US3275408A - Methods for the production of vitreous silica - Google Patents

Methods for the production of vitreous silica Download PDF

Info

Publication number
US3275408A
US3275408A US335848A US33584864A US3275408A US 3275408 A US3275408 A US 3275408A US 335848 A US335848 A US 335848A US 33584864 A US33584864 A US 33584864A US 3275408 A US3275408 A US 3275408A
Authority
US
United States
Prior art keywords
silica
hydrogen
free
vitreous
oxygen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US335848A
Inventor
Winterburn John Alexander
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thermal Syndicate Ltd
Original Assignee
Thermal Syndicate Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thermal Syndicate Ltd filed Critical Thermal Syndicate Ltd
Application granted granted Critical
Publication of US3275408A publication Critical patent/US3275408A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C03B19/1423—Reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C03B37/0142—Reactant deposition burners
    • C03B37/01426—Plasma deposition burners or torches
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/80—Particles consisting of a mixture of two or more inorganic phases
    • C01P2004/82—Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases
    • C01P2004/84—Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases one phase coated with the other
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C03C2203/42—Gas-phase processes using silicon halides as starting materials
    • C03C2203/44—Gas-phase processes using silicon halides as starting materials chlorine containing

Definitions

  • a mass of vitreous silica may be formed by applying finely divided silica to a body held at such a temperature that the silica particles are fused at the surface of the body.
  • the silica can be in the form of grains of quartz sand, crushed quartz crystal or particles of chemically prepared silica.
  • the heating can be done for example by flames, an electric are or electric resistance if the body conducts electricity.
  • a mass of vitreous silica may be formed by vaporising a hydrolysable compound of silicon into a flame of combustible gas and oxygen, so as to form a flame containing silica vapour and/ or finely comminuted silica, impinging or projecting the flame on to a heated body, in such a manner that a mass of transparent vitreous silica is built up upon the said body, the heat for the hydroysis of the silicon compound and fusion of the silica being provided by the aforesaid flame.
  • vitreous silica formed in the last mentioned manner can be made almost completely free from metallic and other impurities by selection of a suitable hydrolysable silicon compound and the resultant product has much greater transparency to ultraviolet radiation than vitreous silica made by fusing natural raw materials such as quartz crystal.
  • a serious disadvantage of the material made in this way is that it can contain as much as 0.14% w./w. of hydroxyl groups, usually referred to as water and this results in undesirable absorption bands in the infrared at 1.4, 2.2 and 2.7 microns wave-lengths, rendering the material unsuitable for optical use in this part of the spectrum.
  • a method of producing a transparent article of vitreous silica comprises vaporsing an oxidisable hydrogen-free compound of silicon into a high temperature gas stream which contains hydrogen-free elemental and/ or combined oxygen so that the compound of silicon is oxidised to form finely comminuted silica or silica vapour, impinging the gas stream on to a refractory target to deposit thereon a layer of silica which is virtified to a transparent body as fast as it is deposited by heat transfer from the gas stream.
  • Any exothermic shortcoming of a flame can, however, be overcome by electric augmentation, that is the introduction of thermal energy into the flame by the utilisation of electrical energy.
  • a first method of electric augmentation is through the use of a high frequency, high energy electrodeless plasma torch.
  • a second method of electric augmentation is through the useof resistive heating of the flame itself by an electric current passing between two electrodes immersed in the flame. The latter method can use electric power from the mains, through a suitable step up transformer and control gear, but can also be made to function at any frequency from zero to many megacycles per second.
  • a method of producing vitreous silica comprises the steps of supplying electrical energy to a gas stream formed from an oxidisable hydrogen-free silicon compound and oxygen or oxygen-containing gas free from hydrogen to provide a gas stream having a temperature sufficient to oxidise the silicon compound to silica, impinging the gas stream on a refractory target and collecting the silica so formed from the stream as a transparent vitreous mass.
  • the temperature of the gas stream may be high enough to form silica vapour or the temperature may be sufficient to form finely comminuted fused silica particles entrained in the stream.
  • the refractory target, or bait piece may be a piece of vitreous silica.
  • the gas stream may comprise a combustible hydrogenfree gas so that a proportion of the thermal energy re quired for the method is derived from the exothermic reaction between the combustible gas and oxygen.
  • the silicon compound may be, for example, suitably purified silicon tetrachloride.
  • a method of producing vitreous silica comprises passing a stream of oxygen or oxygen-containing gas free from hydrogen through an induction-coupled plasma torch, adding to the stream an oxidisable hydrogen-free silicon compound and collecting the silica oxidised from the silicon compound as a transparent vitreous mass on a bait piece.
  • the silicon compound may be added to the gas stream before or after the latter passes through the plasma torch.
  • the plasma torch may comprise a silica burner tube surrounded by an induction coil, and the stream of oxygen or oxygen-containing gas may be passed with the silicon compound through the tube and thereby subjected to the influence of a high frequency electric discharge generated along the axis of the coil.
  • a flame temperature in the plasma leaving the silica tube has been generated, which is suflicient to oxidise the silicon compound to silica and to cause the silica formed in this way to be deposited almost simultaneously on the bait piece.
  • the gas stream, prior to the addition of the silicon compound contains 50 to v./v. of elemental oxygen.
  • reference numeral 3 an inlet for oxygen gas plus silicon tetrachloride.
  • the ball piece 6 issupported on a rotating stand 7 in a container 8.-
  • Example 1 A stream of gas consisting of 3 parts by volume of oxygenand 2 parts by volume of argon is fed into a high frequency induction plasma torch schematically shown in the accompanying drawing, part of the oxygen stream having previously been saturated with silicon tetrachloride vapour at room temperature.
  • the plasma torch comprises a burner'1 of, vitreous. silica surrounded by a four-turn coil fed with 15 kilowatts of electric power at a frequency of 12 megacycles per second.
  • the electrical breakdown of the gas stream is initiated in the known manner and the tip of the resulting plasma of 1 diameter maintained 1 /2 away from a vitreous silica bait piece 6.
  • Example 2 A stream of oxygen gas saturated with silicon tetra- :chloride vapour at room temperature is fed into a high frequency induction plasma torch.
  • the plasma torch consists of a burner of vitreous silica surrounded by a tightly coupled five-turn coil fed with 24 kilowatts of electric power at a frequency of megacycles per second.
  • the electrical breakdown of the gas stream is initiated in the known manner and the tip of the resulting plasma of 1" diameter is maintained 3 inches away from a vitreous silica bait piece.
  • Example 3 phide in order to prevent condensation.
  • the fiarne produced by the ignition of the gases is sufficiently hot both to oxidise the silicon tetrachloride to silica and to fuse the resultant silica to a transparent mass when a vitreous silica bait piece is placed in the flame.
  • Example 4 Two streams of oxygen gas, one saturated with silicon tetrachloride at room temperature and one passed over heated sodium chloride are fed to a vitreous silicaburner to which is also fed carbon monoxide.
  • the flame produced by the ignition of the gases is sufiiciently hot to oxidise the silicon tetrachloride to silica but, not to fuse the product into a vitreous mass when a silica bait piece is placed in the flame.
  • the burner used has two graphite.
  • the flame is sufficiently hot to fuse the silica produced in the flame-to a transparent vitreous mass.
  • the gases are dried by refrigeration to remove all traces of moisture and the silicon tetrachloride is examined for freedom from hydrogen containing compounds such as trichlorosilane and methyl trichlorosilane.
  • the sodium chloride is required in order to increase. the conductivity of the flame, but the amount of this addition which appears in the, silica produced isnotsuflicicnt to have a deleterious etfecton its transmission.
  • a method of producing a transparent body of 'vitreous, hydrogen-free silica comprising the steps of forming an oxygen-containing, hydrogen-free gas stream having distributed therethrough a substance selected from the group consisting of silicon and oxidizable, vaporizable, hydrogen-free silicon compounds, said gas streambeing at a sufliciently high temperature to vaporize said substance and to oxidize the same under formation of silicaand to maintain the thus-formed silica at at least its fusing temperature; directing the thus-formed silica-containing gas including the step of recovering said body of fused, hydro-.
  • a method of producing a transparent body of vitreous, hydrogen-free silica as defined in claim .1, wherein said silica-containing gas stream at said sufliciently high temperature is producedby forming a stream comprising oxygen and said substance and being free of hydrogen;
  • a method of producing a transparent body of vitreous, hydrogen-free silica as defined in claim 1, wherein said silica-containing gas stream at said sufiiciently high temperature is produced by forming a hydrogen-free stream consisting essentially of oxygen, a hydrogen-free combustible gas and said substance, and causing com- 'busti-on of said combustible substance by reaction thereof with a portion only of said oxygen; and wherein the thermal energy produced by said combustion is augmented by passing the gas stream through an induction-coupled plasma torch.

Description

Sept. 27, 1956 J. A. WINTERBURN 3,275,408
METHODS FOR THE PRODUCTION OF VI'IREOUS SILICA Filed Jan. 6, 1964 v Attorney United States Patent 3,275,408 METHODS FOR THE PRODUCTION OF VITREOUS SILICA John Alexander Winterburn, Tynemouth, North Shields, Northumberland, England, assignor to The Thermal Syndicate Limited, Wallsend, Northumberland, England, a British company Filed Jan. 6, 1964, Ser. No. 335,848 Claims priority, application Great Britain, Jan. 29, 1963, 3,543/ 63 16 Claims. (Cl. 23-182) It is known that a mass of vitreous silica may be formed by applying finely divided silica to a body held at such a temperature that the silica particles are fused at the surface of the body. The silica can be in the form of grains of quartz sand, crushed quartz crystal or particles of chemically prepared silica. The heating can be done for example by flames, an electric are or electric resistance if the body conducts electricity.
Furthermore, it is known that a mass of vitreous silica may be formed by vaporising a hydrolysable compound of silicon into a flame of combustible gas and oxygen, so as to form a flame containing silica vapour and/ or finely comminuted silica, impinging or projecting the flame on to a heated body, in such a manner that a mass of transparent vitreous silica is built up upon the said body, the heat for the hydroysis of the silicon compound and fusion of the silica being provided by the aforesaid flame.
The mass of vitreous silica formed in the last mentioned manner can be made almost completely free from metallic and other impurities by selection of a suitable hydrolysable silicon compound and the resultant product has much greater transparency to ultraviolet radiation than vitreous silica made by fusing natural raw materials such as quartz crystal. However, a serious disadvantage of the material made in this way is that it can contain as much as 0.14% w./w. of hydroxyl groups, usually referred to as water and this results in undesirable absorption bands in the infrared at 1.4, 2.2 and 2.7 microns wave-lengths, rendering the material unsuitable for optical use in this part of the spectrum.
According to one feature of the present invention, a method of producing a transparent article of vitreous silica comprises vaporsing an oxidisable hydrogen-free compound of silicon into a high temperature gas stream which contains hydrogen-free elemental and/ or combined oxygen so that the compound of silicon is oxidised to form finely comminuted silica or silica vapour, impinging the gas stream on to a refractory target to deposit thereon a layer of silica which is virtified to a transparent body as fast as it is deposited by heat transfer from the gas stream.
We have discovered that by using an oxidisable compound of silicon free from hydrogen and introducing it into a flame free from hydrogen, for example an oxy-cyanogen or an oxy-carbon disulphide flame, it is possible to obtain vitreous silica which is substantially free from water and is thus freefrorn the undesirable absorption bands already refered to. The product produced by this method is thus comparable in this respect with that produced entirely by electrical fusion of quartz crystal or that obtained by a suitable refining treatment of a watercontaining material. Throughout this specification the terms free from hydrogen or hydrogen-free should be understood as including not only free from hydrogen gas but also free from hydrogen'containing compounds.
Most hydrogen-free combustible gases generate, with oxygen, a flame reaction which is not sufficiently exothermic to maintain the conditions required for both the oxidation of the silicon compound and the subsequent fusion of the silica produced. Carbon monoxide is one example of such a combustible gas. Any exothermic shortcoming of a flame can, however, be overcome by electric augmentation, that is the introduction of thermal energy into the flame by the utilisation of electrical energy. A first method of electric augmentation is through the use of a high frequency, high energy electrodeless plasma torch. A second method of electric augmentation is through the useof resistive heating of the flame itself by an electric current passing between two electrodes immersed in the flame. The latter method can use electric power from the mains, through a suitable step up transformer and control gear, but can also be made to function at any frequency from zero to many megacycles per second.
According to a further feature of this invention, therefore, a method of producing vitreous silica comprises the steps of supplying electrical energy to a gas stream formed from an oxidisable hydrogen-free silicon compound and oxygen or oxygen-containing gas free from hydrogen to provide a gas stream having a temperature sufficient to oxidise the silicon compound to silica, impinging the gas stream on a refractory target and collecting the silica so formed from the stream as a transparent vitreous mass.
The temperature of the gas stream may be high enough to form silica vapour or the temperature may be sufficient to form finely comminuted fused silica particles entrained in the stream.
The refractory target, or bait piece may be a piece of vitreous silica.
The gas stream may comprise a combustible hydrogenfree gas so that a proportion of the thermal energy re quired for the method is derived from the exothermic reaction between the combustible gas and oxygen. The silicon compound may be, for example, suitably purified silicon tetrachloride.
According to a still further feature of the present invention, a method of producing vitreous silica comprises passing a stream of oxygen or oxygen-containing gas free from hydrogen through an induction-coupled plasma torch, adding to the stream an oxidisable hydrogen-free silicon compound and collecting the silica oxidised from the silicon compound as a transparent vitreous mass on a bait piece.
The silicon compound may be added to the gas stream before or after the latter passes through the plasma torch.
The plasma torch may comprise a silica burner tube surrounded by an induction coil, and the stream of oxygen or oxygen-containing gas may be passed with the silicon compound through the tube and thereby subjected to the influence of a high frequency electric discharge generated along the axis of the coil.
By suitably adjusting the frequency and power input to the coil, a flame temperature in the plasma leaving the silica tube has been generated, which is suflicient to oxidise the silicon compound to silica and to cause the silica formed in this way to be deposited almost simultaneously on the bait piece.
Preferably, the gas stream, prior to the addition of the silicon compound contains 50 to v./v. of elemental oxygen.
The novel features which are considered as characteristic for the invention are set forth in particular in the appended claims. The invention itself, however, both as to its construction :and its method .of operation, together with additional objects and advantages thereof, will be best understood from the following description of specific embodiments when read in connection with the accompanying drawings, in which the figure is a sche- Patented Sept. 27, 1966 matic, elevational view of a device for carrying out the' method of the present invention.
Referring now to the drawing, it will be seen that the samerllustrates a plasma torch arrangement comprising, .a burner 1, surrounded by a four turn coil 5.. Reference numeral 4 illustrates an inlet for pure oxygen gas,
and reference numeral 3 an inlet for oxygen gas plus silicon tetrachloride.
The ball piece 6 issupported on a rotating stand 7 in a container 8.-
The following examples are given as illustrative only, without limiting the invention to the specific details of the examples.
Example 1 A stream of gas consisting of 3 parts by volume of oxygenand 2 parts by volume of argon is fed into a high frequency induction plasma torch schematically shown in the accompanying drawing, part of the oxygen stream having previously been saturated with silicon tetrachloride vapour at room temperature. The plasma torch comprises a burner'1 of, vitreous. silica surrounded by a four-turn coil fed with 15 kilowatts of electric power at a frequency of 12 megacycles per second. The electrical breakdown of the gas stream is initiated in the known manner and the tip of the resulting plasma of 1 diameter maintained 1 /2 away from a vitreous silica bait piece 6.-
W Very high purity silica resulting from the oxidation of the SlllCOIl tetrachloride is deposited as a transparent vitreous mass on the bait piece.
Example 2 A stream of oxygen gas saturated with silicon tetra- :chloride vapour at room temperature is fed into a high frequency induction plasma torch. The plasma torch consists of a burner of vitreous silica surrounded by a tightly coupled five-turn coil fed with 24 kilowatts of electric power at a frequency of megacycles per second. The electrical breakdown of the gas stream is initiated in the known manner and the tip of the resulting plasma of 1" diameter is maintained 3 inches away from a vitreous silica bait piece.
Very high purity silica resulting from the oxidation of the silicon tetrachloride is deposited on the silica bait piece as a transparent vitreous mass.
Example 3 phide in order to prevent condensation. The fiarne produced by the ignition of the gases is sufficiently hot both to oxidise the silicon tetrachloride to silica and to fuse the resultant silica to a transparent mass when a vitreous silica bait piece is placed in the flame.
Example 4 Two streams of oxygen gas, one saturated with silicon tetrachloride at room temperature and one passed over heated sodium chloride are fed to a vitreous silicaburner to which is also fed carbon monoxide. The flame produced by the ignition of the gases is sufiiciently hot to oxidise the silicon tetrachloride to silica but, not to fuse the product into a vitreous mass when a silica bait piece is placed in the flame. The burner used has two graphite.
tubes separated along the length of the flame and coaxial with it. When high voltage 50 c./s.' A.C. is applied between these electrodes current flows through the flame.
"and with a dissipation of 5 kva. the flame is sufficiently hot to fuse the silica produced in the flame-to a transparent vitreous mass.
In each of the above examples care is taken to ensure that the gases and the SiCl are hydrogen free. In parstream consisting essentially of an oxygen-containing gas, I
ticul-ar the gases are dried by refrigeration to remove all traces of moisture and the silicon tetrachloride is examined for freedom from hydrogen containing compounds such as trichlorosilane and methyl trichlorosilane.
The sodium chloride is required in order to increase. the conductivity of the flame, but the amount of this addition which appears in the, silica produced isnotsuflicicnt to have a deleterious etfecton its transmission.
Subsequent fashioning ofthe massof jvitreousgsilica produced by the method according to the inventiomand fabrication into useful articles are carried out by methods well known in the art.
What is claimed is:
1.A method of producing a transparent body of 'vitreous, hydrogen-free silica, comprising the steps of forming an oxygen-containing, hydrogen-free gas stream having distributed therethrough a substance selected from the group consisting of silicon and oxidizable, vaporizable, hydrogen-free silicon compounds, said gas streambeing at a sufliciently high temperature to vaporize said substance and to oxidize the same under formation of silicaand to maintain the thus-formed silica at at least its fusing temperature; directing the thus-formed silica-containing gas including the step of recovering said body of fused, hydro-.
gen firee, transparent, vitreous silica from said refractory support. 1
4. A method of producing a transparent body of vitreous, hydrogen-free silica, as defined in claim 1, wherein said silica-containing gas stream is formed by passing a stream of oxygen-containing gastree of hydrogen through an induction coupled plasma torch, and adding said substance to said stream.
5. A method of producing a transparent body of vitreous, hydrogen-free silica, as defined in claim .1, wherein said silica-containing gas stream at said sufliciently high temperature is producedby forming a stream comprising oxygen and said substance and being free of hydrogen;
and supplying electric energy to the thus produced stream so as to raise the temperature thereof to said sufliciently high temperature.
6. A method of producing a transparent body of vitreous, hydrogen-free silica, as defined in claim 1, wherein said silica-containing gas stream at said sufficiently high temperature is produced by forming a stream consisting essentially of an oxygen-containing gas and said substance and being free of hydrogen; and supplying electricenergy.
to the thus produced stream so as to raise the temperature thereof to said sufliciently high temperature.
7. A method of producing a transparent body ofxvitreous, hydrogen-free silica, as defined in claim 1, wherein said silica-containing. gas stream at said sufliciently high 7 temperature is produced by forming a hydrogen-free stream consisting essentially of oxygen, a hydrogen-free combustible gas and said substance, and causing combustion of saidcombustible substance by reaction thereof. 7
with a portion only of said oxygen; andwherein the ther-, mal energy produced by said combustion is augmented by passing an electric cur-rentthrough said stream.
,8. -A method of producing a transparent body of vitreous, hydrogen-free silica, as defined in claim 1, wherein said silica-containing gas streamat said sufiiciently high temperature is produced by forming .a hydrogen-free a hydrogen-free combustible gas and said substance, and
causing combustion of said combustible substance by 1'6."
action thereof with a portion only of said oxygen-com taining gas; and wherein the thermal energy produced by said combustion is augmented by passing an electric current through said stream.
9. A method of producing a transparent body of vitreous, hydrogen-free silica, as defined in claim 1, wherein said silica-containing gas stream at said sufiiciently high temperature is produced by forming a hydrogen-free stream consisting essentially of oxygen, a hydrogen-free combustible gas and said substance, and causing com- 'busti-on of said combustible substance by reaction thereof with a portion only of said oxygen; and wherein the thermal energy produced by said combustion is augmented by passing the gas stream through an induction-coupled plasma torch.
'10. A method of producing a transparent body of vitreoue, hydrogen-free silica, as defined in claim 1, wherein said silica-containing gas stream at said sufliciently high temperature is produced by forming a hydrogen-free stream consisting essentially of an oxygen-containing gas, a hydrogen-free combustible gas and said substance, and causing combustion of said combustible substance by reaction thereof with a portion only of said oxygen-containing gas; and wherein the thermal energy produced by said combustion is augmented by passing the gas stream through an induction-coupled plasma torch.
11. A method of producing a transparent body of vitreous, hydrogen-free silica, as defined in claim 1, wherein said oxygen-containing, hydrogen-free gas stream, prior to distribution of said substance therethro'ugh, contains between 50 and 100% by volume of elemental oxygen.
12. A method of producing a transparent body of vitreous, hydrogen-free silica, as defined in claim 1, wherein said gas stream contain-s elemental oxygen and said substance is vaporized into the same so as to form therein by reaction with said elemental oxygen finely comminuted silica, and wherein said gas stream is impinged onto a refractory support in such a manner as to deposit thereon a layer of silica which is vitrified to form a transparcut body as fast as it is deposited by heat transfer from said gas stream.
13. A method of producing a transparent body of vitreous, hydrogen-free silica, as defined in claim 12, wherein said sufiiciently high temperature is obtained by means of an oxy-carb-on disulphide flame.
14. A method of producing a transparent body of vitreous, hydrogen-free silica, as defined in claim 12, wherein said sufiiciently 'high temperature is obtained by means of an oxy-cyanogen flame.
15. A method of producing a transparent body of vitreous, hydrogen-free silica, as defined in claim 12, wherein said substance is silicon tetrachloride.
16. A method of producing .a transparent body of vitreous, hydrogen-free silica, as defined in claim 1, wherein said gas stream contains hydrogen-free combined oxygen and said substance is vaporized into the same so as to form silica therein by reaction with said oxygen, and wherein said gas stream is impinged onto .a refractory support in such a manner as to deposit thereon a layer of silica which is vitrified to form a transparent body as fast as is deposited by heat transfer from said gas stream.
References Cited by the Examiner UNITED STATES PATENTS 2,819,423 1/ l'958 Clark. 2,967,115 1/ 1961 Herrick. 3,004,137 10/1961 Karlovitz. 3,043,659 7/ 1962 Hughes et a1. 260765 XR OTHER REFERENCES Lowry, T. Martin, Inorganic Chemistry, second edition, pages 543 and 548, London, Macmillan and Company, Limited, 1931.
OSCAR R. V-ERTIZ, Primary Examiner.
BENJAMIN HENIQIN, Examiner.
H. S. MILLER, A. GREIF, Assistant Examiners.

Claims (1)

1. A METHOD OF PRODUCING A TRANSPARENT BODY OF VITREOUS, HYDROGEN-FREE SILICA, COMPRISING THE STEPS OF FROM ING AN OXYGEN-CONTAINING, HYDROGEN-FREE GAS STREAM HAVING DISTRIBUTED THERETHROUGH A SUBSTANCE SELECTED FROM THE GROUP CONSISTING OF SILICON AND OXIDIZABLE, VAPORIZALBE HYDROGEN-FREE SILICON COMPOUNDS, SAID GAS STREAM BEING AT A SUFFICIENTLY HIGH TEMPERATURE TO VAPORIZE SAID SUBSTANCE AND TO OXIDIZE THE SAME UNDER FORMATION OF SILICA AND TO MAINTAIN THE THUS-FORMED SILICA AT AT LEAST ITS FUSING TEMPERATURE; DIRECTING THE THUS-FORMED SILICA-CONTAINING GAS STREAM AGAINST A REFRACTORY SUPPORT SO AS TO IMPINGE THEREON AND TO DEPOSIT SAID SILICA ON THE SAME IN THE FORM OF A BODY OF FUSED, HYDROGEN-FREE, TRAMSPAENT, VITEROUS SILICA.
US335848A 1963-01-29 1964-01-06 Methods for the production of vitreous silica Expired - Lifetime US3275408A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB3543/63A GB1061042A (en) 1963-01-29 1963-01-29 Improvements in the methods for the production of vitreous silica

Publications (1)

Publication Number Publication Date
US3275408A true US3275408A (en) 1966-09-27

Family

ID=9760313

Family Applications (1)

Application Number Title Priority Date Filing Date
US335848A Expired - Lifetime US3275408A (en) 1963-01-29 1964-01-06 Methods for the production of vitreous silica

Country Status (6)

Country Link
US (1) US3275408A (en)
JP (1) JPS4816330B1 (en)
CH (1) CH477373A (en)
DE (1) DE1208740B (en)
GB (1) GB1061042A (en)
NL (2) NL6400714A (en)

Cited By (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3440092A (en) * 1964-11-20 1969-04-22 Owens Illinois Glass Co Art of producing metal salt impregnated silica-coated substrates
US3485666A (en) * 1964-05-08 1969-12-23 Int Standard Electric Corp Method of forming a silicon nitride coating
US3485591A (en) * 1965-02-15 1969-12-23 British Titan Products Preparation of pigmentary silicon carbide
US3503787A (en) * 1966-02-11 1970-03-31 United States Borax Chem Method of making refractory aluminum nitride coatings
US3533756A (en) * 1966-11-15 1970-10-13 Hercules Inc Solids arc reactor method
US3655438A (en) * 1969-10-20 1972-04-11 Int Standard Electric Corp Method of forming silicon oxide coatings in an electric discharge
US3658572A (en) * 1968-11-05 1972-04-25 Westinghouse Electric Corp Pyrolytic coatings of molybdenum sulfide by plasma jet technique
JPS4873522A (en) * 1972-01-03 1973-10-04
DE2328930A1 (en) * 1972-06-08 1974-01-03 Int Standard Electric Corp INTERNAL COATED GLASS TUBE AND METHOD FOR MANUFACTURING THE COATING
US3954431A (en) * 1974-09-26 1976-05-04 Bell Telephone Laboratories, Incorporated Optical glass and its production
US3966300A (en) * 1972-01-24 1976-06-29 Jenaer Glaswerk Schott & Gen. Light conducting fibers of quartz glass
US4054641A (en) * 1976-05-07 1977-10-18 John S. Pennish Method for making vitreous silica
US4083708A (en) * 1976-09-15 1978-04-11 Exxon Research & Engineering Co. Forming a glass on a substrate
US4102663A (en) * 1976-07-09 1978-07-25 Lothar Jung Method for manufacturing hollow and solid ingots
US4113844A (en) * 1975-11-20 1978-09-12 Komatsu Electronci Metals, Co., Ltd. Method of producing high-purity transparent vitreous silica body
US4162908A (en) * 1975-08-16 1979-07-31 Heraeus Quarzschmelze Gmbh Method of producing synthetic quartz glass, apparatus for the practice of the method, and use of the synthetic quartz glass
US4178165A (en) * 1976-07-09 1979-12-11 Lothar Jung Apparatus for manufacturing hollow and solid ingots
FR2447890A1 (en) * 1979-02-05 1980-08-29 Lyonnaise Transmiss Optiques Vitreous silica blanks made by CVD, for mfg. optical fibres - where different gas mixts. are fed into plasma burner to obtain parabolic gradient of refractive index across blank
US4221825A (en) * 1978-07-31 1980-09-09 Saint-Gobain Industries Continuous production of synthetic silica doped with fluorine
USRE30883E (en) * 1975-08-16 1982-03-16 Heraeus Quarzscmelze GmbH Method of producing synthetic quartz glass
FR2490205A1 (en) * 1980-09-12 1982-03-19 Western Electric Co PROCESS FOR REDUCING THE QUANTITY OF HYDROXYLATED IMPURITIES OF A LIQUID CHLORIDE, CHLORIDE OBTAINED BY THIS PROCESS AND APPLICATION OF THIS METHOD TO THE MANUFACTURE OF OPTICAL FIBERS
US4462974A (en) * 1981-08-19 1984-07-31 Hughes Aircraft Company Process for preparation of water-free oxide material
US4465656A (en) * 1981-08-19 1984-08-14 Hughes Aircraft Company Process for preparation of water-free oxide material
EP0127956A1 (en) * 1983-05-10 1984-12-12 Aetna Telecommunications Laboratories Method for manufacturing sinterable glass bodies
US5032193A (en) * 1986-01-21 1991-07-16 Energy Conversion Devices, Inc. Method of making synthetically engineered materials
FR2714371A1 (en) * 1993-12-24 1995-06-30 Cabloptic Sa Coating optical fibre preform by plasma deposition
US20020005051A1 (en) * 2000-04-28 2002-01-17 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
US20030148194A1 (en) * 2000-04-28 2003-08-07 Brown John T. Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks
WO2003078321A1 (en) * 2002-03-18 2003-09-25 Wacker-Chemie Gmbh Highly pure silica-powder, method and device for the production thereof
US20040187525A1 (en) * 2003-03-31 2004-09-30 Coffey Calvin T. Method and apparatus for making soot
US20050120752A1 (en) * 2001-04-11 2005-06-09 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
WO2005056486A2 (en) * 2003-12-11 2005-06-23 Wacker-Chemie Gmbh Device for the production of fused silica
DE102005018209A1 (en) * 2005-04-19 2006-10-26 Heraeus Tenevo Gmbh Method and device for producing a quartz glass body
US20080213591A1 (en) * 2005-03-09 2008-09-04 Degussa Gmbh Granules Based On Pyrogenically Prepared Silicon Dioxide, Method For Their Preparation And Use Thereof
US20110291333A1 (en) * 2006-06-28 2011-12-01 Werner Hartmann Method and device for introducing dust into a metal melt of a pyrometallurgical installation

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3711262A (en) * 1970-05-11 1973-01-16 Corning Glass Works Method of producing optical waveguide fibers
GB1391177A (en) * 1971-08-09 1975-04-16 Thermal Syndicate Ltd Vitreous siliceous material
JPS5025240A (en) * 1973-06-07 1975-03-17
JPS53101661A (en) * 1977-02-16 1978-09-05 Toyo Denso Kk Method of manufacturing laminated print coil plate
DE3330910A1 (en) * 1983-08-27 1985-03-07 Philips Patentverwaltung Gmbh, 2000 Hamburg METHOD FOR PRODUCING A REACTION TUBE FOR CRYSTAL GROWING PURPOSES
US4733939A (en) * 1984-08-18 1988-03-29 Mitsubishi Metal Co., Radiation-resistant optical conductor
CH665202A5 (en) * 1985-01-03 1988-04-29 Troitsky Vladimir N METHOD FOR PRODUCING FINE DISPERSIVE SILICON DIOXIDE.
DE10035951C2 (en) * 2000-07-21 2002-06-27 Heraeus Quarzglas Process for producing a component for the production of optical fibers, and use of the component

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2819423A (en) * 1957-03-11 1958-01-07 Gen Electric Plasma transmitter
US2967115A (en) * 1958-07-25 1961-01-03 Gen Electric Method of depositing silicon on a silica coated substrate
US3004137A (en) * 1960-06-07 1961-10-10 Comb And Explosives Res Inc Method and apparatus for the production of high gas temperatures
US3043659A (en) * 1955-07-25 1962-07-10 British Titan Products Process for the production of purified silicon dioxide

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3043659A (en) * 1955-07-25 1962-07-10 British Titan Products Process for the production of purified silicon dioxide
US2819423A (en) * 1957-03-11 1958-01-07 Gen Electric Plasma transmitter
US2967115A (en) * 1958-07-25 1961-01-03 Gen Electric Method of depositing silicon on a silica coated substrate
US3004137A (en) * 1960-06-07 1961-10-10 Comb And Explosives Res Inc Method and apparatus for the production of high gas temperatures

Cited By (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3485666A (en) * 1964-05-08 1969-12-23 Int Standard Electric Corp Method of forming a silicon nitride coating
US3440092A (en) * 1964-11-20 1969-04-22 Owens Illinois Glass Co Art of producing metal salt impregnated silica-coated substrates
US3485591A (en) * 1965-02-15 1969-12-23 British Titan Products Preparation of pigmentary silicon carbide
US3503787A (en) * 1966-02-11 1970-03-31 United States Borax Chem Method of making refractory aluminum nitride coatings
US3533756A (en) * 1966-11-15 1970-10-13 Hercules Inc Solids arc reactor method
US3658572A (en) * 1968-11-05 1972-04-25 Westinghouse Electric Corp Pyrolytic coatings of molybdenum sulfide by plasma jet technique
US3655438A (en) * 1969-10-20 1972-04-11 Int Standard Electric Corp Method of forming silicon oxide coatings in an electric discharge
JPS4873522A (en) * 1972-01-03 1973-10-04
JPS5312608B2 (en) * 1972-01-03 1978-05-02
US3966300A (en) * 1972-01-24 1976-06-29 Jenaer Glaswerk Schott & Gen. Light conducting fibers of quartz glass
DE2328930A1 (en) * 1972-06-08 1974-01-03 Int Standard Electric Corp INTERNAL COATED GLASS TUBE AND METHOD FOR MANUFACTURING THE COATING
US3954431A (en) * 1974-09-26 1976-05-04 Bell Telephone Laboratories, Incorporated Optical glass and its production
US4162908A (en) * 1975-08-16 1979-07-31 Heraeus Quarzschmelze Gmbh Method of producing synthetic quartz glass, apparatus for the practice of the method, and use of the synthetic quartz glass
USRE30883E (en) * 1975-08-16 1982-03-16 Heraeus Quarzscmelze GmbH Method of producing synthetic quartz glass
US4113844A (en) * 1975-11-20 1978-09-12 Komatsu Electronci Metals, Co., Ltd. Method of producing high-purity transparent vitreous silica body
US4054641A (en) * 1976-05-07 1977-10-18 John S. Pennish Method for making vitreous silica
US4123229A (en) * 1976-05-07 1978-10-31 John S. Pennish Method and apparatus for making vitreous silica
US4102663A (en) * 1976-07-09 1978-07-25 Lothar Jung Method for manufacturing hollow and solid ingots
US4178165A (en) * 1976-07-09 1979-12-11 Lothar Jung Apparatus for manufacturing hollow and solid ingots
US4083708A (en) * 1976-09-15 1978-04-11 Exxon Research & Engineering Co. Forming a glass on a substrate
US4221825A (en) * 1978-07-31 1980-09-09 Saint-Gobain Industries Continuous production of synthetic silica doped with fluorine
FR2447890A1 (en) * 1979-02-05 1980-08-29 Lyonnaise Transmiss Optiques Vitreous silica blanks made by CVD, for mfg. optical fibres - where different gas mixts. are fed into plasma burner to obtain parabolic gradient of refractive index across blank
FR2490205A1 (en) * 1980-09-12 1982-03-19 Western Electric Co PROCESS FOR REDUCING THE QUANTITY OF HYDROXYLATED IMPURITIES OF A LIQUID CHLORIDE, CHLORIDE OBTAINED BY THIS PROCESS AND APPLICATION OF THIS METHOD TO THE MANUFACTURE OF OPTICAL FIBERS
US4465656A (en) * 1981-08-19 1984-08-14 Hughes Aircraft Company Process for preparation of water-free oxide material
US4462974A (en) * 1981-08-19 1984-07-31 Hughes Aircraft Company Process for preparation of water-free oxide material
EP0127956A1 (en) * 1983-05-10 1984-12-12 Aetna Telecommunications Laboratories Method for manufacturing sinterable glass bodies
US5032193A (en) * 1986-01-21 1991-07-16 Energy Conversion Devices, Inc. Method of making synthetically engineered materials
FR2714371A1 (en) * 1993-12-24 1995-06-30 Cabloptic Sa Coating optical fibre preform by plasma deposition
US20020005051A1 (en) * 2000-04-28 2002-01-17 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
US20030148194A1 (en) * 2000-04-28 2003-08-07 Brown John T. Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks
US7089766B2 (en) * 2000-04-28 2006-08-15 Corning Inc Method of forming optical fiber preforms
US6817211B2 (en) * 2000-04-28 2004-11-16 Corning Incorporated Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks
US20050120752A1 (en) * 2001-04-11 2005-06-09 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
WO2003078321A1 (en) * 2002-03-18 2003-09-25 Wacker-Chemie Gmbh Highly pure silica-powder, method and device for the production thereof
US20050129603A1 (en) * 2002-03-18 2005-06-16 Wacker-Chemie Gmbh High-purity silica powder, and process and apparatus for producing it
WO2004094323A1 (en) * 2003-03-31 2004-11-04 Corning Incorporated A method and apparatus for making silica soot by vapor oxidation
US20040206127A1 (en) * 2003-03-31 2004-10-21 Coffey Calvin T. Method and apparatus for making soot
US20040187525A1 (en) * 2003-03-31 2004-09-30 Coffey Calvin T. Method and apparatus for making soot
WO2005056486A2 (en) * 2003-12-11 2005-06-23 Wacker-Chemie Gmbh Device for the production of fused silica
WO2005056486A3 (en) * 2003-12-11 2005-10-06 Wacker Chemie Gmbh Device for the production of fused silica
US20080213591A1 (en) * 2005-03-09 2008-09-04 Degussa Gmbh Granules Based On Pyrogenically Prepared Silicon Dioxide, Method For Their Preparation And Use Thereof
US7780937B2 (en) 2005-03-09 2010-08-24 Evonik Degussa Gmbh Granules based on pyrogenically prepared silicon dioxide, method for their preparation and use thereof
DE102005018209A1 (en) * 2005-04-19 2006-10-26 Heraeus Tenevo Gmbh Method and device for producing a quartz glass body
DE102005018209B4 (en) * 2005-04-19 2007-08-30 Heraeus Tenevo Gmbh Apparatus and method for producing a quartz glass body
US20110291333A1 (en) * 2006-06-28 2011-12-01 Werner Hartmann Method and device for introducing dust into a metal melt of a pyrometallurgical installation
US8524145B2 (en) * 2006-06-28 2013-09-03 Siemens Aktiengesellschaft Method and device for introducing dust into a metal melt of a pyrometallurgical installation

Also Published As

Publication number Publication date
NL128054C (en)
GB1061042A (en) 1967-03-08
NL6400714A (en) 1964-07-30
JPS4816330B1 (en) 1973-05-21
CH477373A (en) 1969-08-31
DE1208740B (en) 1966-01-13

Similar Documents

Publication Publication Date Title
US3275408A (en) Methods for the production of vitreous silica
CA1080562A (en) Method of and apparatus for manufacturing an optical fibre with plasma activated deposition in a tube
US3764286A (en) Manufacture of elongated fused quartz member
JPS6038345B2 (en) Manufacturing method of glass material for optical transmission
US4125389A (en) Method for manufacturing an optical fibre with plasma activated deposition in a tube
US4419118A (en) Quartz glass and a process for making same
CA1258206A (en) Method and apparatus for forming doped optical preforms
JPS5717433A (en) Dehydrating and sintering method for porous base material for optical fiber with low loss
JPS6090836A (en) Manufacture of synthetic quartz
JPS6311541A (en) Plasma torch and production of glass base material for optical fiber by using said plasma torch
JPS569230A (en) Manufacture of high purity quartz glass pipe
JP3417962B2 (en) Manufacturing method of synthetic quartz glass member
JPS649831A (en) Production of preform for optical fiber
JPS58148427A (en) Quartz glass core tube for manufacture of semiconductor
JPS5542268A (en) Production of high purity glass
JPH0583497B2 (en)
JPH0218333A (en) Heat treatment of porous base material
JPS5854097B2 (en) Manufacturing method of optical fiber base material
JPS5855087B2 (en) Method for manufacturing base material for optical fiber
JPS5843335B2 (en) Seizouhou
JPS6210942B2 (en)
JPS6054937A (en) Manufacture of preform rod
JPS6036320A (en) Preparation of fine powder of silicic acid
JPH01203238A (en) Production of optical fiber preform
JPS62182128A (en) Production of optical fiber preform