US3634210A - Alkaline nickel plating solutions - Google Patents
Alkaline nickel plating solutions Download PDFInfo
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- US3634210A US3634210A US752170A US3634210DA US3634210A US 3634210 A US3634210 A US 3634210A US 752170 A US752170 A US 752170A US 3634210D A US3634210D A US 3634210DA US 3634210 A US3634210 A US 3634210A
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- Prior art keywords
- nickel
- alkaline
- solutions
- acid
- nickel plating
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- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title abstract description 68
- 229910052759 nickel Inorganic materials 0.000 title abstract description 34
- 238000007747 plating Methods 0.000 title abstract description 16
- 238000005282 brightening Methods 0.000 claims description 3
- OFWXITZZPOYIJJ-UHFFFAOYSA-N 3-cyanopropane-1-sulfonic acid Chemical compound OS(=O)(=O)CCCC#N OFWXITZZPOYIJJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 abstract description 20
- 125000000547 substituted alkyl group Chemical group 0.000 abstract description 5
- 229940045714 alkyl sulfonate alkylating agent Drugs 0.000 abstract description 4
- 125000004432 carbon atom Chemical group C* 0.000 abstract description 4
- 125000004093 cyano group Chemical group *C#N 0.000 abstract description 4
- 229910052736 halogen Inorganic materials 0.000 abstract description 4
- 150000002367 halogens Chemical class 0.000 abstract description 4
- 125000001424 substituent group Chemical group 0.000 abstract description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 abstract description 3
- 239000000243 solution Substances 0.000 description 18
- 239000002253 acid Substances 0.000 description 11
- 150000001875 compounds Chemical class 0.000 description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 5
- 229940081974 saccharin Drugs 0.000 description 5
- 235000019204 saccharin Nutrition 0.000 description 5
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 5
- 239000012670 alkaline solution Substances 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 239000008139 complexing agent Substances 0.000 description 4
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 229940124530 sulfonamide Drugs 0.000 description 3
- 150000003456 sulfonamides Chemical class 0.000 description 3
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 3
- OOCCDEMITAIZTP-QPJJXVBHSA-N (E)-cinnamyl alcohol Chemical compound OC\C=C\C1=CC=CC=C1 OOCCDEMITAIZTP-QPJJXVBHSA-N 0.000 description 2
- PCEMJUSXPJQKDP-UHFFFAOYSA-N 1,1-dioxo-2-prop-2-enyl-1,2-benzothiazol-3-one Chemical compound C1=CC=C2S(=O)(=O)N(CC=C)C(=O)C2=C1 PCEMJUSXPJQKDP-UHFFFAOYSA-N 0.000 description 2
- BEJGLFVJZIJLDQ-UHFFFAOYSA-N 1,1-dioxo-2-prop-2-ynyl-1,2-benzothiazol-3-one Chemical compound C1=CC=C2C(=O)N(CC#C)S(=O)(=O)C2=C1 BEJGLFVJZIJLDQ-UHFFFAOYSA-N 0.000 description 2
- AXDJCCTWPBKUKL-UHFFFAOYSA-N 4-[(4-aminophenyl)-(4-imino-3-methylcyclohexa-2,5-dien-1-ylidene)methyl]aniline;hydron;chloride Chemical compound Cl.C1=CC(=N)C(C)=CC1=C(C=1C=CC(N)=CC=1)C1=CC=C(N)C=C1 AXDJCCTWPBKUKL-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- JEHKKBHWRAXMCH-UHFFFAOYSA-N benzenesulfinic acid Chemical compound O[S@@](=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-N 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 239000002932 luster Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 2
- TVDSBUOJIPERQY-UHFFFAOYSA-N prop-2-yn-1-ol Chemical class OCC#C TVDSBUOJIPERQY-UHFFFAOYSA-N 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- OSOPUXURUGZMFL-UHFFFAOYSA-L 1-(4-pyridin-1-ium-1-ylbutyl)pyridin-1-ium;dichloride Chemical compound [Cl-].[Cl-].C=1C=CC=C[N+]=1CCCC[N+]1=CC=CC=C1 OSOPUXURUGZMFL-UHFFFAOYSA-L 0.000 description 1
- URDCARMUOSMFFI-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(2-hydroxyethyl)amino]acetic acid Chemical compound OCCN(CC(O)=O)CCN(CC(O)=O)CC(O)=O URDCARMUOSMFFI-UHFFFAOYSA-N 0.000 description 1
- GOLORTLGFDVFDW-UHFFFAOYSA-N 3-(1h-benzimidazol-2-yl)-7-(diethylamino)chromen-2-one Chemical compound C1=CC=C2NC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 GOLORTLGFDVFDW-UHFFFAOYSA-N 0.000 description 1
- WSGYTJNNHPZFKR-UHFFFAOYSA-N 3-hydroxypropanenitrile Chemical compound OCCC#N WSGYTJNNHPZFKR-UHFFFAOYSA-N 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- PWHVEHULNLETOV-UHFFFAOYSA-N Nic-1 Natural products C12OC2C2(O)CC=CC(=O)C2(C)C(CCC2=C3)C1C2=CC=C3C(C)C1OC(O)C2(C)OC2(C)C1 PWHVEHULNLETOV-UHFFFAOYSA-N 0.000 description 1
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 1
- 241000080590 Niso Species 0.000 description 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 241000272534 Struthio camelus Species 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- -1 allyl sulfonate Chemical compound 0.000 description 1
- OOCCDEMITAIZTP-UHFFFAOYSA-N allylic benzylic alcohol Natural products OCC=CC1=CC=CC=C1 OOCCDEMITAIZTP-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- KGHMFMDJVUVBRY-UHFFFAOYSA-N antimony copper Chemical compound [Cu].[Sb] KGHMFMDJVUVBRY-UHFFFAOYSA-N 0.000 description 1
- QQHJESKHUUVSIC-UHFFFAOYSA-N antimony lead Chemical compound [Sb].[Pb] QQHJESKHUUVSIC-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-M benzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-M 0.000 description 1
- 229940077388 benzenesulfonate Drugs 0.000 description 1
- VQLYBLABXAHUDN-UHFFFAOYSA-N bis(4-fluorophenyl)-methyl-(1,2,4-triazol-1-ylmethyl)silane;methyl n-(1h-benzimidazol-2-yl)carbamate Chemical compound C1=CC=C2NC(NC(=O)OC)=NC2=C1.C=1C=C(F)C=CC=1[Si](C=1C=CC(F)=CC=1)(C)CN1C=NC=N1 VQLYBLABXAHUDN-UHFFFAOYSA-N 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- JHRWWRDRBPCWTF-OLQVQODUSA-N captafol Chemical compound C1C=CC[C@H]2C(=O)N(SC(Cl)(Cl)C(Cl)Cl)C(=O)[C@H]21 JHRWWRDRBPCWTF-OLQVQODUSA-N 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- LEKPFOXEZRZPGW-UHFFFAOYSA-N copper;dicyanide Chemical compound [Cu+2].N#[C-].N#[C-] LEKPFOXEZRZPGW-UHFFFAOYSA-N 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 238000004512 die casting Methods 0.000 description 1
- XPPKVPWEQAFLFU-UHFFFAOYSA-J diphosphate(4-) Chemical compound [O-]P([O-])(=O)OP([O-])([O-])=O XPPKVPWEQAFLFU-UHFFFAOYSA-J 0.000 description 1
- 235000011180 diphosphates Nutrition 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- IISDMBNJXWPOIZ-UHFFFAOYSA-N n-(benzenesulfonyl)-4-[4-(benzenesulfonylsulfamoyl)phenyl]benzenesulfonamide Chemical compound C=1C=CC=CC=1S(=O)(=O)NS(=O)(=O)C(C=C1)=CC=C1C(C=C1)=CC=C1S(=O)(=O)NS(=O)(=O)C1=CC=CC=C1 IISDMBNJXWPOIZ-UHFFFAOYSA-N 0.000 description 1
- OVQABVAKPIYHIG-UHFFFAOYSA-N n-(benzenesulfonyl)benzenesulfonamide Chemical compound C=1C=CC=CC=1S(=O)(=O)NS(=O)(=O)C1=CC=CC=C1 OVQABVAKPIYHIG-UHFFFAOYSA-N 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-M naphthalene-1-sulfonate Chemical compound C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-M 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- RZLUIDROFNIMHF-UHFFFAOYSA-L nickel(2+);dichlorate Chemical compound [Ni+2].[O-]Cl(=O)=O.[O-]Cl(=O)=O RZLUIDROFNIMHF-UHFFFAOYSA-L 0.000 description 1
- HZVHQZNLOHJMHF-UHFFFAOYSA-N nickel(2+);tetraborate Chemical compound [Ni+2].[Ni+2].[Ni+2].[Ni+2].[Ni+2].[Ni+2].[O-]B([O-])[O-].[O-]B([O-])[O-].[O-]B([O-])[O-].[O-]B([O-])[O-] HZVHQZNLOHJMHF-UHFFFAOYSA-N 0.000 description 1
- 229910000008 nickel(II) carbonate Inorganic materials 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- ZULUUIKRFGGGTL-UHFFFAOYSA-L nickel(ii) carbonate Chemical compound [Ni+2].[O-]C([O-])=O ZULUUIKRFGGGTL-UHFFFAOYSA-L 0.000 description 1
- BFDHFSHZJLFAMC-UHFFFAOYSA-L nickel(ii) hydroxide Chemical compound [OH-].[OH-].[Ni+2] BFDHFSHZJLFAMC-UHFFFAOYSA-L 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- VBPSVYDSYVJIPX-UHFFFAOYSA-N pent-2-en-2-ol Chemical compound CCC=C(C)O VBPSVYDSYVJIPX-UHFFFAOYSA-N 0.000 description 1
- XNERWVPQCYSMLC-UHFFFAOYSA-N phenylpropiolic acid Chemical compound OC(=O)C#CC1=CC=CC=C1 XNERWVPQCYSMLC-UHFFFAOYSA-N 0.000 description 1
- 229920001983 poloxamer Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000151 polyglycol Polymers 0.000 description 1
- 239000010695 polyglycol Substances 0.000 description 1
- KADVUADSGCRCHA-UHFFFAOYSA-N prop-2-enylarsonic acid Chemical compound O[As](O)(=O)CC=C KADVUADSGCRCHA-UHFFFAOYSA-N 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Definitions
- This invention relates to the electrodeposition of nickel and nickel-cobalt alloys from alkaline plating solutions containing a variety of addition agents which includes certain substituted alkyl sulfonates. More specifically, this invention is concerned with improving the brightness of nickel deposits produced from alkaline baths and increasing the limiting current density of said baths.
- Alkaline nickel plating solutions have inherent advantages.
- the throwing power of such solutions is almost invariably better than that observed in acid nickel solutions of the Watts or all-chloride variety.
- the throwing power for alkaline nickel solutions using the BS] formula ranges from to 70 percent while that for the Watts solution is 5 to +5 percent.
- a number of alkaline nickel formulations can be used to plate nickel directly on zinc base die castings. This provides a distinct economic advantage as it avoids the need for the use of cyanide copper which not only eliminates the costly problem of waste disposal but affords a better corrosion resistance.
- complexing agents such as glycolic acid, tartarate, acetylacetone, and ethylenediamine may be used. Even glycerol and oxalate can be used although they are used in combination with other agents having more complexing ability and solubility.
- ethoxylated butynediol at 0.2 g./l. gives a bright deposit up to about 70 a.s.f. At higher current densities the deposit becomes duller. By acid nickel standards the ductility is poor. When 1 g./l. of saccharin is added the deposit becomes duller especially in the low-current density area and slightly less ductile. A similar effect, i.e., no improvement, is noted when 3 g./ 1. of N,N-bis-(phenylsulfonyl)-4,4-biphenyldisulfonimide is added to an alkaline nickel solution containing butynediol.
- Tetramethylene-bis-pyridinium chloride effects a streaked, semibright, very brittle deposit.
- the addition of N,N-bis- (phenylsulfonyl-4,4-biphenylenyldisulfonimide seemed to relieve the brittleness somewhat but darkened the deposit.
- N- Propargyl saccharin effects a bright deposit at 0.1 g./l. with air agitation and the addition of N,N'-bis(phenylsulfonyl)-4,4- biphenyldisulfonimide causes no improvement in ductility or brightness.
- N -allyl saccharin which is similar to N-propargyl saccharin when used in the acid bath, has no efiect when used in the alkaline solution.
- N ,N'- bis(phenylsulfonyl)-4,4'-biphenyldisulfonimide will eliminate misplating caused by high concentrations of ethoxylated propargyl alcohol but just as good deposits are obtained when lower concentrations of the acetylenic compound are used with no sulfonimide.
- Another case where a control agent was beneficial was for Z-butyne-l,4,-dithioethanol. These cases are rare however.
- the addition agents of the present invention comprise substituted alkyl sulfonates wherein the alkyl radical contains from one to five carbon atoms and the substituents are selected from the group consisting of halogen, cyano and nitro.
- the effective concentration range for these addition agents of the instant invention is from 0.1 to 5.0 g./l. while the optimum concentration appears to be about 2 'g./l. for these compounds.
- One way in which these materials may be supplied to the electroplating bath of the instant invention is to supply them in the form of the sodium salt, although the sulfonate of the instant invention can be supplied in any other manner familiar to those skilled in the art and the need not necessarily be the sodium salt thereof.
- Such addition agents of the instant invention are utilized to advantage in alkaline nickel plating processes.
- a nickel plating process can utilize any conventional source of nickel as used in the plating industry such as NiC1 NiSo nickel sulfamate or NiBF wherein the pH is adjusted to between about 7.0 and l 1.0.
- Such plating baths can be operated generally in the range from room temperature to 180 F. depending on the particular-type bath employed. Likewise, plating can be accomplished in such baths at current densities of from about 5 to about 100 amps per sq. ft.
- any conventional source of nickel may be used in supplying the nickel for the plating bath for the instant invention.
- Commonly complexing agents are used in such plating baths to produce complex ions and such is suitable in the practice of the instant invention.
- a nickel electroplating bath comprising an aqueous alkaline solution having a pH of between about 7.0 and about 1 1.0 including at least one electrolyte containing nickel ions and having dissolved therein a sufficient amount of a single brightening agent consisting of between about 0.1 and 5.0 g./l. of a substituted alkyl sulfonate wherein the alkyl radical contains from one to five carbon atoms and the substituents are selected from the group consisting of halogen, cyano and mtro.
- 3-cyano-propanesulfonate is the brightening agent, and is used in an amount of between the about 0.1 and about 5.0 g./l.
Abstract
Addition agents for use in alkaline nickel plating baths which produce a brighter more ductile nickel electroplate. The addition agents are selected from the group consisting of substituted alkyl sulfonates wherein the alkyl radical contains from one-five carbon atoms and the substituents are selected from the group consisting of halogen, cyano and nitro.
Description
nited States Patent lnventors Arthur H. Du Rose Richmond Heights; Robert L. Stern, Cleveland Heights, both of Ohio Appl. No. 752,170 Filed Aug. 13, 1968 Patented Jan. 11, 1972 Assignee Kewanee Oil Company Bryn Mawr, Pa.
ALKALINE NICKEL PLATING SOLUTIONS 2 Claims, No Drawings [56] References Cited UNITED STATES PATENTS 2,937,978 5/l960 Strauss et al 204/49 3,417,005 l2/l968 Baig 204/49 X 3,428,536 2/1969 Towle et al. 204/49 Primary Examiner-G. L. Kaplan Attorney-John P. Hazzard ABSTRACT: Addition agents for use in alkaline nickel plating baths which produce a brighter more ductile nickel electroplate. The addition agents are selected from the group consisting of substituted alkyl sulfonates wherein the alkyl radical contains from one-five carbon atoms and the substituents are selected from the group consisting of halogen, cyano and nitro.
This invention relates to the electrodeposition of nickel and nickel-cobalt alloys from alkaline plating solutions containing a variety of addition agents which includes certain substituted alkyl sulfonates. More specifically, this invention is concerned with improving the brightness of nickel deposits produced from alkaline baths and increasing the limiting current density of said baths.
Alkaline nickel plating solutions have inherent advantages. The throwing power of such solutions is almost invariably better than that observed in acid nickel solutions of the Watts or all-chloride variety. For example, the throwing power for alkaline nickel solutions using the BS] formula ranges from to 70 percent while that for the Watts solution is 5 to +5 percent. Moreover, when proper preplating steps are followed, a number of alkaline nickel formulations can be used to plate nickel directly on zinc base die castings. This provides a distinct economic advantage as it avoids the need for the use of cyanide copper which not only eliminates the costly problem of waste disposal but affords a better corrosion resistance.
Many complex alkaline nickel plating solutions of various formulations have been proposed and devised heretofore. Their use, however, has not been extensive for several reasons, primarily because of a limited current density, lack of ductility, high stress and lack of luster in the deposit.
A variety of complexing agents has been used, see Saubestre's review in Plating, May 1958. Complexing agents which have been used singly or in combination with others are: NH OH (Brit. Pat. No. 512,484), triethanolamine as described in .I Met. Fin. Soc. Japan 11 (2) 55 (1960), citrate (Brit. Pat. No. 880,786), hydroxyethylethylenediaminetriacetic acid (Brit. Pat. No. 1,022,073), and polyamines (U.S. Pat. No. 2,335,070). Also ammonia, citrate and pyrophosphate are used in combination as described in U.S. Pat. No. 2,069,566 and Brit. Pat. No. 902,499. Similarly citrate, alkanolamines and EDTA-type compounds are described in U.S. Pat. No. 2,773,818.
Other complexing agents such as glycolic acid, tartarate, acetylacetone, and ethylenediamine may be used. Even glycerol and oxalate can be used although they are used in combination with other agents having more complexing ability and solubility.
Little work has been done on producing bright or semibright nickel deposits from alkaline solutions. Brit. Pat. No. 902,499 proposes the use of saccharin in combination with selenium, tellurium, arsenic or coumarin, while Brit. Pat. No. 880,786 uses saccharin and a rather high concentration of formaldehyde.
At first thought one might assume that any addition agent or brightener that is useful in acid nickel plating solutions would be also useful and effective in alkaline nickel solutions. This assumption has been shown many times not to be true. In fact many brighteners and addition agents which are effective in acid baths of zinc, tin, antimony copper and lead are ineffective and useless in the corresponding alkaline baths. Nickel is no exception. Table l is a list of compounds which exhibit little or no effect in alkaline nickel solutions.
TABLE I Phenylpropiolic acid (propiolic good) J-Methoxy-Il-phenyl butyne-l N-Propnrgyldlbcnzenesultonamidc Z-Propynyl) thiohenzothiazole Allylsulfonute Diallyl allyl phosphonatc Allylarsonic acid B-Neopentylallyl alcohol 4-Mcthyl-4-pentene-2-ol Undecyl-lO ene-l-ol Methylbuteneol Trinllylarnine Tetraallylethylenediamine N Allyl saccharin Cinnamyl alcohol Crotonic acid 17. Butanediol l8. Glycerine l9. Cyclohexunol 20. Fuchsin 21. Phenol 22. Nitroindazolc 23. Tetrnmethylene-bis-pyridinium chloride 24. Benzene sulfinic acid 25. Thiourea 26. Polyglycols and Pluronics It should be noted that compounds 1-7, 12-14, -26 of above table are useful in acid nickel baths.
An important difference between the alkaline and acid nickel solutions is that there appears to be very little, or consistent synergistic effect due to the combination of so-called acid nickel control agents and brighteners when they are used in combination in the alkaline nickel solution. in acid nickel solutions the use of the brightener alone (Such as fuchsin, ethoxylated propargyl alcohol, ethylenecyanohydrin, etc.) usually gives only a slight increase in or uneven deposit brightness and the deposit tends to be brittle. When a control agent such as naphthalene sulfonate or saccharin is added the brightness and uniformity of brightness are enhanced and the ductility is improved. Very seldom is the above combination of any benefit in the alkaline nickel solution. For example ethoxylated butynediol at 0.2 g./l. gives a bright deposit up to about 70 a.s.f. At higher current densities the deposit becomes duller. By acid nickel standards the ductility is poor. When 1 g./l. of saccharin is added the deposit becomes duller especially in the low-current density area and slightly less ductile. A similar effect, i.e., no improvement, is noted when 3 g./ 1. of N,N-bis-(phenylsulfonyl)-4,4-biphenyldisulfonimide is added to an alkaline nickel solution containing butynediol. Tetramethylene-bis-pyridinium chloride effects a streaked, semibright, very brittle deposit. The addition of N,N-bis- (phenylsulfonyl-4,4-biphenylenyldisulfonimide seemed to relieve the brittleness somewhat but darkened the deposit. N- Propargyl saccharin effects a bright deposit at 0.1 g./l. with air agitation and the addition of N,N'-bis(phenylsulfonyl)-4,4- biphenyldisulfonimide causes no improvement in ductility or brightness. For some reason N -allyl saccharin which is similar to N-propargyl saccharin when used in the acid bath, has no efiect when used in the alkaline solution.
In many cases as indicated above the addition of the sulfonate or sulfonamide control agent was harmful or of no help. In one case using 3 cc./1. of allyl alcohol the deposit was semibright but the addition of a sulfonamide increased the brightness. This was not so for B-chloroallyl alcohol where only 0.5 cc./l. of the alcohol had to be used. The use of N ,N'- bis(phenylsulfonyl)-4,4'-biphenyldisulfonimide will eliminate misplating caused by high concentrations of ethoxylated propargyl alcohol but just as good deposits are obtained when lower concentrations of the acetylenic compound are used with no sulfonimide. Another case where a control agent was beneficial was for Z-butyne-l,4,-dithioethanol. These cases are rare however.
The use of certain sulfonate and sulfonamide control agents alone, in alkaline nickel solutions-has little effect compared to when these are used in acid solutions. The deposit from alkaline solutions with no addition agents present usually has more sheen than those from acid solutions. This may be why the addition of such agents as benzene sulfonate, saccharin or allyl sulfonate very seldom exhibit any improvement in brightness. Sometimes, as for dibenzenesulfonamide the uniformity of lustre is improved but the increase in luster is almost negligible. Also the ductility is not improved.
The addition agents of the present invention comprise substituted alkyl sulfonates wherein the alkyl radical contains from one to five carbon atoms and the substituents are selected from the group consisting of halogen, cyano and nitro. The effective concentration range for these addition agents of the instant invention is from 0.1 to 5.0 g./l. while the optimum concentration appears to be about 2 'g./l. for these compounds. One way in which these materials may be supplied to the electroplating bath of the instant invention is to supply them in the form of the sodium salt, although the sulfonate of the instant invention can be supplied in any other manner familiar to those skilled in the art and the need not necessarily be the sodium salt thereof.
These addition agents of the instant invention are utilized to advantage in alkaline nickel plating processes. Such a nickel plating process can utilize any conventional source of nickel as used in the plating industry such as NiC1 NiSo nickel sulfamate or NiBF wherein the pH is adjusted to between about 7.0 and l 1.0. Such plating baths can be operated generally in the range from room temperature to 180 F. depending on the particular-type bath employed. Likewise, plating can be accomplished in such baths at current densities of from about 5 to about 100 amps per sq. ft.
Typical compounds falling within the scope of the instant invention and their effective concentration ranges as well as optimum concentrations are given hereinafter.
6. 2,3-diiodopropylsull'onntc 0.l5.0 2.0
1 (I)CH cH, so,, Na
7. Z-chlorocthylsulfonate 0.1-5.0 10
ci-cH,-cH, -s0, Na
8. Z-Cynnoethancsulfonalc 0.1-5.0 2.0
As stated earlier in the specification, any conventional source of nickel may be used in supplying the nickel for the plating bath for the instant invention. For example, nickel chlorate, nickel sulfate, nickel tetraborate, nickel carbonate. nickel hydroxide, nickel sulfamate and the like. Commonly complexing agents are used in such plating baths to produce complex ions and such is suitable in the practice of the instant invention.
We claim:
1. A nickel electroplating bath comprising an aqueous alkaline solution having a pH of between about 7.0 and about 1 1.0 including at least one electrolyte containing nickel ions and having dissolved therein a sufficient amount of a single brightening agent consisting of between about 0.1 and 5.0 g./l. of a substituted alkyl sulfonate wherein the alkyl radical contains from one to five carbon atoms and the substituents are selected from the group consisting of halogen, cyano and mtro.
2. The bath of claim 1 wherein 3-cyano-propanesulfonate is the brightening agent, and is used in an amount of between the about 0.1 and about 5.0 g./l.
Claims (1)
- 2. The bath of claim 1 wherein 3-cyano-propanesulfonate is the brightening agent, and is used in an amount of between the about 0.1 and about 5.0 g./1.
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2937978A (en) * | 1953-08-13 | 1960-05-24 | Dehydag Gmbh | Electroplating of nickel |
US3417005A (en) * | 1965-12-27 | 1968-12-17 | Gen Motors Corp | Neutral nickel-plating process and bath therefor |
US3428536A (en) * | 1966-05-09 | 1969-02-18 | Kewanee Oil Co | Process of and electrolytes for bright nickel electroplating |
-
1968
- 1968-08-13 US US752170A patent/US3634210A/en not_active Expired - Lifetime
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2937978A (en) * | 1953-08-13 | 1960-05-24 | Dehydag Gmbh | Electroplating of nickel |
US3417005A (en) * | 1965-12-27 | 1968-12-17 | Gen Motors Corp | Neutral nickel-plating process and bath therefor |
US3428536A (en) * | 1966-05-09 | 1969-02-18 | Kewanee Oil Co | Process of and electrolytes for bright nickel electroplating |
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