US2856556A - Electron discharge device - Google Patents

Electron discharge device Download PDF

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Publication number
US2856556A
US2856556A US463655A US46365554A US2856556A US 2856556 A US2856556 A US 2856556A US 463655 A US463655 A US 463655A US 46365554 A US46365554 A US 46365554A US 2856556 A US2856556 A US 2856556A
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Prior art keywords
electron discharge
grid
discharge device
cavity
envelope
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US463655A
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Thomas D Fentress
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Bendix Aviation Corp
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Bendix Aviation Corp
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Priority to US463655A priority Critical patent/US2856556A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J25/00Transit-time tubes, e.g. klystrons, travelling-wave tubes, magnetrons
    • H01J25/02Tubes with electron stream modulated in velocity or density in a modulator zone and thereafter giving up energy in an inducing zone, the zones being associated with one or more resonators
    • H01J25/22Reflex klystrons, i.e. tubes having one or more resonators, with a single reflection of the electron stream, and in which the stream is modulated mainly by velocity in the modulator zone
    • H01J25/24Reflex klystrons, i.e. tubes having one or more resonators, with a single reflection of the electron stream, and in which the stream is modulated mainly by velocity in the modulator zone in which the electron stream is in the axis of the resonator or resonators and is pencil-like before reflection

Definitions

  • the present invention relates to high frequency structure and more particularly to electron discharge devices embodying such structure.
  • the device In certain applications for electron discharge devices, such for example as a klystron, it is required that the device be capable of operating from a cold start with a minimum shift in frequency from the start to that of operation after a predetermined time.
  • the spacing between the cavity grids One factor that aifects frequency in electron discharge devices that utilize resonant cavities is the spacing between the cavity grids.
  • the structure supporting the grid has been of a material having relative high heat conductance in order to conduct heat away from the grid and supporting structure.
  • Such material inherently has a high thermal coefiicient of expansion.
  • the heat, created by electron bombardment causes expansion of the supporting structure which changes the spacing between the grids, thereby changing the operating frequency of the device.
  • the present invention provides means for overcoming the aforenoted problem.
  • a supporting member is provided that is made of a material having a low temperature coefiicient of expansion, such for example as Invar.
  • the support is provided with a heavy copper plating in order to provide a high thermal conductivity path from the grid to the wall of the device.
  • Another object of the invention is to provide a novel high frequency structure.
  • Another object of the invention is to provide novel means for preventing frequency shift with changes in temperature in an electron discharge device.
  • Another object of the invention is to provide a novel stabilized electron discharge device.
  • the single figure is a cutaway view of an electron discharge device embodying the invention.
  • an electron discharge device is indicated generally by the numeral 1, which may, for purposes of illustration, be a klystron of the reflex type. Only that portion of the device embodying the invention will be described in 2 detail.
  • the device 1 has an envelope 2 inclosing acavity 3.
  • the cavity 3 has a side wall 4, top wall 5 and bottom wall 6.
  • the top wall 5 has a grid 7 supported by a flexible diaphragm 8.
  • the diaphragm 8 may be connected to suitable tuning apparatus (not shown) for tuning the device 1 over a range of frequencies. It is understood, however, that the grid 7 may be fixed and not tunable over a range of frequencies.
  • the bottom wall 6 is of a substantially inverted cup shaped configuration and carries a grid 9 arranged concentric with the grid 7.
  • the wall 6 comprises a base 10 of a material having a low thermal coefiicient of expansion, such for example as Invar.
  • the base 10 has a heavily plated skin 11 of a material having high thermal conductivity, such for example as copper.
  • the cavity 3 may be excited by an electron gun 12 of a suitable type.
  • the Wall 6 supporting the grid 9 is heated by electron beams.
  • this heating would cause the structure to expand thereby changing the spacing between the grids '7 and 9.
  • the heavy plated skin 11 provides a path of high thermal conductivity from the grid support to the envelope 1, thus reducing the internal temperature of the structure.
  • An electron discharge device having a resonant cavity, a pair of grids forming a gap therein, one of said grids being movable for tuning said cavity, a fixed support for the other of said grids, an envelope for enclosing said cavity said fixed support being of a material having a low thermal coefficient of expansion and having a covering in good heat exchange relationship therewith of a material having high thermal conductivity and extending from said fixed grid to said envelope to provide a thermal path from said support to said envelope.
  • a reflex klystron comprising an envelope inclosing a resonant cavity, a movable grid, a fixed grid, means for mounting said movable grid in one wall of said cavity, means for mounting said fixed grid in an opposite wall of said cavity, said last means being constructed of a material having a low thermal coefiicient of expansion and having a heavy plating of copper thereon extending from said fixed grid to said envelope to provide a thermal path from said fixed grid to said envelope.

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  • Electron Sources, Ion Sources (AREA)

Description

I Oct. 14, 1958 T. D. FENTRESS ELECTRON DISCHARGE DEVICE Filed Oct. 21, 1954 Ir JV! INVENTOR. THOMAS Q ILE/VTR ATTORNEY United States Patent ELECTRON DISCHARGE DEVICE Thomas D. Fentress, Shrewsbury, N. 1., assignor to Bendix Aviation Corporation, Eatontown, N. J., a corpo ration of Delaware Application October 21, 1954, Serial No. 463,655
2 Claims. (Cl. SIS-5.22)
The present invention relates to high frequency structure and more particularly to electron discharge devices embodying such structure.
In certain applications for electron discharge devices, such for example as a klystron, it is required that the device be capable of operating from a cold start with a minimum shift in frequency from the start to that of operation after a predetermined time.
One factor that aifects frequency in electron discharge devices that utilize resonant cavities is the spacing between the cavity grids. Heretofore, the structure supporting the grid has been of a material having relative high heat conductance in order to conduct heat away from the grid and supporting structure. Such material inherently has a high thermal coefiicient of expansion. Hence, during the warm up period, the heat, created by electron bombardment causes expansion of the supporting structure which changes the spacing between the grids, thereby changing the operating frequency of the device.
The present invention provides means for overcoming the aforenoted problem. A supporting member is provided that is made of a material having a low temperature coefiicient of expansion, such for example as Invar. In order to overcome the disadvantage of the low heat conductivity of the material, the support is provided with a heavy copper plating in order to provide a high thermal conductivity path from the grid to the wall of the device.
It is an object of the invention to provide an improved electron discharge device.
Another object of the invention is to provide a novel high frequency structure.
Another object of the invention is to provide novel means for preventing frequency shift with changes in temperature in an electron discharge device.
Another object of the invention is to provide a novel stabilized electron discharge device.
The above and other objects and features of the invention will appear more fully hereinafter from a con sideration of the following description taken in conjunction with the accompanying drawing wherein one embodiment of the invention is illustrated by way of example.
In the drawing:
The single figure is a cutaway view of an electron discharge device embodying the invention.
Reference is now made to the drawing wherein an electron discharge device is indicated generally by the numeral 1, which may, for purposes of illustration, be a klystron of the reflex type. Only that portion of the device embodying the invention will be described in 2 detail. The device 1 has an envelope 2 inclosing acavity 3. The cavity 3 has a side wall 4, top wall 5 and bottom wall 6. The top wall 5 has a grid 7 supported by a flexible diaphragm 8. The diaphragm 8 may be connected to suitable tuning apparatus (not shown) for tuning the device 1 over a range of frequencies. It is understood, however, that the grid 7 may be fixed and not tunable over a range of frequencies.
The bottom wall 6 is of a substantially inverted cup shaped configuration and carries a grid 9 arranged concentric with the grid 7. The wall 6 comprises a base 10 of a material having a low thermal coefiicient of expansion, such for example as Invar. The base 10 has a heavily plated skin 11 of a material having high thermal conductivity, such for example as copper.
The cavity 3 may be excited by an electron gun 12 of a suitable type. t
In operation the Wall 6 supporting the grid 9 is heated by electron beams. Heretofore, this heating would cause the structure to expand thereby changing the spacing between the grids '7 and 9. With the wall of a material having a low thermal coefficient of expansion, as long as the temperature is held within the thermal limits of the material, there will be a minimum change in spacing with changes in temperature. The heavy plated skin 11 provides a path of high thermal conductivity from the grid support to the envelope 1, thus reducing the internal temperature of the structure.
Although only one embodiment of the invention has been illustrated and described, various changes in the form and relative arrangement of the parts may be made to suit requirements.
What is claimed is:
1. An electron discharge device having a resonant cavity, a pair of grids forming a gap therein, one of said grids being movable for tuning said cavity, a fixed support for the other of said grids, an envelope for enclosing said cavity said fixed support being of a material having a low thermal coefficient of expansion and having a covering in good heat exchange relationship therewith of a material having high thermal conductivity and extending from said fixed grid to said envelope to provide a thermal path from said support to said envelope.
2. A reflex klystron comprising an envelope inclosing a resonant cavity, a movable grid, a fixed grid, means for mounting said movable grid in one wall of said cavity, means for mounting said fixed grid in an opposite wall of said cavity, said last means being constructed of a material having a low thermal coefiicient of expansion and having a heavy plating of copper thereon extending from said fixed grid to said envelope to provide a thermal path from said fixed grid to said envelope.
References Cited in the file of this patent UNITED STATES PATENTS 2,337,214 Tunick Dec. 21, 1943 2,374,810 Fremlin May 1, 1945 2,418,844 Le Van Apr. 15, 1947 2,468,141 True Apr. 26, 1949 2,503,266 Harrison et al. Apr. 11, 1950 2,508,141 Broadway et al. May 16, 1950 2,513,371 Shepherd July 4, 1950 2,523,031 Laflt'erty Sept. 19, 1950
US463655A 1954-10-21 1954-10-21 Electron discharge device Expired - Lifetime US2856556A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100139182A1 (en) * 2007-03-21 2010-06-10 Wernersson Lars Haakan resilient fixing arrangement

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2337214A (en) * 1941-04-17 1943-12-21 Rca Corp Ultra short wave apparatus
US2374810A (en) * 1939-12-22 1945-05-01 Int Standard Electric Corp Electron discharge apparatus
US2418844A (en) * 1943-04-01 1947-04-15 Raytheon Mfg Co Ultra high frequency tube
US2468141A (en) * 1944-10-12 1949-04-26 Raytheon Mfg Co Electron discharge device
US2503266A (en) * 1943-08-11 1950-04-11 Sperry Corp Frequency stabilization apparatus
US2508141A (en) * 1944-05-20 1950-05-16 Emi Ltd Electron discharge device employing hollow resonator
US2513371A (en) * 1945-02-01 1950-07-04 Bell Telephone Labor Inc Thermally tunable cavity resonator electron discharge device
US2523031A (en) * 1945-06-30 1950-09-19 Gen Electric Tunable ultra high frequency tube with reflector electrode

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2374810A (en) * 1939-12-22 1945-05-01 Int Standard Electric Corp Electron discharge apparatus
US2337214A (en) * 1941-04-17 1943-12-21 Rca Corp Ultra short wave apparatus
US2418844A (en) * 1943-04-01 1947-04-15 Raytheon Mfg Co Ultra high frequency tube
US2503266A (en) * 1943-08-11 1950-04-11 Sperry Corp Frequency stabilization apparatus
US2508141A (en) * 1944-05-20 1950-05-16 Emi Ltd Electron discharge device employing hollow resonator
US2468141A (en) * 1944-10-12 1949-04-26 Raytheon Mfg Co Electron discharge device
US2513371A (en) * 1945-02-01 1950-07-04 Bell Telephone Labor Inc Thermally tunable cavity resonator electron discharge device
US2523031A (en) * 1945-06-30 1950-09-19 Gen Electric Tunable ultra high frequency tube with reflector electrode

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100139182A1 (en) * 2007-03-21 2010-06-10 Wernersson Lars Haakan resilient fixing arrangement
US8585338B2 (en) * 2007-03-21 2013-11-19 Akoustos Ab Resilient fixing arrangement

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