TWM517679U - Replication system device for supercritical nano fluid low-temperature eco-friendly transferring - Google Patents
Replication system device for supercritical nano fluid low-temperature eco-friendly transferring Download PDFInfo
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本創作係與一超臨界奈米流體低溫綠能轉印複製系統裝置有關，特別是與一種利用超臨界奈米流體(Supercritical fluid,SCF)來促進壓印均勻性的超臨界奈米流體壓印系統及方法有關。 This creation is related to a supercritical nanofluid low temperature green energy transfer replication system device, especially with a supercritical nanofluid imprinting that uses supercritical fluid (SCF) to promote imprint uniformity. System and method related.
隨著科技的進步，資訊、光電、光通訊和醫療儀器等相關產業所應用到的相關儀器和技術，逐步朝向微小化系統發展。舉凡：微電子晶片、生醫晶片、DNA電泳晶片等，比比皆是。在今日益創新且訴求高效舒適的汽車產業來說，微小化技術在車用市場上其應用面也愈來越多，舉凡汽車內裝、抗反射光學薄膜、車用後視鏡抗反射技術等等。因此，微機電技術(Micro-Electro-Mechanical Systems,MEMS)的發展，也必須隨著產業的需求而日新月異。然而微機電技術雖可以應付車用產業需求而製作出微系統元件提供應用，但微機電製程卻有著龐大且複雜的製作程序和費用，且有著無法多量生產之窘境。為有效降低成本、提高產能，精密微成型技術因而誕生。其中，微熱壓成形技術是一相當穩定且有著悠久歷史的技術。 然而與其他精密製造技術相比較，微熱壓成型技術雖相對穩定，但因其機具成形過程之作動方式，是以壓板對壓板的型式，經常會有壓印均勻性和壓印成形性不佳之考驗，近年，多篇文獻提出創新的方法，例如：為縮短 製程時間，加裝紅外線以熱輻射作為塑膠基材升溫方式；利用塑膠基材在Tg點以下，應用CO2滲入並熱壓成型等相關研究，雖陸續有相關研究發表，但仍舊無法有效達到相當均勻成形情況。為克服壓印均勻性問題，近年逐漸發展出光膨潤塑化壓印技術，利用氣體作為壓印的方式，明顯改善壓印均勻性，但中央部位和壓板邊緣成形性不一，仍舊存有問題。此外，氣體微熱壓印預壓印成形需要將氣體溫度提升到玻璃轉換溫度(Glass transition temperature,Tg)以上或結晶型塑膠熔點(Melting point,Tm)附近才能成形，除耗時外亦耗能，對比於室溫下壓印，明顯會在升/降溫度過程中引起內應力，並且易因壓印溫度改變，氣體逸散不及產生包封現象(Encapsulation phenomenon)。 With the advancement of technology, related instruments and technologies applied by related industries such as information, optoelectronics, optical communication and medical instruments are gradually moving towards miniaturized systems. For example: microelectronic wafers, biomedical wafers, DNA electrophoresis wafers, etc., abound. In today's automotive industry, which is innovative and appealing to high efficiency and comfort, miniaturization technology is becoming more and more used in the automotive market. For example, automotive interiors, anti-reflective optical films, automotive rearview mirror anti-reflection technologies, etc. Wait. Therefore, the development of Micro-Electro-Mechanical Systems (MEMS) must also change with the needs of the industry. However, MEMS technology can meet the needs of the automotive industry to produce micro-system components to provide applications, but the MEMS process has a large and complex production process and cost, and has a dilemma of mass production. In order to effectively reduce costs and increase production capacity, precision micro-molding technology was born. Among them, micro-compression forming technology is a relatively stable and long-standing technology. However, compared with other precision manufacturing techniques, the micro-compression forming technology is relatively stable. However, due to the operation mode of the forming process of the machine, it is a type of pressure plate to the pressure plate, which often has the test of uniformity of imprint and poor formability. In recent years, many papers have proposed innovative methods, such as: to shorten the processing time, add infrared radiation to heat radiation as a plastic substrate heating method; use plastic substrate below the T g point, apply CO 2 infiltration and hot press molding, etc. Related research, although there have been related research published, but still can not effectively achieve a fairly uniform shape. In order to overcome the problem of uniformity of imprinting, in recent years, the light-expanding plasticizing imprinting technology has been gradually developed, and the use of gas as an imprinting method has obviously improved the imprint uniformity, but the central portion and the edge of the platen have different formability, and there are still problems. In addition, gas micro-embossing pre-imprinting requires the gas temperature to rise above the glass transition temperature (Tg) or near the melting point of the crystalline plastic (Melting point, Tm) to form, in addition to time-consuming energy consumption, Compared with embossing at room temperature, it is obvious that internal stress is caused during the rise/fall temperature, and it is easy to cause the encapsulation phenomenon due to the change of the imprint temperature.
有鑑於此，本案的創作動機即由此而產生。本案申請人鑑於時代潮流之所需，乃經悉心試驗與研究，並一本鍥而不捨之精神，終於提出超臨界奈米流體低溫綠能轉印複製系統裝置，以有效的克服上述技術中之缺失。 In view of this, the creative motive of this case arises from this. Applicants in this case, in view of the needs of the times, have carefully tested and researched, and have a perseverance, finally proposed a supercritical nano-fluid low-temperature green energy transfer replication system device to effectively overcome the lack of the above technology.
本創作之一構想係提供一種超臨界奈米流體低溫綠能轉印複製系統裝置，其包含一第一封蓋以及設置於該第一封蓋上的一第二封蓋，以形成一腔室；其中，該腔室內更包含一第一基板、一高分子材料成型層以及一模仁，其中，該第一基板係設置於該第一封蓋上，該高分子材料成型層係置放於該第一基板上，而該模仁上則是具有一微結構，用以對該高分子材料成型層進行壓印成形；其中，該超臨界奈米流體低溫綠能轉印複製系統裝置更包 含一超臨界奈米流體輸送裝置，用以提供具有懸浮的奈米顆粒的一超臨界奈米流體到該腔室內，當該流體流經該模仁上方時，該奈米顆粒係沉積於該模仁之上，以增加該模仁壓印的均勻性。奈米流體作為壓印過程中的介質，主要是奈米體本身具有較高的比重在壓印過程中，將會堆積在分隔裝置上，並且產生最佳堆積方式。此種方式有助於改善壓印過程中邊角施力不完整性。本創作舉之奈米流體以CO2氣體為例作為說明，CO2氣體為大氣中非常容易取得之氣體，文獻指出該氣體在密閉腔室內經由壓力高於約72.9bar和攝氏31.3℃以上條件時，將會轉變為超臨界流體現象，此態將會滲入塑膠基材內，並有效針對高分子材料進行塑化反應，亦即可在低於玻璃轉換溫度下，使得塑膠基材有半融熔態產生，得施以進行精微成形，過程中將能有效降低升溫能量耗損及熱應力的產生。 One idea of the present invention is to provide a supercritical nano fluid low temperature green energy transfer replication system device comprising a first cover and a second cover disposed on the first cover to form a chamber The chamber further includes a first substrate, a polymer material forming layer and a mold core, wherein the first substrate is disposed on the first cover, and the polymer material forming layer is placed on the first substrate On the first substrate, the mold core has a microstructure for embossing the polymer material forming layer; wherein the supercritical nano fluid low temperature green energy transfer replication system device further comprises a supercritical nanofluid delivery device for providing a supercritical nanofluid having suspended nanoparticles into the chamber, the nanoparticle being deposited on the mold as the fluid flows over the mold Above the kernel to increase the uniformity of the stamp imprint. Nanofluid is used as the medium in the imprint process, mainly because the nano-body itself has a high specific gravity. During the imprint process, it will accumulate on the separator and produce the best accumulation method. This method helps to improve the imperfections of the corners during the imprinting process. When the fluid present creation nm to give a CO 2 gas as an example of the way of illustration, a gas made of a CO 2 gas atmosphere is very easy, via the literature indicates that the gas pressure is higher than 31.3 ° C and above about 72.9bar ℃ conditions in a sealed chamber It will be transformed into a supercritical fluid phenomenon, which will penetrate into the plastic substrate and effectively plasticize the polymer material, and the plastic substrate will be semi-melted below the glass transition temperature. The state is generated and subjected to fine forming, which can effectively reduce the heating energy loss and the generation of thermal stress.
根據上述構想，其中該超臨界奈米流體低溫綠能轉印複製系統裝置更包含一超臨界奈米流體，用以對壓印成形的高分子材料成型層進行膨潤塑化。 According to the above concept, the supercritical nano fluid low-temperature green energy transfer replication system device further comprises a supercritical nano fluid for swelling and plasticizing the embossed polymer material forming layer.
根據上述構想，其中該高分子材料成型層係由高分子材料所構成。 According to the above concept, the polymer material forming layer is composed of a polymer material.
根據上述構想，其中該模仁係由PDMS、鎳模仁、矽基材、非鐵金屬或陶瓷材料所構成。 According to the above concept, the mold core is composed of PDMS, nickel mold, tantalum substrate, non-ferrous metal or ceramic material.
根據上述構想，其中該模仁上之微結構係為一奈微米結構。 According to the above concept, the microstructure on the mold core is a nanometer structure.
根據上述構想，其中該超臨界奈米流體低溫綠能轉印複製系統裝置更包含一分隔裝置，用以固定該模仁與該第一基 板的相對位置。 According to the above concept, the supercritical nanofluid low temperature green energy transfer replication system device further comprises a partitioning device for fixing the mold core and the first base The relative position of the board.
本創作之又一構想係提供一種超臨界奈米流體壓印方法，其至少包含下列步驟：(1)提供一第一封蓋；(2)提供一第一基板，設置於該第一封蓋上；(3)於該第一基板上，置放一高分子材料成型層；(4)提供一具有一微結構之模仁，用以對該高分子材料成型層進行壓印成形；以及(5)提供一具有懸浮的奈米顆粒的一超臨界奈米流體，當該流體流經該模仁上方時，該奈米顆粒係受重力影響而沉積於該模仁之上，以提昇該模仁壓印的均勻性，同時充填奈米流體並加熱到適當壓力和溫度，使得奈米流體轉為超臨界流體，並充分滲入高分子材料成型層進行後續成型。 Another idea of the present invention is to provide a supercritical nanofluid imprinting method comprising at least the following steps: (1) providing a first cover; (2) providing a first substrate disposed on the first cover (3) placing a polymer material forming layer on the first substrate; (4) providing a mold core having a microstructure for embossing the polymer material forming layer; 5) providing a supercritical nanofluid having suspended nanoparticles, wherein when the fluid flows over the mold, the nanoparticle is deposited on the mold by gravity to lift the mold The uniformity of the imprinting, while filling the nanofluid and heating to a suitable pressure and temperature, causes the nanofluid to be converted into a supercritical fluid and fully infiltrated into the polymer material forming layer for subsequent molding.
根據上述構想，其中該方法更包含步驟(6)提供一超臨界奈米流體，用以對壓印成形的高分子材料成型層進行膨潤塑化。 According to the above concept, the method further comprises the step (6) of providing a supercritical nano fluid for swelling and plasticizing the embossed shaped polymer material forming layer.
根據上述構想，其中該高分子材料成型層係由高分子材料所構成。 According to the above concept, the polymer material forming layer is composed of a polymer material.
根據上述構想，其中該模仁係由PDMS、鎳模仁、矽基材、非鐵金屬或陶瓷材料所構成。 According to the above concept, the mold core is composed of PDMS, nickel mold, tantalum substrate, non-ferrous metal or ceramic material.
根據上述構想，其中該模仁上之微結構係為一奈微米結構。 According to the above concept, the microstructure on the mold core is a nanometer structure.
根據上述構想，其中在提供該超臨界奈米流體之前，更包含一固定步驟，以固定該模仁與該第一基板的相對位置。 According to the above concept, before the provision of the supercritical nanofluid, a fixing step is further included to fix the relative position of the mold to the first substrate.
根據上述構想，其中該分隔裝置，係為一封膠(Seal) 步驟。 According to the above concept, wherein the partitioning device is a seal (Seal) step.
本創作得藉由下列實施方式暨配合相對應的圖式詳細說明，俾得一更深入之了解。 This creation can be obtained through a detailed explanation of the following implementations and corresponding diagrams.
100‧‧‧超臨界奈米流體低溫綠能轉印複製系統裝置 100‧‧‧Supercritical nano-fluid low-temperature green energy transfer replication system device
10‧‧‧第一封蓋 10‧‧‧First cover
15‧‧‧磁控/電控/電場 15‧‧‧Magnetic/Electric Control/Electric Field
20‧‧‧第二封蓋 20‧‧‧Second cover
25‧‧‧腔室 25‧‧‧ chamber
26‧‧‧上工作腔室 26‧‧‧Working room
27‧‧‧下工作腔室 27‧‧‧Working room
30‧‧‧第一基板 30‧‧‧First substrate
40‧‧‧高分子材料成型層 40‧‧‧ polymer material forming layer
50‧‧‧模仁 50‧‧‧Men
52‧‧‧曲面 52‧‧‧ Surface
55‧‧‧微結構 55‧‧‧Microstructure
56‧‧‧凹槽結構 56‧‧‧ Groove structure
60‧‧‧超臨界奈米流體 60‧‧‧Supercritical Nano Fluid
65‧‧‧超臨界奈米流體輸送裝置 65‧‧‧Supercritical nano fluid delivery device
80‧‧‧分隔裝置 80‧‧‧Separator
90‧‧‧奈米流體 90‧‧‧Nano fluid
第一圖，係為本創作第一較佳實施例之超臨界奈米流體低溫綠能轉印複製系統裝置及其方法之示意圖；第二圖，係為本創作第二較佳實施例之超臨界奈米流體低溫綠能轉印複製系統裝置及其方法之示意圖；以及第三圖，係為本創作第三較佳實施例之超臨界奈米流體低溫綠能轉印複製系統裝置及其方法之示意圖。 The first figure is a schematic diagram of a supercritical nano fluid low-temperature green energy transfer replication system device and a method thereof according to a first preferred embodiment of the present invention; the second figure is a super-second embodiment of the present invention. Schematic diagram of a critical nano-fluid low-temperature green energy transfer replication system device and method thereof; and a third diagram, which is a super-critical nano fluid low-temperature green energy transfer replication system device and method thereof according to a third preferred embodiment Schematic diagram.
請進一步參閱第二圖中所示，本創作之超臨界奈米流體低溫綠能轉印複製系統裝置100主要係由一第一封蓋10其內可具有磁控/電控/電場設備藉以產生輔助作用15以及設置於該第一封蓋上的一第二封蓋20構成一工作腔室25。如圖中所示，該腔室25內更包含一第一基板30置於該第一封蓋10上，而且該第一基板30上更具有一高分子材料成型層40。另外，該腔室25內更包含一模仁50，且該模仁50上具有一微米/奈米等級之微結構55，用以對該高分子材料成型層40進行壓印(imprinting)成形，亦即充填奈米流體90並加熱到適當溫度，使得奈米流體90轉為超臨界奈米流體60，並充分滲入高分子材料成型層，卸除上工作腔室26及下工作腔室27部分氣 體，再通入奈米流體90，控制適當壓力並進行壓印動作，開啟卻系統，洩壓並取得複製成品。 Referring further to the second figure, the supercritical nanofluid low temperature green energy transfer replication system device 100 of the present invention is mainly produced by a first cover 10 having a magnetron/electrical control/electric field device therein. The auxiliary action 15 and a second cover 20 disposed on the first cover form a working chamber 25. As shown in the figure, the first substrate 30 is further disposed on the first cover 10, and the first substrate 30 further has a polymer material forming layer 40 thereon. In addition, the chamber 25 further includes a mold core 50, and the mold core 50 has a micro/nano-grade microstructure 55 for imprinting the polymer material forming layer 40. That is, the nanofluid 90 is filled and heated to a suitable temperature, so that the nanofluid 90 is converted into the supercritical nanofluid 60, and fully penetrated into the polymer material forming layer, and the upper working chamber 26 and the lower working chamber 27 are removed. gas The body is then introduced into the nanofluid 90, the appropriate pressure is controlled and the imprinting action is performed, the system is opened, the pressure is released, and the finished product is obtained.
請進一步參閱第三圖所示，在習知的壓印系統中，當具有微結構的模仁對高分子材料成型層進行壓印時，該模仁微結構中角度變化較大的曲面或者兩個曲面(如第三圖中的52所示)，往往因為承受不平均的壓印力而容易使高分子材料成型層的成形結構產生缺陷。而為了有效解決這個問題，在一較佳具體實施利中，本創作之模仁50可以設計成如第三圖所示的結構，亦即在該模仁的上表面設計出多個凹槽結構56，以使本創作之超臨界奈米流體中的奈米顆粒得以沉積在該凹槽結構56中，以進一步均勻化施加該模仁50之曲面52的壓印力。在一較佳具體實施例中，該模仁50可以是由一高分子材料，如PDMS、鎳模仁、矽基材、非鐵金屬或陶瓷材料所構成。另外，在其他替代的較佳具體實施例中，承載該高分子材料成型層40的第一基板30及第一封蓋10均可以採用曲面或其他非平面狀的不規則基板，而配合前述具有凹槽結構的模仁，即使採用如述的非平面狀不規則基板，亦可因為奈米顆粒沉積在該模仁的凹槽結構中而克服壓印力不平均的問題，同時充填奈米流體90並加熱到適當溫度，使得奈米流體90轉為超臨界奈米流體60，並充分滲入高分子材料成型層，卸除上工作腔室26及下工作腔室27部分氣體，再通入奈米流體90，控制適當壓力並進行壓印動作，開啟卻系統，洩壓並取得複製成品。 Please refer to the third figure. In the conventional imprinting system, when the mold core having the microstructure is imprinted on the polymer material forming layer, the surface of the mold core having a large angle change or two A curved surface (as indicated by 52 in the third figure) tends to cause defects in the formed structure of the polymer material forming layer because of the uneven embossing force. In order to effectively solve this problem, in a preferred embodiment, the mold core 50 of the present invention can be designed as the structure shown in the third figure, that is, a plurality of groove structures are designed on the upper surface of the mold core. 56. The nanoparticle in the supercritical nanofluid of the present invention is deposited in the groove structure 56 to further homogenize the imprinting force of the curved surface 52 to which the mold core 50 is applied. In a preferred embodiment, the mold core 50 may be constructed of a polymeric material such as PDMS, nickel mold, tantalum substrate, non-ferrous metal or ceramic material. In addition, in other alternative preferred embodiments, the first substrate 30 and the first cover 10 carrying the polymer material forming layer 40 may each have a curved surface or other non-planar irregular substrate, and the foregoing has The mold of the groove structure, even if the non-planar irregular substrate as described above is used, can overcome the problem of unevenness of the imprinting force due to deposition of nano particles in the groove structure of the mold core, and simultaneously fill the nano fluid. 90 and heated to a suitable temperature, so that the nanofluid 90 is converted into a supercritical nanofluid 60, and fully infiltrated into the polymer material forming layer, and the gas of the upper working chamber 26 and the lower working chamber 27 is removed, and then the naphthalene is introduced. Meter fluid 90, controls the appropriate pressure and performs the imprinting action, opens the system, relieves pressure and obtains the duplicated product.
以上所述者，僅用以說明本創作之較佳實施例，然 而本創作之範圍當不受限於該上述之各項具體實施方式；且本創作得由熟悉技藝之人任施匠思而為諸般修飾，然不脫如附申請範圍所欲保護者。 The above description is only used to illustrate the preferred embodiment of the present invention, The scope of the present invention is not limited to the specific embodiments described above; and the present invention is modified by those skilled in the art, and is not intended to be protected by the scope of the application.
10‧‧‧第一封蓋 10‧‧‧First cover
20‧‧‧第二封蓋 20‧‧‧Second cover
25‧‧‧腔室 25‧‧‧ chamber
26‧‧‧上工作腔室 26‧‧‧Working room
27‧‧‧下工作腔室 27‧‧‧Working room
30‧‧‧第一基板 30‧‧‧First substrate
40‧‧‧高分子材料成型層 40‧‧‧ polymer material forming layer
50‧‧‧模仁 50‧‧‧Men
55‧‧‧微結構 55‧‧‧Microstructure
80‧‧‧分隔裝置 80‧‧‧Separator
90‧‧‧奈米流體 90‧‧‧Nano fluid
100‧‧‧超臨界奈米流體低溫綠能轉印複製系統裝置 100‧‧‧Supercritical nano-fluid low-temperature green energy transfer replication system device
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW104212330U TWM517679U (en) | 2015-07-31 | 2015-07-31 | Replication system device for supercritical nano fluid low-temperature eco-friendly transferring |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW104212330U TWM517679U (en) | 2015-07-31 | 2015-07-31 | Replication system device for supercritical nano fluid low-temperature eco-friendly transferring |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWM517679U true TWM517679U (en) | 2016-02-21 |
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| Application Number | Title | Priority Date | Filing Date |
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| TW104212330U TWM517679U (en) | 2015-07-31 | 2015-07-31 | Replication system device for supercritical nano fluid low-temperature eco-friendly transferring |
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| TW (1) | TWM517679U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113238456A (en) * | 2016-08-25 | 2021-08-10 | 李永春 | Method for imprinting flexible mold core with variable thickness |
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2015
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113238456A (en) * | 2016-08-25 | 2021-08-10 | 李永春 | Method for imprinting flexible mold core with variable thickness |
| CN113238456B (en) * | 2016-08-25 | 2024-02-20 | 李永春 | Imprinting method adopting flexible mold core with thickness variation |
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