TWM247864U - Projection display apparatus with a light shield - Google Patents

Description

M247864 五、創作說明（l) 【新型所屬之技術領域】 本創作係有關投影顯示裝置，尤其係指一種具有遮罩'结 構之投影顯示裝置。 【先前技術】 請參閱第1圖所示，習知數位光源處理（D L P，D i g i t a 1 L i ght Process i ng)投影顯示裝置1 〇 ，係採用反射式之數 位微鏡裝置 1 1 (DMD，Digital Micromirror Device )，藉由微鏡陣列（M i c r o m i r r o r a r r a y)將照明單元i 2 提供之照明光束反射，經投影鏡頭1 3以形成影像呈現於螢 幕1 4上。 請參閱第2圖所示，目前採用之數位微鏡裝置1 1 (即 無遮罩型光閥，Non-Aperture DMD)，係於封裝程序中將於 微鏡陣列晶片1 1 1周圍之電性連結部分1 1 2 (如：焊墊 或焊線）裸露出來，以免去使用習知之高成本密封式封裝 (Hermetic package)方式，使數位微鏡裝置1 1之製造成 本可大幅降低，然當投射於數位微鏡裝置1 1之光束投射於 裸露焊墊或焊線區域1 1 2時，會將光束反射後顯示於螢幕 1 4 ，而使螢幕1 4晝面產生雜散影像影響視覺享受。因 此，當低成本之無遮罩型光閥應用於投影顯示裝置，存在的 雜散影像產生問題，仍有待研究人員提出解決之道。 【新型内容】 本創作之一目的，係提供一種具有遮罩結構之投影顯示 裝置，藉由設置遮罩結構，以阻擋投射於電性連結部分之光 束，達到避免雜散影像產生而提高影像品質。M247864 V. Creation Instructions (l) [Technical Field to which the New Type belongs] This creation relates to a projection display device, especially a projection display device with a mask structure. [Prior art] Please refer to Fig. 1. A conventional digital light source processing (DLP, Digit 1 L ght Process i ng) projection display device 1 〇 is a reflective digital micromirror device 1 1 (DMD, Digital Micromirror Device), the illumination beam provided by the lighting unit i 2 is reflected by a micro mirror array, and the image is presented on the screen 14 through the projection lens 1 3. Please refer to Figure 2. The current digital micromirror device 1 1 (that is, non-mask type light valve, Non-Aperture DMD) is the electrical property of the micromirror array chip 1 1 1 during the packaging process. The connection part 1 1 2 (such as a solder pad or a wire) is exposed, so as to avoid the use of the conventional high-cost Hermetic package method, so that the manufacturing cost of the digital micromirror device 1 1 can be greatly reduced. When the light beam of the digital micromirror device 1 1 is projected on the exposed pad or wire area 1 1 2, the light beam is reflected and displayed on the screen 1 4, so that a stray image on the day 14 surface of the screen affects visual enjoyment. Therefore, when a low-cost, unmasked light valve is applied to a projection display device, the problem of stray images exists, which needs to be solved by researchers. [New content] One of the objectives of this creation is to provide a projection display device with a mask structure. By setting the mask structure to block the light beam projected on the electrical connection part, to avoid stray images and improve the image quality .

M247864 五、創作說明（2) 本創作之另一目的，係提供一種具有遮罩結構之投影顯 示裝置，利用將遮罩結構之光遮蔽區面向數位微鏡裝置言史 置，使非有效光束可規則反射以避免反射光束進入投影鏡 頭，且可更準確遮蔽非有效光束。 為達上述目的，本創作之一種具有遮罩結構之投影顯示 裝置包括照明單元、遮罩結構、數位微鏡裝置及投影鏡頭； 其中遮罩結構具有一透明基板，並於基板側面利用印刷或鍍 膜方式設置光遮蔽區以形成一光穿透區，數位微鏡裝置包括 數位微鏡陣及裸露於其周圍之電性連結部分；當照明單元提 供之光束投射於遮罩結構時，其中有效光束可直接穿過光穿 透區至微鏡裝置之微鏡片陣列上，後由投影鏡頭將影像呈現 於螢幕，而部分光束受到光遮蔽區之反射及吸收作用阻擋， 而不會投射於微鏡裝置之裸露電性連結部分，以達到防止雜 散影像呈現於螢幕；另外，利用將遮罩結構之光遮蔽區面向 數位微鏡裝置設置，使非有效光束可規則反射以避免反射光 束進入投影鏡頭，且光遮蔽區可貼近數位微鏡裝置之成像 面，故可更準確遮蔽非有效光束。 【實施方式】 有關本創作為達到上述目的，所採用之技術手段及其餘 功效，茲舉三較佳實施例，並配合圖示加以說明如下： 第一實施例： 請參閱第3圖所示，本創作具有遮罩結構之投影顯示裝 置2 0包括一照明單元2 1 、一遮罩結構2 2 、一無遮罩型M247864 V. Creation Instructions (2) Another purpose of this creation is to provide a projection display device with a mask structure. By using the light shielding area of the mask structure to face the digital micromirror device, the ineffective light beam can be used. Regular reflections prevent the reflected beam from entering the projection lens and can more accurately block ineffective beams. In order to achieve the above purpose, a projection display device with a mask structure includes a lighting unit, a mask structure, a digital micromirror device, and a projection lens. The mask structure has a transparent substrate, and printing or coating is used on the side of the substrate. The light shielding area is set to form a light transmission area. The digital micromirror device includes a digital micromirror array and an electrical connection part exposed around it. When the light beam provided by the lighting unit is projected on the mask structure, the effective light beam can be Directly pass through the light penetrating area to the micro-lens array of the micro-mirror device, and then present the image on the screen by the projection lens, and part of the light beam is blocked by the reflection and absorption of the light-shielding area, and will not be projected on the micro-mirror device. Exposing the electrical connection part to prevent stray images from appearing on the screen; In addition, the light shielding area of the mask structure is set to face the digital micromirror device so that the ineffective light beam can be regularly reflected to prevent the reflected light beam from entering the projection lens, and The light shielding area can be close to the imaging surface of the digital micromirror device, so it can more accurately shield the ineffective light beam. [Embodiment] Regarding the technical means and other effects adopted by this creation to achieve the above-mentioned purpose, three preferred embodiments are described below with the illustrations: First embodiment: Please refer to FIG. 3, The original projection display device 20 with a mask structure includes a lighting unit 2 1, a mask structure 2 2, and an unmasked type.

數位微鏡裝置2 3 (例無遮罩型光闊，Non-Aperture DMDDigital Micromirror Device 2 3 (Ex. Unmasked Light, Non-Aperture DMD

M247864 五、創作說明（3) )、一全反射稜鏡24、一投影鏡頭25及一螢幕（圖未示 )° -其中照明單元2 1包括提供光束2 1 1 1之光源2 1 1 、 濾光結構2 1 2 、均勻化結構2 1 3等；請參閱第4圖所 示，遮罩結構2 2係設置於照明單元2 1後方，且貼近數位 微鏡裝置2 3之前端設置；遮罩結構2 2包括一透明基板2 2 1 ，並於透明基板2 2 1背對數位微鏡裝置2 3之側面2 2 2上設有一光穿透區2 2 3及設於其周圍之光遮蔽區2 2 4 ，光穿透區223係供有效光束2 1 1 1A通過，而光遮 蔽區2 2 4係用以阻擋非有效光束2 1 1 1 B射入數位微鏡 裝置2 3或投影鏡頭2 5 ，該透明基板2 2 1可為玻璃，光 遮蔽區2 2 4係藉由印刷或鍍膜方式形成一不透光層，不透 光層可為黑色油墨、金屬層或鏡面材質；而無遮罩型數位微 鏡裝置2 3包括一微鏡片陣列2 3 1及裸露於其周圍之電性 連結部分2 3 2 (如：焊墊或焊線），微鏡片陣列2 3 1係 位於光穿透區2 2 3後方，電性連結部分係位於光遮蔽區2 2 4後方，並依微鏡片陣列2 3 1面積適當設置光穿透區2 2 3 ，以使由光穿透區2 2 3穿過之光束（即有效光束2 1 1 1A)可完全投射於微鏡片陣列2 3 1上，而光遮蔽區2 2 4可完全阻擋投射於電性連結部分2 3 2之光束（及非有 效光束2 1 1 1 B )。 當照明單元2 1提供之光束2 1 1 1藉由濾光結構2 1 2 、均勻化結構2 1 3進行濾光及均勻化等處理後，透過全 反射稜鏡2 4投射於遮罩結構2 2 ，其中部分光束2 1 1 1M247864 V. Creative Instructions (3)), a total reflection 稜鏡 24, a projection lens 25, and a screen (not shown) °-where the lighting unit 2 1 includes a light source 2 1 1 that provides a light beam 2 1 1 1 Light structure 2 1 2, homogenization structure 2 1 3, etc .; please refer to FIG. 4, the mask structure 2 2 is arranged behind the lighting unit 21 and is arranged close to the front end of the digital micromirror device 2 3; the mask The structure 2 2 includes a transparent substrate 2 2 1, and a light transmissive region 2 2 3 and a light shielding region disposed around the transparent substrate 2 2 1 on the side 2 2 2 facing away from the digital micromirror device 2 3. 2 2 4, the light transmission area 223 is for the effective light beam 2 1 1 1A to pass through, and the light shielding area 2 2 4 is used to block the ineffective light beam 2 1 1 1 B into the digital micromirror device 2 3 or the projection lens 2 5. The transparent substrate 2 2 1 may be glass, and the light-shielding area 2 2 4 may be formed by printing or coating an opaque layer. The opaque layer may be black ink, metal layer or mirror material; The cover type digital micromirror device 2 3 includes a micro lens array 2 3 1 and an electrical connection portion 2 3 2 (such as a pad or a wire) exposed around the micro lens array. The sheet array 2 3 1 is located behind the light transmission area 2 2 3, and the electrical connection part is located behind the light shielding area 2 2 4. The light transmission area 2 2 3 is appropriately set according to the area of the micro lens array 2 3 1. The light beam passing through the light penetrating area 2 2 3 (ie, the effective light beam 2 1 1 1A) can be completely projected on the micro lens array 2 3 1, and the light shielding area 2 2 4 can completely block the projection on the electrical connection part 2 3 2 beams (and ineffective beams 2 1 1 1 B). After the light beam 2 1 1 1 provided by the lighting unit 2 1 is filtered and homogenized by the filtering structure 2 1 2 and the homogenizing structure 2 1 3, it is transmitted to the masking structure 2 through total reflection 稜鏡 2 4 2 of which part of the beam 2 1 1 1

M247864 五、創作說明（4) A由遮罩結構2 2側面2 2 2之光穿透區2 2 3通過，入射 於其後方之數位微鏡裝置2 3上微鏡片陣列2 3 1區域，'經 其處理反射後再經過遮罩結構2 2、全反射稜鏡2 4，由最 後由投影鏡頭2 5將影像呈現於螢幕（圖未示）；而其餘投 射於光遮蔽區2 2 4之光束，受到光遮蔽區2 2 4之反射及 吸收作用阻擋，而限制光束投射於數位微鏡裝置2 3上電性 連結部分2 3 2區域，因此，藉由遮罩結構2 2可阻擋投射 於電性連結部分2 3 2之光束，以避免光束由電性連結部分 2 3 2反射而產生雜散影像呈現於螢幕（圖未示）上。 另外，本實施例中係將遮罩結構2 2設於一採用全反射 稜鏡2 4之投影顯示系統2 0 ，使入射與反射於微鏡裝置2 3之光束，可透過遮罩結構2 2進行兩次阻擋非有效光，以 有效阻擋雜散影像產生；但隨著投影系統之不同，遮罩結構 2 2亦可作不同配置以有效遮蔽非有效光束，例如：當採用 反射鏡之非斜射系統（圖未示）時，遮罩元件2 2則可設於 數位微鏡裝置2 3之入射光路上以阻擋光束入射於電性連結 部分2 3 2 ，或者設於數位微鏡裝置2 3之反射光路上以阻 擋由電性連結區域2 3 2反射之光束。 第二實施例： 本實施例與上述第一實施例相同或相當之元件係標示同 一圖號，請參閱第5圖所示，而本實施例與上述實施例不同 之處在於··該遮罩結構3 2係包括一透明基板3 2 1 ，並於 透明基板3 2 1面對數位微鏡裝置2 3之側面3 2 2上設有 一光穿透區3 2 3及設於其周圍之光遮蔽區3 2 4 ，以使光M247864 V. Creation instructions (4) A passes through the light-transmitting area 2 2 3 of the mask structure 2 2 side 2 2 2 and enters the micro lens array 2 3 1 area on the digital micro mirror device 2 3 behind it, ' After processing the reflection, it passes through the mask structure 2 2, total reflection 稜鏡 2 4 and finally the image is presented on the screen (not shown) by the projection lens 25; and the rest is projected on the light shielding area 2 2 4 Is blocked by the reflection and absorption of the light shielding area 2 2 4, and the light beam is restricted from being projected on the electric connection part 2 3 2 of the digital micromirror device 2 3. Therefore, the projection structure 2 2 can be blocked by the mask structure 2 2 The light beam of the sexual connection part 2 3 2 is to prevent the light beam from being reflected by the electrical connection part 2 3 2 and the stray image is presented on the screen (not shown). In addition, in this embodiment, the mask structure 2 2 is set in a projection display system 20 using a total reflection 稜鏡 24, so that the light beam incident and reflected on the micromirror device 23 can pass through the mask structure 2 2 Block the non-effective light twice to effectively block the generation of stray images; however, depending on the projection system, the mask structure 22 can also be configured differently to effectively block the non-effective light beam, such as when using a non-inclined reflector In the system (not shown), the masking element 22 can be set on the incident light path of the digital micromirror device 23 to block the light beam from being incident on the electrical connection part 2 3 2 or on the digital micromirror device 23. The light path is reflected to block the light beam reflected by the electrical connection area 2 3 2. Second embodiment: The same or equivalent components of this embodiment as those of the first embodiment above are marked with the same drawing number, please refer to FIG. 5, and the difference between this embodiment and the above embodiment is that the mask Structure 3 2 includes a transparent substrate 3 2 1, and a light transmitting region 3 2 3 and a light shielding provided around the transparent substrate 3 2 1 on the side 3 2 2 facing the digital micromirror device 2 3. Zone 3 2 4 to make light

第ίο頁 M247864 五、創作說明（5) 遮蔽區3 2 4之背面形成反射面，該透明基板3 2 1可為玻 璃，光遮蔽區3 2 4係藉由印刷或鍍膜方式形成一不透光一 層，不透光層可為黑色油墨、金屬層或鏡面材質；藉由將光 遮蔽區3 2 4設於面對數位微鏡裝置2 3之側面3 2 2 ，使 光遮蔽區3 2 4可更接近數位微鏡裝置2 3之入射面（即成 像面），使更準確阻擋投射於電性連結部分2 3 2之光束。 另外，由於光遮蔽區係由鍍層或印刷技術形成，因此其表面 會隨著製程精度及厚度影響而產生凹凸表面，當光束直接入 射於該凹凸表面時將產生不規則反射（即漫射（d i f f u s e) )，然本實施例係將光束由光遮蔽區3 2 4背面之光滑表面 入射，使入射於光遮蔽區3 2 4之光束可規則反射，以防止 反射光束射入投影鏡頭之光路，故可更有效達到防制雜散影 像之產生。 請參閱第6圖所示，遮罩結構3 2之側面可設置抗反射 (Anti-Reflection，AR)層3 2 5 ，以提昇光束穿透率， 降低光束穿過不同介質產生之亮度損失，使系統亮度提昇。 第三實施例： 本實施例與上述第二實施例相同或相當之元件係標示同 一圖號，請參閱第7圖所示，而本實施例與上述實施例不同 之處在於：遮罩結構42係為一金屬基板421 ，金屬基板 4 2 1中心開設有一通孔4 2 2以形成光穿透區，而通孔4 2 2周圍部分則為光遮蔽區，以一體製成該遮罩結構4 2 ， 藉以取代前述實施例由透明基板及鍍層形成之遮罩結構，以 達到降低成本；且可將該遮罩結構4 2直接貼設於無遮罩型Page ίο M247864 V. Creative Instructions (5) The reflective surface of the shielded area 3 2 4 forms a reflective surface. The transparent substrate 3 2 1 can be glass, and the light-shielded area 3 2 4 is opaque by printing or coating. One layer, the opaque layer can be black ink, metal layer or mirror material; by setting the light shielding area 3 2 4 on the side 3 2 2 facing the digital micromirror device 2 3, the light shielding area 3 2 4 can be It is closer to the incident surface (ie, the imaging surface) of the digital micromirror device 23, so that the light beam projected on the electrical connection portion 2 3 2 is more accurately blocked. In addition, because the light-shielding area is formed by plating or printing technology, its surface will produce a concave-convex surface with the influence of process accuracy and thickness. When the light beam directly enters the concave-convex surface, irregular reflection (that is, diffuse) will occur. )) However, in this embodiment, the light beam is incident from the smooth surface on the back of the light shielding area 3 2 4 so that the light beam incident on the light shielding area 3 2 4 can be regularly reflected to prevent the reflected light beam from entering the optical path of the projection lens. Can more effectively prevent the generation of stray images. Please refer to FIG. 6. An anti-reflection (AR) layer 3 2 5 can be provided on the side of the mask structure 3 2 to increase the light transmittance and reduce the brightness loss caused by the light beam passing through different media. System brightness increased. Third embodiment: The same or equivalent elements of this embodiment as those of the second embodiment above are marked with the same drawing number, please refer to FIG. 7. The difference between this embodiment and the above embodiment is that the mask structure 42 It is a metal substrate 421. A through hole 4 2 2 is opened in the center of the metal substrate 4 2 1 to form a light transmitting area, and a surrounding area of the through hole 4 2 2 is a light shielding area. The mask structure 4 is made in one piece. 2, in order to replace the mask structure formed by the transparent substrate and the plating layer in the foregoing embodiment to reduce the cost; and the mask structure 4 2 can be directly attached to the non-mask type

第11頁 M247864 五、創作說明（6) 數位微鏡裝置2 3之入射面，以使通孔4 2 2接近數位微鏡 裝置2 3之入射面（即成像面），以更準確阻擋投射於言性 連結部分2 3 2之光束。 當照明單元2 1提供之光束投射於遮罩結構4 2 ，其中 部分光東由遮罩結構4 2中心之通孔4 2 2通過，直接入射 於其後方之數位微鏡裝置2 3之微鏡片陣列2 3 1區域，經 其處理反射後由投影鏡頭2 5將影像呈現於螢幕（圖未示 )，而其餘投射於金屬基板421上之光束，受到金屬之吸 收與反射作用阻擋，而限制光束投射於數位微鏡裝置上電性 連結部分2 3 2區域，因此，藉由遮罩結構4 2可阻擋投射 於電性連結部分之光束，以避免光束由電性連結部分反射而 產生雜散影像呈現於螢幕（圖未示）上。 以上所述，僅用以方便說明本創作之較佳實施例，本創 作之範圍不限於該等較佳實施例，凡依本創作所做的任何變 更，於不脫離本創作之精神下，皆屬本創作申請專利範圍。Page 11 M247864 V. Creation instructions (6) The incident surface of the digital micromirror device 23, so that the through hole 4 2 2 approaches the incident surface (ie, the imaging surface) of the digital micromirror device 23, in order to more accurately block the projection on the The beam of the speech link 2 3 2. When the light beam provided by the lighting unit 21 is projected on the mask structure 4 2, part of the light east passes through the through hole 4 2 2 in the center of the mask structure 4 2 and directly enters the micro lens of the digital micromirror device 2 3 behind it. The array 2 3 1 area is processed and reflected by the projection lens 25 to present the image on the screen (not shown), and the rest of the light beam projected on the metal substrate 421 is blocked by the absorption and reflection of the metal to limit the light beam. Projected on the area of the electrical connection part 2 3 2 on the digital micromirror device. Therefore, the light beam projected on the electrical connection part can be blocked by the mask structure 4 2 to avoid stray images generated by the light reflected by the electrical connection part. Presented on the screen (not shown). The above is only for the convenience of explaining the preferred embodiments of this creation, and the scope of this creation is not limited to these preferred embodiments. Any changes made in accordance with this creation will not depart from the spirit of this creation. It is within the scope of this creation application patent.

第12頁 M247864 圖式簡單說明 【圖式簡要說明】 第1圖係習知數位光源處理投影顯示裝置之示意圖 第2圖係習知無遮罩數位微鏡裝置之外觀圖。 第3圖係本創作具有遮罩結構之投影顯示裝置圖。 第4圖係本創作第一實施例遮罩結構之侧視圖。 第5圖係本創作第二實施例遮罩結構之側視圖。 第6圖係本創作第二實施例遮罩結構之另一側視圖 第7圖係本創作第三實施例遮罩結構之側視圖。 【圖號簡要說明】 投影顯示裝置 20 照明單元 光源 2 111 2 1 2 光束 濾光結構 均勻化結構 遮罩結構 透明基板 側面 光穿透區 223 光遮蔽區 224 數位微鏡裝置 2 3 微鏡片陣列 231 電性連接部分 232 全反射稜鏡 24Page 12 M247864 Brief description of the drawings [Brief description of the drawings] Figure 1 is a schematic diagram of a conventional digital light source processing projection display device. Figure 2 is an external view of a conventional unmasked digital micromirror device. Figure 3 is a diagram of a projection display device with a mask structure in the present creation. Fig. 4 is a side view of the mask structure of the first embodiment of the present invention. Fig. 5 is a side view of the mask structure of the second embodiment of the present invention. Fig. 6 is another side view of the mask structure of the second embodiment of the present invention. Fig. 7 is a side view of the mask structure of the third embodiment of the present invention. [Brief description of the drawing number] Projection display device 20 Illumination unit light source 2 111 2 1 2 Beam filter structure Uniform structure Mask structure Transparent substrate Side light transmission area 223 Light shielding area 224 Digital micromirror device 2 3 Micro lens array 231 Electrical connection part 232 Total reflection 稜鏡 24

第13頁 M247864 圖式簡單說明 投影鏡頭 25 遮罩結構 32 透明基板 32 側面 3 2 2 光穿透區 323 光遮蔽區 324 抗反射層 325 遮罩結構 42 金屬基板 421Page 13 M247864 Simple illustration of the projection lens 25 Mask structure 32 Transparent substrate 32 Side 3 2 2 Light transmission area 323 Light shield area 324 Anti-reflection layer 325 Mask structure 42 Metal substrate 421

通孔 4 2 2Through hole 4 2 2

第14頁Page 14

Claims (1)

M247864 六、申請專利範圍 1 、一種具有遮罩結構之投影顯示裝置，其包括： 一照明單元，係提供一光束； · 一遮罩結構，係設於該照明單元之後方，其包括一基 板，該基板上設有一光穿透區及設於其周圍之光遮蔽 區，以及 一數位微鏡裝置，係設於該遮罩結構之後方，以將光束 反射至一投影鏡頭。 2 、如申請專利範圍第1項所述之具有遮罩結構之投影顯示 裝置，其中該基板係為一透明基板。 3 、如申請專利範圍第2項所述之具有遮罩結構之投影顯示 裝置，其中該遮罩結構之光遮蔽區係為一不透光層。 4、如申請專利範圍第3項所述之具有遮罩結構之投影顯示 裝置，其中該不透光層係設於該透明基板面向該數位微 鏡裝置之一側面。 5 、如申請專利範圍第3項所述之具有遮罩結構之投影顯示 裝置，其中該不透光層係設於該透明基板背對該數位微 鏡裝置之一側面。 6 、如申請專利範圍第3項所述之具有遮罩結構之投影顯示 裝置，其中該不透光層係以鍍層方式製成。 7 、如申請專利範圍第3項所述之具有遮罩結構之投影顯示 裝置，其中該不透光層係以印刷方式製成。 8 、如申請專利範圍第1項所述之具有遮罩結構之投影顯示 裝置，其中該基板之側面可設有抗反射層。 9 、如申請專利範圍第1項所述之具有遮罩結構之投影顯示M247864 6. Scope of patent application 1. A projection display device with a mask structure, which includes: a lighting unit, which provides a light beam; a mask structure, which is located behind the lighting unit, which includes a substrate, The substrate is provided with a light penetrating area and a light shielding area provided around the substrate, and a digital micromirror device is arranged behind the mask structure to reflect the light beam to a projection lens. 2. The projection display device with a mask structure as described in item 1 of the scope of patent application, wherein the substrate is a transparent substrate. 3. The projection display device with a mask structure as described in item 2 of the scope of the patent application, wherein the light shielding area of the mask structure is an opaque layer. 4. The projection display device with a mask structure according to item 3 of the scope of the patent application, wherein the opaque layer is provided on a side of the transparent substrate facing the digital micromirror device. 5. The projection display device with a mask structure as described in item 3 of the scope of the patent application, wherein the opaque layer is provided on a side of the transparent substrate facing away from the digital micromirror device. 6. The projection display device with a mask structure as described in item 3 of the scope of patent application, wherein the opaque layer is made by plating. 7. The projection display device with a mask structure as described in item 3 of the scope of patent application, wherein the opaque layer is made by printing. 8. The projection display device with a mask structure as described in item 1 of the scope of the patent application, wherein the side of the substrate may be provided with an anti-reflection layer. 9. Projection display with mask structure as described in item 1 of the scope of patent application 第15頁 M247864 六、申請專利範圍 裝置，其中該基板可為金屬基板，且其中心設有一開 子L 。 — 1 0 、如申請專利範圍第1項所述之具有遮罩結構之投影顯 示裝置，其中該數位微鏡裝置具有一微鏡片陣列，及裸 露於其周圍之電性連結部分。 1 1 、如申請專利範圍第1項所述之具有遮罩結構之投影顯 示裝置，其中該遮罩結構與數位微鏡裝置間係間隔一極 小間隙。 1 2 、如申請專利範圍第1項所述之具有遮罩結構之投影顯 示裝置，其中該遮罩結構係可貼設於該數位微鏡裝置之 入射面上。Page 15 M247864 VI. Patent application device, where the substrate can be a metal substrate, and an opening L is set in the center. — 1 0. The projection display device with a mask structure as described in item 1 of the scope of the patent application, wherein the digital micromirror device has a microlens array and an electrical connection portion exposed around it. 1 1. The projection display device with a mask structure as described in item 1 of the scope of patent application, wherein the mask structure and the digital micromirror device are spaced with a very small gap. 12. The projection display device with a mask structure as described in item 1 of the scope of patent application, wherein the mask structure can be attached to the incident surface of the digital micromirror device. 第16頁Page 16