US3472691A - Stable resistance films of ni-cr - Google Patents

Stable resistance films of ni-cr Download PDF

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Publication number
US3472691A
US3472691A US623924A US3472691DA US3472691A US 3472691 A US3472691 A US 3472691A US 623924 A US623924 A US 623924A US 3472691D A US3472691D A US 3472691DA US 3472691 A US3472691 A US 3472691A
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United States
Prior art keywords
resistance
nickel
chromium
oxygen
resistivity
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Expired - Lifetime
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US623924A
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English (en)
Inventor
Cornelis Kooy
Enno Coert Munk
Piet Hein Rem
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US Philips Corp
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US Philips Corp
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
    • H01C17/08—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by vapour deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material

Definitions

  • Such resistors may be used in minature circuits. When used for this purpose, it is desirable that the resistors should have a lo-W temperature coefficient and a high stability even if the ambient temperature is comparatively high. Further it is desirable that, if subsequent to the application of the resistance material to the carrier, variations in resistivity of unreversible nature occur, for example, during a thermal threatment for thermal stabilisation, this variation is reproducible.
  • Nickel-chromium resistors are generally manufactured by evaporating a nickel-chromium alloy (80-20) in a vacuum having a residual gas pressure of 10P5 mm. Hg and depositing the vapour evolved onto a carrier which has a temperature of approximately 300 C. After a certain resistivity is reached, the evaporation-deposition is stopped. The films thus obtained are generally found to have still an inadequate thermal stability. Consequently, in practice, such resistance films are also heated for a short time in air, for example, at approximately 300 C. During this heating treatment oxidation and recrystallization processes presumably take place in the resistance film, resulting in a permanent variation in resistivity which progressively decreases, so that a desired stability is ultimately obtained.
  • resistivity upon stabilisation it applies in general that the higher the film resistance, that is to say the thinner the resistance film, the greater is the variation in resitivity upon stabilisation by heating. In practice, this has been found to happen in a manner which is poorly reproducible and hence not well predictable.
  • An object of the invention is to manufacture resistors of the type consisting of a thin film of nickel-chromium on a carrier by evaporation-deposition in vacuo, the resistivity of which resistors varies to a comparatively small extent upon thermal treatment in air for stabilisation.
  • This object is attained in a process in which in a first step a film of nickel-chromium is evaporation-deposited on a carrier in an atmosphere of oxygen at a pressure of the order of 10-5 mm. Hg until the desired resistance of the film is obtained, whereafter in a second step oxygen is admitted up to a pressure of the order of 10-4 mm. Hg
  • the atmosphere of oxygen at a pressure ofthe order of 10F5 mm. Hg may be obtained, for example, by reducing the residual gas pressure in the space in which the resistance films are provided to a pressure of the order of l0-6 mm. Hg or less and then admitting oxygen to the space until a pressure of the order of 10-5 mm. Hg is reached.
  • a pressure of the order of 10-5 mm. Hg is reached.
  • a substantially constant content of oxygen for the resistance film is thus ensured.
  • more oxygen is admitted to an extent such that, with continued deposition of nickelchromium, variation in the resistivity of the film deposited at a pressure of oxygen in the order of 10-5 mm. Hg does not occur any more.
  • this pressure is found to be of the order of 10-4 mm. Hg. It appears to be preferable also in the second step to maintain the pressure constant, by steadily admitting oxygen to the evaporation space.
  • Nickel-chromium is deposited by evaporation on a plurality of glass plates in a vacuum recipient containing a holder for the Said plates, a source of evaporation consisting of a foil of nickel-chromium alloy (-20) which may be heated by the passage of electric current, an aperture through which the space may be exhausted and an inlet for the oxygen to -be supplier, and means for heating the substrates to be deposited on.
  • a source of evaporation consisting of a foil of nickel-chromium alloy (-20) which may be heated by the passage of electric current, an aperture through which the space may be exhausted and an inlet for the oxygen to -be supplier, and means for heating the substrates to be deposited on.
  • One glass plate has previously been provided with metal contacts, included in an electric circuit so that the resistivity of the film can be observed during the depositing process. After reaching a pressure of 10-6 mm. Hg, oxygen is admitted to the vacuum space up to a pressure of 1 to 2.105 mm. Hg
  • the glass plates are heated to a temperature of approximately 300 C. by radiation heating and nickel-chromium is evaporation-deposited until the desired resistivity is reached. Subsequently, more oxygen is admitted, without interrupting the depositing process, until the pressure is, for example, from 0.6 to 0.7 l04 mm. Hg. This pressure has to be such that the resistivity of the film does not vary any more with continued deposition of the nickel-chromium.
  • the depositing process is stopped after some time, in this example after 2 minutes.
  • the table following hereinafter shows several representative values of variations in resistance if the resistance films are heated at 200 C., for example for 24 hours.
  • the first column shows the resistivities per square of the resistance films, the next column shows whether an oxidic covering layer as described has been applied, and the last column shows the variation in resistance after heating at 200 C. in air for 24 hours.
  • Oxidie layer 1n an' provided From literature it is known that, upon thermal treatment of resistance lms having resistivities of 10052 to 1500 per square, variations in resistivity between and may occur upon thermal after-treatment. Said resistivities were obtained by evaporationdeposition at a residual gas pressure lower than 10-4 mm. Hg.
  • the temperature coefficient of the resistors according to the invention is low and usually of the order of -50 ppm. per C.
  • a substrate 1 for example of glass, is covered with a first nickel-chromium layer 2 of a low content of oxygen and the desired resistivity and with a second nickel-chromium layer 3 which is rich in a oxygen.
  • the last-mentioned layer, which has no electric conductivity, is of a composition which is not known but possibly consists of a mixture of oxides of nickel and chromium.
  • a method of manufacturing a thin film resistor comprising the steps depositing on a carrier, in an oxygen atmosphere of about 10-5 mm. Hg, a first evaporation layer of chromium-nickel until a desired resistivity is achieved and then time stabilizing the resistivity of said layer by depositing thereon, in an oxygen atmosphere of about 10-4 mm. Hg, a second evaporation layer of chromium-nickel having a thickness at which the resistivity of the composite layer is no longer substantially effected by time.

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Non-Adjustable Resistors (AREA)
US623924A 1966-03-23 1967-03-17 Stable resistance films of ni-cr Expired - Lifetime US3472691A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6603768A NL6603768A (de) 1966-03-23 1966-03-23

Publications (1)

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US3472691A true US3472691A (en) 1969-10-14

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US623924A Expired - Lifetime US3472691A (en) 1966-03-23 1967-03-17 Stable resistance films of ni-cr

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Country Link
US (1) US3472691A (de)
AT (1) AT274966B (de)
CH (1) CH464644A (de)
DE (1) DE1665236A1 (de)
FR (1) FR1515479A (de)
GB (1) GB1133402A (de)
NL (1) NL6603768A (de)
SE (1) SE305994B (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3607384A (en) * 1968-07-11 1971-09-21 Western Electric Co Thin-film resistors having positive resistivity profiles
US3637421A (en) * 1969-08-27 1972-01-25 Joseph Paul Gimigliano Vacuum vapor coating with metals of high vapor pressure
US3833410A (en) * 1971-12-30 1974-09-03 Trw Inc High stability thin film alloy resistors

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2902244C2 (de) * 1979-01-20 1982-11-11 W.C. Heraeus Gmbh, 6450 Hanau Dehnungsstreifen mit im Vakuum auf einem aufklebbaren Kunststoffträger aufgebrachten Meßgitter aus einer Metallegierung
DE3429607A1 (de) * 1984-08-09 1986-02-20 Klaus 1000 Berlin Oppermann Messwertaufnehmer zum elektrischen messen von kraeften, druecken und spannungen

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2586752A (en) * 1946-09-26 1952-02-19 Polytechnic Inst Brooklyn Alloy resistance element and method for manufacturing same
US2882377A (en) * 1951-10-24 1959-04-14 Pittsburgh Plate Glass Co Electrical resistor metal coatings on refractory materials
US2962393A (en) * 1953-04-21 1960-11-29 John G Ruckelshaus Method of preparing electrical resistors
US2981611A (en) * 1956-03-14 1961-04-25 Metropolitanvickers Electrical Manufacture of printed electrical circuits or components
US3059197A (en) * 1952-06-07 1962-10-16 John G Ruckelshaus Potentiometer

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2586752A (en) * 1946-09-26 1952-02-19 Polytechnic Inst Brooklyn Alloy resistance element and method for manufacturing same
US2882377A (en) * 1951-10-24 1959-04-14 Pittsburgh Plate Glass Co Electrical resistor metal coatings on refractory materials
US3059197A (en) * 1952-06-07 1962-10-16 John G Ruckelshaus Potentiometer
US2962393A (en) * 1953-04-21 1960-11-29 John G Ruckelshaus Method of preparing electrical resistors
US2981611A (en) * 1956-03-14 1961-04-25 Metropolitanvickers Electrical Manufacture of printed electrical circuits or components

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3607384A (en) * 1968-07-11 1971-09-21 Western Electric Co Thin-film resistors having positive resistivity profiles
US3637421A (en) * 1969-08-27 1972-01-25 Joseph Paul Gimigliano Vacuum vapor coating with metals of high vapor pressure
US3833410A (en) * 1971-12-30 1974-09-03 Trw Inc High stability thin film alloy resistors

Also Published As

Publication number Publication date
GB1133402A (en) 1968-11-13
SE305994B (de) 1968-11-11
DE1665236A1 (de) 1971-01-21
CH464644A (de) 1968-10-31
NL6603768A (de) 1967-09-25
FR1515479A (fr) 1968-03-01
AT274966B (de) 1969-10-10

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