UA82781U - Electron-beam unit - Google Patents
Electron-beam unitInfo
- Publication number
- UA82781U UA82781U UAU201301118U UAU201301118U UA82781U UA 82781 U UA82781 U UA 82781U UA U201301118 U UAU201301118 U UA U201301118U UA U201301118 U UAU201301118 U UA U201301118U UA 82781 U UA82781 U UA 82781U
- Authority
- UA
- Ukraine
- Prior art keywords
- heating
- longitudinal axis
- symmetry
- liquid metal
- gas discharge
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
- C22B9/16—Remelting metals
- C22B9/22—Remelting metals with heating by wave energy or particle radiation
- C22B9/228—Remelting metals with heating by wave energy or particle radiation by particle radiation, e.g. electron beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/077—Electron guns using discharge in gases or vapours as electron sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Toxicology (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacture And Refinement Of Metals (AREA)
Abstract
An electron-beam unit comprises the vacuum melting chamber with intermediate reservoir and ingot mold are installed in it. Vacuum melting chamber is equipped with base with gas discharge electron guns for melting of consumable blanks and heating of liquid metal in intermediate reservoir and gas discharge electron guns for heating liquid metal in ingot mold placed on its, at that gas discharge electron guns for smelting of consumable blanks and heating of liquid metal in intermediate reservoir are placed pairwise on same distance from longitudinal axis of base symmetry and gas discharge electron guns for heating of liquid metal in ingot mold are pairwise placed on single distance from longitudinal axis of the base symmetry. During melting of consumable blanks and heating of liquid metal in intermediate reservoir and at heating of liquid metal in ingot mold the base with gas discharge electron guns is installed in such way that longitudinal axis of symmetry thereof is parallel to longitudinal axis of symmetry of intermediate reservoir and parallel to longitudinal axis of symmetry of ingot mold, and longitudinal axis of the base symmetry is in the same vertical plane with longitudinal axis of symmetry of intermediate reservoir and longitudinal axis of symmetry of ingot mold. Gas discharge electron guns for smelting of consumable blanks and heating of liquid metal in intermediate reservoir and gas discharge electron guns for heating of liquid metal in ingot mold are installed with inclination towards vertical plane.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
UAU201301118U UA82781U (en) | 2013-01-30 | 2013-01-30 | Electron-beam unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
UAU201301118U UA82781U (en) | 2013-01-30 | 2013-01-30 | Electron-beam unit |
Publications (1)
Publication Number | Publication Date |
---|---|
UA82781U true UA82781U (en) | 2013-08-12 |
Family
ID=52274875
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
UAU201301118U UA82781U (en) | 2013-01-30 | 2013-01-30 | Electron-beam unit |
Country Status (1)
Country | Link |
---|---|
UA (1) | UA82781U (en) |
-
2013
- 2013-01-30 UA UAU201301118U patent/UA82781U/en unknown
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