US20050155556A1

US20050155556A1 - Method and device for coating substrates

Info

Publication number: US20050155556A1
Application number: US11/028,364
Authority: US
Inventors: Burkhard Danielzik; Markus Kuhr; Wolfgang Moehl
Original assignee: Schott AG
Current assignee: Schott AG
Priority date: 2000-03-04
Filing date: 2005-01-03
Publication date: 2005-07-21
Also published as: US20030021909A1; CN1411515A; EP1264004B1; DE10010766B4; WO2001066822A1; EP1264004A1; AU2001256178A1; CN1191389C; DE50106975D1; JP2003528216A; CA2398598A1; ATE301204T1; DE10010766A1; US6916512B2; CA2398598C

Abstract

The device for simultaneous multi-sided coating of a substrate, especially a lens, by microwave plasma chemical vapor deposition has a reaction chamber with microwave windows and microwave guides with microwave launch sites for guiding microwaves into the reaction chamber through the windows; dielectric tuning elements at the microwave launch sites to influence the microwave field distribution and at least one substrate holder arranged so that surfaces to be coated are oriented perpendicularly to plasma propagation directions. The respective shapes of the dielectric tuning elements are adapted to corresponding shapes of the surfaces, so that inhomogeneities in plasma distributions in the plasmas formed in the reaction chamber are corrected and coatings formed on the surfaces have a uniform thickness. Coated surfaces on opposite sides of a lens have a uniformity of ±1%.

Description

The invention concerns a method according to the preamble of claim 1 as well as a device according to the preamble of claim 8.
Particular but not exclusive significance is attributed to the coating of arched surfaces of spectacle lenses or lenses having one or more layers, especially with scratch-proof coatings and uniform, glare-reducing multiple layers.
According to DE 39 31 713 C1, work pieces, in particular plastic lenses, are provided with an abrasion-resistant protective layer by placing them in the center region of a discharge space formed by two electrodes in free-floating fashion with regard for the electrical potential. Because, in the “plasma space”, the distribution of charge density is as independent of distance as possible, in contrast to the dark spaces directly next to the electrodes. The gas discharge is produced by applying a radio frequency field between the electrodes. This method has the disadvantage that the two sides of the substrate are coated differently, as one side always faces the grounded electrode and the plasma has other properties there than in the vicinity of the electrode launching the radio frequency.
Application WO 96/27690 describes a PECVD (“Plasma Enhanced Chemical Vapor Deposition”) method and a device for the two-sided coating of substrates, preferably spectacle lenses, by means of microwave excitation. A distinct plasma is used for each surface to be coated. In order to keep the heat load of the substrate low, the use of a pulsed discharge is recommended. No mention is made of which uniformities can be obtained in the coating and how they can be influenced.
Application WO 95/26427 A1 describes a PICVD method and a device for producing uniform coatings on lenses made of glass or plastic, in which the substrate surface to be coated is arranged opposite to the gas passage surface of a gas shower. In a preferred embodiment, the gas shower is developed as a zone shower by means of which locally different gas flows arise on the substrate. Individual microwave and gas flow parameters are used for each substrate form. Although uniformities that are adequate for anti-glare coatings as well are obtained, the determination of individual process parameters and their control is very costly.
A method and a device for the exterior coating of lamps is described in DE 196 52 454 A1. Damage caused by the microwaves to the lamp to be coated is prevented by selecting a microwave output launched into the microwave reactor that is greater than or equal to a threshold value at which a plasma having reduced permeability to microwave radiation arises. The microwaves are therefore shielded by the plasma. No statement is made about the layer uniformities that can be obtained.
A diamond coating method for the partial diamond coating of drills and sealing rings using UHF or microwaves is described in U.S. Pat. No. 5,645,645.
EP 0 326 998 B1 describes a method for the microwave-CVD coating of flat substrates.
In the devices according to U.S. Pat. No. 5,645,645 or EP 0 326 998 B1 there is an interplay of conventional tuning elements in the form of metallic slides and perforated metal plates. The conventional tuning elements serve to match impedance, which results in a higher microwave intensity. The structure of the microwave dispersion is not changed as a result, it is only shifted or intensified. In EP 0 326 998 B1, the perforated metal plate serves only to scatter the reaction flow. In the device according to U.S. Pat. No. 5,645,645, the perforated plate forms the launch site for the plasma and has an effect on the microwaves that is similar to a shield.
The object of the invention is to provide a method and a device to enable the coating—in economical fashion—of in particular substrates having sharp bends such as, for example, lenses and spectacle lenses, whereby a high uniformity of layer thickness is to be obtained. The uniformity should be approximately ±1% in order to suffice for coating with scratch-proof and anti-glare layers. Uniformity is thereby defined as 100% multiplied by the standard deviation of the mean layer thickness divided by the layer thickness.
This object is obtained with a method according to claim 1 and by means of a device according to claim 8.
A basic uniformity of the layer thickness is ensured when the substrate surface to be coated is located in a region of the plasma in which the plasma is impermeable to the microwaves, and the distribution of plasma density is constant in the first iteration. The shielding effect of the plasma becomes even more significant in the case of two- or more-sided coating, as the shielding ensures that the two microwave fields do not influence each other, and each microwave field only influences the respective plasma.
Inhomogeneities in the microwave field bring about inhomogeneities in the distribution of plasma density. The microwave field distribution can be influenced by placing dielectric tuning elements in the microwave field in the region of the microwave launch sites. The phase of the microwave changes on the surface of the dielectric tuning element. Additionally, the microwave field is weakened, and the propagation speed of the wave is slower inside the dielectric tuning element. This modifies the electrical field distribution and, as a consequence, the distribution of plasma density dependent on it, and the coating result induced as a result. Depending on the shape of the dielectric tuning elements selected, coatings are obtained that have a uniformity of nearly ±1%.
In the case of coating a concave surface, the coating at the edges is greater than in the center in a wide parameter range. The coating becomes more uniform as the distance from the microwave launch site increases. In the case of convex surfaces, the coating becomes more uniform up to a certain distance. If the distance is increased even further, the uniformity of the coating decreases once more.
The dielectric tuning element should have more material in locations where the microwave field is to be weakened, i.e., where an over-heightening of the layer thickness is to be avoided.
The tuning element is advantageously arranged behind the launch site of the microwaves in the microwave waveguide. The tuning element preferably remains in this location during the procedure.
The method according to the invention is preferably carried out using a microwave PICVD (“Plasma Induced Chemical Vapor Deposition”) method. It has proven advantageous to activate the distances between substrate surface and microwave launch site depending on the process parameters of microwave output, pressure, microwave pulse duration and microwave pulse separation as well as the duration of the microwave pulse separation as a function of the pressure, the mass flow of the reaction gas and the distance between the substrate surface and microwave launch site. The method of statistical experimental design is used hereby, as described, for example, in: Box G.E.P., Hunter W. G., Hunter J. S.: Statistics for Experimenters, 1978, Wiley, N.Y.
In general, the variables relevant in each case are thereby varied at random depending on the surface of the substrate to be coated, and the individual parameters are then optimized for uniform coating while keeping the remaining specified parameters constant in accordance with the respective results obtained. This measure is carried out only for limit forms of lenses to reduce the experimental cost, and the parameters for coating the intermediate form are determined by means of interpolation.
For a certain substrate type, for example, three of the parameters of microwave output, pressure, microwave pulse duration and microwave separation and random variation of the distance(s) between the substrate and the microwave launch site are kept constant in a first experimental sequence while the fourth parameter in each case is optimized for uniform coating in accordance with the respective results obtained.
It is also possible to run a second experimental sequence for a certain substrate type, keeping two of the parameters of pressure, reaction mass flow and distance/distances between the substrate and microwave launch site and random variation of the microwave pulse separations constant and optimizing the third parameter in each case for uniform coating in accordance with the respective results obtained.
It has proven advantageous to switch between continuous gas flow between carrier gas and reaction gas and vice-versa without interrupting the gas flow. The plasma is ignited by microwaves during the continuous gas flow.
The gas is preferably introduced as close as possible to the surface to be coated. The closer the gas is introduced to the substrate surface, the shorter the pulse separations can be selected. The shortest possible pulse duration should be selected as well so that the gas flow can be viewed as still during the microwave pulse. This makes it easier to model the coating process.
Preferred reaction gasses are hexamethyldisiloxane and titanium tetrachloride.
The dielectric tuning elements that are arranged in the region of the microwave launch sites in the device according to the invention are preferably composed of materials having very high dielectric constants. Quartz and polytetrafluorethylene are particularly preferred materials.
The dielectric tuning elements are preferably arranged on the atmospheric side of the launch sites and on the microwave window(s).
In a preferred embodiment, the outer contour of the dielectric tuning element corresponds to the inner contour of the waveguide in which it is attached.
The shape of the dielectric tuning elements is advantageously adapted to the substrate surface to be coated and the desired coating thickness. The dielectric tuning element can be formed as a ring or a disk or a cone or a pyramid. Combinations of various dielectric tuning elements can be used as well, such as a disk with a ring or two disks having different diameters, each of which is arranged coaxially in relation to the other. Depending on the microwave output, the bend of the surface to be coated, and the desired coating, the dielectric tuning elements have a material thickness of 5 to 50 mm.
The gas inlet is advantageously situated on the substrate holder.
The distance between the substrate holder and the microwave launch site should be selected so that the distance between the surface to be coated and the launch site is between 5 and 80 mm.
The invention will now be explained in greater detail with reference to the following figures.
FIG. 1 a shows a principal sketch of the device according to the invention for coating a plano-convex substrate,
FIG. 1 b shows a principal sketch of the device according to the invention for coating a convex substrate, and
FIGS. 2 a+b show the measured courses of layer thickness.
FIG. 1 represents a device according to the invention for the two-sided coating of an arched substrate. It has a coating reactor 1 in which the substrate 2 is secured by means of a substrate holder 6. Gas inlets 7 are situated in the immediate vicinity of the substrate holder 6. In the present case, the gas supply is designed as a rotationally-symmetric gas shower. The gas outlet is not shown, to improve clarity. The substrate 2 is convex on one side and flat on the other side. The substrate 2 is arranged in the coating reactor 1 in such a fashion that the surfaces to be coated are parallel to the microwave windows 3. Microwave waveguides 5 abut the microwave windows on both sides.
Dielectric tuning elements 4 a, b are placed on the atmospheric side of the microwave launch sites 3, i.e., in the waveguides 5. The dielectric tuning element 4 a on the convex side of the substrate 2 is formed out of two partial elements 4 a′ and 4 a″. It is a disk 4 a′, the outer diameter of which corresponds to the inner diameter of the waveguide 5 and a disk 4 a″ having a smaller diameter that is placed coaxially on the larger disk 4 a′ and, as a result, weakens the microwave field and the plasma distribution in the region of the center of the convex substrate surface. The dielectric tuning element 4 b that is opposite to the flat side of the substrate 2—whereby the flat side is considered a borderline case for concave surfaces—is composed of a disk 4 b′, the outer diameter of which corresponds to the inner diameter of the waveguide 5—analogous to the disk 4 a′—and a ring element 4 b″. As a result, the microwave field distribution and plasma density distribution is weakened at the edge of the substrate. The dielectric tuning elements 4 a,b are inserted into the respective waveguide 5 until they stop at the respective microwave window 3.
It has also proven, by the way, that the substrate 2 is to be arranged, advantageously, off-center in the coating reactor 1, in particular when the substrate 2 is concave on one side and convex on the other side, as shown in FIG. 1 b. The concave surface should be situated further away from the microwave launch site 3 than the convex surface is. This is shown in FIG. 1 b. The layout shown in FIG. 1 b is analogous to the layout shown in FIG. 1 a.
Measurements of the coating of a concave surface have been carried out at two different distances from the microwave launch site. The results are presented in FIGS. 2 a and 2 b. The location coordinate in the radial direction on the substrate is plotted on the abscissa, and the zero point is in the center of the substrate surface. The corresponding layer thicknesses are plotted on the ordinates. The measurements were carried out once without a dielectric tuning element (measuring point A), once with a disk-shaped dielectric tuning element (measuring point B)—whereby the disk is dimensioned in such a fashion that the field is weakened in the center of the surface to be coated—and with an annular dielectric tuning element (measuring point C), which weakens the field at the edge of the surface to be coated. The measurement shown in FIG. 2 a shows a coating in which the concave substrate surface was 34 mm away from the microwave launch site. The distance is always measured with regard for the shortest distance, i.e., in the case of concave lenses, from the edge of the lens outward and, in the case of convex lenses, from the center of the lens outward. In the case of the measurement shown in FIG. 2 b, the concave substrate surface was 39 mm away from the microwave launch site. Uniformity is defined as 100% multiplied by the standard deviation of the mean layer thickness divided by the layer thickness.
In both measurements, the coating without a dielectric tuning element is very inhomogeneous. The layer thicknesses are much greater on the edges of the concave substrate than in the middle of the concave substrate.
If a dielectric tuning element is used that weakens the field in the center of the surface to be coated (measuring point B), this effect is even increased. If, on the other hand, an annular dielectric tuning element is arranged in the waveguide at the microwave launch site, so that the field is weakened at the edge of the substrate to be coated, a constant layer thickness is obtained over the entire concave substrate.

Reference Numerals and Letters

1 Coating reactor
2 Substrate
3 Microwave window
4 a, 4 a′, 4 a″ Dielectric tuning element
4 b, 4 b′, 4 b″ Dielectric tuning element
5 Microwave waveguide
6 Substrate holder
7 Gas inlet
8 Gas outlet
A Measurement without dielectric element
B Measurement with annular dielectric element
C Measurement with disk-shaped dielectric element.

Claims

1-15. (canceled)

16. A device for simultaneous multi-sided coating of substrates by microwave plasma chemical vapor deposition, comprising

a reaction chamber provided with at least one gas inlet;

at least two microwave windows provided in said reaction chamber;

at least two microwave guides with microwave launch sites for guiding microwaves into the reaction chamber through the microwave windows;

dielectric tuning elements arranged in the vicinity of the microwave launch sites and influencing a microwave field distribution in said reaction chamber; and

at least one substrate holder arranged in said reaction chamber to hold a substrate so that respective substrate surfaces to be coated are oriented perpendicularly to propagation directions of corresponding coating plasmas generated in said reaction chamber for coating the respective substrate surfaces;

wherein corresponding distances between the respective substrate surfaces to be coated and the microwave launch sites are each greater than a penetration depth of the microwaves in the coating plasmas; and

wherein respective shapes of said dielectric tuning elements are adapted to corresponding shapes of said substrate surfaces to be coated, so that inhomogeneities in plasma distributions in said coating plasmas are corrected and said substrate surfaces are simultaneously coated with coatings of uniform thickness.

17. A device as defined in claim 16, wherein said dielectric tuning elements are each composed of a material selected from the group consisting of quartz and polytetrafluoroethylene.

18. A device as defined in claim 16, wherein said dielectric tuning elements are arranged on atmospheric sides of said microwave launch sites.

19. A device as defined in claim 18, wherein said dielectric tuning elements are arranged on said microwave windows.

20. A device as defined in claim 18, wherein said dielectric tuning elements have outer contours corresponding to inner contours of the microwave guides.

21. A device as defined in claim 18, wherein said dielectric tuning elements are each selected from the group consisting of rings, disks, cones and pyramids.

22. A device as defined in claim 22; wherein said at least one gas inlet is on said at least one substrate holder.

23. A device as defined in claim 16, wherein a respective distance between said at least one substrate holder and each of said microwave windows is between 5 and 80 mm.

24. The device as defined in claim 16, wherein said reaction chamber has two of said microwave windows arranged on opposite sides of said reaction chamber and said microwave waveguides extend on said opposite sides of said reaction chamber from said microwave windows.

25. The device as defined in claim 24, wherein said dielectric tuning elements are arranged on atmospheric sides of the microwave launch sites, said dielectric tuning elements are arranged on said microwave windows and said dielectric tuning elements have outer contours corresponding to inner contours of the microwave guides.

26. The device as defined in claim 16 or 24, wherein said substrate is a lens and said substrate surfaces to be coated are on opposite sides of said lens, one of said substrate surfaces to be coated is a concave surface, said concave surface is associated with first and second dielectric tuning elements, said first and second dielectric tuning elements consist of a disk and a ring, said ring rests on said disk on an atmospheric side of an associated one of said microwave launch sites and said disk and said ring have respective outer diameters each corresponding to an inner diameter of a waveguide through which said microwaves pass.

27. The device as defined in claim 16 or 24, wherein said substrate is a lens and said substrate surfaces to be coated are on opposite sides of said lens, one of said substrate surfaces to be coated is a convex surface, said convex surface is associated with first and second dielectric tuning elements, said first and second dielectric tuning elements consist of two disks, said disks rest against each other on an atmospheric side of an associated one of said microwave launch sites, one of said disks has an outer diameter corresponding to an inner diameter of a waveguide through which said microwaves pass and another of said disks has an outer diameter smaller than said inner diameter of said waveguide.