US4429398A - Twin waveguide laser - Google Patents

Twin waveguide laser Download PDF

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Publication number
US4429398A
US4429398A US06/348,565 US34856582A US4429398A US 4429398 A US4429398 A US 4429398A US 34856582 A US34856582 A US 34856582A US 4429398 A US4429398 A US 4429398A
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United States
Prior art keywords
waveguide
passages
laser
discharge
electrodes
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Expired - Lifetime
Application number
US06/348,565
Inventor
Peter P. Chenausky
Robert J. Mongeon
Erroll H. Drinkwater
Lanny M. Laughman
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Demaria Electrooptics Systems Inc
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United Technologies Corp
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Assigned to UNITED TECHNOLOGIES CORPORATION, A CORP. OF DE reassignment UNITED TECHNOLOGIES CORPORATION, A CORP. OF DE ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: MONGEON, ROBERT J., CHENAUSKY, PETER P., DRINKWATER, ERROLL H., LAUGHMAN, LANNY M.
Priority to US06/348,565 priority Critical patent/US4429398A/en
Priority to IL67897A priority patent/IL67897A0/en
Priority to PCT/US1983/000197 priority patent/WO1983002854A1/en
Priority to EP83901029A priority patent/EP0098302B1/en
Priority to DE8383901029T priority patent/DE3378716D1/en
Priority to DE1983901029 priority patent/DE98302T1/en
Publication of US4429398A publication Critical patent/US4429398A/en
Application granted granted Critical
Assigned to UNITED TECHNOLOGIES OPTICAL SYSTEMS, INC. reassignment UNITED TECHNOLOGIES OPTICAL SYSTEMS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: UNITED TECHNOLOGIES CORPORATION
Assigned to DEMARIA ELECTROOPTICS SYSTEMS, INC. reassignment DEMARIA ELECTROOPTICS SYSTEMS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: UNITED TECHNOLOGIES OPTICAL SYSTEMS, INC.
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/07Construction or shape of active medium consisting of a plurality of parts, e.g. segments
    • H01S3/073Gas lasers comprising separate discharge sections in one cavity, e.g. hybrid lasers
    • H01S3/076Folded-path lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/0315Waveguide lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08Construction or shape of optical resonators or components thereof
    • H01S3/081Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/105Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H01S3/1055Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2383Parallel arrangements

Definitions

  • the field of the invention is that of an RF-discharge waveguide laser.
  • the invention relates to an RF-discharge waveguide laser having multiple waveguides sharing a common set of transverse discharge electrodes, so that the duplication and redundancy implied by separate electrode or power supplies for each waveguide is eliminated.
  • FIG. 1 illustrates the electrode and waveguide configuration of a laser constructed according to the invention.
  • FIG. 2 illustrates a cross section of a pair of lasers sharing a common diffraction grating.
  • FIG. 3 illustrates a cross section of a pair of waveguide lasers, each waveguide having a separate diffraction grating.
  • FIG. 4 illustrates a cross section of a pair of waveguides connected in series.
  • electrodes 110 and 112 are separated by ceramic slab 122, into one surface of which waveguides 132 and 134 are machined.
  • the material of slab 122 may be alumina or any other suitable ceramic material.
  • Electrodes 110 and 112 are fed RF power from a conventional power source omitted from the illustration for simplicity. Typical mirrors and diffraction gratings appropriate for waveguide lasers are conventional in the art and are also omitted from the drawing for clarity.
  • a plurality of passages 192 having cross sectional area comparable to the cross section of the discharge channel are formed in slab 122, connecting the two discharge passages. These connecting passages permit the discharge plasma to communicate between channels and thereby improve discharge stability. Since the passages are at a right angle to the path of the laser radiation, there is very little communication between optical cavities and systems in which the two cavities run at different frequencies are not adversely affected.
  • Enclosure 150 encloses and supports diffraction grating 146 mounted on piezoelectric transducer 148.
  • the interior of enclosure 150 may be filled with a gas and pressure chosen for convenience.
  • Grating 146 is sufficiently large to control the optical beams passing from waveguides 132 and 134 through window 144 and being reflected back from grating 146.
  • Frequency adjuster 152 is a plate of transparent material oriented at Brewster's angle which changes the effective cavity length for waveguide 134 and thus changes the operating frequency of that waveguide. With frequency adjuster 152, waveguides 132 and 134 operate within the transition selected by grating 146, but at the frequency offset determined by the thickness of adjuster 152.
  • Transducer 148 is controlled by conventional circuitry to maintain the cavity length of the two lasers at a predetermined amount to compensate for any thermal length variations. Control circuitry is conventional and is omitted from the diagram.
  • FIG. 3 illustrates in cross section an alternative embodiment of the invention, in which separate gratings 154 and 156, controlled by separate piezoelectric transducers 158 and 160, determine the frequency of the two lasers.
  • This embodiment eliminates the considerable alignment problem involved in setting one grating correctly for both channels, at the cost of less optical commonality.
  • FIG. 4 illustrates in cross section another embodiment of the invention in which waveguides 132 and 134 are combined to form a single laser.
  • the frequency is determined by grating 154 controlled by piezoelectric transducer 158 positioned at one end of waveguide 132.
  • Mirrors 166 and 168 are oriented at 45° to the axis of the waveguides to reflect radiation into waveguide 134 from which it exits through output mirrors 162.
  • This embodiment of the invention has the virtue that a certain optical length is contained within half the corresponding physical length, a feature that may be important when the volume allowed for the laser is a system constraint.
  • the present invention also permits the use of a single power supply instead of two supplies or devices for electrically isolating the two discharges, thereby saving a corresponding amount of expense and complexity in the overall laser system.
  • the prior art '319 patent shows, without discussion, an electrode structure in which two cylindrical electrodes (44 and 46) are common to the two longitudinal discharge channels 36 and 38, with no indication of any means for isolating the two discharges. It is well known to those skilled in the art of DC laser gas discharges that when voltage (of the order of tens of kilovolts) is applied to two parallel gaseous discharge paths, one path will have more ionization than the other and will break down sooner. After breakdown, the voltage between the electrodes drops to a level determined by the relative magnitude of the discharge impedance and the power supply impedance. This lower voltage will be insufficient to initiate a discharge in the second channel, so that two discharges cannot be generated with any reasonable reliability.
  • a laser constructed according to the principles of the invention has a pair of square waveguides each having a cross sectional area of 2.25 mm squared, a length of 17 cm and operated at a pressure of approximately 70 Torr.
  • the relative frequency stability of the twin oscillator device was measured to be approximately 30 KHz over a five second period.

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Abstract

An RF-discharge waveguide laser incorporates two or more waveguides sharing a common set of discharge electrodes. The device may be used to provide two lasers operating on the same or different frequencies, or a single laser with two waveguides contributing to the power output.

Description

DESCRIPTION
The Government has rights in this invention pursuant to Contract No. DAAK80-79-C-0302 awarded by the Department of the Army.
1. Technical Field
The field of the invention is that of an RF-discharge waveguide laser.
2. Background Art
U.S. Pat. No. 4,241,319, issued on Dec. 23, 1980 discloses a waveguide laser having two parallel waveguides machined in a ceramic block. The two lasers are independently tuned by separate stark cells operated nearly at the breakdown voltage. The problem of causing both of the waveguide DC discharges to fire simultaneously is not discussed.
DISCLOSURE OF INVENTION
The invention relates to an RF-discharge waveguide laser having multiple waveguides sharing a common set of transverse discharge electrodes, so that the duplication and redundancy implied by separate electrode or power supplies for each waveguide is eliminated.
BRIEF DESCRIPTION OF DRAWINGS
FIG. 1 illustrates the electrode and waveguide configuration of a laser constructed according to the invention.
FIG. 2 illustrates a cross section of a pair of lasers sharing a common diffraction grating.
FIG. 3 illustrates a cross section of a pair of waveguide lasers, each waveguide having a separate diffraction grating.
FIG. 4 illustrates a cross section of a pair of waveguides connected in series.
BEST MODE FOR CARRYING OUT THE INVENTION
In FIG. 1, electrodes 110 and 112 are separated by ceramic slab 122, into one surface of which waveguides 132 and 134 are machined. The material of slab 122 may be alumina or any other suitable ceramic material. Electrodes 110 and 112 are fed RF power from a conventional power source omitted from the illustration for simplicity. Typical mirrors and diffraction gratings appropriate for waveguide lasers are conventional in the art and are also omitted from the drawing for clarity.
FIG. 2 illustrates a cross section taken through section 2--2 in FIG. 1 and also showing a diffraction grating and windows. Block 122 of FIG. 1 has attached to it window 144 and mirror 142, constructed of material appropriate for laser operation. The whole electrode construction is enclosed within box 140, a gas tight enclosure confining the gaseous gain medium. In this particular embodiment, the remainder of box 140 is filled with the same gaseous gain medium, such as CO2, that is contained within the waveguides and suitable passages are machined in block 122 to permit circulation of the gas.
A plurality of passages 192 having cross sectional area comparable to the cross section of the discharge channel are formed in slab 122, connecting the two discharge passages. These connecting passages permit the discharge plasma to communicate between channels and thereby improve discharge stability. Since the passages are at a right angle to the path of the laser radiation, there is very little communication between optical cavities and systems in which the two cavities run at different frequencies are not adversely affected.
Enclosure 150 encloses and supports diffraction grating 146 mounted on piezoelectric transducer 148. The interior of enclosure 150 may be filled with a gas and pressure chosen for convenience. Grating 146 is sufficiently large to control the optical beams passing from waveguides 132 and 134 through window 144 and being reflected back from grating 146. Frequency adjuster 152 is a plate of transparent material oriented at Brewster's angle which changes the effective cavity length for waveguide 134 and thus changes the operating frequency of that waveguide. With frequency adjuster 152, waveguides 132 and 134 operate within the transition selected by grating 146, but at the frequency offset determined by the thickness of adjuster 152. Transducer 148 is controlled by conventional circuitry to maintain the cavity length of the two lasers at a predetermined amount to compensate for any thermal length variations. Control circuitry is conventional and is omitted from the diagram.
FIG. 3 illustrates in cross section an alternative embodiment of the invention, in which separate gratings 154 and 156, controlled by separate piezoelectric transducers 158 and 160, determine the frequency of the two lasers. This embodiment eliminates the considerable alignment problem involved in setting one grating correctly for both channels, at the cost of less optical commonality.
FIG. 4 illustrates in cross section another embodiment of the invention in which waveguides 132 and 134 are combined to form a single laser. The frequency is determined by grating 154 controlled by piezoelectric transducer 158 positioned at one end of waveguide 132. Mirrors 166 and 168 are oriented at 45° to the axis of the waveguides to reflect radiation into waveguide 134 from which it exits through output mirrors 162. This embodiment of the invention has the virtue that a certain optical length is contained within half the corresponding physical length, a feature that may be important when the volume allowed for the laser is a system constraint. The present invention also permits the use of a single power supply instead of two supplies or devices for electrically isolating the two discharges, thereby saving a corresponding amount of expense and complexity in the overall laser system.
The prior art '319 patent shows, without discussion, an electrode structure in which two cylindrical electrodes (44 and 46) are common to the two longitudinal discharge channels 36 and 38, with no indication of any means for isolating the two discharges. It is well known to those skilled in the art of DC laser gas discharges that when voltage (of the order of tens of kilovolts) is applied to two parallel gaseous discharge paths, one path will have more ionization than the other and will break down sooner. After breakdown, the voltage between the electrodes drops to a level determined by the relative magnitude of the discharge impedance and the power supply impedance. This lower voltage will be insufficient to initiate a discharge in the second channel, so that two discharges cannot be generated with any reasonable reliability.
No information is given in the '319 patent about the size, shape or extent of penetration into the discharge channels of electrodes 44 and 46, so that one skilled in the art would have no indication of what degree of isolation, if any, between channels 36 and 38 was provided. One skilled in the art, therefore, would not infer from this patent that it is possible to employ electrodes in common to two or more discharges.
One would expect that two transverse RF discharges would exhibit the same starting problem, but it has been found experimentally that two parallel RF discharges may be started reliably. When one discharge initiates first, the second discharge reliably may be struck by increasing the RF input power slightly (approximately 25%) momentarily. DC discharges, of course, do not exhibit this property. It is not understood why RF discharge have this unexpected property, it may be associated with the difference between the peak RF voltage and the plasma sustaining voltage.
A laser constructed according to the principles of the invention has a pair of square waveguides each having a cross sectional area of 2.25 mm squared, a length of 17 cm and operated at a pressure of approximately 70 Torr. The relative frequency stability of the twin oscillator device was measured to be approximately 30 KHz over a five second period.

Claims (3)

We claim:
1. A waveguide laser system comprising:
a ceramic member having a plurality of passages containing a gain medium fashioned therein;
first and second electrodes disposed on opposite sides of said plurality of waveguide passages in said ceramic member for supplying power to said gain medium;
means for resonating optical radiation in said gain medium;
means for supplying radio-frequency power to said first and second electrodes so that each of said first and second electrodes supplies electromagnetic radiation to all of said plurality of passages.
2. A laser system according to claim 1, in which said first and second waveguide passages are bounded by said means for resonating optical radiation in such a manner that radiation of different frequencies may be resonated in each of said waveguide passages.
3. A laser system according to claim 1, in which at least two of said plurality of waveguide passages are connected serially, whereby said at least two waveguide passages form a combined gain medium for a single laser.
US06/348,565 1982-02-12 1982-02-12 Twin waveguide laser Expired - Lifetime US4429398A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
US06/348,565 US4429398A (en) 1982-02-12 1982-02-12 Twin waveguide laser
IL67897A IL67897A0 (en) 1982-02-12 1983-02-13 Twin waveguide laser
DE8383901029T DE3378716D1 (en) 1982-02-12 1983-02-14 Twin waveguide laser
EP83901029A EP0098302B1 (en) 1982-02-12 1983-02-14 Twin waveguide laser
PCT/US1983/000197 WO1983002854A1 (en) 1982-02-12 1983-02-14 Twin waveguide laser
DE1983901029 DE98302T1 (en) 1982-02-12 1983-02-14 DOUBLE WAVE GUIDE LASER.

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US06/348,565 US4429398A (en) 1982-02-12 1982-02-12 Twin waveguide laser

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DE (1) DE3378716D1 (en)
WO (1) WO1983002854A1 (en)

Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4521110A (en) * 1982-12-13 1985-06-04 The United States Of America As Represented By The Secretary Of The Army Dual cavity laser gyro
US4647204A (en) * 1985-08-16 1987-03-03 The United States Of America As Represented By The Secretary Of The Army Compensated dual cavity laser gyro
US4719640A (en) * 1985-08-01 1988-01-12 The United States Of America As Represented By The Secretary Of The Army Multiple parallel RF excited CO2 lasers
US4751715A (en) * 1986-09-30 1988-06-14 Hughes Aircraft Company Clustered waveguide laser
US4761787A (en) * 1986-12-17 1988-08-02 Siemens Aktiengesellschaft Transversely excited waveguide laser
US4813052A (en) * 1987-12-23 1989-03-14 The United States Of America As Represented By The Secretary Of The Air Force Dielectric ridge waveguide gas laser apparatus
US4815094A (en) * 1987-05-22 1989-03-21 California Laboratories, Inc. Multiply folded laser systems
US4870654A (en) * 1987-05-22 1989-09-26 California Laboratories, Inc. Generation of multiply folded optical paths
US4879721A (en) * 1988-11-21 1989-11-07 Hughes Aircraft Company Phase locked laser array
US4890294A (en) * 1987-01-26 1989-12-26 Mitsubishi Denki Kabushiki Kaisha Plasma apparatus
DE3828952A1 (en) * 1988-08-26 1990-03-15 Deutsche Forsch Luft Raumfahrt WAVE GUIDE LASER SYSTEM
US4932775A (en) * 1988-11-21 1990-06-12 Hughes Aircraft Company FM laser transmitter
US4991178A (en) * 1987-09-28 1991-02-05 Matsushita Electric Industrial Co., Ltd. Laser apparatus
WO1995002838A1 (en) * 1993-07-16 1995-01-26 Luckoff Display Corporation Diffractive display utilizing reflective or transmissive light yielding single pixel full color capability
US5610936A (en) * 1995-09-28 1997-03-11 Technology Development Corporation Extended multiply folded optical paths
US5661746A (en) * 1995-10-17 1997-08-26 Universal Laser Syatems, Inc. Free-space gas slab laser
US5675603A (en) * 1993-07-03 1997-10-07 The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland Of Defence Evaluation And Research Agency Laser device
US5867517A (en) * 1997-04-30 1999-02-02 Universal Laser Systems, Inc. Integrated gas laser RF feed and fill apparatus and method
US5881087A (en) * 1997-04-30 1999-03-09 Universal Laser Systems, Inc. Gas laser tube design
US5901167A (en) * 1997-04-30 1999-05-04 Universal Laser Systems, Inc. Air cooled gas laser
US5936993A (en) * 1996-11-01 1999-08-10 Deutsche Zentrum Fuer Luft- Und Raumfahrt E.V. Laser system
DE3614247C2 (en) * 1985-04-30 1999-09-09 Chenausky High frequency transformer
US8223815B2 (en) 2010-07-29 2012-07-17 Dbc Technology Corp. Multiple discharge CO2 laser with improved repetition rate

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2154788B (en) * 1984-02-18 1987-05-13 Ferranti Plc Waveguide laser
US5020062A (en) * 1990-05-03 1991-05-28 Raytheon Company Apparatus and method for frequency modulating a waveguide laser

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4103255A (en) * 1977-03-10 1978-07-25 Schlossberg Howard R High power, compact waveguide gas laser
US4169251A (en) * 1978-01-16 1979-09-25 Hughes Aircraft Company Waveguide gas laser with high frequency transverse discharge excitation
US4241319A (en) * 1979-02-16 1980-12-23 The United States Of America As Represented By The Secretary Of The Army Dual channel waveguide gas laser
DE2951564C2 (en) * 1979-12-21 1983-02-10 Messerschmitt-Bölkow-Blohm GmbH, 8000 München Lasers as directional and beam emitters
US4352188A (en) * 1980-07-03 1982-09-28 Hughes Aircraft Company rf Pumped waveguide laser with inductive loading for enhancing discharge uniformity
FR2510316B1 (en) * 1981-07-21 1987-06-12 Centre Nat Rech Scient GAS LASER

Cited By (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4521110A (en) * 1982-12-13 1985-06-04 The United States Of America As Represented By The Secretary Of The Army Dual cavity laser gyro
DE3614247C2 (en) * 1985-04-30 1999-09-09 Chenausky High frequency transformer
US4719640A (en) * 1985-08-01 1988-01-12 The United States Of America As Represented By The Secretary Of The Army Multiple parallel RF excited CO2 lasers
US4647204A (en) * 1985-08-16 1987-03-03 The United States Of America As Represented By The Secretary Of The Army Compensated dual cavity laser gyro
US4751715A (en) * 1986-09-30 1988-06-14 Hughes Aircraft Company Clustered waveguide laser
US4761787A (en) * 1986-12-17 1988-08-02 Siemens Aktiengesellschaft Transversely excited waveguide laser
US4890294A (en) * 1987-01-26 1989-12-26 Mitsubishi Denki Kabushiki Kaisha Plasma apparatus
US4815094A (en) * 1987-05-22 1989-03-21 California Laboratories, Inc. Multiply folded laser systems
US4870654A (en) * 1987-05-22 1989-09-26 California Laboratories, Inc. Generation of multiply folded optical paths
US4991178A (en) * 1987-09-28 1991-02-05 Matsushita Electric Industrial Co., Ltd. Laser apparatus
US4813052A (en) * 1987-12-23 1989-03-14 The United States Of America As Represented By The Secretary Of The Air Force Dielectric ridge waveguide gas laser apparatus
DE3828952A1 (en) * 1988-08-26 1990-03-15 Deutsche Forsch Luft Raumfahrt WAVE GUIDE LASER SYSTEM
US4930138A (en) * 1988-08-26 1990-05-29 Deutsche Forschungsanstalt Fuer Luft- Und Raumfahrt Waveguide laser system
WO1990004865A1 (en) * 1988-10-17 1990-05-03 California Laboratories Inc. The generation of multiply folded optical paths
US4932775A (en) * 1988-11-21 1990-06-12 Hughes Aircraft Company FM laser transmitter
US4879721A (en) * 1988-11-21 1989-11-07 Hughes Aircraft Company Phase locked laser array
US5675603A (en) * 1993-07-03 1997-10-07 The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland Of Defence Evaluation And Research Agency Laser device
WO1995002838A1 (en) * 1993-07-16 1995-01-26 Luckoff Display Corporation Diffractive display utilizing reflective or transmissive light yielding single pixel full color capability
US5610936A (en) * 1995-09-28 1997-03-11 Technology Development Corporation Extended multiply folded optical paths
US5661746A (en) * 1995-10-17 1997-08-26 Universal Laser Syatems, Inc. Free-space gas slab laser
US5754575A (en) * 1995-10-17 1998-05-19 Universal Laser Systems, Inc. Free-space gas slab laser
US5894493A (en) * 1995-10-17 1999-04-13 Universal Laser Systems, Inc. Free-space gas slab laser
US5982803A (en) * 1995-10-17 1999-11-09 Universal Laser Systems, Inc. Free-space gas slab laser
US5936993A (en) * 1996-11-01 1999-08-10 Deutsche Zentrum Fuer Luft- Und Raumfahrt E.V. Laser system
US5867517A (en) * 1997-04-30 1999-02-02 Universal Laser Systems, Inc. Integrated gas laser RF feed and fill apparatus and method
US5881087A (en) * 1997-04-30 1999-03-09 Universal Laser Systems, Inc. Gas laser tube design
US5901167A (en) * 1997-04-30 1999-05-04 Universal Laser Systems, Inc. Air cooled gas laser
US8223815B2 (en) 2010-07-29 2012-07-17 Dbc Technology Corp. Multiple discharge CO2 laser with improved repetition rate

Also Published As

Publication number Publication date
EP0098302A1 (en) 1984-01-18
WO1983002854A1 (en) 1983-08-18
EP0098302A4 (en) 1986-03-18
DE3378716D1 (en) 1989-01-19
EP0098302B1 (en) 1988-12-14

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