US20050190680A1 - Method of aligning optical system using a hologram and apparatus therefor - Google Patents
Method of aligning optical system using a hologram and apparatus therefor Download PDFInfo
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- US20050190680A1 US20050190680A1 US11/118,487 US11848705A US2005190680A1 US 20050190680 A1 US20050190680 A1 US 20050190680A1 US 11848705 A US11848705 A US 11848705A US 2005190680 A1 US2005190680 A1 US 2005190680A1
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- optical
- optical system
- hologram
- barrel
- beams
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/30—Collimators
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
- G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
- G01B11/272—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes using photoelectric detection means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/62—Optical apparatus specially adapted for adjusting optical elements during the assembly of optical systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/32—Holograms used as optical elements
Definitions
- the present invention relates to a method of aligning an optical system and an apparatus therefor, and more particularly, to a method of and an apparatus for easily aligning an optical system using a computer-generated hologram (CGH) and aligning elements.
- CGH computer-generated hologram
- an alignment of an optical system is achieved by aligning optical elements of the optical system and mechanically adjusting positions of the optical elements so that the optical system has an image quality within a prescribed tolerance.
- the conventional technique for aligning the optical system does not directly measure errors of the optical system, but measures light intensity representing the image quality to realign the optical elements where the image quality deviates from a tolerance limit.
- a method of aligning an optical system An optical element and a hologram element are installed in a barrel. Alignment errors of the optical element are measured from interference patterns formed on an image surface by reference beams and test beams. The optical element is aligned to remove the alignment errors.
- the hologram element is a computer-generated hologram element which is manufactured according to the tolerance of the optical system so that test beams travel in a same optical path as an incident path.
- the barrel may further include a unit for installing the computer-generated hologram element.
- the optical element may be installed in front of the computer-generated hologram element, wherein the test beams transmitted through the optical element are reflected on the computer-generated hologram element and travel on the same optical path.
- the optical element may be installed after the computer-generated hologram element, wherein the test beams transmitted through the computer-generated hologram element are perpendicularly reflected on an incident surface of the optical element and travel on the same optical path.
- the alignment errors of the optical element are measured from errors of the interference patterns with respect to null interference patterns.
- an optical system comprising at least one optical element with a hologram for diffracting test beams on the same optical path.
- the hologram may be a computer-generated hologram.
- an optical element with a hologram is aligned in a barrel so that test beams travel on the same optical path as an incident path. Alignment errors of the optical element are measured from interference patterns formed by reference beams and the test beams. The optical element is aligned to remove the alignment errors.
- the hologram may be a computer-generated hologram.
- the alignment errors of the optical element are measured from errors of the interference patterns with respect to null interference patterns.
- a method of testing a barrel A hologram element is placed in a predetermined position of the barrel and a predetermined lens is installed in a designated position of an optical element.
- a manufacturing condition of the barrel is measurable from interference patterns formed by reference beams and test beams.
- the hologram element is manufactured according to the tolerance of an optical element so that the test beams travel in the same optical path as an incident path.
- the hologram element may be a computer-generated hologram element.
- the barrel may include a unit for installing the computer-generated hologram element.
- the predetermined lens may be a spherical lens for measuring the manufacturing condition of the barrel.
- the test beams transmitted through the predetermined lens are reflected along the same optical path as an incident path.
- test beams transmitted through the computer-generated hologram are perpendicularly reflected on an incident surface of the predetermined lens and travel on the same optical path as an incident path.
- the manufacturing condition of the barrel is measurable from errors of the interference patterns with respect to null interference patterns.
- An optical system includes at least one optical element with a hologram element placed in a predetermined position of a barrel so that test beams travel on the same optical path as an incident path.
- the hologram element may be a computer-generated hologram element.
- an optical system comprising at least one optical element with a unit for placing a hologram element in a predetermined position of a barrel.
- the hologram element measures a manufacturing condition of the barrel or aligns the at least one optical element.
- the hologram element may be a computer-generated hologram element.
- the present invention provides a method of aligning an optical system using a computer-generated hologram in real time and in an accurate manner and a measured manufacturing condition of a barrel. Also, the present invention provides an optical element which is directly aligned and simultaneously used by writing a hologram directly on the optical element, and a method of aligning the optical system.
- Alignment errors of the optical system include a defocus error, a decenter error, a tip error, and a tilt error.
- the defocus error occurs where light rays are bent toward an optical axis by more or less than a correct amount as in focusing or defocusing the system.
- the decenter error occurs where the center of the optical element is not aligned with the optical axis of the system.
- the tip error occurs where the optical element is inclined on an X-axis.
- the tilting error occurs when the optical element is inclined on a Y-axis.
- the alignment of the optical system represents the arrangement of optical elements constituting the optical system without the defocus, decenter, tip and tilt errors.
- FIG. 1 is a schematic view of an optical projection system using a method of aligning an optical system according to a first embodiment of the present invention
- FIG. 2 is another schematic view of the optical projection system using a method of aligning the optical system according to a second embodiment of the present invention
- FIG. 3 is a schematic view of an interferometer useable in the method of aligning the optical system according to the embodiments of the present invention
- FIG. 4 is a schematic view illustrating a method of testing a barrel according to the present invention.
- FIG. 5 is a schematic view illustrating another method of testing a barrel according to the present invention.
- FIG. 6 is a schematic view illustrating an optical system and a method of aligning the optical system according to a first embodiment of the present invention
- FIG. 7 is schematic view illustrating another optical system and a method of aligning the optical system according to a second embodiment of the present invention.
- FIG. 8 is a view showing interference patterns resulting from alignment or manufacturing errors
- FIG. 9 is view showing interference patterns resulting from decentering errors in a first direction.
- FIG. 10 is a view showing interference patterns resulting from decentering errors in a second direction.
- FIG. 1 is a schematic view of an optical projection system using a method of aligning an optical system having a hologram element, i.e., a computer-generated hologram (CGH) element, according to a first embodiment of the present invention.
- FIG. 3 shows a more detailed view of a Fizeau interferometer.
- a Fizeau interferometer 31 forms test beams 1 and reference beams 3 from a light source 41 .
- An optical projection system 35 has optical elements on which the test beams 1 transmitted through the Fizeau interferometer 31 are incident.
- interferometer 31 another type of interferometer may be used as the interferometer 31 .
- the present invention is described with reference to a method of aligning an optical projection system but the principles thereof may be applied to an alignment of another type of optical system.
- the Fizeau interferometer 31 is positioned in front of the optical projection system as shown in FIG. 1 and generates the test beams 1 and the reference beams 3 necessary for the method of aligning the optical system and the method of testing a barrel.
- test beams 1 emitted from the Fizeau interferometer 31 are incident on the optical projection system 35 which is positioned rearward of the Fizeau interferometer 31 .
- the optical elements which are components of the optical system are lenses or mirrors, but not a CGH.
- the Fizeau interferometer 31 includes a light source 41 , a condensing lens 42 , a filter 43 , a beam splitter 45 , and a collimating lens 47 .
- the condensing lens 42 condenses beams generated from the light source 41 .
- the filter 43 transmits only ones of the specific wavelengths of the incident beams.
- the beam splitter 45 splits an optical path into two optical paths so that some of the incident beams, the reference beams 3 travel toward an image surface 49 and the test beams 1 travel toward the optical projection system 35 .
- the collimating lens 47 collimates the test beams 1 .
- the light source 41 may generate laser beams, some of which are the test beams 1 and some of which are the reference beams 3 .
- the condensing lens 42 condenses the laser beams generated by the light source 41 and transmits the condensed laser beams to the beam splitter 45 .
- the filter 43 is positioned on an optical path between the condensing lens 42 and the beam splitter 45 and is adapted to transmit only incident beams having optimum light intensity within a predetermined frequency range.
- the beam splitter 45 changes the optical path of the reference beams 3 of the incident beams to an angle of 90° so that the reference beams 3 travel toward the image surface 49 and transmits the test beams 1 , without alteration of the optical path, toward the optical projection system 35 .
- the collimating lens 47 collimates the test beams 1 transmitted through the beam splitter 45 . Also, a lens (not shown) is positioned in front of the collimating lens 47 to assist in making the test beams 1 transmitted through the collimating lens 47 into convergent light beams.
- the test beams 1 are transmitted to the optical projection system 35 through the Fizeau interferometer 31 , are reflected by an optical element or a CGH element of the optical projection system 35 , and are incident again on the Fizeau interferometer 31 .
- the beam splitter 45 changes the optical path of the reflected test beams 1 incident again on the Fizeau interferometer 31 to an angle of 90° so that the reflected test beams 1 travel toward the image surface 49 and form interference patterns with the reference beams 3 on the image surface 49 .
- convergent light beams may be used rather than collimated light beams as the test beams transmitted through the Fizeau interferometer 31 .
- the convergent light beams may be formed by positioning an optical lens in front of the collimating lens 47 of the Fizeau interferometer 31 , as described above.
- the structure and function of the optical system 35 shown in FIG. 2 are the same as the structure and function of the optical system 35 described with reference to FIG. 1 .
- FIGS. 4 and 5 are schematic views illustrating a method of testing a barrel to measure the manufacturing condition of the barrel in which an optical element is installed.
- a hologram element i.e., a CGH element 33
- the CGH element 33 is placed in a predetermined position of a barrel 37 .
- FIG. 4 In the embodiment shown in FIG.
- a predetermined lens 32 is installed in a designated position of an optical element, and the manufacturing condition of the barrel 37 is measured from interference patterns formed by the reference beams 3 and the reflected test beams 1 emitted from the predetermined lens 32 .
- a predetermined lens 34 is installed in a designated position of another optical element, and the manufacturing condition of the barrel 37 is measured from the interference patterns formed by the reference beams 3 and the test beams 1 reflected by the predetermined lens 34 and emitted from the CGH element 33 .
- the CGH element 33 is manufactured in consideration of a tolerance limit of image quality.
- the predetermined lens 32 is manufactured to the same size as a diameter and a thickness of an edge of an optical element which will be installed in the barrel 37 and is designed to have an optimum curvature radius so that beams are incident on an accurate predetermined position of the CGH element 33 .
- the predetermined lens 32 is manufactured in consideration of each optical element and is installed in a designated position where optical elements are placed to measure the manufacturing condition of the barrel 37 .
- the CGH element 33 is manufactured so as to reflect the test beams 1 transmitted from the predetermined lens 32 so that the test beams 1 travel inversely with respect to optical path where the predetermined lens 32 is positioned in front of the CGH element 33 .
- the CGH element 33 is manufactured so that the test beams 1 are transmitted to the CGH 33 , reflected on a mirror 36 , are perpendicularly incident and reflected on an incident surface of the predetermined lens 34 , and travel inversely with respect to the optical path, and transmitted to the interferometer 31 through the CGH element 33 .
- the CGH element 33 may be ring-shaped or fan-shaped depending on the optical path of the test beams 1 transmitted through the predetermined lens 32 .
- the barrel 37 may include an additional unit so as to install the CGH element 33 .
- the predetermined lens 32 is specially manufactured to measure the manufacturing condition of the barrel 37 . Also, the predetermined lens 32 is placed in a designated position of each optical element that will be positioned in front of a hologram element, i.e., the CGH element 33 , to retransmit the test beams 1 reflected by the CGH element 33 to the Fizeau interferometer 31 .
- a hologram element i.e., the CGH element 33
- the predetermined lens 34 is placed in a designated position of each optical element after the CGH element 33 .
- the test beams 1 transmitted through the CGH element 33 are perpendicularly incident, are reflected on an incident surface of the predetermined lens 34 according to the reflection law, change direction to an inverse direction, and are thus transmitted to the Fizeau interferometer 31 .
- the test beams 1 which are incident on the Fizeau interferometer 31 from the optical projection system 35 form interference patterns with the reference beams 3 on the image surface 49 . If these interference patterns are null interference patterns, the barrel 37 is determined to be manufactured to a design parameter. If the interference patterns are not null interference patterns, the barrel 37 is determined not to be manufactured to the design parameter. Manufacturing errors of the barrel 37 are correctable based on shapes of the interference patterns.
- FIG. 6 is a schematic view illustrating an optical system 35 in which a hologram element, i.e., a CGH element, is additionally installed and a method of aligning the optical system according to an embodiment of the present invention.
- the optical system according to the embodiment of the present invention includes at least one optical element 32 a on which test beams 1 are incident from an interferometer 31 and a barrel 37 having a hologram element.
- the hologram element is a CGH element 33 .
- an additional unit may be prepared in the barrel 37 .
- a hologram element i.e., the CGH element 33
- the CGH element 33 is manufactured to reflect test beams 1 along a same optical path as an incident path of the test beams 1 .
- Optical elements 32 a and 34 a are installed in the barrel 37 and alignment errors of the optical elements 32 a and 34 a are measurable from interference patterns formed by reference beams 3 ( FIG. 3 ) and test beams 1 transmitted through the optical element 32 a and reflected by the CGH element 33 or transmitted through the CGH element 33 and reflected by the optical elements 34 a .
- the optical elements 32 a and 34 a are aligned to remove the alignment errors.
- the CGH element 33 is manufactured in consideration of a tolerance limit of image quality.
- the CGH element 33 used in the method of aligning the optical system according to the embodiment of the present invention is manufactured by the same method as the CGH element 33 in the method of testing the barrel.
- the CGH element 33 is manufactured so that the CGH element 33 is written in a position where test beams 1 transmitted through the optical elements 32 a and 34 a are incident.
- Light beams transmitted through the optical element 32 a positioned in front of the CGH element 33 are reflected along the same optical path, and light beams transmitted through the optical element 34 a positioned behind the CGH element 33 are reflected along the same optical path.
- Alignment errors of the optical system are measurable after the optical elements 32 a and 34 a are both arranged in the barrel 37 or after the optical elements 32 a and 34 a are separately installed.
- alignment errors of the optical system are measurable from errors of the reference patterns with respect to null interference patterns formed by the reference beams 3 generated from the interferometer 31 and the test beams 1 returned from the optical system 35 .
- FIG. 7 is a schematic view illustrating an optical system using optical elements on which a CGH is written, according to the embodiment of the present invention, and a method of aligning the optical system.
- holograms 30 a and 30 b are written directly on optical elements 32 b and 34 b , respectively.
- the holograms may be computer-generated holograms.
- the CGH 30 a and the CGH 30 b which are designed through computer simulation are written on the optical elements 32 b and 34 b , respectively, so that the test beams 1 are incident on the optical elements 32 b and 34 b and are reflected in the same optical path as the incident path.
- the CGH 30 a and the CGH 30 b may be written around the respective peripheral areas of the optical elements 32 b and 34 b so as not to degrade the quality of an image formed by beams transmitted through the optical elements 32 b and 34 b.
- a hologram is formed on the optical elements 32 b and 34 b so that the test beams 1 travel in the same optical path as the incident path.
- the optical elements 32 b and 34 b are arranged in the barrel 37 , and alignment errors of the optical elements 32 b and 34 b are measured from interference patterns which are formed on the image surface 49 by the reference beams 3 and the test beams 1 transmitted through the optical elements 32 b and 34 b.
- the optical elements 32 b and 34 b are aligned to remove the alignment errors.
- the hologram formed on each optical element may be a CGH.
- test beams 1 are incident on and reflected by the respective CGH formed on the optical elements 32 b and 34 b , change optical paths to an inverse direction of the incident direction, and interfere with the reference beams 3 of the interferometer 31 shown in FIG. 3 to form an interference pattern on the image surface 49 .
- test beams 1 and the reference beams 3 form a null interference pattern in the method of aligning the optical system in which the CGH is additionally installed or in the method of testing the barrel, the optical system is determined to be correctly aligned.
- alignment errors are determined to occur in the optical system.
- the errors shown, g ⁇ 2 and g ⁇ 1 indicate that the optical elements are close to the X-axis direction of the interferometer, while the + errors shown, g +1 and g +2 , indicate the opposite.
- a null interference pattern go shown in FIG. 8 is formed where optical system alignment errors or barrel test errors do not occur.
- the shape of the circle of the null interference pattern g 0 represents the shape of the image surface, which means that an interference pattern is not formed.
- Interference patterns g +1 and g +2 are created where the optical system alignment errors or the barrel test errors are in a +error direction. Where errors occur, interference patterns increase by one or by two, and circles of the interference patterns become larger and spread out in a form of waves.
- an error ⁇ E determined according to equation 1 equals ⁇ , where ⁇ is the wavelength of the beam. In the same manner, if three circles occur as in the interference pattern g ⁇ 2 shown in FIG. 8 , the error ⁇ E determined according to equation 1 is 1.5 ⁇ .
- the black and white colors of interference patterns corresponding to the ⁇ error are interchanged with the black and white colors of the interference patterns corresponding to the +error direction.
- FIGS. 9 and 10 show interference patterns created where decentering error occurs in the method of aligning the optical system or the method of testing the barrel.
- an interference pattern g +1 is created in the +error direction.
- an interference pattern g ⁇ 2 is created in the ⁇ error direction.
- an interference pattern g +1 is created in the +error direction.
- an interference pattern g ⁇ 2 is created in the ⁇ error direction.
- the interference patterns shown in FIG. 9 are created.
- the errors can be calculated from equation 1 according to the number of interference patterns, as described above.
- the manufacturing condition of the barrel or the alignment errors of the optical system are measurable in real time and in an accurate manner using a CGH.
- the CGH is not installed as an additional element, but the CGH is directly written on the optical element to simplify the configuration of the optical system. Also, since the CGH which is written directly on one or more elements of the optical system becomes a part of the optical system as sold, errors are prevented from initially occurring and the CGH may be used by a customer to aid in any realignment of the optical system without adding another element to the system.
- the method of aligning the optical system or the method of testing the barrel may be applied to an optical system easily and accurately measure alignment or manufacturing errors of the optical system in real time.
- the aligned optical elements and the method of aligning the optical system allow measuring the alignment errors in optical systems in real time and in an accurate manner. Further, since an additional unit is unnecessary for the CGH, the configuration of the optical system is simplified and errors are remarkably reduced.
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- Optics & Photonics (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
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- Diffracting Gratings Or Hologram Optical Elements (AREA)
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Abstract
A method of aligning an optical system and an optical system incorporating the method. A hologram element is installed in the optical system so that test beams diffracted by the hologram element travel along a same optical path as test beams incident on the optical system. Alignment errors in the optical system are measured using interference patterns formed on an image surface by test beams returned from the optical system and reference beams. At least one optical element of the system is aligned using measurements calculated from the interference patterns. The optical system may provide for temporarily installing the hologram element to perform the measurements or the optical system may be constructed with a hologram formed on any optical element which may require alignment. A direction and a magnitude of any misalignment are determinable based on an appearance of the pattern and a number of circles in the pattern, respectively.
Description
- This application is a divisional of Ser. No. 10/246,541 which claims the benefit of Korean Application No. 2001-61641 filed Oct. 6, 2001, in the Korean Industrial Property Office, the disclosure of which is incorporated herein by reference.
- 1. Field of the Invention
- The present invention relates to a method of aligning an optical system and an apparatus therefor, and more particularly, to a method of and an apparatus for easily aligning an optical system using a computer-generated hologram (CGH) and aligning elements.
- 2. Description of the Related Art
- In general, an alignment of an optical system is achieved by aligning optical elements of the optical system and mechanically adjusting positions of the optical elements so that the optical system has an image quality within a prescribed tolerance. The conventional technique for aligning the optical system does not directly measure errors of the optical system, but measures light intensity representing the image quality to realign the optical elements where the image quality deviates from a tolerance limit.
- In the conventional method of aligning the optical system, an additional unit is necessary to measure the image quality and the optical system is realigned by measuring the image quality and indirectly calculating the alignment errors of the optical system. Thus, it is difficult to accurately calculate the alignment errors and errors may occur in realigning the optical system.
- In the conventional technique, optical elements are aligned through mechanical manipulation, which results in a slack alignment of the optical elements, and an additional alignment unit is necessary to perform the alignment. Thus, the configuration of the conventional apparatus becomes complicated and the manufacturing cost increases.
- To solve the above-described problems, it is an object of the present invention to provide a method of precisely aligning an optical system in real time and in an accurate manner by removing errors occurring through mechanical manipulation of optical elements of the optical system, and associated aligning elements.
- Additional objects and advantages of the invention will be set forth in part in the description which follows, and, in part, will be obvious from the description, or may be learned by practice of the invention.
- Accordingly, to achieve the above and other objects, there is provided a method of aligning an optical system. An optical element and a hologram element are installed in a barrel. Alignment errors of the optical element are measured from interference patterns formed on an image surface by reference beams and test beams. The optical element is aligned to remove the alignment errors.
- The hologram element is a computer-generated hologram element which is manufactured according to the tolerance of the optical system so that test beams travel in a same optical path as an incident path.
- The barrel may further include a unit for installing the computer-generated hologram element.
- The optical element may be installed in front of the computer-generated hologram element, wherein the test beams transmitted through the optical element are reflected on the computer-generated hologram element and travel on the same optical path.
- Alternatively, the optical element may be installed after the computer-generated hologram element, wherein the test beams transmitted through the computer-generated hologram element are perpendicularly reflected on an incident surface of the optical element and travel on the same optical path.
- The alignment errors of the optical element are measured from errors of the interference patterns with respect to null interference patterns.
- To achieve the above and other objects, there is provided an optical system comprising at least one optical element with a hologram for diffracting test beams on the same optical path.
- The hologram may be a computer-generated hologram.
- To achieve the above and other objects, there is provided a method of aligning an optical system. An optical element with a hologram is aligned in a barrel so that test beams travel on the same optical path as an incident path. Alignment errors of the optical element are measured from interference patterns formed by reference beams and the test beams. The optical element is aligned to remove the alignment errors.
- The hologram may be a computer-generated hologram.
- The alignment errors of the optical element are measured from errors of the interference patterns with respect to null interference patterns.
- To achieve the above and other objects, there is provided a method of testing a barrel. A hologram element is placed in a predetermined position of the barrel and a predetermined lens is installed in a designated position of an optical element. A manufacturing condition of the barrel is measurable from interference patterns formed by reference beams and test beams.
- The hologram element is manufactured according to the tolerance of an optical element so that the test beams travel in the same optical path as an incident path.
- The hologram element may be a computer-generated hologram element.
- The barrel may include a unit for installing the computer-generated hologram element.
- The predetermined lens may be a spherical lens for measuring the manufacturing condition of the barrel.
- Where the predetermined lens is installed in front of the computer-generated hologram element, the test beams transmitted through the predetermined lens are reflected along the same optical path as an incident path.
- Where the predetermined lens is installed after the computer-generated hologram element, the test beams transmitted through the computer-generated hologram are perpendicularly reflected on an incident surface of the predetermined lens and travel on the same optical path as an incident path.
- The manufacturing condition of the barrel is measurable from errors of the interference patterns with respect to null interference patterns.
- An optical system according to the present invention includes at least one optical element with a hologram element placed in a predetermined position of a barrel so that test beams travel on the same optical path as an incident path.
- The hologram element may be a computer-generated hologram element.
- To achieve the above and other objects, there is provided an optical system comprising at least one optical element with a unit for placing a hologram element in a predetermined position of a barrel.
- The hologram element measures a manufacturing condition of the barrel or aligns the at least one optical element.
- The hologram element may be a computer-generated hologram element.
- The present invention provides a method of aligning an optical system using a computer-generated hologram in real time and in an accurate manner and a measured manufacturing condition of a barrel. Also, the present invention provides an optical element which is directly aligned and simultaneously used by writing a hologram directly on the optical element, and a method of aligning the optical system.
- Alignment errors of the optical system include a defocus error, a decenter error, a tip error, and a tilt error. The defocus error occurs where light rays are bent toward an optical axis by more or less than a correct amount as in focusing or defocusing the system. The decenter error occurs where the center of the optical element is not aligned with the optical axis of the system. The tip error occurs where the optical element is inclined on an X-axis. The tilting error occurs when the optical element is inclined on a Y-axis.
- The alignment of the optical system represents the arrangement of optical elements constituting the optical system without the defocus, decenter, tip and tilt errors.
- The above object and advantages of the present invention will become more apparent by describing in detail preferred embodiments thereof with reference to the attached drawings in which:
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FIG. 1 is a schematic view of an optical projection system using a method of aligning an optical system according to a first embodiment of the present invention; -
FIG. 2 is another schematic view of the optical projection system using a method of aligning the optical system according to a second embodiment of the present invention; -
FIG. 3 is a schematic view of an interferometer useable in the method of aligning the optical system according to the embodiments of the present invention; -
FIG. 4 is a schematic view illustrating a method of testing a barrel according to the present invention; -
FIG. 5 is a schematic view illustrating another method of testing a barrel according to the present invention; -
FIG. 6 is a schematic view illustrating an optical system and a method of aligning the optical system according to a first embodiment of the present invention; -
FIG. 7 is schematic view illustrating another optical system and a method of aligning the optical system according to a second embodiment of the present invention; -
FIG. 8 is a view showing interference patterns resulting from alignment or manufacturing errors; -
FIG. 9 is view showing interference patterns resulting from decentering errors in a first direction; and -
FIG. 10 is a view showing interference patterns resulting from decentering errors in a second direction. - Reference will now be made in detail to the present embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to like elements throughout. Embodiments of a method of aligning an optical system, an optical system having aligned elements, and a method of testing a barrel according to the present invention will be described in detail.
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FIG. 1 is a schematic view of an optical projection system using a method of aligning an optical system having a hologram element, i.e., a computer-generated hologram (CGH) element, according to a first embodiment of the present invention.FIG. 3 shows a more detailed view of a Fizeau interferometer. - Referring to
FIGS. 1 and 3 , in an embodiment of an optical system, a method of aligning the optical system, and a method of testing a barrel according to the present invention, aFizeau interferometer 31 forms testbeams 1 andreference beams 3 from alight source 41. Anoptical projection system 35 has optical elements on which thetest beams 1 transmitted through theFizeau interferometer 31 are incident. - Alternatively, another type of interferometer may be used as the
interferometer 31. Also, the present invention is described with reference to a method of aligning an optical projection system but the principles thereof may be applied to an alignment of another type of optical system. - The
Fizeau interferometer 31 is positioned in front of the optical projection system as shown inFIG. 1 and generates thetest beams 1 and thereference beams 3 necessary for the method of aligning the optical system and the method of testing a barrel. - The test beams 1 emitted from the
Fizeau interferometer 31 are incident on theoptical projection system 35 which is positioned rearward of theFizeau interferometer 31. Here, the optical elements which are components of the optical system are lenses or mirrors, but not a CGH. - Referring to
FIG. 3 , theFizeau interferometer 31 includes alight source 41, a condensinglens 42, afilter 43, abeam splitter 45, and acollimating lens 47. The condensinglens 42 condenses beams generated from thelight source 41. Thefilter 43 transmits only ones of the specific wavelengths of the incident beams. Thebeam splitter 45 splits an optical path into two optical paths so that some of the incident beams, thereference beams 3 travel toward animage surface 49 and thetest beams 1 travel toward theoptical projection system 35. The collimatinglens 47 collimates the test beams 1. Thelight source 41 may generate laser beams, some of which are thetest beams 1 and some of which are the reference beams 3. - The condensing
lens 42 condenses the laser beams generated by thelight source 41 and transmits the condensed laser beams to thebeam splitter 45. Thefilter 43 is positioned on an optical path between the condensinglens 42 and thebeam splitter 45 and is adapted to transmit only incident beams having optimum light intensity within a predetermined frequency range. - The
beam splitter 45 changes the optical path of thereference beams 3 of the incident beams to an angle of 90° so that thereference beams 3 travel toward theimage surface 49 and transmits thetest beams 1, without alteration of the optical path, toward theoptical projection system 35. - The collimating
lens 47 collimates thetest beams 1 transmitted through thebeam splitter 45. Also, a lens (not shown) is positioned in front of the collimatinglens 47 to assist in making thetest beams 1 transmitted through the collimatinglens 47 into convergent light beams. - The test beams 1 are transmitted to the
optical projection system 35 through theFizeau interferometer 31, are reflected by an optical element or a CGH element of theoptical projection system 35, and are incident again on theFizeau interferometer 31. Thebeam splitter 45 changes the optical path of the reflectedtest beams 1 incident again on theFizeau interferometer 31 to an angle of 90° so that the reflectedtest beams 1 travel toward theimage surface 49 and form interference patterns with the reference beams 3 on theimage surface 49. - Referring to
FIG. 2 , in the optical projection system using the optical system, the method of aligning the optical system, and the method of testing the barrel according to the present invention, convergent light beams may be used rather than collimated light beams as the test beams transmitted through theFizeau interferometer 31. The convergent light beams may be formed by positioning an optical lens in front of the collimatinglens 47 of theFizeau interferometer 31, as described above. The structure and function of theoptical system 35 shown inFIG. 2 are the same as the structure and function of theoptical system 35 described with reference toFIG. 1 . -
FIGS. 4 and 5 are schematic views illustrating a method of testing a barrel to measure the manufacturing condition of the barrel in which an optical element is installed. Referring toFIGS. 4 and 5 , in the method of testing the barrel according to embodiments of the present invention, a hologram element, i.e., aCGH element 33, is manufactured to reflecttest beams 1 along an optical path which is the same as an optical path of incident test beams 1. TheCGH element 33 is placed in a predetermined position of abarrel 37. In the embodiment shown inFIG. 4 , apredetermined lens 32 is installed in a designated position of an optical element, and the manufacturing condition of thebarrel 37 is measured from interference patterns formed by thereference beams 3 and the reflectedtest beams 1 emitted from thepredetermined lens 32. In the embodiment shown inFIG. 5 , apredetermined lens 34 is installed in a designated position of another optical element, and the manufacturing condition of thebarrel 37 is measured from the interference patterns formed by thereference beams 3 and thetest beams 1 reflected by thepredetermined lens 34 and emitted from theCGH element 33. TheCGH element 33 is manufactured in consideration of a tolerance limit of image quality. - As shown in
FIG. 4 , thepredetermined lens 32 is manufactured to the same size as a diameter and a thickness of an edge of an optical element which will be installed in thebarrel 37 and is designed to have an optimum curvature radius so that beams are incident on an accurate predetermined position of theCGH element 33. Thepredetermined lens 32 is manufactured in consideration of each optical element and is installed in a designated position where optical elements are placed to measure the manufacturing condition of thebarrel 37. - The
CGH element 33 is manufactured so as to reflect thetest beams 1 transmitted from thepredetermined lens 32 so that thetest beams 1 travel inversely with respect to optical path where thepredetermined lens 32 is positioned in front of theCGH element 33. - Where the
predetermined lens 34 is positioned after theCGH element 33 as shown inFIG. 5 , theCGH element 33 is manufactured so that thetest beams 1 are transmitted to theCGH 33, reflected on amirror 36, are perpendicularly incident and reflected on an incident surface of thepredetermined lens 34, and travel inversely with respect to the optical path, and transmitted to theinterferometer 31 through theCGH element 33. - The
CGH element 33 may be ring-shaped or fan-shaped depending on the optical path of thetest beams 1 transmitted through thepredetermined lens 32. Thebarrel 37 may include an additional unit so as to install theCGH element 33. - Referring to
FIG. 4 , thepredetermined lens 32 is specially manufactured to measure the manufacturing condition of thebarrel 37. Also, thepredetermined lens 32 is placed in a designated position of each optical element that will be positioned in front of a hologram element, i.e., theCGH element 33, to retransmit thetest beams 1 reflected by theCGH element 33 to theFizeau interferometer 31. - Referring to
FIG. 5 , thepredetermined lens 34 is placed in a designated position of each optical element after theCGH element 33. The test beams 1 transmitted through theCGH element 33 are perpendicularly incident, are reflected on an incident surface of thepredetermined lens 34 according to the reflection law, change direction to an inverse direction, and are thus transmitted to theFizeau interferometer 31. - As described above, the
test beams 1 which are incident on theFizeau interferometer 31 from theoptical projection system 35 form interference patterns with the reference beams 3 on theimage surface 49. If these interference patterns are null interference patterns, thebarrel 37 is determined to be manufactured to a design parameter. If the interference patterns are not null interference patterns, thebarrel 37 is determined not to be manufactured to the design parameter. Manufacturing errors of thebarrel 37 are correctable based on shapes of the interference patterns. -
FIG. 6 is a schematic view illustrating anoptical system 35 in which a hologram element, i.e., a CGH element, is additionally installed and a method of aligning the optical system according to an embodiment of the present invention. Referring toFIG. 6 , the optical system according to the embodiment of the present invention includes at least oneoptical element 32 a on whichtest beams 1 are incident from aninterferometer 31 and abarrel 37 having a hologram element. The hologram element is aCGH element 33. To install theCGH element 33, an additional unit may be prepared in thebarrel 37. - Referring to
FIG. 6 , in the method of aligning the optical system, a hologram element, i.e., theCGH element 33, is manufactured to reflecttest beams 1 along a same optical path as an incident path of the test beams 1.Optical elements barrel 37 and alignment errors of theoptical elements FIG. 3 ) andtest beams 1 transmitted through theoptical element 32 a and reflected by theCGH element 33 or transmitted through theCGH element 33 and reflected by theoptical elements 34 a. Finally, theoptical elements CGH element 33 is manufactured in consideration of a tolerance limit of image quality. - The
CGH element 33 used in the method of aligning the optical system according to the embodiment of the present invention is manufactured by the same method as theCGH element 33 in the method of testing the barrel. In other words, theCGH element 33 is manufactured so that theCGH element 33 is written in a position wheretest beams 1 transmitted through theoptical elements optical element 32 a positioned in front of theCGH element 33 are reflected along the same optical path, and light beams transmitted through theoptical element 34 a positioned behind theCGH element 33 are reflected along the same optical path. - Alignment errors of the optical system are measurable after the
optical elements barrel 37 or after theoptical elements - Similar to the method of testing the barrel, in the method of aligning the optical system where the
CGH element 33 is additionally installed, alignment errors of the optical system are measurable from errors of the reference patterns with respect to null interference patterns formed by thereference beams 3 generated from theinterferometer 31 and thetest beams 1 returned from theoptical system 35. -
FIG. 7 is a schematic view illustrating an optical system using optical elements on which a CGH is written, according to the embodiment of the present invention, and a method of aligning the optical system. Referring toFIG. 7 ,holograms optical elements - The
CGH 30 a and theCGH 30 b which are designed through computer simulation are written on theoptical elements test beams 1 are incident on theoptical elements CGH 30 a and theCGH 30 b may be written around the respective peripheral areas of theoptical elements optical elements - Referring to
FIG. 7 , in the method of aligning the optical system according to the embodiment of the present invention, a hologram is formed on theoptical elements test beams 1 travel in the same optical path as the incident path. Theoptical elements barrel 37, and alignment errors of theoptical elements image surface 49 by thereference beams 3 and thetest beams 1 transmitted through theoptical elements optical elements - The test beams 1 are incident on and reflected by the respective CGH formed on the
optical elements reference beams 3 of theinterferometer 31 shown inFIG. 3 to form an interference pattern on theimage surface 49. - As described above, where the
test beams 1 and thereference beams 3 form a null interference pattern in the method of aligning the optical system in which the CGH is additionally installed or in the method of testing the barrel, the optical system is determined to be correctly aligned. However, where another type of interference pattern is formed, alignment errors are determined to occur in the optical system. - Manufacturing errors of the barrel or alignment errors of the optical system contribute to the defocus, tip, tilt, or decenter errors of the optical system.
FIGS. 8 through 10 illustrate interference patterns formed on theimage surface 49 by the errors. Errors may be calculated byequation 1 which is applicable to all of the above-described errors.
ΔE=λ/2×(number of interference patterns) (1) - Referring to
FIG. 8 , it can be seen that a number of interference patterns increases with an increase in the error. The errors shown, g−2 and g−1, indicate that the optical elements are close to the X-axis direction of the interferometer, while the + errors shown, g+1 and g+2, indicate the opposite. - A null interference pattern go shown in
FIG. 8 is formed where optical system alignment errors or barrel test errors do not occur. The shape of the circle of the null interference pattern g0 represents the shape of the image surface, which means that an interference pattern is not formed. - Interference patterns g+1 and g+2 are created where the optical system alignment errors or the barrel test errors are in a +error direction. Where errors occur, interference patterns increase by one or by two, and circles of the interference patterns become larger and spread out in a form of waves.
- If two circles occur as in the interference pattern g+1 of
FIG. 8 , an error ΔE determined according toequation 1 equals λ, where λ is the wavelength of the beam. In the same manner, if three circles occur as in the interference pattern g−2 shown inFIG. 8 , the error ΔE determined according toequation 1 is 1.5 λ. The black and white colors of interference patterns corresponding to the −error are interchanged with the black and white colors of the interference patterns corresponding to the +error direction. -
FIGS. 9 and 10 show interference patterns created where decentering error occurs in the method of aligning the optical system or the method of testing the barrel. Referring toFIG. 9 , where the center of the optical axis of the optical element moves upward on the Z-axis, as shown inFIG. 9 , an interference pattern g+1 is created in the +error direction. Where the center of the optical axis of the optical element moves downward on the Z-axis, as shown inFIG. 9 , an interference pattern g−2 is created in the −error direction. - Referring to
FIG. 10 , where the center of the optical axis of the optical element moves along the Y-axis in a positive direction, as shown inFIG. 10 , an interference pattern g+1 is created in the +error direction. Where the center of the optical axis of the optical element moves along the Y-axis in a negative direction, as shown inFIG. 10 , an interference pattern g−2 is created in the −error direction. - If tip or tilting error occurs in the method of aligning the optical system or the method of testing the barrel, the interference patterns shown in
FIG. 9 are created. The errors can be calculated fromequation 1 according to the number of interference patterns, as described above. - In the method of aligning the optical system and the method of testing the barrel according to the embodiment of the present invention, the manufacturing condition of the barrel or the alignment errors of the optical system are measurable in real time and in an accurate manner using a CGH.
- In particular, in the optical system and the method of aligning the optical system according to the present invention, the CGH is not installed as an additional element, but the CGH is directly written on the optical element to simplify the configuration of the optical system. Also, since the CGH which is written directly on one or more elements of the optical system becomes a part of the optical system as sold, errors are prevented from initially occurring and the CGH may be used by a customer to aid in any realignment of the optical system without adding another element to the system.
- As described above, the method of aligning the optical system or the method of testing the barrel may be applied to an optical system easily and accurately measure alignment or manufacturing errors of the optical system in real time.
- Also, the aligned optical elements and the method of aligning the optical system allow measuring the alignment errors in optical systems in real time and in an accurate manner. Further, since an additional unit is unnecessary for the CGH, the configuration of the optical system is simplified and errors are remarkably reduced.
- Although a few embodiments of the present invention have been shown and described, it would be appreciated by those skilled in the art that changes may be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the claims and their equivalents.
Claims (11)
1. An optical system comprising at least one optical element having a hologram for diffracting light beams on a same optical path as light beams transmitted or reflected by the at least one optical element.
2. The optical system of claim 1 , wherein the hologram is a computer-generated hologram.
3. An optical system comprising:
a barrel; and
at least one optical element having a hologram element formed thereon,
wherein:
the at least one optical element is placed in a predetermined position of the barrel so that test beams diffracted by the hologram element travel along a same optical path as test beams incident on the optical system.
4. The optical system of claim 3 , wherein the hologram element is a computer-generated hologram element.
5. An optical system comprising:
a barrel; and
at least one optical element mounted in the barrel,
wherein:
the barrel further comprises a unit in which to place a hologram element in a predetermined position of the barrel.
6. The optical system of claim 5 , wherein the hologram element enables measurement of a manufacturing condition of the barrel.
7. The optical system of claim 5 , wherein the hologram element assists in an alignment of the optical element.
8. The optical system of claim 5 , wherein the hologram element is a computer-generated hologram element.
9. An optical system, comprising:
a barrel; and
at least one optical element mounted in the barrel, the at least one optical element having a computer generated hologram written on a peripheral area of the optical element.
10. The optical system of claim 9 , wherein the computer generated hologram is ring shaped.
11. The optical system of claim 9 , wherein the computer generated hologram is fan shaped.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/118,487 US20050190680A1 (en) | 2001-10-06 | 2005-05-02 | Method of aligning optical system using a hologram and apparatus therefor |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2001-0061641A KR100472437B1 (en) | 2001-10-06 | 2001-10-06 | Aligning method of optical system using Computer Generated Hologram and thereof apparatus |
KR2001-61641 | 2001-10-06 | ||
US10/246,541 US6930783B2 (en) | 2001-10-06 | 2002-09-19 | Method of aligning optical system using a hologram and apparatus therefor |
US11/118,487 US20050190680A1 (en) | 2001-10-06 | 2005-05-02 | Method of aligning optical system using a hologram and apparatus therefor |
Related Parent Applications (1)
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US10/246,541 Division US6930783B2 (en) | 2001-10-06 | 2002-09-19 | Method of aligning optical system using a hologram and apparatus therefor |
Publications (1)
Publication Number | Publication Date |
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US20050190680A1 true US20050190680A1 (en) | 2005-09-01 |
Family
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Family Applications (2)
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---|---|---|---|
US10/246,541 Expired - Fee Related US6930783B2 (en) | 2001-10-06 | 2002-09-19 | Method of aligning optical system using a hologram and apparatus therefor |
US11/118,487 Abandoned US20050190680A1 (en) | 2001-10-06 | 2005-05-02 | Method of aligning optical system using a hologram and apparatus therefor |
Family Applications Before (1)
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US10/246,541 Expired - Fee Related US6930783B2 (en) | 2001-10-06 | 2002-09-19 | Method of aligning optical system using a hologram and apparatus therefor |
Country Status (7)
Country | Link |
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US (2) | US6930783B2 (en) |
JP (1) | JP4040944B2 (en) |
KR (1) | KR100472437B1 (en) |
CN (1) | CN100343725C (en) |
MX (1) | MXPA02009021A (en) |
MY (1) | MY128789A (en) |
TW (1) | TW561277B (en) |
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CN102494631A (en) * | 2011-11-26 | 2012-06-13 | 中国科学院光电技术研究所 | Method for analyzing alignment error by rotating around optical axis |
WO2015080750A1 (en) * | 2013-11-29 | 2015-06-04 | Hewlett-Packard Development Company, L.P. | Hologram for alignment |
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US7224469B2 (en) * | 2004-03-19 | 2007-05-29 | Asml Holding N.V. | Optical system alignment system and method with high accuracy and simple operation |
US7436520B1 (en) * | 2005-01-18 | 2008-10-14 | Carl Zeiss Smt Ag | Method of calibrating an interferometer optics and of processing an optical element having an optical surface |
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CN102902192B (en) * | 2012-09-28 | 2016-03-30 | 中国科学院光电技术研究所 | Computer-generated holographic element for adjusting or detecting optical elements |
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CN103335615B (en) * | 2013-07-08 | 2016-05-18 | 中国科学院光电技术研究所 | Device and method for aligning optical element in optical axis direction |
JP6138982B2 (en) | 2015-01-30 | 2017-05-31 | 國立中央大學 | Holographic device and data reading method thereof |
RU2658106C1 (en) * | 2017-07-31 | 2018-06-19 | АКЦИОНЕРНОЕ ОБЩЕСТВО "Научно-исследовательский институт оптико-электронного приборостроения" (АО "НИИ ОЭП") | Interference method for definition of the position of the aspheric surface axis and the device for its implementation |
RU186481U9 (en) * | 2018-09-25 | 2019-04-01 | АКЦИОНЕРНОЕ ОБЩЕСТВО "Научно-исследовательский институт оптико-электронного приборостроения" (АО "НИИ ОЭП") | INTERFEROMETRIC DEVICE FOR CENTERING OPTICAL ELEMENTS WITH ASPHERIC SURFACES IN FRAMES |
RU201539U1 (en) * | 2020-03-10 | 2020-12-21 | АКЦИОНЕРНОЕ ОБЩЕСТВО "Научно-исследовательский институт оптико-электронного приборостроения" (АО "НИИ ОЭП") | CENTERING DEVICE FOR OPTICAL ELEMENTS WITH ASPHERIC SURFACES IN FRAMES |
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Also Published As
Publication number | Publication date |
---|---|
KR100472437B1 (en) | 2005-03-08 |
CN1410799A (en) | 2003-04-16 |
US20030067684A1 (en) | 2003-04-10 |
JP2003177290A (en) | 2003-06-27 |
JP4040944B2 (en) | 2008-01-30 |
TW561277B (en) | 2003-11-11 |
MXPA02009021A (en) | 2005-08-16 |
MY128789A (en) | 2007-02-28 |
US6930783B2 (en) | 2005-08-16 |
CN100343725C (en) | 2007-10-17 |
KR20030029295A (en) | 2003-04-14 |
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