US3172734A - warren - Google Patents
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- US3172734A US3172734A US3172734DA US3172734A US 3172734 A US3172734 A US 3172734A US 3172734D A US3172734D A US 3172734DA US 3172734 A US3172734 A US 3172734A
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- crucible
- coil
- silicon
- zone
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- 239000000463 material Substances 0.000 claims description 34
- 238000010438 heat treatment Methods 0.000 claims description 8
- 239000012530 fluid Substances 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 24
- 229910052710 silicon Inorganic materials 0.000 description 24
- 239000010703 silicon Substances 0.000 description 24
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 11
- 239000002184 metal Substances 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- 229910052709 silver Inorganic materials 0.000 description 8
- 239000004332 silver Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 238000007670 refining Methods 0.000 description 7
- 239000012535 impurity Substances 0.000 description 6
- 238000002844 melting Methods 0.000 description 6
- 230000008018 melting Effects 0.000 description 6
- 229910052732 germanium Inorganic materials 0.000 description 5
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 230000006698 induction Effects 0.000 description 4
- 239000012809 cooling fluid Substances 0.000 description 3
- 239000000498 cooling water Substances 0.000 description 3
- 230000005672 electromagnetic field Effects 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000005266 casting Methods 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000110 cooling liquid Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 239000011796 hollow space material Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- XEBWQGVWTUSTLN-UHFFFAOYSA-M phenylmercury acetate Chemical compound CC(=O)O[Hg]C1=CC=CC=C1 XEBWQGVWTUSTLN-UHFFFAOYSA-M 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/02—Induction heating
- H05B6/22—Furnaces without an endless core
- H05B6/32—Arrangements for simultaneous levitation and heating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J6/00—Heat treatments such as Calcining; Fusing ; Pyrolysis
- B01J6/005—Fusing
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/029—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B35/00—Boron; Compounds thereof
- C01B35/02—Boron; Borides
- C01B35/023—Boron
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/10—Obtaining titanium, zirconium or hafnium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B4/00—Electrothermal treatment of ores or metallurgical products for obtaining metals or alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B41/00—Obtaining germanium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B60/00—Obtaining metals of atomic number 87 or higher, i.e. radioactive metals
- C22B60/02—Obtaining thorium, uranium, or other actinides
- C22B60/0204—Obtaining thorium, uranium, or other actinides obtaining uranium
- C22B60/0286—Obtaining thorium, uranium, or other actinides obtaining uranium refining, melting, remelting, working up uranium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
- C22B9/02—Refining by liquating, filtering, centrifuging, distilling, or supersonic wave action including acoustic waves
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/14—Crucibles or vessels
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
- C30B13/18—Heating of the molten zone the heating element being in contact with, or immersed in, the molten zone
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
- C30B13/20—Heating of the molten zone by induction, e.g. hot wire technique
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/14—Heating of the melt or the crystallised materials
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B3/00—Hearth-type furnaces, e.g. of reverberatory type; Tank furnaces
- F27B3/08—Hearth-type furnaces, e.g. of reverberatory type; Tank furnaces heated electrically, with or without any other source of heat
- F27B3/085—Arc furnaces
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/25—Process efficiency
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10S117/90—Apparatus characterized by composition or treatment thereof, e.g. surface finish, surface coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1076—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone
- Y10T117/108—Including a solid member other than seed or product contacting the liquid [e.g., crucible, immersed heating element]
Definitions
- a molten zone may be caused to traverse the length of the crucible.
- silicon or germanium in the form of granules or powder may be consolidated into the form of a rod.
- a rod of silicon or germanium may be refined in a similar way care being taken to observe the limitations in the width of the zone for impurities to be driven to the ends of the rod.
- the invention has been found to be highly successful in the treatment of silicon. It has been found that, although silicon very readily absorbs impurities when in the molten condition, no contamination of silicon occurs in the practice of the present invention.
- the metals copper, silver and gold are chosen for the material of the crucible because each of these metals has high electrical and thermal conductivity and does not react with the material being treated; silver is preferred because its electrical and also thermal conductivities are the highest of the three and because it can be most readily polished to reflect heat optically into the melt.
- FIG. 1 is a side view of one embodiment of apparatus according to the invention.
- FIG. 2 is a cross sectional view on the line 11 of FIG. 1, and in conjunction with the accompanying drawings in which:
- FIG. 4 is a cross sectional view of the line AA of FIG. 3.
- FIG. 5 is a diagrammatic view illustrating one manner of operation of the apparatus.
- the crucible should be so located with respect to the heating coil that the silicon lies below the centre of the coil and the reaction between the electromagnetic field of coil A and the field clue to currents induced in the wall of the crucible immediately adjacent to the silicon with the field induced in the molten zone of silicon lifts that zone upwards in the drawing.
- the crucible 1 It is convenient to place the crucible 1 within a tube 5 made of silica in order that the material in the crucible can be surrounded by a protective atmosphere, the induction heater 4 being exterior to the tube 5. The crucible 1 is then pushed or pulled, by means described later, so that the full length of the crucible 1 passes the coil 4.
- a protective gas such as argon is circulated through the silca tube 5 by flexible hose 18.
- the platform 10 carrying the crucible 1 within the protective gas atmosphere may be traversed past a stationary heating coil 4 to carry out the process of zone refining at any speed found necessary or desirable and by reversing the direction of rotation of the motor 16 passes of the silicon 7 may be given in alternate directions.
- Apparatus for processing fusible material comprising an open elongated hollow walled vessel of a substantially pure metal of high electrical and thermal conductivity which is substantially non-reactive with the material being treated, means for circulating cooling fluid through the hollow walls of said crucible, a heating coil surrounding a portion of said vessel, means for passing through said coil alternating current of such value as to melt a limited zone of said fusible material and means for causing relative movement between said coil and said crucible to melt successive limited zones of said material.
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Environmental & Geological Engineering (AREA)
- Geology (AREA)
- Electromagnetism (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Acoustics & Sound (AREA)
- Thermal Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Geochemistry & Mineralogy (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Silicon Compounds (AREA)
Description
March 9, 1965 R. w. WARREN 3,172,734
WATER COOLED CRUCIBLE FOR ZONE REFINING Filed Jan. 10, 1958 2 Sheets-Sheet l 3 I FIG. 3. l I 2 I 0 O -o v o 4 F/G.
F 6 A 0 00 oo A "am e y March 9, 1965 R. w. WARREN 3,172,734
WATER COOLED CRUCIBLE FOR ZONE REFINING Filed Jan. 10, 1958 2 Sheets-Sheet 2 72. W. Warren y Kb I Atlor ney United States Patent 3,172,734 WATER COOLED CRUCIBLE FOR ZONE REFINING Reginald Walter Warren, London, England, assiguor to International Standard Electric Corporation, New York, N.Y., a corporation of Delaware Filed Jan. 10, 1958, Ser. No. 708,100 Claims priority, application Great Britain, Mar. 7, 1957, 7,540/57 4 Claims. (Cl. 23-273) This invention relates to a method and apparatus for processing fusible material. The invention is particularly applicable to the processing of semiconductor material such as germanium or silicon.
The processing of semi-conductor material involves melting the material. For example, zone refining of germanium or silicon is carried out by passing a molten zone of the material from one end of a rod to another. It may be required to consolidate germanium or silicon in the form of small lumps or powder into a coherent rod by melting the lumps or powder and casting the material into the form of a rod so that the process of zone refining may be carried out on the rod.
In any process involving melting of semi-conductor material care must be exercised in the choice of the material for the crucible in which melting takes place. This is for the reason that very small quantities of impurities in semiconductor material cause large changes in the properties thereof, and hence it is important that no impurities should be introduced into the material from the crucible. Silicon, in particular, is very liable to contamination when in the molten condition. Hitherto crucibles for the treatment of germanium or silicon in the molten condition have been made of purified graphite or silica. It is, however, very difficult to ensure that graphite or quartz crucibles are entirely free from impurities.
According to the present invention a crucible for processing fusible material is made of metal of high electrical and thermal conductivity and in the form of a hollow walled vessel, fluid being circulated through the hollow walls for cooling purposes. A work coil for inducing eddy currents surrounds at least a portion of said crucible and the current through said coil is made of sufficient magnitude to melt the said material. 5
A molten zone may be caused to traverse the length of the crucible. In this way silicon or germanium in the form of granules or powder may be consolidated into the form of a rod. A rod of silicon or germanium may be refined in a similar way care being taken to observe the limitations in the width of the zone for impurities to be driven to the ends of the rod. The invention has been found to be highly successful in the treatment of silicon. It has been found that, although silicon very readily absorbs impurities when in the molten condition, no contamination of silicon occurs in the practice of the present invention.
The metals copper, silver and gold are chosen for the material of the crucible because each of these metals has high electrical and thermal conductivity and does not react with the material being treated; silver is preferred because its electrical and also thermal conductivities are the highest of the three and because it can be most readily polished to reflect heat optically into the melt. 65
One way of making the crucible is to start with a hol low cylinder of silver and to beat it into the shape of a boat. Practical tests with silver have shown that molten silicon does not wet silver and does not pick up impurities therefrom. Copper and gold may, however, be used.
The invention will be better understood from the fol- 'ice lowing description of embodiments thereof taken in conjunction with the accompanying drawings, in which:
FIG. 1 is a side view of one embodiment of apparatus according to the invention.
FIG. 2 is a cross sectional view on the line 11 of FIG. 1, and in conjunction with the accompanying drawings in which:
FIG. 3 is a plan view of another embodiment, with part shown in section.
FIG. 4 is a cross sectional view of the line AA of FIG. 3.
FIG. 5 is a diagrammatic view illustrating one manner of operation of the apparatus.
Referring to the drawings and first to FIGS. 1 and 2, a crucible C of silver has in cross-section the form of a hollow half torus, through which cooling water F is circulated by pipes D and E. Silicon B to be zone refined is contained within the crucible C. High frequency heating coils A are placed around the crucible in the places shown in FIG. 1.
As silicon is of very high resistivity when at room temperature a susceptor (not shown) is initially placed in a position adjacent to one of the coils A and heats the silicon B by radiant heat to a temperature suflicient to reduce its resistivity to an extent to allow eddy currents to be induced therein. This preheater is then removed. The current in the heating coil A may be adjusted so that the electromagnetic field resulting therefrom and from currents induced in the metal of the crucible C react with the currents induced in a molten zone of the material B in such manner as to raise such molten zone away from contact with the metal of the crucible. For this purpose the crucible should be so located with respect to the heating coil that the silicon lies below the centre of the coil and the reaction between the electromagnetic field of coil A and the field clue to currents induced in the wall of the crucible immediately adjacent to the silicon with the field induced in the molten zone of silicon lifts that zone upwards in the drawing.
This arrangement leads to economy in the power needed by reducing heat loss from the molten zone to the metal of the crucible.
Preferably the heat treatment is carried out in an atmosphere of a protective gas such as argon and the crucible C is therefore contained in a chamber in which such protective atmosphere can be maintained.
In the apparatus shown in FIGS. 3 and 4 the crucible 1 is formed from a hollow cylinder of silver having copper rings 2 welded on its ends. The copper rings 2 are closed at one end of each except for apertures communicating with copper pipes 3. The dimensions of one tube 1 which has been used successfully are: length between copper end pieces 15 inches, diameter 1% inches. The crucible is formed by pressing into the shape shown in the drawings the maximum depth of the depression formed being a little over half an inch. In operation cooling water is circulated through the hollow space below the depression. An induction heater 4 consisting of hollow copper tubes wound in a coil surrounds a part of the crucible 1. Cooling liquid may then be circulated through these hollow copper tubes. It is convenient to place the crucible 1 within a tube 5 made of silica in order that the material in the crucible can be surrounded by a protective atmosphere, the induction heater 4 being exterior to the tube 5. The crucible 1 is then pushed or pulled, by means described later, so that the full length of the crucible 1 passes the coil 4.
The apparatus shown in FIGS. 3 and 4 has been found to be particularly suitable in the zone refining of silicon. As silicon is of extremely high resistance when cold it is difficult to induce currents therein. Initially therefore susceptor rings 6 are placed in the neighbourhood of coil 3 4 and are heated by induction from the: coil 4. Radiant heat from the rings 6 then raises the temperature of the silicon sufliciently to lower its resistance and sufiicient eddy currents are then induced therein to melt the silicon in a limited zone immediately within the coil 4. The susceptor rings 6 are then moved away.
The temperature gradient on either side of the limited molten zone is very sharp since the silicon is cooled by the circulation of water through the hollow crucible Walls. The temperature gradient does, however, permit of the molten zone being progressively traversed along a rod of silicon lying in the crucible, the material immediately ahead of the molten zone in the direction of movement being of sufiiciently high temperature to have currents induced therein when this material reaches the centre of the coil.
One means for causing the traversal of the molten zone is shown diagrammatically in FIG. 5.
In this figure silicon 7 is shown contained within a crucible 1 of the kind above described. The copper pipes 3 pass through the center of tubular supports 8 secured to end plates 9. A silica tube surrounds the crucible 1 and is secured to the end plates 9 in gas tight manner. End plates 9 are mounted on a platform 10 which is in turn supported on wheels 11 running on a track 12. Depending from platform 10 is a nut 13 engaged by a lead screw 14 rotatable through gearing 15 from a motor 16. Flexible hose 17 serves to circulate cooling water via copper pipes 3 through the hollow Walls of crucible 1.
A protective gas, such as argon is circulated through the silca tube 5 by flexible hose 18. By adjusting the speed of the motor 16 the platform 10 carrying the crucible 1 within the protective gas atmosphere may be traversed past a stationary heating coil 4 to carry out the process of zone refining at any speed found necessary or desirable and by reversing the direction of rotation of the motor 16 passes of the silicon 7 may be given in alternate directions.
While the principles of the invention have been described above in connection with specific embodiments, and particular modifications thereof, it is to be clearly understood that this description is made only by way of example and not as a limitation on the scope of the invention.
What I claim is:
1. Apparatus for processing fusible material comprising an open elongated hollow walled vessel of a substantially pure metal of high electrical and thermal conductivity which is substantially non-reactive with the material being treated, means for circulating cooling fluid through the hollow walls of said crucible, a heating coil surrounding a portion of said vessel, means for passing through said coil alternating current of such value as to melt a limited zone of said fusible material and means for causing relative movement between said coil and said crucible to melt successive limited zones of said material.
2. Apparatus for zone refining an elongated body of semi-conductor material comprising an open elongated hollow walled crucible for containing said body, said crucible being made of a substantially pure metal of high electrical and thermal conductivity which is substantially non-reactive with said semi-conductor material, means for circulating cooling fluid through the hollow walls of said crucible, an induction heating coil surrounding a portion of said crucible, means for passing alternating current through said coil of such frequency and power as to induce suiiicient current in a limited zone of said body as to melt the material in said zone and means for causing such relativ movement between said body and said coil that said molten zone traverses at least a portion of the length of said body.
3. Apparatus as claimed in claim 2 in which said coil is placed around the crucible with the center above the center of said material so that the electromagnetic fields of the currents in said coil and those induced in the metal of the crucible tend ot lift the material in the molten zone out of contact with said crucible.
4. Apparatus for processing a fusible material comprising a crucible of substantially pure metal from the group consisting of copper, silver and gold, for containing said fusible material in contact therewith said crucible being in the form of a hollow walled vessel, means for circulating a cooling fluid through said hollow walls to maintain said crucible below its melting point and below the melting point of said fusible material and means for inducing currents in said crucible and in at least a part of the fusible material contained therein suflicient to melt said fusible material through a cross sectional zone.
References Cited by the Examiner UNITED STATES PATENTS 2,686,865 8/54 Kelly 23273 2,719,799 10/55 Christian 148l.6 2,768,074 10/56 Staugger 23223.5 2,785,058 3/57 Buehler 23-301 2,836,412 5/58 Krieger 266--39 2,870,309 1/59 Capita 23301 2,872,299 2/59 Celmer 23-301 2,880,117 3/59 Hamlet 2330l 2,897,329 7/59 Matare 23-301 OTHER REFERENCES Pfann: Transistor Technology, Bell Tel. Lab. Inc. and Western Electric Sp., 1952, pp. 44 to 54.
NORMAN YUDKOFF, Primary Examiner.
MAURICE A. BRINDISI, GEORGE D. MITCHELL,
Examiners.
Claims (1)
1. APPARATUS FOR PROCESSING FUSIBLE MATERIAL COMPRISING AN OPEN ELONGATED HOLLOW WALLED VESSEL OF SUBSTANTIALLY PURE METAL OF HIGH ELECTRICAL AND THERMAL CONDUCTIVITY WHICH IS SUBSTANTIALLY NON-REACTIVE WITH THE MATERIAL BEING TREATED, MEANS FOR CIRCULATING COLLING FLUID THROUGH THE HOLLOW WALLS OF SAID CRUCIBLE, A HEATING COIL SURROUNDING A PORTION OF SAID VESSEL, MEANS FOR PASSING THROUGH SAID COIL ALTERNATING CURRENT OF SUCH VALUE AS TO MELT A LIMITED ZONE OF SAID FUSIBLE MATERIAL AND MEANS FOR CAUSING RELATIVE MOVEMENT BETWEEN SAID COIL AND SAID CRUCIBLE TO MELT SUCCESSIVE LIMITED ZONES OF SAID MATERIAL.
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB7540/57A GB827676A (en) | 1957-03-07 | 1957-03-07 | Method and apparatus for heat treating semi-conductor material |
GB3627257A GB871156A (en) | 1957-11-21 | 1957-11-21 | Improvements in or relating to growing monocrystals of semiconductor material |
GB37764/57A GB889615A (en) | 1957-03-07 | 1957-12-04 | Method and apparatus for processing metals |
GB829558A GB871157A (en) | 1958-03-14 | 1958-03-14 | Improvements in or relating to apparatus for processing fusible materials |
GB949458A GB875592A (en) | 1958-03-25 | 1958-03-25 | Improvements in or relating to methods and apparatus for melting materials |
GB18772/58A GB899287A (en) | 1958-06-12 | 1958-06-12 | Method and apparatus for heat treating fusible material |
Publications (1)
Publication Number | Publication Date |
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US3172734A true US3172734A (en) | 1965-03-09 |
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Family Applications (1)
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US3172734D Expired - Lifetime US3172734A (en) | 1957-03-07 | warren |
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BE (1) | BE565404A (en) |
CH (3) | CH385794A (en) |
DE (4) | DE1164982B (en) |
FR (1) | FR1192712A (en) |
GB (1) | GB889615A (en) |
NL (7) | NL233434A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3796548A (en) * | 1971-09-13 | 1974-03-12 | Ibm | Boat structure in an apparatus for making semiconductor compound single crystals |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2512066B1 (en) * | 1981-09-03 | 1986-05-16 | Cogema | METHOD FOR THE PHYSICAL SEPARATION OF A METAL PHASE AND SLAGS IN AN INDUCTION OVEN |
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US2719799A (en) * | 1952-11-13 | 1955-10-04 | Rca Corp | Zone melting furnace and method of zone melting |
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DE518499C (en) * | 1926-11-02 | 1931-02-16 | Siemens & Halske Akt Ges | Process for melting refractory metals, in particular tantalum, tungsten, thorium or alloys of these metals in a water-cooled container |
DE536300C (en) * | 1929-09-04 | 1931-10-22 | Hirsch Kupfer Und Messingwerke | Method and device for operating electric induction ovens |
DE903266C (en) * | 1941-04-05 | 1954-02-04 | Aeg | Electric induction furnace for melting magnesium and its alloys |
US2541764A (en) * | 1948-04-15 | 1951-02-13 | Battelle Development Corp | Electric apparatus for melting refractory metals |
BE510303A (en) * | 1951-11-16 | |||
DE968582C (en) * | 1952-08-07 | 1958-03-06 | Telefunken Gmbh | Process for the preparation of a melt of a material which is semiconducting at ordinary temperature |
GB734973A (en) * | 1953-04-30 | 1955-08-10 | Gen Electric Co Ltd | Improvements in or relating to fractional fusion methods |
BE528916A (en) * | 1953-05-18 | |||
DE975708C (en) * | 1953-08-12 | 1962-06-14 | Standard Elek K Lorenz Ag | Evaporator for the evaporation of metals, especially in a high vacuum |
DE1007885B (en) * | 1955-07-28 | 1957-05-09 | Siemens Ag | Heating arrangement for semiconductor crystal pulling devices, which preferably work according to the melt zone process |
-
0
- NL NL236919D patent/NL236919A/xx unknown
- NL NL237042D patent/NL237042A/xx unknown
- NL NL239559D patent/NL239559A/xx unknown
- NL NL225605D patent/NL225605A/xx unknown
- NL NL113928D patent/NL113928C/xx active
- NL NL114078D patent/NL114078C/xx active
- NL NL233434D patent/NL233434A/xx unknown
- US US3172734D patent/US3172734A/en not_active Expired - Lifetime
-
1957
- 1957-12-04 GB GB37764/57A patent/GB889615A/en not_active Expired
-
1958
- 1958-02-15 CH CH5587358A patent/CH385794A/en unknown
- 1958-03-04 DE DEI14490A patent/DE1164982B/en active Pending
- 1958-03-05 FR FR1192712D patent/FR1192712A/en not_active Expired
- 1958-03-05 BE BE565404D patent/BE565404A/xx unknown
- 1958-11-17 CH CH6623558A patent/CH416572A/en unknown
- 1958-11-24 DE DEI15671A patent/DE1191970B/en active Pending
- 1958-11-27 CH CH6663958A patent/CH435757A/en unknown
-
1959
- 1959-03-12 DE DEI16140A patent/DE1293934B/en active Pending
- 1959-06-10 DE DEI16553A patent/DE1226539B/en active Pending
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US2768074A (en) * | 1949-09-24 | 1956-10-23 | Nat Res Corp | Method of producing metals by decomposition of halides |
US2686865A (en) * | 1951-10-20 | 1954-08-17 | Westinghouse Electric Corp | Stabilizing molten material during magnetic levitation and heating thereof |
US2785058A (en) * | 1952-04-28 | 1957-03-12 | Bell Telephone Labor Inc | Method of growing quartz crystals |
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Also Published As
Publication number | Publication date |
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CH416572A (en) | 1966-07-15 |
NL237042A (en) | 1900-01-01 |
DE1191970B (en) | 1965-04-29 |
DE1226539B (en) | 1966-10-13 |
NL113928C (en) | 1900-01-01 |
NL225605A (en) | 1900-01-01 |
FR1192712A (en) | 1959-10-28 |
GB889615A (en) | 1962-02-21 |
DE1164982B (en) | 1964-03-12 |
NL236919A (en) | 1900-01-01 |
NL114078C (en) | 1900-01-01 |
CH385794A (en) | 1964-12-31 |
NL239559A (en) | 1900-01-01 |
DE1293934B (en) | 1969-04-30 |
CH435757A (en) | 1967-05-15 |
BE565404A (en) | 1958-09-05 |
NL233434A (en) | 1900-01-01 |
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