TWI824266B - Vacuum magnet adjustment mechanism - Google Patents

Vacuum magnet adjustment mechanism Download PDF

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TWI824266B
TWI824266B TW110124665A TW110124665A TWI824266B TW I824266 B TWI824266 B TW I824266B TW 110124665 A TW110124665 A TW 110124665A TW 110124665 A TW110124665 A TW 110124665A TW I824266 B TWI824266 B TW I824266B
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vacuum
magnet
rotating part
rod
base
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TW110124665A
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TW202302892A (en
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張佑臣
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達威應材有限公司
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Abstract

本發明係一種真空磁石調整機構，包含有：一真空裝置，其內具有一真空容置空間，該真空容置空間內並容設有一磁石；一調整裝置，其係包含有一調整桿及一氣密座，該調整桿係樞設於該氣密座內，該氣密座係固設於該真空裝置上保持氣密；一連動裝置，該連動裝置具有一基座及一轉動部，該基座係與該磁石連接，該轉動部係設置於該基座上，該調整桿與該轉動部連接，並可驅動該轉動部，使該轉動部調整該磁石之位置，透過該調整裝置可由外部直接調整該連動裝置驅動磁石，而不需破壞該真空容置空間內的真空狀態。The invention is a vacuum magnet adjustment mechanism, which includes: a vacuum device, which has a vacuum accommodation space, and a magnet is accommodated in the vacuum accommodation space; an adjustment device, which includes an adjustment rod and an airtight seal base, the adjusting rod is pivoted in the airtight base, and the airtight base is fixed on the vacuum device to maintain airtightness; a linkage device, the linkage device has a base and a rotating part, the base It is connected with the magnet. The rotating part is arranged on the base. The adjusting rod is connected with the rotating part and can drive the rotating part so that the rotating part adjusts the position of the magnet. Through the adjusting device, the adjusting device can directly adjust the position of the magnet from the outside. The linkage device is adjusted to drive the magnet without destroying the vacuum state in the vacuum containing space.

Description

真空磁石調整機構Vacuum magnet adjustment mechanism

本發明係與一種濺鍍裝置有關，特別是指一種不需破壞真空即可完成間距調整之真空磁石調整機構。The present invention relates to a sputtering device, and in particular, to a vacuum magnet adjustment mechanism that can adjust the spacing without destroying the vacuum.

按，請參閱圖1所示，其係為一種習知之磁控濺鍍裝置10，其係包含有一濺鍍基材11、一磁石12、一真空室13，該真空室13係具有一間隔板131，該間隔板131一側為高真空區，另側則為真空區；該濺鍍基材11係設置於該高真空區內，而該磁石12則設置於該真空區內；透過調整該磁石12與該濺鍍基材11之間的距離，可以相對調整該濺鍍基材11上所濺鍍 的厚度；該磁石12為了要調整其位置，在上面設置有一距離調整器121，透過調整該距離調整器121而可以調整該磁石12與該濺鍍基材11間之間距，進而可以調整該濺鍍基材11上所濺鍍的厚度。Please refer to Figure 1, which is a conventional magnetron sputtering device 10, which includes a sputtering substrate 11, a magnet 12, and a vacuum chamber 13. The vacuum chamber 13 has a partition plate. 131. One side of the partition plate 131 is a high vacuum zone, and the other side is a vacuum zone; the sputtering substrate 11 is set in the high vacuum zone, and the magnet 12 is set in the vacuum zone; by adjusting the The distance between the magnet 12 and the sputtering base material 11 can relatively adjust the thickness of the sputtering on the sputtering base material 11; in order to adjust its position, the magnet 12 is provided with a distance adjuster 121 on it. The distance adjuster 121 can adjust the distance between the magnet 12 and the sputtering base material 11 , and further can adjust the thickness of sputtering on the sputtering base material 11 .

惟，因為該距離調整器121與該磁石12皆位於該真空室13之真空區內，要進行間距調整時，就需要破壞該真空區的真空狀態，然後進行對於該距離調整器121進行調整動作，該距離調整器121通常為一螺桿或其他透過旋轉來切換成直線動作的結構所構成；使用者除了需要破換該真空室13之真空區之真空來調整該磁石12與濺鍍基材11間之間距之外，該距離調整器121在調整的過程中，使用者也很難透過轉動的量去計算實際的間隙調整數值，導致在調整過程中需要反覆的校正測量，並且，在破壞真空區的真空之後，也需要一定的作業時間來使該真空區恢復真空狀態，在調整上相對耗費時間並且準確度不佳。However, since the distance adjuster 121 and the magnet 12 are both located in the vacuum zone of the vacuum chamber 13, when adjusting the distance, it is necessary to destroy the vacuum state of the vacuum zone and then adjust the distance adjuster 121. , the distance adjuster 121 is usually composed of a screw or other structure that switches to linear motion through rotation; the user needs to change the vacuum in the vacuum zone of the vacuum chamber 13 to adjust the magnet 12 and the sputtering substrate 11 In addition to the gap, during the adjustment process of the distance adjuster 121, it is also difficult for the user to calculate the actual gap adjustment value through the amount of rotation, resulting in the need for repeated correction measurements during the adjustment process, and the vacuum is destroyed. After the vacuum zone is vacuumed, it also takes a certain amount of time to restore the vacuum zone to the vacuum state. The adjustment is relatively time-consuming and the accuracy is poor.

本發明之主要目的係在於提供一種不需破壞真空狀態即可調整磁石位置之真空磁石調整機構。The main purpose of the present invention is to provide a vacuum magnet adjustment mechanism that can adjust the position of the magnet without breaking the vacuum state.

本發明之另一目的係在於，提供一種可以精確調整間隙以及降低調整時間，提升操作精度的真空磁石調整機構。Another object of the present invention is to provide a vacuum magnet adjustment mechanism that can accurately adjust the gap, reduce adjustment time, and improve operating accuracy.

為達上述目的，本發明係提供一種真空磁石調整機構，包含有： 一真空裝置，其內具有一真空容置空間，該真空裝置之一側設置有一穿孔，該真空容置空間內並容設有一可調整位置之磁石； 一調整裝置，其係包含有一調整桿及一氣密座，該調整桿係樞設於該氣密座內，該氣密座係固設於該真空裝置之穿孔上，使該穿孔可保持氣密； 一連動裝置，該連動裝置具有一基座及一轉動部，該基座係與該磁石連接，該轉動部係設置於該基座上，該調整桿與該轉動部連接，並可驅動該轉動部，使該轉動部調整該磁石之位置。 In order to achieve the above object, the present invention provides a vacuum magnet adjustment mechanism, which includes: A vacuum device, which has a vacuum containing space, a perforation is provided on one side of the vacuum device, and a magnet with adjustable position is accommodated in the vacuum containing space; An adjusting device, which includes an adjusting rod and an airtight seat. The adjusting rod is pivotally located in the airtight seat. The airtight seat is fixed on the perforation of the vacuum device so that the perforation can remain airtight. ; A linkage device, the linkage device has a base and a rotating part, the base is connected to the magnet, the rotating part is arranged on the base, the adjusting rod is connected to the rotating part, and can drive the rotation part, so that the rotating part can adjust the position of the magnet.

本發明所提供之真空磁石調整機構，其可透過該調整裝置由該真空裝置外側直接對該連動裝置進行調整的動作讓該連動裝置在調整該磁石的位置時，不需要破壞該真空裝置的真空狀態，可降低整體作業的時間，並且透過該調整裝置，可以容易進行調整，可以提升調整的精度，提高成品的良率以及降低調整的時間。The vacuum magnet adjustment mechanism provided by the present invention can directly adjust the linkage device from the outside of the vacuum device through the adjustment device, so that the linkage device does not need to destroy the vacuum of the vacuum device when adjusting the position of the magnet. state, the overall operation time can be reduced, and through the adjustment device, adjustments can be easily made, the accuracy of adjustment can be improved, the yield of finished products can be improved, and the adjustment time can be reduced.

請配合參閱圖1至3所示，其係為本發明所提供之一真空磁石調整機構之較佳實施例，其係包含有：Please refer to Figures 1 to 3, which is a preferred embodiment of a vacuum magnet adjustment mechanism provided by the present invention, which includes:

一真空裝置20，其內具有一真空容置空間21，該真空裝置21之一側設置有一開口22，該開口22上蓋設有一板材23，本實施例中，其係為一透明壓克力板材所構成，該板材23係與該開口22保持氣密固定；該板材23上並設置有一穿孔231，該真空容置空間21內並容設有一可調整位置之磁石24；透過磁石24位置的變化，而可以調整與一濺鍍基材25之間的間距，進而可以控制該濺鍍基材25上所濺鍍的厚度。A vacuum device 20 has a vacuum containing space 21 therein. An opening 22 is provided on one side of the vacuum device 21. The opening 22 is covered with a plate 23. In this embodiment, it is a transparent acrylic plate. The plate 23 is airtightly fixed to the opening 22; the plate 23 is provided with a through hole 231, and the vacuum containing space 21 is provided with an adjustable magnet 24; through changes in the position of the magnet 24 , and the distance between the sputtering base material 25 and a sputtering base material 25 can be adjusted, and the thickness of the sputtering on the sputtering base material 25 can be controlled.

一調整裝置30，其係包含有一調整桿31及一氣密座32；該調整桿31係為一桿體，其一端設置有一旋把311，另一端則為一接頭312，本實施例中該接頭312係為一字形；該氣密座32係包含有一導入件321及一旋入部322，該導入件321係包含有一擋止部3211及一桿部3212，該擋止部3211係凸設桿部3212之一端，該導入件321中央並貫設有一貫孔3213，該貫孔3213係穿經該擋止部3211及該桿部3212，該調整桿31係穿樞設於該導入件321之貫孔3213內；該導入件321係由該真空裝置20之外側置入該穿孔231，使該擋止部3211可以設置於該板材23之外側，且該調整桿31之旋把311也設置於外側，該旋入部322係設置於該真空容置空間21內，相對穿設於該導入件321之桿部3212上，透過螺接或其他結合方式，使該導入件321與該旋入部322形成固定，並且，該氣密座32可以使該穿孔231位置保持氣密；An adjusting device 30 includes an adjusting rod 31 and an airtight seat 32; the adjusting rod 31 is a rod body, one end of which is provided with a rotating handle 311, and the other end is a joint 312. In this embodiment, the joint 312 is in a straight shape; the airtight seat 32 includes an introduction part 321 and a screw-in part 322. The introduction part 321 includes a stopper 3211 and a rod part 3212. The stopper part 3211 is a protruding rod part. One end of 3212 has a through hole 3213 in the center of the introduction piece 321. The through hole 3213 passes through the stopper 3211 and the rod portion 3212. The adjustment rod 31 is pivoted through the introduction piece 321. Inside the hole 3213; the introduction piece 321 is inserted into the through hole 231 from the outside of the vacuum device 20, so that the stopper 3211 can be disposed on the outside of the plate 23, and the knob 311 of the adjustment rod 31 is also disposed on the outside. , the screw-in part 322 is disposed in the vacuum containing space 21 and penetrates through the rod part 3212 of the introduction part 321. The introduction part 321 and the screw-in part 322 are fixed by screwing or other combination methods. , and the airtight seat 32 can keep the position of the through hole 231 airtight;

一連動裝置40，請配合參閱圖4及圖4A所示，該連動裝置40具有一基座41及一轉動部42，該基座41係與該磁石24連接，該轉動部42係設置於該基座42上，該轉動部42之上方係為一分度頭421，該分度頭421上並設置有一連接槽422，該調整桿31之接頭312係插設於該連接槽422內，使該調整桿31可以帶動該分度頭421轉動，該分度頭421下方連接有一推動桿423；該分度頭421可以轉動並轉換成推動桿423之直線往復運動，該推動桿423可以來調整該磁石24之位置，而可調整該磁石24之間隙。A linkage device 40, please refer to Figure 4 and Figure 4A. The linkage device 40 has a base 41 and a rotating part 42. The base 41 is connected to the magnet 24, and the rotating part 42 is provided on the On the base 42, above the rotating part 42 is an indexing head 421. The indexing head 421 is provided with a connecting groove 422. The joint 312 of the adjusting rod 31 is inserted into the connecting groove 422, so that The adjusting rod 31 can drive the indexing head 421 to rotate, and a push rod 423 is connected below the indexing head 421; the indexing head 421 can rotate and convert into linear reciprocating motion of the push rod 423, and the push rod 423 can be adjusted. The position of the magnet 24 can adjust the gap of the magnet 24 .

請參閱圖5所示，當使用者要調整該磁石24的間隙位置時，可以轉動該調整桿31之旋把311，該調整桿31之接頭312會於該連接槽422內帶動該分度頭421進行旋轉，該分度頭421旋轉時可以看到相對的轉動角度，透過分度頭421的轉動角度來換算調整的距離，進而可以準確的控制間隙調整的值，可以使厚度的變化量變成精確可控制。並且，因為調整時，係透過該調整桿31位於外部的旋把311來進行調整，整體在調整的過程中並不需要破壞該真空容置空間21內的真空，可以降低調整該磁石24間隙所需要的時間。Please refer to Figure 5. When the user wants to adjust the gap position of the magnet 24, he can rotate the knob 311 of the adjustment rod 31, and the joint 312 of the adjustment rod 31 will drive the indexing head in the connecting groove 422. 421 rotates, and the relative rotation angle can be seen when the indexing head 421 rotates. The adjustment distance can be converted through the rotation angle of the indexing head 421, and the gap adjustment value can be accurately controlled, so that the thickness change can become Precisely controllable. Moreover, since the adjustment is performed through the external knob 311 of the adjustment rod 31, there is no need to destroy the vacuum in the vacuum accommodating space 21 during the adjustment process, and the time required for adjusting the gap of the magnet 24 can be reduced. required time.

請參閱圖6所示，其係為本發明所提供之第二較佳實施例，其主要結構係與前一實施例相同，相同元件以相同符號表示，不另贅述，其中：Please refer to Figure 6, which is a second preferred embodiment provided by the present invention. Its main structure is the same as that of the previous embodiment. The same elements are represented by the same symbols and will not be described again. Among them:

該調整裝置30之調整桿31位於該真空裝置20端側為一主齒輪313，該連動裝置40之轉動部42設置有一從動齒輪組424，該主齒輪313係嚙接於該從動齒輪組424上，透過轉動該調整桿31而可齒動該從動齒輪組424進行轉動，齒輪間的轉動可以更精確的確知轉動的角度變化，另外，也可以透過該主齒輪313與從動齒輪組424之間的齒數配比變化來調整該調整桿31與該轉動部42間之轉動角度變化，例如，該從動齒輪組424之齒數大於該主齒輪313的齒數，則該調整桿31轉動的角度會大於該從動齒輪組424所轉動的角度，如此可使該轉動部42對於該磁石24所調整的間隙能更加精確，使該濺鍍的厚度能控制的更確實。The adjusting rod 31 of the adjusting device 30 is located on the end side of the vacuum device 20 and is a main gear 313. The rotating part 42 of the linkage device 40 is provided with a driven gear set 424, and the main gear 313 is meshed with the driven gear set. 424, by rotating the adjusting rod 31, the driven gear set 424 can be rotated. The rotation between the gears can more accurately determine the angle change of the rotation. In addition, the main gear 313 and the driven gear set can also be rotated through the rotation of the main gear 313 and the driven gear set. The rotation angle between the adjusting rod 31 and the rotating part 42 is adjusted by changing the tooth number ratio between the driven gear set 424 and the main gear 313. For example, if the number of teeth of the driven gear set 424 is greater than the number of teeth of the main gear 313, then the adjusting rod 31 rotates The angle will be larger than the rotation angle of the driven gear set 424, so that the gap adjusted by the rotating part 42 to the magnet 24 can be more precise, and the thickness of the sputtering can be controlled more accurately.

本發明之真空磁石調整機構，其透過該調整裝置之操作，而可於該真空裝置外側即可調整該磁石的位置；相較於習知之磁石調整位置時，需要破壞真空才可進行調整的動作，本發明之調整裝置與連動裝置可以不需要破壞真空狀態來進行調整，可以大幅降低調整位置所需要的操作時間，可有效提高作業效率；另外，該調整裝置轉動角度與該連動裝置之轉動部的搭配，可以使該磁石的位置控制更加精確，使該濺鍍的厚度能被準確的控制。The vacuum magnet adjustment mechanism of the present invention can adjust the position of the magnet from the outside of the vacuum device through the operation of the adjustment device. Compared with the conventional magnet adjustment mechanism, the vacuum needs to be broken before the adjustment can be performed. , the adjustment device and the linkage device of the present invention can be adjusted without breaking the vacuum state, which can greatly reduce the operation time required to adjust the position, and can effectively improve the work efficiency; in addition, the rotation angle of the adjustment device is consistent with the rotating part of the linkage device. The combination can make the position control of the magnet more precise, so that the thickness of the sputtering can be accurately controlled.

上揭實施例僅係說明本發明之技術手段而非限制，舉凡由本發明之等效修改，均應視為本發明之保護範圍。本發明之真空磁石調整機構於此領域中首創之結構，並具實用功效之增進，依法提出申請。The above-mentioned embodiments are only for illustrating the technical means of the present invention but not for limiting them. Any equivalent modifications made by the present invention should be regarded as falling within the protection scope of the present invention. The vacuum magnet adjustment mechanism of the present invention is the first structure in this field and has improved practical effects. The application is filed in accordance with the law.

10:磁控濺鍍裝置 11:濺鍍基材 12:磁石 121:距離調整器 13:真空室 131:間隔板 20:真空裝置 21:真空容置空間 22:開口 23:板材 231:穿孔 24:磁石 25:濺鍍基材 30:調整裝置 31:調整桿 311:旋把 312:接頭 313:主齒輪 32:氣密座 321:導入件 3211:擋止部 3212:桿部 3213:貫孔 322:旋入部 40:連動裝置 41:基座 42:轉動部 421:分度頭 422:連接槽 423:推動桿 424:從動齒輪組 10: Magnetron sputtering device 11: Sputtering substrate 12:Magnet 121:Distance adjuster 13: Vacuum chamber 131:Partition board 20: Vacuum device 21: Vacuum containment space 22:Open your mouth 23:Plate 231:Perforation 24:Magnet 25: Sputtering substrate 30:Adjustment device 31:Adjustment lever 311:Turn handle 312:Connector 313:Main gear 32: Airtight seat 321:Import 3211: Stopper 3212: Rod 3213:Through hole 322:Screw-in part 40: Linkage device 41:Pedestal 42:Rotating part 421: Dividing head 422:Connection slot 423:Push lever 424: Driven gear set

為使  貴審查委員能進一步瞭解本發明之目的、特徵以及所達成之功效，以下茲舉二較佳實施例，並配合圖式詳細說明於後，其中： 圖1為習知間距調整裝置之動作示意圖。 圖2為本發明較佳實施例之局部立體外觀圖。 圖3為本發明較佳實施例之剖面示意圖。 圖4為本發明較佳實施例之連動裝置立體外觀圖。 圖4A為本發明較佳實施例之連動裝置與調整桿之局部立體外觀圖。 圖5為本發明較佳實施例之調整動作示意圖。 圖6為本發明第二較佳實施例之連動裝置與調整桿之局部立體外觀圖。 In order to enable your review committee to further understand the purpose, characteristics and achieved effects of the present invention, two preferred embodiments are listed below and described in detail with reference to the drawings, among which: Figure 1 is a schematic diagram of the operation of a conventional spacing adjustment device. Figure 2 is a partial three-dimensional appearance view of the preferred embodiment of the present invention. Figure 3 is a schematic cross-sectional view of a preferred embodiment of the present invention. Figure 4 is a three-dimensional appearance view of the linkage device according to the preferred embodiment of the present invention. Figure 4A is a partial three-dimensional appearance view of the linkage device and the adjustment rod according to the preferred embodiment of the present invention. Figure 5 is a schematic diagram of the adjustment action of the preferred embodiment of the present invention. Figure 6 is a partial perspective view of the linkage device and the adjustment rod according to the second preferred embodiment of the present invention.

20:真空裝置 20: Vacuum device

21:真空容置空間 21: Vacuum containment space

22:開口 22:Open your mouth

23:板材 23:Plate

231:穿孔 231:Perforation

24:磁石 24:Magnet

25:濺鍍基材 25: Sputtering substrate

30:調整裝置 30:Adjustment device

31:調整桿 31:Adjustment lever

311:旋把 311:Turn handle

312:接頭 312:Connector

32:氣密座 32: Airtight seat

321:導入件 321:Import

3211:擋止部 3211: Stopper

3212:桿部 3212: Rod

3213:貫孔 3213:Through hole

322:旋入部 322:Screw-in part

40:連動裝置 40: Linkage device

41:基座 41:Pedestal

42:轉動部 42:Rotating part

421:分度頭 421: Dividing head

422:連接槽 422:Connection slot

423:推動桿 423:Push lever

Claims (4)

一種真空磁石調整機構，係包含有：一真空裝置，其內具有一真空容置空間，該真空裝置之一側設置有一穿孔，該真空容置空間內並容設有一可調整位置之磁石；一調整裝置，其係包含有一調整桿及一氣密座，該調整桿係樞設於該氣密座內，該氣密座係固設於該真空裝置之穿孔上，使該穿孔可保持氣密；一連動裝置，該連動裝置具有一基座及一轉動部，該基座係與該磁石連接，該轉動部係設置於該基座上，該調整桿與該轉動部連接，並可驅動該轉動部，使該轉動部調整該磁石之位置；該轉動部係具有一分度頭及一推動桿，該分度頭並可旋轉而驅動該推動桿於該基座上前後往復運動；該推動桿係與該磁石相抵接，並可變化該磁石之位置。 A vacuum magnet adjustment mechanism includes: a vacuum device, which has a vacuum accommodation space, a perforation is provided on one side of the vacuum device, and a magnet with an adjustable position is accommodated in the vacuum accommodation space; The adjusting device includes an adjusting rod and an airtight seat. The adjusting rod is pivotally installed in the airtight seat. The airtight seat is fixed on the perforation of the vacuum device so that the perforation can remain airtight; A linkage device, the linkage device has a base and a rotating part, the base is connected to the magnet, the rotating part is arranged on the base, the adjusting rod is connected to the rotating part, and can drive the rotation part, so that the rotating part can adjust the position of the magnet; the rotating part has an indexing head and a push rod, and the indexing head can rotate to drive the push rod to reciprocate forward and backward on the base; the push rod It is in contact with the magnet and can change the position of the magnet. 如請求項1所述之真空磁石調整機構，其中：該氣密座係包含有一導入件及一旋固件；該導入件係具有一檔止部及一桿部，該導入件中央並具有一貫孔，該貫孔貫穿該擋止部及該桿部；該旋固件係組設於該桿部上，該擋止不與該旋固件係密封該穿孔兩側。 The vacuum magnet adjustment mechanism as described in claim 1, wherein: the airtight seat system includes an introduction piece and a screw; the introduction piece has a stopper and a rod part, and the introduction piece has a through hole in the center , the through hole penetrates the stopper part and the rod part; the screw part is assembled on the rod part, and the stopper and the screw part seal both sides of the through hole. 如請求項1所述之真空磁石調整機構，其中：該真空裝置設有一開口，該開口上固設有一板材，該板材上設置有該穿孔。 The vacuum magnet adjustment mechanism as claimed in claim 1, wherein: the vacuum device is provided with an opening, a plate is fixed on the opening, and the perforation is provided on the plate. 如請求項1所述之真空磁石調整機構，其中：該轉動部之分度頭上凹設有一連接槽，該調整桿相對設置有一接頭；該接頭係插設於該連接槽內。 The vacuum magnet adjustment mechanism as claimed in claim 1, wherein: a connecting groove is recessed on the indexing head of the rotating part, and a joint is provided opposite the adjusting rod; the joint is inserted into the connecting groove.
TW110124665A 2021-07-05 2021-07-05 Vacuum magnet adjustment mechanism TWI824266B (en)

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TWI824266B true TWI824266B (en) 2023-12-01

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN205473964U (en) * 2016-01-19 2016-08-17 河南康耀电子股份有限公司 Magnetic field intensity adjustable magnetron sputtering device
CN111536339A (en) * 2020-05-08 2020-08-14 温州精宏阀门管件有限公司 Flange

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN205473964U (en) * 2016-01-19 2016-08-17 河南康耀电子股份有限公司 Magnetic field intensity adjustable magnetron sputtering device
CN111536339A (en) * 2020-05-08 2020-08-14 温州精宏阀门管件有限公司 Flange

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