US20140170387A1 - Glass plate - Google Patents
Glass plate Download PDFInfo
- Publication number
- US20140170387A1 US20140170387A1 US14/189,072 US201414189072A US2014170387A1 US 20140170387 A1 US20140170387 A1 US 20140170387A1 US 201414189072 A US201414189072 A US 201414189072A US 2014170387 A1 US2014170387 A1 US 2014170387A1
- Authority
- US
- United States
- Prior art keywords
- chamfered
- glass plate
- main flat
- flat surface
- curvature radius
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
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Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
- B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
- B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
- B24B9/08—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133302—Rigid substrates, e.g. inorganic substrates
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
- G02F1/133331—Cover glasses
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/24488—Differential nonuniformity at margin
Definitions
- the present invention relates to a glass plate.
- a glass substrate may be used as a glass plate on which a function layer such as a thin film transistor (TFT) or a color filter (CF) is formed.
- a glass plate may be used as a cover glass for improving the aesthetics of a display or increasing protection of the display.
- Patent Document 1 the quality of a glass plate is evaluated according to flexural strength. However, in some cases, it may be suitable to evaluate the quality of the glass plate according to impact fracture strength. For example, because a glass plate can be hardly bent in a case where the glass plate is mounted on an image display apparatus, impact fracture strength has greater significance than flexural strength.
- the present invention may provide a glass plate that substantially obviates one or more of the problems caused by the limitations and disadvantages of the related art.
- an embodiment of the present invention provides a glass plate including a main flat surface, an edge surface orthogonal to the main flat surface, and a chamfered surface adjacent to the main flat surface and the edge surface.
- the chamfered surface In a cross-sectional surface of the glass plate that is orthogonal to the edge surface and that is orthogonal to the main flat surface, the chamfered surface has a curvature radius greater than or equal to 50 ⁇ m at an intersection point between the chamfered surface and a straight line inclined 45 degrees with respect to the main flat surface and a curvature radius ranging from 20 ⁇ m to 500 ⁇ m at an intersection point between the chamfered surface and a straight line inclined 15 degrees with respect to the main flat surface.
- FIG. 1 is a side view illustrating a glass plate according to an embodiment of the present invention
- FIG. 2 is a schematic view for describing an example of a method for forming a chamfered part
- FIG. 3 is a schematic diagram for describing an example of another method for forming a chamfered part
- FIG. 4 is a schematic diagram for describing an example of forming a curved surface part and a curved part (1);
- FIG. 5 is a schematic diagram for describing an example of forming a curved surface part and a curved part (2);
- FIG. 6 is a schematic diagram for describing a shape and a dimension of a chamfered surface according to an embodiment of the present invention (1);
- FIG. 7 is a schematic diagram for describing a shape and a dimension of a chamfered surface according to an embodiment of the present invention (2);
- FIG. 8 is a schematic diagram for describing a shape and a dimension of a chamfered surface according to an embodiment of the present invention (3);
- FIG. 9 is a schematic diagram for describing a shape and a dimension of a chamfered surface according to an embodiment of the present invention (4);
- FIG. 10 is a side view of a modified example of a glass plate according to an embodiment of the present invention.
- FIG. 11 is a schematic diagram for describing an impact testing machine.
- FIG. 1 is a side view illustrating a glass plate according to an embodiment of the present invention.
- FIG. 1 illustrates, for example, a raw plate of the glass plate with a double-dot-dash line.
- the glass plate 10 may be a glass substrate used for an image display apparatus or a cover glass.
- the image display apparatus may be, for example, a liquid crystal display (LCD), a plasma display panel (PDP), an organic EL (Electro Luminescence) display, or a touch panel.
- LCD liquid crystal display
- PDP plasma display panel
- organic EL Electro Luminescence
- the glass plate 10 in this embodiment is used for an image display apparatus, the usage of the glass plate 10 is not to be limited in particular.
- the glass plate 10 may be used for a solar battery or a thin-film secondary battery.
- the plate thickness of the glass plate 10 may be set according to the usage of the glass plate 10 .
- the plate thickness of the glass plate 10 is 0.3 mm to 3 mm.
- the plate thickness of the glass plate 10 is, for example, 0.5 mm to 3 mm.
- the glass plate 10 may be formed by using a float method, a fusion down-draw method, a redraw method, or a press method.
- the method for forming the glass plate 10 is not limited to the aforementioned methods.
- the glass plate 10 includes two main flat surfaces 11 , 12 that are parallel to each other, an edge surface 13 that is orthogonal to each of the two main flat surfaces 11 , 12 , and chamfered surfaces 15 , 16 that are formed from the edge surface 113 and corresponding main flat surfaces 11 , 12 .
- the chamfered surface 15 is adjacent to the main flat surface 11 and the edge surface 13 .
- the chamfered surface 16 is adjacent to the main flat surface 12 and the edge surface 13 .
- the glass plate 10 is symmetrically formed with respect to a center plane of the main flat surfaces 11 , 12 .
- the chamfered surfaces 15 , 16 have substantially the same shapes and dimensions. Thus, in the following, description of one of the chamfered surfaces (in this case, chamfered surface 16 ) is omitted. It is to be noted that, although the chamfered surfaces 15 , 16 have substantially the same shapes and dimensions, the chamfered surfaces 15 , 16 may have shapes and dimensions different from each other. Further, the glass plate 10 may be formed without one of the chamfered surfaces 15 , 16 .
- the main flat surfaces 11 , 12 may be formed in a rectangular shape.
- the term “rectangular shape” includes both a quadrate shape and an oblong shape.
- corner portions of the rectangular-shaped main flat surfaces 11 , 12 may have rounded shapes.
- the shape of the main flat surfaces 11 , 12 is not limited to the aforementioned shapes.
- the main flat surfaces 11 , 12 may have polygonal shapes such as triangular shapes.
- the main flat surfaces 11 , 12 may have a circular shape or an elliptical shape.
- the edge surface 13 is a surface orthogonal to the main flat surfaces 11 , 12 .
- the edge surface 13 is positioned more outward of the glass plate 10 than the main flat surfaces 11 , 12 from a plan view (i.e. viewed from a plate thickness direction). With the edge surface 13 , the glass plate 10 can attain satisfactory impact resistance with respect to impact exerted from a direction orthogonal to the edge surface 13 .
- the edge surface 13 is a flat surface. However, as long as the edge surface 13 is orthogonal to the main flat surfaces 11 , 12 , the edge surface 13 may be a curved surface. Further, the edge surface 13 may be a constituted by a combination of a flat surface and a curved surface.
- chamfered surfaces 15 may be provided in correspondence with four sides of the rectangular-shaped main flat surface 11 .
- a single chamfered surface 15 may be provided on one of the sides of the rectangular-shaped main flat surface 11 .
- the number of chamfered surfaces 15 which may be provided is not limited to the aforementioned number of chamfered surfaces provided on the side(s) of the rectangular-shaped main flat surface 11 .
- the chamfered surface 15 may be formed by forming a chamfered part 17 B by removing a corner part between a main flat surface 11 A and an edge surface 13 A of a raw plate 10 A of the glass plate 10 , and processing the chamfered part 17 B.
- the chamfered part 17 B is described below.
- the chamfered part 17 B is a flat surface that is diagonal with respect to the main flat surface 11 B. It is to be noted that, although the chamfered part 17 B of this embodiment is a flat surface, the chamfered part 17 B may be a curved surface.
- the curved surface may be, for example, a circular arc surface, an arc surface including multiple circular arc surfaces having different curvature radii, or an elliptical arc surface.
- the chamfered part 17 B gradually protrudes outward from the main flat surface 11 B to an edge surface 13 B from a plan view (i.e. viewed from plate-thickness direction).
- the edge surface 13 B is a surface orthogonal to the main flat surface 11 B and is adjacent to the chamfered part 17 B.
- a border part 19 B between the chamfered part 17 B and the main flat surface 11 B is formed into a tapered shape owing to the nature of the chamfering process.
- a border part 21 B between the chamfered part 17 B and the edge surface 13 B is formed into a tapered shape owing to the nature of the chamfering process.
- FIG. 2 is a schematic view for describing an example of a method for forming a chamfered part.
- FIG. 2 illustrates the raw plate 10 A of the glass plate 10 and a sheet 200 used for polishing the raw plate 10 A.
- the chamfered part 17 B is illustrated with a double-dot dash line.
- the chamfered part 17 B is formed by polishing the raw plate 10 A with the sheet 200 including abrasive grains.
- the sheet 200 is fixed to a fixing surface 211 of a base 210 .
- the sheet 200 has a shape complying with the shape of the fixing surface 211 .
- the fixing surface 211 may be, for example, a flat surface.
- the sheet 200 includes abrasive grains provided on a surface that is opposite to a surface facing the fixing surface 211 .
- the abrasive grains of the sheet 200 may be, for example, alumina (Al 2 O 3 ), silicon carbide (SiC), or diamond.
- the granularity of the abrasive grains may be, for example, greater than or equal to #1000. The particle diameters of the abrasive grains become smaller as the granularity increases.
- the raw plate 10 A is chamfered by pressing the raw plate 10 A against the surface of the sheet 200 including abrasive grains and sliding the raw plate 10 A along the surface of the sheet 200 including abrasive grains. Thereby, the chamfered part 17 B is formed.
- a coolant such as water may be used during the polishing process.
- the sheet 200 of this embodiment is fixed on the base 210 and has its surface including abrasive grains pressed against the raw plate 10 A while the raw plate 10 A is slid along the surface including abrasive grains, the raw plate 10 A may be pressed against the surface including abrasive grains in a state where tension is applied to the sheet 200 .
- FIG. 3 is a schematic diagram for describing an example of another method for forming a chamfered part.
- FIG. 3 illustrates the raw plate 10 A and a rotary grinding wheel 300 used for grinding the raw plate 10 A.
- the chamfered part 17 B and the edge surface 13 B are illustrated with a double-dot dash line.
- the chamfered part 17 B and the edge surface 13 B are formed by grinding an outer peripheral part of the raw plate 10 A with the rotary grinding wheel 300 .
- the rotary grinding wheel 300 which has a disk-like shape, is formed with an annular grinding groove 301 along its outer edge.
- Abrasive grains are included in a wall surface of the grinding groove 301 .
- the abrasive grains may be, for example, alumina (Al 2 O 3 ), silicon carbide, or diamond.
- the granularity of the abrasive grains may be, for example, #300 to #2000 (JIS R6001: Abrasive Micro Grain Size).
- the rotary grinding wheel 300 is rotated about a center line of the rotary grinding wheel 300 while being moved relative to the raw plate 10 A along the outer edge of the raw plate 10 A. Thereby, the outer edge part of the glass plate 10 A is grinded by the wall surface of the grinding groove 301 .
- a coolant such as water may be used during the polishing process.
- the method for forming the chamfered part is not limited to the methods described with FIGS. 2 and 3 .
- the methods of FIGS. 2 and 3 may be combined.
- the method of FIG. 2 may be performed after the method of FIG. 3 .
- the chamfered surface 15 is formed by further chamfering the border part 19 B (between the chamfered part 17 B and the main flat surface 11 B) and the border part 21 B (between the chamfered part 17 B and the edge surface 13 B) into curved surfaces, respectively.
- the curved surface may be, for example, a circular arc surface, or an arc surface including multiple circular arc surfaces having different curvature radii, or an elliptical arc surface. Because the tapered border parts 19 B, 21 B are processed into curved (rounded) surfaces, the stress generated at the time of impact is caused to scatter as taught in the Hertzian contact stress theory. Accordingly, impact (shock) resistance of the glass plate 10 can be improved.
- a fracture A originating from the chamfered surface 15 that has received the impact.
- the other type is a fracture B originating from the chamfered surface 16 that has not received impact.
- impact resistance of the glass plate 10 is improved against the fracture A.
- the chamfered surface 15 includes a curved surface part 23 formed by chamfering the border part 19 B into a curved surface and a curved part 25 formed by chamfering the border part 21 B into a curved surface.
- the curved surface part 23 gradually protrudes outward from the main flat surface 11 to the side of the curved part 25 from a plan view (i.e. viewed from plate-thickness direction).
- the curved part 25 gradually protrudes outward from the edge surface 13 to the side of the curved surface part 23 from a plan view.
- FIGS. 4 and 5 are schematic diagrams for describing an example of forming a curved surface part and a curved part.
- FIG. 4 illustrates multiple plate glasses 10 B formed with the chamfered part 17 B and a brush 400 used for polishing the plate glasses 10 B.
- FIG. 5 is an enlarged view illustrating a state where the plate glasses 10 B are polished with the brush 400 .
- the curved surface part 23 , the curved part 25 , and the edge surface 13 are illustrated with a double-dot dash line.
- the curved surface part 23 , the curved part 25 , and the edge surface 13 are formed by using the brush 400 to polish the plate glasses 10 B including the chamfered parts 17 B.
- the brush 400 may polish a layered body 420 that includes the plate glasses 10 B and spacers 410 alternately provided one on top of the other.
- the plate glasses 10 B are formed having substantially the same shape and same dimension.
- the plate glasses 10 B are layered, so that the outer edges of the plate glasses 10 B are superposed when viewed from a layer direction of the layered body 420 (direction X in FIGS. 4 and 5 ). Thereby, the outer edge part of each of the plate glasses 10 B can be evenly polished.
- Each of the spacers 410 is formed with a material that is softer than the plate glass 10 B.
- the spacer 410 may be formed of a polypropylene resin or a urethane foam resin.
- Each of the spacers 410 is formed having substantially the same shape and dimension.
- Each of the spacers 410 is arranged more inward than the outer edges of the plate glasses 10 B in the layer direction of the layered body 420 (i.e. direction X in FIGS. 4 and 5 ). Thereby, the spacers 410 form groove-like spaces 430 between the plate glasses 10 B.
- the brush 400 is a brush roll as illustrated in FIG. 4 .
- the brush 400 includes a rotational shaft 401 parallel to the layer direction of the layered body 420 and brush hairs 402 that are retained substantially orthogonal to the rotational shaft 401 .
- the brush 400 is rotated about the rotational shaft 401 while being moved relative to the layered body 420 along the outer edge of the layered body 420 .
- the brush 400 discharges a slurry containing a polishing material to the outer edge of the layered body 420 and polishes (brushes) the outer edge of the layered body 420 .
- the polishing material may be, for example, cerium oxide or zirconia.
- the particle diameter (D50) of the polishing material may be, for example, less than or equal to 5 ⁇ m, and more preferably less than or equal to 2 ⁇ m.
- the brush 400 is a channel brush that includes a long member (channel) spirally wound around the rotation axis 401 . Multiple brush hairs 402 are attached to the channel.
- the brush hair 402 is mainly formed of, for example, a resin such as a polyamide resin.
- the brush hair 402 may also include a polishing material such as alumina (Al 2 O 3 ), silicon carbide, or diamond.
- the brush hair 402 may have a liner shape and include a tapered leading end part.
- the width W1 of the space 430 is greater than or equal to 1.25 times of the maximum diameter A of the brush hair 402 (W1 ⁇ 1.25 ⁇ A). Therefore, as illustrated in FIG. 5 , the brush hair 402 can be smoothly inserted into the space 430 , so that the border parts 19 B between the main flat surfaces 11 B and the chamfered parts 17 B can be chamfered into curved surfaces by the brush hairs 402 . In addition, the border parts 21 B between the chamfered parts 17 B and the edge surfaces 13 B are also chamfered into curved surfaces by the brush hairs 402 .
- the width W1 of the space 430 is preferably greater than or equal to 1.33 ⁇ A, and more preferably greater than or equal to 1.5 ⁇ A. In order to improve efficiency of the polishing (brushing) process, the width W1 of the space 430 may be smaller than the plate thickness of the plate glass 10 B.
- the curved surface part 23 is formed by polishing the border part 19 B between the chamfered part 17 B and the main flat surface 11 B with the outer peripheral surfaces of the brush hairs 402 of the brush 400 .
- the curved part 25 is formed by polishing the border part 21 B between the chamfered part 17 B and the edge surface 13 B with the outer peripheral surfaces of the brush hairs 11 B of the brush 400 .
- the entire chamfered part 17 B is polished to become a curved (rounded) surface.
- the edge surface 13 B is polished to become the edge surface 13 illustrated in FIG. 1 .
- FIGS. 6 to 9 are schematic diagrams for describing a shape and a dimension of a chamfered surface according to an embodiment of the present invention.
- a chamfered surface 15 is formed, so that a chamfer width W is, for example, greater than or equal to 20 ⁇ m in a direction orthogonal to the edge surface 13 .
- the chamfer width W is calculated as a distance between an intersection point P 1 and an intersection point P 2 .
- the intersection point P 1 is a point where a straight line L 20 and an extension line E 11 of the main flat surface 11 intersect.
- the straight line L 20 is inclined 45 degrees with respect to the main flat surface 11 and is tangential to a single point of the chamfered surface 15 .
- the extension line E 11 of the main flat surface 11 is a line extending from the main flat surface 11 .
- the intersection point P 2 is a point where the extension line E 11 of the main flat surface 11 and an extension line E 13 of the edge surface 13 intersect.
- the extension line E 13 is a line extending from the edge surface 13 .
- An inclination of a line with respect to the main flat surface 11 is assumed to be 0 degrees in a case where the line is parallel to the main flat surface 11 .
- the chamfer width W is greater than or equal to 20 ⁇ m, a satisfactory impact resistance can be attained with respect to impact (shock) from a direction orthogonal to the straight line L 20 , and a 45 degree impact fracture strength (see below-described working examples) becomes high.
- An upper limit value of the chamfer width W is not limited in particular. However, in a case where the glass plate 10 has a symmetrical shape with respect to its center surface in the plate-thickness direction, the chamfer width W may be less than 1 ⁇ 2 of the plate-thickness of the glass plate 10 .
- the chamfer width W is preferably greater than or equal to 40 ⁇ m.
- the chamfered surface 15 is formed to have a curvature radius r1 of, for example, 20 ⁇ m to 500 ⁇ m at its tangent point S 10 with respect to a straight line L 10 .
- the straight line L 10 is inclined 15 degrees with respect to the main flat surface 11 .
- the curvature radius r1 at the tangent point S 10 is calculated as a radius of a perfect circle C 10 that passes through 3 points including a point S 11 , a point S 12 , and the tangent point S 10 that are located on the chamfered surface 15 .
- Each of the points S 11 , S 12 is positioned 10 ⁇ m away from the tangent point S 10 in a direction parallel to the straight line L 10 .
- the border part 19 B between the chamfered part 17 B and the main flat surface 11 B can be sufficiently chamfered into a curved surface.
- an intersecting area between the curved surface part 23 and the main flat surface 11 can be prevented from becoming acute.
- the curvature radius r1 at the tangent point S 10 is preferably 40 ⁇ m to 500 ⁇ m.
- the chamfered surface 15 is formed to have a curvature radius r2 that is larger than the curvature radius r1 at its tangent point S 20 with respect to a straight line L 20 .
- the straight line L 20 is inclined 45 degrees with respect to the main flat surface 11 .
- the curvature radius r2 at the tangent point S 20 is calculated as a radius of a perfect circle C 20 that passes through 3 points including a point S 21 , a point S 22 , and the tangent point S 20 that are located on the chamfered surface 15 .
- Each of the points S 21 , S 22 is positioned 10 ⁇ m away from the tangent point S 20 in a direction parallel to the straight line L 10 .
- the curvature radius r2 at the tangent point S 20 is greater than the curvature radius r1 at the tangent point S 10 , a surface for receiving impact (shock) from a direction orthogonal to the straight line L 20 becomes wide.
- the 45 degree impact fracture strength becomes high.
- the curvature radius r2 at the tangent point S 20 is, for example, greater than or equal to 50 ⁇ m, and more preferably greater than or equal to 70 ⁇ m.
- the chamfered surface 15 is formed to have a curvature radius r3 of, for example, 20 ⁇ m to 500 ⁇ m at its tangent point S 30 with respect to a straight line L 30 .
- the straight line L 30 is inclined 75 degrees with respect to the main flat surface 11 .
- the curvature radius r3 at the tangent point S 30 is calculated as a radius of a perfect circle C 30 that passes through 3 points including a point S 31 , a point S 32 , and the tangent point S 30 that are located on the chamfered surface 15 .
- Each of the points S 31 , S 32 is positioned 10 ⁇ m away from the tangent point S 30 in a direction parallel to the straight line L 30 .
- the curvature radius r3 at the tangent point S 30 is greater than or equal to 20 ⁇ m, the border part 21 B between the chamfered part 17 B and the edge surface 13 B can be sufficiently chamfered into a curved surface. Further, in a case where the curvature radius r3 at the tangent point S 30 is less than or equal to 500 ⁇ m, an intersecting area between the curved part 25 and the edge surface 13 can be prevented from becoming acute. Thus, the impact resistance at this area can be prevented from degrading.
- the curvature radius r3 at the tangent point S 30 is preferably 40 ⁇ m to 500 ⁇ m.
- FIG. 10 is a side view of a modified example of a glass plate according to an embodiment of the present invention.
- a glass plate 110 illustrated in FIG. 10 includes main flat surfaces 111 , 112 , an edge surface 113 orthogonal to each of the main flat surfaces 111 , 112 , and chamfered surfaces 115 , 116 that are formed between the edge surface 113 and corresponding main flat surfaces 111 , 112 .
- the glass plate 110 is symmetrically formed with respect to a center plane of the main flat surfaces 111 , 112 in the plate-thickness direction of the glass plate 110 .
- the chamfered surfaces 115 , 116 have substantially the same shapes and dimensions. Thus, in the following, description of one of the two main flat surfaces (in this case, chamfered surface 116 ) is omitted.
- the chamfered surfaces 115 , 116 have substantially the same shapes and dimensions, the chamfered surfaces 115 , 116 may have shapes and dimensions different from each other. Further, the glass plate 110 may be formed without one of the chamfered surfaces 115 , 116 .
- the chamfered surface 115 may be formed by forming a chamfered part 117 B by removing a corner part between a main flat surface 111 A and an edge surface 113 A of a raw plate 110 A of the glass plate 110 , and processing the chamfered part 117 B.
- the chamfered surface 115 is formed by chamfering a border part 119 B between the chamfered part 117 B and the main flat surface 111 B adjacent to the chamfered part 117 B and a border part 121 B between the chamfered part 117 B and the edge surface 113 B adjacent to the chamfered part 117 B.
- the border parts 119 B, 121 B are chamfered into more curved surfaces compared to the above-described border parts 19 B, 21 B. Because the tapered border parts 119 B, 121 B are processed into curved (rounded) surfaces, the stress generated at the time of impact is caused to scatter as taught in the Hertzian contact stress theory. Accordingly, impact (shock) resistance of the glass plate 110 can be improved.
- the chamfered surface 115 includes a curved surface part 123 formed by chamfering the border part 119 B into a curved surface and a curved part 125 formed by chamfering the border part 121 B into a curved surface.
- the chamfered surface 115 further includes a flat part 127 between the curved surface part 123 and the curved part 125 .
- the flat part 127 is diagonal to the main flat surface 111 . Accordingly, the glass plate 110 can attain satisfactory impact resistance with respect to impact exerted from a direction orthogonal to the flat part 127 .
- the chamfered surface 115 may be formed by forming the chamfered part 117 B with the method described with FIG. 2 or FIG. 3 and then polishing only the border parts 119 B, 121 B with a brush.
- the flat part 127 is a part of the chamfered part 117 B that remains by not being processed (chamfered) during the forming of the curved surface part 123 and the curved part 125 . It is, however, to be noted that the flat part 127 may be formed by processing the chamfered part 117 B.
- composition of the glass plates used in the following working examples was 64.2% of Si, 8.0% of Al 2 O 3 , 10.5% of MgO, 12.5% of Na 2 O, 4.0% of K 2 O, 0.5% of Zr 0 2 , 0.1% of CaO, 0.1% of SrO, and 0.1% of BaO. No chemically strengthened layer was included in the glass plates.
- a sample was manufactured by forming a chamfered part by polishing a rectangular-shaped glass raw plate (plate-thickness: 0.8 mm) with the method described in FIG. 2 and forming a curved surface part and a curved part with the method described in FIG. 4 . Then, the impact fracture strength of the sample was tested. The sample did not have a chemically strengthened layer.
- a wrapping film sheet (#8000, manufactured by Sumitomo 3M Limited) was used as a sheet for forming the chamfered part. Further, a brush having polyimide brush hairs was used as a brush for forming the curved surface part and the curved part. The diameter of the brush hair was 0.2 mm. Further, cerium oxide having an average particle diameter (D50) of 2 ⁇ m was used as a polishing material for polishing with the brush.
- D50 average particle diameter
- FIG. 11 is a schematic diagram for describing an impact testing machine.
- FIG. 11 illustrates an impact testing machine 500 and a sample 600 .
- a solid line indicates a state in which an impact oscillator 503 is in a neutral position whereas a dash-dot line indicates a state in which the impact oscillator 503 is raised from the neutral state.
- the sample 600 includes two main flat surfaces 601 , 602 that are parallel to each other, a flat edge surface 603 that is orthogonal to each of the main flat surfaces 601 , 602 , and chamfered surfaces 605 , 606 that are formed between the edge surface 603 and corresponding main flat surfaces 601 , 602 .
- the sample 600 is symmetrically formed with respect to a center plane of the main flat surfaces 601 , 602 .
- the chamfered surfaces 605 , 606 have substantially the same shapes and dimensions.
- the chamfered surfaces 605 , 606 have substantially the same configurations as the configurations illustrated in FIG. 1 .
- the impact testing machine 500 includes a rotational shaft 501 that is arranged in a horizontal position, a rod 502 that extends in a vertical direction from the rotational shaft 501 , and the impact oscillator 503 having a circular-columnar shape and coaxially fixed to the rod 502 .
- the impact oscillator 503 has a mass of 96 g and is formed of a SS (Stainless Steel) material.
- a part of the impact oscillator 503 that contacts the sample 600 has a curvature radius of 2.5 mm.
- the impact oscillator 503 can rotate about the rotational shaft 501 . Further, the impact oscillator 503 can rotate left and right with respect to the neutral position (position in which the rod 502 is in a vertical state).
- the impact testing machine 500 includes a jig 504 that supports the main flat surfaces 601 , 602 of the sample 600 in an inclined position with respect to a vertical surface.
- the main flat surfaces 601 , 602 are inclined at a predetermined angle ⁇ such as 45 degrees or 30 degrees with respect to the vertical surface.
- the jig 504 supports the sample 600 , so that a longitudinal direction of the chamfered surface 606 becomes parallel to the rotational shaft 501 .
- the impact test was performed by raising the impact oscillator 503 from the neutral position and lowering the impact oscillator 503 by gravity.
- the impact oscillator 503 rotates about the rotational shaft 501 by gravity and collides with the sample 600 (technically, a lower side of the chamfered surface 606 ) at the neutral position as illustrated with the solid line in FIG. 11 .
- the impact energy exerted to the sample 600 when the impact oscillator 503 collides with the sample 600 was calculated according to the mass of the rod 502 (16 g), the mass of the impact oscillator 503 (80 g), and the height H in which a center of gravity 505 of the impact oscillator 503 is raised.
- the shapes and the dimensions (chamfer width W of FIG. 6 , curvature radius r1 of FIG. 7 , curvature radius r2 of FIG. 8 , and curvature radius of FIG. 9 ) of the chamfered surface 606 with which the impact oscillator 503 collides were measured (evaluated) by cutting the sample 600 after the impact test and observing a cross-sectional surface of the cut sample 600 .
- a sample was manufactured under the same conditions as the conditions of example 1 except that the polishing time for forming a chamfered part of the sample was changed. After forming the sample, impact fracture resistance of the sample was measured. Further, the shape and the dimensions of the chamfered part of the sample were measured. Results of the measurements are shown in the below-described Table 1.
- a sample was manufactured under the same conditions as the conditions of example 1 except that the method illustrated in FIG. 3 was used instead of the method illustrated in FIG. 2 for forming a chamfered part of the sample.
- impact fracture resistance of the sample was measured. Further, the shape and the dimensions of the chamfered part of the sample were measured. Results of the measurements are shown in the below-described Table 1.
- examples 4 and 5 samples were manufactured under the same conditions as the condition of example 1 except that a curved surface part and a curved part of the sample were not formed after forming a chamfered part of the sample. Therefore, the chamfered surfaces of the samples of the examples 4 and 5 are constituted only by chamfered parts.
- the chamfered part of each of the examples 4 and 5 is a flat surface that is diagonal to a main surface of the samples of the examples 4 and 5. The polishing time for forming a chamfered part was changed between the examples 4 and 5.
- results of the evaluation of the examples 4 and 5 are shown in the below-described Table 1. Because the chamfered surfaces in examples 4 and 5 are flat surfaces, the curvature radii of the chamfered surfaces in examples 4 and 5 are infinite. Further, in examples 4 and 5, both a curvature radius r1 at an area between the main flat surface and the chamfered surface and a curvature radius r3 at an area between the chamfered surface and the edge surface are assumed to be 0 ⁇ m because the area between the main flat surface and the chamfered surface and the area between the chamfered surface and the edge surface having a curvature radius of r1 have bent shapes that do not include the curved surface part or the curved part.
- example 6 the same glass raw plate used in example 1 was used as a sample of example 6.
- the sample of example 6 includes two main flat surfaces that are parallel to each other, and an edge surface that is orthogonal to each of the main flat surfaces.
- the sample of example 6 has no chamfered surface.
- Results of the evaluation of the example 6 are shown in the below-described Table 1.
- the impact oscillator 503 collided with a corner part between a main flat surface and an edge surface on the lower side of the sample because the sample of example 6 has no chamfered surface.
- the impact fracture strength of the sample of example 6 was significantly low.
- the glass plate 10 in the above-described embodiments does not include a chemically strengthened layer
- the glass plate 10 may include a chemically strengthened layer.
- a chemically strengthened layer compression stress layer
- the glass plate 10 is formed by immersing glass into a process liquid used for ion-exchange.
- ions that have small ion radii and are contained in a surface of the glass e.g., Li ions, Na ions
- ions that have large ion radii e.g., K ions.
- the compression stress layer is formed having a predetermined depth from the surface of the glass.
- a tensile stress layer is formed inside the glass plate 10 for maintaining balance of stress.
- a chemically strengthened glass plate in other words, a glass plate having a chemically strengthened layer (compression stress layer) formed in its main flat surface has high strength and high scratch resistance. Therefore, by chemically strengthening the glass plate 10 according to an embodiment of the present invention, the glass plate 10 can become more resistant to fracture and scratches. Accordingly, the glass plate 10 can be suitably used as a cover glass for protecting a display of a smartphone a tablet type PC (Personal Computer), a computer monitor, or a television set.
- PC Personal Computer
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Abstract
A glass plate includes a main flat surface, an edge surface orthogonal to the main flat surface, and a chamfered surface adjacent to the main flat surface and the edge surface. In a cross-sectional surface of the glass plate that is orthogonal to the edge surface and that is orthogonal to the main flat surface, the chamfered surface has a curvature radius greater than or equal to 50 μm at an intersection point between the chamfered surface and a straight line inclined 45 degrees with respect to the main flat surface and a curvature radius ranging from 20 μm to 500 μm at an intersection point between the chamfered surface and a straight line inclined 15 degrees with respect to the main flat surface.
Description
- This application is a U.S. continuation application filed under 35 USC 111(a) claiming benefit under 35 USC 120 and 365(c) of PCT Application JP2012/070860, filed Aug. 16, 2012, which claims the benefit of priority of Japanese Patent Application Ser. No. 2011-186461, filed in Japan on Aug. 29, 2011. The foregoing applications are hereby incorporated herein by reference.
- 1. Field of the Invention
- The present invention relates to a glass plate.
- 2. Description of the Related Art
- In recent years, glass plates have been manufactured for the use of image display apparatuses such as liquid crystal displays and organic EL (Electro Luminescence) displays. For example, a glass substrate may be used as a glass plate on which a function layer such as a thin film transistor (TFT) or a color filter (CF) is formed. Further, a glass plate may be used as a cover glass for improving the aesthetics of a display or increasing protection of the display.
- In a case where a glass plate is bent, compression stress is generated in a main flat surface corresponding to a concave surface of the glass plate whereas a tensile stress is generated in a main flat surface corresponding to a convex surface of the glass plate. Such tensile stress tends to concentrate at a border part between the main flat surface corresponding to the convex surface and an edge surface adjacent to the main surface corresponding to the convex surface. Therefore, the glass plate is susceptible to breakage when a defect exists in the border part.
- Accordingly, there is proposed a glass plate having a chamfered surface formed at its border part in which a surface roughness of the chamfered surface is less than a surface roughness of its edge surface (see, for example, Patent Document 1).
-
- Patent Document 1: International Publication Pamphlet 10/104,039
- In
Patent Document 1, the quality of a glass plate is evaluated according to flexural strength. However, in some cases, it may be suitable to evaluate the quality of the glass plate according to impact fracture strength. For example, because a glass plate can be hardly bent in a case where the glass plate is mounted on an image display apparatus, impact fracture strength has greater significance than flexural strength. - The present invention may provide a glass plate that substantially obviates one or more of the problems caused by the limitations and disadvantages of the related art.
- Features and advantages of the present invention will be set forth in the description which follows, and in part will become apparent from the description and the accompanying drawings, or may be learned by practice of the invention according to the teachings provided in the description. Objects as well as other features and advantages of the present invention will be realized and attained by a glass plate particularly pointed out in the specification in such full, clear, concise, and exact terms as to enable a person having ordinary skill in the art to practice the invention.
- To achieve these and other advantages and in accordance with the purpose of the invention, as embodied and broadly described herein, an embodiment of the present invention provides a glass plate including a main flat surface, an edge surface orthogonal to the main flat surface, and a chamfered surface adjacent to the main flat surface and the edge surface. In a cross-sectional surface of the glass plate that is orthogonal to the edge surface and that is orthogonal to the main flat surface, the chamfered surface has a curvature radius greater than or equal to 50 μm at an intersection point between the chamfered surface and a straight line inclined 45 degrees with respect to the main flat surface and a curvature radius ranging from 20 μm to 500 μm at an intersection point between the chamfered surface and a straight line inclined 15 degrees with respect to the main flat surface.
-
FIG. 1 is a side view illustrating a glass plate according to an embodiment of the present invention; -
FIG. 2 is a schematic view for describing an example of a method for forming a chamfered part; -
FIG. 3 is a schematic diagram for describing an example of another method for forming a chamfered part; -
FIG. 4 is a schematic diagram for describing an example of forming a curved surface part and a curved part (1); -
FIG. 5 is a schematic diagram for describing an example of forming a curved surface part and a curved part (2); -
FIG. 6 is a schematic diagram for describing a shape and a dimension of a chamfered surface according to an embodiment of the present invention (1); -
FIG. 7 is a schematic diagram for describing a shape and a dimension of a chamfered surface according to an embodiment of the present invention (2); -
FIG. 8 is a schematic diagram for describing a shape and a dimension of a chamfered surface according to an embodiment of the present invention (3); -
FIG. 9 is a schematic diagram for describing a shape and a dimension of a chamfered surface according to an embodiment of the present invention (4); -
FIG. 10 is a side view of a modified example of a glass plate according to an embodiment of the present invention; and -
FIG. 11 is a schematic diagram for describing an impact testing machine. - In the following, embodiments of the present invention will be described with reference to the accompanying drawings. Throughout the drawings of the embodiments, like components are denoted by like numerals as those of the below-described embodiment and will not be further explained.
-
FIG. 1 is a side view illustrating a glass plate according to an embodiment of the present invention.FIG. 1 illustrates, for example, a raw plate of the glass plate with a double-dot-dash line. - The
glass plate 10 may be a glass substrate used for an image display apparatus or a cover glass. The image display apparatus may be, for example, a liquid crystal display (LCD), a plasma display panel (PDP), an organic EL (Electro Luminescence) display, or a touch panel. - It is to be noted that, although the
glass plate 10 in this embodiment is used for an image display apparatus, the usage of theglass plate 10 is not to be limited in particular. For example, theglass plate 10 may be used for a solar battery or a thin-film secondary battery. - The plate thickness of the
glass plate 10 may be set according to the usage of theglass plate 10. For example, in a case where theglass plate 10 is used as a glass substrate for an image display apparatus, the plate thickness of theglass plate 10 is 0.3 mm to 3 mm. Further, in a case where theglass plate 10 is used as a cover glass for an image display apparatus, the plate thickness of theglass plate 10 is, for example, 0.5 mm to 3 mm. - The
glass plate 10 may be formed by using a float method, a fusion down-draw method, a redraw method, or a press method. However, the method for forming theglass plate 10 is not limited to the aforementioned methods. - The
glass plate 10 includes two mainflat surfaces edge surface 13 that is orthogonal to each of the two mainflat surfaces surfaces edge surface 113 and corresponding mainflat surfaces chamfered surface 15 is adjacent to the mainflat surface 11 and theedge surface 13. Thechamfered surface 16 is adjacent to the mainflat surface 12 and theedge surface 13. - The
glass plate 10 is symmetrically formed with respect to a center plane of the mainflat surfaces chamfered surfaces chamfered surfaces chamfered surfaces glass plate 10 may be formed without one of thechamfered surfaces - The main
flat surfaces flat surfaces flat surfaces flat surfaces flat surfaces - The
edge surface 13 is a surface orthogonal to the mainflat surfaces edge surface 13 is positioned more outward of theglass plate 10 than the mainflat surfaces edge surface 13, theglass plate 10 can attain satisfactory impact resistance with respect to impact exerted from a direction orthogonal to theedge surface 13. - The
edge surface 13 is a flat surface. However, as long as theedge surface 13 is orthogonal to the mainflat surfaces edge surface 13 may be a curved surface. Further, theedge surface 13 may be a constituted by a combination of a flat surface and a curved surface. - For example, four chamfered
surfaces 15 may be provided in correspondence with four sides of the rectangular-shaped mainflat surface 11. Alternatively, a single chamferedsurface 15 may be provided on one of the sides of the rectangular-shaped mainflat surface 11. The number ofchamfered surfaces 15 which may be provided is not limited to the aforementioned number of chamfered surfaces provided on the side(s) of the rectangular-shaped mainflat surface 11. - As one example of a method for forming the chamfered
surface 15, the chamferedsurface 15 may be formed by forming achamfered part 17B by removing a corner part between a mainflat surface 11A and anedge surface 13A of araw plate 10A of theglass plate 10, and processing thechamfered part 17B. First, thechamfered part 17B is described below. - The
chamfered part 17B is a flat surface that is diagonal with respect to the mainflat surface 11B. It is to be noted that, although thechamfered part 17B of this embodiment is a flat surface, thechamfered part 17B may be a curved surface. The curved surface may be, for example, a circular arc surface, an arc surface including multiple circular arc surfaces having different curvature radii, or an elliptical arc surface. - The
chamfered part 17B gradually protrudes outward from the mainflat surface 11B to anedge surface 13B from a plan view (i.e. viewed from plate-thickness direction). Theedge surface 13B is a surface orthogonal to the mainflat surface 11B and is adjacent to thechamfered part 17B. - A
border part 19B between thechamfered part 17B and the mainflat surface 11B is formed into a tapered shape owing to the nature of the chamfering process. Similarly, aborder part 21B between thechamfered part 17B and theedge surface 13B is formed into a tapered shape owing to the nature of the chamfering process. -
FIG. 2 is a schematic view for describing an example of a method for forming a chamfered part.FIG. 2 illustrates theraw plate 10A of theglass plate 10 and asheet 200 used for polishing theraw plate 10A. InFIG. 2 , thechamfered part 17B is illustrated with a double-dot dash line. - The
chamfered part 17B is formed by polishing theraw plate 10A with thesheet 200 including abrasive grains. Thesheet 200 is fixed to a fixingsurface 211 of abase 210. Thesheet 200 has a shape complying with the shape of the fixingsurface 211. The fixingsurface 211 may be, for example, a flat surface. Thesheet 200 includes abrasive grains provided on a surface that is opposite to a surface facing the fixingsurface 211. The abrasive grains of thesheet 200 may be, for example, alumina (Al2O3), silicon carbide (SiC), or diamond. In order to prevent damage during the polishing process, the granularity of the abrasive grains may be, for example, greater than or equal to #1000. The particle diameters of the abrasive grains become smaller as the granularity increases. - The
raw plate 10A is chamfered by pressing theraw plate 10A against the surface of thesheet 200 including abrasive grains and sliding theraw plate 10A along the surface of thesheet 200 including abrasive grains. Thereby, thechamfered part 17B is formed. A coolant such as water may be used during the polishing process. - It is to be noted that, although the
sheet 200 of this embodiment is fixed on thebase 210 and has its surface including abrasive grains pressed against theraw plate 10A while theraw plate 10A is slid along the surface including abrasive grains, theraw plate 10A may be pressed against the surface including abrasive grains in a state where tension is applied to thesheet 200. -
FIG. 3 is a schematic diagram for describing an example of another method for forming a chamfered part.FIG. 3 illustrates theraw plate 10A and arotary grinding wheel 300 used for grinding theraw plate 10A. InFIG. 3 , thechamfered part 17B and theedge surface 13B are illustrated with a double-dot dash line. - The
chamfered part 17B and theedge surface 13B are formed by grinding an outer peripheral part of theraw plate 10A with therotary grinding wheel 300. Therotary grinding wheel 300, which has a disk-like shape, is formed with anannular grinding groove 301 along its outer edge. Abrasive grains are included in a wall surface of the grindinggroove 301. The abrasive grains may be, for example, alumina (Al2O3), silicon carbide, or diamond. In order to increase grinding efficiency, the granularity of the abrasive grains may be, for example, #300 to #2000 (JIS R6001: Abrasive Micro Grain Size). - The
rotary grinding wheel 300 is rotated about a center line of therotary grinding wheel 300 while being moved relative to theraw plate 10A along the outer edge of theraw plate 10A. Thereby, the outer edge part of theglass plate 10A is grinded by the wall surface of the grindinggroove 301. A coolant such as water may be used during the polishing process. - It is to be noted that the method for forming the chamfered part is not limited to the methods described with
FIGS. 2 and 3 . For example, the methods ofFIGS. 2 and 3 may be combined. Alternatively, the method ofFIG. 2 may be performed after the method ofFIG. 3 . - As illustrated in
FIG. 1 , the chamferedsurface 15 is formed by further chamfering theborder part 19B (between thechamfered part 17B and the mainflat surface 11B) and theborder part 21B (between thechamfered part 17B and theedge surface 13B) into curved surfaces, respectively. The curved surface may be, for example, a circular arc surface, or an arc surface including multiple circular arc surfaces having different curvature radii, or an elliptical arc surface. Because the taperedborder parts glass plate 10 can be improved. In a case where impact is exerted on the chamferedsurface 15, two types of fractures may occur. One type is a fracture A originating from the chamferedsurface 15 that has received the impact. The other type is a fracture B originating from the chamferedsurface 16 that has not received impact. In this embodiment, impact resistance of theglass plate 10 is improved against the fracture A. - The chamfered
surface 15 includes acurved surface part 23 formed by chamfering theborder part 19B into a curved surface and acurved part 25 formed by chamfering theborder part 21B into a curved surface. - The
curved surface part 23 gradually protrudes outward from the mainflat surface 11 to the side of thecurved part 25 from a plan view (i.e. viewed from plate-thickness direction). Similarly, thecurved part 25 gradually protrudes outward from theedge surface 13 to the side of thecurved surface part 23 from a plan view. -
FIGS. 4 and 5 are schematic diagrams for describing an example of forming a curved surface part and a curved part.FIG. 4 illustratesmultiple plate glasses 10B formed with thechamfered part 17B and abrush 400 used for polishing theplate glasses 10B.FIG. 5 is an enlarged view illustrating a state where theplate glasses 10B are polished with thebrush 400. InFIG. 5 , thecurved surface part 23, thecurved part 25, and theedge surface 13 are illustrated with a double-dot dash line. - The
curved surface part 23, thecurved part 25, and theedge surface 13 are formed by using thebrush 400 to polish theplate glasses 10B including the chamferedparts 17B. In order to improve polishing efficiency, thebrush 400 may polish alayered body 420 that includes theplate glasses 10B andspacers 410 alternately provided one on top of the other. - As illustrated in
FIG. 4 , theplate glasses 10B are formed having substantially the same shape and same dimension. Theplate glasses 10B are layered, so that the outer edges of theplate glasses 10B are superposed when viewed from a layer direction of the layered body 420 (direction X inFIGS. 4 and 5 ). Thereby, the outer edge part of each of theplate glasses 10B can be evenly polished. - Each of the
spacers 410 is formed with a material that is softer than theplate glass 10B. For example, thespacer 410 may be formed of a polypropylene resin or a urethane foam resin. - Each of the
spacers 410 is formed having substantially the same shape and dimension. Each of thespacers 410 is arranged more inward than the outer edges of theplate glasses 10B in the layer direction of the layered body 420 (i.e. direction X inFIGS. 4 and 5 ). Thereby, thespacers 410 form groove-like spaces 430 between theplate glasses 10B. - The
brush 400 is a brush roll as illustrated inFIG. 4 . Thebrush 400 includes arotational shaft 401 parallel to the layer direction of thelayered body 420 andbrush hairs 402 that are retained substantially orthogonal to therotational shaft 401. Thebrush 400 is rotated about therotational shaft 401 while being moved relative to thelayered body 420 along the outer edge of thelayered body 420. Thebrush 400 discharges a slurry containing a polishing material to the outer edge of thelayered body 420 and polishes (brushes) the outer edge of thelayered body 420. The polishing material may be, for example, cerium oxide or zirconia. The particle diameter (D50) of the polishing material may be, for example, less than or equal to 5 μm, and more preferably less than or equal to 2 μm. - The
brush 400 is a channel brush that includes a long member (channel) spirally wound around therotation axis 401.Multiple brush hairs 402 are attached to the channel. - The
brush hair 402 is mainly formed of, for example, a resin such as a polyamide resin. Thebrush hair 402 may also include a polishing material such as alumina (Al2O3), silicon carbide, or diamond. Thebrush hair 402 may have a liner shape and include a tapered leading end part. - In this embodiment, the width W1 of the
space 430 is greater than or equal to 1.25 times of the maximum diameter A of the brush hair 402 (W1≧1.25×A). Therefore, as illustrated inFIG. 5 , thebrush hair 402 can be smoothly inserted into thespace 430, so that theborder parts 19B between the mainflat surfaces 11B and the chamferedparts 17B can be chamfered into curved surfaces by thebrush hairs 402. In addition, theborder parts 21B between thechamfered parts 17B and the edge surfaces 13B are also chamfered into curved surfaces by thebrush hairs 402. - The width W1 of the
space 430 is preferably greater than or equal to 1.33×A, and more preferably greater than or equal to 1.5×A. In order to improve efficiency of the polishing (brushing) process, the width W1 of thespace 430 may be smaller than the plate thickness of theplate glass 10B. - The
curved surface part 23 is formed by polishing theborder part 19B between thechamfered part 17B and the mainflat surface 11B with the outer peripheral surfaces of thebrush hairs 402 of thebrush 400. Further, thecurved part 25 is formed by polishing theborder part 21B between thechamfered part 17B and theedge surface 13B with the outer peripheral surfaces of thebrush hairs 11B of thebrush 400. When forming thecurved surface part 23 and thecurved part 25, the entirechamfered part 17B is polished to become a curved (rounded) surface. Further, theedge surface 13B is polished to become theedge surface 13 illustrated inFIG. 1 . -
FIGS. 6 to 9 are schematic diagrams for describing a shape and a dimension of a chamfered surface according to an embodiment of the present invention. - As illustrated in
FIG. 6 , at a cross-sectional surface of theglass plate 10 that is orthogonal to theedge surface 13 and that is orthogonal to the mainflat surface 11, a chamferedsurface 15 is formed, so that a chamfer width W is, for example, greater than or equal to 20 μm in a direction orthogonal to theedge surface 13. - The chamfer width W is calculated as a distance between an intersection point P1 and an intersection point P2. The intersection point P1 is a point where a straight line L20 and an extension line E11 of the main
flat surface 11 intersect. The straight line L20 is inclined 45 degrees with respect to the mainflat surface 11 and is tangential to a single point of the chamferedsurface 15. The extension line E11 of the mainflat surface 11 is a line extending from the mainflat surface 11. The intersection point P2 is a point where the extension line E11 of the mainflat surface 11 and an extension line E13 of theedge surface 13 intersect. The extension line E13 is a line extending from theedge surface 13. An inclination of a line with respect to the mainflat surface 11 is assumed to be 0 degrees in a case where the line is parallel to the mainflat surface 11. - In a case where the chamfer width W is greater than or equal to 20 μm, a satisfactory impact resistance can be attained with respect to impact (shock) from a direction orthogonal to the straight line L20, and a 45 degree impact fracture strength (see below-described working examples) becomes high. An upper limit value of the chamfer width W is not limited in particular. However, in a case where the
glass plate 10 has a symmetrical shape with respect to its center surface in the plate-thickness direction, the chamfer width W may be less than ½ of the plate-thickness of theglass plate 10. The chamfer width W is preferably greater than or equal to 40 μm. - As illustrated in
FIG. 7 , at a cross-sectional surface of theglass plate 10 that is orthogonal to theedge surface 13 and that is orthogonal to the mainflat surface 11, the chamferedsurface 15 is formed to have a curvature radius r1 of, for example, 20 μm to 500 μm at its tangent point S10 with respect to a straight line L10. The straight line L10 is inclined 15 degrees with respect to the mainflat surface 11. - The curvature radius r1 at the tangent point S10 is calculated as a radius of a perfect circle C10 that passes through 3 points including a point S11, a point S12, and the tangent point S10 that are located on the chamfered
surface 15. Each of the points S11, S12 is positioned 10 μm away from the tangent point S10 in a direction parallel to the straight line L10. - In a case where the curvature radius r1 at the tangent point S10 is greater than or equal to 20 μm, the
border part 19B between thechamfered part 17B and the mainflat surface 11B can be sufficiently chamfered into a curved surface. Further, in a case where the curvature radius r1 at the tangent point S10 is less than or equal to 500 μm, an intersecting area between thecurved surface part 23 and the mainflat surface 11 can be prevented from becoming acute. Thus, the impact resistance at this area can be prevented from degrading. The curvature radius r1 at the tangent point S10 is preferably 40 μm to 500 μm. - As illustrated in
FIG. 8 , at a cross-sectional surface of theglass plate 10 that is orthogonal to theedge surface 13 and that is orthogonal to the mainflat surface 11, the chamferedsurface 15 is formed to have a curvature radius r2 that is larger than the curvature radius r1 at its tangent point S20 with respect to a straight line L20. The straight line L20 is inclined 45 degrees with respect to the mainflat surface 11. - The curvature radius r2 at the tangent point S20 is calculated as a radius of a perfect circle C20 that passes through 3 points including a point S21, a point S22, and the tangent point S20 that are located on the chamfered
surface 15. Each of the points S21, S22 is positioned 10 μm away from the tangent point S20 in a direction parallel to the straight line L10. - In a case where the curvature radius r2 at the tangent point S20 is greater than the curvature radius r1 at the tangent point S10, a surface for receiving impact (shock) from a direction orthogonal to the straight line L20 becomes wide. Thus, the 45 degree impact fracture strength (see below-described working examples) becomes high. The curvature radius r2 at the tangent point S20 is, for example, greater than or equal to 50 μm, and more preferably greater than or equal to 70 μm.
- As illustrated in
FIG. 9 , at a cross-sectional surface of theglass plate 10 that is orthogonal to theedge surface 13 and that is orthogonal to the mainflat surface 11, the chamferedsurface 15 is formed to have a curvature radius r3 of, for example, 20 μm to 500 μm at its tangent point S30 with respect to a straight line L30. The straight line L30 is inclined 75 degrees with respect to the mainflat surface 11. - The curvature radius r3 at the tangent point S30 is calculated as a radius of a perfect circle C30 that passes through 3 points including a point S31, a point S32, and the tangent point S30 that are located on the chamfered
surface 15. Each of the points S31, S32 is positioned 10 μm away from the tangent point S30 in a direction parallel to the straight line L30. - In a case where the curvature radius r3 at the tangent point S30 is greater than or equal to 20 μm, the
border part 21B between thechamfered part 17B and theedge surface 13B can be sufficiently chamfered into a curved surface. Further, in a case where the curvature radius r3 at the tangent point S30 is less than or equal to 500 μm, an intersecting area between thecurved part 25 and theedge surface 13 can be prevented from becoming acute. Thus, the impact resistance at this area can be prevented from degrading. The curvature radius r3 at the tangent point S30 is preferably 40 μm to 500 μm. -
FIG. 10 is a side view of a modified example of a glass plate according to an embodiment of the present invention. Similar to theglass plate 10 illustrated inFIG. 1 , aglass plate 110 illustrated inFIG. 10 includes mainflat surfaces edge surface 113 orthogonal to each of the mainflat surfaces surfaces edge surface 113 and corresponding mainflat surfaces glass plate 110 is symmetrically formed with respect to a center plane of the mainflat surfaces glass plate 110. The chamfered surfaces 115, 116 have substantially the same shapes and dimensions. Thus, in the following, description of one of the two main flat surfaces (in this case, chamfered surface 116) is omitted. - It is to be noted that, although the chamfered surfaces 115, 116 have substantially the same shapes and dimensions, the chamfered surfaces 115, 116 may have shapes and dimensions different from each other. Further, the
glass plate 110 may be formed without one of the chamfered surfaces 115, 116. - Similar to the chamfered
surface 15 illustrated inFIG. 1 , the chamferedsurface 115 may be formed by forming achamfered part 117B by removing a corner part between a main flat surface 111A and anedge surface 113A of araw plate 110A of theglass plate 110, and processing thechamfered part 117B. - The chamfered
surface 115 is formed by chamfering a border part 119B between thechamfered part 117B and the mainflat surface 111B adjacent to thechamfered part 117B and aborder part 121B between thechamfered part 117B and theedge surface 113B adjacent to thechamfered part 117B. Theborder parts 119B, 121B are chamfered into more curved surfaces compared to the above-describedborder parts border parts 119B, 121B are processed into curved (rounded) surfaces, the stress generated at the time of impact is caused to scatter as taught in the Hertzian contact stress theory. Accordingly, impact (shock) resistance of theglass plate 110 can be improved. - The chamfered
surface 115 includes acurved surface part 123 formed by chamfering the border part 119B into a curved surface and acurved part 125 formed by chamfering theborder part 121B into a curved surface. The chamferedsurface 115 further includes aflat part 127 between thecurved surface part 123 and thecurved part 125. Theflat part 127 is diagonal to the mainflat surface 111. Accordingly, theglass plate 110 can attain satisfactory impact resistance with respect to impact exerted from a direction orthogonal to theflat part 127. - For example, the chamfered
surface 115 may be formed by forming thechamfered part 117B with the method described withFIG. 2 orFIG. 3 and then polishing only theborder parts 119B, 121B with a brush. Theflat part 127 is a part of thechamfered part 117B that remains by not being processed (chamfered) during the forming of thecurved surface part 123 and thecurved part 125. It is, however, to be noted that theflat part 127 may be formed by processing thechamfered part 117B. - The composition of the glass plates used in the following working examples, in mass percent (mol. %), was 64.2% of Si, 8.0% of Al2O3, 10.5% of MgO, 12.5% of Na2O, 4.0% of K2O, 0.5% of Zr0 2, 0.1% of CaO, 0.1% of SrO, and 0.1% of BaO. No chemically strengthened layer was included in the glass plates.
- In example 1, a sample was manufactured by forming a chamfered part by polishing a rectangular-shaped glass raw plate (plate-thickness: 0.8 mm) with the method described in
FIG. 2 and forming a curved surface part and a curved part with the method described inFIG. 4 . Then, the impact fracture strength of the sample was tested. The sample did not have a chemically strengthened layer. - A wrapping film sheet (#8000, manufactured by Sumitomo 3M Limited) was used as a sheet for forming the chamfered part. Further, a brush having polyimide brush hairs was used as a brush for forming the curved surface part and the curved part. The diameter of the brush hair was 0.2 mm. Further, cerium oxide having an average particle diameter (D50) of 2 μm was used as a polishing material for polishing with the brush.
-
FIG. 11 is a schematic diagram for describing an impact testing machine.FIG. 11 illustrates animpact testing machine 500 and asample 600. InFIG. 11 , a solid line indicates a state in which animpact oscillator 503 is in a neutral position whereas a dash-dot line indicates a state in which theimpact oscillator 503 is raised from the neutral state. - The
sample 600 includes two mainflat surfaces flat edge surface 603 that is orthogonal to each of the mainflat surfaces surfaces edge surface 603 and corresponding mainflat surfaces sample 600 is symmetrically formed with respect to a center plane of the mainflat surfaces FIG. 1 . - The
impact testing machine 500 includes arotational shaft 501 that is arranged in a horizontal position, arod 502 that extends in a vertical direction from therotational shaft 501, and theimpact oscillator 503 having a circular-columnar shape and coaxially fixed to therod 502. Theimpact oscillator 503 has a mass of 96 g and is formed of a SS (Stainless Steel) material. A part of theimpact oscillator 503 that contacts thesample 600 has a curvature radius of 2.5 mm. Theimpact oscillator 503 can rotate about therotational shaft 501. Further, theimpact oscillator 503 can rotate left and right with respect to the neutral position (position in which therod 502 is in a vertical state). - The
impact testing machine 500 includes ajig 504 that supports the mainflat surfaces sample 600 in an inclined position with respect to a vertical surface. The mainflat surfaces jig 504 supports thesample 600, so that a longitudinal direction of the chamferedsurface 606 becomes parallel to therotational shaft 501. - As illustrated with a double-dot dash line in
FIG. 11 , the impact test was performed by raising theimpact oscillator 503 from the neutral position and lowering theimpact oscillator 503 by gravity. Theimpact oscillator 503 rotates about therotational shaft 501 by gravity and collides with the sample 600 (technically, a lower side of the chamfered surface 606) at the neutral position as illustrated with the solid line inFIG. 11 . - The impact energy exerted to the
sample 600 when theimpact oscillator 503 collides with thesample 600 was calculated according to the mass of the rod 502 (16 g), the mass of the impact oscillator 503 (80 g), and the height H in which a center ofgravity 505 of theimpact oscillator 503 is raised. - Then, it was determined whether any cracks are formed in the
sample 600 by visual observation. In a case where no cracks were formed, the test was repeated by increasing the height H for raising theimpact oscillator 503. The impact position of theimpact oscillator 503 was changed each time the impact test was performed. A maximum impact energy when a crack(s) is formed is recorded as an impact fracture strength (J). - The shapes and the dimensions (chamfer width W of
FIG. 6 , curvature radius r1 ofFIG. 7 , curvature radius r2 ofFIG. 8 , and curvature radius ofFIG. 9 ) of the chamferedsurface 606 with which theimpact oscillator 503 collides were measured (evaluated) by cutting thesample 600 after the impact test and observing a cross-sectional surface of thecut sample 600. - Results of the evaluation are shown in the below-described Table 1. In Table 1, “45° impact fracture strength” indicates the impact fracture strength in a case where angle θ of
FIG. 11 is 45 degrees. Further, in Table 1, “30° impact fracture strength” indicates the impact fracture strength in a case where angle θ ofFIG. 11 is 30 degrees. - In example 2, a sample was manufactured under the same conditions as the conditions of example 1 except that the polishing time for forming a chamfered part of the sample was changed. After forming the sample, impact fracture resistance of the sample was measured. Further, the shape and the dimensions of the chamfered part of the sample were measured. Results of the measurements are shown in the below-described Table 1.
- In example 3, a sample was manufactured under the same conditions as the conditions of example 1 except that the method illustrated in
FIG. 3 was used instead of the method illustrated inFIG. 2 for forming a chamfered part of the sample. After forming the sample, impact fracture resistance of the sample was measured. Further, the shape and the dimensions of the chamfered part of the sample were measured. Results of the measurements are shown in the below-described Table 1. - In examples 4 and 5, samples were manufactured under the same conditions as the condition of example 1 except that a curved surface part and a curved part of the sample were not formed after forming a chamfered part of the sample. Therefore, the chamfered surfaces of the samples of the examples 4 and 5 are constituted only by chamfered parts. Thus, the chamfered part of each of the examples 4 and 5 is a flat surface that is diagonal to a main surface of the samples of the examples 4 and 5. The polishing time for forming a chamfered part was changed between the examples 4 and 5.
- Results of the evaluation of the examples 4 and 5 are shown in the below-described Table 1. Because the chamfered surfaces in examples 4 and 5 are flat surfaces, the curvature radii of the chamfered surfaces in examples 4 and 5 are infinite. Further, in examples 4 and 5, both a curvature radius r1 at an area between the main flat surface and the chamfered surface and a curvature radius r3 at an area between the chamfered surface and the edge surface are assumed to be 0 μm because the area between the main flat surface and the chamfered surface and the area between the chamfered surface and the edge surface having a curvature radius of r1 have bent shapes that do not include the curved surface part or the curved part.
- In example 6, the same glass raw plate used in example 1 was used as a sample of example 6. The sample of example 6 includes two main flat surfaces that are parallel to each other, and an edge surface that is orthogonal to each of the main flat surfaces. The sample of example 6 has no chamfered surface.
- Results of the evaluation of the example 6 are shown in the below-described Table 1. In example 6, the
impact oscillator 503 collided with a corner part between a main flat surface and an edge surface on the lower side of the sample because the sample of example 6 has no chamfered surface. Thus, the impact fracture strength of the sample of example 6 was significantly low. -
TABLE 1 45° 30° CURVATURE CURVATURE CURVATURE IMPACT IMPACT CHAMFER RADIUS RADIUS RADIUS FRACTURE FRACTURE WIDTH W r1 r2 r3 STRENGTH STRENGTH (μm) (μm) (μm) (μm) (J) (J) EXAMPLE 1 130 60 60 50 0.014 0.012 EXAMPLE 2 160 80 85 60 0.018 0.018 EXAMPLE 3 200 140 280 120 0.035 0.030 EXAMPLE 4 40 0 INFINITE 0 0.004 0.002 EXAMPLE 5 55 0 INFINITE 0 0.007 0.002 EXAMPLE 6 0 — — — 0.001 0.001 - Hence, with the above-described embodiments of the present invention, a glass plate having satisfactory impact fracture strength can be provided.
- Although embodiments of a glass plate have been described above, the present invention is not limited to these embodiments, but variations and modifications may be made without departing from the scope of the present invention.
- For example, although the
glass plate 10 in the above-described embodiments does not include a chemically strengthened layer, theglass plate 10 may include a chemically strengthened layer. In a case where a chemically strengthened layer (compression stress layer) is included in theglass plate 10, theglass plate 10 is formed by immersing glass into a process liquid used for ion-exchange. Thus, ions that have small ion radii and are contained in a surface of the glass (e.g., Li ions, Na ions) are replaced with ions that have large ion radii (e.g., K ions). As a result, the compression stress layer is formed having a predetermined depth from the surface of the glass. A tensile stress layer is formed inside theglass plate 10 for maintaining balance of stress. A chemically strengthened glass plate, in other words, a glass plate having a chemically strengthened layer (compression stress layer) formed in its main flat surface has high strength and high scratch resistance. Therefore, by chemically strengthening theglass plate 10 according to an embodiment of the present invention, theglass plate 10 can become more resistant to fracture and scratches. Accordingly, theglass plate 10 can be suitably used as a cover glass for protecting a display of a smartphone a tablet type PC (Personal Computer), a computer monitor, or a television set.
Claims (6)
1. A glass plate comprising:
a main flat surface;
an edge surface orthogonal to the main flat surface; and
a chamfered surface adjacent to the main flat surface and the edge surface;
wherein in a cross-sectional surface of the glass plate that is orthogonal to the edge surface and that is orthogonal to the main flat surface, the chamfered surface has a curvature radius greater than or equal to 50 μm at an intersection point between the chamfered surface and a straight line inclined 45 degrees with respect to the main flat surface and a curvature radius ranging from 20 μm to 500 μm at an intersection point between the chamfered surface and a straight line inclined 15 degrees with respect to the main flat surface.
2. The glass plate as claimed in claim 1 , wherein the chamfered surface has a chamfer width ranging from 20 μm to 500 μm in a direction orthogonal to the edge surface.
3. The glass plate as claimed in claim 1 ,
wherein in the cross-sectional surface of the glass plate that is orthogonal to the edge surface and that is orthogonal to the main flat surface, a curvature radius r2 of the chamfered surface is greater than or equal to a curvature radius r1 of the chamfered surface,
wherein the curvature radius r1 is a curvature radius of the chamfered surface at an intersection point between the chamfered surface and a straight line inclined 15 degrees with respect to the main flat surface,
wherein the curvature radius r2 is a curvature radius of the chamfered surface at an intersection point between the chamfered surface and a straight line inclined 45 degrees with respect to the main flat surface.
4. The glass plate as claimed in claim 1 , wherein the chamfered surface includes a flat part that is diagonal to the main flat surface.
5. The glass plate as claimed in claim 1 wherein the main flat surface includes a chemically strengthened layer.
6. The glass plate as claimed in claim 1 , wherein the glass plate is used for a cover glass of a display.
Priority Applications (1)
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US15/178,627 US20160280590A1 (en) | 2011-08-29 | 2016-06-10 | Glass plate |
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JP2011-186461 | 2011-08-29 | ||
JP2011186461 | 2011-08-29 | ||
PCT/JP2012/070860 WO2013031548A1 (en) | 2011-08-29 | 2012-08-16 | Glass plate |
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PCT/JP2012/070860 Continuation WO2013031548A1 (en) | 2011-08-29 | 2012-08-16 | Glass plate |
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US15/178,627 Continuation US20160280590A1 (en) | 2011-08-29 | 2016-06-10 | Glass plate |
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US20140170387A1 true US20140170387A1 (en) | 2014-06-19 |
Family
ID=47756042
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US14/189,072 Abandoned US20140170387A1 (en) | 2011-08-29 | 2014-02-25 | Glass plate |
US15/178,627 Abandoned US20160280590A1 (en) | 2011-08-29 | 2016-06-10 | Glass plate |
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US15/178,627 Abandoned US20160280590A1 (en) | 2011-08-29 | 2016-06-10 | Glass plate |
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US (2) | US20140170387A1 (en) |
JP (1) | JP5382280B2 (en) |
KR (2) | KR101988681B1 (en) |
CN (2) | CN107032638B (en) |
TW (1) | TWI576204B (en) |
WO (1) | WO2013031548A1 (en) |
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- 2012-08-16 KR KR1020197016183A patent/KR102132175B1/en active IP Right Grant
- 2012-08-16 CN CN201611001525.2A patent/CN107032638B/en active Active
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Also Published As
Publication number | Publication date |
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JPWO2013031548A1 (en) | 2015-03-23 |
JP5382280B2 (en) | 2014-01-08 |
KR101988681B1 (en) | 2019-06-12 |
CN103764586A (en) | 2014-04-30 |
WO2013031548A1 (en) | 2013-03-07 |
TWI576204B (en) | 2017-04-01 |
CN107032638B (en) | 2020-07-03 |
US20160280590A1 (en) | 2016-09-29 |
CN103764586B (en) | 2016-12-14 |
KR20190068636A (en) | 2019-06-18 |
TW201315572A (en) | 2013-04-16 |
KR20140063611A (en) | 2014-05-27 |
KR102132175B1 (en) | 2020-07-09 |
CN107032638A (en) | 2017-08-11 |
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