TWM555856U - Hydrogen generator, and hydrogen gas inhaler including the same - Google Patents

Description

氫氣生成裝置及包含其之氫氣吸入裝置 Hydrogen generating device and hydrogen inhaling device containing same

本新型係關於一種氫氣生成裝置及包含其之氫氣吸入裝置。 The present invention relates to a hydrogen generating device and a hydrogen inhaling device including the same.

近年來，溶存氫濃度較高之水(氫水)之功效受到關注，已有針對用以製造氫水之裝置之方案(例如專利文獻1)。專利文獻1之氫水供給裝置係不使用離子交換膜或半透膜之裝置。但是，存在藉由使用利用了離子交換膜之電極部，能夠供給小型且效率較高之裝置之情況。 In recent years, the effect of water (hydrogen water) having a high concentration of dissolved hydrogen has been attracting attention, and there has been a proposal for a device for producing hydrogen water (for example, Patent Document 1). The hydrogen water supply device of Patent Document 1 is a device that does not use an ion exchange membrane or a semipermeable membrane. However, there is a case where a small and highly efficient device can be supplied by using an electrode portion using an ion exchange membrane.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特開2005-105289號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2005-105289

藉由使用將水電解而生成氫氣之氫氣生成裝置並使生成之氫氣溶解於水，能夠獲得氫水。於氫氣生成裝置中，若生成之氫氣之流路被阻斷，則存在裝置內之氫氣之壓力過度變高之情況。因此，需要生成之氫氣之流路被阻斷之情形時之對策。尤其是於使裝置小型化之情形時，需 要對該對策下功夫。 Hydrogen water can be obtained by using a hydrogen generating device that generates hydrogen by electrolysis of water and dissolving the generated hydrogen gas in water. In the hydrogen generating apparatus, if the generated hydrogen gas flow path is blocked, the pressure of the hydrogen gas in the apparatus may excessively increase. Therefore, it is necessary to take measures when the generated hydrogen flow path is blocked. Especially when it is necessary to miniaturize the device, It is necessary to work hard on this countermeasure.

在此種狀況下，本新型之目的之一係提供一種即便於氫氣之流路被阻斷之情形時裝置內之氫氣之壓力亦不過度變高的氫氣生成裝置。 Under such circumstances, one of the objects of the present invention is to provide a hydrogen generating apparatus which does not excessively increase the pressure of hydrogen in the apparatus even when the flow path of the hydrogen gas is blocked.

本新型之一實施形態之氫氣生成裝置包含：至少1個電解單元，其包含陽極與陰極，且用以將水電解；槽，其保持被供給至上述電解單元之水性液體；第1流路，其供在上述陰極生成之氫氣流動，且於下游連接供上述氫氣流動之氫氣流路；及氫氣釋放機構。上述槽具有用以將上述槽內之氣體向上述氫氣生成裝置之外部釋放之氣體釋放口。上述氫氣釋放機構於上述氫氣流路中之上述氫氣之流動受到抑制時，藉由使上述氫氣流至上述槽內而自上述氣體釋放口釋放上述氫氣。 A hydrogen generating apparatus according to an embodiment of the present invention includes: at least one electrolytic unit including an anode and a cathode for electrolyzing water; and a tank for holding an aqueous liquid supplied to the electrolytic unit; a first flow path; The hydrogen gas generated by the cathode is flowed, and a hydrogen gas flow path for supplying the hydrogen gas is connected downstream; and a hydrogen gas release mechanism. The tank has a gas release port for releasing the gas in the tank to the outside of the hydrogen generating device. When the flow of the hydrogen gas in the hydrogen gas flow path is suppressed, the hydrogen gas releasing means releases the hydrogen gas from the gas discharge port by flowing the hydrogen gas into the cell.

本新型之一實施形態之氫氣吸入裝置包含本新型之氫氣生成裝置、及連接於上述第1流路之下游之氣體吸入器具。 A hydrogen inhalation device according to an embodiment of the present invention includes the hydrogen generating device of the present invention and a gas suction device connected downstream of the first flow path.

根據本新型之氫氣生成裝置，即便於氫氣之流路被阻斷之情形時，亦能夠抑制裝置內之氫氣之壓力過度變高。 According to the hydrogen generating apparatus of the present invention, even when the flow path of the hydrogen gas is blocked, it is possible to suppress the pressure of the hydrogen gas in the apparatus from becoming excessively high.

11‧‧‧殼體 11‧‧‧Shell

12‧‧‧直流電源 12‧‧‧DC power supply

20‧‧‧電解槽 20‧‧‧electrolyzer

21‧‧‧陰極室 21‧‧‧ Cathode chamber

22‧‧‧陽極室 22‧‧‧Anode chamber

23‧‧‧薄膜電極組 23‧‧‧Thin electrode group

30‧‧‧水箱(第1槽) 30‧‧‧Water tank (1st trough)

30h、120h‧‧‧氣體釋放口 30h, 120h‧‧‧ gas release port

41‧‧‧第1流路 41‧‧‧1st flow path

42‧‧‧第2流路 42‧‧‧2nd flow path

43‧‧‧第3流路 43‧‧‧3rd flow path

44、201‧‧‧氫氣流路 44, 201‧‧‧ Hydrogen flow path

50‧‧‧管(氫氣釋放機構) 50‧‧‧ tube (hydrogen release mechanism)

50a‧‧‧開口部 50a‧‧‧ openings

100、100a‧‧‧氫氣生成裝置 100, 100a‧‧‧ Hydrogen generating device

110‧‧‧電解單元 110‧‧‧Electrolytic unit

111‧‧‧陽極 111‧‧‧Anode

112‧‧‧陰極 112‧‧‧ cathode

300‧‧‧氫氣吸入裝置 300‧‧‧ Hydrogen inhalation device

310‧‧‧鼻插管(氣體吸入器具) 310‧‧‧ nasal cannula (gas inhalation device)

圖1係示意性地表示本新型之氫氣生成裝置之一例之構成的圖。 Fig. 1 is a view schematically showing the configuration of an example of the hydrogen generating apparatus of the present invention.

圖2A係示意性地表示用以向水箱補充水之補充器具之一例的圖。 Fig. 2A is a view schematically showing an example of a refilling device for replenishing water to a water tank.

圖2B係用以表示圖2A所示之補充器具之功能的圖。 Fig. 2B is a view for showing the function of the refilling device shown in Fig. 2A.

圖2C係用以表示圖2A所示之補充器具之功能的圖。 Figure 2C is a diagram for showing the function of the refill device shown in Figure 2A.

圖3係示意性地表示本新型之氫氣生成裝置之另一例之構成的圖。 Fig. 3 is a view schematically showing the configuration of another example of the hydrogen generating apparatus of the present invention.

圖4係示意性地表示本新型之氫氣生成裝置之另一例之構成的圖。 Fig. 4 is a view schematically showing the configuration of another example of the hydrogen generating apparatus of the present invention.

圖5係示意性地表示本新型之氫氣生成裝置之另一例之構成的圖。 Fig. 5 is a view schematically showing the configuration of another example of the hydrogen generating apparatus of the present invention.

圖6係示意性地表示本新型之氫氣生成裝置之另一例之構成的圖。 Fig. 6 is a view schematically showing the configuration of another example of the hydrogen generating apparatus of the present invention.

圖7係示意性地表示本新型之氫氣生成裝置之另一例之構成的圖。 Fig. 7 is a view schematically showing the configuration of another example of the hydrogen generating apparatus of the present invention.

圖8係示意性地表示本新型之氫氣生成裝置之一部分之一例的圖。 Fig. 8 is a view schematically showing an example of a part of the hydrogen generating apparatus of the present invention.

圖9係示意性地表示本新型之氫氣生成裝置之一部分之一例的圖。 Fig. 9 is a view schematically showing an example of a part of the hydrogen generating apparatus of the present invention.

圖10係示意性地表示本新型之氫氣吸入裝置之一例之構成的圖。 Fig. 10 is a view schematically showing the configuration of an example of the hydrogen gas inhalation device of the present invention.

圖11係示意性地表示可於本新型中使用之吸入用之器具之一例的圖。 Fig. 11 is a view schematically showing an example of an apparatus for inhalation which can be used in the present invention.

以下，對本新型之實施形態進行說明。再者，於以下之說明中，舉例對本新型之實施形態進行說明，但本新型不限定於以下說明之例。於以下之說明中，有時例示特定之數值或特定之材料，但本新型不限定於該等例示。再者，於以下之說明中，於對構件等之方向(例如上下)進行說明之情形時，係對使本新型之氫氣生成裝置為使用狀態之配置時之方向進行說明。 Hereinafter, embodiments of the present invention will be described. In the following description, the embodiments of the present invention will be described by way of examples, but the present invention is not limited to the examples described below. In the following description, specific numerical values or specific materials are sometimes exemplified, but the present invention is not limited to the examples. In the following description, in the case where the direction of the member or the like (for example, the upper and lower sides) is described, the direction in which the hydrogen generating device of the present invention is placed in the use state will be described.

(氫氣生成裝置) (hydrogen generating device)

以下，對本新型之氫氣生成裝置進行說明。以下，有時將本新型之氫氣生成裝置簡稱為本新型之裝置。本新型之氫氣生成裝置包含至少1個電解單元、槽、第1流路、及氫氣釋放機構。電解單元係包含陽極與陰極， 且用以將水電解之單元。槽係保持被供給至電解單元之水性液體之槽。第1流路係供在陰極生成之氫氣流動且於下游連接供氫氣流動之氫氣流路之流路。氫氣流路可直接連接於第1流路，亦可透過其他構件連接於第1流路之下游。槽具有用以將槽內之氣體向氫氣生成裝置之外部釋放之氣體釋放口。氫氣釋放機構(氫氣釋放構件)係上述氫氣流路中之氫氣之流動受到抑制(例如阻斷)時，藉由使氫氣流至上述槽內而自氣體釋放口釋放氫氣之機構(構件)。 Hereinafter, the hydrogen generating apparatus of the present invention will be described. Hereinafter, the hydrogen generating device of the present invention may be simply referred to as the novel device. The hydrogen generating apparatus of the present invention includes at least one electrolytic unit, a tank, a first flow path, and a hydrogen gas releasing mechanism. The electrolysis unit comprises an anode and a cathode, And a unit for electrolyzing water. The trough system maintains a tank of aqueous liquid that is supplied to the electrolysis unit. The first flow path is a flow path for supplying hydrogen gas generated at the cathode and connecting a hydrogen gas flow path for supplying hydrogen gas downstream. The hydrogen flow path may be directly connected to the first flow path or may be connected downstream of the first flow path by other members. The tank has a gas release port for releasing the gas in the tank to the outside of the hydrogen generating device. The hydrogen gas releasing means (hydrogen releasing means) is a mechanism (member) for releasing hydrogen gas from the gas releasing port by flowing hydrogen into the tank when the flow of hydrogen in the hydrogen gas flow path is suppressed (for example, blocked).

以下，有時將氫氣流路中之氫氣之流動未被不當抑制之狀態(例如未被阻斷之狀態)下的驅動稱為「通常驅動」。通常驅動時，於陰極生成之氫氣通過第1流路向氫氣流路流動。但是，於過度抑制氫氣流路中之氫氣之流動之情形時，通過第1流路流動之氣體藉由氫氣釋放機構而流至槽內。流至槽內之氫氣自氣體釋放口向裝置外部釋放。因此，即便於過度抑制氫氣流路中之氫氣之流動之情形時，亦能夠防止裝置內之氫氣之壓力過度變高。 Hereinafter, the drive in a state in which the flow of hydrogen in the hydrogen flow path is not improperly suppressed (for example, in a state where it is not blocked) may be referred to as "normal drive". Normally, hydrogen gas generated at the cathode flows through the first flow path to the hydrogen gas flow path. However, when the flow of hydrogen in the hydrogen gas flow path is excessively suppressed, the gas flowing through the first flow path flows into the tank by the hydrogen gas release mechanism. Hydrogen flowing into the tank is released from the gas release port to the outside of the device. Therefore, even when the flow of hydrogen in the hydrogen gas flow path is excessively suppressed, the pressure of the hydrogen gas in the apparatus can be prevented from becoming excessively high.

於本新型之裝置中，槽亦可包含保持被供給至陽極之水性液體之第1槽。第1槽亦可具有用以將第1槽內之氣體向氫氣生成裝置之外部釋放之氣體釋放口。於該情形之一例中，氫氣釋放機構於氫氣流路中之氫氣之流動受到抑制時，使通過第1流路流動之氫氣流至第1槽內。槽亦可為僅由第1槽所構成者。或者，槽亦可包含保持被供給至陽極之水性液體之第1槽、及保持被供給至陰極之水性液體之第2槽。 In the apparatus of the present invention, the tank may also include a first tank that holds the aqueous liquid supplied to the anode. The first tank may also have a gas release port for releasing the gas in the first tank to the outside of the hydrogen generating device. In an example of this case, when the hydrogen gas is suppressed in the flow of hydrogen in the hydrogen gas flow path, the hydrogen gas flowing through the first flow path flows into the first tank. The groove may also be composed of only the first groove. Alternatively, the tank may include a first tank that holds the aqueous liquid supplied to the anode, and a second tank that holds the aqueous liquid supplied to the cathode.

本新型之裝置之典型之一例包含具備電解單元、配置陽極之陽極室、及配置陰極之陰極室之電解槽，且電解單元係包含陽極與陰極之 薄膜電極組，第1流路連接於陰極室。如該一例般，電解單元亦可為薄膜電極組。以下，有時將使用薄膜電極組之本新型之氫氣生成裝置稱為裝置(Da)。於裝置(Da)中，槽(第1槽)亦可為保持被供給至陽極室之水性液體之水箱。以下，有時將裝置(Da)中之第1槽稱為「水箱」。於以下之記載中，只要不違背宗旨，則可稱第1槽為水箱，可稱水箱為第1槽。 A typical example of the apparatus of the present invention includes an electrolytic cell, an anode chamber in which an anode is disposed, and an electrolytic cell in which a cathode chamber of the cathode is disposed, and the electrolytic cell includes an anode and a cathode. In the thin film electrode group, the first flow path is connected to the cathode chamber. As in this example, the electrolytic cell may also be a thin film electrode assembly. Hereinafter, the hydrogen generating device of the present invention using a thin film electrode group is sometimes referred to as a device (Da). In the apparatus (Da), the tank (first tank) may also be a water tank that holds the aqueous liquid supplied to the anode chamber. Hereinafter, the first tank in the device (Da) may be referred to as a "water tank". In the following description, the first tank is referred to as a water tank as long as it does not contradict the purpose, and the water tank may be referred to as a first tank.

裝置(Da)之一例包含：電解槽，其包含用以將水電解之薄膜電極組且具備陰極室及陽極室；水箱，其保持被供給至陽極室之水；及第1流路，其連接於陰極室且供在陰極室生成之氫氣流動，於下游連接供氫氣流動之氣體流路；而且水箱具有用以將水箱內之氣體向氫氣生成裝置之外部釋放之氣體釋放口。該一例之裝置(Da)具有當氣體流路中之氫氣之流動受到抑制時，使通過第1流路流動之氫氣流至水箱內之氣體釋放機構。 An example of the device (Da) includes: an electrolytic cell including a thin film electrode group for electrolyzing water and having a cathode chamber and an anode chamber; a water tank holding water supplied to the anode chamber; and a first flow path connected The cathode chamber is provided with a hydrogen gas flow generated in the cathode chamber, and a gas flow path for supplying hydrogen gas is connected downstream; and the water tank has a gas release port for releasing the gas in the water tank to the outside of the hydrogen generating device. The device (Da) of this example has a gas release mechanism that causes hydrogen flowing through the first flow path to flow into the water tank when the flow of hydrogen in the gas flow path is suppressed.

於裝置(Da)中，陽極室可藉由流路而與水箱連接，亦可與水箱直接連接，還可配置於水箱內。於任一情形，均可視為水箱之內部與陽極室相連接。 In the device (Da), the anode chamber may be connected to the water tank by a flow path, or directly connected to the water tank, or may be disposed in the water tank. In either case, it can be considered that the inside of the tank is connected to the anode chamber.

於裝置(Da)中，較佳為第1流路連接於陰極室中之下方。若向陽極室供給水，則所供給之水之一部分通過薄膜電極組向陰極室移動。若水蓄積於陰極室，則將於陰極生成之氫氣自陰極室釋放時將水擠出之阻力變高。其結果為，水容易殘留於陰極室內，氫氣不易釋放，可能導致反應速度下降。因此，較佳為隨時自陰極室排出陰極室內之水。藉由將第1流路連接於陰極室之下部，能夠將陰極室內之水與於陰極室生成之氫氣一同向陰極室之外部排出。即，氫氣及水亦可流經第1流路。亦可使第1 流路之內部之截面積(與水流垂直之截面積)某種程度變小，以使水易於與氫氣一同流經第1流路。例如亦可將第1流路之內部之截面積設為3mm²~80mm²之範圍。 In the device (Da), preferably, the first flow path is connected below the cathode chamber. When water is supplied to the anode chamber, part of the supplied water moves toward the cathode chamber through the membrane electrode assembly. If water accumulates in the cathode chamber, the resistance to water extrusion when the hydrogen generated by the cathode is released from the cathode chamber becomes high. As a result, water easily remains in the cathode chamber, and hydrogen gas is not easily released, which may cause a decrease in the reaction rate. Therefore, it is preferred to discharge the water in the cathode chamber from the cathode chamber at any time. By connecting the first flow path to the lower portion of the cathode chamber, the water in the cathode chamber can be discharged to the outside of the cathode chamber together with the hydrogen gas generated in the cathode chamber. That is, hydrogen gas and water may also flow through the first flow path. The cross-sectional area of the inside of the first flow path (the cross-sectional area perpendicular to the water flow) can be made small to some extent, so that the water easily flows through the first flow path together with the hydrogen gas. For example, the cross-sectional area of the inside of the first flow path may be set to be in the range of 3 mm ² to 80 mm ² .

本新型之裝置可包含連接於第1流路之下游之氫氣流路，亦可不包含。即，氫氣流路亦可為連接於本新型之裝置者。本新型之裝置可包含供氫氣流路連接之連接件，亦可不包含。氫氣流路或氫氣流路之連接件可直接連接於第1流路，亦可間接連接。 The apparatus of the present invention may include a hydrogen flow path connected downstream of the first flow path, or may not be included. That is, the hydrogen flow path may be connected to the device of the present invention. The device of the present invention may or may not include a connection for connecting the hydrogen flow path. The connecting member of the hydrogen flow path or the hydrogen flow path may be directly connected to the first flow path or may be indirectly connected.

於水性液體之例中，包括水及水溶液。水箱(第1槽)只要為能夠保持水性液體者即可，例如亦可使用樹脂製之水箱。亦可於水箱設置用以向水箱供給水之供給口。供給口可為裝有水之瓶(容器)之連接部(具有開口部之端部)所嵌合者。於該情形時，供給口亦可具有當水箱之水減少時自動從瓶供給水之水供給機構。水供給機構例如亦可具有當水箱內之水減少時使連結水箱與瓶之間之流路開口之機構。此種水供給機構之一例包含與水箱內之水位連動而位移之浮體。該浮體亦可作為將連結水箱與瓶之間之流路開閉之閥而發揮功能。或者，水供給機構亦可進一步地包含對應浮體之位置而將流路開閉之閥。 In the case of aqueous liquids, water and aqueous solutions are included. The water tank (first tank) may be any one that can hold an aqueous liquid, and for example, a resin water tank may be used. A supply port for supplying water to the water tank may also be provided in the water tank. The supply port may be a fitting portion of a connection portion (an end portion having an opening portion) in which a water bottle (container) is attached. In this case, the supply port may also have a water supply mechanism that automatically supplies water from the bottle when the water in the water tank is reduced. The water supply mechanism may, for example, have a mechanism for opening a flow path between the water tank and the bottle when the water in the water tank is reduced. An example of such a water supply mechanism includes a floating body that is displaced in conjunction with a water level in the water tank. The floating body can also function as a valve that opens and closes a flow path connecting the water tank and the bottle. Alternatively, the water supply mechanism may further include a valve that opens and closes the flow path corresponding to the position of the floating body.

於槽(例如第1槽)設置有用以將槽內之氣體向裝置之外部釋放之氣體釋放口。亦可於氣體釋放口或與其連接之氣體釋放路徑設置用以防漏水之機構，使得當裝置傾斜或裝置搖動時槽內之水不自氣體釋放口洩漏。例如亦可於氣體釋放口或氣體釋放路徑設置當水箱內之壓力成為既定值以上時打開且於其他時間關閉之閥(釋壓閥)。亦可於氣體釋放口或氣體釋放路徑配置使氣體透過但抑制液體透過之構件(撥水性濾紙、氣液分 離膜、多孔質體等)。亦可以包圍氣體釋放口之周圍之方式設置朝向槽之內側而突起之凸部(縱壁)。 A gas release port for releasing the gas in the tank to the outside of the apparatus is provided in the tank (for example, the first tank). A mechanism for preventing water leakage may also be provided at the gas release port or the gas release path connected thereto, so that the water in the tank does not leak from the gas release port when the device is tilted or the device is shaken. For example, a valve (pressure relief valve) that opens when the pressure in the water tank is equal to or higher than a predetermined value and is closed at other times may be provided in the gas release port or the gas release path. It is also possible to arrange a member for permeating the gas but suppressing the permeation of the liquid at the gas release port or the gas release path (water-repellent filter paper, gas-liquid separation) Release film, porous body, etc.). It is also possible to provide a convex portion (longitudinal wall) that protrudes toward the inner side of the groove so as to surround the periphery of the gas discharge port.

於裝置(Da)中，為了抑制薄膜電極組之劣化，較佳為自水箱(第1槽)向陽極室供給之水性液體係不包含金屬離子之水，亦可為去離子水。作為去離子水，亦可使用一般之去離子水或純水。例如較佳為使用將導電率設為1.3μS/cm以下之水(去離子水)。亦可分別準備適當量之經H⁺取代之陽離子交換樹脂、及經OH^-取代之陰離子交換樹脂，將該等混合裝入袋並放入至水箱內。藉此，能夠使水箱內之離子濃度(導電率)下降。 In the apparatus (Da), in order to suppress deterioration of the thin film electrode group, it is preferable that the aqueous liquid system supplied from the water tank (first tank) to the anode chamber does not contain water of metal ions, and may be deionized water. As deionized water, general deionized water or pure water can also be used. For example, water (deionized water) having a conductivity of 1.3 μS/cm or less is preferably used. An appropriate amount of the H ⁺ -substituted cation exchange resin and the OH ^- -substituted anion exchange resin may be separately prepared, and the mixture may be mixed into a bag and placed in a water tank. Thereby, the ion concentration (conductivity) in the water tank can be lowered.

於在裝置(Da)中不使用離子交換樹脂之情形時，若長時間不更換槽(例如第1槽)中之水而使用裝置，則裝置內之構件之雜質等溶出於水中。若此種雜質過量，則有造成水之污染或電解槽(薄膜電極組)之劣化的可能性。因此，較佳為定期廢棄槽內之水並更換為新的去離子水。藉由定期進行此種更換，即便不使用離子交換樹脂，亦能夠抑制槽內之水之金屬離子濃度及雜質濃度之上升。即，本新型之裝置亦可不包含離子交換樹脂。於不包含離子交換樹脂之情形時，可無需進行離子交換樹脂之維護，並且使裝置小型化。 When the ion exchange resin is not used in the apparatus (Da), if the apparatus is used without replacing the water in the tank (for example, the first tank) for a long period of time, impurities or the like of the members in the apparatus are dissolved in the water. If such impurities are excessive, there is a possibility of causing contamination of water or deterioration of the electrolytic cell (thin film electrode group). Therefore, it is preferred to periodically discard the water in the tank and replace it with new deionized water. By periodically performing such replacement, it is possible to suppress an increase in the metal ion concentration and the impurity concentration of water in the tank even without using an ion exchange resin. That is, the apparatus of the present invention may also not contain an ion exchange resin. In the case where the ion exchange resin is not contained, maintenance of the ion exchange resin is not required, and the apparatus is miniaturized.

於裝置(Da)中，亦可於任意時期利用包含次氯酸之水(洗淨水)將電解槽內部洗淨，以對電解槽(薄膜電極組)之內部進行殺菌。為了抑制薄膜電極組之劣化，較佳為洗淨水不包含金屬離子。於洗淨水之較佳之一例中，包括藉由使氯氣溶解於去離子水而製備之洗淨水。藉由使氯氣溶解於水而產生次氯酸。例如，於使用有效氯濃度為1ppm~10ppm之 洗淨水之情形時，亦可不進行電解而利用洗淨水將電解槽之內部洗淨。亦可於洗淨後，將洗淨水排出，利用去離子水將電解槽之內部洗淨。或者，於使用有效氯濃度為0.1~0.5ppm之洗淨水之情形時，亦可於任意時期(例如每月1次左右)進行以電解槽將該洗淨水電解之洗淨運轉。或者，亦可將濃度更低之洗淨水用作通常之運轉時進行電解之水。 In the apparatus (Da), the inside of the electrolytic cell may be washed with water containing hypochlorous acid (washing water) at any time to sterilize the inside of the electrolytic cell (thin film electrode group). In order to suppress deterioration of the thin film electrode group, it is preferred that the washing water does not contain metal ions. In a preferred embodiment of the washing water, the washing water prepared by dissolving chlorine gas in deionized water is included. Hypochlorous acid is produced by dissolving chlorine gas in water. For example, using an effective chlorine concentration of 1 ppm to 10 ppm In the case of washing water, the inside of the electrolytic cell may be washed with washing water without performing electrolysis. After washing, the washing water is discharged, and the inside of the electrolytic bath is washed with deionized water. Alternatively, when a washing water having an effective chlorine concentration of 0.1 to 0.5 ppm is used, the washing operation of electrolyzing the washing water in an electrolytic bath may be performed at any time (for example, about once a month). Alternatively, a lower-concentration washing water may be used as the water for electrolysis in normal operation.

於裝置(Da)中，陽極室亦可藉由流路而連接於水箱。於較佳之一例中，藉由連結陽極室之下部與水箱之第2流路、及連結陽極室之上部與水箱之第3流路將陽極室與水箱連接。於該情形時，通過第2流路自水箱向陽極室供給水。通常，水箱配置於與電解槽相同或其以上之高度。第3流路亦可以於陽極室生成之氧氣藉由其浮力自然向水箱內移動之方式配置。例如，第3流路亦可以朝向水箱而上升之方式配置。若以電解槽將水電解，則於陽極室生成氧氣。該氧氣通過第3流路流至水箱內。此時，陽極室內之水亦與氧氣一同通過第3流路流至水箱。其結果為，產生水按照水箱、第2流路、陽極室、及第3流路之順序流動之循環流。即，於較佳之一例中，電解槽、水箱、第2及第3流路係以藉由於陽極室生成之氧氣之浮力而產生上述循環流之方式配置。 In the device (Da), the anode chamber may also be connected to the water tank by a flow path. In a preferred embodiment, the anode chamber is connected to the water tank by a second flow path connecting the lower portion of the anode chamber to the water tank and a third flow path connecting the upper portion of the anode chamber to the water tank. In this case, water is supplied from the water tank to the anode chamber through the second flow path. Typically, the water tank is placed at the same height as or above the electrolytic cell. The third flow path can also be configured such that the oxygen generated in the anode chamber naturally moves into the water tank by its buoyancy. For example, the third flow path may be arranged to rise toward the water tank. When water is electrolyzed in an electrolytic cell, oxygen is generated in the anode chamber. This oxygen flows into the water tank through the third flow path. At this time, the water in the anode chamber also flows through the third flow path to the water tank together with the oxygen. As a result, a circulating flow in which water flows in the order of the water tank, the second flow path, the anode chamber, and the third flow path is generated. That is, in a preferred example, the electrolytic cell, the water tank, and the second and third flow paths are arranged to generate the above-described circulating flow by the buoyancy of oxygen generated by the anode chamber.

藉由使生成之氫氣溶解於液體可獲得溶存氫濃度較高之液體(例如水)。又，亦可將生成之氫氣吸入而用於其他用途。例如亦可使氫氣溶解於液體，將未溶解之氫氣吸入而用於其他用途。 A liquid (for example, water) having a high dissolved hydrogen concentration can be obtained by dissolving the generated hydrogen gas in a liquid. Further, the generated hydrogen gas may be taken in for other uses. For example, hydrogen gas may be dissolved in a liquid, and undissolved hydrogen gas may be taken in for other uses.

使用本新型之裝置時，存在因某種原因而抑制氫氣流路中之氫氣之流動的情況。例如，作為氫氣流路之管被折彎時，氫氣流路中之氫氣之流動受到抑制。於此種情形時，可藉由上述氫氣釋放機構將生成之氫 氣釋放。 When the apparatus of the present invention is used, there is a case where the flow of hydrogen in the hydrogen flow path is suppressed for some reason. For example, when the tube as the hydrogen flow path is bent, the flow of hydrogen in the hydrogen flow path is suppressed. In this case, the hydrogen generated by the hydrogen release mechanism described above can be used. Gas release.

本新型之裝置亦可包含複數個電解槽。與其等之陰極室連接之複數個第1流路可於下游結合，亦可不結合。 The device of the present invention may also comprise a plurality of electrolytic cells. The plurality of first flow paths connected to the cathode chambers thereof may be combined downstream or not.

薄膜電極組之典型之一例包含配置於陽極與陰極之間之高分子電解質層。陽極及陰極分別配置於陽極室及陰極室。對薄膜電極組並無特別限定，可使用用於燃料電池(例如高分子電解質燃料電池)之薄膜電極組。即，作為電解槽，可使用燃料電池(例如高分子電解質燃料電池)，亦可使用市售之高分子電解質燃料電池。藉由使用薄膜電極組(燃料電池)，能夠使裝置大幅度小型化。 A typical example of the thin film electrode group includes a polymer electrolyte layer disposed between the anode and the cathode. The anode and the cathode are disposed in the anode chamber and the cathode chamber, respectively. The thin film electrode group is not particularly limited, and a thin film electrode assembly for a fuel cell (for example, a polymer electrolyte fuel cell) can be used. That is, a fuel cell (for example, a polymer electrolyte fuel cell) can be used as the electrolytic cell, and a commercially available polymer electrolyte fuel cell can also be used. By using a thin film electrode assembly (fuel cell), the device can be greatly miniaturized.

於使用燃料電池作為電解槽之情形時，將為燃料電池之正極側之電極(空氣極)用作電解槽之陽極，將為燃料電池之負極側之電極(燃料極)用作電解槽之陰極。於高分子電解質燃料電池中，於空氣極(正極)氧、氫離子及電子發生反應而生成水，於燃料極(負極)由氫分子生成氫離子與電子。於本新型中，藉由以空氣極為陽極且燃料極為陰極之方式對兩者之間施加電壓而將水電解。即，於空氣極(陽極)連接電源之正極，於陰極(燃料極)連接電源之負極。藉由以此方式將水電解，而於陽極生成氧氣，於陰極生成氫氣。 When a fuel cell is used as the electrolytic cell, the electrode (air electrode) on the positive electrode side of the fuel cell is used as the anode of the electrolytic cell, and the electrode (fuel electrode) on the negative electrode side of the fuel cell is used as the cathode of the electrolytic cell. . In a polymer electrolyte fuel cell, water is generated by reacting oxygen (hydrogen ions) and electrons in the air electrode (positive electrode), and hydrogen ions and electrons are generated from hydrogen molecules in the fuel electrode (negative electrode). In the present invention, water is electrolyzed by applying a voltage between the two in such a manner that the air is extremely anode and the fuel is extremely cathode. That is, the anode of the power source is connected to the air electrode (anode), and the cathode of the power source is connected to the cathode (fuel electrode). By electrolyzing water in this manner, oxygen is generated at the anode, and hydrogen is generated at the cathode.

以下，對電解單元為薄膜電極組之裝置(Da)之一例進行說明。於該一例之裝置中，槽包含保持被供給至陽極之水性液體之第1槽、及保持被供給至陰極之水性液體之第2槽。進一步地，於該一例之裝置中，電解單元為包含陽極與陰極之薄膜電極組，且由薄膜電極組將第1槽與第2槽區隔。較佳為於第1及第2槽如上所述般配置不包含金屬離子之水(去 離子水等)。另外，亦可使用複數個薄膜電極組積層而成者作為薄膜電極組。 Hereinafter, an example of a device (Da) in which an electrolytic cell is a thin film electrode group will be described. In the apparatus of this example, the tank includes a first tank that holds the aqueous liquid supplied to the anode, and a second tank that holds the aqueous liquid supplied to the cathode. Further, in the apparatus of this example, the electrolytic cell is a thin film electrode group including an anode and a cathode, and the first groove and the second groove are partitioned by the thin film electrode group. It is preferable to dispose water containing no metal ions in the first and second tanks as described above (go Ionized water, etc.). Further, a plurality of thin film electrode assemblies may be used as a thin film electrode group.

本新型之典型之另一例與裝置(Da)不同，不使用薄膜電極組。該一例之電解單元包含配置於陽極與陰極之間之分隔件。有時將使用該電解單元之本新型之氫氣生成裝置稱為「裝置(Db)」。於本新型之裝置之一例(裝置(Db)之一例)中，槽包含保持被供給至陽極之水性液體之第1槽、及保持被供給至陰極之水性液體之第2槽，且電解單元包含配置於陽極與陰極之間之分隔件，由分隔件區隔第1槽與第2槽。 Another typical example of the present invention differs from the device (Da) in that a thin film electrode set is not used. The electrolytic unit of this example includes a separator disposed between the anode and the cathode. The hydrogen generating device of the present invention using the electrolytic cell is sometimes referred to as "device (Db)". In an example of the apparatus of the present invention (an example of the apparatus (Db)), the tank includes a first tank for holding the aqueous liquid supplied to the anode, and a second tank for holding the aqueous liquid supplied to the cathode, and the electrolytic unit includes A separator disposed between the anode and the cathode, the partition being separated by the first groove and the second groove.

於裝置(Db)之電解單元之電極(陽極及陰極)使用能夠進行水之電解之電極。電極亦可為金屬電極。在用於電極之金屬之例中，包括鈦、鎳、鉑、及可用於電極之其他金屬。為了使水之電解容易進行，較佳為於電極之表面存在鉑。較佳之電極之一例係由以鉑塗佈之金屬(例如鈦)所構成之電極。第1電極與第2電極可相同亦可不同。 An electrode capable of performing electrolysis of water is used for the electrodes (anode and cathode) of the electrolysis unit of the device (Db). The electrode can also be a metal electrode. Examples of the metal used for the electrode include titanium, nickel, platinum, and other metals that can be used for the electrode. In order to facilitate the electrolysis of water, it is preferred to have platinum on the surface of the electrode. One example of a preferred electrode is an electrode composed of a platinum coated metal such as titanium. The first electrode and the second electrode may be the same or different.

對裝置(Db)之電極之形狀並無特別限定，但較佳為具有擴展為二維狀之形狀。於電極之形狀之較佳之例中，包括將複數個線狀之電極配置為條紋狀之形狀、擴張金屬板之形狀、及篩網形狀。陽極與陰極係以隔著分隔件而對向之方式配置。 The shape of the electrode of the device (Db) is not particularly limited, but is preferably a shape that expands into a two-dimensional shape. A preferred example of the shape of the electrode includes arranging a plurality of linear electrodes in a stripe shape, a shape of an expanded metal plate, and a mesh shape. The anode and the cathode are arranged to face each other with a separator interposed therebetween.

裝置(Db)之電解單元之分隔件可使用絕緣性之分隔件。分隔件較佳為使水性液體通過，而於浸漬於水性液體之狀態下抑制氣泡之通過之分隔件。於此種分隔件之例中，包括布狀之分隔件，例如包括由親水性之布(織布、不織布、其他布)所構成之分隔件。於親水性之布之例中，包括由棉所構成之布、或由親水性樹脂之纖維所構成之布。分隔件係由不具有離子交換能力之材料所形成。即，分隔件並非離子交換膜。藉由 使用抑制氣體之通過之分隔件，能夠抑制於陽極生成之氧氣的氣泡與於陰極生成之氫氣的氣泡被混合。 The separator of the electrolytic unit of the device (Db) may use an insulating separator. The separator is preferably a separator that passes the aqueous liquid and suppresses the passage of the bubbles in a state of being immersed in the aqueous liquid. In the case of such a separator, a cloth-like separator is included, and for example, a separator composed of a hydrophilic cloth (woven fabric, non-woven fabric, other cloth) is included. In the case of the hydrophilic cloth, a cloth composed of cotton or a cloth composed of fibers of a hydrophilic resin is included. The separator is formed of a material that does not have ion exchange capability. That is, the separator is not an ion exchange membrane. By By using a separator that suppresses the passage of gas, it is possible to suppress the bubbles of oxygen generated at the anode from being mixed with the bubbles of hydrogen generated at the cathode.

於裝置(Db)中，配置於電解槽(第1槽及第2槽)之水性液體為電解液，例如為溶解有鹽之水溶液。若將包含氯化物離子之水溶液電解，則存在產生氯氣之情況。為了避免氯氣之產生，亦可使用使含有硫酸根離子(SO₄ ^2-)或磷酸根離子(PO₄ ^3-)作為陰離子之鹽溶解之水溶液。於此種水溶液之例中，包括磷酸鹽水溶液(磷酸鈉水溶液或磷酸鉀水溶液、碳酸鉀等)。 In the apparatus (Db), the aqueous liquid disposed in the electrolytic cell (the first tank and the second tank) is an electrolytic solution, for example, an aqueous solution in which a salt is dissolved. If an aqueous solution containing chloride ions is electrolyzed, chlorine gas is generated. In order to avoid the generation of chlorine gas, an aqueous solution in which a salt containing a sulfate ion (SO ₄ ^2- ) or a phosphate ion (PO ₄ ^3- ) is used as an anion may be used. Examples of such an aqueous solution include an aqueous phosphate solution (aqueous sodium phosphate solution or potassium phosphate aqueous solution, potassium carbonate, etc.).

於具有第1及第2槽之本新型之裝置中，第1槽亦可具有用以將第1槽內之氣體向氫氣生成裝置之外部釋放之氣體釋放口。於該情形時，氫氣釋放機構於氫氣流路中之氫氣之流動受到抑制時，能夠藉由使氫氣流至第1槽內而自氣體釋放口釋放氫氣。 In the apparatus of the present invention having the first and second tanks, the first tank may have a gas discharge port for releasing the gas in the first tank to the outside of the hydrogen generating device. In this case, when the flow of hydrogen gas in the hydrogen gas flow path is suppressed by the hydrogen gas releasing means, hydrogen gas can be released from the gas discharge port by flowing the hydrogen gas into the first tank.

於具有第1及第2槽之本新型之裝置中，第2槽亦可具有用以將第2槽內之氣體向氫氣生成裝置之外部釋放之氣體釋放口，且第1槽亦可具有用以將於陽極生成之氧氣向氫氣生成裝置之外部釋放之氧氣釋放口。於該情形時，氫氣釋放機構於氫氣流路中之氫氣之流動受到抑制時，能夠藉由使氫氣流至第2槽內而自氣體釋放口釋放氫氣。 In the apparatus of the present invention having the first and second tanks, the second tank may have a gas release port for releasing the gas in the second tank to the outside of the hydrogen generating device, and the first tank may also be used. An oxygen release port that releases oxygen generated at the anode to the outside of the hydrogen generating device. In this case, when the flow of hydrogen gas in the hydrogen gas flow path is suppressed by the hydrogen gas release means, hydrogen gas can be released from the gas discharge port by flowing hydrogen gas into the second gas tank.

於上述本新型之裝置中，氫氣釋放機構亦可包含於下部具有開口部之管。以下，有時將該管稱為「管(T)」。管(T)亦包含將水箱區隔使一部分為管狀者。於管(T)連接第1流路及氫氣流路。另外，第1流路與管(T)只要以氣體可自第1流路向管(T)流動之方式連接即可，可直接連接，亦可不直接連接。同樣地，管(T)與氫氣流路只要以氣體可自 管(T)向氫氣流路流動之方式連接即可，可直接連接，亦可不直接連接。管(T)之內部與槽(例如第1槽)之內部係透過管(T)之開口部而連接。以下，有時將該開口部稱為「開口部(O)」。於該構成之一例中，氫氣流路中之氫氣之流動受到抑制時，通過第1流路流動之氫氣通過開口部(O)流至槽內。流至槽內之氫氣自氣體釋放口被釋放。 In the above apparatus of the present invention, the hydrogen gas releasing mechanism may be included in the tube having the opening at the lower portion. Hereinafter, the tube may be referred to as a "tube (T)". The tube (T) also includes a portion that divides the water tank so that a portion is tubular. The first flow path and the hydrogen flow path are connected to the tube (T). Further, the first flow path and the tube (T) may be connected so that the gas can flow from the first flow path to the tube (T), and may be directly connected or not directly connected. Similarly, the tube (T) and the hydrogen flow path can be self-contained as a gas. The tube (T) may be connected to the hydrogen flow path, and may be directly connected or not directly connected. The inside of the tube (T) and the inside of the groove (for example, the first groove) are connected through the opening of the tube (T). Hereinafter, the opening portion may be referred to as an "opening portion (O)". In an example of the configuration, when the flow of hydrogen in the hydrogen flow path is suppressed, the hydrogen gas flowing through the first flow path flows into the groove through the opening (O). Hydrogen flowing into the tank is released from the gas release port.

於氫氣流路被阻斷之情形時，氧氣與氫氣一同於槽(例如第1槽)內流動。此時，亦可自不同之氣體釋放口釋放氧氣與氫氣。例如，亦可將槽內之至少一部分(例如上部)隔開，自不同之氣體釋放口釋放氧氣與氫氣。例如，亦可於第1槽形成用以將氧氣向裝置外部釋放之氧氣釋放口，於第2槽形成用以將氫氣向裝置外部釋放之氫氣釋放口。 When the hydrogen flow path is blocked, oxygen and hydrogen flow together in the tank (for example, the first tank). At this time, oxygen and hydrogen can also be released from different gas release ports. For example, at least a portion of the tank (eg, the upper portion) may also be separated to release oxygen and hydrogen from different gas release ports. For example, an oxygen release port for releasing oxygen to the outside of the device may be formed in the first groove, and a hydrogen gas release port for releasing hydrogen gas to the outside of the device may be formed in the second groove.

於該說明書中，所謂管(T)之下部係指將管(T)之整體之高度設為h時，自管(T)之下端起朝向上方未達高度h/2之區域，例如係指自管(T)之下端起朝向上方高度h/3以下之區域。另一方面，所謂管(T)之上部係指自管(T)之上端起朝向下方未達高度h/2之區域，例如係指自管(T)之上端起朝向下方高度h/3以下之區域。 In this specification, the lower part of the tube (T) means an area where the height of the tube (T) as a whole is h, and the area from the lower end of the tube (T) does not reach the height h/2, for example, The area from the lower end of the tube (T) to the upper height h/3 or less. On the other hand, the upper part of the tube (T) means an area that does not reach a height h/2 from the upper end of the tube (T), and is, for example, a height h/3 or less from the upper end of the tube (T) toward the lower side. The area.

管(T)之下部(管(T)之至少下部)亦可配置於槽(例如第1槽)之內部。或者，亦可為管(T)之下部與槽(例如第1槽)之內部藉由流路而連接。針對該等情形時之2個例之裝置(第1及第2例之裝置)於後描述。對管(T)並無特別限定，只要為作為管而發揮功能者即可。管(T)亦可為將槽之一部分區隔而成為管狀者。即，管(T)可與槽成為一體，亦可不成為一體。管(T)之剖面形狀並無特別限定。一例之管(T)作為氫氣釋放機構及聚水器而發揮功能。亦可使管(T)為較粗之管，例如 使其較第1流路粗，使得通過第1流路到達管(T)之水容易蓄積於管(T)之下方。藉由使管(T)變粗，位於管(T)內之上部之水容易與位於管(T)內之下部之氣體置換而於管(T)內落下。 The lower portion of the tube (T) (at least the lower portion of the tube (T)) may also be disposed inside the groove (for example, the first groove). Alternatively, the inside of the tube (T) and the inside of the groove (for example, the first groove) may be connected by a flow path. The device (the devices of the first and second examples) for the two cases in the case of the above description will be described later. The tube (T) is not particularly limited as long as it functions as a tube. The tube (T) may also be a tubular member by dividing a portion of the groove. That is, the tube (T) may be integral with the groove or may not be integrated. The cross-sectional shape of the tube (T) is not particularly limited. An example of the tube (T) functions as a hydrogen gas release mechanism and a water trap. It is also possible to make the tube (T) a thicker tube, for example It is made thicker than the first flow path, so that the water that has passed through the first flow path to the tube (T) is easily accumulated below the tube (T). By thickening the tube (T), the water located in the upper portion of the tube (T) is easily displaced with the gas located below the tube (T) and falls inside the tube (T).

於本新型之第1例之裝置中，亦可將第1流路與氫氣流路一同連接於管(T)之上部。於該情形時，能夠使自第1流路流來之水於管(T)內落下，實質上僅使氫氣流至氫氣流路。即，能夠將管(T)用作聚水器。由於管(T)之開口部(O)與槽連接，故而能夠將於管(T)內落下之水用於電解。根據該構成，能夠效率良好地利用水。再者，由於在陽極產生氧化分解，故而能夠對與陽極接觸之液體(水或電解液等)進行殺菌。 In the apparatus of the first example of the present invention, the first flow path may be connected to the upper portion of the tube (T) together with the hydrogen flow path. In this case, the water flowing from the first flow path can be dropped in the tube (T), and substantially only the hydrogen gas flows to the hydrogen gas flow path. That is, the tube (T) can be used as a water trap. Since the opening (O) of the tube (T) is connected to the groove, the water that can be dropped in the tube (T) can be used for electrolysis. According to this configuration, water can be utilized efficiently. Further, since oxidative decomposition occurs at the anode, the liquid (water, electrolyte, or the like) that is in contact with the anode can be sterilized.

於本新型之第2例之裝置中，亦可將氫氣流路連接於管(T)之上部，進一步地，亦可於較氫氣流路與管(T)之連接部更下方之位置將第1流路連接於管(T)。於該情形時，能夠使自第1流路流來之水蓄積於管(T)之下部，實質上僅氫氣流至氫氣流路。即，能夠將管(T)用作聚水器。由於管(T)之開口部(O)與槽連接，故而能夠將於管(T)內落下之水用於電解。於該情形時，第1流路亦可連接於管(T)之下部。 In the apparatus of the second example of the present invention, the hydrogen flow path may be connected to the upper portion of the tube (T), or further, at a position lower than the connection portion between the hydrogen flow path and the tube (T). 1 flow path is connected to the tube (T). In this case, water flowing from the first flow path can be accumulated in the lower portion of the tube (T), and substantially only hydrogen gas flows to the hydrogen gas flow path. That is, the tube (T) can be used as a water trap. Since the opening (O) of the tube (T) is connected to the groove, the water that can be dropped in the tube (T) can be used for electrolysis. In this case, the first flow path may also be connected to the lower portion of the tube (T).

亦可使氫氣流路之截面積(內部空間之截面積)大於第1流路之截面積，使得僅氣體流至與管(T)連接之氫氣流路。 It is also possible to make the cross-sectional area of the hydrogen flow path (the cross-sectional area of the internal space) larger than the cross-sectional area of the first flow path, so that only the gas flows to the hydrogen flow path connected to the tube (T).

於本新型之裝置中，亦可為氫氣釋放機構包含配置於槽(例如第1槽)內且於下部具有開口部(O)之管(T)，而且於該管(T)(例如管(T)之上部)連接有氫氣流路。於該情形時，亦能以氫氣流路中之氫氣之流動不受抑制(例如阻斷)時通過第1流路流動之氫氣通過管(T)之開口部(O)流經管(T)之方式配置管(T)與第1流路。於該裝置中，氫氣 流路中之氫氣之流動受到抑制時，氫氣不流經管(T)內，管(T)內由氫氣充滿。其結果為，氫氣不流經管(T)內而流至槽內。 In the device of the present invention, the hydrogen release mechanism may include a tube (T) disposed in the groove (for example, the first groove) and having an opening (O) in the lower portion, and the tube (T) (for example, a tube ( The upper part of T) is connected to a hydrogen flow path. In this case, the hydrogen flowing through the first flow path can also flow through the opening (O) of the tube (T) through the tube (T) when the flow of hydrogen in the hydrogen flow path is not inhibited (for example, blocked). The configuration pipe (T) and the first flow path are arranged. In the device, hydrogen When the flow of hydrogen in the flow path is suppressed, hydrogen does not flow through the tube (T), and the tube (T) is filled with hydrogen. As a result, hydrogen does not flow through the tube (T) and flows into the tank.

通常，管(T)之至少下部浸於槽內之水性液體。因此，自第1流路之開口部(端部)釋放之氫氣於水性液體中成為氣泡而於管(T)中上升。此時，亦能以氫氣之氣泡成為容易目視之大小之方式調整第1流路之開口部的截面積。例如第1流路之開口部之截面積亦可處於1~20mm²之範圍。 Typically, at least the lower portion of the tube (T) is immersed in the aqueous liquid in the tank. Therefore, the hydrogen gas released from the opening (end portion) of the first flow path becomes a bubble in the aqueous liquid and rises in the tube (T). At this time, the cross-sectional area of the opening of the first flow path can be adjusted so that the bubble of hydrogen gas can be easily visually recognized. For example, the cross-sectional area of the opening of the first flow path may be in the range of 1 to 20 mm ² .

開口部(O)亦可配置於較槽(例如第1槽)內之液面(水位)所設定之下限更下方。以下，有時將所設定之下限之液面(水位)稱為「下限水位」。藉由將開口部(O)配置於較下限水位更靠下，能夠抑制通常驅動時氫氣自開口部(O)流至槽內。 The opening (O) may be disposed below the lower limit set by the liquid level (water level) in the groove (for example, the first groove). Hereinafter, the liquid level (water level) of the set lower limit may be referred to as a "lower limit water level". By disposing the opening (O) below the lower limit water level, it is possible to suppress the flow of hydrogen gas from the opening (O) into the groove during normal driving.

本新型之裝置亦可進一步地包含檢測槽(例如第1槽)內之液面(水位)已到達上述下限水位之水位感測器。並且，檢測出槽內之液面已到達下限水位時，可停止電解，亦可發出向使用者通知液面已到達下限水位之顯示或聲音。 The apparatus of the present invention may further include a water level sensor that detects that the liquid level (water level) in the tank (e.g., the first tank) has reached the lower limit water level. Further, when it is detected that the liquid level in the tank has reached the lower limit water level, the electrolysis may be stopped, and a display or sound indicating to the user that the liquid level has reached the lower limit water level may be issued.

於本新型之裝置(Da)中，亦可將第1槽(例如水箱)與陽極室直接連接。於該情形時，亦可透過形成於第1槽之側壁之貫通孔及形成於陽極室之側壁之貫通孔將第1槽的內部與陽極室的內部連接。於本新型之裝置中，亦可將電解槽配置於第1槽內。 In the device (Da) of the present invention, the first tank (for example, a water tank) may be directly connected to the anode chamber. In this case, the inside of the first groove may be connected to the inside of the anode chamber through the through hole formed in the side wall of the first groove and the through hole formed in the side wall of the anode chamber. In the apparatus of the present invention, the electrolytic cell may be disposed in the first tank.

本新型之裝置亦可包含用以控制電解之控制器。控制器亦可與已知之控制器相同，包含演算處理裝置及記憶裝置。於記憶裝置儲存用以控制本新型之裝置之程式。本新型之裝置亦可包含電源、各種感測器(水 位感測器等)、開關、顯示裝置、輸入裝置、閥(valve)等。並且，其等亦可與控制器連接。只要能夠進行電解，則對電源並無特別限定，亦可為將自插座輸出之交流轉換為直流之AC-DC轉換器。 The device of the present invention may also include a controller for controlling electrolysis. The controller can also be the same as the known controller, including the arithmetic processing device and the memory device. The memory device stores a program for controlling the device of the present invention. The device of the present invention can also include a power source and various sensors (water Position sensor, etc.), switch, display device, input device, valve, etc. And, they can also be connected to the controller. The power source is not particularly limited as long as it can perform electrolysis, and may be an AC-DC converter that converts an alternating current output from a socket into a direct current.

本新型之裝置亦可具備監控使用次數或使用時間(電解之時間)之機構。於該情形時，控制器亦可累計使用次數或使用時間，並基於其結果向使用者通知維護時期。 The device of the present invention can also have a mechanism for monitoring the number of uses or the time of use (time of electrolysis). In this case, the controller may also accumulate the number of uses or the time of use, and notify the user of the maintenance period based on the result.

本新型之裝置亦可包含串聯連接之複數個電解單元。於該情形時，本新型之裝置亦可包含複數個齊納二極體。並且，亦可分別於複數個電解單元並聯連接齊納二極體。1個氫氣生成裝置中所包含之電解單元之數量亦可為2個、3個或其以上。齊納二極體係於電流不流至電解單元時使電流於齊納二極體流動之方式進行選擇及配置。 The apparatus of the present invention may also comprise a plurality of electrolytic units connected in series. In this case, the device of the present invention may also comprise a plurality of Zener diodes. Furthermore, the Zener diodes may be connected in parallel to the plurality of electrolytic cells. The number of electrolytic units included in one hydrogen generating device may be two, three or more. The Zener diode system selects and configures the current flow in the Zener diode when current does not flow to the electrolytic cell.

本新型之裝置亦可具有能夠目視氫氣之氣泡流動之部分之至少一部分的構成。例如，能夠自裝置之外部目視第1流路之內部之至少一部分，亦能夠自裝置之外部目視管(T)之內部之至少一部分，還能夠自裝置之外部目視槽之內部之至少一部分。該等構成可藉由以透明之材料(透明之玻璃或樹脂等)形成所要目視之部分而實現。藉由能夠目視氫氣之氣泡流動之部分，而能夠目視確認氫氣之生成狀況。 The apparatus of the present invention may also have a configuration capable of visually observing at least a portion of a portion of the flow of hydrogen gas bubbles. For example, at least a portion of the interior of the first flow path can be visually viewed from outside the device, and at least a portion of the interior of the tube (T) can be viewed from outside the device, and at least a portion of the interior of the groove can be visually viewed from outside the device. Such a configuration can be realized by forming a portion to be visually observed with a transparent material (transparent glass or resin, etc.). The formation of hydrogen gas can be visually confirmed by visually observing the portion of the bubble flow of hydrogen gas.

亦可於裝置(Da)之第1槽內配置吸收並維持水分之保濕構件。於長時間不使用等情形時，存在第1槽內之水幾乎消失之情況。若第1槽內之濕度下降而電解槽之內部乾燥，則存在電解槽之性能下降之情況。藉由將保濕構件配置於第1槽內，能夠抑制電解槽內部之乾燥。對保濕構件並無特別限定。於保濕構件之例中，包括多孔質體(海棉等)。 A moisturizing member that absorbs and retains moisture may be disposed in the first tank of the device (Da). When it is not used for a long period of time, there is a case where the water in the first tank almost disappears. When the humidity in the first tank is lowered and the inside of the electrolytic cell is dried, the performance of the electrolytic cell may be degraded. By arranging the moisturizing member in the first tank, drying inside the electrolytic cell can be suppressed. The moisturizing member is not particularly limited. Examples of the moisturizing member include a porous body (such as sponge).

亦可於氫氣流路安裝用以吸入氫氣之氣體吸入器具。於氣體吸入器具之例中，包括鼻插管或氣體吸入用之頸套(neck set)。氣體吸入器具亦可為形成氫氣濃度高於大氣之空間之器具。例如，氣體吸入器具亦可為用以形成氫氣濃度高於大氣之空間之外罩。藉由使用此種外罩，可不將氣體吸入器具戴在面部而吸入氫氣。藉由使用此種外罩，能夠容易使動物等(例如寵物等小動物)吸入氫氣。 A gas inhalation device for inhaling hydrogen gas may also be installed in the hydrogen flow path. In the case of a gas inhalation device, a nasal cannula or a neck set for gas inhalation is included. The gas inhalation device may also be an instrument that forms a space in which the hydrogen concentration is higher than the atmosphere. For example, the gas inhalation device may also be a cover for forming a space in which the hydrogen concentration is higher than the atmosphere. By using such a cover, it is possible to suck hydrogen gas without wearing the gas inhalation device on the face. By using such a cover, it is possible to easily inhale hydrogen gas from an animal or the like (for example, a small animal such as a pet).

作為外罩，可使用不密閉之外罩(即，向大氣開放之外罩)。較佳為以外罩中之氫氣濃度未達4體積%(例如3體積%以下)之方式構成外罩。 As the outer cover, an outer cover that is not sealed (that is, a cover that opens to the atmosphere) can be used. It is preferable that the outer cover is configured such that the hydrogen concentration in the outer cover is less than 4% by volume (for example, 3% by volume or less).

為了不於外罩內產生靜電放電，亦可藉由將導電體配置於外罩之內側而抑制靜電之儲存。又，為了不產生靜電放電，亦可藉由使外罩內部為高濕而抑制靜電放電。例如，亦可將外罩內部之相對濕度設為60%以上(例如65%以上或70%以上)。 In order to prevent electrostatic discharge from occurring in the outer cover, it is also possible to suppress the storage of static electricity by disposing the electric conductor inside the outer cover. Further, in order to prevent electrostatic discharge from occurring, electrostatic discharge can be suppressed by making the inside of the cover high in humidity. For example, the relative humidity inside the cover may be set to 60% or more (for example, 65% or more or 70% or more).

亦可於氫氣流路配置去除水蒸氣之凝氣器、或截留液體之集液器。對集液器及凝氣器並無特別限定，可使用已知者。藉由使用凝氣器能夠抑制氫氣流路中之冷凝。 It is also possible to arrange a condenser for removing water vapor or a liquid trap for trapping the liquid in the hydrogen flow path. The liquid collector and the air condenser are not particularly limited, and known ones can be used. Condensation in the hydrogen flow path can be suppressed by using a condenser.

於連接於本新型之裝置之氫氣流路為具有柔軟性之管的情形時，存在管被折彎時氫氣之流動受到抑制之情況。較佳為即便為此種情況亦不完全阻斷氫氣之流動。因此，亦可於管內配置較細之線(釣線等樹脂製之線等)。或者，亦可使用於內部形成有凹凸之管。 In the case where the hydrogen flow path connected to the apparatus of the present invention is a flexible tube, there is a case where the flow of hydrogen gas is suppressed when the tube is bent. It is preferred that even in this case, the flow of hydrogen gas is not completely blocked. Therefore, it is also possible to arrange thinner wires (resin made of resin, etc.) in the tube. Alternatively, it may be used for a tube having irregularities formed therein.

(氫氣吸入裝置) (hydrogen inhalation device)

本新型之氫氣生成裝置可用於氫氣吸入裝置。本新型之氫氣吸入裝置 包含本新型之氫氣生成裝置、及連接於第1流路之下游(氫氣流路之下游)之氣體吸入器具。於氣體吸入器具之例中，包括上述氣體吸入器具。 The novel hydrogen generating device can be used for a hydrogen suction device. The novel hydrogen inhalation device The present invention includes a hydrogen generating device of the present invention and a gas suction device connected downstream of the first flow path (downstream of the hydrogen flow path). In the case of a gas inhalation device, the above gas inhalation device is included.

以下，一面參照圖式，一面對本新型之裝置進行說明。另外，於以下之說明中，有時對相同之部分標註相同之符號並省略重複之說明。只要能獲得本新型之效果，則以下之實施形態之裝置之構成可替換為上述構成。以下之實施形態之裝置之構成中之並非發揮本新型之效果所必需之構成亦可省略。對1個實施形態之裝置說明之事項只要不違背其他實施形態之裝置之構成，則亦可應用於其他實施形態之裝置。因此，關於在1個實施形態中說明之事項有時於其他實施形態之說明中省略說明。 Hereinafter, the device of the present invention will be described with reference to the drawings. In the following description, the same components are denoted by the same reference numerals, and the description thereof will not be repeated. As long as the effects of the present invention can be obtained, the configuration of the apparatus of the following embodiment can be replaced with the above configuration. The configuration of the apparatus of the following embodiment that is not essential to the effects of the present invention may be omitted. The matters described for the device of one embodiment can be applied to devices of other embodiments as long as they do not contradict the configuration of the device of the other embodiment. Therefore, the matters described in the one embodiment may be omitted in the description of the other embodiments.

(實施形態1) (Embodiment 1)

於實施形態1中，對裝置(Da)之一例進行說明。將實施形態1之氫氣生成裝置100之構成示意性地示於圖1。裝置100包含殼體11、直流電源(AC-DC轉換器)12、電解槽20、水箱(第1槽)30、第1流路41、第2流路42、第3流路43、氫氣流路44、及管50(管(T))。另外，裝置100包含控制器，但於圖1中將圖示省略。該控制器連接於裝置內之機器(水位感測器61、直流電源12等)。 In the first embodiment, an example of the device (Da) will be described. The configuration of the hydrogen gas generator 100 of the first embodiment is schematically shown in Fig. 1 . The device 100 includes a casing 11, a DC power source (AC-DC converter) 12, an electrolytic cell 20, a water tank (first tank) 30, a first flow path 41, a second flow path 42, a third flow path 43, and a hydrogen flow. Road 44, and tube 50 (tube (T)). In addition, the device 100 includes a controller, but is omitted from illustration in FIG. The controller is connected to a machine within the device (water level sensor 61, DC power source 12, etc.).

電解槽20為燃料電池槽，包含陰極室21、陽極室22、及由其等所包圍之薄膜電極組(電解單元)23。薄膜電極組23包含陽極、陰極、及高分子電解質層(例如陽離子交換膜等離子交換膜)，但省略其等之圖示。由直流電源12對薄膜電極組23之2個電極間施加直流電壓。薄膜電極組23之陰極係由陰極室21所包圍，薄膜電極組23之陽極係由陽極室22所包圍。一例之電解槽20之電解槽係由薄膜電極組23分為陰極室21與陽 極室22之兩個部分。 The electrolytic cell 20 is a fuel cell tank, and includes a cathode chamber 21, an anode chamber 22, and a thin film electrode group (electrolytic unit) 23 surrounded by the electrolytic cell. The thin film electrode group 23 includes an anode, a cathode, and a polymer electrolyte layer (for example, an ion exchange membrane such as a cation exchange membrane), but the illustration thereof is omitted. A DC voltage is applied between the two electrodes of the thin film electrode group 23 by the DC power source 12. The cathode of the membrane electrode group 23 is surrounded by the cathode chamber 21, and the anode of the membrane electrode group 23 is surrounded by the anode chamber 22. The electrolytic cell of the electrolytic cell 20 is divided into the cathode chamber 21 and the anode by the thin film electrode group 23. Two parts of the pole chamber 22.

於水箱30之上方連接有將殼體11之外部與水箱30連結之水供給路徑31。水箱30與水供給路徑31之連接部作為用以將水箱30內之氣體向裝置之外部釋放之氣體釋放口30h而發揮功能。即，水供給路徑31作為用以釋放氣體之氣體釋放路徑而發揮功能。另外，亦可與水供給路徑31分開設置氣體釋放口(氣體釋放路徑)。於水箱30配置有水位感測器61。藉由水位感測器61檢測水箱30內之水W已達到下限水位WL。如圖1所示般，亦可使水箱30之一部分30a變細，由流路將該一部分30a與電解槽20連接。 A water supply path 31 that connects the outside of the casing 11 to the water tank 30 is connected above the water tank 30. The connection portion between the water tank 30 and the water supply path 31 functions as a gas release port 30h for releasing the gas in the water tank 30 to the outside of the device. That is, the water supply path 31 functions as a gas release path for releasing the gas. Further, a gas release port (gas release path) may be provided separately from the water supply path 31. A water level sensor 61 is disposed in the water tank 30. The water level sensor Detector 61 detects that the water W in the water tank 30 has reached the lower limit water level WL. As shown in Fig. 1, one portion 30a of the water tank 30 may be thinned, and the portion 30a may be connected to the electrolytic cell 20 by a flow path.

第1流路41之一端(第1端部41a)連接於陰極室21之下部。第1流路41之另一端(第2端部41b)連接於管50。亦可使第1流路41之至少一部分及殼體11之至少一部分透明，而能夠自裝置100之外部目視第1流路41內。以此方式而能夠目視確認於第1流路41中移動之氫氣之氣泡。如圖1所示般，亦可使第1流路41之一部分41c變粗且變透明。然後，亦能夠自裝置100之外部目視該一部分41c。 One end (first end portion 41a) of the first flow path 41 is connected to the lower portion of the cathode chamber 21. The other end (second end portion 41b) of the first flow path 41 is connected to the tube 50. At least a part of the first flow path 41 and at least a part of the casing 11 may be made transparent, and the inside of the first flow path 41 may be visually observed from the outside of the apparatus 100. In this way, the bubbles of the hydrogen gas moving in the first flow path 41 can be visually confirmed. As shown in Fig. 1, one portion 41c of the first flow path 41 may be made thicker and more transparent. Then, the portion 41c can also be visually viewed from outside the device 100.

第2流路42係以將陽極室22之下部與水箱30連結之方式連接於兩者。第3流路43係以將陽極室22之上部與水箱30連結之方式連接於兩者。水箱(第1槽)30保持被供給至陽極(陽極室22)之水性液體。 The second flow path 42 is connected to both of the lower portion of the anode chamber 22 and the water tank 30. The third flow path 43 is connected to both of the upper portion of the anode chamber 22 and the water tank 30. The water tank (first tank) 30 holds the aqueous liquid supplied to the anode (anode chamber 22).

於管50之上端連接有第1流路41之下游側之端部41b及氫氣流路44之上游側之一端(第1端部44a)。於其等之結合部分，亦可如圖1所示般將其等配置為Y字狀。管50中之至少下部配置於水箱30內。管50之下方之開口部50a配置於較下限水位WL更下方，且作為氫氣之流路 被阻斷時之氫氣之排出口而發揮功能。開口部50a係以自開口部50a釋放之氫氣能夠到達氣體釋放口30h之方式配置。即，氫氣釋放機構(管50)於氫氣流路中之氫氣之流動受到抑制時，使氫氣以到達氣體釋放口30h之方式流至槽(水箱30)內。 An end portion 41b on the downstream side of the first flow path 41 and one end (first end portion 44a) on the upstream side of the hydrogen gas flow path 44 are connected to the upper end of the tube 50. The combination of the components may be arranged in a Y shape as shown in FIG. At least a lower portion of the tube 50 is disposed in the water tank 30. The opening 50a below the tube 50 is disposed below the lower limit water level WL and serves as a hydrogen flow path. It functions as a hydrogen discharge port when it is blocked. The opening 50a is disposed such that hydrogen gas released from the opening 50a can reach the gas release port 30h. That is, when the flow of hydrogen gas in the hydrogen gas flow path is suppressed by the hydrogen gas releasing means (tube 50), the hydrogen gas flows into the tank (water tank 30) so as to reach the gas discharge port 30h.

氫氣流路44之另一端(第2端部44b)連接於連接件45。連接件45係能夠連接氫氣流路201之連接件。氫氣流路201***至容器200內。容器200具有蓋200a，限制內部空間與外部之氣體之移動。亦可進一步地於蓋200a連接氫氣流路202。 The other end (second end portion 44b) of the hydrogen flow path 44 is connected to the connecting member 45. The connecting member 45 is capable of connecting the connecting member of the hydrogen flow path 201. The hydrogen flow path 201 is inserted into the container 200. The container 200 has a cover 200a that restricts the movement of the internal space and the outside gas. The hydrogen gas flow path 202 may be further connected to the lid 200a.

進行水之電解時，首先，自水供給路徑31向水箱30供給水(去離子水)。供給至水箱30之水W經由流路42及43而供給至陽極室22。接著，利用直流電源12對電解槽20之2個電極間施加直流電壓，將水電解。藉由該電解，於陰極生成氫氣，於陽極生成氧氣。於陽極室22生成之氧氣通過第3流路43流向水箱30，進一步地通過氣體釋放口30h及水供給路徑31向裝置之外部釋放。氧氣通過第3流路43時，陽極室22內之水亦流向水箱30側。其結果為，產生於水箱30與陽極室22之間循環之水流。亦可使第2流路42較第3流路43粗，以使水易於自水箱30向陽極室22流動。通常，裝置係以自流路43釋放之氧氣不會通過開口部50a流向氫氣流路44之方式構成。例如，亦可不在流路43與水箱30之連接部之正上方配置開口部50a。 When electrolysis of water is performed, first, water (deionized water) is supplied from the water supply path 31 to the water tank 30. The water W supplied to the water tank 30 is supplied to the anode chamber 22 via the flow paths 42 and 43. Next, a DC voltage is applied between the two electrodes of the electrolytic cell 20 by the DC power source 12 to electrolyze the water. By this electrolysis, hydrogen gas is generated at the cathode, and oxygen is generated at the anode. The oxygen generated in the anode chamber 22 flows through the third flow path 43 to the water tank 30, and is further released to the outside of the apparatus through the gas discharge port 30h and the water supply path 31. When oxygen passes through the third flow path 43, the water in the anode chamber 22 also flows toward the water tank 30 side. As a result, a flow of water that circulates between the water tank 30 and the anode chamber 22 occurs. The second flow path 42 may be made thicker than the third flow path 43 so that water can easily flow from the water tank 30 to the anode chamber 22. Usually, the apparatus is configured such that oxygen released from the flow path 43 does not flow through the opening portion 50a to the hydrogen gas flow path 44. For example, the opening 50a may not be disposed directly above the connection portion between the flow path 43 and the water tank 30.

於陰極室21生成之氫氣通過第1流路41流向管50之上部。供給至陽極室22之水之一部分通過薄膜電極組23流至陰極室21。於較佳之一例中，流至陰極室21之水伴隨氫氣之移動流經第1流路41，到達管50。 例如，藉由使第1流路41變細，能夠使水與氫氣一同移動。 The hydrogen gas generated in the cathode chamber 21 flows through the first flow path 41 to the upper portion of the tube 50. A portion of the water supplied to the anode chamber 22 flows through the membrane electrode group 23 to the cathode chamber 21. In a preferred embodiment, the water flowing to the cathode chamber 21 flows through the first flow path 41 along with the movement of hydrogen gas to reach the tube 50. For example, by making the first flow path 41 thin, water and hydrogen can be moved together.

已到達至管50之水沿管50落下，返回至水箱30。其結果為，於第1流路41之下游之氫氣流路44實質上僅氫氣流動。如此，管50作為聚水器而發揮功能。此處，不論水箱30內之水位，均必須使水不會流至氫氣流路44。因此，通常，於高於水箱30內之最高水位之位置連接氫氣流路44與管50。另外，亦可使管50之整體變粗，或使連接有第1流路41之部分變粗，以使管作為聚水器而容易發揮功能。 The water that has reached the tube 50 falls along the tube 50 and returns to the water tank 30. As a result, the hydrogen gas flow path 44 downstream of the first flow path 41 flows substantially only hydrogen gas. In this manner, the tube 50 functions as a water trap. Here, regardless of the water level in the water tank 30, it is necessary to prevent water from flowing to the hydrogen flow path 44. Therefore, in general, the hydrogen flow path 44 and the tube 50 are connected at a position higher than the highest water level in the water tank 30. Further, the entire tube 50 may be thickened or the portion to which the first flow path 41 is connected may be thickened so that the tube functions as a water trap.

已流至氫氣流路44之氫氣通過氫氣流路201被吹入至容器200內之液體210內。液體210係例如為飲用液體(水等)。被吹入有氫氣之液體可用作溶存氫濃度較高之液體(例如氫水)。未溶解於液體210之氫氣通過氫氣流路202流向容器200之外部。該氫氣可用作吸入用之氫氣。於該情形時，亦可於氫氣流路202之端部連接吸入用之器具(例如鼻插管等)。 The hydrogen that has flowed to the hydrogen flow path 44 is blown into the liquid 210 in the vessel 200 through the hydrogen flow path 201. The liquid 210 is, for example, a drinking liquid (water or the like). The liquid to which hydrogen gas is blown can be used as a liquid having a high concentration of dissolved hydrogen (for example, hydrogen water). Hydrogen that is not dissolved in the liquid 210 flows to the outside of the vessel 200 through the hydrogen flow path 202. This hydrogen gas can be used as hydrogen for inhalation. In this case, an apparatus for inhalation (for example, a nasal cannula or the like) may be connected to the end of the hydrogen flow path 202.

於開始生成氫氣之前(管50內之內壓上升之前)，管50內之水位(水之表面之位置)與水箱30內之水位相同。即，管50內之中的自開口部50a至水箱30內之水面之位置被充滿水。另一方面，生成氫氣時，如圖1所示，管50內之水位下降之程度和容器200內之水位與氫氣流路201之前端(開放端)之高低差L1相同。另外，為了便於理解，於圖1中，對管50內之水標註與水箱30內之水W之影線不同的影線。又，對流路內之水及電解槽20內之水省略影線。 Before the start of the formation of hydrogen (before the internal pressure rises in the tube 50), the water level in the tube 50 (the position of the surface of the water) is the same as the water level in the water tank 30. That is, the position of the water surface from the opening 50a to the water tank 30 in the inside of the tube 50 is filled with water. On the other hand, when hydrogen gas is generated, as shown in Fig. 1, the degree of water level drop in the tube 50 is the same as the height difference L1 between the water level in the container 200 and the front end (open end) of the hydrogen gas flow path 201. In addition, in order to facilitate understanding, in FIG. 1, the water in the tube 50 is marked with a hatching different from the hatching of the water W in the water tank 30. Further, the water in the flow path and the water in the electrolytic cell 20 are omitted from the hatching.

通常，下限水位WL係以下限水位WL與開口部(氣體排出口)50a之間的高低差L2較容器200內之水位與氫氣流路201之開放端之間的高低差L1之最大值大的方式進行設定。於該情形時，通常驅動時，管 50內之水位位於較開口部50a更上方。亦可將開口部50a配置於水箱30之較細之部分(例如一部分30a)，以將開口部50a儘可能地配置於下方。但是，較佳為自開口部50a釋放之氫氣不會流至第2流路42。 Usually, the lower limit water level WL is greater than the maximum value L1 between the water level WL and the opening (gas discharge port) 50a of the lower limit water level WL, which is larger than the maximum value of the height difference L1 between the water level in the container 200 and the open end of the hydrogen flow path 201. The way to set. In this case, usually when driving, the tube The water level in 50 is located above the opening 50a. The opening 50a may be disposed in a thin portion (for example, a portion 30a) of the water tank 30 so that the opening 50a is disposed as far as possible below. However, it is preferable that the hydrogen gas released from the opening portion 50a does not flow to the second flow path 42.

再者，由水位感測器61檢測出水箱30內之水位已達到下限水位WL時，亦可停止水之電解。又，亦可設置開口部50a於水箱30內之水位已達到下限水位WL時，因壓力之關係而不會自氫氣流路201之前端釋放氫氣之氣泡之位置。於該情形時，可省略水位感測器61。於任一情形時，當水箱30內之水位已達到下限水位WL時，均不會自氫氣流路201之前端釋放氫氣之氣泡。因此，使用者能夠利用是否自氫氣流路201之前端釋放氫氣作為補充水之標準。 Furthermore, when the water level sensor 61 detects that the water level in the water tank 30 has reached the lower limit water level WL, the electrolysis of the water can also be stopped. Further, when the water level in the water tank 30 reaches the lower limit water level WL, the opening portion 50a may not be provided with a position where the hydrogen gas bubbles are released from the front end of the hydrogen gas flow path 201 due to the pressure. In this case, the water level sensor 61 can be omitted. In either case, when the water level in the water tank 30 has reached the lower limit water level WL, no gas bubbles are released from the front end of the hydrogen flow path 201. Therefore, the user can utilize whether or not the hydrogen gas is released from the front end of the hydrogen flow path 201 as a standard for the supplementary water.

此處，對氫氣流路201因某種原因意外被折彎之情形進行研究。於該情形時，過度抑制(阻斷)氫氣流路201中之氫氣之流動。另一方面，於繼續在陰極室21生成氫氣之情形時，第1流路41及其下游(管50及氫氣流路44)中之內壓提高。其結果為，管50內之水位下降直至到達管50之開口部50a為止。並且，生成之氫氣自開口部50a被排出至水箱30內。排出之氫氣通過氣體釋放口30h及水供給路徑31向裝置之外部被釋放。如上所述，管50作為氫氣釋放機構而發揮功能。即，管50於氫氣流路中之氫氣之流動受到抑制時使氫氣迂迴而釋放。藉由使用此種氫氣釋放機構，即便於氫氣流路被阻斷時，亦可不進行電性控制而簡單地將氫氣向裝置外部釋放。 Here, the hydrogen flow path 201 is accidentally bent for some reason. In this case, the flow of hydrogen in the hydrogen flow path 201 is excessively suppressed (blocked). On the other hand, when hydrogen gas is continuously generated in the cathode chamber 21, the internal pressure in the first flow path 41 and its downstream (tube 50 and hydrogen gas flow path 44) is increased. As a result, the water level in the tube 50 drops until it reaches the opening 50a of the tube 50. Then, the generated hydrogen gas is discharged into the water tank 30 from the opening 50a. The discharged hydrogen gas is released to the outside of the apparatus through the gas discharge port 30h and the water supply path 31. As described above, the tube 50 functions as a hydrogen gas release mechanism. That is, when the flow of hydrogen in the hydrogen gas flow path of the tube 50 is suppressed, the hydrogen gas is decanted and released. By using such a hydrogen gas release mechanism, even when the hydrogen gas flow path is blocked, hydrogen gas can be easily released to the outside of the device without performing electrical control.

本新型之裝置亦可具備用以檢測氫氣流路中之氣流受到不當抑制(例如阻斷)的感測器。並且，於檢測出氫氣流路受到不當抑制之 情形時，亦可停止水之電解。例如，亦可使用用以檢測管50內之水位已到達至既定位置之感測器。於氫氣流路中氫氣流被阻斷時，管50內之水位大幅下降。又，氧氣之釋放路徑(例如水供給路徑31)被阻斷時，管50內之水位大幅上升。藉由利用感測器檢測此種狀況並停止電解，能夠防止於非通常驅動之狀態下繼續電解。藉由一同使用此種感測器與上述氫氣釋放機構，即便於感測器未順利發揮功能之情形時，亦能夠將氫氣簡單地向裝置外部釋放。另外，亦可於管50內配置浮控開關(float switch)作為感測器，控制氣體或液體之流動。 The apparatus of the present invention may also be provided with a sensor for detecting improper suppression (e.g., blocking) of the gas flow in the hydrogen flow path. Moreover, it is detected that the hydrogen flow path is improperly suppressed. In case of circumstances, the electrolysis of water can also be stopped. For example, a sensor for detecting that the water level in the tube 50 has reached a predetermined position may also be used. When the hydrogen flow is blocked in the hydrogen flow path, the water level in the tube 50 is greatly reduced. Further, when the oxygen release path (for example, the water supply path 31) is blocked, the water level in the tube 50 rises significantly. By detecting this condition with a sensor and stopping the electrolysis, it is possible to prevent the electrolysis from continuing in an abnormal driving state. By using such a sensor together with the above-described hydrogen gas releasing mechanism, hydrogen gas can be easily released to the outside of the device even when the sensor does not function smoothly. In addition, a float switch may be disposed in the tube 50 as a sensor to control the flow of gas or liquid.

於本新型之裝置中，亦可將塑膠瓶等容器直接連接於水箱，以便容易向水箱供給水。於該情形時，與圖1所示之構成不同，較佳為單獨設置氣體釋放口。於圖2A~圖2C中示出能夠將寶特瓶等容器直接連接於水箱之情形時之構成的一例。另外，於圖2A~圖2C中，僅圖示相應之部分。 In the device of the present invention, a container such as a plastic bottle may be directly connected to the water tank to easily supply water to the water tank. In this case, unlike the configuration shown in Fig. 1, it is preferable to separately provide a gas discharge port. An example of a configuration in the case where a container such as a PET bottle can be directly connected to the water tank is shown in FIGS. 2A to 2C. In addition, in FIGS. 2A to 2C, only the corresponding portions are illustrated.

於圖2A之裝置中，容器70內之水被供給至水箱30。於該情形時，水箱30具有用以連接容器70之承接部33。又，於水箱30連接用以將水箱內之氣體向裝置之外部釋放之氣體釋放路徑32。氣體釋放路徑32與水箱30之連接部成為氣體釋放口30h。 In the apparatus of Fig. 2A, water in the container 70 is supplied to the water tank 30. In this case, the water tank 30 has a receiving portion 33 for connecting the container 70. Further, a gas release path 32 for releasing the gas in the water tank to the outside of the apparatus is connected to the water tank 30. The connection portion between the gas release path 32 and the water tank 30 serves as a gas release port 30h.

承接部33具有用以保持容器70之連接部71之形狀。承接部33包含銷33a、支承銷33a之板33b、及承接連接部71之承接台33c。於板33b形成有供水流動之貫通孔。連接部71包含筒狀部71a、與配置於筒狀部71a內之環狀之浮體71b及球狀構件71c。球狀構件71c作為閥而發揮功能。 The receiving portion 33 has a shape for holding the connecting portion 71 of the container 70. The receiving portion 33 includes a pin 33a, a plate 33b of the support pin 33a, and a receiving base 33c that receives the connecting portion 71. A through hole for the water supply flow is formed in the plate 33b. The connecting portion 71 includes a tubular portion 71a, an annular floating body 71b disposed in the tubular portion 71a, and a spherical member 71c. The spherical member 71c functions as a valve.

若於水箱30內之水不足之狀態下將裝有水之容器70安裝於承接部33，則如圖2B所示，浮體71b及球狀構件71c下降，不會堵塞筒狀部71a。因此，自筒狀部71a向水箱30供給水。若隨著水之供給，水箱30之水位上升，則如圖2C所示，浮體71b上升，藉此球狀構件71c亦上升。其結果為，由球狀構件71c堵塞筒狀部71a，水之供給停止。因此，能夠於水箱30內之水W達到既定之水位之時間點，自動停止自容器70供給水。進一步地，若水箱30之水較既定之水位下降，則浮體71b下降而供給水。如此，能夠自動將水箱30之水位保持固定。另外，圖2A所示之構成為一例，藉由其他構成亦能夠發揮與圖2A所示之構成相同之功能。 When the water tank 70 is attached to the receiving portion 33 in a state where the water in the water tank 30 is insufficient, the floating body 71b and the spherical member 71c are lowered as shown in Fig. 2B, and the tubular portion 71a is not blocked. Therefore, water is supplied to the water tank 30 from the tubular portion 71a. When the water level of the water tank 30 rises with the supply of water, as shown in FIG. 2C, the floating body 71b rises, whereby the spherical member 71c also rises. As a result, the tubular portion 71a is closed by the spherical member 71c, and the supply of water is stopped. Therefore, it is possible to automatically stop the supply of water from the container 70 at a point in time when the water W in the water tank 30 reaches a predetermined water level. Further, if the water of the water tank 30 is lowered from the predetermined water level, the floating body 71b is lowered to supply water. In this way, the water level of the water tank 30 can be automatically kept fixed. In addition, the configuration shown in FIG. 2A is an example, and the same configuration as that shown in FIG. 2A can be exhibited by another configuration.

(實施形態2) (Embodiment 2)

於實施形態2中，對裝置(Da)之另一例進行說明。實施形態2之裝置與實施形態1之裝置相比較，流路之連接方法不同。將實施形態2之裝置之構成示意性地表示於圖3。 In the second embodiment, another example of the device (Da) will be described. The apparatus of the second embodiment differs from the apparatus of the first embodiment in the method of connecting the flow paths. The configuration of the apparatus of the second embodiment is schematically shown in Fig. 3.

於實施形態2之裝置100中，第1流路41之另一端(第2端部41b)連接於管50之下部。又，氫氣流路44之一端(第1端部44a)連接於管50之上部。即，於較第1端部44a與管50之連接部更下方之位置連接第2端部41b與管50。於管50之下端形成有作為氣體排出口而發揮功能之開口部50a。 In the apparatus 100 of the second embodiment, the other end (second end portion 41b) of the first flow path 41 is connected to the lower portion of the tube 50. Further, one end (first end portion 44a) of the hydrogen gas flow path 44 is connected to the upper portion of the tube 50. That is, the second end portion 41b and the tube 50 are connected to a position lower than the connection portion between the first end portion 44a and the tube 50. An opening 50a that functions as a gas discharge port is formed at a lower end of the tube 50.

於圖3中，示出將水箱30之一部分區隔而形成管50之一例，但亦可使用與水箱30分開之管50。進一步地，只要使開口部50a開口，則亦可將管50與陰極室21直接連接。於該情形時，可將管50之下部之一部分視為第1流路41。 In Fig. 3, an example in which one portion of the water tank 30 is partitioned to form the tube 50 is shown, but a tube 50 separate from the water tank 30 may be used. Further, the tube 50 and the cathode chamber 21 may be directly connected as long as the opening 50a is opened. In this case, one portion of the lower portion of the tube 50 can be regarded as the first flow path 41.

進行水之電解時，與實施形態1之裝置100同樣地向水箱30供給水(去離子水)。接著，利用直流電源12對電解槽20之2個電極間施加直流電壓，將水電解。藉由該電解，於陰極室21生成氫氣，於陽極室22生成氧氣。氧氣通過水箱30被釋放。 When electrolysis of water is performed, water (deionized water) is supplied to the water tank 30 in the same manner as the apparatus 100 of the first embodiment. Next, a DC voltage is applied between the two electrodes of the electrolytic cell 20 by the DC power source 12 to electrolyze the water. Hydrogen gas is generated in the cathode chamber 21 by the electrolysis, and oxygen is generated in the anode chamber 22. Oxygen is released through the water tank 30.

於陰極室21生成之氫氣通過第1流路41流至管50。於通常驅動時，以通過第1流路41流動之氫氣通過開口部50a流經管50之方式配置管50與第1流路41。於圖3所示之一例中，於通常驅動時，必須使自端部41b釋放之氫氣之氣泡不會自開口部50a流向外部。例如，亦可以覆蓋端部41b之上方之方式配置管50或開口部50a。亦可如圖3所示，於較端部41b之開口端更下方配置開口部50a。 The hydrogen gas generated in the cathode chamber 21 flows through the first flow path 41 to the tube 50. At the time of normal driving, the tube 50 and the first flow path 41 are disposed such that the hydrogen gas flowing through the first flow path 41 flows through the tube 50 through the opening 50a. In an example shown in Fig. 3, it is necessary to prevent the air bubbles of the hydrogen gas released from the end portion 41b from flowing out of the opening portion 50a to the outside during normal driving. For example, the tube 50 or the opening 50a may be disposed so as to cover the upper side of the end portion 41b. As shown in FIG. 3, the opening 50a may be disposed below the open end of the end portion 41b.

如實施形態1中說明般，水及氫氣流經第1流路41。已到達至管50之水蓄積於管50，於氫氣流路44實質上僅氫氣流動。即，於實施形態2之構成，管50亦作為聚水器而發揮功能。管50之形狀(例如粗細)設為作為聚水器而發揮功能之形狀。已流至氫氣流路44之氫氣能夠如實施形態1中說明般被利用。 As described in the first embodiment, water and hydrogen flow through the first flow path 41. The water that has reached the tube 50 is accumulated in the tube 50, and substantially only hydrogen flows in the hydrogen gas channel 44. That is, in the configuration of the second embodiment, the tube 50 also functions as a water trap. The shape (for example, the thickness) of the tube 50 is a shape that functions as a water trap. The hydrogen gas having flowed to the hydrogen gas flow path 44 can be utilized as described in the first embodiment.

(實施形態3) (Embodiment 3)

於實施形態3中，對裝置(Da)之另一例進行說明。實施形態3之裝置與實施形態1之裝置相比較，電解槽20與水箱30之連接方法不同。將實施形態3之裝置之構成示意性地表示於圖4。 In the third embodiment, another example of the device (Da) will be described. The apparatus of the third embodiment differs from the apparatus of the first embodiment in the method of connecting the electrolytic cell 20 to the water tank 30. The configuration of the apparatus of the third embodiment is schematically shown in Fig. 4 .

於實施形態3之裝置100中，將電解槽20與水箱30直接連接。電解槽20之陽極室22與水箱30係透過形成於其等之壁之貫通孔而連接。另外，可將該等貫通孔視為流路。 In the apparatus 100 of the third embodiment, the electrolytic cell 20 is directly connected to the water tank 30. The anode chamber 22 of the electrolytic cell 20 and the water tank 30 are connected to each other through a through hole formed in a wall thereof. Further, the through holes can be regarded as a flow path.

實施形態3之裝置100具有與實施形態1之裝置100相同之功能。另外，於實施形態2之裝置中，亦可將電解槽20與水箱30直接連接。 The device 100 of the third embodiment has the same function as the device 100 of the first embodiment. Further, in the apparatus of the second embodiment, the electrolytic cell 20 and the water tank 30 may be directly connected.

(實施形態4) (Embodiment 4)

於實施形態4中，對裝置(Da)之另一例進行說明。實施形態4之裝置與實施形態2之裝置相比較，電解槽之配置不同。將實施形態4之裝置之構成示意性地表示於圖5。 In the fourth embodiment, another example of the device (Da) will be described. The apparatus of the fourth embodiment differs from the apparatus of the second embodiment in the arrangement of the electrolytic cells. The configuration of the apparatus of the fourth embodiment is schematically shown in Fig. 5.

於實施形態4之裝置100中，將電解槽20配置於水箱30內之下部。於陽極室22之壁形成有貫通孔，或者將陽極室22之壁去除。藉由於水箱30內配置水，而向薄膜電極組23之陽極側供給水。另外，亦可如圖1之一部分30a般，使水箱30之一部分變細，於該部分配置電解槽20。 In the apparatus 100 of the fourth embodiment, the electrolytic cell 20 is placed in the lower portion of the water tank 30. A through hole is formed in the wall of the anode chamber 22, or the wall of the anode chamber 22 is removed. Water is supplied to the anode side of the membrane electrode group 23 by arranging water in the water tank 30. Alternatively, one of the water tanks 30 may be thinned as in part 30a of Fig. 1, and the electrolytic cell 20 may be disposed in this portion.

藉由水之電解而於陰極室21生成之氫氣通過第1流路41及管50流至氫氣流路44。實施形態4之裝置100具有與實施形態2之裝置100相同之功能。另外，於實施形態1之裝置中，亦可將電解槽20配置於水箱30內之下部。 Hydrogen gas generated in the cathode chamber 21 by electrolysis of water flows through the first flow path 41 and the tube 50 to the hydrogen gas flow path 44. The device 100 of the fourth embodiment has the same function as the device 100 of the second embodiment. Further, in the apparatus of the first embodiment, the electrolytic cell 20 may be disposed in the lower portion of the water tank 30.

(實施形態5) (Embodiment 5)

於實施形態5中，對裝置(Db)之一例進行說明。將實施形態5之氫氣生成裝置100a之構成示意性地表示於圖6。裝置100a包含殼體11、直流電源(AC-DC轉換器)12、電解單元110、電解槽120、第1流路41、氫氣流路44、及管50(管(T))。裝置100a包含控制器，但於圖6中將圖示省略。該控制器連接於裝置內之機器(水位感測器61、直流電源12等)。對與裝置100相同之部分，有時省略重複之說明。 In the fifth embodiment, an example of the device (Db) will be described. The configuration of the hydrogen generating apparatus 100a of the fifth embodiment is schematically shown in Fig. 6. The device 100a includes a casing 11, a DC power source (AC-DC converter) 12, an electrolytic cell 110, an electrolytic cell 120, a first flow path 41, a hydrogen gas flow path 44, and a tube 50 (tube (T)). The device 100a includes a controller, but is omitted from the illustration in FIG. The controller is connected to a machine within the device (water level sensor 61, DC power source 12, etc.). The description of the same portions as the device 100 will sometimes be omitted.

電解單元110包含陽極111、陰極112、及配置於其等之間 之分隔件113。分隔件113例如係由絕緣性之不織布所構成，使液體及離子透過，但抑制氣泡之透過。電解槽120係由分隔件113區隔成陽極側之第1槽121及陰極側之第2槽122。另外，第1槽121與第2槽122於分隔件113之上方由不使液體及氣體透過之區隔板120a區隔。配置於第1槽121之水溶液AS與陽極111接觸，配置於第2槽122之水溶液AS與陰極112接觸。即，第1槽121保持被供給至陽極111之水性液體，第2槽122保持被供給至陰極112之水性液體。裝置(Db)亦可具有自裝置外部觀察到電解槽120之內部(尤其是第1槽121之內部)之構成。根據該構成，能夠目視確認藉由將水電解而產生之氣泡。 The electrolysis unit 110 includes an anode 111, a cathode 112, and is disposed between The partition 113. The separator 113 is made of, for example, an insulating non-woven fabric, and transmits liquid and ions, but suppresses the transmission of bubbles. The electrolytic cell 120 is partitioned by a separator 113 into a first groove 121 on the anode side and a second groove 122 on the cathode side. Further, the first groove 121 and the second groove 122 are partitioned above the partition 113 by a partition plate 120a that does not allow liquid and gas to pass therethrough. The aqueous solution AS disposed in the first tank 121 is in contact with the anode 111, and the aqueous solution AS disposed in the second tank 122 is in contact with the cathode 112. That is, the first tank 121 holds the aqueous liquid supplied to the anode 111, and the second tank 122 holds the aqueous liquid supplied to the cathode 112. The device (Db) may also have a configuration in which the inside of the electrolytic cell 120 (especially the inside of the first groove 121) is observed from the outside of the device. According to this configuration, it is possible to visually recognize the bubbles generated by electrolysis of water.

於第2槽122之上部連接有供在陰極112生成之氫氣流動之第1流路41。至少通常驅動時，第2槽122不向大氣開放。根據該構成，能夠提高氫氣流路內之氫氣之內壓。 A first flow path 41 through which hydrogen gas generated at the cathode 112 flows is connected to the upper portion of the second tank 122. At least during normal driving, the second groove 122 is not open to the atmosphere. According to this configuration, the internal pressure of the hydrogen gas in the hydrogen gas flow path can be increased.

於第1槽121形成有用以將第1槽121內之氣體向裝置之外部釋放之氣體釋放口120h，於氣體釋放口120h連接有成為氣體釋放路徑之水供給路徑31。亦可如上所述，水供給路徑31與氣體釋放路徑分別形成。 A gas release port 120h for releasing the gas in the first groove 121 to the outside of the device is formed in the first groove 121, and a water supply path 31 serving as a gas release path is connected to the gas release port 120h. Alternatively, as described above, the water supply path 31 and the gas release path are formed separately.

於管50之上部連接有第1流路41之一端及氫氣流路44之一端。於其等之結合部分，亦可如圖6所示般將其等配置為Y字狀。管50中之至少下部配置於第1槽121內。管50之下方之開口部50a配置於較下限水位WL更下方，作為氫氣之流路被阻斷時之氫氣之排出口而發揮功能。 One end of the first flow path 41 and one end of the hydrogen flow path 44 are connected to the upper portion of the tube 50. The combination of the components may be arranged in a Y shape as shown in FIG. 6. At least a lower portion of the tube 50 is disposed in the first groove 121. The opening 50a below the tube 50 is disposed below the lower limit water level WL, and functions as a hydrogen discharge port when the hydrogen flow path is blocked.

氫氣流路44透過連接件45而連接於氫氣流路201。如實施形態1中說明般，於氫氣流路201連接用以利用氫氣之器具。 The hydrogen gas flow path 44 is connected to the hydrogen gas flow path 201 through the connection member 45. As described in the first embodiment, an apparatus for utilizing hydrogen gas is connected to the hydrogen gas flow path 201.

進行水之電解時，首先，向電解槽120供給水溶液AS。接 著，利用直流電源12對電解單元110之2個電極間施加直流電壓，將水電解。藉由該電解，於陰極112生成氫氣，於陽極111生成氧氣。於陽極111生成之氧氣通過氣體釋放口120h及氣體釋放路徑(水供給路徑31)向裝置之外部釋放。再者，於本新型之裝置中，亦可將所釋放之氧氣用於某些用途。 When electrolysis of water is performed, first, the aqueous solution AS is supplied to the electrolytic cell 120. Connect A DC voltage is applied between the two electrodes of the electrolytic cell 110 by the DC power source 12 to electrolyze the water. By this electrolysis, hydrogen gas is generated at the cathode 112, and oxygen is generated at the anode 111. The oxygen generated at the anode 111 is released to the outside of the apparatus through the gas release port 120h and the gas release path (water supply path 31). Furthermore, in the apparatus of the present invention, the released oxygen can also be used for certain purposes.

於陰極112生成之氫氣通過第1流路41流向管50之上部。管50內之液面係如實施形態1中說明般對應氫氣流路44之內壓而上升下降。將管50浸漬於水溶液AS之深度係以通常驅動時氫氣不自開口部50a釋放之方式進行選擇。 The hydrogen gas generated at the cathode 112 flows through the first flow path 41 to the upper portion of the tube 50. The liquid level in the tube 50 rises and falls in accordance with the internal pressure of the hydrogen flow path 44 as described in the first embodiment. The depth in which the tube 50 is immersed in the aqueous solution AS is selected such that hydrogen gas is not released from the opening portion 50a during normal driving.

通常驅動時，已通過第1流路41之氫氣透過管50流經氫氣流路44及氫氣流路201。另一方面，氫氣流路201中之氫氣之流動被阻斷時，管50內之液面下降到達開口部50a。其結果為，已通過第1流路41之氫氣自開口部50a被釋放至第1槽121內。被釋放之氫氣通過氣體釋放口120h及氣體釋放路徑(水供給路徑31)被釋放至裝置之外部。其結果為，即便氫氣流路201被阻斷時，亦能夠防止氫氣流路201內之壓力過度變高，或水溶液AS自電解槽120洩漏。 In the normal driving, the hydrogen gas having passed through the first flow path 41 passes through the hydrogen gas flow path 44 and the hydrogen gas flow path 201. On the other hand, when the flow of the hydrogen gas in the hydrogen gas flow path 201 is blocked, the liquid level in the tube 50 falls to the opening portion 50a. As a result, the hydrogen gas that has passed through the first flow path 41 is released into the first groove 121 from the opening portion 50a. The released hydrogen gas is released to the outside of the device through the gas release port 120h and the gas release path (water supply path 31). As a result, even when the hydrogen flow path 201 is blocked, it is possible to prevent the pressure in the hydrogen gas flow path 201 from becoming excessively high or the aqueous solution AS from leaking from the electrolytic cell 120.

(實施形態6) (Embodiment 6)

於實施形態5中，對不於保持向陰極供給之水性液體之第2槽設置氣體釋放口之例進行圖示。但是，於本新型之裝置中，亦可於第1槽及第2槽分別形成氣體釋放口。作為此種裝置之一例，將實施形態6之裝置100b示於圖7。再者，關於與圖6中說明之事項相同之事項，有時省略重複之說明。於圖7中，省略氫氣流路201之下游側之圖示。於圖7中，對管50內 之水溶液AS標註與電解槽120內之水溶液AS之影線不同的影線。 In the fifth embodiment, an example in which a gas discharge port is provided in the second groove in which the aqueous liquid supplied to the cathode is not held is illustrated. However, in the device of the present invention, a gas release port may be formed in each of the first tank and the second tank. As an example of such a device, the device 100b of the sixth embodiment is shown in Fig. 7. Incidentally, the same matters as those described in FIG. 6 may be omitted. In FIG. 7, the illustration of the downstream side of the hydrogen flow path 201 is abbreviate|omitted. In Figure 7, in the tube 50 The aqueous solution AS is marked with a hatching different from the hatching of the aqueous solution AS in the electrolytic cell 120.

於圖7所示之氫氣生成裝置100b中，於第2槽122形成有氣體釋放口120h。氣體釋放口120h連接於氣體釋放路徑32。於第1槽121形成有氧氣釋放口121h。氧氣釋放口121h連接於作為氣體釋放路徑而發揮功能之水供給路徑31。另外，亦可將氣體釋放路徑32用作水供給路徑。 In the hydrogen generating device 100b shown in FIG. 7, a gas release port 120h is formed in the second groove 122. The gas release port 120h is connected to the gas release path 32. An oxygen release port 121h is formed in the first groove 121. The oxygen release port 121h is connected to the water supply path 31 that functions as a gas release path. Alternatively, the gas release path 32 can also be used as a water supply path.

於裝置100b中，管50配置於第1流路41之上游側。第1流路41與管50亦可為一體。即，亦可將1個管之下方之部分視為管50，將上方之部分視為第1流路41。管50係以於陰極112生成之氫氣通過開口部50a流動之方式配置。另外，亦可如圖7所示般，以氫氣流經開口部50a之方式將開口部50a附近擴展。或者亦可以覆蓋陰極112之上部之方式配置管50。 In the device 100b, the tube 50 is disposed on the upstream side of the first flow path 41. The first flow path 41 and the tube 50 may also be integrated. In other words, the portion below one tube may be regarded as the tube 50, and the portion above the tube may be regarded as the first channel 41. The tube 50 is disposed such that hydrogen generated by the cathode 112 flows through the opening 50a. Further, as shown in FIG. 7, the vicinity of the opening 50a may be expanded so that hydrogen gas flows through the opening 50a. Alternatively, the tube 50 may be disposed to cover the upper portion of the cathode 112.

若於裝置100b中將水電解，則於陰極112生成氫氣，於陽極111生成氧氣。於陽極111生成之氧氣通過氧氣釋放口121h被釋放至裝置100b之外部。於陰極生成之氫氣流經開口部50a、管50、第1流路41、及氫氣流路201。 When water is electrolyzed in the apparatus 100b, hydrogen gas is generated at the cathode 112, and oxygen is generated at the anode 111. The oxygen generated at the anode 111 is released to the outside of the device 100b through the oxygen release port 121h. Hydrogen generated at the cathode flows through the opening 50a, the tube 50, the first flow path 41, and the hydrogen flow path 201.

另一方面，氫氣流路201中之氫氣之流動被阻斷時，氫氣蓄積於管50內，管50內之水位下降。並且，若水位到達開口部50a，則生成之氫氣通過管50之外部及氣體釋放口120h被釋放至裝置100b之外部。 On the other hand, when the flow of hydrogen in the hydrogen flow path 201 is blocked, hydrogen gas is accumulated in the tube 50, and the water level in the tube 50 is lowered. Further, when the water level reaches the opening portion 50a, the generated hydrogen gas is released to the outside of the apparatus 100b through the outside of the tube 50 and the gas discharge port 120h.

亦可藉由將裝置100a或裝置100b之電解單元110替換為薄膜電極組而作為裝置(Da)。於該情形時，第1槽121與第2槽122係由薄膜電極組而區隔。進一步地，於該情形時，於電解槽120配置去離子水等金屬離子濃度較低之水。於第1槽121配置薄膜電極組之陽極，於第2槽 122配置薄膜電極組之陰極。 The device (Da) can also be used by replacing the electrolytic unit 110 of the device 100a or the device 100b with a thin film electrode group. In this case, the first groove 121 and the second groove 122 are separated by a thin film electrode group. Further, in this case, water having a low concentration of metal ions such as deionized water is disposed in the electrolytic cell 120. The anode of the thin film electrode group is disposed in the first groove 121, and is in the second groove 122 configures the cathode of the thin film electrode set.

於本新型之氫氣生成裝置中，亦可以包圍氣體釋放口(氣體釋放口30h、120h、121h)之周圍之方式形成朝向水箱之內側而突起之凸部(縱壁)。將此種凸部30c之一例示於圖8。藉由形成凸部30c，即便氫氣生成裝置揺動時，亦能夠抑制水自氣體釋放口洩漏。 In the hydrogen generating apparatus of the present invention, a convex portion (longitudinal wall) that protrudes toward the inner side of the water tank may be formed so as to surround the gas discharge ports (gas release ports 30h, 120h, 121h). One of such convex portions 30c is exemplified in Fig. 8 . By forming the convex portion 30c, it is possible to suppress leakage of water from the gas discharge port even when the hydrogen generating device is shaken.

本新型之氫氣生成裝置亦可包含複數個電解單元。該等複數個電解單元亦可串聯連接。於該情形時，亦可於複數個電解單元之各者逐一並聯連接齊納二極體。將該情形時之連接之一例示意性地示於圖9。 The hydrogen generating device of the present invention may also comprise a plurality of electrolytic units. The plurality of electrolytic cells may also be connected in series. In this case, the Zener diodes may be connected in parallel to each of the plurality of electrolytic cells. An example of the connection at this time is schematically shown in FIG.

於圖9中，作為一例，示意性地示出將3個薄膜電極組23串聯連接之一例。薄膜電極組23包含陽極23a、陰極23b、及高分子電解質層23c。複數個薄膜電極組23係如圖9所示般串聯連接。於各薄膜電極組23並聯連接有齊納二極體24。齊納二極體24之崩潰電壓對應薄膜電極組23而進行選擇。具體而言，選擇當電流正常於薄膜電極組23流動時，電流不於齊納二極體24流動，電流不於薄膜電極組23流動時，電流於齊納二極體24流動之齊納二極體作為齊納二極體24。 In FIG. 9, as an example, an example in which three thin film electrode groups 23 are connected in series is schematically shown. The thin film electrode group 23 includes an anode 23a, a cathode 23b, and a polymer electrolyte layer 23c. A plurality of thin film electrode groups 23 are connected in series as shown in FIG. A Zener diode 24 is connected in parallel to each of the thin film electrode groups 23. The breakdown voltage of the Zener diode 24 is selected corresponding to the thin film electrode group 23. Specifically, when the current is normally flowing through the thin film electrode group 23, the current does not flow through the Zener diode 24, and when the current does not flow through the thin film electrode group 23, the current flows in the Zener diode 24. The polar body acts as a Zener diode 24.

有時複數個電解單元(例如薄膜電極組23)中之1個因劣化等而導致電流不流動。於該情形時，若無齊納二極體，則電流亦不於其他電解單元流動，無法進行氫氣之生成。另一方面，若將齊納二極體並聯連接，則即便電流不於1個電解單元流動，電流亦透過與其並聯連接之齊納二極體流動，而於其他電解單元進行氫氣生成。因此，即便於複數個電解單元中之1個產生故障，亦能夠繼續進行氫氣生成。 Sometimes, one of a plurality of electrolytic cells (for example, the thin film electrode group 23) does not flow due to deterioration or the like. In this case, if there is no Zener diode, the current does not flow to other electrolytic cells, and hydrogen generation cannot be performed. On the other hand, when the Zener diodes are connected in parallel, even if the current does not flow in one electrolytic cell, the current flows through the Zener diode connected in parallel, and hydrogen is generated in the other electrolytic cells. Therefore, even if one of the plurality of electrolytic cells fails, hydrogen generation can be continued.

於上述實施形態之氫氣生成裝置中，亦可於第1流路之下游 連接氣體吸入器具。將此種包含氣體吸入器具之氫氣吸入裝置300之一例示於圖10。氫氣吸入裝置300包含氫氣生成裝置100、及氣體吸入器具310。於圖10中，示出具有與圖3中說明之氫氣生成裝置100大致相同之構成之裝置100，但亦可使用本新型之其他氫氣生成裝置。 In the hydrogen generation device of the above embodiment, it may be downstream of the first flow path. Connect the gas inhalation device. One example of such a hydrogen suction device 300 including a gas inhalation device is shown in Fig. 10 . The hydrogen gas suction device 300 includes a hydrogen gas generation device 100 and a gas suction device 310. In Fig. 10, a device 100 having substantially the same configuration as that of the hydrogen generating device 100 illustrated in Fig. 3 is shown, but other hydrogen generating devices of the present invention may be used.

氣體吸入器具310連接於氫氣流路201。於圖10中，作為氣體吸入器具之一例，示出鼻插管。 The gas suction tool 310 is connected to the hydrogen gas flow path 201. In Fig. 10, a nasal cannula is shown as an example of a gas inhalation device.

於僅進行吸入之情形時，無需考慮圖1所示之高低差L1。因此，於該情形時，無需使水箱之高度高於L1。其結果為，僅進行吸入之情形時之氫氣生成裝置100可實現更小型化。 In the case of only inhalation, it is not necessary to consider the height difference L1 shown in FIG. Therefore, in this case, it is not necessary to make the height of the water tank higher than L1. As a result, the hydrogen generating apparatus 100 can be further miniaturized only when the suction is performed.

殼體11中之面向管50之下部之部分為由透明之材料所構成之透明部11a。進一步地，管50之至少下部係由透明之材料所構成。根據該等構成，能夠透過透明部11a目視於管50之內部上升之氫氣之氣泡。另外，水箱30中之管50之部分亦可構成殼體11之一部分。於本新型之其他氫氣生成裝置中，亦同樣地，亦可以能夠目視管50之內部之至少一部分之方式構成裝置。 The portion of the casing 11 facing the lower portion of the tube 50 is a transparent portion 11a composed of a transparent material. Further, at least the lower portion of the tube 50 is constructed of a transparent material. According to these configurations, it is possible to visually see the bubbles of hydrogen gas rising inside the tube 50 through the transparent portion 11a. Additionally, portions of the tube 50 in the water tank 30 may also form part of the housing 11. In the other hydrogen generating apparatus of the present invention, similarly, the apparatus may be configured to visually at least a part of the inside of the tube 50.

於圖10所示之一例中，以通過第1流路41流動之氫氣通過開口部50a流經管50之方式配置管50與第1流路41。具體而言，第1流路41不***至管50之內部，而位於管50之開口部50a之下方。自第1流路41釋放之氫氣之氣泡直接上升通過開口部50a，於管50內上升。於該情形時，亦可以說第1流路41與管50係作為氫氣之流路而連接。 In the example shown in FIG. 10, the tube 50 and the first flow path 41 are disposed such that the hydrogen gas flowing through the first flow path 41 flows through the tube 50 through the opening 50a. Specifically, the first flow path 41 is not inserted into the inside of the tube 50 but below the opening 50a of the tube 50. The bubbles of hydrogen gas released from the first flow path 41 rise directly through the opening 50a and rise inside the tube 50. In this case, it can be said that the first flow path 41 and the tube 50 are connected as a flow path of hydrogen gas.

於氣體吸入器具310之氫氣流路201因某種原因被封閉之情形時，流經第1流路41之氫氣蓄積於管50內，管50內之水位下降。並且， 若由氫氣充滿管50內而水位下降至開口部50a，則氫氣不流經管50內而於水箱30內之水W中上升，通過氣體釋放口30h被釋放至裝置之外部。因此，即便於氫氣流路201被意外封閉之情形時，亦能夠防止氫氣通過高分子電解質層。即，能夠抑制因氫氣通過高分子電解質層所導致之高分子電解質層之劣化。 When the hydrogen gas flow path 201 of the gas suction tool 310 is closed for some reason, the hydrogen gas flowing through the first flow path 41 is accumulated in the tube 50, and the water level in the tube 50 is lowered. and, When the inside of the tube 50 is filled with hydrogen and the water level drops to the opening portion 50a, the hydrogen gas does not flow through the tube 50 and rises in the water W in the water tank 30, and is released to the outside of the device through the gas discharge port 30h. Therefore, even when the hydrogen flow path 201 is accidentally closed, hydrogen gas can be prevented from passing through the polymer electrolyte layer. In other words, deterioration of the polymer electrolyte layer due to passage of hydrogen gas through the polymer electrolyte layer can be suppressed.

氣體吸入器具亦可為形成氫氣濃度較高之空間之器具。將此種器具之一例示於圖11。圖11之器具包含吸入用之外罩321。外罩321為不密閉(即，向大氣開放)但以某程度阻斷空氣流之外罩。例如，外罩321可為將上方開放之外罩，亦可為形成有換氣口之箱。於外罩321連接氫氣流路。連接於外罩321之氫氣流路可為氫氣流路201，亦可為氫氣流路202(用於氫水之製備後之氫氣之流路)。使氫氣流入至外罩321之路徑如圖11所示，可自外罩321之側面，亦可自外罩321之底面，亦可自其他部分。由於氫氣較輕，故而自外罩321之下方流入至外罩321之氫氣於外罩321內上升。藉由吸入氫氣之主體進入至外罩321內，能夠容易地吸入氫氣。例如，藉由將寵物等動物配置於外罩321內，能夠使該動物容易地吸入氫氣。另外，此種吸入用之外罩亦可與本新型之氫氣生成裝置以外之氫氣生成裝置連接而使用。 The gas inhalation device may also be an instrument that forms a space with a high hydrogen concentration. An example of such an appliance is shown in FIG. The appliance of Figure 11 includes an outer cover 321 for inhalation. The outer cover 321 is a cover that is not sealed (ie, open to the atmosphere) but blocks the air flow to some extent. For example, the outer cover 321 may be an outer cover that opens upward, or may be a case in which a ventilation port is formed. A hydrogen flow path is connected to the outer cover 321 . The hydrogen flow path connected to the outer cover 321 may be the hydrogen flow path 201 or the hydrogen flow path 202 (the flow path for the hydrogen after the preparation of the hydrogen water). The path for allowing hydrogen gas to flow into the outer cover 321 is as shown in Fig. 11, and may be from the side of the outer cover 321 or from the bottom surface of the outer cover 321 or from other portions. Since hydrogen gas is light, hydrogen gas flowing from the lower side of the outer cover 321 to the outer cover 321 rises in the outer cover 321. Hydrogen gas can be easily sucked in by entering the inside of the outer casing 321 by the main body of the hydrogen gas. For example, by arranging an animal such as a pet in the outer cover 321, the animal can be easily sucked into the hydrogen gas. Further, such a suction outer cover may be used in connection with a hydrogen generating device other than the hydrogen generating device of the present invention.

[產業上之可利用性] [Industrial availability]

本新型可用於氫氣生成裝置及包含其之氫氣吸入裝置。 The present invention can be applied to a hydrogen generating device and a hydrogen inhaling device including the same.

11‧‧‧殼體 11‧‧‧Shell

12‧‧‧直流電源 12‧‧‧DC power supply

20‧‧‧電解槽 20‧‧‧electrolyzer

21‧‧‧陰極室 21‧‧‧ Cathode chamber

22‧‧‧陽極室 22‧‧‧Anode chamber

23‧‧‧薄膜電極組 23‧‧‧Thin electrode group

30‧‧‧水箱(第1槽) 30‧‧‧Water tank (1st trough)

30a‧‧‧水箱之一部分 30a‧‧‧ part of the water tank

30h‧‧‧氣體釋放口 30h‧‧‧ gas release port

31‧‧‧水供給路徑 31‧‧‧Water supply path

41‧‧‧第1流路 41‧‧‧1st flow path

41a‧‧‧第1端部 41a‧‧‧1st end

41b‧‧‧第2端部 41b‧‧‧2nd end

41c‧‧‧第1流路之一部分 41c‧‧‧ part of the first flow path

42‧‧‧第2流路 42‧‧‧2nd flow path

43‧‧‧第3流路 43‧‧‧3rd flow path

44‧‧‧氫氣流路 44‧‧‧ Hydrogen flow path

44a‧‧‧第1端部 44a‧‧‧1st end

44b‧‧‧第2端部 44b‧‧‧2nd end

45‧‧‧連接件 45‧‧‧Connecting parts

50‧‧‧管(氫氣釋放機構) 50‧‧‧ tube (hydrogen release mechanism)

50a‧‧‧開口部 50a‧‧‧ openings

61‧‧‧水位感測器 61‧‧‧Water level sensor

100‧‧‧裝置 100‧‧‧ device

200‧‧‧容器 200‧‧‧ container

200a‧‧‧蓋 200a‧‧‧ Cover

201‧‧‧氫氣流路 201‧‧‧ Hydrogen flow path

202‧‧‧氫氣流路 202‧‧‧ Hydrogen flow path

210‧‧‧液體 210‧‧‧Liquid

L1‧‧‧高低差 L1‧‧‧ height difference

L2‧‧‧高低差 L2‧‧‧ height difference

W‧‧‧水 W‧‧‧Water

WL‧‧‧下限水位 WL‧‧‧ lower water level

Claims (18)

一種氫氣生成裝置，其包含：至少1個電解單元，其包含陽極與陰極，且用以將水電解；槽，其保持被供給至上述電解單元之水性液體；第1流路，其供在上述陰極生成之氫氣流動，且於下游連接供上述氫氣流動之氫氣流路；及氫氣釋放機構；且上述槽具有用以將上述槽內之氣體向上述氫氣生成裝置之外部釋放之氣體釋放口，上述氫氣釋放機構於上述氫氣流路中之上述氫氣之流動受到抑制時，藉由使上述氫氣流至上述槽內而自上述氣體釋放口釋放上述氫氣。 A hydrogen generating device comprising: at least one electrolytic unit comprising an anode and a cathode for electrolyzing water; a tank holding an aqueous liquid supplied to the electrolytic unit; and a first flow path provided in the above a hydrogen gas flowing from the cathode, and a hydrogen gas flow path for supplying the hydrogen gas to the downstream; and a hydrogen gas release mechanism; and the gas tank has a gas release port for releasing the gas in the tank to the outside of the hydrogen gas generating device, When the flow of the hydrogen gas in the hydrogen gas flow path is suppressed, the hydrogen gas releasing means releases the hydrogen gas from the gas discharge port by flowing the hydrogen gas into the gas tank. 如申請專利範圍第1項之氫氣生成裝置，其中上述槽包含保持被供給至上述陽極之上述水性液體之第1槽，且上述第1槽具有用以將上述第1槽內之氣體向上述氫氣生成裝置之外部釋放之上述氣體釋放口，上述氫氣釋放機構於上述氫氣流路中之上述氫氣之流動受到抑制時，使通過上述第1流路流動之上述氫氣流至上述第1槽內。 The hydrogen generating apparatus according to claim 1, wherein the tank includes a first tank for holding the aqueous liquid supplied to the anode, and the first tank has a gas for conveying the gas in the first tank to the hydrogen gas. The gas release port released from the outside of the generating device, wherein the hydrogen gas is released from the first flow path to the first tank when the flow of the hydrogen gas in the hydrogen flow path is suppressed. 如申請專利範圍第2項之氫氣生成裝置，其包含電解槽，該電解槽包含上述電解單元、配置上述陽極之陽極室、及配置上述陰極之陰極室，且上述電解單元係包含上述陽極與上述陰極之薄膜電極組，上述第1流路連接於上述陰極室。 A hydrogen generating device according to claim 2, comprising an electrolytic cell comprising: the electrolytic cell, an anode chamber in which the anode is disposed, and a cathode chamber in which the cathode is disposed, wherein the electrolytic cell comprises the anode and the anode In the cathode thin film electrode assembly, the first flow path is connected to the cathode chamber. 如申請專利範圍第1項之氫氣生成裝置，其中上述槽包含保持被供給至上述陽極之上述水性液體之第1槽、及保持被供給至上述陰極之上述水性液體之第2槽，且上述電解單元係包含上述陽極與上述陰極之薄膜電極組，由上述薄膜電極組區隔上述第1槽與上述第2槽。 The hydrogen generating apparatus according to claim 1, wherein the tank includes a first tank for holding the aqueous liquid supplied to the anode, and a second tank for holding the aqueous liquid supplied to the cathode, and the electrolysis The unit includes a thin film electrode assembly of the anode and the cathode, and the first electrode and the second groove are separated by the thin film electrode group. 如申請專利範圍第4項之氫氣生成裝置，其中上述第1槽具有用以將上述第1槽內之氣體向上述氫氣生成裝置之外部釋放之上述氣體釋放口，且上述氫氣釋放機構於上述氫氣流路中之上述氫氣之流動受到抑制時，藉由使上述氫氣流至上述第1槽內而自上述氣體釋放口釋放上述氫氣。 The hydrogen generating apparatus according to claim 4, wherein the first tank has the gas release port for releasing the gas in the first tank to the outside of the hydrogen generating device, and the hydrogen releasing mechanism is in the hydrogen gas. When the flow of the hydrogen gas in the flow path is suppressed, the hydrogen gas is released from the gas release port by flowing the hydrogen gas into the first tank. 如申請專利範圍第4項之氫氣生成裝置，其中上述第2槽具有用以將上述第2槽內之氣體向上述氫氣生成裝置之外部釋放之上述氣體釋放口，且上述第1槽具有用以將於上述陽極生成之氧氣向上述氫氣生成裝置之外部釋放之氧氣釋放口，上述氫氣釋放機構於上述氫氣流路中之上述氫氣之流動受到抑制時，藉由使上述氫氣流至上述第2槽內而自上述氣體釋放口釋放上述氫氣。 The hydrogen generating device according to claim 4, wherein the second tank has the gas release port for releasing the gas in the second tank to the outside of the hydrogen generating device, and the first tank has a An oxygen release port that releases oxygen generated by the anode to the outside of the hydrogen generating device, and the hydrogen gas is released to the second groove by the hydrogen gas when the flow of the hydrogen gas in the hydrogen flow path is suppressed The hydrogen gas is released from the gas release port. 如申請專利範圍第1項之氫氣生成裝置，其中上述槽包含保持被供給至上述陽極之上述水性液體之第1槽、及保持被供給至上述陰極之上述水性液體之第2槽，且 上述電解單元包含配置於上述陽極與上述陰極之間之分隔件，由上述分隔件區隔上述第1槽與上述第2槽。 The hydrogen generating apparatus according to claim 1, wherein the tank includes a first tank that holds the aqueous liquid supplied to the anode, and a second tank that holds the aqueous liquid supplied to the cathode, and The electrolytic cell includes a separator disposed between the anode and the cathode, and the separator partitions the first groove and the second groove. 如申請專利範圍第7項之氫氣生成裝置，其中上述第1槽具有用以將上述第1槽內之氣體向上述氫氣生成裝置之外部釋放之上述氣體釋放口，且上述氫氣釋放機構於上述氫氣流路中之上述氫氣之流動受到抑制時，藉由使上述氫氣流至上述第1槽內而自上述氣體釋放口釋放上述氫氣。 The hydrogen generating apparatus according to claim 7, wherein the first tank has the gas release port for releasing the gas in the first tank to the outside of the hydrogen generating device, and the hydrogen releasing mechanism is in the hydrogen gas. When the flow of the hydrogen gas in the flow path is suppressed, the hydrogen gas is released from the gas release port by flowing the hydrogen gas into the first tank. 如申請專利範圍第7項之氫氣生成裝置，其中上述第2槽具有用以將上述第2槽內之氣體向上述氫氣生成裝置之外部釋放之上述氣體釋放口，且上述第1槽具有用以將於上述陽極生成之氧氣向上述氫氣生成裝置之外部釋放之氧氣釋放口，上述氫氣釋放機構於上述氫氣流路中之上述氫氣之流動受到抑制時，藉由使上述氫氣流至上述第2槽內而自上述氣體釋放口釋放上述氫氣。 The hydrogen generating device according to claim 7, wherein the second tank has the gas release port for releasing the gas in the second tank to the outside of the hydrogen generating device, and the first tank has a An oxygen release port that releases oxygen generated by the anode to the outside of the hydrogen generating device, and the hydrogen gas is released to the second groove by the hydrogen gas when the flow of the hydrogen gas in the hydrogen flow path is suppressed The hydrogen gas is released from the gas release port. 如申請專利範圍第1至9項中任一項之氫氣生成裝置，其中上述氫氣釋放機構包含下部具有開口部之管，且於上述管連接上述第1流路及上述氫氣流路，上述管之內部與上述槽之內部係透過上述開口部而連接，上述氫氣流路中之上述氫氣之流動受到抑制時，通過上述第1流路流動之上述氫氣通過上述開口部流至上述槽內。 The hydrogen generating device according to any one of claims 1 to 9, wherein the hydrogen gas releasing mechanism includes a tube having an opening at a lower portion, and the first flow path and the hydrogen gas flow path are connected to the tube, and the tube is The inside of the inside and the inside of the groove are connected through the opening, and when the flow of the hydrogen gas in the hydrogen flow path is suppressed, the hydrogen gas flowing through the first flow path flows into the groove through the opening. 如申請專利範圍第10項之氫氣生成裝置，其中將上述管之上述下部配置於上述槽之內部，且將上述第1流路及上述氫氣流路一同連接於上述管之上部。 The hydrogen generating apparatus according to claim 10, wherein the lower portion of the tube is disposed inside the tank, and the first flow path and the hydrogen flow path are connected together at an upper portion of the tube. 如申請專利範圍第10項之氫氣生成裝置，其中將上述管之上述下部配置於上述槽之內部，且將上述氫氣流路連接於上述管之上部，於較上述氫氣流路與上述管之連接部更下方之位置將上述第1流路連接於上述管。 The hydrogen generating apparatus according to claim 10, wherein the lower portion of the tube is disposed inside the tank, and the hydrogen flow path is connected to an upper portion of the tube to be connected to the tube via the hydrogen flow path. The first flow path is connected to the tube at a position lower than the portion. 如申請專利範圍第1至3項中任一項之氫氣生成裝置，其中上述氫氣釋放機構包含配置於上述槽內且於下部具有開口部之管，且於上述管連接上述氫氣流路，以於上述氫氣流路中之氫氣之流動未受抑制時，通過上述第1流路流動之氫氣通過上述開口部流經上述管之方式配置上述管與上述第1流路。 The hydrogen generating apparatus according to any one of claims 1 to 3, wherein the hydrogen gas releasing means includes a tube disposed in the tank and having an opening at a lower portion, and the hydrogen gas flow path is connected to the tube. When the flow of the hydrogen gas in the hydrogen flow path is not suppressed, the hydrogen flowing through the first flow path flows through the tube through the opening to arrange the tube and the first flow path. 如申請專利範圍第10項之氫氣生成裝置，其中上述開口部配置於較上述槽內之液面所設定之下限更下方。 The hydrogen generating apparatus according to claim 10, wherein the opening is disposed below a lower limit set by a liquid level in the tank. 如申請專利範圍第1項之氫氣生成裝置，其包含串聯連接之複數個上述電解單元及複數個齊納二極體，且於複數個上述電解單元之各者並聯連接有上述齊納二極體。 The hydrogen generating device of claim 1, comprising a plurality of the electrolytic cells and a plurality of Zener diodes connected in series, and wherein the Zener diodes are connected in parallel to each of the plurality of electrolytic cells . 如申請專利範圍第1項之氫氣生成裝置，其不包含離子交換樹脂。 The hydrogen generating apparatus of claim 1, which does not contain an ion exchange resin. 一種氫氣吸入裝置，其包含申請專利範圍第1項之氫氣生成裝置、及連接於上述第1流路之下游之氣體吸入器具。 A hydrogen inhalation device comprising the hydrogen generating device of claim 1 and a gas inhaling device connected downstream of the first flow path. 如申請專利範圍第17項之氫氣吸入裝置，其中上述氣體吸入器具係未 被密閉之外罩。 The hydrogen inhalation device of claim 17, wherein the gas inhalation device is not It is sealed outside the cover.