
  • the horizontal axis indicates time and the vertical axis indicates voltage.
  • the first bias electrode 132 is an electrode to which a positive bias is applied as the first bias voltage
  • the second bias electrode 134 is an electrode to which a negative bias is applied as the second bias voltage.
  • the first power supply section 220 supplies the first bias electrode 132 with V b+ of 100 V as a first bias voltage
  • the second power supply section 222 supplies the second bias electrode 134 with V b ⁇ of ⁇ 100 V as a second bias voltage.
  • the frequency signal source 260 applies to the signal line 130 a sinusoidal signal V RF with an amplitude of 20 V, which is a control signal between the first bias voltage V b+ and the second bias voltage V b ⁇ .
  • FIG. 5 shows an exemplary inter-electrode voltage of the optical device section 100 according to the present embodiment.
  • the horizontal axis indicates time and the vertical axis indicates voltage.
  • the drive circuit section 200 can apply electric fields with inverse phases respectively to the first optical waveguide 110 and the second optical waveguide 120 of the optical device section 100 .
  • the drive circuit section 200 can cause the phase difference between the two beams of light transmitted respectively on the two optical waveguides to be approximately double the phase difference achieved by one-sided driving in which an electric field is applied to only one of the first optical waveguide 110 and the second optical waveguide 120 .
  • the drive circuit section 200 can perform push-pull driving of the first optical waveguide 110 and the second optical waveguide 120 formed of PLZT, for example, to efficiently apply the electric fields.
  • the optical device section 100 and the drive circuit section 200 can perform optical modulation without using a plurality of bias tees, additional circuits, or differential signal drivers, for example.
  • the optical device section 100 and the drive circuit section 200 of the present embodiment described above can form coplanar electrodes and transmit a high-speed control signal to apply electric fields with inverse phases respectively to two optical waveguides, according to a control signal.
  • the optical device section 100 can operate as an optical modulator that tracks a control signal having a frequency of tens of GHz.
  • the optical device section 100 includes the insulating film 30 and performs speed matching by matching the transmission speed of the modulated signal with the transmission speed of a light wave transmitted by the first optical waveguide 110 and the second optical waveguide 120 .
  • the control signal is less than several GHz, for example, and speed matching is not necessary, the optical device section 100 need not include the insulating film 30 .
  • the transmission line including the signal line 130 , the first bias electrode 132 , and the second bias electrode 134 is formed on the dielectric film 20 .
  • FIG. 6 shows an exemplary modification of the optical device section 100 according to the present embodiment, along with the drive circuit section 200 .
  • the optical device section 100 includes ground electrodes 610 and 612 , external electrode sections 620 and 622 , a third capacitor 630 , and a fourth capacitor 632 .
  • the ground electrode 610 is formed in a region on a side of the first optical waveguide 110 opposite the signal line 130 and the second optical waveguide 120 , either within the insulating film 30 or in contact with the dielectric film 20 , and is connected to the predetermined reference voltage.
  • the ground electrode 612 is formed in a region on a side of the second optical waveguide 120 opposite the signal line 130 and the first optical waveguide 110 , either within the insulating film 30 or in contact with the dielectric film 20 , and is connected to the predetermined reference voltage.
  • the external electrode section 620 is formed on the insulating film 30 and is electrically connected to the ground electrode 610 .
  • the external electrode section 620 is connected to the reference voltage 210 of the drive circuit section 200 .
  • the external electrode section 622 is formed on the insulating film 30 and electrically connected to the ground electrode 612 .
  • the external electrode section 622 is connected to the reference voltage 210 of the drive circuit section 200 .
  • the third capacitor 630 is connected between the first bias electrode 132 and the ground electrode 610 .
  • the third capacitor 630 may include two electrode films formed of metal within the insulating film 30 , and the insulating material within these electrode films may be a dielectric. Instead, the third capacitor 630 may include one electrode film formed of metal within the insulating film 30 , and the insulating material between this electrode film and the ground electrode 610 may be a dielectric.
  • the fourth capacitor 632 is connected between the second bias electrode 134 and the ground electrode 612 .
  • the fourth capacitor 632 may include two electrode films formed of metal within the insulating film 30 , and the insulating material within these electrode films may be a dielectric. Instead, the fourth capacitor 632 may include one electrode film formed of metal within the insulating film 30 , and the insulating material between this electrode film and the ground electrode 612 may be a dielectric.
  • the optical device section 100 of the present modification forms capacitors using a portion of the insulating material of the insulating film 30 within the insulating film 30 .
  • the first capacitor 240 and the second capacitor 242 of the drive circuit section 200 can be omitted.
  • the drive circuit section 200 includes a frequency signal source 260 and supplies a frequency signal having a predetermined frequency to the signal line 130 .
  • the drive circuit section 200 may include a pulse signal source or a switching circuit, for example, and supply the signal line 130 with a pulse signal or a switching control signal.
  • the optical device section 100 can operate as an optical switch that switches whether input light is output, according to the pulse signal or the switching control signal.

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
US13/278,156 2011-06-24 2011-10-20 Optical device and optical modulation apparatus Active 2031-10-29 US8565559B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011140861A JP5462837B2 (ja) 2011-06-24 2011-06-24 光デバイスまたは光変調装置
JP2011-140861 2011-06-24

Publications (2)

Publication Number Publication Date
US20120328228A1 US20120328228A1 (en) 2012-12-27
US8565559B2 true US8565559B2 (en) 2013-10-22

Family

ID=47361925

Family Applications (1)

Application Number Title Priority Date Filing Date
US13/278,156 Active 2031-10-29 US8565559B2 (en) 2011-06-24 2011-10-20 Optical device and optical modulation apparatus

Country Status (5)

Country Link
US (1) US8565559B2 (zh)
JP (1) JP5462837B2 (zh)
KR (1) KR101266977B1 (zh)
CN (1) CN102841477B (zh)
TW (1) TWI459109B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140205229A1 (en) * 2012-06-06 2014-07-24 Eospace Inc. Advanced Techniques for Improving High-Efficiency Optical Modulators

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101362130B1 (ko) * 2013-02-01 2014-02-25 서울대학교산학협력단 표면 플라즈몬 파의 집적회로를 위한 광 소자
US9507237B2 (en) 2014-09-23 2016-11-29 Finisar Corporation Differential TWE MZM driver for silicon photonics
CN107104736B (zh) * 2016-02-19 2019-08-30 光联通讯有限公司 一种具有马赫-詹德调制器的光传送器及其操作方法
CN107741657B (zh) * 2017-09-27 2021-02-09 西安空间无线电技术研究所 一种极低半波电压的波导电光强度调制装置
JP7343347B2 (ja) * 2019-10-04 2023-09-12 日本碍子株式会社 光変調器用接合体、光変調器および光変調器用接合体の製造方法
CN113156670B (zh) * 2021-03-29 2022-07-12 江苏大学 一种超材料调制器

Citations (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63210917A (ja) 1987-02-27 1988-09-01 Matsushita Electric Ind Co Ltd 光スイツチ装置
US4917449A (en) * 1987-11-20 1990-04-17 Telefonaktiebolaget L M Ericsson Method of disposing a polarization directing optoelectronic coupler and a coupler for carrying out the method
US5064684A (en) * 1989-08-02 1991-11-12 Eastman Kodak Company Waveguides, interferometers, and methods of their formation
JPH05150200A (ja) 1991-11-29 1993-06-18 Fujitsu Ltd 光送信機
US5895742A (en) * 1996-07-19 1999-04-20 Uniphase Telecommunications Products, Inc. Velocity-matched traveling-wave electro-optical modulator using a benzocyclobutene buffer layer
US20020071622A1 (en) * 2000-09-15 2002-06-13 Massachusetts Institute Of Technology Optical modulator using simultaneous push-pull drive of linear and quadratic electro-optic effects
US20020085811A1 (en) * 2000-12-22 2002-07-04 Nec Corporation Waveguide-type optical control device and process for producing the same
US20020131745A1 (en) * 2001-03-15 2002-09-19 Bahman Azarbar Electro-optic waveguide devices
US6522793B1 (en) * 2001-11-21 2003-02-18 Andrei Szilagyi Low voltage electro-optic modulator with integrated driver
US6558585B1 (en) * 2000-11-02 2003-05-06 Pacific Wave Industries, Inc. Techniques for electrode poling of electro-optic polymers to eliminate poling induced optical loss and poling induced damage to electro-optic chromophores
US20030091259A1 (en) * 1999-03-01 2003-05-15 Hiroki Ooi Apparatus and method for optical modulation and demodulation
US20030103709A1 (en) * 2001-12-05 2003-06-05 Jan Grinberg Back biased electro-optical modulator
US6646776B1 (en) * 2002-11-23 2003-11-11 Jds Uniphase Corporation Suppression of high frequency resonance in an electro-optical modulator
JP2004078002A (ja) 2002-08-21 2004-03-11 Sumitomo Electric Ind Ltd 光学部品
JP2004109457A (ja) 2002-09-18 2004-04-08 Ricoh Co Ltd 有機導波路型光変調器および光集積回路
JP2005107229A (ja) 2003-09-30 2005-04-21 Sumitomo Osaka Cement Co Ltd 光導波路素子
US20050226547A1 (en) * 2004-01-16 2005-10-13 Ridgway Richard W Electrooptic modulator employing DC coupled electrodes
US20060023288A1 (en) * 2004-07-27 2006-02-02 Jds Uniphase Corporation Low bias drift modulator with buffer layer
WO2006016677A1 (ja) 2004-08-13 2006-02-16 Tokyo Electron Limited 成膜装置および気化器
JP2006058837A (ja) 2004-08-20 2006-03-02 Nozomi Photonics Co Ltd 光スイッチ及びマトリクス光スイッチ
JP2006221111A (ja) 2005-02-14 2006-08-24 Nippon Telegr & Teleph Corp <Ntt> マッハツェンダー型光素子およびその駆動方法
US7224878B1 (en) * 2004-11-12 2007-05-29 Northwestern University BaTiO3 thin film waveguides and related modulator devices
US20070133918A1 (en) * 2003-07-02 2007-06-14 Celight, Inc. Quadrature modulator with feedback control and optical communications system using the same
US7321702B2 (en) * 2004-05-13 2008-01-22 Fujitsu Limited Optical modulator, optical transmitter, optical modulating method and manufacturing method of the optical modulator
US20080069491A1 (en) * 2004-07-27 2008-03-20 Jds Uniphase Corporaton Electro-Optic Device
JP2009008978A (ja) 2007-06-29 2009-01-15 Anritsu Corp 光変調器
JP4368004B2 (ja) 1999-03-16 2009-11-18 エピフォトニクス株式会社 光導波路素子及び光導波路素子の製造方法
US20120328227A1 (en) * 2011-06-24 2012-12-27 Advantest Corporation Optical device and optical modulation apparatus

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW357271B (en) * 1996-02-26 1999-05-01 Seiko Epson Corp Light regulator, display and the electronic machine

Patent Citations (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63210917A (ja) 1987-02-27 1988-09-01 Matsushita Electric Ind Co Ltd 光スイツチ装置
US4917449A (en) * 1987-11-20 1990-04-17 Telefonaktiebolaget L M Ericsson Method of disposing a polarization directing optoelectronic coupler and a coupler for carrying out the method
US5064684A (en) * 1989-08-02 1991-11-12 Eastman Kodak Company Waveguides, interferometers, and methods of their formation
JPH05150200A (ja) 1991-11-29 1993-06-18 Fujitsu Ltd 光送信機
US5895742A (en) * 1996-07-19 1999-04-20 Uniphase Telecommunications Products, Inc. Velocity-matched traveling-wave electro-optical modulator using a benzocyclobutene buffer layer
US20030091259A1 (en) * 1999-03-01 2003-05-15 Hiroki Ooi Apparatus and method for optical modulation and demodulation
JP4368004B2 (ja) 1999-03-16 2009-11-18 エピフォトニクス株式会社 光導波路素子及び光導波路素子の製造方法
US20020071622A1 (en) * 2000-09-15 2002-06-13 Massachusetts Institute Of Technology Optical modulator using simultaneous push-pull drive of linear and quadratic electro-optic effects
US6558585B1 (en) * 2000-11-02 2003-05-06 Pacific Wave Industries, Inc. Techniques for electrode poling of electro-optic polymers to eliminate poling induced optical loss and poling induced damage to electro-optic chromophores
US20020085811A1 (en) * 2000-12-22 2002-07-04 Nec Corporation Waveguide-type optical control device and process for producing the same
US20020131745A1 (en) * 2001-03-15 2002-09-19 Bahman Azarbar Electro-optic waveguide devices
US6522793B1 (en) * 2001-11-21 2003-02-18 Andrei Szilagyi Low voltage electro-optic modulator with integrated driver
US20030103709A1 (en) * 2001-12-05 2003-06-05 Jan Grinberg Back biased electro-optical modulator
JP2004078002A (ja) 2002-08-21 2004-03-11 Sumitomo Electric Ind Ltd 光学部品
JP2004109457A (ja) 2002-09-18 2004-04-08 Ricoh Co Ltd 有機導波路型光変調器および光集積回路
US6646776B1 (en) * 2002-11-23 2003-11-11 Jds Uniphase Corporation Suppression of high frequency resonance in an electro-optical modulator
US20070133918A1 (en) * 2003-07-02 2007-06-14 Celight, Inc. Quadrature modulator with feedback control and optical communications system using the same
JP2005107229A (ja) 2003-09-30 2005-04-21 Sumitomo Osaka Cement Co Ltd 光導波路素子
US20050226547A1 (en) * 2004-01-16 2005-10-13 Ridgway Richard W Electrooptic modulator employing DC coupled electrodes
US7321702B2 (en) * 2004-05-13 2008-01-22 Fujitsu Limited Optical modulator, optical transmitter, optical modulating method and manufacturing method of the optical modulator
US20060023288A1 (en) * 2004-07-27 2006-02-02 Jds Uniphase Corporation Low bias drift modulator with buffer layer
US20080069491A1 (en) * 2004-07-27 2008-03-20 Jds Uniphase Corporaton Electro-Optic Device
WO2006016677A1 (ja) 2004-08-13 2006-02-16 Tokyo Electron Limited 成膜装置および気化器
JP2006058837A (ja) 2004-08-20 2006-03-02 Nozomi Photonics Co Ltd 光スイッチ及びマトリクス光スイッチ
US7224878B1 (en) * 2004-11-12 2007-05-29 Northwestern University BaTiO3 thin film waveguides and related modulator devices
JP2006221111A (ja) 2005-02-14 2006-08-24 Nippon Telegr & Teleph Corp <Ntt> マッハツェンダー型光素子およびその駆動方法
JP2009008978A (ja) 2007-06-29 2009-01-15 Anritsu Corp 光変調器
US20120328227A1 (en) * 2011-06-24 2012-12-27 Advantest Corporation Optical device and optical modulation apparatus

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
"Notice of Reasons for Rejection" issued by the Japan Patent Office for application No. 2011-140861, May 21, 2013.
G.H. Jin, et al., "PLZT Film Waveguide Mach-Zehnder Electrooptic Modulator", Journal of Lightwave Technology, vol. 18, No. 6, Jun. 2000.
Korean Intellectual Property Office Notice of Office Action for Appl. No. 10-2011-0117754; issued Dec. 5, 2012.

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140205229A1 (en) * 2012-06-06 2014-07-24 Eospace Inc. Advanced Techniques for Improving High-Efficiency Optical Modulators
US10018888B2 (en) * 2012-06-06 2018-07-10 Eospace, Inc. Advanced techniques for improving high-efficiency optical modulators

Also Published As

Publication number Publication date
KR101266977B1 (ko) 2013-05-30
KR20130001100A (ko) 2013-01-03
CN102841477B (zh) 2016-01-13
JP5462837B2 (ja) 2014-04-02
TWI459109B (zh) 2014-11-01
JP2013007910A (ja) 2013-01-10
US20120328228A1 (en) 2012-12-27
CN102841477A (zh) 2012-12-26
TW201300924A (zh) 2013-01-01

Similar Documents

Publication Publication Date Title
US8565559B2 (en) Optical device and optical modulation apparatus
CN111051970B (zh) 光调制器
JP6787397B2 (ja) 光変調器
US10018888B2 (en) Advanced techniques for improving high-efficiency optical modulators
US7447389B2 (en) Optical modulator
CN111164496B (zh) 光调制器
US8909001B2 (en) Optical modulator
US8559777B2 (en) Optical device and optical modulation apparatus
US10578893B2 (en) Optical waveguide element
US6567203B1 (en) Tri-electrode traveling wave optical modulators and methods
US20230122741A1 (en) Optical modulator
Aoki et al. High-performance optical modulator with a wide center electrode and thin x-cut LiNbO 3 substrate
US6738174B1 (en) Dual-electrode traveling wave optical modulators and methods
US7095543B1 (en) Dual-electrode traveling wave optical phase shifters and methods
Girouard et al. Ultrahigh bandwidth, low Vπ photonic crystal BaTiO3 modulators
JP7400661B2 (ja) 光変調器及び光変調素子の駆動方法
WO2009030916A1 (en) Method of modulating a beam of light and optical external modulator
CN115917411A (zh) 光调制元件和光调制元件的驱动方法
CN116324596A (zh) 光调制器
Rabiei et al. High-index contrast, low-voltage lithium niobate modulators

Legal Events

Date Code Title Description
STCF Information on status: patent grant

Free format text: PATENTED CASE

FPAY Fee payment

Year of fee payment: 4

AS Assignment

Owner name: ADVANTEST CORPORATION, JAPAN

Free format text: CHANGE OF ADDRESS;ASSIGNOR:ADVANTEST CORPORATION;REEL/FRAME:047987/0626

Effective date: 20181112

MAFP Maintenance fee payment

Free format text: PAYMENT OF MAINTENANCE FEE, 8TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1552); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

Year of fee payment: 8