US3514407A - Chemical polishing of titanium and titanium alloys - Google Patents
Chemical polishing of titanium and titanium alloys Download PDFInfo
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- US3514407A US3514407A US583125A US3514407DA US3514407A US 3514407 A US3514407 A US 3514407A US 583125 A US583125 A US 583125A US 3514407D A US3514407D A US 3514407DA US 3514407 A US3514407 A US 3514407A
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- titanium
- acid
- alloys
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- chemical polishing
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F3/00—Brightening metals by chemical means
- C23F3/04—Heavy metals
- C23F3/06—Heavy metals with acidic solutions
Definitions
- This invention is a new and improved chemical solution for imparting bright and lustrous surfaces to articles made of titanium and alloys thereof.
- metal surface polishing has been accomplished by dissolving thin layers of the metal chemically, or by abrading the surface, or by both.
- the object of the present invention is to provide a chemical solution for imparting a visually bright and reflective surface to articles made of titanium and its alloys, with a minimum metal loss and minimum thermal emittance.
- a further object is to provide a chemical solution for cleaning the surfaces of articles made of titanium and its alloys, preparatory to the firm bonding thereto of silicate paints, and the like.
- Another object is to provide a metal surface polishing solution that requires the use of no electrical energy, does not require critical control of trained workers, and that provides results that are superior to comparable results attained by the use of processes that have been available to the trade previously.
- the solutions that comprise the present invention are closely related in their compositions.
- the titanium, or titanium alloy article is immersed at ambient temperature or the temperature may be elevated to decrease the period of immersion.
- EXAMPLE 2 Percent by volume Fluosilicic acid (31%) 20 Hydroflnoric acid (48%) 15 Nitric acid 45 Acetic acid (99 10 Phosphoric acid 10 Temperature (ambient). Time (15-45 minutes).
- a solution for chemically polishing pure titanium metal consisting of: 33% by volume fluosilicic acid (31%), 8% by volume hydrofluoric acid (48%), 25% by volume nitric acid (70%), 17% by volume acetic acid (99;+%), and 17% by volume phosphoric acid (85%).
- a solution for chemically polishing a titanium alloy wherein said titanium alloy consists essentially of the composition by weight of titanium, 6% aluminum, and 4% vanadium; said solution consisting of: 20% by volume fluosilicic acid (31%), 15% by volume hydrofiuoric acid (48%), 45% by volume nitric acid (70%), 10% by Volume acetic acid (99;+%), and 10% by volume phosphoric acid (85 References Cited UNITED STATES PATENTS 3,202,612 8/1965 Nelson 25279.2 3,085,917 4/1963 Netzler et a1. 25279.3 XR 3,007,780 11/1961 Beigay et al.
Description
United States Patent 3,514,407 CHEMICAL POLISHING 0F TITANIUM AND TITANIUM ALLOYS Leo Missel, Endwell, N.Y., assignor to Lockheed Missiles 8: Space Company, a division of Lockheed Aircraft Corporation, Sunnyvale, Calif., a corporation of California No Drawing. Filed Sept. 28, 1966, Ser. No. 583,125
Int. Cl. C2313 3/04, 1/00 U.S. Cl. 252-793 2 Claims ABSTRACT OF THE DISCLOSURE Solutions for polishing titanium and titanium alloy surfaces are disclosed. The solutions are mixtures of fluosilicic acid, hydrofluoric acid, nitric acid, acetic acid, and phosphoric acid. Polishing is accomplished by immersing objects made of titanium or titanium alloys in a solution containing the above acids at room temperature or elevated temperatures for periods up to 90 minutes.
This invention is a new and improved chemical solution for imparting bright and lustrous surfaces to articles made of titanium and alloys thereof.
In the past, metal surface polishing has been accomplished by dissolving thin layers of the metal chemically, or by abrading the surface, or by both.
The object of the present invention is to provide a chemical solution for imparting a visually bright and reflective surface to articles made of titanium and its alloys, with a minimum metal loss and minimum thermal emittance.
A further object is to provide a chemical solution for cleaning the surfaces of articles made of titanium and its alloys, preparatory to the firm bonding thereto of silicate paints, and the like.
Another object is to provide a metal surface polishing solution that requires the use of no electrical energy, does not require critical control of trained workers, and that provides results that are superior to comparable results attained by the use of processes that have been available to the trade previously.
The solutions that comprise the present invention are closely related in their compositions. In both solutions the titanium, or titanium alloy article, is immersed at ambient temperature or the temperature may be elevated to decrease the period of immersion.
Illustratively the solution for pure titanium articles is:
Phosphoric acid (85%) 17 Temperature (ambient). Time (-90 minutes).
3,514,407 Patented May 26, 1970 Illustratively an alloy of the composition by weight of 90% titanium, 6% aluminum and 4% vanadium is immersed in the solution:
EXAMPLE 2 Percent by volume Fluosilicic acid (31%) 20 Hydroflnoric acid (48%) 15 Nitric acid 45 Acetic acid (99 10 Phosphoric acid 10 Temperature (ambient). Time (15-45 minutes).
1. A solution for chemically polishing pure titanium metal, said solution consisting of: 33% by volume fluosilicic acid (31%), 8% by volume hydrofluoric acid (48%), 25% by volume nitric acid (70%), 17% by volume acetic acid (99;+%), and 17% by volume phosphoric acid (85%).
2. A solution for chemically polishing a titanium alloy wherein said titanium alloy consists essentially of the composition by weight of titanium, 6% aluminum, and 4% vanadium; said solution consisting of: 20% by volume fluosilicic acid (31%), 15% by volume hydrofiuoric acid (48%), 45% by volume nitric acid (70%), 10% by Volume acetic acid (99;+%), and 10% by volume phosphoric acid (85 References Cited UNITED STATES PATENTS 3,202,612 8/1965 Nelson 25279.2 3,085,917 4/1963 Netzler et a1. 25279.3 XR 3,007,780 11/1961 Beigay et al. 252--79.3 XR 2,559,445 7/1951 Lotz 252136 2,711,364 6/1955 Beach 41-42 3,125,474 3/ 1964 Watkins et al. 15618 LEON D. ROSDOL, Primary Examiner D. L. ALBRECHT, Assistant Examiner U.S. Cl. X.R.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US58312566A | 1966-09-28 | 1966-09-28 |
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US3514407A true US3514407A (en) | 1970-05-26 |
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US583125A Expired - Lifetime US3514407A (en) | 1966-09-28 | 1966-09-28 | Chemical polishing of titanium and titanium alloys |
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Cited By (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3607398A (en) * | 1969-06-18 | 1971-09-21 | Avco Corp | Chemical stripping process |
US3850712A (en) * | 1971-06-17 | 1974-11-26 | Rolls Royce | Method of etching a titanium or titanium alloy part |
US3891456A (en) * | 1973-10-17 | 1975-06-24 | Us Air Force | Surface treatment of titanium and titanium alloys |
US4071397A (en) * | 1973-07-02 | 1978-01-31 | Motorola, Inc. | Silicon metallographic etch |
US4230522A (en) * | 1978-12-26 | 1980-10-28 | Rockwell International Corporation | PNAF Etchant for aluminum and silicon |
US4277289A (en) * | 1978-07-19 | 1981-07-07 | Aluminum Pechiney | Process for removing titaniferous and silico-aluminous incrustations from surfaces |
US4477364A (en) * | 1983-11-07 | 1984-10-16 | Capetrol International, Inc. | Acidic glass cleaning composition |
US4551434A (en) * | 1983-03-16 | 1985-11-05 | Mtu Motoren-Und Turbinen-Union Muenchen Gmbh | Method for recognizing structural inhomogeneities in titanium alloy test samples including welded samples |
US4704126A (en) * | 1985-04-15 | 1987-11-03 | Richards Medical Company | Chemical polishing process for titanium and titanium alloy surgical implants |
US4900398A (en) * | 1989-06-19 | 1990-02-13 | General Motors Corporation | Chemical milling of titanium |
US4944986A (en) * | 1988-09-23 | 1990-07-31 | Zuel Company | Anti-reflective glass surface |
US5120605A (en) * | 1988-09-23 | 1992-06-09 | Zuel Company, Inc. | Anti-reflective glass surface |
WO2000066808A1 (en) * | 1999-04-30 | 2000-11-09 | Yury Vyacheslavovich Kislyakov | Method for chemically processing articles made of titanium or alloys thereof |
EP1162286A1 (en) * | 2000-06-09 | 2001-12-12 | General Electric Company | A method for removing a coating from a substrate |
EP1178526A2 (en) * | 2000-07-31 | 2002-02-06 | Mitsubishi Chemical Corporation | Mixed acid solution in etching process, process for producing the same, etching process using the same and process for producing semiconductor device |
US20020100493A1 (en) * | 2001-01-29 | 2002-08-01 | General Electric Company | Method for removing oxides and coatings from a substrate |
US20030098042A1 (en) * | 2001-10-05 | 2003-05-29 | Belmonte Frank G. | Method of removing iron oxide deposits from the surface of titanium components |
WO2004031448A1 (en) * | 2002-10-03 | 2004-04-15 | Nuovo Pignone Holding S.P.A. | Aqueous composition for the chemical removal of metallic surfacing present on turbine blades, and its use |
US20040074873A1 (en) * | 2002-10-21 | 2004-04-22 | General Electric Company | Process for removing aluminosilicate material from a substrate, and related compositions |
US20040169013A1 (en) * | 2003-02-28 | 2004-09-02 | General Electric Company | Method for chemically removing aluminum-containing materials from a substrate |
WO2005017230A1 (en) * | 2003-08-19 | 2005-02-24 | Mitsubishi Chemical Corporation | Etching solution for titanium-containing layer and method for etching titanium-containing layer |
US20050115926A1 (en) * | 2003-06-16 | 2005-06-02 | General Electric Company | Process for removing chromide coatings from metal substrates, and related compositions |
US6929861B2 (en) | 2002-03-05 | 2005-08-16 | Zuel Company, Inc. | Anti-reflective glass surface with improved cleanability |
US20100147803A1 (en) * | 2008-12-15 | 2010-06-17 | General Electric Company | Process for removing metallic material from casted substates, and related compositions |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2559445A (en) * | 1946-12-12 | 1951-07-03 | Union Switch & Signal Co | Method for removing scale from steel |
US2711364A (en) * | 1953-12-31 | 1955-06-21 | John G Beach | Polishing metals and composition therefor |
US3007780A (en) * | 1958-03-20 | 1961-11-07 | Titanium Metals Corp | Titanium etching |
US3085917A (en) * | 1960-05-27 | 1963-04-16 | Gen Electric | Chemical cleaning method and material |
US3125474A (en) * | 1964-03-17 | Pickling zirconium and zirconium base alloys | ||
US3202612A (en) * | 1960-12-05 | 1965-08-24 | Monsanto Co | Composition for bright polishing aluminum |
-
1966
- 1966-09-28 US US583125A patent/US3514407A/en not_active Expired - Lifetime
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3125474A (en) * | 1964-03-17 | Pickling zirconium and zirconium base alloys | ||
US2559445A (en) * | 1946-12-12 | 1951-07-03 | Union Switch & Signal Co | Method for removing scale from steel |
US2711364A (en) * | 1953-12-31 | 1955-06-21 | John G Beach | Polishing metals and composition therefor |
US3007780A (en) * | 1958-03-20 | 1961-11-07 | Titanium Metals Corp | Titanium etching |
US3085917A (en) * | 1960-05-27 | 1963-04-16 | Gen Electric | Chemical cleaning method and material |
US3202612A (en) * | 1960-12-05 | 1965-08-24 | Monsanto Co | Composition for bright polishing aluminum |
Cited By (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3607398A (en) * | 1969-06-18 | 1971-09-21 | Avco Corp | Chemical stripping process |
US3850712A (en) * | 1971-06-17 | 1974-11-26 | Rolls Royce | Method of etching a titanium or titanium alloy part |
US4071397A (en) * | 1973-07-02 | 1978-01-31 | Motorola, Inc. | Silicon metallographic etch |
US3891456A (en) * | 1973-10-17 | 1975-06-24 | Us Air Force | Surface treatment of titanium and titanium alloys |
US4277289A (en) * | 1978-07-19 | 1981-07-07 | Aluminum Pechiney | Process for removing titaniferous and silico-aluminous incrustations from surfaces |
US4230522A (en) * | 1978-12-26 | 1980-10-28 | Rockwell International Corporation | PNAF Etchant for aluminum and silicon |
US4551434A (en) * | 1983-03-16 | 1985-11-05 | Mtu Motoren-Und Turbinen-Union Muenchen Gmbh | Method for recognizing structural inhomogeneities in titanium alloy test samples including welded samples |
US4477364A (en) * | 1983-11-07 | 1984-10-16 | Capetrol International, Inc. | Acidic glass cleaning composition |
US4704126A (en) * | 1985-04-15 | 1987-11-03 | Richards Medical Company | Chemical polishing process for titanium and titanium alloy surgical implants |
US4944986A (en) * | 1988-09-23 | 1990-07-31 | Zuel Company | Anti-reflective glass surface |
US5120605A (en) * | 1988-09-23 | 1992-06-09 | Zuel Company, Inc. | Anti-reflective glass surface |
US4900398A (en) * | 1989-06-19 | 1990-02-13 | General Motors Corporation | Chemical milling of titanium |
WO2000066808A1 (en) * | 1999-04-30 | 2000-11-09 | Yury Vyacheslavovich Kislyakov | Method for chemically processing articles made of titanium or alloys thereof |
EP1162286A1 (en) * | 2000-06-09 | 2001-12-12 | General Electric Company | A method for removing a coating from a substrate |
US6833328B1 (en) | 2000-06-09 | 2004-12-21 | General Electric Company | Method for removing a coating from a substrate, and related compositions |
EP1178526A2 (en) * | 2000-07-31 | 2002-02-06 | Mitsubishi Chemical Corporation | Mixed acid solution in etching process, process for producing the same, etching process using the same and process for producing semiconductor device |
EP1178526A3 (en) * | 2000-07-31 | 2004-03-03 | Mitsubishi Chemical Corporation | Mixed acid solution in etching process, process for producing the same, etching process using the same and process for producing semiconductor device |
US20020100493A1 (en) * | 2001-01-29 | 2002-08-01 | General Electric Company | Method for removing oxides and coatings from a substrate |
US6863738B2 (en) | 2001-01-29 | 2005-03-08 | General Electric Company | Method for removing oxides and coatings from a substrate |
US20030098042A1 (en) * | 2001-10-05 | 2003-05-29 | Belmonte Frank G. | Method of removing iron oxide deposits from the surface of titanium components |
US6852879B2 (en) * | 2001-10-05 | 2005-02-08 | Bp Corporation North America Inc. | Method of removing iron oxide deposits from the surface of titanium components |
US6929861B2 (en) | 2002-03-05 | 2005-08-16 | Zuel Company, Inc. | Anti-reflective glass surface with improved cleanability |
WO2004031448A1 (en) * | 2002-10-03 | 2004-04-15 | Nuovo Pignone Holding S.P.A. | Aqueous composition for the chemical removal of metallic surfacing present on turbine blades, and its use |
EP1431421A1 (en) * | 2002-10-21 | 2004-06-23 | General Electric Company | Procees and compositions for removing aluminosilicate material from a substrate |
US20040074873A1 (en) * | 2002-10-21 | 2004-04-22 | General Electric Company | Process for removing aluminosilicate material from a substrate, and related compositions |
US6916429B2 (en) | 2002-10-21 | 2005-07-12 | General Electric Company | Process for removing aluminosilicate material from a substrate, and related compositions |
US20040169013A1 (en) * | 2003-02-28 | 2004-09-02 | General Electric Company | Method for chemically removing aluminum-containing materials from a substrate |
US20050161438A1 (en) * | 2003-02-28 | 2005-07-28 | Kool Lawrence B. | Method for chemically removing aluminum-containing materials from a substrate |
US20050115926A1 (en) * | 2003-06-16 | 2005-06-02 | General Electric Company | Process for removing chromide coatings from metal substrates, and related compositions |
US6953533B2 (en) | 2003-06-16 | 2005-10-11 | General Electric Company | Process for removing chromide coatings from metal substrates, and related compositions |
WO2005017230A1 (en) * | 2003-08-19 | 2005-02-24 | Mitsubishi Chemical Corporation | Etching solution for titanium-containing layer and method for etching titanium-containing layer |
US20100147803A1 (en) * | 2008-12-15 | 2010-06-17 | General Electric Company | Process for removing metallic material from casted substates, and related compositions |
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