US10132830B2 - Method of measuring a topographic profile and/or a topographic image - Google Patents
Method of measuring a topographic profile and/or a topographic image Download PDFInfo
- Publication number
- US10132830B2 US10132830B2 US15/001,049 US201615001049A US10132830B2 US 10132830 B2 US10132830 B2 US 10132830B2 US 201615001049 A US201615001049 A US 201615001049A US 10132830 B2 US10132830 B2 US 10132830B2
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- United States
- Prior art keywords
- indenter
- sample
- topographic
- reference structure
- relative position
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q20/00—Monitoring the movement or position of the probe
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N3/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N3/40—Investigating hardness or rebound hardness
- G01N3/42—Investigating hardness or rebound hardness by performing impressions under a steady load by indentors, e.g. sphere, pyramid
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
- G01Q30/02—Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
- G01Q60/24—AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes
- G01Q60/38—Probes, their manufacture, or their related instrumentation, e.g. holders
Definitions
- the present invention relates to the field of material measurements. More particularly, it relates to a method of making a topographic measurement of an indentation test by using an indentation instrument comprising a topographic tip.
- Atomic force microscopy and other types of small-scale microscopy are well-known for taking topographical measurements of the profile of surfaces, with measurements often down to the nanometer scale.
- Such measurements are often used in combination with indentation testing machines to generate a profile of the indentation after it has been made, so as to generate useful data about the residual profile of the indentation. This is particularly useful in the case of scratch tests, in which an indenter is dragged across a sample surface under a constant or varying indentation force.
- two-dimensional data relating to the residual indentation depth can be generated, and by scanning in multiple parallel passes, three-dimensional data relating to the test can be generated.
- an AFM may be provided as a bolt-on supplementary module for an indentation test apparatus, which puts a large distance between the indenter and the tip, thereby requiring large displacements of the sample so as to make a topographic measurement.
- AFM or similar
- U.S. Pat. No. 7,568,381 describes use of an AFM tip as part of a reference sensor, as does EP 2 816 342.
- An aim of the present invention is thus to propose a method for taking topographic measurements of the surface of a sample using an indentation apparatus without having to provide further sensors other than those already provided on the indentation apparatus.
- This aim is achieved by a method of measuring a topographic image and/or a topographic profile of a surface of a sample according to claim 1 . This method is described in the following paragraphs.
- an indentation instrument which comprises a headstock, an indenter mounted on said headstock by means of (i.e. indirectly via) a first actuator arranged to displace the indenter parallel to a longitudinal axis of the indenter, and a force sensor adapted to measure a force applied by said indenter.
- the indentation instrument also comprises a reference structure mounted on said headstock by means of (i.e.
- a second actuator arranged to displace the reference structure parallel to said longitudinal axis, a topographic tip mounted on said reference structure and adapted to detect a surface of a sample, for instance by determining a predetermined interaction between the topographic tip and the sample as described in more detail below, and a relative position sensor adapted to determine a relative position of the indenter with respect to the reference structure.
- a feedback control system is provided, which is adapted to control the second actuator based on detection of a surface of a sample by the topographic tip, as is a sample holder arranged to hold the sample facing the indenter and the topographic tip, the sample holder being arranged to be displaced in at least one direction perpendicular to said longitudinal axis.
- the sample holder typically comprises a positional readout as is generally known.
- a sample is provided on the sample holder, and the indenter is positioned out of contact with said sample and in a constant position with respect to the headstock.
- the topographic tip is positioned so as to detect the surface of the sample and the reference structure is thereby positioned at a predetermined distance from the said surface as detected by the topographic tip (i.e. the part of the surface detected by the tip) by means of the feedback control system and the second actuator.
- the relative position of the indenter is then measured with respect to the reference structure by means of the relative position sensor, i.e. by means of measuring and recording the relative position of the reference structure with respect to the indenter, this latter being in a fixed vertical position with respect to the headstock, and the sample is then moved in translation perpendicular to said longitudinal axis while maintaining the reference structure at said predetermined distance from the surface of the sample as detected by the topographic tip by means of the feedback control system and the second actuator while measuring the relative position of the indenter with respect to the reference structure by means of the relative position sensor.
- the topographic tip is thus caused to maintain constant interaction with the surface of the substrate by the feedback control system and the actuator, and hence the reference structure correspondingly tracks up and down to follow the surface.
- topographic profile pertains to a cross sectional view along a line drawn through a portion of a surface topography map and the terms “topographic image” pertain to a surface topography map.
- topographic profile is two-dimensional and based on a single pass of the topographic tip and the topographic image is three-dimensional and reconstructed from multiple parallel passes of the topographic tip, i.e. reconstructed from multiple topographic images.
- an indentation test is carried out by means of the indenter.
- This indentation test may be a simple indentation test, or a scratch test in which the sample is moved perpendicular to the longitudinal axis of the indenter during the indentation, as is generally known.
- the constant position of the indenter parallel to said longitudinal axis may be verified by means of said force sensor, which may comprise a spring disposed between the indenter and the actuator, the relative displacement detector being arranged to detect a relative displacement between said indenter and a structure mounted between the spring and said first actuator, said relative displacement detector comprising a differential capacitor comprising a first pair of electrodes provided on said structure, each of said electrodes facing a corresponding electrode of a second pair of electrodes provided on said indenter.
- a simple way to determine that the indenter is out of contact with the surface and in a constant position is by measuring a zero force by means of said force sensor, and maintaining the first actuator in a fixed position or state.
- the relative position sensor comprises a further differential capacitor comprising a further first pair of electrodes provided on said reference structure, each of said electrodes facing a corresponding electrode of a further second pair of electrodes provided on said indenter.
- a further differential capacitor comprising a further first pair of electrodes provided on said reference structure, each of said electrodes facing a corresponding electrode of a further second pair of electrodes provided on said indenter.
- the invention also relates to a product, comprising a computer-readable medium, and a computer program product comprising computer-executable instructions on the computer-readable medium for causing an indentation instrument of the type defined above to carry out the method as defined above.
- FIG. 1 an indentation instrument with which the method of the invention is carried out
- FIG. 2 the indentation instrument of FIG. 1 , shown carrying out an indentation operation
- FIG. 3-6 the indentation instrument of FIG. 1 , shown at various stages of making a topographic measurement of a scratch test.
- top, bottom, over, under and the like in the description and the claims are used for descriptive purposes and not necessarily for describing relative positions. The terms so used are interchangeable under appropriate circumstances and the embodiments of the invention described herein can operate in other orientations than described or illustrated herein.
- FIG. 1 illustrates an indentation instrument 1 as described in EP 2 816 342, herein incorporated by reference in its entirety.
- This indentation instrument comprises a headstock 3 upon which is mounted an indenter 5 by means of a first actuator 7 .
- First actuator 7 may be a piezoelectric actuator or any other convenient type capable of applying sufficient force for the desired indentation applications.
- indenter 5 comprises an indenter rod 5 a extending along a longitudinal axis 9 parallel to the Z axis as indicated on the figure, and terminating at its distal end with an indentation tip 5 b .
- This tip may be of hardened steel, tungsten, diamond, corundum, sapphire or similar, as is generally known.
- the tip 5 b may be formed integrally with the intender rod 5 a .
- the rod 5 a comprises a laterally-extending flange 5 c , the function of which will appear more clearly below.
- a sample holder 2 is adapted to support a sample 4 facing the tip 5 b of the indenter 5 , and is typically motorised and adapted to be moved along at least three axes X, Y and Z, and may also rotate about one or more of these axes, with accurate position detection.
- the position of the sample holder in at least the X and Y directions, and ideally also the Z direction, is determined by sensors so as to give a positional readout as is generally known.
- Force sensor 11 comprises a calibrated spring 13 of known spring constant k which is arranged so as to force the indenter 5 away from the actuator, and a relative displacement detector 15 .
- Relative displacement detector 15 comprises a structure 15 a mounted between the spring 13 and the first actuator 7 , the structure 15 a extending parallel to the indenter rod 5 a and being provided with a first pair of electrodes 17 a , 17 b facing a corresponding second pair of electrodes 19 a , 19 b situated on the flange 5 c of the indenter 5 so as to form a differential capacitor formed of a first capacitor 17 a , 19 a and a second capacitor 17 b , 19 b .
- the flange 5 c extends towards the structure 15 a into an interstice formed between the electrodes 17 a , 17 b so as to position electrodes 19 a , 19 b there between and extend substantially perpendicularly to longitudinal axis 9 , although other configurations are possible such as the inverse construction in which electrodes 19 a , 19 b are each provided on a different flange facing each other, electrodes 17 a , 17 b being situated on either side of a protrusion provided on the structure 15 a extending in the direction of the indenter 5 , again extending perpendicularly to longitudinal axis 9 .
- Electrodes 17 a , 17 b , 19 a , 19 b are electrically connected to appropriate measurement and recording circuitry (not illustrated), and by measuring the difference in capacitance between first capacitor 17 a , 19 a and second capacitor 17 b , 19 b , the relative position of the indenter 5 and the structure 15 a can be determined by any known method. This result, combined with knowing spring constant k of spring 13 , permits determining the force applied by the indenter 5 on the sample 4 . This principle is explained at length in document EP 1 828 744, herein incorporated by reference in its entirety, and thus need not be explained further here.
- force sensor such as direct piezoelectric measurement of the force applied, separate to the first actuator 7 or combined therewith.
- the indentation instrument 1 also comprises a measurement subsystem 21 for measuring the penetration depth.
- This subsystem 21 comprises a topographic tip 23 , arranged to detect the surface 4 a of the sample 4 .
- topographic tip 23 is a cantilevered atomic force microscope (AFM) probe, however other types of probes common for scanning probe microscopy in general are also possible.
- AFM atomic force microscope
- the form of the tip should be sufficiently small and appropriately shaped for the desired measurement resolution.
- detect the surface 4 a of the sample not only are contact-based detections such as those based on optical detection of a predetermined deflection of the probe meant, but also non-contact detections such as by using a vibrating AFM probe and detecting a predetermined change in amplitude, phase or frequency of the vibration caused by Van der Waals interactions between the atoms of the surface 4 a of the sample 4 and the tip of the probe.
- Topographic tip 23 is mounted on a reference structure 25 , which is itself mounted on a second actuator 28 which may be of similar nature to first actuator 7 , and serves to displace the reference structure 25 and hence the topographic tip 23 parallel to the Z axis.
- Driving and/or measuring systems required for the topographic tip 23 (not illustrated) to detect the surface 4 a of the sample 4 may also be provided on or in reference structure 25 .
- Such driving and/or measuring systems may for instance vibrate the tip, measure its vibrations, detect optically or (piezo-) electrically movement of the tip, and so on.
- Such systems are known per se and thus do not need to be described further, and may for instance “detect” the surface by determining a predetermined deflection of an AFM cantilever, a predetermined change in amplitude, phase or frequency of a vibrating AFM tip, or a predetermined force applied to the surface.
- Reference structure 25 also comprises a relative position sensor 26 .
- this comprises a further first pair of electrodes 27 a , 27 b forming a further differential capacitor in combination with corresponding further second pair of electrodes 29 a , 29 b provided on a further laterally-extending flange 5 d of the indenter rod 5 , which may be integral with the flange 5 c or separate therefrom.
- Electrodes 27 a , 27 b , 29 a , 29 b again extend substantially perpendicular to longitudinal axis 9 .
- capacitors 27 a , 29 a and 27 b , 29 b are constructed similarly to capacitors 17 a , 19 a and 17 a , 19 b , and all comments in respect of these latter capacitors apply equally to the former, mutatis mutandis.
- the relative position of the indenter 5 and the reference structure 25 can be determined.
- Other forms of relative position sensor 26 arranged to measure the relative position of the indenter 5 with respect to the reference structure 25 are also possible.
- the indentation instrument 1 comprises a feedback control system 31 which is in operative connection with the topographic tip 23 and the second actuator 28 , so as to drive the second actuator 28 so as to adjust the position of the reference structure with respect to the sample 4 as will be described below in the context of FIG. 2 .
- FIG. 2 illustrates the position of the various components of the indentation instrument 1 during an indentation test.
- FIG. 2 and subsequent figures only reference signs referred to in the text are reproduced in order to avoid cluttering the figures, and vertical displacements have been exaggerated for clarity.
- the feedback control system 31 has not been illustrated from FIG. 3 onwards.
- the indenter tip 5 b has penetrated into the surface 4 a of the sample 4 under a force applied by first actuator 7 and measured by force sensor 11 .
- the sample is positioned close to the tip 5 b of the indenter 5 and to the topographic tip 23 by means of displacing the sample holder 2 , and/or displacing the headstock 3 , and/or moving the indenter 5 and topographic tip 23 in the Z direction by means of first actuator 7 and second actuator 28 respectively, and the reference structure is then positioned at a predetermined distance d from the surface 4 a of the sample by actuating the second actuator 28 to move the reference structure 25 towards the surface 4 a of the sample until the surface 4 a thereof is detected by the topographic tip.
- feedback control system 31 maintains the reference structure 25 at predetermined distance d by controlling second actuator 28 to make any required adjustments according to the Z axis so as to maintain the reference structure 25 in the desired vertical relation with the surface 4 a .
- These adjustments are typically minuscule.
- indenter tip 5 b is brought into contact with the surface 4 a of the sample 4 and is forced to penetrate into the surface 4 a under a load applied by first actuator 7 .
- the indenter 5 displaces towards the sample along the Z axis (i.e. downwards as illustrated in the figure) with respect to the reference structure 25 , as clearly shown in FIG. 2 .
- This causes the electrode 29 a to approach electrode 27 a , and electrode 29 b to withdraw from electrode 27 b , thereby changing the relative capacitance of the two capacitors 27 a , 29 a and 27 b , 29 b , from which the displacement of the indenter 5 with respect to the reference structure 25 can be calculated.
- These capacitors 27 a , 29 a ; 27 b , 29 b are electrically connected (not shown) to suitable processing and recording circuitry.
- the absolute penetration of the indenter tip 5 b into the surface 4 a of the sample 4 can be determined.
- the force applied by the indenter 5 to the sample 4 is measured continuously by the force sensor 11 , and can be correlated with that of the penetration depth of the indenter tip into the surface 4 a of the sample 4 .
- spring 13 is compressed, and the structure 15 a moves downwards (towards the sample 4 ) with respect to the indenter rod 5 a , causing electrodes 17 b and 19 b to approach each other, and electrodes 17 a and 19 a to withdraw from each other.
- the changes in capacitance thereby engendered can be used to determine the relative displacement of the indenter 5 with respect to the structure 15 a and hence the force applied at any moment.
- This system can not only perform a static indentation test under a static or dynamic load, but also by displacing the sample 4 laterally during indentation, scratch tests can be carried out, again under static or dynamic indentation loads.
- a separate topographic measurement module (typically an AFM module) is provided off to the side of the indenter.
- AFM module typically an AFM module
- the method of the present invention obviates the need to incorporate such conventional topographic measurement elements by using the existing sensors present in the indentation system 1 to carry out not only the measurement of the indentation depth as described above, but also the topographic measurement in addition. It should be noted that the method can also be used for making a topographic measurement of any substantially planar sample 4 , whether indented or not.
- FIGS. 3-6 This method is illustrated in FIGS. 3-6 , in the context of taking a topographic measurement of a scratch test previously carried out on the same indentation apparatus 1 , however applies equally to any other sample 4 for which a topographic measurement is required.
- the indentation instrument 1 and the sample 4 have been provided.
- the surface 4 a of the sample 4 is depressed following the track of a previously-performed scratch test, the sectional view of the figures being taken along the centreline of the scratch test which deepens from left to right.
- the indenter tip 5 b is positioned out of contact with the sample 4 by the actuator.
- the indenter tip 5 b remains out of contact with the surface 4 a of the sample 4 throughout the measurement. Since there is no force acting on the tip 5 b , the spring 13 causes the indenter 5 to adopt a neutral position, which can be verified by the capacitors 17 a , 19 a and 17 b , 19 b if required, by checking that the force measured by the force sensor 11 is zero. If required, this verification can be carried out continuously throughout a topographic measurement.
- the first actuator 7 can simply be driven into an arbitrary position and deactivated, or can be placed in an extreme position (such as to position the indenter 5 as close to the headstock 3 as possible, or as far away from the headstock 3 as possible) against a mechanical stop (not illustrated).
- a mechanical stop not illustrated
- Indenter 5 thus maintains a constant vertical (Z-axis) position with respect to the headstock 3 and to the sample 4 , and serves as a Z-axis reference.
- Topographic tip 23 is then placed so as to detect the surface 4 a of the sample 4 at a desired start point of the topographic measurement as described above in the context of making an indentation measurement. A convenient start point of the measurement is immediately adjacent to the scratch test.
- Control system 31 (not illustrated on FIGS. 3-6 to avoid cluttering the figures) again positions the reference structure 25 at predetermined distance d from the surface 4 a of the sample 4 as detected by the topographic tip 23 .
- the relative position between the indenter 5 and the reference structure is then determined by the relative position sensor 26 , and can be taken as a datum point for taking the topographic measurement.
- the substrate 4 is moved laterally with respect to the topographic tip 23 , i.e. perpendicular to axis Z, by means of translating the sample holder 2 with respect to the headstock 3 or vice-versa.
- the sample holder is moved to the left so as to scan the topographic tip towards the right along the scratch test in the surface 4 a of the substrate 4 .
- the sample 4 has been translated leftwards, and the topographic tip has descended into the scratch test present in the surface 4 a .
- This is carried out by the feedback control system commanding the second actuator to maintain the predetermined distance d between the reference structure 25 and the surface 4 a of the sample as detected by the topographic tip 23 as the sample is translated. Since the surface profile deepens as the sample 4 moves leftwards, the actuator drives the reference structure downwards in the direction of the substrate so as to follow the surface.
- Reference structure 25 thus descends with respect to the intender 5 , which has remained in the same vertical position as a reference, electrodes 27 b , 29 b have approached each other, and electrodes 27 a , 29 a have separated.
- the resulting change in capacitance is used to determine the new relative position of the reference structure 25 with respect to the indenter 5 , which thus generates the topographic measurement by taking multiple measurements along the sample.
- the indenter 5 having been placed in an unchanging vertical position with respect to not only the headstock 1 but also with respect to the sample holder, which is only translated perpendicular to the axis Z, it serves as a fixed vertical reference, against which the vertical position of the reference structure 25 is compared throughout the topographic measurement.
- the topographic measurement is thus carried out by measuring vertical movements of the reference structure 25 and topographic tip 23 with reference to the indenter 5 .
- the surface 4 a indentation profile deepens, and the reference structure 25 is driven further downwards to maintain predetermined distance d and thus to follow the surface.
- Indenter 5 maintains its vertical position with respect to the headstock 3 , and hence electrodes 27 b , 29 b further approach each other, and electrodes 27 a , 29 a further separate from one another.
- the sample 4 continues translating leftwards and the topographic tip 3 has left the depression left in the surface 4 a by the scratch test.
- the control system 31 always driving the second actuator 28 to maintain the distance d, it has driven the reference structure upwards towards the headstock 3 , and hence electrodes 27 b , 29 b have separated, and electrodes 27 a , 29 a have returned towards each other.
- the topographic profile of the scratch test can be measured.
- displacing the sample 4 a predetermined distance in the Y direction (into or out of the page) and repeating the process, thereby scanning the topographic tip 23 in several passes in a grid or raster pattern three-dimensional topographic profiles can be measured and images created.
- the above-mentioned method can be carried out under computer control by following instructions contained in a computer program product stored on a computer-readable medium (CD-ROM, DVD, hard disk, flash drive etc.).
- a computer-readable medium CD-ROM, DVD, hard disk, flash drive etc.
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Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH1679/15 | 2015-11-18 | ||
CH01679/15 | 2015-11-18 | ||
CH01679/15A CH711792A2 (de) | 2015-11-18 | 2015-11-18 | Verfahren zur Vermessung eines topographischen Profils und/oder eines topographischen Bildes einer Oberfläche einer Probe. |
Publications (2)
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US20170138982A1 US20170138982A1 (en) | 2017-05-18 |
US10132830B2 true US10132830B2 (en) | 2018-11-20 |
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US15/001,049 Active 2036-12-23 US10132830B2 (en) | 2015-11-18 | 2016-01-19 | Method of measuring a topographic profile and/or a topographic image |
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US (1) | US10132830B2 (de) |
JP (1) | JP2017096906A (de) |
KR (1) | KR102520501B1 (de) |
CH (1) | CH711792A2 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10996152B2 (en) * | 2018-01-19 | 2021-05-04 | Kla-Tencor Corporation | Apparatus and method for two dimensional nanoindentation |
Families Citing this family (2)
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WO2019003692A1 (ja) * | 2017-06-29 | 2019-01-03 | 株式会社テイエルブイ | センサ装置 |
EP3489654B1 (de) * | 2017-11-22 | 2020-07-29 | FemtoTools AG | Mems-nanoindenter chip mit eindruck-prüfkörpersonde und referenzsonde |
Citations (8)
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US4852397A (en) * | 1988-01-15 | 1989-08-01 | Haggag Fahmy M | Field indentation microprobe for structural integrity evaluation |
US20030070475A1 (en) * | 2000-02-10 | 2003-04-17 | Nobuo Nagashima | Ultra micro indentation testing apparatus |
US6718820B2 (en) * | 2001-01-12 | 2004-04-13 | Frontics, Inc. | Apparatus for indentation test and method for measuring mechanical properties using it |
EP1828744A1 (de) | 2004-12-23 | 2007-09-05 | CSM Instruments SA | Messkopf für nanoeinschnittvorrichtung und verfahren zur messung damit |
US20080028840A1 (en) * | 2006-08-02 | 2008-02-07 | Smith Stuart T | Apparatus and Method For Surface Property Measurement With In-Process Compensation For Instrument Frame Distortion |
US20100088788A1 (en) * | 2007-02-21 | 2010-04-08 | The Board Of Trustees Of The University Of Illinois | Stress micro mechanical test cell, device, system and methods |
US8117892B2 (en) * | 2007-12-07 | 2012-02-21 | Mitutoyo Corporation | Hardness testing instrument and calibration method thereof |
EP2816342A1 (de) | 2013-06-17 | 2014-12-24 | CSM Instruments SA | Messkopf für Nanoindentationsinstrument und Messverfahren |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1247645B (it) * | 1990-10-24 | 1994-12-28 | Alfred Ernst | Durometro e metodo di misura della durezza di materiali metallici |
JP3791173B2 (ja) * | 1998-03-06 | 2006-06-28 | 株式会社島津製作所 | 高温硬度計 |
-
2015
- 2015-11-18 CH CH01679/15A patent/CH711792A2/de not_active Application Discontinuation
-
2016
- 2016-01-19 US US15/001,049 patent/US10132830B2/en active Active
- 2016-02-01 KR KR1020160012413A patent/KR102520501B1/ko active IP Right Grant
- 2016-02-05 JP JP2016020346A patent/JP2017096906A/ja active Pending
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4852397A (en) * | 1988-01-15 | 1989-08-01 | Haggag Fahmy M | Field indentation microprobe for structural integrity evaluation |
US20030070475A1 (en) * | 2000-02-10 | 2003-04-17 | Nobuo Nagashima | Ultra micro indentation testing apparatus |
US6718820B2 (en) * | 2001-01-12 | 2004-04-13 | Frontics, Inc. | Apparatus for indentation test and method for measuring mechanical properties using it |
EP1828744A1 (de) | 2004-12-23 | 2007-09-05 | CSM Instruments SA | Messkopf für nanoeinschnittvorrichtung und verfahren zur messung damit |
US7685868B2 (en) * | 2004-12-23 | 2010-03-30 | Csm Instruments Sa | Measuring head for nanoindentation instrument and measuring method using same |
US20080028840A1 (en) * | 2006-08-02 | 2008-02-07 | Smith Stuart T | Apparatus and Method For Surface Property Measurement With In-Process Compensation For Instrument Frame Distortion |
US7568381B2 (en) | 2006-08-02 | 2009-08-04 | University Of North Carolina At Charlotte | Apparatus and method for surface property measurement with in-process compensation for instrument frame distortion |
US20100088788A1 (en) * | 2007-02-21 | 2010-04-08 | The Board Of Trustees Of The University Of Illinois | Stress micro mechanical test cell, device, system and methods |
US8117892B2 (en) * | 2007-12-07 | 2012-02-21 | Mitutoyo Corporation | Hardness testing instrument and calibration method thereof |
EP2816342A1 (de) | 2013-06-17 | 2014-12-24 | CSM Instruments SA | Messkopf für Nanoindentationsinstrument und Messverfahren |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10996152B2 (en) * | 2018-01-19 | 2021-05-04 | Kla-Tencor Corporation | Apparatus and method for two dimensional nanoindentation |
Also Published As
Publication number | Publication date |
---|---|
US20170138982A1 (en) | 2017-05-18 |
KR102520501B1 (ko) | 2023-04-12 |
KR20170058222A (ko) | 2017-05-26 |
JP2017096906A (ja) | 2017-06-01 |
CH711792A2 (de) | 2017-05-31 |
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