TWM614679U - Improved structure of mask - Google Patents
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- TWM614679U TWM614679U TW110202157U TW110202157U TWM614679U TW M614679 U TWM614679 U TW M614679U TW 110202157 U TW110202157 U TW 110202157U TW 110202157 U TW110202157 U TW 110202157U TW M614679 U TWM614679 U TW M614679U
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Abstract
本新型係關於一種口罩改良結構,且該口罩改良結構包括一罩體、一壓條以及二耳帶。其中,該罩體包括一上緣及二側緣,且該上緣具有一切口,該切口係呈V字形;該壓條係嵌設於該罩體、鄰近於該切口且位於該切口之下方;該二耳帶係分別連結於該二側緣,藉由該切口,可服貼於使用者的鼻樑,並提升舒適感。The present invention relates to an improved structure of a mask, and the improved structure of the mask includes a cover body, a bead and two ear straps. Wherein, the cover body includes an upper edge and two side edges, and the upper edge has a notch, and the cutout is V-shaped; the bead is embedded in the cover body, adjacent to the cutout and located below the cutout; The two ear straps are respectively connected to the two side edges, and the incision can be applied to the bridge of the nose of the user, and the comfort is improved.
Description
本新型係關於一種讓人們配戴之口罩的技術領域,尤指一種口罩改良結構,其可提升使用方便性、提高防護效果、增加配戴舒適度及符合環保要求。This model relates to the technical field of a mask for people to wear, especially an improved structure of a mask, which can improve the convenience of use, improve the protective effect, increase the wearing comfort and meet the requirements of environmental protection.
口罩一般係用於過濾、隔絕外部環境之灰塵、病毒、細菌等有害物質,藉以保護配戴者,例如醫護人員配戴口罩以過濾工作環境之病毒或細菌、工地作業人員配戴口罩以隔絕工作環境之灰塵等。此外,一般大眾也都會配戴口罩以降低受到流行性疾病傳染的機會。Masks are generally used to filter and isolate dust, viruses, bacteria and other harmful substances in the external environment to protect the wearer. For example, medical staff wear masks to filter viruses or bacteria in the working environment, and site workers wear masks to isolate work Environmental dust, etc. In addition, the general public will also wear masks to reduce the chance of being infected by epidemic diseases.
請參照圖1,其係為習知口罩之立體圖。於圖1所示之習知的口罩9包括一罩體91、設於罩體91上緣之一壓條92以及分別設於罩體91二側邊之細繩93。Please refer to Figure 1, which is a three-dimensional view of a conventional mask. The
上述習知之口罩9一般係以熔噴不織布製成並具有多項缺點,例如:無法緊密壓合於臉部,若有配戴眼鏡時容易使鏡片起霧;一次性使用(拋棄式)且難以回收分解而不環保;礙於不織布之熔噴良率(例如潮濕)及靜電駐極影響而容易使防護效果降低;容易殘留異味;悶熱不透氣;細繩93之長度無法調整,若是遇到臉型較大者,在長時間配戴後容易導致勒耳疼痛;容易摩擦肌膚造成不適;碰到水分即需將整個口罩9丟棄等。The above-mentioned
有鑑於此,本新型之主要目的在於提供一種口罩改良結構,藉由各種結構之改良,可解決上述習知口罩所會具有之各種問題,如下詳述。In view of this, the main purpose of the present invention is to provide an improved structure of a mask, which can solve various problems of the above-mentioned conventional masks through the improvement of various structures, as detailed below.
本新型所提出之口罩改良結構包括一罩體、一壓條以及二耳帶。其中,該罩體包括一上緣及二側緣,且該上緣具有一切口,該切口係呈V字形;該壓條係嵌設於該罩體、並鄰近於該切口且位於該切口之下方;該二耳帶係分別連結於該二側緣。藉此結構設計可以達到符合人體工學要求,例如呈V字形之切口可以讓壓條服貼合於配戴者的臉部,進而可提升使用方便性。The improved structure of the mask proposed by the present invention includes a cover body, a bead and two ear straps. Wherein, the cover includes an upper edge and two side edges, and the upper edge has a notch, the cut is V-shaped; the bead is embedded in the cover, adjacent to the cut and located below the cut ; The two ear straps are respectively connected to the two side edges. The structure design can meet the ergonomic requirements. For example, the V-shaped incision can make the layering suit fit the wearer's face, thereby improving the ease of use.
於一實施態樣中,該罩體係由一親膚敏布料層、一吸附層及一奈米過濾層彼此疊置而成。藉此結構設計可提高例如細菌或灰塵等有害物質之防護效果、可增加配戴舒適度(不會摩擦肌膚、透氣、可重複水洗而不會殘留異味等)以及可符合環保要求(可回收分解)等。In one embodiment, the cover system is formed by stacking a skin-friendly and sensitive cloth layer, an adsorption layer and a nanofiltration layer on top of each other. The structural design can improve the protective effect of harmful substances such as bacteria or dust, increase the wearing comfort (not rubbing the skin, breathable, repeatable washing without residual odor, etc.) and meet environmental protection requirements (recyclable and decomposable) )Wait.
於一實施態樣中,該罩體包括彼此連結之一本體部及一上延展部,且該上緣、該切口及該壓條係分別位於該上延展部。又於一實施態樣中,該罩體更包括與該本體部連結之一下延展部。藉此結構設計可使該罩體形成立體式設計,其可讓配戴者呼出之熱氣從該罩體之側邊進行交換,避免熱氣造成眼鏡鏡片起霧問題,進而提升使用方便性。In one embodiment, the cover includes a body portion and an upper extension portion connected to each other, and the upper edge, the cutout, and the bead are located on the upper extension portion, respectively. In another embodiment, the cover further includes a lower extension part connected with the main body part. With this structural design, the cover body can be formed into a three-dimensional design, which allows the wearer's exhaled heat to be exchanged from the side of the cover body, avoiding the problem of fogging of the glasses lens caused by the heat, and improving the convenience of use.
於一實施態樣中,該二耳帶分別包括一調整夾件。藉此結構設計可調整耳帶之長度以符合不同要求,於使用上更為方便。In one embodiment, the two ear straps respectively include an adjusting clip. With this structural design, the length of the ear straps can be adjusted to meet different requirements, which is more convenient in use.
請參照圖2,其係為本新型較佳具體實施例之使用狀態示意圖。於圖2中顯示一配戴者6配戴有本新型所提出之口罩改良結構1,藉以過濾、隔絕外部環境之灰塵、病毒、細菌等有害物質。Please refer to FIG. 2, which is a schematic diagram of the use state of the preferred embodiment of the new type. Fig. 2 shows a
請同時參照圖3及圖4,其中之圖3係為本新型較佳具體實施例之口罩之立體圖,圖4係為本新型較佳具體實施例之口罩之層疊結構示意圖。Please refer to FIGS. 3 and 4 at the same time. FIG. 3 is a perspective view of a mask according to a preferred embodiment of the new type, and FIG. 4 is a schematic diagram of a laminated structure of a mask according to a preferred embodiment of the new type.
如圖3及圖4所示,口罩改良結構1包括一罩體2、一壓條4以及二耳帶3。其中,罩體2包括一上緣21及二側緣22(於圖3中因視角關係,僅顯示其中一個側緣22),於本實施例中,罩體2係由一親膚敏布料層201、一吸附層202及一奈米過濾層203彼此疊置而成(如圖4所示),且罩體2包括彼此連結之一本體部23及一上延展部24,罩體2更包括與本體部23連結之一下延展部25,且該上延展部24與該下延展部25皆朝向該本體部23的同一側,以與該本體部23形成一立體空間。所述之罩體2可遮擋配戴者6的口鼻,當配戴者穿戴於面部時,該本體部23之中央將與該使用者6的面部具有一間距,該上延展部24至少有部份與該使用者6的面部接觸,使得該口鼻處不會直接接觸該罩體2,提升舒適性。As shown in FIGS. 3 and 4, the improved
此外,在罩體2之上緣21具有一切口211,此切口211係呈V字形,於本實施例中,上緣21及其所具有之切口211係分別位於上延展部24,且前述切口211之形成方式並不加以限定,例如切口211可於模製罩體2時形成、或者亦可以二次加工切割形成等。In addition, the
另外,壓條4係嵌設於罩體2、並鄰近於切口211且位於切口211之下方,於本實施例中,壓條4係位於罩體2之上延展部24。前述之壓條4可為一般塑性材質或是鐵絲,於此不再加以贅述。又,二耳帶3係分別連結於罩體2之二側緣22。In addition, the
請參照圖5,其係為本新型較佳具體實施例之口罩之壓條調整示意圖,並請同時一併參照圖2。於配戴者6配戴上述之口罩改良結構1時,係以二耳帶3分別套掛於耳部63,並以上延展部24遮蔽鼻部61,以下延展部25的部份靠抵與遮蔽下巴62。此外,配戴者6係將位於罩體2之上延展部24的壓條4壓合服貼於臉部64及鼻部61,此時,由於罩體2之上緣21具有呈V字形的切口211,使該切口211對齊鼻樑,使切口211的兩側分別順貼於鼻樑的兩側,罩體2之上延展部24可符合人體工學要求而緊密貼合於臉部64及鼻部61,如此可提升使用方便性,且配戴者6若有配戴眼鏡(圖未示)時亦不會因呼出熱氣而使鏡片起霧。Please refer to FIG. 5, which is a schematic diagram of adjusting the pressure strip of the mask according to the preferred embodiment of the new type. Please also refer to FIG. 2 at the same time. When the
於實際應用時,罩體2之上延展部24與下延展部25可分別製作成伸縮囊式,於未使用(收納)時,上延展部24與下延展部25可分別縮回至本體部23處,於使用(配戴)時,則可將上延展部24與下延展部25分別拉出以遮蔽配戴者6的鼻部61和下巴62。In actual application, the
此外,藉由罩體2彼此連結之本體部23、上延展部24及下延展部25之結構設計,罩體2可形成上、中、下式的三層立體設計,於配戴時,可讓配戴者6呼出之熱氣從罩體2之側邊進行交換,徹底解決眼鏡鏡片起霧的問題,進而可讓眼鏡配戴者配戴口罩改良結構1時更為便利。In addition, through the structural design of the
請再同時參照圖2及圖4,藉由親膚敏布料層201、吸附層202及奈米過濾層203彼此疊置而成之罩體2尚具有以下效果:(1)可以有效吸附空氣中懸浮之有害氣體及油脂,例如甲醛、阿摩尼亞、戴奧辛等農工業排放廢氣體,經實際實驗結果,細菌過濾效率可達99.9%(實驗結果,可阻擋次微米粒子,可阻擋比PM2.5小33倍的有害物質),故對於防護效果可大為提高;(2)透氣良好且不會殘留異味、不會摩擦配戴者6肌膚,在配戴舒適度上(例如長時間配戴)可大為增加;(3)可進行簡單清洗而完全不會降低過濾效率(經實際實驗結果,可重複約200次的清洗),藉此可更省錢;(4)可回收分解,符合環保要求。Please refer to Figures 2 and 4 at the same time. The
請參照圖6,其係為本新型較佳具體實施例之口罩之耳帶調整示意圖。如圖6所示,二耳帶3分別包括一調整夾件31,該調整夾件31係設置一穿孔,該耳帶3可穿過後,使耳帶3與穿孔形成緊配合的狀態,使得耳帶3與調整夾件31的相對位置固定,達到調整調整夾件31相對於口罩位置的距離長度,即改變耳帶3之鬆緊程序。藉此,於配戴時,耳帶3之鬆緊可進行調整以符合不同配戴者6的要求,調整該二耳帶之鬆緊,進而提高使用方便性。另於結構設計上,耳帶3亦可由親膚敏布料製成,故在配戴舒適度上可再大為增加。又,該耳帶3係為二條彈性繩所組成,該些彈性繩分別固定於該本體部23之一側的上緣與下緣,該些彈性繩的另端穿過該穿孔,以形成一可被勾扣於耳後的耳帶。Please refer to FIG. 6, which is a schematic diagram of adjusting the ear straps of a mask according to a preferred embodiment of the new type. As shown in Fig. 6, the two
以上所述僅為本新型的較佳具體實施例,其並不用以限制本新型,凡在本新型的精神和原則之內,所作的任何修改、等同替換、改進等,均應包含在本新型的防護範圍之內。The above descriptions are only the preferred specific embodiments of the present invention, and they are not intended to limit the present invention. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the present invention. Within the scope of protection.
1:口罩改良結構 2:罩體 201:親膚敏布料層 202:吸附層 203:奈米過濾層 21:上緣 211:切口 22:側緣 23:本體部 24:上延展部 25:下延展部 3:耳帶 31:調整夾件 4:壓條 6:配戴者 61:鼻部 62:下巴 63:耳部 64:臉部1: Improved structure of mask 2: hood 201: Skin-friendly sensitive fabric layer 202: Adsorption layer 203: Nano filter layer 21: upper edge 211: cut 22: side edge 23: body part 24: Upper Extension Department 25: Lower extension 3: ear strap 31: Adjust the clamp 4: layering 6: wearer 61: Nose 62: Chin 63: Ear 64: face
圖1係為習知口罩之立體圖。Figure 1 is a three-dimensional view of a conventional mask.
圖2係為本新型較佳具體實施例之使用狀態示意圖。Fig. 2 is a schematic diagram of the use state of the preferred embodiment of the new type.
圖3係為本新型較佳具體實施例之口罩之立體圖。Figure 3 is a perspective view of a mask according to a preferred embodiment of the new model.
圖4係為本新型較佳具體實施例之口罩之層疊結構示意圖。Fig. 4 is a schematic diagram of the laminated structure of the mask according to the preferred embodiment of the new type.
圖5係為本新型較佳具體實施例之口罩之壓條調整示意圖。Fig. 5 is a schematic diagram of the bead adjustment of the mask according to the preferred embodiment of the new type.
圖6係為本新型較佳具體實施例之口罩之耳帶調整示意圖。Fig. 6 is a schematic diagram of adjusting ear straps of a mask according to a preferred embodiment of the new invention.
1:口罩改良結構 1: Improved structure of mask
2:罩體 2: hood
21:上緣 21: upper edge
211:切口 211: cut
22:側緣 22: side edge
23:本體部 23: body part
24:上延展部 24: Upper Extension Department
25:下延展部 25: Lower extension
3:耳帶 3: ear strap
4:壓條 4: layering
Claims (6)
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TW110202157U TWM614679U (en) | 2021-02-26 | 2021-02-26 | Improved structure of mask |
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TW110202157U TWM614679U (en) | 2021-02-26 | 2021-02-26 | Improved structure of mask |
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TWM614679U true TWM614679U (en) | 2021-07-21 |
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- 2021-02-26 TW TW110202157U patent/TWM614679U/en not_active IP Right Cessation
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