US20180151716A1 - Semiconductor device and forming method thereof - Google Patents
Semiconductor device and forming method thereof Download PDFInfo
- Publication number
- US20180151716A1 US20180151716A1 US15/396,900 US201715396900A US2018151716A1 US 20180151716 A1 US20180151716 A1 US 20180151716A1 US 201715396900 A US201715396900 A US 201715396900A US 2018151716 A1 US2018151716 A1 US 2018151716A1
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- Prior art keywords
- dielectric
- feature
- gate
- semiconductor device
- gate stack
- Prior art date
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- Abandoned
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- 238000000034 method Methods 0.000 title description 107
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/785—Field effect transistors with field effect produced by an insulated gate having a channel with a horizontal current flow in a vertical sidewall of a semiconductor body, e.g. FinFET, MuGFET
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/308—Chemical or electrical treatment, e.g. electrolytic etching using masks
- H01L21/3083—Chemical or electrical treatment, e.g. electrolytic etching using masks characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
- H01L21/3085—Chemical or electrical treatment, e.g. electrolytic etching using masks characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by their behaviour during the process, e.g. soluble masks, redeposited masks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0642—Isolation within the component, i.e. internal isolation
- H01L29/0649—Dielectric regions, e.g. SiO2 regions, air gaps
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/417—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
- H01L29/41725—Source or drain electrodes for field effect devices
- H01L29/41791—Source or drain electrodes for field effect devices for transistors with a horizontal current flow in a vertical sidewall, e.g. FinFET, MuGFET
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- H—ELECTRICITY
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Definitions
- a multiple-gate finFET may have a gate electrode that straddles across a fin-like silicon body to form a channel region.
- FIGS. 1A to 13A are cross-sectional views of a method of forming a semiconductor device at various stages in accordance with some embodiments.
- FIGS. 1B to 13B are different cross-sectional views respectively corresponding to FIGS. 1A to 13A .
- first and second features are formed in direct contact
- additional features may be formed between the first and second features, such that the first and second features may not be in direct contact
- present disclosure may repeat reference numerals and/or letters in the various examples. This repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed.
- spatially relative terms such as “beneath,” “below,” “lower,” “above,” “upper” and the like, may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures.
- the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures.
- the apparatus may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein may likewise be interpreted accordingly.
- Examples of devices that can be improved from one or more embodiments of the present disclosure are semiconductor devices.
- Such a device for example, is a Fin field effect transistor (FinFET) device.
- FinFET Fin field effect transistor
- the following disclosure will continue with a FinFET example to illustrate various embodiments. It is understood, however, that the disclosure is not limited to a particular type of device.
- FIGS. 1A to 13A are cross-sectional views of a method of forming a semiconductor device at various stages in accordance with some embodiments.
- FIGS. 1B to 13B are different cross-sectional views respectively corresponding to FIGS. 1A to 13A . Reference is made to FIGS. 1A and 1B .
- a semiconductor fin 110 is formed on the substrate 100 and protrudes from the substrate 100 .
- the substrate 100 includes silicon.
- the substrate 100 may include germanium, silicon germanium, gallium arsenide or other appropriate semiconductor materials.
- the substrate 100 may include an epitaxial layer.
- the substrate 100 may have an epitaxial layer overlying a bulk semiconductor. Further, the substrate 100 may be strained for performance enhancement.
- the epitaxial layer may include a semiconductor material different from that of the bulk semiconductor, such as a layer of silicon germanium overlying bulk silicon or a layer of silicon overlying bulk silicon germanium.
- strained substrate may be formed by selective epitaxial growth (SEG).
- the substrate 100 may include a semiconductor-on-insulator (SOI) structure.
- the substrate 100 may include a buried dielectric layer, such as a buried oxide (BOX) layer, such as that formed by separation by implantation of oxygen (SIMOX) technology, wafer bonding, SEG, or other appropriate method.
- SOI semiconductor-on-insulator
- SOI semiconductor-on-insulator
- the substrate 100 may include a buried dielectric layer, such as a buried oxide (BOX) layer, such as that formed by separation by implantation of oxygen (SIMOX) technology, wafer bonding, SEG, or other appropriate method.
- BOX buried oxide
- SIMOX separation by implantation of oxygen
- the semiconductor fin 110 includes silicon.
- the semiconductor fin 110 may be formed, for example, by patterning and etching the substrate 100 using photolithography techniques.
- a layer of photoresist material (not shown) is sequentially deposited over the substrate 100 .
- the layer of photoresist material is irradiated (exposed) in accordance with a desired pattern (the semiconductor fin 110 in this case) and developed to remove portions of the photoresist material.
- the remaining photoresist material protects the underlying material from subsequent processing steps, such as etching. It is noted that other masks, such as an oxide or silicon nitride mask, may also be used in the etching process.
- An isolation dielectric 120 is formed to fill trenches between the semiconductor fins 110 as shallow trench isolation (STI).
- the isolation dielectric 120 may include any suitable dielectric material, such as silicon oxide.
- the method of forming the isolation dielectric 120 may include depositing an isolation dielectric 120 on the substrate 100 to cover the semiconductor fin 110 , optionally performing a planarization process, such as a chemical mechanical polishing (CMP) process, to remove the excess isolation dielectric 120 outside the trenches, and then performing an etching process on the isolation dielectric 120 until upper portions of the semiconductor fins 110 are exposed.
- the etching process performed may be a wet etching process, for example, by dipping the substrate 100 in hydrofluoric acid (HF).
- the etching process may be a dry etching process, for example, the dry etching process may be performed using CHF 3 or BF 3 as etching gases.
- Gate stacks 130 are formed on portions of the semiconductor fin 110 at interval and expose other portions of the semiconductor fin 110 .
- the gate stacks 130 can serve as dummy gates and at least portions thereof will be replaced by final gate stacks at a subsequent stage.
- portions of the dummy gate stacks 130 are to be replaced later by metal gate electrodes (MG) after high temperature thermal processes, such as thermal annealing for source/drain activation during the sources/drains formation.
- the dummy gate stacks 130 include gate dielectrics 132 , dummy electrodes 134 and gate masks 136 .
- the gate dielectrics 132 may include, for example, a high-k dielectric material such as metal oxides, metal nitrides, metal silicates, transition metal-oxides, transition metal-nitrides, transition metal-silicates, oxynitrides of metals, metal aluminates, zirconium silicate, zirconium aluminate, or combinations thereof.
- a high-k dielectric material such as metal oxides, metal nitrides, metal silicates, transition metal-oxides, transition metal-nitrides, transition metal-silicates, oxynitrides of metals, metal aluminates, zirconium silicate, zirconium aluminate, or combinations thereof.
- the gate dielectrics 132 may include hafnium oxide (HfO 2 ), hafnium silicon oxide (HfSiO), hafnium silicon oxynitride (HfSiON), hafnium tantalum oxide (HfTaO), hafnium titanium oxide (HMO), hafnium zirconium oxide (HfZrO), lanthanum oxide (LaO), zirconium oxide (ZrO), titanium oxide (TiO), tantalum oxide (Ta 2 O 5 ), yttrium oxide (Y 2 O 3 ), strontium titanium oxide (SrTiO 3 , STO), barium titanium oxide (BaTiO 3 , BTO), barium zirconium oxide (BaZrO), hafnium lanthanum oxide (HfLaO), lanthanum silicon oxide (LaSiO), aluminum silicon oxide (AlSiO), aluminum oxide (Al 2 O 3 ), silicon nitride (Si 3 N 4
- the gate dielectrics 132 may have a multilayer structure such as one layer of silicon oxide (e.g., interfacial layer) and another layer of high-k material.
- the dummy electrodes 134 may include polycrystalline silicon (polysilicon), as examples.
- the gate masks 136 may include a suitable dielectric material, such as silicon nitride, silicon oxynitride or silicon carbide, as examples.
- the dummy gate stacks 130 can be formed by deposition and patterning.
- the gate dielectric 132 is blanket deposited on the structure shown in FIGS. 1A and 1 B by a suitable technique, such as chemical vapor deposition (CVD).
- the dummy electrode 134 is deposited on the gate dielectric 132 by a suitable technique, such as CVD.
- the gate mask 136 is deposited on the dummy gate electrode 134 by a suitable technique, such as CVD. Then the gate mask 136 is patterned by a lithography process and an etching process, thereby forming openings in the gate mask 136 , exposing the underlying dummy gate materials within the openings.
- the lithography process may include photoresist (or resist) coating (e.g., spin-on coating), soft baking, mask aligning, exposure, post-exposure baking, developing the photoresist, rinsing, drying (e.g., hard baking), other suitable processes, and/or combinations thereof.
- the etching process includes dry etching, wet etching, and/or other etching methods (e.g., reactive ion etching). Another etching process is applied to the dummy gate materials through the openings of the gate mask 136 using the gate mask 136 as an etch mask, thereby forming the gate stacks 130 straddling portions of the semiconductor fin 110 .
- a blanket first dielectric layer 140 is formed on the structure shown in FIGS. 2A and 2B . That is, the first dielectric layer 140 is conformally formed over at least the semiconductor fin 110 and the dummy gate stacks 130 . Portions of the first dielectric layer 140 are located on sidewalls 131 of the dummy gate stacks 130 , and these portions of the first dielectric layer 140 can be referred to as dielectric features on the sidewalls 131 of the dummy gate stacks 130 . In some embodiments, the first dielectric layer 140 has a dielectric constant greater than about 3.7.
- Exemplary materials of the first dielectric layer 140 may include silicon oxycarbonitride (SiOCN), silicon oxycarbide (SiOC), silicon oxide, silicon nitride, silicon oxy-nitride, non-porous dielectric materials or other suitable material.
- the first dielectric layer 140 may be formed by a deposition process, such as an atomic layer deposition (ALD) process, a CVD process, a physical vapor deposition (PVD) process, a sputter deposition process or other suitable techniques.
- ALD atomic layer deposition
- CVD chemical vapor deposition
- PVD physical vapor deposition
- sputter deposition process or other suitable techniques.
- the dielectric constant may range from about 3.5 to about 5.
- a second dielectric layer 150 is conformally formed on the first dielectric layer 140 . Portions of the second dielectric layer 150 are located on sidewalls 131 of the dummy gate stacks 130 , and these portions of the second dielectric layer 150 can be referred to as dielectric features on the sidewalls 131 of the dummy gate stacks 130 .
- the second dielectric layer 150 has a dielectric constant less than that of the first dielectric layer 140 .
- the second dielectric layer 150 may include a low-k dielectric material having a dielectric constant less than about 4.0.
- the dielectric constant of the second dielectric layer 150 may range from about 1.5 to about 3.7.
- Exemplary low-k dielectric material may include hydrogen doped silicon oxycarbide (SiOC:H), low-k silicon oxycarbide (SiOC), spin-on dielectric (SOD), porous silicon dioxide, porous silicon oxycarbonitride (SiOCN), low-k silicon nitride, low-k silicon oxynitride, polyimide, spin-on glass (SOG), fluoride-doped silicate glass (FSG), phosphosilicate glass (PSG), borophosphosilicate glass (BPSG), Black Diamond® (Applied Materials of Santa Clara, Calif.), Xerogel, Aerogel, amorphous fluorinated carbon, Parylene, BCB (bis-benzocyclobutenes), SiLK (Dow Chemical of Midland, Mich.), other suitable low-k dielectric materials, and/or combinations thereof.
- SiOC:H hydrogen doped silicon oxycarbide
- SiOC spin-on dielectric
- porous silicon dioxide porous silicon oxycarbonitride
- the second dielectric layer 150 including the low-k dielectric material may be deposited using ALD, PVD or a CVD method such as plasma enhanced CVD (PECVD), low pressure CVD (LPCVD), or atomic layer CVD (ALCVD).
- PECVD plasma enhanced CVD
- LPCVD low pressure CVD
- ACVD atomic layer CVD
- the second dielectric layer 150 can be formed by a PECVD or high density PECVD process including organo-silane precursors such as tetramethylsilane, trimethylsilane or combinations thereof, and the second dielectric layer 150 may have the dielectric constant ranging from about 2.2 to about 3.2.
- the second dielectric layer 150 can be formed by CVD, and the dielectric constant thereof may range from about 3.5 to about 3.9.
- the second dielectric layer 150 may include low-k spin-on dielectric materials, such as a composition with silicon-hydrogen (Si—H) bonds, such as hydrogen silsesquioxane (HSQ) or methylsilsesquioxane (MSQ), and the dielectric constant of the second dielectric layer 150 may range from about 2.1 to about 2.5.
- the low-k dielectric material of the second dielectric layer 150 is beneficial to reduce a parasitic capacitance between a gate stack and a contact plug formed in subsequently steps due to its low permittivity, and a resistive-capacitive (RC) time delay caused by the parasitic capacitance can be thus decreased.
- the low-k second dielectric layer 150 and the first dielectric layer 140 have different etch properties.
- the first and second dielectric layers 140 and 150 have different etch resistance properties.
- the first dielectric layer 140 has an etch resistance to etching the dummy gate stacks 130 , and this etch resistance of the first dielectric layer 140 is higher than that of the second dielectric layer 150 .
- the first dielectric layer 140 is not easier to be etched or removed compared to the second dielectric layer 150 during the etching performed to the dummy gate stacks 130 .
- the second dielectric layer 150 can thus be protected by the first dielectric layer 140 during the etching performed to the dummy gate stacks 130 . That is, the low-k feature can be protected by the first dielectric layer 140 during the etching performed to the dummy gate stacks 130 .
- a third dielectric layer 160 is conformally formed on the second dielectric layer 150 . Portions of the third dielectric layer 160 are located on sidewalls 131 of the dummy gate stacks 130 , and these portions of the third dielectric layer 160 can be referred to as dielectric features on the sidewalls 131 of the dummy gate stacks 130 . In some embodiments, the third dielectric layer 160 has a dielectric constant greater than about 3.7. Exemplary materials of the third dielectric layer 160 may include silicon oxycarbonitride (SiOCN), silicon oxycarbide (SiOC), silicon oxide, silicon nitride, silicon oxy-nitride, non-porous dielectric materials or other suitable material.
- the third dielectric layer 160 may be formed by a deposition process, such as an atomic layer deposition (ALD) process, a CVD process, a physical vapor deposition (PVD) process, a sputter deposition process or other suitable techniques.
- ALD atomic layer deposition
- CVD chemical vapor deposition
- PVD physical vapor deposition
- sputter deposition process or other suitable techniques.
- the dielectric constant may range from about 3.5 to about 5.
- the second dielectric layer 150 and the third dielectric layer 160 have different etch properties.
- the second and third dielectric layers 150 and 160 have different etch resistance properties.
- the third dielectric layer 160 has an etch resistance to an etching used to form source/drain regions in subsequent steps, and this etch resistance of the third dielectric layer 160 is higher than that of the second dielectric layer 150 . Therefore, the third dielectric layer 160 is not easier to be etched or removed compared to the second dielectric layer 150 during the etching used to form the source/drain regions.
- the second dielectric layer 150 can thus be protected by the third dielectric layer 160 during the etching used to form the source/drain regions. That is, the low-k feature can be protected by the third dielectric layer 160 during the etching used to form the source/drain regions.
- a filling dielectric 170 is formed on the third dielectric layer 160 and fills a recess 161 of the third dielectric layer 160 .
- the filling dielectric 170 may overfill the recess 161 of the third dielectric layer 160 .
- the filling dielectric 170 may not remain on sidewalls of the final gate stacks.
- the dielectric constant of the filling dielectric 170 can be not limited.
- Exemplary materials of the filling dielectric 170 may include silicon oxycarbonitride (SiOCN), silicon oxycarbide (SiOC), silicon oxide, silicon nitride, silicon oxy-nitride, non-porous dielectric materials or other suitable material.
- the filling dielectric 170 may be formed by a deposition process, such as an atomic layer deposition (ALD) process, a CVD process, a physical vapor deposition (PVD) process, a sputter deposition process or other suitable techniques.
- a deposition process such as an atomic layer deposition (ALD) process, a CVD process, a physical vapor deposition (PVD) process, a sputter deposition process or other suitable techniques.
- a chemical mechanical polishing (CMP) process may be applied to remove excessive filling dielectric 170 and expose top surfaces of the dummy gate stacks 130 , the first, second and third dielectric layers 140 , 150 and 160 and the filling dielectric 170 .
- CMP chemical mechanical polishing
- An etching process is performed on the first, second and third dielectric layers 140 , 150 and 160 and the filling dielectric 170 , such that upper portions of the dummy gate stacks 130 are exposed.
- the etching process may be a wet etching process, a dry etching process or combinations thereof.
- upper portions of the sidewalls 131 of the dummy gate stacks 130 are exposed. For example, sidewalls of the gate masks 136 and upper portions of sidewalls of the dummy electrodes 134 are exposed.
- a dielectric cap 180 is formed on the structure shown in FIGS. 5A and 5B . Therefore, the dielectric cap 180 at least caps the first, second and third dielectric layers 140 , 150 and 160 and the filling dielectric 170 . In other words, the first, second and third dielectric layers 140 , 150 and 160 and the filling dielectric 170 are buried under the dielectric cap 180 . Stated differently, the dielectric cap 180 is formed on the exposed portions of the sidewalls 131 of the dummy gate stacks 130 . In some embodiments, the dielectric cap 180 has a dielectric constant greater than about 3.7.
- Exemplary materials of the dielectric cap 180 may include silicon oxycarbonitride (SiOCN), silicon oxycarbide (SiOC), silicon oxide, silicon nitride, silicon oxy-nitride, non-porous dielectric materials or other suitable material.
- the dielectric cap 180 may be formed by a deposition process, such as an atomic layer deposition (ALD) process, a CVD process, a physical vapor deposition (PVD) process, a sputter deposition process or other suitable techniques.
- ALD atomic layer deposition
- CVD chemical vapor deposition
- PVD physical vapor deposition
- sputter deposition process or other suitable techniques.
- the dielectric constant may range from about 3.5 to about 5.
- the second dielectric layer 150 and the dielectric cap 180 have different etch properties.
- the second dielectric layer 150 and the dielectric cap 180 have different etch resistance properties.
- the dielectric cap 180 has an etch resistance to etching the dummy gate stacks 130 , and this etch resistance of the dielectric cap 180 is higher than that of the second dielectric layer 150 . Therefore, the dielectric cap 180 is not easier to be etched or removed compared to the underlying second dielectric layer 150 during the etching performed to the dummy gate stacks 130 . The second dielectric layer 150 can thus be protected by the overlying dielectric cap 180 during the etching performed to the dummy gate stacks 130 .
- the low-k feature can be protected by the overlying dielectric cap 180 during the etching performed to the dummy gate stacks 130 .
- the dielectric cap 180 has an etch resistance to the etching used to form source/drain regions in subsequent steps, and this etch resistance of the dielectric cap 180 is higher than that of the underlying second dielectric layer 150 . Therefore, the dielectric cap 180 is not easier to be etched or removed compared to the underlying second dielectric layer 150 during the etching used to form the source/drain regions.
- the second dielectric layer 150 can thus be protected by the overlying dielectric cap 180 during the etching used to form the source/drain regions. That is, the low-k feature can be protected by the overlying dielectric cap 180 during the etching used to form the source/drain regions.
- a chemical mechanical polishing (CMP) process may be applied to remove excessive dielectric cap 180 outside the space between the dummy gate stacks 130 and expose top surfaces of the dummy gate stacks 130 and the dielectric cap 180 .
- CMP chemical mechanical polishing
- a removal process is performed to remove portions of the dielectric cap 180 and their underlying portions of filling dielectric 170 , third, second and first dielectric layers 160 , 150 and 140 .
- Remaining portions of the first, second and third dielectric layers 140 , 150 and 160 and the overlying dielectric cap 180 can collectively serve as gate spacers 190 located on opposite sides of the dummy gate stacks 130 . That is, two gate spacers 190 are respectively located on two opposite sidewalls 131 of a dummy gate stack 130 .
- the first and third dielectric layers 140 and 160 are respectively located on opposite sidewalls of the second dielectric layer 150 .
- the first dielectric layer 140 is located on a sidewall of the second dielectric layer 150 proximal to the dummy gate stack 130
- the third dielectric layer 160 is located on a sidewall of the second dielectric layer 150 distal to the dummy gate stack 130
- the dielectric cap 180 is wider than the second dielectric layer 150 and is located atop the first, second and third dielectric layers 140 , 150 and 160 . That is, the second dielectric layer 150 is located between the first and third dielectric layers 140 and 160 and underlies the dielectric cap 180 .
- the dielectric cap 180 and the first and third dielectric layers 140 and 160 can be collectively referred to as a dielectric feature straddling the second dielectric layer 150 .
- the second dielectric layer 150 having the lowest dielectric constant of the gate spacer 190 can be protected by the first and third dielectric layers 140 and 160 and the dielectric cap 180 against subsequent etching processes, such as the etching performed to the dummy gate stacks 130 , the etching used to form the source/drain regions, or combinations thereof.
- this removal process may remove portions of the semiconductor fin 110 as well. More particularly, portions of the semiconductor fin 110 underlying the removed portions of the dielectric cap 180 may be removed or recessed, and a recess R is thus formed on the semiconductor fin 110 and between the gate spacers 190 . In other words, the remaining semiconductor fin 110 has at least one source/drain portion 110 s and channel portions 110 c .
- the channel portions 110 c underlie respect dummy gate stacks 130 , and the source/drain portion 110 s is exposed by the dummy gate stacks 130 and the gate spacers 190 .
- the source/drain portion 110 s has a top lower than that of the channel portions 110 c due to this removal process.
- this removal process may cause height loss to the exposed portion of the semiconductor fin 110 .
- the top of the source/drain portion 110 s of the semiconductor fin 110 is higher than that of the isolation dielectric 120 . Stated differently, the source/drain portion 110 s protrudes with respect to the isolation dielectric 120 . In some embodiments, a portion of the semiconductor fin 110 protruding with respect to the isolation dielectric 120 may be removed, so that the source/drain portion 110 s may be formed as having a top lower than that of the isolation dielectric 120 .
- the removal process performed in FIGS. 7A and 7B may be, for example, an etching process, such as an anisotropic etching process.
- the gate spacers 190 may be used to offset subsequently formed epitaxy structures on the semiconductor fin 110 , such as source/drain epitaxy structures.
- the gate spacers 190 may further be used for designing or modifying the source/drain regions (junction) profile. Removal may include a lithography process to facilitate the etching process.
- the lithography process may include photoresist coating (e.g., spin-on coating), soft baking, mask aligning, exposure, post-exposure baking, developing the photoresist, rinsing, drying (e.g., hard baking), other suitable processes, or combinations thereof.
- the lithography process is implemented or replaced by other methods, such as maskless photolithography, electron-beam writing, and ion-beam writing.
- the lithography process could implement nanoimprint technology.
- the dielectric layers 140 , 150 , 160 and 170 are absent except for in the gate spacers 190 . In some other embodiments, at least some portions of the dielectric layers 140 , 150 , 160 and 170 remain, such as, on the isolation dielectric 120 and/or sidewalls of the semiconductor fin 110 .
- a trimming process is preformed to the exposed source/drain portion 110 s , so that the source/drain portion 110 s protruding above the isolation dielectric 120 may be trimmed as a thinned source/drain portion 112 s .
- the thinned source/drain portion 112 s may be referred to as thinner semiconductor strips on the thicker semiconductor fin 110 .
- the trimming or thinning process may include an etching process, such as a wet etching process, and the etchant may include a solution of HF, hydrogen peroxide (H 2 O 2 ), and acetic acid (CH 3 COOH), for example.
- the etch resistance of the dielectric cap 180 to this etching process is higher than that of the second dielectric layer 150 . That is, the etch resistance of the dielectric cap 180 to etching the source/drain portion 110 s of the semiconductor substrate 100 is higher than that of the second dielectric layer 150 . Therefore, the dielectric cap 180 is not easier to be etched or removed compared to the underlying second dielectric layer 150 during the etching process to trim or thin the semiconductor fin 110 .
- the second dielectric layer 150 can thus be protected by the overlying dielectric cap 180 during this trimming process. That is, the low-k feature can be protected by the overlying dielectric cap 180 during this trimming process.
- the etch resistance of the third dielectric layer 160 to this etching process is higher than that of the second dielectric layer 150 . That is, the etch resistance of the third dielectric layer 160 to etching the source/drain portion 110 s of the semiconductor substrate 100 is higher than that of the second dielectric layer 150 . As such, the low-k feature can be protected by the adjacent third dielectric layer 160 during this trimming process.
- width W 1 is between about 50 percent and about 70 percent of width W 2 , although width W 1 may be greater or smaller.
- LDD lightly doped source and drain
- FIGS. 9A and 9B An epitaxy structure 200 is formed on the thinned source/drain portion 112 s of the semiconductor fin 110 .
- the thinned source/drain portion 112 s protruding above the isolation dielectric 120 can be wrapped by the epitaxy structure 200 , as shown in FIG. 9B .
- the epitaxy structure 200 and the thinned source/drain portion 112 s wrapped by the epitaxy structure 200 can be collectively referred to as a source/drain region with cladding. As illustrated in FIGS.
- the formation of the source/drain region includes thinning, but not totally removing, an original portion of semiconductor fin 110 above the isolation dielectric 120 , and then epitaxially growing epitaxy structure 200 on the thinned portion of the semiconductor fin 110 above the isolation dielectric 120 .
- This may be advantageous to maintain the strain in channel portions 110 c , and may be advantageous to reduce height losses of the gate spacers 190 .
- the epitaxy structure 200 may be formed using one or more epitaxy or epitaxial (epi) processes, such that a Si feature, a SiGe feature, and/or other suitable features can be formed in a crystalline state around the thinned source/drain portion 112 s of the semiconductor fin 110 .
- the lattice constant of the epitaxy structures 200 is different from the lattice constant of the semiconductor fin 110 , so that the channel portions 110 c of the semiconductor fin 110 can be strained or stressed by the epitaxy structures 200 to improve carrier mobility of the semiconductor device and enhance the device performance.
- the epitaxy processes include CVD deposition techniques (e.g., vapor-phase epitaxy (VPE) and/or ultra-high vacuum CVD (UHV-CVD)), molecular beam epitaxy, and/or other suitable processes.
- the epitaxy process may use gaseous and/or liquid precursors, which interact with the composition of the thinned source/drain portion 112 s of the semiconductor fin 110 (e.g., silicon).
- a strained channel can be achieved to increase carrier mobility and enhance device performance.
- the epitaxy structure 200 may be in-situ doped.
- the doping species include P-type dopants, such as boron or BF 2 ; N-type dopants, such as phosphorus or arsenic; and/or other suitable dopants including combinations thereof.
- a second implantation process i.e., a junction implant process
- One or more annealing processes may be performed to activate the epitaxy structure 200 .
- the annealing processes include rapid thermal annealing (RTA) and/or laser annealing processes.
- An interlayer dielectric (ILD) layer 210 is formed on the substrate 100 the cover the semiconductor fin 110 , the dummy gate stacks 130 , the gate spacers 190 and the epitaxy structure 200 .
- the ILD layer 210 includes silicon oxide, silicon nitride, silicon oxynitride, silicon carbide, low-k dielectric material or a combination thereof.
- the ILD layer 210 includes a single layer or multiple layers.
- the ILD layer 210 is formed by a suitable technique, such as CVD. Afterward, a chemical mechanical polishing (CMP) process may be applied to remove excessive ILD layer 210 and expose top surfaces of the dummy gate stacks 130 to a subsequent dummy gate removal process.
- CMP chemical mechanical polishing
- FIGS. 11A and 11B At least portions of the dummy gate stacks 130 (see FIGS. 10A and 10B ) are removed to form gate trenches O with the gate spacers 190 as their sidewalls. That is, the gate trenches O are defined by the gate spacers 190 . In some embodiments, the dummy electrodes 134 and the gate masks 136 are removed while the gate dielectrics 132 retain as shown in FIG. 11A .
- the gate dielectrics 132 include high-k dielectric materials
- the high-k gate dielectrics 132 are formed prior to the formation of the gate spacers 190 , so that inner walls of the gate spacers 190 may not be blanket covered by high-k dielectric materials. Stated differently, inner walls of the gate spacers 190 may be substantially free from coverage of high-k dielectric materials in some embodiments. This arrangement may be beneficial to reduce the parasitic capacitance between the subsequently formed gate stack and contact plug.
- the gate dielectrics 132 can be removed as well.
- the dummy gate stacks 130 may be removed by dry etching, wet etching, or a combination of dry and wet etching.
- a wet etching process may include exposure to a hydroxide containing solution (e.g., ammonium hydroxide), deionized water, and/or other suitable etchant solutions.
- the etch resistance of the dielectric cap 180 to this etching process is higher than that of the second dielectric layer 150 . That is, the etch resistance of the dielectric cap 180 to etching the gate trenches O is higher than that of the second dielectric layer 150 . Therefore, the dielectric cap 180 is not easier to be etched or removed compared to the underlying second dielectric layer 150 during the etching the gate trenches O.
- the second dielectric layer 150 can thus be protected by the overlying dielectric cap 180 during the etching the gate trenches O. That is, the low-k feature can be protected by the overlying dielectric cap 180 during the etching the gate trenches O.
- the etch resistance of the first dielectric layer 140 to the etching the gate trenches O is higher than that of the second dielectric layer 150 .
- the low-k feature can be protected by the adjacent first dielectric layer 140 during the etching the gate trenches O.
- Gate conductors 222 are respectively formed in the gate trenches O between the gate spacers 190 .
- the gate conductors 222 and the respective underlying gate dielectrics 132 can be collectively referred to as gate stacks 220 .
- the gate stacks 220 straddle the semiconductor fin 110 and extend along the gate spacers 190 .
- the gate spacers 190 are present on sidewalls 221 of the gate stacks 220 .
- the gate conductors 222 may include work function metals to provide suitable work functions for the gate stacks 220 . For example, if a P-type work function metal (P-metal) for a PMOS device is desired, P-type work function materials may be used.
- P-metal P-type work function metal
- P-type work function materials include, but are not limited to, titanium nitride (TiN), tungsten nitride (WN), tungsten (W), ruthenium (Ru), palladium (Pd), platinum (Pt), cobalt (Co), nickel (Ni), conductive metal oxides, and/or other suitable materials.
- TiN titanium nitride
- WN tungsten nitride
- W tungsten
- Ru palladium
- Pd platinum
- Pt platinum
- cobalt Co
- Ni nickel
- conductive metal oxides and/or other suitable materials.
- N-type metal materials may be used.
- N-type work function materials include, but are not limited to, titanium aluminide (TiAl), titanium aluminium nitride (TiAlN), carbo-nitride tantalum (TaCN), hafnium (Hf), zirconium (Zr), titanium (Ti), tantalum (Ta), aluminum (Al), metal carbides (e.g., hafnium carbide (HfC), zirconium carbide (ZrC), titanium carbide (TiC), aluminum carbide (AlC)), aluminides, and/or other suitable materials.
- the gate conductors 222 may further include filling metals located on the work function metals and filling recesses in the work function metals.
- the filling metals may include tungsten, aluminum, copper, nickel, cobalt, titanium, tantalum, titanium nitride, tantalum nitride, nickel silicide, cobalt silicide, TaC, TaSiN, TaCN, TiAl, TiAlN, or other suitable materials.
- Exemplary method of forming the gate conductors 222 may include blanket forming one or more work function metal layers over the structure shown in FIGS. 11A and 11B , forming filling metal over the work function metal layers, wherein some portions of the filling metal overfill the gate trenches O shown in FIG. 11A , and then performing a CMP process to remove excessive filling metal and work function metal layers outside the gate trenches O.
- a conductive feature such as a contact plug 230
- the contact plug 230 can thus serve as source/drain contacts.
- the low-k second dielectric layer 150 is located between the contact plug 230 and the gate stack 220 , and therefore, the low-k second dielectric layer 150 can reduce the parasitic capacitance between the gate stack 220 and the contact plug 230 , thereby decreasing the RC time delay.
- Exemplary formation method of the contact plug 230 may include forming a contact hole by one or more etching processes to sequentially etch through the ILD layer 210 down to the epitaxy structure 200 , and depositing metal or other suitable conductive materials in the contact hole by a deposition process, such as a CVD process, to form the contact plug 230 .
- the gate spacer between the contact plug and the gate stack.
- This low-k dielectric feature is advantageous to reduce the parasitic capacitance between the gate stack and the contact plug.
- the RC time delay can be decreased, accordingly.
- the low-k dielectric feature is straddled by other dielectric feature. Therefore, the low-k dielectric feature can be protected against etching processes, such as etching in a gate replacement process, etching used to form source/drain regions, or combinations thereof.
- a semiconductor device includes a semiconductor substrate, a gate stack and at least one gate spacer.
- the gate stack is located on the semiconductor substrate.
- the gate spacer is located on a sidewall of the gate stack.
- the gate spacer includes a first dielectric feature and a dielectric cap capping the first dielectric feature.
- the first dielectric feature has a dielectric constant less than that of the dielectric cap.
- a semiconductor device includes a semiconductor substrate, a gate stack and at least one gate spacer.
- the gate stack is located on the semiconductor substrate.
- the gate spacer is located on a sidewall of the gate stack.
- the gate spacer includes a first dielectric feature and a second dielectric feature straddling the first dielectric feature.
- the first dielectric feature has a dielectric constant less than that of the second dielectric feature.
- a method of forming a semiconductor device includes forming a gate stack on a semiconductor substrate, forming a first dielectric feature on a sidewall of the gate stack, removing a portion of the first dielectric feature such that a portion of the sidewall of the gate stack is exposed, and forming a dielectric cap on the exposed portion of the sidewall of the gate stack.
Abstract
Description
- This application claims priority to U.S. Provisional Application Ser. No. 62/426,671, filed Nov. 28, 2016, which is herein incorporated by reference.
- In the race to improve transistor performance as well as reduce the size of transistors, transistors have been developed such that the channel and source/drain regions are located in a fin on a bulk substrate. Such non-planar devices can be referred to as multiple-gate finFETs. A multiple-gate finFET may have a gate electrode that straddles across a fin-like silicon body to form a channel region.
- Aspects of the present disclosure are best understood from the following detailed description when read with the accompanying figures. It is noted that, in accordance with the standard practice in the industry, various features are not drawn to scale. In fact, the dimensions of the various features may be arbitrarily increased or reduced for clarity of discussion.
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FIGS. 1A to 13A are cross-sectional views of a method of forming a semiconductor device at various stages in accordance with some embodiments. -
FIGS. 1B to 13B are different cross-sectional views respectively corresponding toFIGS. 1A to 13A . - The following disclosure provides many different embodiments, or examples, for implementing different features of the provided subject matter. Specific examples of components and arrangements are described below to simplify the present disclosure. These are, of course, merely examples and are not intended to be limiting. For example, the formation of a first feature over or on a second feature in the description that follows may include embodiments in which the first and second features are formed in direct contact, and may also include embodiments in which additional features may be formed between the first and second features, such that the first and second features may not be in direct contact. In addition, the present disclosure may repeat reference numerals and/or letters in the various examples. This repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed.
- Further, spatially relative terms, such as “beneath,” “below,” “lower,” “above,” “upper” and the like, may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. The spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. The apparatus may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein may likewise be interpreted accordingly.
- Examples of devices that can be improved from one or more embodiments of the present disclosure are semiconductor devices. Such a device, for example, is a Fin field effect transistor (FinFET) device. The following disclosure will continue with a FinFET example to illustrate various embodiments. It is understood, however, that the disclosure is not limited to a particular type of device.
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FIGS. 1A to 13A are cross-sectional views of a method of forming a semiconductor device at various stages in accordance with some embodiments.FIGS. 1B to 13B are different cross-sectional views respectively corresponding toFIGS. 1A to 13A . Reference is made toFIGS. 1A and 1B . Asemiconductor fin 110 is formed on thesubstrate 100 and protrudes from thesubstrate 100. In some embodiments, thesubstrate 100 includes silicon. Alternatively, thesubstrate 100 may include germanium, silicon germanium, gallium arsenide or other appropriate semiconductor materials. Also alternatively, thesubstrate 100 may include an epitaxial layer. For example, thesubstrate 100 may have an epitaxial layer overlying a bulk semiconductor. Further, thesubstrate 100 may be strained for performance enhancement. For example, the epitaxial layer may include a semiconductor material different from that of the bulk semiconductor, such as a layer of silicon germanium overlying bulk silicon or a layer of silicon overlying bulk silicon germanium. Such strained substrate may be formed by selective epitaxial growth (SEG). Furthermore, thesubstrate 100 may include a semiconductor-on-insulator (SOI) structure. Also alternatively, thesubstrate 100 may include a buried dielectric layer, such as a buried oxide (BOX) layer, such as that formed by separation by implantation of oxygen (SIMOX) technology, wafer bonding, SEG, or other appropriate method. - In some embodiments, the
semiconductor fin 110 includes silicon. Thesemiconductor fin 110 may be formed, for example, by patterning and etching thesubstrate 100 using photolithography techniques. In some embodiments, a layer of photoresist material (not shown) is sequentially deposited over thesubstrate 100. The layer of photoresist material is irradiated (exposed) in accordance with a desired pattern (thesemiconductor fin 110 in this case) and developed to remove portions of the photoresist material. The remaining photoresist material protects the underlying material from subsequent processing steps, such as etching. It is noted that other masks, such as an oxide or silicon nitride mask, may also be used in the etching process. - An isolation dielectric 120 is formed to fill trenches between the semiconductor fins 110 as shallow trench isolation (STI). The isolation dielectric 120 may include any suitable dielectric material, such as silicon oxide. The method of forming the isolation dielectric 120 may include depositing an isolation dielectric 120 on the
substrate 100 to cover thesemiconductor fin 110, optionally performing a planarization process, such as a chemical mechanical polishing (CMP) process, to remove the excess isolation dielectric 120 outside the trenches, and then performing an etching process on the isolation dielectric 120 until upper portions of thesemiconductor fins 110 are exposed. In some embodiments, the etching process performed may be a wet etching process, for example, by dipping thesubstrate 100 in hydrofluoric acid (HF). In alternative embodiments, the etching process may be a dry etching process, for example, the dry etching process may be performed using CHF3 or BF3 as etching gases. - Reference is made to
FIGS. 2A and 2B .Gate stacks 130 are formed on portions of thesemiconductor fin 110 at interval and expose other portions of thesemiconductor fin 110. In some embodiments using a gate-last process, thegate stacks 130 can serve as dummy gates and at least portions thereof will be replaced by final gate stacks at a subsequent stage. For example, portions of thedummy gate stacks 130 are to be replaced later by metal gate electrodes (MG) after high temperature thermal processes, such as thermal annealing for source/drain activation during the sources/drains formation. In some embodiments, thedummy gate stacks 130 includegate dielectrics 132,dummy electrodes 134 andgate masks 136. In some embodiments, thegate dielectrics 132 may include, for example, a high-k dielectric material such as metal oxides, metal nitrides, metal silicates, transition metal-oxides, transition metal-nitrides, transition metal-silicates, oxynitrides of metals, metal aluminates, zirconium silicate, zirconium aluminate, or combinations thereof. In some embodiments, thegate dielectrics 132 may include hafnium oxide (HfO2), hafnium silicon oxide (HfSiO), hafnium silicon oxynitride (HfSiON), hafnium tantalum oxide (HfTaO), hafnium titanium oxide (HMO), hafnium zirconium oxide (HfZrO), lanthanum oxide (LaO), zirconium oxide (ZrO), titanium oxide (TiO), tantalum oxide (Ta2O5), yttrium oxide (Y2O3), strontium titanium oxide (SrTiO3, STO), barium titanium oxide (BaTiO3, BTO), barium zirconium oxide (BaZrO), hafnium lanthanum oxide (HfLaO), lanthanum silicon oxide (LaSiO), aluminum silicon oxide (AlSiO), aluminum oxide (Al2O3), silicon nitride (Si3N4), oxynitrides (SiON), and combinations thereof. In alternative embodiments, thegate dielectrics 132 may have a multilayer structure such as one layer of silicon oxide (e.g., interfacial layer) and another layer of high-k material. Thedummy electrodes 134 may include polycrystalline silicon (polysilicon), as examples. The gate masks 136 may include a suitable dielectric material, such as silicon nitride, silicon oxynitride or silicon carbide, as examples. - The dummy gate stacks 130 can be formed by deposition and patterning. For example, the
gate dielectric 132 is blanket deposited on the structure shown inFIGS. 1A and 1B by a suitable technique, such as chemical vapor deposition (CVD). Thedummy electrode 134 is deposited on thegate dielectric 132 by a suitable technique, such as CVD. Thegate mask 136 is deposited on thedummy gate electrode 134 by a suitable technique, such as CVD. Then thegate mask 136 is patterned by a lithography process and an etching process, thereby forming openings in thegate mask 136, exposing the underlying dummy gate materials within the openings. The lithography process may include photoresist (or resist) coating (e.g., spin-on coating), soft baking, mask aligning, exposure, post-exposure baking, developing the photoresist, rinsing, drying (e.g., hard baking), other suitable processes, and/or combinations thereof. The etching process includes dry etching, wet etching, and/or other etching methods (e.g., reactive ion etching). Another etching process is applied to the dummy gate materials through the openings of thegate mask 136 using thegate mask 136 as an etch mask, thereby forming the gate stacks 130 straddling portions of thesemiconductor fin 110. - Reference is made to
FIGS. 3A and 3B . A blanket firstdielectric layer 140 is formed on the structure shown inFIGS. 2A and 2B . That is, thefirst dielectric layer 140 is conformally formed over at least thesemiconductor fin 110 and the dummy gate stacks 130. Portions of thefirst dielectric layer 140 are located onsidewalls 131 of the dummy gate stacks 130, and these portions of thefirst dielectric layer 140 can be referred to as dielectric features on thesidewalls 131 of the dummy gate stacks 130. In some embodiments, thefirst dielectric layer 140 has a dielectric constant greater than about 3.7. Exemplary materials of thefirst dielectric layer 140 may include silicon oxycarbonitride (SiOCN), silicon oxycarbide (SiOC), silicon oxide, silicon nitride, silicon oxy-nitride, non-porous dielectric materials or other suitable material. Thefirst dielectric layer 140 may be formed by a deposition process, such as an atomic layer deposition (ALD) process, a CVD process, a physical vapor deposition (PVD) process, a sputter deposition process or other suitable techniques. In the embodiments where thefirst dielectric layer 140 is made of SiOCN or SiOC, the dielectric constant may range from about 3.5 to about 5. - Next, a
second dielectric layer 150 is conformally formed on thefirst dielectric layer 140. Portions of thesecond dielectric layer 150 are located onsidewalls 131 of the dummy gate stacks 130, and these portions of thesecond dielectric layer 150 can be referred to as dielectric features on thesidewalls 131 of the dummy gate stacks 130. Thesecond dielectric layer 150 has a dielectric constant less than that of thefirst dielectric layer 140. For example, thesecond dielectric layer 150 may include a low-k dielectric material having a dielectric constant less than about 4.0. In some embodiments, the dielectric constant of thesecond dielectric layer 150 may range from about 1.5 to about 3.7. Exemplary low-k dielectric material may include hydrogen doped silicon oxycarbide (SiOC:H), low-k silicon oxycarbide (SiOC), spin-on dielectric (SOD), porous silicon dioxide, porous silicon oxycarbonitride (SiOCN), low-k silicon nitride, low-k silicon oxynitride, polyimide, spin-on glass (SOG), fluoride-doped silicate glass (FSG), phosphosilicate glass (PSG), borophosphosilicate glass (BPSG), Black Diamond® (Applied Materials of Santa Clara, Calif.), Xerogel, Aerogel, amorphous fluorinated carbon, Parylene, BCB (bis-benzocyclobutenes), SiLK (Dow Chemical of Midland, Mich.), other suitable low-k dielectric materials, and/or combinations thereof. Thesecond dielectric layer 150 including the low-k dielectric material may be deposited using ALD, PVD or a CVD method such as plasma enhanced CVD (PECVD), low pressure CVD (LPCVD), or atomic layer CVD (ALCVD). In the embodiments where thesecond dielectric layer 150 is made of SiOC:H, thesecond dielectric layer 150 can be formed by a PECVD or high density PECVD process including organo-silane precursors such as tetramethylsilane, trimethylsilane or combinations thereof, and thesecond dielectric layer 150 may have the dielectric constant ranging from about 2.2 to about 3.2. In the embodiments wherein thesecond dielectric layer 150 is made of SiOC, thesecond dielectric layer 150 can be formed by CVD, and the dielectric constant thereof may range from about 3.5 to about 3.9. In the embodiments where thesecond dielectric layer 150 is made of spin-on dielectric, thesecond dielectric layer 150 may include low-k spin-on dielectric materials, such as a composition with silicon-hydrogen (Si—H) bonds, such as hydrogen silsesquioxane (HSQ) or methylsilsesquioxane (MSQ), and the dielectric constant of thesecond dielectric layer 150 may range from about 2.1 to about 2.5. - The low-k dielectric material of the
second dielectric layer 150 is beneficial to reduce a parasitic capacitance between a gate stack and a contact plug formed in subsequently steps due to its low permittivity, and a resistive-capacitive (RC) time delay caused by the parasitic capacitance can be thus decreased. Moreover, the low-k seconddielectric layer 150 and thefirst dielectric layer 140 have different etch properties. For example, the first and seconddielectric layers first dielectric layer 140 has an etch resistance to etching the dummy gate stacks 130, and this etch resistance of thefirst dielectric layer 140 is higher than that of thesecond dielectric layer 150. Therefore, thefirst dielectric layer 140 is not easier to be etched or removed compared to thesecond dielectric layer 150 during the etching performed to the dummy gate stacks 130. Thesecond dielectric layer 150 can thus be protected by thefirst dielectric layer 140 during the etching performed to the dummy gate stacks 130. That is, the low-k feature can be protected by thefirst dielectric layer 140 during the etching performed to the dummy gate stacks 130. - Next, a third
dielectric layer 160 is conformally formed on thesecond dielectric layer 150. Portions of the thirddielectric layer 160 are located onsidewalls 131 of the dummy gate stacks 130, and these portions of the thirddielectric layer 160 can be referred to as dielectric features on thesidewalls 131 of the dummy gate stacks 130. In some embodiments, the thirddielectric layer 160 has a dielectric constant greater than about 3.7. Exemplary materials of the thirddielectric layer 160 may include silicon oxycarbonitride (SiOCN), silicon oxycarbide (SiOC), silicon oxide, silicon nitride, silicon oxy-nitride, non-porous dielectric materials or other suitable material. The thirddielectric layer 160 may be formed by a deposition process, such as an atomic layer deposition (ALD) process, a CVD process, a physical vapor deposition (PVD) process, a sputter deposition process or other suitable techniques. In the embodiments where the thirddielectric layer 160 is made of SiOCN or SiOC, the dielectric constant may range from about 3.5 to about 5. - In some embodiments, the
second dielectric layer 150 and the thirddielectric layer 160 have different etch properties. For example, the second and thirddielectric layers dielectric layer 160 has an etch resistance to an etching used to form source/drain regions in subsequent steps, and this etch resistance of the thirddielectric layer 160 is higher than that of thesecond dielectric layer 150. Therefore, the thirddielectric layer 160 is not easier to be etched or removed compared to thesecond dielectric layer 150 during the etching used to form the source/drain regions. Thesecond dielectric layer 150 can thus be protected by the thirddielectric layer 160 during the etching used to form the source/drain regions. That is, the low-k feature can be protected by the thirddielectric layer 160 during the etching used to form the source/drain regions. - Next, a filling
dielectric 170 is formed on the thirddielectric layer 160 and fills arecess 161 of the thirddielectric layer 160. In some embodiments, the filling dielectric 170 may overfill therecess 161 of the thirddielectric layer 160. The filling dielectric 170 may not remain on sidewalls of the final gate stacks. As such, the dielectric constant of the filling dielectric 170 can be not limited. Exemplary materials of the filling dielectric 170 may include silicon oxycarbonitride (SiOCN), silicon oxycarbide (SiOC), silicon oxide, silicon nitride, silicon oxy-nitride, non-porous dielectric materials or other suitable material. The filling dielectric 170 may be formed by a deposition process, such as an atomic layer deposition (ALD) process, a CVD process, a physical vapor deposition (PVD) process, a sputter deposition process or other suitable techniques. - Reference is made to
FIGS. 4A and 4B . A chemical mechanical polishing (CMP) process may be applied to removeexcessive filling dielectric 170 and expose top surfaces of the dummy gate stacks 130, the first, second and thirddielectric layers dielectric 170. - Reference is made to
FIGS. 5A and 5B . An etching process is performed on the first, second and thirddielectric layers dielectric 170, such that upper portions of the dummy gate stacks 130 are exposed. The etching process may be a wet etching process, a dry etching process or combinations thereof. After the etching process, upper portions of thesidewalls 131 of the dummy gate stacks 130 are exposed. For example, sidewalls of the gate masks 136 and upper portions of sidewalls of thedummy electrodes 134 are exposed. - Reference is made to
FIGS. 6A and 6B . Adielectric cap 180 is formed on the structure shown inFIGS. 5A and 5B . Therefore, thedielectric cap 180 at least caps the first, second and thirddielectric layers dielectric 170. In other words, the first, second and thirddielectric layers dielectric cap 180. Stated differently, thedielectric cap 180 is formed on the exposed portions of thesidewalls 131 of the dummy gate stacks 130. In some embodiments, thedielectric cap 180 has a dielectric constant greater than about 3.7. Exemplary materials of thedielectric cap 180 may include silicon oxycarbonitride (SiOCN), silicon oxycarbide (SiOC), silicon oxide, silicon nitride, silicon oxy-nitride, non-porous dielectric materials or other suitable material. Thedielectric cap 180 may be formed by a deposition process, such as an atomic layer deposition (ALD) process, a CVD process, a physical vapor deposition (PVD) process, a sputter deposition process or other suitable techniques. In the embodiments where thedielectric cap 180 is made of SiOCN or SiOC, the dielectric constant may range from about 3.5 to about 5. - In some embodiments, the
second dielectric layer 150 and thedielectric cap 180 have different etch properties. For example, thesecond dielectric layer 150 and thedielectric cap 180 have different etch resistance properties. For example, thedielectric cap 180 has an etch resistance to etching the dummy gate stacks 130, and this etch resistance of thedielectric cap 180 is higher than that of thesecond dielectric layer 150. Therefore, thedielectric cap 180 is not easier to be etched or removed compared to the underlying seconddielectric layer 150 during the etching performed to the dummy gate stacks 130. Thesecond dielectric layer 150 can thus be protected by the overlyingdielectric cap 180 during the etching performed to the dummy gate stacks 130. That is, the low-k feature can be protected by the overlyingdielectric cap 180 during the etching performed to the dummy gate stacks 130. Moreover, in some embodiments, thedielectric cap 180 has an etch resistance to the etching used to form source/drain regions in subsequent steps, and this etch resistance of thedielectric cap 180 is higher than that of the underlying seconddielectric layer 150. Therefore, thedielectric cap 180 is not easier to be etched or removed compared to the underlying seconddielectric layer 150 during the etching used to form the source/drain regions. Thesecond dielectric layer 150 can thus be protected by the overlyingdielectric cap 180 during the etching used to form the source/drain regions. That is, the low-k feature can be protected by the overlyingdielectric cap 180 during the etching used to form the source/drain regions. - Afterward, a chemical mechanical polishing (CMP) process may be applied to remove
excessive dielectric cap 180 outside the space between the dummy gate stacks 130 and expose top surfaces of the dummy gate stacks 130 and thedielectric cap 180. After the CMP process, the top surfaces of the dummy gate stacks 130 may be substantially level with that of thedielectric cap 180. - Reference is made to
FIGS. 7A and 7B . A removal process is performed to remove portions of thedielectric cap 180 and their underlying portions of filling dielectric 170, third, second and firstdielectric layers dielectric layers dielectric cap 180 can collectively serve asgate spacers 190 located on opposite sides of the dummy gate stacks 130. That is, twogate spacers 190 are respectively located on twoopposite sidewalls 131 of adummy gate stack 130. In onegate spacer 190, the first and thirddielectric layers second dielectric layer 150. That is, thefirst dielectric layer 140 is located on a sidewall of thesecond dielectric layer 150 proximal to thedummy gate stack 130, and the thirddielectric layer 160 is located on a sidewall of thesecond dielectric layer 150 distal to thedummy gate stack 130. Thedielectric cap 180 is wider than thesecond dielectric layer 150 and is located atop the first, second and thirddielectric layers second dielectric layer 150 is located between the first and thirddielectric layers dielectric cap 180. Thedielectric cap 180 and the first and thirddielectric layers second dielectric layer 150. Therefore, thesecond dielectric layer 150 having the lowest dielectric constant of thegate spacer 190 can be protected by the first and thirddielectric layers dielectric cap 180 against subsequent etching processes, such as the etching performed to the dummy gate stacks 130, the etching used to form the source/drain regions, or combinations thereof. - In some embodiments, this removal process may remove portions of the
semiconductor fin 110 as well. More particularly, portions of thesemiconductor fin 110 underlying the removed portions of thedielectric cap 180 may be removed or recessed, and a recess R is thus formed on thesemiconductor fin 110 and between thegate spacers 190. In other words, the remainingsemiconductor fin 110 has at least one source/drain portion 110 s andchannel portions 110 c. Thechannel portions 110 c underlie respect dummy gate stacks 130, and the source/drain portion 110 s is exposed by the dummy gate stacks 130 and thegate spacers 190. The source/drain portion 110 s has a top lower than that of thechannel portions 110 c due to this removal process. In other words, this removal process may cause height loss to the exposed portion of thesemiconductor fin 110. In some embodiments, the top of the source/drain portion 110 s of thesemiconductor fin 110 is higher than that of theisolation dielectric 120. Stated differently, the source/drain portion 110 s protrudes with respect to theisolation dielectric 120. In some embodiments, a portion of thesemiconductor fin 110 protruding with respect to theisolation dielectric 120 may be removed, so that the source/drain portion 110 s may be formed as having a top lower than that of theisolation dielectric 120. - The removal process performed in
FIGS. 7A and 7B may be, for example, an etching process, such as an anisotropic etching process. In some embodiments, thegate spacers 190 may be used to offset subsequently formed epitaxy structures on thesemiconductor fin 110, such as source/drain epitaxy structures. The gate spacers 190 may further be used for designing or modifying the source/drain regions (junction) profile. Removal may include a lithography process to facilitate the etching process. The lithography process may include photoresist coating (e.g., spin-on coating), soft baking, mask aligning, exposure, post-exposure baking, developing the photoresist, rinsing, drying (e.g., hard baking), other suitable processes, or combinations thereof. Alternatively, the lithography process is implemented or replaced by other methods, such as maskless photolithography, electron-beam writing, and ion-beam writing. In yet some other embodiments, the lithography process could implement nanoimprint technology. In the depicted embodiments, thedielectric layers gate spacers 190. In some other embodiments, at least some portions of thedielectric layers isolation dielectric 120 and/or sidewalls of thesemiconductor fin 110. - Reference is made to
FIGS. 8A and 8B . A trimming process is preformed to the exposed source/drain portion 110 s, so that the source/drain portion 110 s protruding above theisolation dielectric 120 may be trimmed as a thinned source/drain portion 112 s. The thinned source/drain portion 112 s may be referred to as thinner semiconductor strips on thethicker semiconductor fin 110. The trimming or thinning process may include an etching process, such as a wet etching process, and the etchant may include a solution of HF, hydrogen peroxide (H2O2), and acetic acid (CH3COOH), for example. - The etch resistance of the
dielectric cap 180 to this etching process is higher than that of thesecond dielectric layer 150. That is, the etch resistance of thedielectric cap 180 to etching the source/drain portion 110 s of thesemiconductor substrate 100 is higher than that of thesecond dielectric layer 150. Therefore, thedielectric cap 180 is not easier to be etched or removed compared to the underlying seconddielectric layer 150 during the etching process to trim or thin thesemiconductor fin 110. Thesecond dielectric layer 150 can thus be protected by the overlyingdielectric cap 180 during this trimming process. That is, the low-k feature can be protected by the overlyingdielectric cap 180 during this trimming process. Similarly, the etch resistance of the thirddielectric layer 160 to this etching process is higher than that of thesecond dielectric layer 150. That is, the etch resistance of the thirddielectric layer 160 to etching the source/drain portion 110 s of thesemiconductor substrate 100 is higher than that of thesecond dielectric layer 150. As such, the low-k feature can be protected by the adjacent thirddielectric layer 160 during this trimming process. - As a result of the trimming or thinning, the width of the thinned source/
drain portion 112 s is reduced from its original width W2 before the thinning to width W1 after the thinning. In some embodiments, width W1 is between about 50 percent and about 70 percent of width W2, although width W1 may be greater or smaller. After the trimming process, a lightly doped source and drain (LDD) implantation process is performed to the thinned source/drain portion 112 s. One or more annealing processes may be performed to the thinned source/drain portion 112 s after performing the LDD implantation. - Reference is made to
FIGS. 9A and 9B . Anepitaxy structure 200 is formed on the thinned source/drain portion 112 s of thesemiconductor fin 110. The thinned source/drain portion 112 s protruding above theisolation dielectric 120 can be wrapped by theepitaxy structure 200, as shown inFIG. 9B . Theepitaxy structure 200 and the thinned source/drain portion 112 s wrapped by theepitaxy structure 200 can be collectively referred to as a source/drain region with cladding. As illustrated inFIGS. 7B, 8B and 9B , the formation of the source/drain region includes thinning, but not totally removing, an original portion ofsemiconductor fin 110 above theisolation dielectric 120, and then epitaxially growingepitaxy structure 200 on the thinned portion of thesemiconductor fin 110 above theisolation dielectric 120. This may be advantageous to maintain the strain inchannel portions 110 c, and may be advantageous to reduce height losses of thegate spacers 190. - The
epitaxy structure 200 may be formed using one or more epitaxy or epitaxial (epi) processes, such that a Si feature, a SiGe feature, and/or other suitable features can be formed in a crystalline state around the thinned source/drain portion 112 s of thesemiconductor fin 110. In some embodiments, the lattice constant of theepitaxy structures 200 is different from the lattice constant of thesemiconductor fin 110, so that thechannel portions 110 c of thesemiconductor fin 110 can be strained or stressed by theepitaxy structures 200 to improve carrier mobility of the semiconductor device and enhance the device performance. The epitaxy processes include CVD deposition techniques (e.g., vapor-phase epitaxy (VPE) and/or ultra-high vacuum CVD (UHV-CVD)), molecular beam epitaxy, and/or other suitable processes. The epitaxy process may use gaseous and/or liquid precursors, which interact with the composition of the thinned source/drain portion 112 s of the semiconductor fin 110 (e.g., silicon). Thus, a strained channel can be achieved to increase carrier mobility and enhance device performance. Theepitaxy structure 200 may be in-situ doped. The doping species include P-type dopants, such as boron or BF2; N-type dopants, such as phosphorus or arsenic; and/or other suitable dopants including combinations thereof. If theepitaxy structure 200 is not in-situ doped, a second implantation process (i.e., a junction implant process) is performed to dope theepitaxy structure 200. One or more annealing processes may be performed to activate theepitaxy structure 200. The annealing processes include rapid thermal annealing (RTA) and/or laser annealing processes. - Reference is made to
FIGS. 10A and 10B . An interlayer dielectric (ILD)layer 210 is formed on thesubstrate 100 the cover thesemiconductor fin 110, the dummy gate stacks 130, thegate spacers 190 and theepitaxy structure 200. TheILD layer 210 includes silicon oxide, silicon nitride, silicon oxynitride, silicon carbide, low-k dielectric material or a combination thereof. TheILD layer 210 includes a single layer or multiple layers. TheILD layer 210 is formed by a suitable technique, such as CVD. Afterward, a chemical mechanical polishing (CMP) process may be applied to removeexcessive ILD layer 210 and expose top surfaces of the dummy gate stacks 130 to a subsequent dummy gate removal process. - Reference is made to
FIGS. 11A and 11B . At least portions of the dummy gate stacks 130 (seeFIGS. 10A and 10B ) are removed to form gate trenches O with thegate spacers 190 as their sidewalls. That is, the gate trenches O are defined by thegate spacers 190. In some embodiments, thedummy electrodes 134 and the gate masks 136 are removed while thegate dielectrics 132 retain as shown inFIG. 11A . In the embodiments where thegate dielectrics 132 include high-k dielectric materials, the high-k gate dielectrics 132 are formed prior to the formation of thegate spacers 190, so that inner walls of thegate spacers 190 may not be blanket covered by high-k dielectric materials. Stated differently, inner walls of thegate spacers 190 may be substantially free from coverage of high-k dielectric materials in some embodiments. This arrangement may be beneficial to reduce the parasitic capacitance between the subsequently formed gate stack and contact plug. Alternatively, in some other embodiments, thegate dielectrics 132 can be removed as well. The dummy gate stacks 130 may be removed by dry etching, wet etching, or a combination of dry and wet etching. For example, a wet etching process may include exposure to a hydroxide containing solution (e.g., ammonium hydroxide), deionized water, and/or other suitable etchant solutions. - The etch resistance of the
dielectric cap 180 to this etching process is higher than that of thesecond dielectric layer 150. That is, the etch resistance of thedielectric cap 180 to etching the gate trenches O is higher than that of thesecond dielectric layer 150. Therefore, thedielectric cap 180 is not easier to be etched or removed compared to the underlying seconddielectric layer 150 during the etching the gate trenches O. Thesecond dielectric layer 150 can thus be protected by the overlyingdielectric cap 180 during the etching the gate trenches O. That is, the low-k feature can be protected by the overlyingdielectric cap 180 during the etching the gate trenches O. Similarly, the etch resistance of thefirst dielectric layer 140 to the etching the gate trenches O is higher than that of thesecond dielectric layer 150. As such, the low-k feature can be protected by the adjacent firstdielectric layer 140 during the etching the gate trenches O. - Reference is made to
FIGS. 12A and 12B .Gate conductors 222 are respectively formed in the gate trenches O between thegate spacers 190. Thegate conductors 222 and the respectiveunderlying gate dielectrics 132 can be collectively referred to as gate stacks 220. The gate stacks 220 straddle thesemiconductor fin 110 and extend along thegate spacers 190. The gate spacers 190 are present onsidewalls 221 of the gate stacks 220. In some embodiments, thegate conductors 222 may include work function metals to provide suitable work functions for the gate stacks 220. For example, if a P-type work function metal (P-metal) for a PMOS device is desired, P-type work function materials may be used. Examples of P-type work function materials include, but are not limited to, titanium nitride (TiN), tungsten nitride (WN), tungsten (W), ruthenium (Ru), palladium (Pd), platinum (Pt), cobalt (Co), nickel (Ni), conductive metal oxides, and/or other suitable materials. On the other hand, if an N-type work function metal (N-metal) for NMOS devices is desired, N-type metal materials may be used. Examples of N-type work function materials include, but are not limited to, titanium aluminide (TiAl), titanium aluminium nitride (TiAlN), carbo-nitride tantalum (TaCN), hafnium (Hf), zirconium (Zr), titanium (Ti), tantalum (Ta), aluminum (Al), metal carbides (e.g., hafnium carbide (HfC), zirconium carbide (ZrC), titanium carbide (TiC), aluminum carbide (AlC)), aluminides, and/or other suitable materials. Thegate conductors 222 may further include filling metals located on the work function metals and filling recesses in the work function metals. The filling metals may include tungsten, aluminum, copper, nickel, cobalt, titanium, tantalum, titanium nitride, tantalum nitride, nickel silicide, cobalt silicide, TaC, TaSiN, TaCN, TiAl, TiAlN, or other suitable materials. - Exemplary method of forming the
gate conductors 222 may include blanket forming one or more work function metal layers over the structure shown inFIGS. 11A and 11B , forming filling metal over the work function metal layers, wherein some portions of the filling metal overfill the gate trenches O shown inFIG. 11A , and then performing a CMP process to remove excessive filling metal and work function metal layers outside the gate trenches O. - Reference is made to
FIGS. 13A and 13B . A conductive feature, such as acontact plug 230, is formed through theILD layer 210 and contacts with a top of theepitaxy structure 200. Thecontact plug 230 can thus serve as source/drain contacts. The low-k seconddielectric layer 150 is located between thecontact plug 230 and thegate stack 220, and therefore, the low-k seconddielectric layer 150 can reduce the parasitic capacitance between thegate stack 220 and thecontact plug 230, thereby decreasing the RC time delay. - Exemplary formation method of the
contact plug 230 may include forming a contact hole by one or more etching processes to sequentially etch through theILD layer 210 down to theepitaxy structure 200, and depositing metal or other suitable conductive materials in the contact hole by a deposition process, such as a CVD process, to form thecontact plug 230. - In some embodiments, there is a low-k dielectric feature in the gate spacer between the contact plug and the gate stack. This low-k dielectric feature is advantageous to reduce the parasitic capacitance between the gate stack and the contact plug. The RC time delay can be decreased, accordingly. Moreover, the low-k dielectric feature is straddled by other dielectric feature. Therefore, the low-k dielectric feature can be protected against etching processes, such as etching in a gate replacement process, etching used to form source/drain regions, or combinations thereof.
- According to some embodiments, a semiconductor device includes a semiconductor substrate, a gate stack and at least one gate spacer. The gate stack is located on the semiconductor substrate. The gate spacer is located on a sidewall of the gate stack. The gate spacer includes a first dielectric feature and a dielectric cap capping the first dielectric feature. The first dielectric feature has a dielectric constant less than that of the dielectric cap.
- According to some embodiments, a semiconductor device includes a semiconductor substrate, a gate stack and at least one gate spacer. The gate stack is located on the semiconductor substrate. The gate spacer is located on a sidewall of the gate stack. The gate spacer includes a first dielectric feature and a second dielectric feature straddling the first dielectric feature. The first dielectric feature has a dielectric constant less than that of the second dielectric feature.
- According to some embodiments, a method of forming a semiconductor device includes forming a gate stack on a semiconductor substrate, forming a first dielectric feature on a sidewall of the gate stack, removing a portion of the first dielectric feature such that a portion of the sidewall of the gate stack is exposed, and forming a dielectric cap on the exposed portion of the sidewall of the gate stack.
- The foregoing outlines features of several embodiments so that those skilled in the art may better understand the aspects of the present disclosure. Those skilled in the art should appreciate that they may readily use the present disclosure as a basis for designing or modifying other processes and structures for carrying out the same purposes and/or achieving the same advantages of the embodiments introduced herein. Those skilled in the art should also realize that such equivalent constructions do not depart from the spirit and scope of the present disclosure, and that they may make various changes, substitutions, and alterations herein without departing from the spirit and scope of the present disclosure.
Claims (22)
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