TWM550670U - Pattern generator with multiple point light sources - Google Patents
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本案是關於一種以繞射點組成圖案產生器的領域，尤其是一種以點光源產生繞射點的圖案產生器。 The present invention relates to a field in which a pattern generator is composed of diffraction points, and more particularly, a pattern generator that generates a diffraction point by a point source.
以繞射點組成並呈現圖案是習知應用繞射點的方式。習知以準直雷射入射繞射元件，例如繞射光學元件(Diffractive Optical Element,DOE)，可產生多個繞射點分布於一距離內的一投影面上。如此方式於投影面上產生的多個繞射點中，零級(zero order)光點的亮度通常遠大於其他的光點，進而限制了此種繞射點的應用。 Forming and presenting a pattern of diffraction points is a conventional way of applying diffraction points. Conventionally, a collimated laser incident diffractive element, such as a Diffractive Optical Element (DOE), can be used to generate a plurality of diffraction spots distributed over a distance on a projection surface. Among the plurality of diffraction points generated on the projection surface in this way, the brightness of the zero order spot is usually much larger than the other spots, thereby limiting the application of such a diffraction point.
中國專利公開號CN103309137公開一種結構光的投影機，其包括半導體基板和發光元件的單片陣列，其中的發光元件以不規則晶格的二維圖案布置於半導體基板上。中國專利公開號CN105319811公開一種重疊圖案投影機，其包括半導體襯底、在襯底上以二維圖案排列的光學發射器陣列、投影透鏡和繞射光學元件，當中的投影透鏡和繞射光學元件皆被安裝在半導體襯底上，投影透鏡收集並聚焦來自光學發射器陣列的光束，繞射光學元件則產生並投影圖案的多個重複副本。中國專利公開號CN105324631公開一種集成結構化光投影儀，其 包括半導體膜片和以多個網格圖案形成在半導體膜片上的發光元件，並形成一公共接觸的導體在半導體膜片，藉以驅動和控制發光元件。 Chinese Patent Publication No. CN103309137 discloses a structured light projector comprising a semiconductor substrate and a monolithic array of light-emitting elements, wherein the light-emitting elements are arranged on the semiconductor substrate in a two-dimensional pattern of irregular lattices. Chinese Patent Publication No. CN105319811 discloses an overlap pattern projector comprising a semiconductor substrate, an optical emitter array arranged in a two-dimensional pattern on a substrate, a projection lens and a diffractive optical element, wherein the projection lens and the diffractive optical element Both are mounted on a semiconductor substrate that collects and focuses the beam from the array of optical emitters, and the diffractive optical element produces and projects a plurality of duplicate copies of the pattern. Chinese Patent Publication No. CN105324631 discloses an integrated structured light projector, which A semiconductor film and a light-emitting element formed on the semiconductor film in a plurality of grid patterns are formed, and a common contact conductor is formed on the semiconductor film, thereby driving and controlling the light-emitting element.
本案提供一種多點光源式圖案產生器，點光源或小面光源設置於一繞射光學元件(Diffractive Optical Element,DOE)的焦平面上，並且光源處發出多個位置偏置但發光角相同的多道球面光，其通過繞射光學元件後、於一投影面上形成的光點可組成圖案、文字或形成亂點分布。 The present invention provides a multi-point source pattern generator. The point source or the facet source is disposed on a focal plane of a Diffractive Optical Element (DOE), and the plurality of positions are offset at the source but the illumination angle is the same. Multi-spherical light, which can form a pattern, a character or a disordered distribution by passing through a light spot formed on a projection surface after the optical element is diffracted.
本案提供一種多點光源式圖案產生器，多道偏置(offset)位置的球面雷射點光束通過一繞射光學元件，每道球面雷射點光束可被平面化並產生一組繞射圖案，多個彼此偏置的繞射圖案在一預設距離處的投影面上可構成大張角和強度均勻度佳的圖案、文字或形成亂點分布。 The present invention provides a multi-point source pattern generator in which a plurality of off-coordinate spherical spot laser beams pass through a diffractive optical element, and each spherical laser spot beam can be planarized and produce a set of diffractive patterns. A plurality of mutually offset diffraction patterns may form a pattern, a character, or a disordered distribution with a large opening angle and a uniform intensity uniformity on a projection surface at a predetermined distance.
本案提供一種多點光源式圖案產生器，以繞射光學元件取代一般採用全像光學元件(Holographic Optical Element,HOE)等深紋路繞射元件，突破深紋路繞射元件產生高斯強度分布的圖案，能夠產生較大張角且強度均勻的投影圖案分布。 The present invention provides a multi-point source pattern generator, which replaces a deep-grain diffractive element such as a Holographic Optical Element (HOE) with a diffractive optical element, and breaks through a pattern of a Gaussian intensity distribution generated by a deep-grain diffractive element. A projection pattern distribution capable of producing a large opening angle and uniform intensity.
依據上述，一種多點光源式圖案產生器，包括：一多點光源模組，其包括：提供球面波形式的複數個雷射點光束的一光束發射共同面，其中，該些雷射點光束由在該光束發射共同面上不同偏置位置的複數個開孔發出；以及設置於該多點光源模組上的一繞射組件，其接收該些雷射點光束，每一該雷射點光束被該繞射組件平面化和繞射後產生複數繞射光束。 According to the above, a multi-point source pattern generator includes: a multi-point source module comprising: a beam emitting common surface providing a plurality of laser spot beams in the form of a spherical wave, wherein the plurality of beam spot beams And emitting, by a plurality of openings at different offset positions on the common surface of the light beam; and a diffraction component disposed on the multi-point light source module, receiving the laser beam, each of the laser points The beam is planarized and diffracted by the diffraction assembly to produce a plurality of diffracted beams.
依據上述，一種多點光源式圖案產生器，包括：一多點光源模組，其包括提供球面波形式的複數雷射點光束的一光束發射共同面，其中，該些雷射 點光束由在該光束發射共同面上不同偏置位置的複數個開孔發出；一反射元件，其接收該些雷射點光束並反射該些雷射點光束後形成反射的該些雷射點光束；以及一繞射組件，其接收反射的該些雷射點光束，每一反射的該雷射點光束被該繞射組件平面化和繞射後產生複數繞射光束。 According to the above, a multi-point source pattern generator includes: a multi-point source module including a beam emission common surface providing a plurality of laser spot beams in the form of a spherical wave, wherein the lasers The point beam is emitted by a plurality of apertures at different offset positions on the common surface of the beam emission; a reflective element that receives the laser beam and reflects the laser beam to form the reflected laser points And a diffraction assembly that receives the reflected laser beam beams, each of the reflected laser beam beams being planarized and diffracted by the diffraction assembly to produce a plurality of diffracted beams.
一例中，該繞射組件包括單一繞射光學元件接收該些或反射的該些雷射點光束，且該單一繞射光學元件的一接收面的範圍涵蓋該些雷射點光束的複數個入射位置。 In one example, the diffraction assembly includes a single diffractive optical element that receives the reflected or reflected laser spot beams, and a range of receiving surfaces of the single diffractive optical element covers a plurality of incidents of the plurality of laser spot beams position.
一例中，該繞射組件包括複數繞射光學元件，任一該繞射光學元件接收該些或反射的該些雷射點光束之一，該些繞射光學元件的數量和該些雷射點光束相等。 In one example, the diffraction assembly includes a plurality of diffractive optical elements, each of the diffractive optical elements receiving one of the reflected or reflected laser spot beams, the number of the diffractive optical elements, and the plurality of laser points The beams are equal.
一例中，該繞射組件包括複數繞射光學元件，任一該繞射光學元件接收該些或反射的該些雷射點光束之至少之一，該些繞射光學元件的數量和該些雷射點光束相異。 In one example, the diffraction assembly includes a plurality of diffractive optical elements, and any one of the diffractive optical elements receives at least one of the or some of the reflected laser spot beams, the number of the diffractive optical elements, and the plurality of The spot beams are different.
一例中，該繞射光學元件或該些繞射光學元件是穿透式或反射式的。 In one example, the diffractive optical elements or the diffractive optical elements are transmissive or reflective.
一例中，該多點光源模組包括一垂直共振腔面射雷射，該垂直共振腔面射雷射具有該光束發射共同面且提供複數個垂直共振腔面射雷射開孔作為該些開孔。 In one example, the multi-point light source module includes a vertical cavity surface-emitting laser having a common surface of the beam emission and providing a plurality of vertical cavity surface-emitting laser apertures as the openings hole.
一例中，該多點光源模組包括一垂直共振腔面射雷射以及設置於該垂直共振腔面射雷射上的一視窗遮罩，該垂直共振腔面射雷射具有該光束發射共同面且提供複數個垂直共振腔面射雷射開孔，該視窗遮罩則包括該些開孔以對應該些垂直共振腔面射雷射開孔。 In one example, the multi-point light source module includes a vertical cavity surface-emitting laser and a window mask disposed on the vertical cavity surface-emitting laser, the vertical cavity surface-emitting laser having the beam emission common surface A plurality of vertical cavity surface-emitting laser apertures are provided, and the window mask includes the openings to face the laser apertures corresponding to the vertical cavity.
一例中，多點光源式圖案產生器更包括容置該多點光源模組和該繞射組件的一殼體，該殼體上設置一開口以供該些繞射光束離開該多點光源式圖案產生器。 In one example, the multi-point source pattern generator further includes a housing for housing the multi-point source module and the diffraction assembly, and the housing is provided with an opening for the diffracted beams to leave the multi-point source Pattern generator.
1、3、4‧‧‧多點光源式圖案產生器 1, 3, 4‧‧‧ multi-point source pattern generator
10‧‧‧多點光源模組 10‧‧‧Multi-point light source module
11‧‧‧光束發射共同面 11‧‧‧ Beam emission commonality
12、14、16、18‧‧‧雷射點光束 12, 14, 16, 18‧‧ ‧ laser spot beam
13、15、17、19‧‧‧垂直共振腔面射雷射 13, 15, 17, 19‧‧ ‧ vertical cavity surface laser
20、30、40‧‧‧繞射組件 20, 30, 40‧‧‧ diffraction components
21‧‧‧視窗遮罩 21‧‧‧Window mask
22、42、72‧‧‧繞射光學元件 22, 42, 72‧‧‧Diffractive optical components
23‧‧‧視窗 23‧‧‧Window
24‧‧‧載體 24‧‧‧ Carrier
26‧‧‧反射元件 26‧‧‧Reflective components
32、34、36、38‧‧‧繞射光學元件 32, 34, 36, 38‧‧‧Diffractive optical components
50‧‧‧目標處 50‧‧‧ Target Office
52、54、56、58‧‧‧繞射光點 52, 54, 56, 58‧‧‧ diffracted spots
60‧‧‧殼體 60‧‧‧shell
62‧‧‧開口 62‧‧‧ openings
A、B、C、D、O‧‧‧幾何中心 A, B, C, D, O‧‧‧ Geometric Center
L‧‧‧軸 L‧‧‧ axis
圖1為本案的一多點光源式圖案產生器的第一實施例模組的配置立體示意圖。 1 is a perspective view showing the configuration of a module of a first embodiment of a multi-point source pattern generator of the present invention.
圖2為本案的一多點光源式圖案產生器的第二實施例模組的配置立體示意圖。 2 is a perspective view showing the configuration of a module of a second embodiment of a multi-point source pattern generator of the present invention.
圖3為本案的一多點光源式圖案產生器的第三實施例模組的配置側面示意圖。 3 is a side view showing the configuration of a module of a third embodiment of a multi-point source pattern generator of the present invention.
圖4為本案的一多點光源式圖案產生器的第四實施例模組的配置側面示意圖。 4 is a side view showing the configuration of a module of a fourth embodiment of a multi-point source pattern generator of the present invention.
圖5為本案的多點光源式圖案產生器的多點光源模組的輸光面正面示意圖。 FIG. 5 is a front view of the light transmission surface of the multi-point light source module of the multi-point source pattern generator of the present invention.
圖6為本案的多點光源式圖案產生器的多點光源模組的輸光面側面示意圖。 6 is a side view of the light transmission surface of the multi-point light source module of the multi-point source pattern generator of the present invention.
圖7為本案的多點光源式圖案產生器的多點光源模組具有一視窗遮罩的正面示意圖。 FIG. 7 is a front view of a multi-point light source module of the multi-point source pattern generator of the present invention having a window mask.
首先於此說明的是，本案以下所述的目標處為一特定著光面，其可以是繞射雷射光束分布投影的一平面上，此平面將應用於後續的實施例中說明。 然本案的目標處並不限於一平面，其亦可為一弧面、曲面或凹凸不一的輪廓。本案的繞射雷射光束分布投影於目標處，其目的形成兼具均勻度和對比度的光點，避免產生亮度差異過大的光點。 First of all, it is explained that the object described below in the present case is a specific illuminating surface, which may be a plane projected by the diffraction laser beam distribution, and this plane will be applied to the description in the subsequent embodiments. However, the target of the present invention is not limited to a plane, and it may also be a curved surface, a curved surface or a contour with irregularities. In this case, the diffraction laser beam distribution is projected on the target, and the purpose is to form a spot with uniformity and contrast, so as to avoid a spot with excessive brightness difference.
以下所稱的多點光源模組，其係發出多道雷射點光束。原則上，本案應用的每一雷射點光束為球面波，就同一發光平面(光束發射共同面)來看，剛離開同一發光平面(光束發射共同面)的多道雷射點光束係以同一發光平面的法線方向發出，故此謂本案的多道雷射點光束的球面波或平面波彼此平行但不重疊，即彼此之間偏置(offset)且偏置位置可以差異化。但可理解的，雷射點光束為具有小發光角的光，是以，在發光平面(光束發射共同面)到繞射光學元件(DOE)之間，具有發光角的多道雷射點光束是有交錯的情形。實現上，本案的每一雷射點光束可由一垂直共振腔面射雷射(Vertical Cavity Surface Emitting Laser,VCSEL)提供，一垂直共振腔面射雷射經由開孔位置的安排可提供本案的多道雷射點光束，此些垂直共振腔面射雷射的排列可以差異化和不規則的。另外，本案以下所謂開孔的點光源，也可更細膩的建立小面光源的波前真實分布模型，更精確地做相位調制，故以下所稱的點光源係涵蓋小面光源，若和繞射光學元件接受多道雷射點光束入射的接收面來比較，發出點光源的開孔的孔大小為幾十微米等級，而繞射光學元件接受多道雷射點光束入射的接收面則為1*1平方毫米(mm2)的等級。 The multi-point light source module referred to below emits multiple laser beam points. In principle, each laser beam used in this case is a spherical wave. In the same illumination plane (the common plane of beam emission), the multiple laser beam beams that have just left the same illumination plane (the common plane of the beam emission) are the same. The normal direction of the light-emitting plane is emitted. Therefore, the spherical wave or the plane wave of the multiple laser spot beams of the present invention are parallel to each other but do not overlap, that is, offset from each other and the offset position can be differentiated. However, it can be understood that the laser beam is a light having a small illuminating angle, that is, a multi-channel laser beam having an illuminating angle between the illuminating plane (the common plane of the beam emitting) and the diffractive optical element (DOE). There is a staggered situation. In practice, each of the laser spot beams in the present case can be provided by a Vertical Cavity Surface Emitting Laser (VCSEL), and a vertical cavity surface laser is arranged through the opening position to provide more of the case. The Dora's spot beam, the arrangement of these vertical cavity surface lasers can be differentiated and irregular. In addition, in the present case, the so-called aperture light source can also be used to more accurately establish the wavefront real distribution model of the small-surface light source, and more accurately do phase modulation. Therefore, the point light source referred to below covers the small-surface light source, if and The optical element receives the receiving surface of the plurality of laser spot beams, and the aperture of the aperture of the point source is tens of micrometers, and the receiving surface of the diffractive optical element that receives the incident of multiple laser beams is 1*1 square millimeter (mm2) grade.
以下所稱的差異化或不規則排列係相對於規則排列而言。以光源而言，市售有謂垂直共振腔面射雷射陣列(VCSEL array)，其中的多垂直共振腔面射雷射多半以間距相同或固定週期的方式排列一起，發出的多道雷射光束為彼此平行且前進方向的前進軸間的間距為相同。而本案的垂直共振腔面射雷射 的不規則排列是以末端繞射圖案的設計需求，反向來設計不同位置的方式排列，就一光束共同發射面而言，本案的垂直共振腔面射雷射之多前進方向的前進軸間的間距或方向為相異。 The differential or irregular arrangement referred to below is relative to the regular arrangement. In terms of light sources, commercially available vertical cavity laser arrays (VCSEL arrays), in which multiple vertical cavity lasers are arranged in a uniform or fixed period, and multiple lasers are emitted. The light beams are parallel to each other and the pitch between the advancing axes in the advancing direction is the same. The vertical cavity surface laser of this case The irregular arrangement is arranged according to the design requirements of the end diffraction pattern, and the different positions are designed in the reverse direction. In the case of a common beam emitting surface of a beam, the vertical cavity of the present invention faces the laser in the direction of advancement between the advancing axes. The spacing or direction is different.
以下所稱的由點光源發出的多道雷射光束，其原則上為紅外不可見光，多道雷射光束可依據需要而選擇發出其他波長的不可見光。 The multi-channel laser beam emitted by the point source is hereinafter referred to as infrared invisible light. The multi-channel laser beam can selectively emit invisible light of other wavelengths as needed.
圖1為本案的一多點光源式圖案產生器的第一實施例模組的配置立體示意圖。多點光源式圖案產生器1包括一多點光源模組10和一繞射組件20，其中，由多點光源模組10提供的複數道球面波形式的雷射點光束12、14、16、18入射至繞射組件20，並且被繞射組件20平面化和繞射後成為複數道繞射光束，此些繞射光束離開多點光源式圖案產生器1後(圖上未繪此後的光路徑)投射至一目標處50形成多個繞射光點52、54、56、58。為方便說明，多點光源模組10、繞射組件20和目標處50沿著L軸間隔設置者。於第一實施例中，多點光源模組10包括一垂直共振腔面射雷射的複數個垂直共振腔面射雷射開孔13、15、17、19分別發出為球面波形式的雷射點光束12、14、16、18，為方便說明，本案以一光束發射共同面11來界定垂直共振腔面射雷射開孔13、15、17、19在多點光源模組10中的一輸光面，光束發射共同面11涵蓋雷射點光束12、14、16、18的發出位置，實作上，光束發射共同面11為包括一晶圓平面。可以理解的，多點光源模組10尚可包括固定或承載垂直共振腔面射雷射的承載結構、調整垂直共振腔面射雷射相對於光束發射共同面11的角度的調整結構等等。 1 is a perspective view showing the configuration of a module of a first embodiment of a multi-point source pattern generator of the present invention. The multi-point source pattern generator 1 includes a multi-point source module 10 and a diffraction assembly 20, wherein the plurality of point source waves are provided by the multi-point source module 10 in the form of a plurality of spherical wave beams 12, 14, 16 18 is incident on the diffraction assembly 20, and is planarized and diffracted by the diffraction assembly 20 to become a plurality of diffracted beams, the diffracted beams exiting the multi-point source pattern generator 1 (the light not shown thereafter) The path) is projected onto a target 50 to form a plurality of diffracted spots 52, 54, 56, 58. For convenience of explanation, the multi-point light source module 10, the diffraction assembly 20, and the target 50 are spaced apart along the L-axis. In the first embodiment, the multi-point light source module 10 includes a plurality of vertical cavity projection laser apertures 13 , 15 , 17 , and 19 respectively emitting a laser in the form of a spherical wave. Point beams 12, 14, 16, 18, for convenience of description, in this case, a beam emitting common surface 11 is used to define one of the vertical cavity projection laser apertures 13, 15, 17, 19 in the multi-point source module 10. The light transmitting surface, the beam emitting common surface 11 covers the emitting positions of the laser spot beams 12, 14, 16, 18. In practice, the beam emitting common surface 11 includes a wafer plane. It can be understood that the multi-point light source module 10 can further include a load-bearing structure for fixing or carrying a vertical cavity-exposure laser, an adjustment structure for adjusting the angle of the vertical cavity-emitting laser with respect to the beam-emitting common surface 11, and the like.
續參考圖1，繞射組件20包括結合平面化和繞射功能的繞射光學元件22(Diffractive Optical Element,DOE)，繞射光學元件22可設置或固定於一載體24上。第一實施例中，繞射光學元件22為穿透式單一繞射元件，其提供雷射點光 束12、14、16、18入射的接收面的大小基本上可涵蓋雷射點光束12、14、16、18在繞射光學元件22上的入射位置範圍。對每一雷射點光束12、14、16或18而言，繞射光學元件22可平面化和繞射每一雷射點光束12、14、16或18以形成多個繞射光點52、54、56或58。其次，對繞射光學元件22而言，雷射點光束12、14、16和18皆位於繞射光學元件22的一焦平面上並作偏置分布；或謂光束發射共同面11位於繞射光學元件22的焦平面上，而雷射點光束12、14、16和18在光束發射共同面11上作偏置分布。是以，本案的多點光源式圖案產生器使用具有m個垂直共振腔面射雷射開孔(m為大於1的正整數)，每個垂直共振腔面射雷射開孔所發出的雷射點光束可被單一繞射元件繞射形成n個繞射光點(n為大於1的正整數)，故於目標處可呈現的繞射光點為m*n個。是以，本案採用差異化間距偏置的垂直共振腔面射雷射開孔13、15、17、19，每一垂直共振腔面射雷射開孔所發出的雷射點光束12、14、16和18經平面化和繞射後、在目標處所形成的繞射光點的位置可以彼此分布較廣而構成大張角的圖案分布，在設計圖案產生上具有彈性。其次，本案採用具有多個發光孔的垂直共振腔面射雷射，並透過差異化間距偏置的垂直共振腔面射雷射開孔13、15、17、19設計，可以避免單一開孔時的雷射點光束的單一零級光太亮而影響後續繞射圖案的表現。又，相對於邊射型雷射而言，本案採用垂直共振腔面射雷射作為光源可以具有較大的發光張角(幾十度相對於邊射型雷射的十幾度)，有利在短距有較大面積著光到DOE上，DOE才能有較多波前調制的能力。另，本案的垂直共振腔面射雷射架構的厚度較薄(約可縮減厚度至1mm)，整體上較有利於整個光學系統的扁平化作業。 With continued reference to FIG. 1, the diffractive assembly 20 includes a diffractive optical element (DOE) that incorporates planarization and diffraction functions, and the diffractive optical element 22 can be disposed or secured to a carrier 24. In a first embodiment, the diffractive optical element 22 is a transmissive single diffractive element that provides laser spot light The size of the receiving surface on which the beams 12, 14, 16, 18 are incident may substantially cover the range of incident positions of the laser spot beams 12, 14, 16, 18 on the diffractive optical element 22. For each of the laser spot beams 12, 14, 16 or 18, the diffractive optical element 22 can planarize and diffract each of the laser spot beams 12, 14, 16 or 18 to form a plurality of diffracted spots 52, 54, 56 or 58. Secondly, for the diffractive optical element 22, the laser spot beams 12, 14, 16 and 18 are all located on a focal plane of the diffractive optical element 22 and are offsetly distributed; or the beam emitting common surface 11 is located in the diffraction The focal planes of the optical elements 22, while the laser spot beams 12, 14, 16 and 18 are offset distributed over the beam emitting common plane 11. Therefore, the multi-point source pattern generator of the present invention uses a laser having a vertical cavity with a vertical cavity (m is a positive integer greater than 1), and each vertical cavity is exposed by a laser. The spot beam can be diffracted by a single diffractive element to form n diffracted spots (n is a positive integer greater than 1), so the diffracted spot that can be presented at the target is m*n. Therefore, in this case, the vertical cavity surface-emitting laser apertures 13, 15, 17, 19 are offset by differential spacing, and the laser beam 12, 14 is emitted from each vertical cavity surface. After the planarization and diffraction of 16 and 18, the positions of the diffracted spots formed at the target can be widely distributed with each other to form a pattern distribution of large opening angles, and have elasticity in design pattern generation. Secondly, in this case, a vertical cavity laser with multiple illuminating apertures is used, and the vertical cavity projection laser apertures 13, 15, 17, 19 are designed to be offset by differential spacing, so that a single aperture can be avoided. The single zero-order light of the laser spot beam is too bright to affect the performance of the subsequent diffraction pattern. Moreover, with respect to the edge-emitting type laser, the vertical resonance cavity surface-emitting laser as the light source can have a large illuminating opening angle (a few tens of degrees relative to the edge-emitting type laser), which is advantageous in the short distance. With a large area of light onto the DOE, the DOE can have more wavefront modulation capabilities. In addition, the vertical cavity surface-emitting laser structure of the present invention has a relatively thin thickness (approximately 1 mm can be reduced), and is generally advantageous for the flattening operation of the entire optical system.
圖2為本案的第二實施例，和第一實施例不同之處在於，第二實施例的多點光源式圖案產生器3的繞射組件30包括在載體24上的多個穿透式繞射 光學元件32、34、36、38。於第二實施例中，多個繞射光學元件32、34、36、38分別對應並接受雷射點光束14、16、12和18的入射，將雷射點光束14、16、12和18平面化和繞射後可投射產生點數相異的繞射光點52、54、56和58。其次，該些繞射光點52的排列和分布可相同或相異於該些繞射光點54、該些繞射光點56或該些繞射光點58，而所有的繞射光點52、54、56和58又可以組合成圖案、文字或亂點分布。是以，本案的多點光源式圖案產生器可採用具有m個繞射光學元件分別對應m個垂直共振腔面射雷射開孔，並對m個垂直共振腔面射雷射開孔產生的雷射點光束進行平面化和繞射。每一繞射光學元件對一入射的雷射點光束繞射產生n(i)個繞射光點(i為1、2、.....、m)，因m個繞射光學元件彼此可以為相同或相異的繞射結構，故n(i)個繞射光點的數量可以相同或相異，n(i)個繞射光點的排列或分布亦可相同或相異。是以，就繞射光點數量而言，本案的多點光源式圖案產生器可產生大量繞射光點；其次，本案的多點光源式圖案產生器利用彼此平行偏置的雷射點光束產生偏置的繞射光點，擴大繞射光點構成的圖形或圖案分布的張角角度。再者，本案的多點光源式圖案產生器透過多個雷射開孔產生多雷射點光束來分散繞射後零級光的亮度，不會產生有亮度過量的特定點；又，因本案的多點光源式圖案產生器使用兼具平面化和繞射的繞射光學元件，進而產生強度均勻度佳的繞射光點。 2 is a second embodiment of the present invention, which differs from the first embodiment in that the diffraction assembly 30 of the multi-point source pattern generator 3 of the second embodiment includes a plurality of through windings on the carrier 24. Shoot Optical elements 32, 34, 36, 38. In the second embodiment, the plurality of diffractive optical elements 32, 34, 36, 38 respectively correspond to and receive the incidence of the laser beam beams 14, 16, 12 and 18, and the laser beam beams 14, 16, 12 and 18 Planarization and diffraction can be projected to produce diffracted spots 52, 54, 56 and 58 having different numbers of points. Second, the arrangement and distribution of the diffracted spots 52 may be the same or different from the diffracted spots 54, the diffracted spots 56 or the diffracted spots 58, and all of the diffracted spots 52, 54, 56 And 58 can be combined into a pattern, text or random distribution. Therefore, the multi-point source pattern generator of the present invention can adopt the m diffractive optical elements respectively corresponding to m vertical cavity projection laser apertures, and the m vertical cavity projections are generated by the laser apertures. The laser beam is planarized and diffracted. Each diffractive optical element produces n(i) diffracted light spots (i is 1, 2, ....., m) for an incident laser spot beam diffraction, since m diffractive optical elements can each other For the same or different diffraction structures, the number of n(i) diffracted spots may be the same or different, and the arrangement or distribution of n(i) diffracted spots may be the same or different. Therefore, in terms of the number of diffracted spots, the multi-point source pattern generator of the present invention can generate a large number of diffracted spots; secondly, the multi-point source pattern generator of the present invention utilizes a laser beam that is offset in parallel with each other to generate a bias. The diffracted spot is enlarged to enlarge the angle of the angle of the pattern or pattern distribution formed by the diffracted spot. Furthermore, the multi-point source pattern generator of the present invention generates a plurality of laser spot beams through a plurality of laser apertures to disperse the brightness of the zero-order light after the diffraction, and does not generate a specific point having excessive brightness; The multi-point source pattern generator uses a diffractive optical element that combines both planarization and diffraction to produce a diffracted spot of good intensity uniformity.
圖3為本案的第三實施例模組的側面示意圖，和第一實施例不同之處在於，多點光源式圖案產生器4採用的繞射組件40是包括反射式的單一繞射光學元件42，雷射點光束12、14入射至繞射光學元件42後被平面化、反射和繞射成投影於目標處50的多個繞射光點52、54。可以理解的，如第二實施例的多繞射光學元件亦可採用反射式的，亦可以是多穿透式或反射式繞射光學元件分別對應 數量不等的雷射點光束，如此增加投影圖案設計的彈性。另外，本案的多點光源式圖案產生器4可更包括一殼體60容置多點光源模組10和繞射光學元件42，殼體60並具有一開口62以提供繞射光點52、54離開多點光源式圖案產生器4。可以理解的，殼體60亦可應用於其他的實施態樣中。 3 is a side view of the module of the third embodiment of the present invention, which is different from the first embodiment in that the diffraction assembly 40 employed in the multi-point source pattern generator 4 is a single diffractive optical element 42 including a reflection type. The laser spot beams 12, 14 are incident on the diffractive optical element 42 and are planarized, reflected and diffracted into a plurality of diffracted spots 52, 54 projected at the target 50. It can be understood that the multi-diffractive optical element according to the second embodiment may also adopt a reflective type, or may be a multi-transmissive or reflective diffractive optical element respectively. A limited number of laser spot beams increase the flexibility of the projected pattern design. In addition, the multi-point source pattern generator 4 of the present invention may further include a housing 60 for housing the multi-point source module 10 and the diffractive optical element 42. The housing 60 has an opening 62 for providing diffracted spots 52, 54. The multi-point source pattern generator 4 is left. It will be appreciated that the housing 60 can also be used in other embodiments.
圖4為本案的一多點光源式圖案產生器的第四實施例模組的配置側面示意圖。和第三實施例不同之處在於，多點光源式圖案產生器中增加一反射元件26，例如一反射鏡，多點光源模組10發出的平行偏置的雷射點光束12、14先入射至反射元件26，再被反射元件26反射後才入射至繞射光學元件42，如此可增加多點光源式圖案產生器內各部件位置設置上的彈性。 4 is a side view showing the configuration of a module of a fourth embodiment of a multi-point source pattern generator of the present invention. The difference from the third embodiment is that a multi-point source pattern generator is added with a reflective element 26, such as a mirror, and the parallel-biased laser spot beams 12, 14 from the multi-point source module 10 are incident first. The reflective element 26 is reflected by the reflective element 26 before being incident on the diffractive optical element 42, thus increasing the flexibility in positional setting of the various components within the multi-point source pattern generator.
圖5和圖6分別為多點光源模組的輸光面正面和側面示意圖。為方便說明，多點光源模組的光束發射共同面11以正四邊形來說明，其具有一幾何中心O。其次，垂直共振腔面射雷射開孔13、15、17、19以四個圓形開孔來說明，圓形開孔的幾何中心分別為A、B、C、D，其發出的雷射點光束則分別為雷射點光束12、14、16、18。於本案中，任一圓形開孔和光束發射共同面11的幾何中心O之間的線段長度可以差異化，即AO線段長(AO連線之距離)、BO線段長、CO線段長和DO線段長皆可不同；或可謂任兩相鄰的圓形開孔的幾何中心間距：AB線段長、AC線段長、CD線段長、BD線段長皆可不同。是以，本案的多點光源模組透過不規則的垂直共振腔面射雷射開孔排列來產生後續不同偏置的繞射投影圖案或光點分布。本案的垂直共振腔面射雷射是以末端繞射圖案的設計需求，反向來設計不同位置的方式排列，能夠確切地表現出設計的繞射圖案。另，要說明的是，垂直共振腔面射雷射開孔13、15、17、19發出的點光束一般具有相同的發光角，發光角的大小可透過製程來控制，圖6中的平行虛線基本上是表示雷射點光 束發出時的法線軸，實際上雷射點光束由垂直共振腔面射雷射的雷射開孔13、15、17、19發出時為圓錐狀。 FIG. 5 and FIG. 6 are schematic diagrams of the front and side of the light transmission surface of the multi-point light source module, respectively. For convenience of explanation, the beam emission common face 11 of the multi-point light source module is illustrated by a regular quadrilateral having a geometric center O. Secondly, the vertical cavity surface laser openings 13, 15, 17, 19 are illustrated by four circular openings, the geometric centers of the circular openings are A, B, C, D, respectively, and the laser emitted therefrom The point beams are respectively the laser spot beams 12, 14, 16, 18. In the present case, the length of the line segment between the geometric center O of any circular opening and the beam emitting common surface 11 can be differentiated, that is, the length of the AO line segment (the distance of the AO line), the length of the BO line segment, the length of the CO line segment, and the DO. The length of the line segments can be different; or the geometric center spacing of any two adjacent circular openings: the length of the AB line segment, the length of the AC line segment, the length of the CD segment, and the length of the BD segment can be different. Therefore, the multi-point light source module of the present invention transmits the laser diffraction aperture arrangement through the irregular vertical cavity to generate a subsequent different offset diffraction projection pattern or spot distribution. The vertical cavity surface-emitting laser in this case is arranged in such a way that the design of the end diffraction pattern is reversed to design different positions, and the diffraction pattern of the design can be exactly expressed. In addition, it should be noted that the spot beams emitted by the vertical cavity surface-emitting laser apertures 13, 15, 17, 19 generally have the same illumination angle, and the size of the illumination angle can be controlled by the process, and the parallel dotted lines in FIG. Basically means laser light The normal axis when the beam is emitted, in fact, the laser beam is cone-shaped when it is emitted from the laser opening 13 , 15 , 17 , 19 of the vertical cavity surface.
圖7為本案之具有一視窗遮罩(window mask)的多點光源模組的正面示意圖。和圖5相較，圖7的多點光源模組的光束發射共同面前方放置或固定一視窗遮罩21，視窗遮罩21可具有複數個開孔大小不同的視窗23，此些視窗23的位置分別和垂直共振腔面射雷射開孔13、15、17、19對應和對準，但開孔大小和形狀可分別和對應的垂直共振腔面射雷射開孔13、15、17、19，如此可增加設計上的彈性。 7 is a front elevational view of a multi-point light source module having a window mask of the present invention. Compared with FIG. 5, the multi-point light source module of FIG. 7 has a window mask 21 placed or fixed in front of the common beam surface of the multi-point light source module, and the window mask 21 can have a plurality of windows 23 having different opening sizes, and the windows 23 The positions are respectively corresponding to and aligned with the vertical cavity projection laser apertures 13, 15, 17, 19, but the aperture size and shape can respectively correspond to the vertical cavity projection laser apertures 13, 15, 17 19, this can increase the flexibility of the design.
以上所述僅為本創作的較佳實施例，並非用以限定本創作的權利要求範圍，因此凡其他未脫離本創作所揭示的精神下所完成的等效改變或修飾，均應包含于本創作的範圍內。 The above description is only the preferred embodiment of the present invention, and is not intended to limit the scope of the claims. Therefore, any equivalent changes or modifications made without departing from the spirit of the present invention should be included in the present invention. Within the scope of creation.
4‧‧‧多點光源式圖案產生器 4‧‧‧Multi-point source pattern generator
10‧‧‧多點光源模組 10‧‧‧Multi-point light source module
11‧‧‧光束發射共同面 11‧‧‧ Beam emission commonality
12、14‧‧‧雷射點光束 12, 14‧‧ ‧ laser spot beam
40‧‧‧繞射組件 40‧‧‧Diffractive components
42‧‧‧繞射光學元件 42‧‧‧Diffractive optical components
50‧‧‧目標處 50‧‧‧ Target Office
52、54‧‧‧繞射光點 52, 54‧‧‧Diffraction spot
60‧‧‧殼體 60‧‧‧shell
62‧‧‧開口 62‧‧‧ openings
Claims (15)
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| TW106209638U TWM550670U (en) | 2017-06-30 | 2017-06-30 | Pattern generator with multiple point light sources |
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|---|---|---|---|
| TW106209638U TWM550670U (en) | 2017-06-30 | 2017-06-30 | Pattern generator with multiple point light sources |
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| TWM550670U true TWM550670U (en) | 2017-10-21 |
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| TW106209638U TWM550670U (en) | 2017-06-30 | 2017-06-30 | Pattern generator with multiple point light sources |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI791148B (en) * | 2020-04-28 | 2023-02-01 | 迪鵬光電科技股份有限公司 | Array structure light pattern projection device |
-
2017
- 2017-06-30 TW TW106209638U patent/TWM550670U/en unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI791148B (en) * | 2020-04-28 | 2023-02-01 | 迪鵬光電科技股份有限公司 | Array structure light pattern projection device |
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