US7417745B2 - Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry - Google Patents

Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry Download PDF

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US7417745B2
US7417745B2 US10/816,896 US81689604A US7417745B2 US 7417745 B2 US7417745 B2 US 7417745B2 US 81689604 A US81689604 A US 81689604A US 7417745 B2 US7417745 B2 US 7417745B2
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phase
shifting
mask structure
grating
periodicity
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US20050007602A1 (en
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Helmut Haidner
Wolfgang Emer
Rainer Hoch
Ulrich Wegmann
Martin Schriever
Markus Goeppert
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Carl Zeiss SMT GmbH
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/04—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by beating two waves of a same source but of different frequency and measuring the phase shift of the lower frequency obtained
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
    • G01M11/0264—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested by using targets or reference patterns
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods

Definitions

  • the invention relates to a device for wavefront measurement of an optical imaging system by means of a phase-shifting interferometry technique, having a mask structure to be arranged on the object side, and a grating structure to be arranged on the image side, and to a method for wavefront measurement of an optical imaging system by means of a phase-shifting interferometry technique, wherein a phase-shifting structure and a detector element are moved laterally relative to the optical imaging system to be measured.
  • Devices and methods of this type serve the purpose, for example, of determining the imaging quality and/or image errors of high-resolution optical imaging systems interferometrically with high precision.
  • An important field of application is the corresponding measurement of projection objectives in microlithography exposure machines for semiconductor component patterning.
  • Interferometry techniques used for this purpose are shearing interferometry, by means of which the wavefront measurement device disclosed in Laid-open Patent Application DE 101 09 929 A1, for example, operates, and point diffraction interferometry.
  • the device can be integrated in the system in which the imaging system is used in its normal operation, and it can use for measurement the same radiation of a radiation source present in the system as it is used in normal operation of the imaging system.
  • the interferometer is denoted as an operational interferometer or OI device.
  • phase-shifting interferometry techniques for wavefront measurement that the phase-shifting structure, for example a diffraction grating, to be arranged on the image side, with a one-dimensional or two-dimensional diffraction grating structure, or a so-called coherence mask, to be arranged on the object side, with a one-dimensional or two-dimensional coherence mask structure, is moved laterally relative to the optical imaging system to be measured, in order to determine the spatial derivative of the measured wavefront in the relevant lateral direction, from which it is then possible to obtain image error information relating to the imaging system, in particular spatially resolved image error information relating to the entire pupil of the imaging system, typically in the form of so-called Zernike coefficients.
  • the designation “one- or two-dimensional” means structures which are periodic in one or in two non-parallel directions, and consequently lead in the diffraction diagram to the diffraction patterns in one or in two non-parallel directions.
  • spatial derivatives in two mutually orthogonal directions such as the x- and y-directions of an xyz coordinate system with a z-axis pointing in the direction of the optical axis of the system are determined by using a two-dimensional coherence mask to be arranged on the object side, and a two-dimensional diffraction grating structure corresponding thereto.
  • the stepwise, relatively slow lateral displacement for example of the diffraction grating structure for the purpose of effecting the phase shift in the direction in which the spatial derivative of the interferogram or of the wavefront is to be measured, for example in the x-direction
  • the interferogram image recorded by the detector element on the detection plane during this fast movement is integrated such that the undesired interference is averaged out as far as possible.
  • the downstream detection part and, in particular, the image recording detector element are also laterally displaced synchronously with the phase-shifting structure, for example in a fashion implemented by a design with a motionally rigid coupling of the phase-shifting structure and detector element.
  • This fixed coupling permits a relatively compact design of the wavefront-measuring interferometer part.
  • the pupil migration also occurs when the object-side mask structure is laterally displaced, while the detector element remains undisplaced, and leads with the conventional evaluation methods to a spatial “blurring” of the measured wavefronts, and thus to a so-called “crosstalk” between different Zernike coefficients, in particular Zernike coefficients with large radial powers are underweighted.
  • the technical problem on which the invention is based is to provide a device and a method of the type mentioned at the beginning which specifically permits comparatively accurate wavefront measurement of an optical imaging system even when the pupil image of the measured imaging system migrates on the detection plane of the detector element owing to a coupled lateral movement of the phase-shifting structure and detector element, or a lateral movement of an object-side mask relative to the detector element.
  • the invention solves this problem by providing a device that is distinguished in that one or more structure patterns of different dimensionality are respectively selected for the mask structure to be arranged on the object side, on the one hand, and the grating structure to be arranged on the image side, on the other hand, that is to say one or more one-dimensional mask structure patterns for the object-side mask structure, and one or more two-dimensional grating structure patterns for the image-side grating structure or, conversely, one or more two-dimensional mask structure patterns for the mask structure, and one or more one-dimensional grating structure patterns for the grating structure.
  • the invention solves this problem further by providing a wavefront measuring method which includes a computational consideration of the offset of the pupil position by back calculating the interferogram, respectively recorded by the detector element, using a phase-shifting characteristic associated with the phase-shifting lateral movement, or by a computational correction of wavefront derivatives, obtained from the recorded interferograms, in the direction of lateral movement.
  • This computational elimination of the measuring error caused by the pupil position offset results in a high measuring accuracy in the determination of image errors by the wave-front measurement even in the case of migration movements of the pupil position on the detection plane.
  • the computational correction of the wavefront derivatives is formed as a function of pupil position by means of an approximation algorithm which is relatively easy to apply and with the aid of which it is possible to take account of adequately, or to compensate the influence of the pupil position offset, in any event for the slow phase shift movement in the measuring direction.
  • the disturbing influence in a non-parallel direction can be adequately suppressed, for example in a refinement of the invention, by carrying out the inventive method with the aid of the inventive device.
  • the mask-displacing or phase-shifting grating structure, limited to one-dimension, of the device renders a fast phase-shifting movement in a non-parallel direction superfluous, so that also no corresponding need arises to compensate a pupil position offset in this direction.
  • the pupil position offset for the fast phase-shifting movement in a non-parallel direction can be compensated by back calculating the recorded interferogram with the aid of the associated phase-shifting characteristic.
  • FIG. 1 shows a schematic side view of a device for wavefront measurement by means of shearing interferometry
  • FIG. 2 shows a perspective view of a phase-shifting and detection part of the device of FIG. 1 ,
  • FIG. 3 shows schematic top views of a detection plane of the phase-shifting and detection part of FIG. 2 during stepwise phase-shifting movements in two orthogonal directions
  • FIG. 4 shows a schematic illustration of the migration movement of the pupil image for the xy phase-shifting movements of FIG. 3 ,
  • FIG. 5 shows a schematic top view of a chessboard diffraction grating which can be used in the device of FIG. 1 as phase-shifting structure
  • FIGS. 6 and 7 show top views of two multiline grating coherence mask structures for the x-direction and y-direction, respectively, which can be used in the device of FIG. 1 , in conjunction with the chessboard diffraction grating of FIG. 5 ,
  • FIG. 8 shows a schematic illustration of the cooperation of the two-dimensional chessboard diffraction grating of FIG. 5 with the one-dimensional coherence mask multiline grating of FIG. 6 ,
  • FIG. 9 shows a schematic top view of a two-dimensional triangular diffraction grating and of three one-dimensional coherent mask multiline gratings, arranged correspondingly in position, for use in the device of FIG. 1 ,
  • FIG. 10 shows a schematic illustration corresponding to FIG. 8 for the two-dimensional triangular diffraction grating, and one of the three associated coherent mask multiline gratings of FIG. 9 ,
  • FIG. 11 shows a characteristic diagram for illustrating the influence of the pupil position offset on measurement operations with the aid of the device of FIG. 1 for the Zernike coefficient Z 9 .
  • FIG. 12 shows a characteristic diagram for illustrating a computational correction of the influence of the pupil position offset during measurement operations with the aid of the device of FIG. 1 for the Zernike coefficient Z 25 .
  • FIG. 1 illustrates a typical design of a device for wavefront measurement by means of shearing interferometry for the purpose of determining image errors and, in particular aberrations, using the example of a projection objective 1 of a microlithography projection exposure machine as optical imaging system to be measured.
  • the objective 1 is represented in a simplified fashion by an object-side lens 1 a , an objective pupil 1 b and an image-side lens 1 c .
  • a coherence mask 6 is arranged on object side, preferably in the object plane of the objective 1 .
  • a phase-shifting diffraction grating 7 is arranged on the image side, preferably in the image plane of the objective 1 , such that it can move laterally in the xy-plane orthogonal to the z-direction of the optical axis of the system.
  • the distorted pupil of the objective 1 is imaged onto a detector element 2 , more precisely onto a detection plane 5 of the same.
  • the detector element 2 which can be, for example, a CCD detector of an image recording camera, is an evaluation unit 3 in which the image processing and evaluation algorithms are implemented such as are known to be required for determining image errors by evaluating the wavefront interferograms recorded by the detector element 2 .
  • the detector element 2 is coupled to the phase-shifting diffraction grating 7 in a motionally rigid fashion in the form of a common phase-shifting and detector component 8 .
  • the lateral movement of the diffraction grating 7 serves the purpose of stepwise phase shifting for the shearing interferometry measurement, as a result of which the successively recorded interferograms can be used to determine the spatial derivative of the wavefront in the relevant lateral direction, and therefrom the image errors of the measured objective 1 , that is known per se and requires no more detailed explanation here.
  • the coupled displacement of the detector element 2 together with the phase-shifting diffraction grating 7 produces an offset of the pupil image, that is to say a corresponding lateral migration movement of the same, on the detection plane 5 . This is illustrated more precisely in FIG. 2 to 4 .
  • FIG. 2 to 4 This is illustrated more precisely in FIG. 2 to 4 .
  • FIG. 2 shows diagrammatically the phase-shifting and detection module 8 with a two-dimensional chessboard diffraction grating 7 a during a measurement operation.
  • the measuring radiation 9 coming from the objective to be measured is diffracted by the chessboard diffraction grating 7 a in the x- and y-directions, the respective diffraction maximum corresponding to an associated pupil image patch 10 on the detection plane 5 .
  • the zero diffraction maximum is illustrated in FIG. 2 .
  • FIG. 3 shows the migration movement of the pupil image patch 10 on the detection surface 5 on the basis of the phase-shifting lateral movement of the diffraction grating 7 , and thus also of the detector element 2 coupled to it.
  • this pupil image offset between a central position 10 0 of the pupil image patch and respectively one position 10 +dx displaced in the positive x-direction, and one position 10 +dy displaced in the positive y-direction.
  • the pupil image offset in the x-direction occurs when the diffraction grating 7 is displaced stepwise in this direction in order to effect the phase shift in this direction, and thereby to determine the spatial derivative of the wavefront in the x-direction, for example.
  • the pupil offset occurring in the xy-plane owing to the abovementioned lateral movements of the diffraction grating 7 and detector element 5 relative to the imaging system 1 to be measured supplies a corresponding error contribution in the evaluation of the recorded shearing interferogram for the determination of wavefront, and thus of image errors.
  • the same goes not only for the shearing interferometry technique shown here by way of example, but also for all other conventional interferometry techniques where for the purpose of the wavefront measurement of an imaging system a lateral movement of a phase-shifting structure, in particular a diffraction grating structure, and of a detection plane coupled thereto is undertaken for the purpose of phase shifting, as in the case of point diffraction interferometry, for example.
  • a pupil offset also occurs in systems for which the phase shifting is effected by a lateral movement of the object-side mask structure, like the coherence mask structure 6 of FIG. 1 , relative to the detection plane.
  • Such systems and associated measurement methods in which the object-side mask structure functions as phase-shifting structure are consequently likewise the subject matter of the invention.
  • the invention is explained below with reference again to the example with the image-side diffraction grating 7 as phase-shifting structure.
  • the error contribution is typically expressed in the so-called crosstalk of Zernike coefficients.
  • a wavefront described by specific Zernike coefficients is coupled by the pupil image offset to other, mostly lower Zernike coefficients.
  • the invention takes account of this error contribution in determining the image error by avoiding it as far as possible by skilful selection of the mask structure to be arranged on the object side and the grating structure to be arranged on the image side, and/or compensating it as far as possible computationally.
  • a first remedial measure consists in selecting a different dimensionality for the mask structure to be arranged on the object side, the coherence mask structure 6 in the example in FIG. 1 , on the one hand, and for the image-side grating structure, the diffraction grating structure 7 in the device of FIG. 1 , on the other hand, that is to say selecting a one-dimensional periodic structure for one element and a two-dimensional periodic structure for the other element instead of, as is conventional, a two-dimensional structure for both elements.
  • FIG. 5 to 8 show an example in which the two-dimensional chessboard diffraction grating 7 a in accordance with FIG. 2 is selected as diffraction grating 7 , as depicted in FIG.
  • one one-dimensional multiline mask structure 6 a , 6 b each is optionally used for the coherence mask 6 , as illustrated in FIGS. 6 and 7 .
  • the two multiline grating mask structures 6 a , 6 b are used here, as reproduced in the correct position in FIGS. 6 and 7 with reference to the diffraction grating illustration of FIG. 5 , with mutually orthogonal directions of periodicity which are in each case parallel to one of the two orthogonal chessboard directions of periodicity of the chessboard diffraction grating 7 a .
  • the multiline grating mask 6 a of FIG. 6 with direction of periodicity in the x-direction, and the multiline grating mask 6 b of FIG. 7 with direction of periodicity in the y-direction are to be arranged on the object side in the device of FIG. 1 .
  • FIG. 8 shows the effect of these measures of different dimensionality of the phase-shifting structure and wavefront-producing coherence mask structure with reference to the example of the chessboard diffraction grating 7 a of FIG. 5 in combination with the coherence mask multiline grating 6 a of FIG. 6 .
  • the latter leads to an intensity coherence function modulated in the x-direction, while the chessboard diffraction grating 7 a supplies diffraction maxima both along the x-axis and along the y-axis of the diffraction diagram, as is likewise depicted diagrammatically in FIG. 8 .
  • Combination of two periodic structures with one-dimensional and two-dimensional periodicity results in lasting diffraction orders in the x-direction which are capable of interference, as depicted in the lowermost component image of FIG. 8 .
  • the diffraction orders in the y-direction are suppressed.
  • FIG. 8 is therefore suitable for interferometric measurement with phase-shifting along the x-direction, the in this case possibly disturbing diffraction orders of the chessboard diffraction grating 7 a in the y-direction being suppressed.
  • a fast, averaging-out movement of the chessboard diffraction grating 7 a in the y-direction is therefore not required.
  • the wavefront measurement can be performed by phase-shifting in the y-direction using the coherence mask multiline grating 6 b of FIG. 7 instead of the multiline grating 6 a of FIG. 6 , disturbing diffraction orders in the x-direction 10 being then suppressed.
  • this geometrical structural measure eliminates the fast, averaging-out lateral movement of the phase-shifting structure in the direction not parallel to the measuring direction, there is also no occurrence of the pupil image offset, caused thereby, in this direction, and therefore no occurrence of a corresponding error contribution.
  • the pupil image offset error contribution resulting from the stepwise phase-shifting movement in the measuring direction can be corrected computationally if required, and this will be examined in more detail further below.
  • FIGS. 9 and 10 show a triangular diffraction grating 7 b as phase-shifting grating structure, and this can lead to a rise in accuracy of the wavefront measurement, for example in a hexagonal parcelling of the pupil of the objective to be measured in conjunction with the determination of the spatial derivatives in the three shearing directions of this three-fold triangular grating structure 7 b.
  • the triangular diffraction grating 7 b is optionally combined with one one-dimensional coherence mask multiline grating 6 c , 6 d , 6 e each, which are orientated such that their direction of periodicity coincides in each case with one of the three directions of periodicity of the triangular grating 7 b which are inclined at 120° to one another. Consequently, by using one each of the three multiline gratings 6 c , 6 d , 6 e as coherence mask, the diffraction orders of the phase-shifting triangular gratings 7 b are filtered out in the relevant direction of periodicity, while the diffraction orders in the two other directions of periodicity are suppressed.
  • one of the three directions of periodicity of the triangular grating lies in the y-direction, and this corresponds to the direction of periodicity of a first coherence mask multiline grating 6 c , while the directions of periodicity of the two other coherence mask multiline gratings 6 d , 6 e are at an angle of +120° and ⁇ 120′ thereto.
  • FIG. 10 illustrates the use of one of the multiline gratings 6 d as coherence masks in combination with the triangular grating 7 b as phase-shifting structure.
  • FIG. 10 illustrates the selection of the interference-capable diffraction orders by the relevant multiline grating 6 d with the aid of its coherent function, intensity-modulated in the associated direction of the periodicity, from the diffraction orders, lying in the three directions of periodicity, of the triangular grating 7 b .
  • a two-dimensional grating structure to be arranged on the image side with a one-dimensional wavefront-generating structure to be arranged on the object side to dispense with the average-out fast displacement movement which otherwise contributes the largest fraction of the Zernike crosstalk.
  • the same effect can be achieved in alternative embodiments of the invention by combining a two-dimensional, object side, wavefront-generating mask structure with a one-dimensional image-side grating structure.
  • the coherence mask and/or the image-side grating structure can include in each case, in a conventional way per se, a plurality of one- or two-dimensional patterns arranged, for example, next to one another or superimposed on one another.
  • the necessity and expediency of correcting the error contribution caused by the slow phase-shifting movement is illustrated diagrammatically firstly in FIG. 11 with reference to the example of the influence on the derivative of the wavefront for the Zernike coefficient Z 9 .
  • the characteristic “original” marked by the cross symbols denotes (as section Z 9 ) the wavefront derivative of the Zernike coefficient Z 9 measured without accompanying movement of the detection plane with the phase-shifting structure, whereas by comparison therewith the characteristic “result of the phase shift” marked by the circle symbols denotes the wavefront derivative obtained by the accompanying movement.
  • the latter derivative clearly leads the “original” characteristic.
  • the result is a crosstalk of the Zernike coefficient Z 9 into the Zernike coefficients Z 5 and Z 6 as well as Z 2 and Z 3 for the wavefront reconstructed from the x- and y-derivatives, respectively.
  • the computational correction method which is specifically useful for compensating the error contribution from the slow phase-shifting movement proceeds from the following relationship (I) of the intensity modulation I (1) as a function of the nth phase shift, that is to say the associated “slow” phase curve for a respective pixel, taking account of the accompanying movement of the detection plane with the phase-shifting structure relative to the imaging system to be measured:
  • I ( 1 ) ⁇ ( n ) cos ⁇ ( S x + ⁇ S x ⁇ x ⁇ ⁇ ⁇ ⁇ x ⁇ ( n - 1 ) N + 2 ⁇ ⁇ ⁇ ( n - 1 ) N ) , ( I ) N denoting the total number of phase steps, a phase shift performed over 2 ⁇ , and S x denoting the derivative of the wavefront in the x-direction, which is measured at a point in the detection plane when there is no accompanying movement of the detection plane.
  • the x-direction is adopted thereby as measuring direction without limitation of generality.
  • ⁇ x denotes the lateral displacement of the detection plane during the phase shifting in the x-direction.
  • I (2) constituting the corrected intensity value of the individual pixel as a function of the nth phase shift
  • S x (1) constituting the wavefront derivative explained above and obtained by evaluating the errored intensity values I (1) .
  • intensity values I (2) are then used to calculate the associated corrected wavefront derivative S x (2) in turn, for example by means of Fourier transformation. In other words, in this correctional algorithm use is made of the information contained in the derivative of S x (1) to correct S x (1) in order to determine the wavefront derivative S x (2) corrected for pupil offset.
  • FIG. 12 illustrates the effect of this computational correction method in increasing accuracy with reference to the example of the derivative of the Zernike coefficient Z 25 in the x-direction.
  • the accompanying movement of the detection plane with the phase-shift structure leads to crosstalk to other Zernike coefficients such that, in a way similar to FIG. 11 , the characteristic “result of the phase shift” with the detection plane moving in accompaniment deviates from the characteristic “original” without a detection plane moving in accompaniment.
  • the characteristic “correction” marked with triangular symbols reproduces the result of the computational correction in accordance with the correction algorithm explained above. It may be seen that the correction method is capable of compensating as far as possible the error contribution caused by pupil offset.

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DE10316123A DE10316123A1 (de) 2003-04-04 2003-04-04 Vorrichtung und Verfahren zur Wellenfrontvermessung eines optischen Abbildungssystems durch phasenschiebende Interferometrie
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