US20150303206A1 - Methods Of Forming Ferroelectric Capacitors - Google Patents
Methods Of Forming Ferroelectric Capacitors Download PDFInfo
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- US20150303206A1 US20150303206A1 US14/254,327 US201414254327A US2015303206A1 US 20150303206 A1 US20150303206 A1 US 20150303206A1 US 201414254327 A US201414254327 A US 201414254327A US 2015303206 A1 US2015303206 A1 US 2015303206A1
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Images
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B53/00—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors
- H10B53/30—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors characterised by the memory core region
-
- H01L27/11507—
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/223—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a gaseous phase
- H01L21/2236—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a gaseous phase from or into a plasma phase
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/55—Capacitors with a dielectric comprising a perovskite structure material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
Definitions
- Embodiments disclosed herein pertain to methods of forming ferroelectric capacitors.
- One component used in integrated circuitry is a capacitor.
- Such a component includes at least two electrical conductors separated by a dielectric. Energy may be electrostatically stored in an electric field within the dielectric.
- Memory is one type of integrated circuitry which may include capacitors.
- Memory may be fabricated in one or more arrays of individual memory cells. Memory cells may be written to, or read from, using digit lines (which may also be referred to as bit lines, data lines, sense lines, or data/sense lines) and access lines (which may also be referred to as word lines).
- the digit lines may conductively interconnect memory cells along columns of the array, and the access lines may conductively interconnect memory cells along rows of the array. Each memory cell may be uniquely addressed through the combination of a digit line and an access line.
- FeRAM ferroelectric random access memory
- Individual memory cells in FeRAM may include a ferroelectric capacitor. These capacitors have ferroelectric dielectric material as at least part of the capacitor dielectric. Ferroelectric materials exhibit a spontaneous electric polarization that can be reversed by the application of an external electric field. In a ferroelectric material, polarization occurs in accordance with a suitable applied voltage between two electrodes, and such polarization remains after the applied voltage has been removed. The polarization can be reversed by application of a suitable inverted voltage. Each polarization state has different capacitance from the other, and which ideally can be used to store and read a memory state without reversing the polarization state until such is desired to be changed. FeRAM memory cells incorporating a ferroelectric capacitor are thereby non-volatile due to the bi-stable characteristics of the ferroelectric material that forms a part of the capacitor. Ferroelectric capacitors may also be used in integrated circuitry other than memory.
- ferroelectric capacitors Properties associated with ferroelectric capacitors include endurance (how many programmed cycle changes can occur before device failure), retention (maintaining a programmed state without an un-programmed state change), and imprint (becoming resistive to programmed polarization reversal evidenced by a lateral shift of the hysteresis loop). Accordingly, it is desirable to have high endurance, high retention, and low imprint in ferroelectric capacitors.
- FIG. 1 is a diagrammatic sectional view of a substrate fragment in process in accordance with an embodiment of the invention.
- FIG. 5 is a diagrammatic sectional view of an alternate embodiment substrate fragment depicting alternate processing to that of FIGS. 3 and 4 .
- substrate refers to any supporting structure, including, but not limited to, the semiconductive substrates described above.
- Partially or wholly fabricated components of integrated circuitry may be formed as part of, or be elevationally inward of, substrate material 12 .
- the depicted portion of substrate material 12 may be conductive (i.e., electrically), dielectric, and/or semiconductive.
- a specific example is conductively-doped semiconductive material such as monocrystalline silicon and/or polycrystalline silicon.
- carbon content in outermost region 16 is about 0.01 to 10 atomic percent after the treating, and in one embodiment is about 1 to 5 atomic percent after the treating (i.e., meaning on average if not homogenous regarding carbon content).
- Outermost region 16 and innermost region 18 individually may have carbon content of at least 0.01 atomic percent before and after the act of treating. Alternately in one embodiment, each may individually be devoid of carbon before the treating. In this document, “devoid of carbon” means from zero carbon content up to no greater than 10 15 carbon atoms (if present in elemental form) and carbon-containing molecules per cubic centimeter.
- the act of treating may slightly increase thickness (not shown) of the inner electrode material. Alternately, the act of treating does not increase thickness of the inner electrode material.
- the method is devoid of forming any non-ferroelectric dielectric oxide between any of treated outermost region 16 and ferroelectric capacitor dielectric material 30 (as shown).
- at least one of a non-ferroelectric dielectric oxide, a non-ferroelectric dielectric oxynitride, and a non-ferroelectric dielectric carbon oxynitride may form, for example as shown with respect to a substrate 10 c in FIG. 7 .
- Like numerals from the above-described embodiments have been used where appropriate, with some differences being indicated with the suffix “c” or with a different numeral.
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Abstract
Description
- Embodiments disclosed herein pertain to methods of forming ferroelectric capacitors.
- One component used in integrated circuitry is a capacitor. Such a component includes at least two electrical conductors separated by a dielectric. Energy may be electrostatically stored in an electric field within the dielectric.
- Memory is one type of integrated circuitry which may include capacitors. Memory may be fabricated in one or more arrays of individual memory cells. Memory cells may be written to, or read from, using digit lines (which may also be referred to as bit lines, data lines, sense lines, or data/sense lines) and access lines (which may also be referred to as word lines). The digit lines may conductively interconnect memory cells along columns of the array, and the access lines may conductively interconnect memory cells along rows of the array. Each memory cell may be uniquely addressed through the combination of a digit line and an access line.
- Memory cells may be volatile or non-volatile. Non-volatile memory cells can store data for extended periods of time, in many instances including when the computer is turned off. Volatile memory dissipates and therefore requires being refreshed/rewritten, in many instances multiple times per second. Regardless, memory cells are configured to retain or store memory in at least two different selectable states. In a binary system, the states are considered as either a “0” or a “1”. In other systems, at least some individual memory cells may be configured to store more than two levels or states of information.
- One type of non-volatile memory is ferroelectric random access memory (FeRAM). Individual memory cells in FeRAM may include a ferroelectric capacitor. These capacitors have ferroelectric dielectric material as at least part of the capacitor dielectric. Ferroelectric materials exhibit a spontaneous electric polarization that can be reversed by the application of an external electric field. In a ferroelectric material, polarization occurs in accordance with a suitable applied voltage between two electrodes, and such polarization remains after the applied voltage has been removed. The polarization can be reversed by application of a suitable inverted voltage. Each polarization state has different capacitance from the other, and which ideally can be used to store and read a memory state without reversing the polarization state until such is desired to be changed. FeRAM memory cells incorporating a ferroelectric capacitor are thereby non-volatile due to the bi-stable characteristics of the ferroelectric material that forms a part of the capacitor. Ferroelectric capacitors may also be used in integrated circuitry other than memory.
- Properties associated with ferroelectric capacitors include endurance (how many programmed cycle changes can occur before device failure), retention (maintaining a programmed state without an un-programmed state change), and imprint (becoming resistive to programmed polarization reversal evidenced by a lateral shift of the hysteresis loop). Accordingly, it is desirable to have high endurance, high retention, and low imprint in ferroelectric capacitors.
-
FIG. 1 is a diagrammatic sectional view of a substrate fragment in process in accordance with an embodiment of the invention. -
FIG. 2 is a view of theFIG. 1 substrate at a processing step subsequent to that shown byFIG. 1 . -
FIG. 3 is an enlargement of a portion of theFIG. 2 substrate subsequent to an act of treating shown byFIG. 2 . -
FIG. 4 is a diagrammatic sectional view of an alternate embodiment substrate fragment depicting alternate processing to that ofFIG. 3 . -
FIG. 5 is a diagrammatic sectional view of an alternate embodiment substrate fragment depicting alternate processing to that ofFIGS. 3 and 4 . -
FIG. 6 is a view of theFIG. 2 substrate at a processing step subsequent to that shown byFIG. 2 . -
FIG. 7 is a diagrammatic sectional view of an alternate embodiment substrate fragment depicting alternate processing to that ofFIG. 6 . -
FIG. 8 is a view of theFIG. 6 substrate at a processing step subsequent to that shown byFIG. 6 . - Embodiments of the invention encompass methods of forming ferroelectric capacitors, for example as might be used in FeRAM or other integrated circuitry. Example embodiments are described with references to
FIGS. 1-8 . Referring toFIG. 1 , anexample substrate fragment 10 comprises abase substrate 12, which may be a semiconductor substrate. In the context of this document, the term “semiconductor substrate” or “semiconductive substrate” is defined to mean any construction comprising semiconductive material, including, but not limited to, bulk semiconductive materials such as a semiconductive wafer (either alone or in assemblies comprising other materials thereon), and semiconductive material layers (either alone or in assemblies comprising other materials). The term “substrate” refers to any supporting structure, including, but not limited to, the semiconductive substrates described above. Partially or wholly fabricated components of integrated circuitry may be formed as part of, or be elevationally inward of,substrate material 12. The depicted portion ofsubstrate material 12 may be conductive (i.e., electrically), dielectric, and/or semiconductive. A specific example is conductively-doped semiconductive material such as monocrystalline silicon and/or polycrystalline silicon. - Any of the materials and/or structures described herein may be homogenous or non-homogenous, and regardless may be continuous or discontinuous over any material that such overlie. As used herein, “different composition” only requires those portions of two stated materials that may be directly against one another to be chemically and/or physically different, for example if such materials are not homogenous. If the two stated materials are not directly against one another, “different composition” only requires that those portions of the two stated materials that are closest to one another be chemically and/or physically different if such materials are not homogenous. In this document, a material or structure is “directly against” another when there is at least some physical touching contact of the stated materials or structures relative one another. In contrast, “over”, “on”, and “against” not preceded by “directly”, encompass “directly against” as well as construction where intervening material(s) or structure(s) result(s) in no physical touching contact of the stated materials or structures relative one another. Further, unless otherwise stated, each material may be formed using any suitable existing or yet-to-be-developed technique, with atomic layer deposition, chemical vapor deposition, physical vapor deposition, epitaxial growth, diffusion doping, and ion implanting being examples.
- Inner conductive
capacitor electrode material 14 has been formed oversubstrate 12. Such may comprise any suitable conductive material, such as elemental metals, an alloy of two or more elemental metals, conductive metal compounds, and/or conductively-doped semiconductive material. Specific example materials include TiN, TiCN, TiAlN, TiAlCN, Ti—W, Ru—TiN, and RuCN. In one embodiment, inner conductivecapacitor electrode material 14 is metallic, andsubstrate material 12 that is directly againstmaterial 14 is devoid of metal. In the context of this document, metal means any one or more of elemental metal(s), alloy(s) of two or more elemental metals, and one or more conductive metal compounds. Metallic means containing at least ninety molar percent metal. Further, devoid of metal means from zero to no more than 1015 metal atoms per cubic centimeter if containing elemental form metal(s) or alloy(s) and metal-containing molecules per cubic centimeter if containing metal compound(s). - Inner conductive
capacitor electrode material 14 may be considered as comprising anoutermost region 16 having anoutermost surface 17 and aninnermost region 18 having aninnermost surface 19. The example processing depicted in the figures is in fabrication of a horizontal capacitor, although vertical or other orientations may be used. A horizontal capacitor may be characterized by two capacitor electrodes at different elevations having the capacitor dielectric elevationally there-between. In this document, vertical is a direction generally orthogonal to horizontal, with horizontal referring to a general direction along a primary surface relative to which a substrate is processed during fabrication. Further, vertical and horizontal as used herein are generally perpendicular directions relative one another independent of orientation of the substrate in three dimensional space. Additionally, elevational, above, and below are with reference to the vertical direction. Accordingly in the depicted example, relative tomaterial 14,region 16 comprises an elevationally outermost region andregion 18 comprises an elevationally innermost region. -
Outermost region 16 andinnermost region 18 may be of the same composition or of different compositions relative one another, and may be un-defined or in-distinguishable from one another at least upon initial formation ofconductive electrode material 14. Additionally,regions regions region 16 being shown smaller than that ofregion 18. As more specific examples, an example thickness for all of inner conductivecapacitor electrode material 14 is about 25 to 300 Angstroms, with an example thickness ofoutermost region 16 being about 5 to 20 Angstroms. In one embodimentoutermost region 16 has a thickness that is no greater than about 20 Angstroms. - Referring to
FIG. 2 and afterinner electrode material 14 has been formed atopsubstrate material 12,outermost region 16 ofinner electrode material 14 is treated to increase carbon content (i.e., in elemental, molecular, or other form) inoutermost region 16 from what it was prior to the act of treating (i.e., regardless of whether any is present before such treating). Such act of treating is depicted inFIG. 2 by downwardly directed arrows. In one embodiment,outermost region 16 may be homogenous at least regarding carbon content after the treating, and in one embodiment may not be homogenous at least regarding carbon content after the treating. In one example, carbon content inoutermost region 16 is about 0.01 to 10 atomic percent after the treating, and in one embodiment is about 1 to 5 atomic percent after the treating (i.e., meaning on average if not homogenous regarding carbon content).Outermost region 16 andinnermost region 18 individually may have carbon content of at least 0.01 atomic percent before and after the act of treating. Alternately in one embodiment, each may individually be devoid of carbon before the treating. In this document, “devoid of carbon” means from zero carbon content up to no greater than 1015 carbon atoms (if present in elemental form) and carbon-containing molecules per cubic centimeter. The act of treating may slightly increase thickness (not shown) of the inner electrode material. Alternately, the act of treating does not increase thickness of the inner electrode material. -
FIG. 3 is an enlargement of an outermost portion ofconductive electrode material 14 illustrating one example embodiment after the treating, and showsoutermost region 16 having homogenous carbon distribution by uniform dots/stippling.FIG. 4 illustrates an alternateembodiment substrate fragment 10 a to that ofFIG. 3 and whereinoutermost region 16 a is not homogenous regarding carbon content. Like numerals from the above-described embodiments have been used where appropriate, with some differences being indicated with the suffix “a” or with a different numeral. InFIG. 4 , an exampleoutermost part 25 ofoutermost region 16 a has greater carbon content (i.e., on average) than aninnermost part 27 ofoutermost region 16 a after the act of treating.Outermost part 25 andinnermost part 27 may individually be homogenous or non-homogenous at least regarding carbon content, with non-homogeneity of carbon content being shown for each in theFIG. 4 example. Regardless,parts FIG. 4 additionally is intended to show but one example embodiment wherein carbon content is essentially linearly decreasing in concentration from outwardly to inwardly withinregion 16 a, although other concentration gradients may be used. -
FIG. 5 depicts an alternate exampleembodiment substrate fragment 10 b to that ofFIGS. 3 and 4 , and also whereoutermost region 16 b is not homogenous at least regarding carbon content. Like numerals from the above-described embodiments have been used where appropriate, with some differences being indicated with the suffix “b” or with a different numeral. InFIG. 5 , aregion 29 of greatest carbon concentration inoutermost region 16 b is displaced inwardly fromoutermost surface 17 after the treating.Region 29 is shown as being elevationally central withinoutermost region 16 b, although other elevational positioning may be used. - Treating may occur by one or more of any suitable existing or yet-to-be-developed manners which provide carbon into
outermost region 16/16 a/16 b. In one embodiment, the treating comprises ion implanting carbon material (i.e., with or without plasma), and in one embodiment comprises plasma immersion ion implantation (sometimes referred to as plasma doping [PLAD]). As one example for PLAD, substrate chuck temperature may be about room temperature to 100° C., substrate chuck bias about 500 to 5,000 V, chamber pressure about 1 to 20 mTorr, plasma power about 500 to 2,000 W, and hydrocarbon (e.g., methane, C2H6, C2H4, C2H2, C3H6, etc.) flow to the chamber at about 100 to 500 sccm for about 3 minutes to one hour, for example to implant carbon-containing material at a dose of about 5×1015 atoms/cm2. - As another example, the treating can comprise diffusion of carbon-containing material into and through
outermost surface 17 ofoutermost region 16/16 a/16 b (i.e., in the absence of ion implanting). In one embodiment, the carbon-containing material may be in plasma phase over the outermost surface during the diffusion. In one embodiment, the treating may comprise gas-phase diffusion (i.e., meaning in the absence of plasma). One such example is processing chamber temperature about 300 to 600° C., pressure about 1 mTorr to about 5 Torr, hydrocarbon flow about 250 to 300 sccm for about 3 minutes to one hour. An example treating including exposure to plasma includes substrate temperature about 275 to 550° C., pressure about 1 mTorr to about 5 Torr, an unbiased wafer chuck, plasma power about 1,000 to 2,000 W, and about 48% volumetric flow of H2 and about 58% volumetric flow of C3H6. - Referring to
FIG. 6 , and after the act of treating, ferroelectriccapacitor dielectric material 30 is formed over treatedoutermost region 16 ofinner electrode material 14. Any suitable existing or yet-to-be-developed ferroelectric dielectric material may be used. In one embodiment, the ferroelectric capacitor dielectric material comprises one of more of transition metal oxide, zirconium, zirconium oxide, hafnium, hafnium oxide, lead zirconium titanate, tantalum oxide, and barium strontium titanate, and having dopant therein which comprises one or more of silicon, aluminum, lanthanum, yttrium, erbium, calcium, magnesium, strontium, and a rare earth element. In one embodiment, forming the ferroelectric electric capacitor dielectric comprises depositing an initially amorphous phase solid followed by crystalline phase transformation of the amorphous phase solid (i.e., after its deposition). By way of examples, any of the materials and processing described in U.S. Pat. No. 7,709,359 to Boescke et al. may be used, and which is herein incorporated by reference. Regardless, an example thickness for ferroelectriccapacitor dielectric material 30 is about 15 to 200 Angstroms.FIG. 6 shows the forming of ferroelectriccapacitor dielectric material 30 to be directly against treatedoutermost region 16 ofinner electrode material 14. Regardless, in one embodiment, the method is devoid of forming any non-ferroelectric dielectric oxide between any of treatedoutermost region 16 and ferroelectric capacitor dielectric material 30 (as shown). In one embodiment, at least one of a non-ferroelectric dielectric oxide, a non-ferroelectric dielectric oxynitride, and a non-ferroelectric dielectric carbon oxynitride may form, for example as shown with respect to asubstrate 10 c inFIG. 7 . Like numerals from the above-described embodiments have been used where appropriate, with some differences being indicated with the suffix “c” or with a different numeral.FIG. 7 shows formation ofmaterial 33 between at least some (all as shown) ofoutermost region 16 and ferroelectriccapacitor dielectric material 30, withmaterial 33 comprising at least one of a non-ferroelectric dielectric oxide, a non-ferroelectric dielectric oxynitride, and a non-ferroelectric dielectric carbon oxynitride. Ifmaterial 33 is formed discontinuously over outermost region 16 (not shown), another some ofoutermost region 16 and ferroelectriccapacitor dielectric material 30 may be directly against one another (not shown). - In one embodiment,
outermost region 16/16 a/16 b is formed to comprise oxygen at least after forming ferroelectriccapacitor dielectric material 30 there-over. Alternately, and in one embodiment, outermost region is formed to be devoid of oxygen at least after forming ferroelectriccapacitor dielectric material 30. In this document “devoid of oxygen” means from zero to no more than 1015 oxygen atoms (whether in elemental form or in compound form) per cubic centimeter. - Ideally, little if any non-ferroelectric oxide is formed and
outermost region 16/16 a/16 b is devoid of oxygen in accordance with one motivation of the invention, as such can have undesired adverse effects on the ferroelectric capacitor being formed. Further, embodiments of the invention may overcome some drawbacks of prior art methods of fabricating capacitors in precluding or at least reducing formation of non-ferroelectric oxide and keepingoutermost region 16/16 a/16 b devoid of oxygen. For example, using TiN as an inner capacitor electrode material can facilitate desired crystallization of a ferroelectric capacitor dielectric material as disclosed in U.S. Pat. No. 7,709,359 to Boescke et al. when TiN is initially deposited to be amorphous. Interface of such amorphous ferroelectric material with underlying TiN can undesirably form non-ferroelectric TiOx between TiN and the ferroelectric capacitor dielectric material (e.g.,material 33 inFIG. 7 ). Alternately or additionally, oxygen from an oxygen-containing ferroelectric capacitor dielectric material may enter the TiN, thereby forming a TiON material (independent of whether a separate TiOx layer is formed). Provision of carbon withinoutermost region 16/16 a/16 b ofinner electrode material 14/14 a/14 b may eliminate or at least reduce formation of a metal oxide layer and/or injection of oxygen into underlying inner electrode material, thereby facilitating crystallization of such ferroelectric capacitor dielectric material and/or producing a better ferroelectric capacitor dielectric material of known or desired composition and/or properties. For example, one or more of endurance, retention, or imprint may be improved. - Referring to
FIG. 8 , outer conductivecapacitor electrode material 40 has been formed over ferroelectriccapacitor dielectric material 30. Example materials include those described above forinner electrode material 14, andouter electrode material 40 may be of the same composition or of different composition from that ofinner material 14. - Ferroelectric capacitors fabricated in accordance with the invention may be incorporated in ferroelectric random access memory cells and in other circuitry.
- In some embodiments, a method of forming a ferroelectric capacitor comprises forming inner conductive capacitor electrode material over a substrate. After forming the inner electrode material, an outermost region of the inner electrode material is treated to increase carbon content in the outermost region from what it was prior to the treating. After the treating, ferroelectric capacitor dielectric material is formed over the treated outermost region of the inner electrode material. Outer conductive capacitor electrode material is formed over the ferroelectric capacitor dielectric material.
- In compliance with the statute, the subject matter disclosed herein has been described in language more or less specific as to structural and methodical features. It is to be understood, however, that the claims are not limited to the specific features shown and described, since the means herein disclosed comprise example embodiments. The claims are thus to be afforded full scope as literally worded, and to be appropriately interpreted in accordance with the doctrine of equivalents.
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