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The proposed high-frequency ion source contains a gas-discharge chamber coupled with a gas-supply system, an inductor, an optical system, and annular permanent magnets that enclose the gas-discharge chamber. The permanent magnets are arranged between the inductor and the optical system, with the possibility to move along the longitudinal axis of the gas-discharge chamber.
UA2003098400A2003-09-112003-09-11High-freqiency ion source
UA67392A
(en)