TWI824051B - Laser cutting processing method of polarized optical functional film laminate - Google Patents
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/0006—Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Polarising Elements (AREA)
- Laser Beam Processing (AREA)
Abstract
為了提供一種切割加工方法，其是將含有偏光薄膜作為最小的構成要素之偏光性光學功能薄膜積層體進行雷射切割，該偏光薄膜是在偏光元件之至少單側積層有保護薄膜。 雷射切割加工方法，係將至少具有偏光薄膜之偏光性光學功能薄膜積層體進行雷射切割加工，該偏光薄膜是在偏光元件之至少單側積層有保護薄膜，將與偏光性光學功能薄膜積層體為不同個體之薄片材重疊配置在偏光性光學功能薄膜積層體之一面，從偏光性光學功能薄膜積層體之位於與薄片材相反側之另一面沿該偏光性光學功能薄膜積層體之厚度方向照射雷射，讓雷射的照射位置在積層體之面內沿著既定形狀移動而進行雷射切割處理，藉此將偏光性光學功能薄膜積層體切割成既定形狀，薄片材，在雷射照射之下，藉由雷射能量使存在於厚度方向的一部分之薄片材成分成為飛濺物而讓其飛散，使該薄片材成分之飛濺物的至少一部分堆積在形成於偏光性光學功能薄膜積層體的偏光元件之雷射切割端面，使至少含有薄片材成分之被覆層形成為覆蓋偏光元件之雷射切割端面。In order to provide a cutting processing method, a polarizing optical functional film laminate containing a polarizing film as a minimum component and a protective film laminated on at least one side of the polarizing element is laser cut. The laser cutting processing method involves laser cutting a laminate of polarizing optically functional films having at least a polarizing film with a protective film laminated on at least one side of the polarizing element and laminating the polarizing optically functional film. Different individual thin sheets are overlapped and arranged on one side of the polarizing optical functional film laminate. From the other side of the polarizing optical functional film laminate on the opposite side to the thin sheet, the thickness direction of the polarizing optical functional film laminate is Irradiate the laser, move the laser irradiation position along the predetermined shape within the surface of the laminated body, and perform laser cutting processing to cut the polarizing optical functional film laminated body into a predetermined shape and thin sheet. Next, a part of the thin sheet component existing in the thickness direction is caused to become spatter and scattered by laser energy, and at least a part of the spatter of the thin sheet component is deposited on the polarized optical functional film laminate formed. The laser-cut end surface of the polarizing element forms a coating layer containing at least a thin sheet component to cover the laser-cut end surface of the polarizing element.
Description
本發明是關於偏光性光學功能薄膜積層體之雷射切割加工方法。更具體的說是關於，將偏光性光學功能薄膜積層體以不限於矩形形狀而具有曲線狀的緣部或孔等之所期望的形狀的方式實施雷射切割加工之方法，該偏光性光學功能薄膜積層體至少具有：在偏光元件之至少單側積層有保護薄膜之偏光薄膜。實施雷射切割加工後之偏光性光學功能薄膜積層體、或其一部分之偏光薄膜，之後，可搭載於液晶顯示裝置、有機EL顯示裝置等之光學顯示設備、或可貼合於電漿顯示面板(PDP)等的光學顯示面板而被使用。The present invention relates to a laser cutting processing method for a polarizing optical functional film laminate. More specifically, it relates to a method of laser cutting a polarizing optical functional film laminate so that it is not limited to a rectangular shape but has a desired shape such as a curved edge or a hole, and the polarizing optical functional film laminate has a desired shape. The thin film laminated body at least has a polarizing film in which a protective film is laminated on at least one side of the polarizing element. The polarizing optical functional film laminate or a part of the polarizing film after laser cutting can be mounted on optical display devices such as liquid crystal display devices and organic EL display devices, or can be bonded to plasma display panels. (PDP) and other optical display panels.
近年，在汽車之儀表顯示部、智慧手錶、智慧眼鏡(goggles)、智慧型手機、筆記型電腦、平板電腦(NotePad)、甚至監視器等之許多種類的圖像顯示裝置中，是使用偏光性光學功能薄膜積層體、或其一部分之偏光薄膜。此外，在這些圖像顯示裝置中，基於其設計性的觀點，要求將這些偏光薄膜等不限於矩形形狀而加工成曲線形狀、缺口(notch)形狀、或具有孔的形狀等之各種形狀，為了滿足這樣的要求，使用包含湯姆遜刀(thomson die)及蝕刻刀(pinnacle die)之刀模來進行之衝切(punching)加工、使用平面銑刀(fullback)及端銑刀之端面加工、以及使用雷射光之雷射切割加工等的方法已被提出(例如，參照專利文獻1)。In recent years, polarizing films have been used in many types of image display devices such as automobile instrument displays, smart watches, smart glasses (goggles), smartphones, notebook computers, tablet computers (NotePad), and even monitors. Optical functional film laminate, or a polarizing film that is a part of it. In addition, in these image display devices, from the viewpoint of their design, it is required that these polarizing films and the like are not limited to rectangular shapes but can be processed into various shapes such as curved shapes, notch shapes, or shapes with holes. To meet such requirements, punching processing is performed using dies including Thomson die and pinnacle die, end face processing is performed using fullback and end mills, and Methods such as laser cutting processing using laser light have been proposed (for example, see Patent Document 1).
再者，最近，基於欲將圖像顯示裝置之顯示部最大化的要求，將邊框部的寬度縮窄的設計逐漸成為主流，對於以所期望形狀實施切割加工後之偏光薄膜的切割端部之品質要求及尺寸精度要求則變得越來越嚴格。Furthermore, recently, based on the requirement to maximize the display area of the image display device, the design of narrowing the width of the frame portion has gradually become mainstream. For the cut end portion of the polarizing film that has been cut into a desired shape, Quality requirements and dimensional accuracy requirements are becoming more and more stringent.
另一方面，因為前述般之搭載偏光薄膜之圖像顯示裝置的用途變廣泛，在高溫高濕環境等被長時間利用的情況也變多，在這樣的環境下，會發生水分從被施加熱負荷之偏光薄膜的切割端面出入的現象。一般而言，偏光元件之主流形式，是讓碘含浸於以PVA為基體之樹脂材料所構成之拉伸薄膜而形成PVA-多碘離子錯合物，藉此顯現偏光性能，若這樣的PVA-碘系偏光元件之切割端面曝露於高溫多濕環境，受到從該切割端面出入之水分的影響，使PVA薄膜內之PVA-多碘離子錯合物變質，變得帶有流動性而洩漏到外部(脫色)，造成端部之偏光功能減損，而發生與品質相關的課題。以下，在本說明書，將此現象稱為「消偏光」。On the other hand, as the above-mentioned image display devices equipped with polarizing films have become more widely used, they are often used for long periods of time in high-temperature and high-humidity environments. In such environments, moisture may escape from the applied heat. The phenomenon that the cut end face of the loaded polarizing film comes in and out. Generally speaking, the mainstream form of polarizing elements is to impregnate iodine into a stretched film composed of a resin material based on PVA to form a PVA-polyiodide ion complex, thereby displaying polarizing properties. If such PVA- The cut end face of the iodine-based polarizing element is exposed to a high temperature and humid environment, and is affected by the moisture entering and leaving the cut end face, causing the PVA-polyiodide ion complex in the PVA film to deteriorate, become fluid and leak to the outside. (Discoloration), resulting in loss of polarizing function at the end, resulting in quality-related issues. Hereinafter, in this specification, this phenomenon is called "depolarization".
為了解決上述課題，將以所期望形狀實施切割加工後之偏光薄膜的外周切割面藉由樹脂被膜被覆的手法已被提出(專利文獻2)。在該專利文獻2所提出的手法，為了形成被膜，必須將讓樹脂溶解於溶媒而成之溶液藉由輥塗布機(roll coater)等塗布於偏光薄膜之切割面並讓其乾燥，製造工序長且變得煩雜，且會引發製造成本增大之另外的問題。此外，專利文獻3，是藉由使配置在偏光元件的表背兩面之保護層形成為比偏光元件更大，而在該等保護層之間設置溝槽狀的間隙，並在該間隙填充密封材。該方法也是，與專利文獻2的情況同樣的，製造工序長且變得煩雜。再者，對於被切割加工成外周呈非直線形狀(包含曲線)之偏光薄膜的切割端面，採用輥塗布機或狹縫型模頭塗布機(slot die coater)般之普遍的塗布手段來形成被膜的情況，必須將在塗布機之液吐出部和偏光薄膜的切割端面之間的間隙(gap)均一地確保，但如此般的間隙調整非常困難，要將厚度均一的被膜形成於切割端面是困難的。此外，關於樹脂被膜的形成，也能考慮使用噴塗機，但在該方法，是使用將樹脂材料溶解於有機溶媒而成的溶液作為塗布液，在此情況，塗布液可能會滲透到多層結構之偏光薄膜的層間，起因於滲透到層間之塗布液會發生層間黏著力降低的問題。此外，在該手法，起因於塗布液所含之稀釋用有機溶媒，還會發生偏光薄膜之構成基材被侵蝕的問題。為了避免該問題，雖可考慮使用無溶劑系的UV硬化樹脂進行噴塗，在此情況，用於形成被膜的材料受到限定，而且因為黏度比稀釋液高而使薄膜形成變困難，被膜的厚度變成會對被切割加工成非直線形狀之製品的尺寸精度造成影響的程度。 雖還有像噴墨印刷或定量吐出裝置(dispenser)方式那樣之沿著切割加工形狀之滴下塗布方法存在，藉由這種方法也是，被膜的薄型化是困難的，且會產生隨著被膜形成而在偏光薄膜表層上之飛濺物污染等的問題，技術上難以運用。 又一般而言，光學薄膜是在單側或兩側具有：在構裝於裝置(device)時被剝離之表面保護薄膜及剝離襯墊(release liner)，若在如此般構成之光學薄膜的切割加工端部形成專利文獻2所教示的被膜，因為在表面保護薄膜及剝離襯墊之切割端面也會同時形成被膜，表面保護薄膜及剝離襯墊的切割端面和光學薄膜的切割端面變成藉由被覆切割端部之被膜而互相固定的狀態，要讓表面保護薄膜及剝離襯墊剝離變得困難。此外，若欲將表面保護薄膜及剝離襯墊勉強剝離，會產生在切割加工端部所形成的被膜從光學薄膜脫落的問題。再者，脫落後之被膜的一部分在製造工序中成為異物污染的原因之問題也會產生。In order to solve the above problems, a method has been proposed in which the outer peripheral cut surface of a polarizing film cut into a desired shape is covered with a resin coating (Patent Document 2). In the method proposed in Patent Document 2, in order to form a film, a solution in which resin is dissolved in a solvent must be applied to the cut surface of the polarizing film using a roll coater or the like and allowed to dry, which requires a long manufacturing process. And it becomes complicated, and will cause other problems such as increased manufacturing costs. In addition, Patent Document 3 makes the protective layers arranged on the front and back sides of the polarizing element larger than the polarizing element, provides a groove-shaped gap between the protective layers, and fills and seals the gap. material. In this method, as in the case of Patent Document 2, the manufacturing process is long and complicated. Furthermore, for the cut end surface of the polarizing film that has been cut into a non-linear shape (including a curve) on the outer circumference, a coating is formed using a common coating method such as a roll coater or a slot die coater. In this case, it is necessary to ensure a uniform gap between the liquid discharge part of the coater and the cut end surface of the polarizing film. However, such gap adjustment is very difficult, and it is difficult to form a film with a uniform thickness on the cut end surface. of. In addition, regarding the formation of the resin film, it is also possible to consider using a spray coating machine. However, in this method, a solution in which the resin material is dissolved in an organic solvent is used as the coating liquid. In this case, the coating liquid may penetrate into the multi-layer structure. Between the layers of polarizing films, the problem of reduced interlayer adhesion occurs due to the coating liquid penetrating into the layers. In addition, with this method, there is a problem that the base material constituting the polarizing film is corroded due to the diluting organic solvent contained in the coating liquid. In order to avoid this problem, spray coating using solvent-free UV curable resin can be considered. In this case, the material used to form the film is limited, and the viscosity is higher than that of the diluent, making it difficult to form a film, and the thickness of the film becomes The extent to which it will affect the dimensional accuracy of products that are cut into non-linear shapes. Although there are drop coating methods along the cut processing shape such as inkjet printing or quantitative discharge device (dispenser) method, it is difficult to make the film thinner by this method, and it will cause the film to form. However, problems such as spatter contamination on the surface of the polarizing film make it technically difficult to apply. Generally speaking, an optical film has on one side or both sides: a surface protection film and a release liner that are peeled off when it is installed on a device. If the optical film constructed in this way is cut The film taught in Patent Document 2 is formed on the processed end portion because the film is also formed on the cut end surfaces of the surface protection film and release liner at the same time. The cut end surfaces of the surface protection film and release liner and the cut end surface of the optical film become coated The film at the cut ends is fixed to each other, making it difficult to peel off the surface protective film and release liner. In addition, if the surface protective film and the release liner are forcibly peeled off, there is a problem that the film formed at the cutting end portion is peeled off from the optical film. Furthermore, a problem may arise in which a part of the peeled-off film becomes a source of foreign matter contamination during the manufacturing process.
雖也能考慮採用蒸鍍、CVD(Chemical Vapor Deposition)等之所謂真空乾式塗布法，蒸鍍是以金屬成分的被膜形成為主要對象，原理上難以進行有機膜的成膜，又關於CVD，雖可將有機物單體封入反應爐，藉由電漿CVD法等進行成膜，因為進行厚度100nm以上的成膜過度耗費時間，其生產性低，現實上難以運用。Although so-called vacuum dry coating methods such as evaporation and CVD (Chemical Vapor Deposition) can also be considered, evaporation mainly focuses on the formation of a film of metal components, and it is difficult to form an organic film in principle. Regarding CVD, although Organic monomers can be sealed in a reactor and film-formed by plasma CVD or the like. However, film formation with a thickness of 100 nm or more is too time-consuming and has low productivity, making it difficult to use in practice.
此外，藉由採用使用具有紅外線波長的雷射光之切割加工方法，讓偏光薄膜之一構成要素之保護薄膜熔融，利用該熔融物來形成覆蓋偏光元件的切割端面之被覆層，藉此讓切割加工端面的可靠性提高，此方法也已被提出(專利文獻4)。該文獻所教示的，是利用切割時的熱讓由原來是低透濕度的材料所形成之保護薄膜熔融，藉由該熔融物來被覆雷射切割加工後之偏光元件端面。在專利文獻4敘述，依據該方法，能讓偏光薄膜加工端部在高溫高濕環境下的可靠性提高。依據該方法，因為在雷射切割加工的同時可形成被覆層，可省略形狀加工後之外周塗布工序。In addition, by adopting a cutting processing method using laser light with an infrared wavelength, the protective film, which is a component of the polarizing film, is melted, and the melt is used to form a coating layer covering the cut end surface of the polarizing element, thereby allowing the cutting process to be completed This method has also been proposed to improve the reliability of the end face (Patent Document 4). What this document teaches is to use the heat during cutting to melt a protective film formed of a material with low moisture permeability, and use the melt to cover the end surface of the polarizing element after laser cutting. Patent Document 4 describes that according to this method, the reliability of the processed end portion of the polarizing film can be improved in a high-temperature and high-humidity environment. According to this method, since the coating layer can be formed simultaneously with the laser cutting process, the outer peripheral coating process after the shape processing can be omitted.
再者，在雷射切割加工中，準備了將長條的光學積層體呈卷狀地捲繞而成之光學積層體卷，該長條的光學積層體是由長條的光學薄膜和積層於該光學薄膜的兩面之保護薄片所構成，一邊從該光學積層體卷將光學積層體放出，一邊對光學積層體進行雷射切割加工處理，此方法也已被提出(專利文獻5)。依據該專利文獻5的教示，在光學薄膜的兩面所積層之保護薄片當中，能讓位於下側的保護薄片發揮作為搬運基材的功能。在此情況可理解，對於下側的保護薄片，是進行利用雷射照射之半切割(half cut)。 [先前技術文獻] [專利文獻]Furthermore, in the laser cutting process, an optical laminate roll is prepared by winding a long optical laminate made of a long optical film and a roll into a roll. A method has also been proposed in which the optical film is composed of protective sheets on both sides, and the optical laminate is subjected to laser cutting processing while unloading the optical laminate from the optical laminate roll (Patent Document 5). According to the teaching of Patent Document 5, among the protective sheets laminated on both sides of the optical film, the protective sheet located on the lower side can be allowed to function as a transportation base material. In this case, it can be understood that the protective sheet on the lower side is half cut by laser irradiation. [Prior technical literature] [Patent Document]
[專利文獻1]日本特開2018-22140號公報 [專利文獻2]日本特開平8-146219號公報 [專利文獻3]日本實公平7-34415號公報 [專利文獻4]日本特許5558026號公報 [專利文獻5]日本特開2017-207585號公報[Patent Document 1] Japanese Patent Application Publication No. 2018-22140 [Patent Document 2] Japanese Patent Application Laid-Open No. 8-146219 [Patent Document 3] Japanese Public Notice No. 7-34415 [Patent Document 4] Japanese Patent No. 5558026 [Patent Document 5] Japanese Patent Application Publication No. 2017-207585
[發明所欲解決之問題][Problem to be solved by the invention]
然而，縱使是採用專利文獻4所教示的方法，藉由僅由來自設置於偏光元件的一面之保護薄膜的熔融物所構成的被膜，難以對偏光元件之切割端面提供充分保護的功能。其理由在於，構成偏光薄膜之偏光元件及保護薄膜的厚度有很多種，來自設置於偏光元件的一面之保護薄膜的熔融物之體積，並無法保證所形成的被膜之寬度可在偏光元件的厚度全體將偏光元件的切割面充分覆蓋，且其厚度可充分阻止來自切割端面之水分的透過。However, even if the method taught in Patent Document 4 is adopted, it is difficult to provide sufficient protection for the cut end surface of the polarizing element with a film composed only of a melt from the protective film provided on one side of the polarizing element. The reason is that there are many thicknesses of the polarizing element and the protective film that make up the polarizing film. The volume of the melt from the protective film placed on one side of the polarizing element cannot guarantee that the width of the film formed can be within the thickness of the polarizing element. The entire body fully covers the cut surface of the polarizing element, and its thickness can fully prevent the penetration of moisture from the cut end surface.
專利文獻4是教示，將偏光元件之保護薄膜藉由既定之低透濕度的樹脂材料來形成，縱使是採用這樣的材料，並無法保證在偏光薄膜之雷射切割加工時所產生之來自保護薄膜的熔融物量足以形成覆蓋偏光元件的切割端面之被膜，且難以形成其厚度可充分阻止來自切割端面的水分透過之被膜。 如此般，依據先前提出之上述手法，並無法獲得可滿足針對來自偏光元件切割端面的脫色所致之「消偏光」之近年嚴格的品質要求之偏光薄膜。 [解決問題之技術手段]Patent Document 4 teaches that the protective film of the polarizing element is formed of a predetermined low moisture permeability resin material. Even if such a material is used, there is no guarantee that the protective film will be generated during the laser cutting process of the polarizing film. The amount of molten material is sufficient to form a film covering the cut end surface of the polarizing element, and it is difficult to form a film with a thickness that can sufficiently prevent the penetration of moisture from the cut end surface. In this way, it is impossible to obtain a polarizing film that meets the stringent quality requirements in recent years regarding "depolarization" caused by discoloration of the cut end face of the polarizing element according to the above-mentioned methods previously proposed. [Technical means to solve problems]
本發明人等，認識到先前技術之上述問題，為了解決該問題而反覆苦心探討的結果發現了以下現象，亦即，在至少具有偏光薄膜之偏光性光學功能薄膜積層體中，該偏光薄膜是在偏光元件之至少單側積層有保護薄膜，將與該偏光性光學功能薄膜積層體為不同個體之薄片材重疊配置在該偏光性光學功能薄膜積層體之一面，從該偏光性光學功能薄膜積層體之位於與薄片材相反側之另一面沿該偏光性光學功能薄膜積層體之厚度方向照射雷射，讓雷射的照射位置在該積層體之面內沿著既定形狀移動而進行雷射切割處理，藉此將該偏光性光學功能薄膜積層體切割成既定形狀，在該雷射照射之下，藉由雷射能量使存在於厚度方向的一部分之薄片材成分成為飛濺物而讓其飛散，使該薄片材成分之飛濺物的至少一部分堆積在形成於偏光性光學功能薄膜積層體的偏光元件之雷射切割端面，使至少含有該薄片材成分之被覆層形成為覆蓋偏光元件之雷射切割端面。利用該現象，想到了在偏光薄膜之切割端面形成抑制水分透過之保護被膜。如此般所形成之被膜，能將高溫高濕環境下之偏光薄膜切割端面的保護功能提高，而使偏光薄膜的可靠性提高。The inventors of the present invention recognized the above-mentioned problems of the prior art, and as a result of repeated studies to solve the problems, they discovered the following phenomenon. That is, in a polarizing optical functional film laminate having at least a polarizing film, the polarizing film is A protective film is laminated on at least one side of the polarizing element, and a thin sheet that is different from the polarizing optical functional film laminated body is overlapped and arranged on one side of the polarizing optical functional film laminated body, and the polarizing optical functional film laminated body is laminated from The other surface of the body opposite to the sheet is irradiated with laser along the thickness direction of the polarizing optical functional film laminate, and the laser irradiation position is moved along the predetermined shape within the surface of the laminate to perform laser cutting. Processing whereby the polarizing optically functional film laminate is cut into a predetermined shape, and under the laser irradiation, a part of the sheet component existing in the thickness direction is caused to become spatter and scattered by the laser energy, At least part of the spatter of the thin sheet component is deposited on the laser-cut end surface of the polarizing element formed in the polarizing optical functional film laminate, and a coating layer containing at least the thin sheet component is formed to cover the laser cutting element. End face. Taking advantage of this phenomenon, it is thought to form a protective film on the cut end surface of the polarizing film to inhibit moisture penetration. The film formed in this way can improve the protection function of the cut end face of the polarizing film in a high temperature and high humidity environment, thereby improving the reliability of the polarizing film.
亦即，本發明提供一種切割加工方法，其是將含有偏光薄膜作為最小的構成要素之偏光性光學功能薄膜積層體進行雷射切割，該偏光薄膜是在偏光元件之至少單側積層有保護薄膜。 本發明的一態樣之偏光薄膜之雷射切割加工方法，係將至少具有偏光薄膜之偏光性光學功能薄膜積層體進行雷射切割加工，該偏光薄膜是在偏光元件之至少單側積層有保護薄膜，將與前述偏光性光學功能薄膜積層體為不同個體之薄片材重疊配置在前述偏光性光學功能薄膜積層體之一面，從前述偏光性光學功能薄膜積層體之位於與前述薄片材相反側之另一面沿該偏光性光學功能薄膜積層體之厚度方向照射雷射，讓雷射的照射位置在前述積層體之面內沿著既定形狀移動而進行雷射切割處理，藉此將前述偏光性光學功能薄膜積層體切割成前述既定形狀，前述薄片材，在前述雷射照射之下，藉由雷射能量使存在於厚度方向的一部分之薄片材成分成為飛濺物而讓其飛散，使該薄片材成分之飛濺物的至少一部分堆積在形成於前述偏光性光學功能薄膜積層體的前述偏光元件之雷射切割端面，使至少含有前述薄片材成分之被覆層形成為覆蓋前述偏光元件之前述雷射切割端面。 [發明之效果]That is, the present invention provides a cutting processing method, which involves laser cutting a polarizing optical functional film laminate containing a polarizing film as a minimum component with a protective film laminated on at least one side of the polarizing element. . A method for laser cutting a polarizing film according to one aspect of the present invention involves laser cutting a laminate of polarizing optically functional films having at least a polarizing film, which is laminated with protection on at least one side of a polarizing element. The film is a thin sheet that is different from the polarizing optical functional film laminated body and is overlapped and arranged on one side of the polarizing optical functional film laminated body, from the side of the polarizing optical functional film laminated body on the opposite side to the aforementioned thin sheet. The other surface is irradiated with a laser along the thickness direction of the polarizing optical functional film laminate, and the laser irradiation position is moved along a predetermined shape within the surface of the laminate to perform a laser cutting process, thereby cutting the polarizing optical functional film. The functional thin film laminate is cut into the aforementioned predetermined shape, and the aforementioned thin sheet is irradiated with the aforementioned laser. The laser energy causes a part of the thin sheet component existing in the thickness direction to become spatter and scatter it, so that the thin sheet is At least part of the spatter of the component is deposited on the laser-cut end surface of the polarizing element formed in the polarizing optical functional film laminate, so that a coating layer containing at least the sheet component is formed to cover the polarizing element before laser cutting. End face. [Effects of the invention]
依據本發明，在偏光性光學功能薄膜積層體等的形狀加工中，於雷射切割加工的同時，能將有助於高溫高濕環境下的可靠性提高之被覆層形成於偏光薄膜之切割端面。According to the present invention, in the shape processing of polarizing optical functional film laminates and the like, a coating layer that contributes to improved reliability in high-temperature and high-humidity environments can be formed on the cut end surface of the polarizing film simultaneously with the laser cutting process. .
以下，根據實施形態對本發明做更詳細地說明，本發明並不限定於該等的實施形態。Hereinafter, the present invention will be described in more detail based on embodiments, but the present invention is not limited to these embodiments.
(偏光性光學功能薄膜積層體) 圖1係顯示在本發明的一實施形態之雷射切割加工方法可使用之偏光性光學功能薄膜積層體的一例之概略剖面圖。偏光性光學功能薄膜積層體1至少含有偏光薄膜12，又雖不限定於這些，但可含有表面處理層13、表面保護薄膜14及污染對策薄膜23作為任意的要素。 偏光性光學功能薄膜積層體1亦可進一步透過黏著劑層15來貼合剝離襯墊16。以下，將設有黏著劑層15及剝離襯墊16之偏光性光學功能薄膜積層體1用符號「1A」表示，以該偏光性光學功能薄膜積層體1A為例進行說明。(Polarized optical functional film laminate) FIG. 1 is a schematic cross-sectional view showing an example of a polarizing optical functional film laminate that can be used in the laser cutting processing method according to one embodiment of the present invention. The polarizing optically functional film laminate 1 contains at least the polarizing film 12, but is not limited to these and may contain a surface treatment layer 13, a surface protection film 14, and a contamination prevention film 23 as optional elements. The polarizing optical functional film laminate 1 may further be bonded to a release liner 16 through the adhesive layer 15 . In the following, the polarizing optical functional film laminate 1 provided with the adhesive layer 15 and the release liner 16 is represented by a symbol "1A", and the polarizing optical functional film laminate 1A will be described as an example.
通常，如圖1所示般，偏光薄膜12主要是由偏光元件10、及積層於該偏光元件10之一方或兩方的主面之保護薄膜11所構成，但亦可進一步積層：相位差薄膜、增亮薄膜、視角補償薄膜等之展現光學功能之其他光學功能薄膜。在這樣的情況，包含該等光學功能薄膜之積層體是構成偏光薄膜12。此外，圖1雖顯示在偏光元件10之兩方的主面積層有保護薄膜11a、11b的例子，但僅在一方的主面積層有保護薄膜11亦可。Usually, as shown in FIG. 1 , the polarizing film 12 is mainly composed of a polarizing element 10 and a protective film 11 laminated on one or both main surfaces of the polarizing element 10 . However, a phase difference film can also be further laminated. , brightness enhancement film, viewing angle compensation film and other optical functional films that display optical functions. In this case, the laminated body including these optically functional films constitutes the polarizing film 12 . In addition, although FIG. 1 shows an example in which the protective films 11a and 11b are layered on both main areas of the polarizing element 10, the protective film 11 may be layered on only one main area.
偏光元件10是由樹脂薄膜所構成。作為該樹脂薄膜，可採用任意之適切的樹脂，通常是使用聚乙烯醇系樹脂(以下稱為：PVA系樹脂)。作為PVA系樹脂，例如可列舉：聚乙烯醇、乙烯-乙烯醇共聚物。乙烯-乙烯醇共聚物，是藉由將乙烯-醋酸乙烯共聚物皂化而獲得。PVA系樹脂之皂化度，通常為85莫耳%~100莫耳%，較佳為95.0莫耳%以上，更佳為99.0莫耳%以上，特佳為99.93莫耳%以上。皂化度可依JIS K 6726-1994來求出。藉由採用如此般皂化度的PVA系樹脂，可獲得耐久性優異之偏光元件10。The polarizing element 10 is made of a resin film. As the resin film, any appropriate resin can be used, but polyvinyl alcohol-based resin (hereinafter referred to as PVA-based resin) is usually used. Examples of the PVA-based resin include polyvinyl alcohol and ethylene-vinyl alcohol copolymer. Ethylene-vinyl alcohol copolymer is obtained by saponifying ethylene-vinyl acetate copolymer. The saponification degree of PVA resin is usually 85 mol% to 100 mol%, preferably 95.0 mol% or more, more preferably 99.0 mol% or more, and particularly preferably 99.93 mol% or more. The saponification degree can be determined according to JIS K 6726-1994. By using a PVA-based resin with such a degree of saponification, the polarizing element 10 with excellent durability can be obtained.
構成偏光元件10之PVA系樹脂，藉由慣用的手法，實施膨潤處理、拉伸處理、使用二色性物質(典型代表為碘)之染色處理、交聯處理、洗淨處理、乾燥處理等之各種處理，成為可作為偏光元件來使用的狀態。各個處理之次數、順序、時間等，可適宜地設定。PVA系樹脂，亦可為以塗膜層的形式形成於另外的基材上之薄膜，藉由對該薄膜實施上述各處理來形成。拉伸處理之拉伸方向，相當於所獲得的偏光元件之吸收軸方向。基於獲得優異的偏光特性之觀點， PVA系樹脂通常被單軸拉伸成3倍~7倍。The PVA-based resin constituting the polarizing element 10 is subjected to swelling treatment, stretching treatment, dyeing treatment using a dichroic substance (typically iodine), cross-linking treatment, cleaning treatment, drying treatment, etc. by conventional techniques. After various treatments, it becomes a state that can be used as a polarizing element. The number, order, time, etc. of each process can be set appropriately. The PVA-based resin may be a thin film formed as a coating layer on another base material, and may be formed by subjecting the thin film to each of the above-mentioned processes. The stretching direction of the stretching process is equivalent to the absorption axis direction of the obtained polarizing element. From the viewpoint of obtaining excellent polarizing characteristics, PVA-based resin is usually uniaxially stretched 3 to 7 times.
作為PVA系樹脂薄膜，可適宜地使用：藉由將溶解於水或有機溶媒之原液進行流延成膜之流延法、鑄造(cast)法、擠出法等之任意方法所成膜者。As the PVA-based resin film, a film formed by any method such as a casting method, a casting method, an extrusion method, etc., in which a raw solution dissolved in water or an organic solvent is cast and formed into a film can be suitably used.
PVA系樹脂之平均聚合度，可按照目的適切地選擇。平均聚合度，通常為1000~10000，較佳為1200~6000，更佳為2000~5000。又平均聚合度，可依JIS K 6726-1994來求出。The average degree of polymerization of PVA resin can be appropriately selected according to the purpose. The average degree of polymerization is usually 1,000~10,000, preferably 1,200~6,000, more preferably 2,000~5,000. The average degree of polymerization can be determined according to JIS K 6726-1994.
在構成偏光元件10之樹脂薄膜，代表性的，是讓二色性物質含浸。作為二色性物質，例如可列舉：碘、有機染料等。其等可單獨地使用，或將二種以上組合使用。作為二色性物質，較佳為使用碘。The resin film constituting the polarizing element 10 is typically impregnated with a dichroic substance. Examples of dichroic substances include iodine, organic dyes, and the like. These can be used individually or in combination of 2 or more types. As the dichroic substance, iodine is preferably used.
作為有機染料，例如可使用：紅BR、紅LR、紅R、粉紅LB、洋紅BL、波爾多紅GS、天藍LG、檸檬黃、藍BR、藍2R、深藍RY、綠LG、紫LB、紫B、黑H、黑B、黑GSP、黃3G、黃R、橙LR、橙3R、深紅GL、深紅KGL、剛果紅、寶石紫BK、活性藍G、活性藍GL、活性橙GL、直接天藍、直接耐曬橙S、耐曬黑等。這些二色性物質，可僅單獨使用一種，也能將二種以上並用。As organic dyes, for example, red BR, red LR, red R, pink LB, magenta BL, Bordeaux red GS, sky blue LG, lemon yellow, blue BR, blue 2R, dark blue RY, green LG, purple LB, purple B , Black H, Black B, Black GSP, Yellow 3G, Yellow R, Orange LR, Orange 3R, Crimson GL, Crimson KGL, Congo Red, Ruby Violet BK, Active Blue G, Active Blue GL, Active Orange GL, Direct Sky Blue, Direct sunfast orange S, sunfast black, etc. Only one type of these dichroic substances may be used alone, or two or more types may be used in combination.
偏光元件10的厚度，可設定成任意的適切值。實用之偏光元件的厚度為5μm~30μm。The thickness of the polarizing element 10 can be set to any appropriate value. The thickness of practical polarizing elements is 5μm~30μm.
偏光元件10的特性較佳為，在波長380nm~780nm的範圍顯現吸收二色性。偏光元件10的單體透過率(Ts)，一般為43%以上。單體透過率之理論上的上限為50%，實用的上限為46%。此外，單體透過率(Ts)，是根據JIS Z8701，藉由2度視野(C光源)所測定並進行視感度校正後之Y值，例如能使用分光光度計(日本分光製，V7100)進行測定。偏光元件10的偏光度，一般為99.9%以上。The characteristic of the polarizing element 10 is preferably to exhibit absorption dichroism in the wavelength range of 380 nm to 780 nm. The single transmittance (Ts) of the polarizing element 10 is generally 43% or more. The theoretical upper limit of monomer transmittance is 50%, and the practical upper limit is 46%. In addition, the single transmittance (Ts) is the Y value measured with a 2-degree field of view (C light source) according to JIS Z8701 and corrected for visual sensitivity. For example, it can be measured using a spectrophotometer (JASCO, V7100) Determination. The polarization degree of the polarizing element 10 is generally above 99.9%.
作為形成保護薄膜11a、11b的材料，例如可列舉：二醋酸纖維素、三醋酸纖維素(TAC)等的纖維素系樹脂，(甲基)丙烯酸系樹脂、環烯系樹脂、聚丙烯等的烯烴系樹脂，聚對苯二甲酸乙二酯系樹脂等的酯系樹脂，聚醯胺系樹脂，聚碳酸酯系樹脂，及其等的共聚物樹脂等。又「(甲基)丙烯酸系樹脂」是指：丙烯酸系樹脂及/或甲基丙烯酸系樹脂。 保護薄膜11a、11b的厚度，通常是選定在10μm~200μm的範圍內之任意值。 又這些材料及厚度等，在保護薄膜11a和保護薄膜11b之間，是相同或不同皆可。Examples of materials forming the protective films 11a and 11b include cellulose-based resins such as cellulose diacetate and cellulose triacetate (TAC), (meth)acrylic-based resins, cycloolefin-based resins, and polypropylene. Olefin resins, ester resins such as polyethylene terephthalate resins, polyamide resins, polycarbonate resins, and copolymer resins thereof, etc. Furthermore, "(meth)acrylic resin" means acrylic resin and/or methacrylic resin. The thickness of the protective films 11a and 11b is usually selected to be any value within the range of 10 μm to 200 μm. These materials, thicknesses, etc. may be the same or different between the protective film 11a and the protective film 11b.
保護薄膜11a、11b的各個，代表性的，是在偏光元件10之主面的各個，透過黏著劑層(未圖示)進行積層。作為構成黏著劑層之黏著劑，可使用任意之適切的黏著劑。例如可使用：水系黏著劑、溶劑系黏著劑、活性能量線硬化型黏著劑等。作為水系黏著劑，較佳為使用含有PVA系樹脂之黏著劑。 在保護薄膜11a、11b，可含有任意之適切的添加劑1種以上。作為添加劑，例如可列舉：紫外線吸收劑、抗氧化劑、潤滑劑、可塑劑、脫模劑、著色防止劑、難燃劑、成核劑、抗靜電劑、顏料、著色劑等。Each of the protective films 11a and 11b is typically laminated on each main surface of the polarizing element 10 through an adhesive layer (not shown). As the adhesive constituting the adhesive layer, any appropriate adhesive can be used. For example, water-based adhesives, solvent-based adhesives, active energy ray-hardening adhesives, etc. can be used. As the water-based adhesive, it is preferable to use an adhesive containing PVA-based resin. The protective films 11a and 11b may contain one or more types of any appropriate additives. Examples of additives include ultraviolet absorbers, antioxidants, lubricants, plasticizers, release agents, coloration inhibitors, flame retardants, nucleating agents, antistatic agents, pigments, colorants, and the like.
在保護薄膜11a、11b各個之與偏光元件10為相反側的面，可實施硬塗層(hard coating)處理、抗反射處理、或以擴散及防眩光為目的的處理，而形成表面處理層13。在圖1所示的實施形態，是僅在積層於偏光元件10之一方的主面之保護薄膜11a形成表面處理層13的例子。The surfaces of the protective films 11a and 11b opposite to the polarizing element 10 may be subjected to hard coating treatment, anti-reflection treatment, or treatment for the purpose of diffusion and anti-glare to form the surface treatment layer 13 . In the embodiment shown in FIG. 1 , the surface treatment layer 13 is formed only on the protective film 11 a laminated on one main surface of the polarizing element 10 .
表面保護薄膜14，當形成有表面處理層13的情況，是透過表面處理層13積層於保護薄膜11；當未形成表面處理層13的情況，是積層於保護薄膜11。表面保護薄膜14，是基於避免保護薄膜11a因接觸而受傷或異物附著之目的而可剝離地貼合於保護薄膜11a之構件，其是由黏著劑層14a及樹脂薄膜14b所構成。 構成黏著劑層14a之黏著劑，是使用以選自丙烯酸系、橡膠系、胺酯系、矽氧系及聚酯系中的任一個高分子材料為主成分之材料，厚度可在1~100μm的範圍適宜地選擇。 作為樹脂薄膜14b，可列舉：丙烯酸系樹脂、聚乙烯及聚丙烯等的烯烴系樹脂、聚對苯二甲酸乙二酯系樹脂等的酯系樹脂等，厚度宜設定在5μm~100μm的範圍。When the surface treatment layer 13 is formed, the surface protection film 14 is laminated on the protective film 11 through the surface treatment layer 13; when the surface treatment layer 13 is not formed, the surface protection film 14 is laminated on the protective film 11. The surface protection film 14 is a member releasably attached to the protective film 11a for the purpose of preventing the protective film 11a from being damaged by contact or adhering to foreign matter. It is composed of an adhesive layer 14a and a resin film 14b. The adhesive constituting the adhesive layer 14a is a material mainly composed of any polymer material selected from acrylic, rubber, urethane, silicone and polyester, and the thickness can be 1~100 μm. range is selected appropriately. Examples of the resin film 14b include acrylic resin, olefin resin such as polyethylene and polypropylene, ester resin such as polyethylene terephthalate resin, etc. The thickness is preferably set in the range of 5 μm to 100 μm.
表面保護薄膜14，在偏光薄膜搭載於光學顯示設備等時被剝離。因此，構成黏著劑層14a之黏著劑，較佳為弱黏著力，較佳剝離力為5N/20mm以下。The surface protection film 14 is peeled off when the polarizing film is mounted on an optical display device or the like. Therefore, the adhesive constituting the adhesive layer 14a preferably has weak adhesive force, and the preferred peeling force is 5N/20mm or less.
剝離襯墊16，是透過黏著劑層15積層在偏光薄膜12之與表面保護薄膜14為相反側的面，亦即保護薄膜11b之與偏光元件10為相反側的面。在剝離襯墊16之與黏著劑層15接觸的主面，為了獲得良好的剝離性而實施脫模處理。剝離襯墊16，直到偏光薄膜12貼合於光學顯示面板的時點為止是被覆黏著劑層15。剝離襯墊16，當要將偏光薄膜12貼合於光學顯示面板時，是將黏著劑層15留在偏光薄膜12側而從保護薄膜11b剝離，該偏光薄膜12是透過黏著劑層15貼合於該光學顯示面板。考慮到作業性，剝離襯墊16對於黏著劑層15之剝離力較佳為5N/20mm以下。 The release liner 16 is laminated through the adhesive layer 15 on the side of the polarizing film 12 opposite to the surface protection film 14 , that is, on the side of the protective film 11 b opposite to the polarizing element 10 . The main surface of the release liner 16 in contact with the adhesive layer 15 is subjected to a release treatment in order to obtain good releasability. The liner 16 is peeled off and is covered with the adhesive layer 15 until the polarizing film 12 is bonded to the optical display panel. The release liner 16 leaves the adhesive layer 15 on the side of the polarizing film 12 and peels it off from the protective film 11b when the polarizing film 12 is to be bonded to the optical display panel. The polarizing film 12 is bonded through the adhesive layer 15 on the optical display panel. Considering workability, the peeling force of the release liner 16 on the adhesive layer 15 is preferably 5 N/20 mm or less.
剝離襯墊16，較佳為由樹脂薄膜所構成，例如可使用聚乙烯及聚丙烯等的烯烴系樹脂、或聚對苯二甲酸乙二酯系樹脂等之酯系樹脂，但並不限定於這些。剝離襯墊16的厚度可在1μm~100μm的範圍適宜地選擇。此外，剝離襯墊16宜為透濕度低的材料所形成，剝離襯墊16的材料之透濕度，於溫度40℃、濕度90%RH的氛圍下，較佳為200g/m2．24h以下，更佳為150g/m2．24h以下。 The release liner 16 is preferably made of a resin film. For example, olefin resins such as polyethylene and polypropylene, or ester resins such as polyethylene terephthalate resin can be used, but it is not limited thereto. These. The thickness of the release liner 16 can be appropriately selected in the range of 1 μm to 100 μm. In addition, the release liner 16 should be made of a material with low moisture permeability. The moisture permeability of the material of the release liner 16 is preferably 200g/m 2 in an atmosphere with a temperature of 40°C and a humidity of 90% RH. 24h or less, preferably 150g/m 2 . Less than 24 hours.
作為構成黏著劑層15之黏著劑，可使用以選自丙烯酸系、橡膠系、胺酯系、矽氧系、烯烴系、聚酯系所構成群中之任一個高分子材料為主成分者。基於抑制成本的觀點，較佳為丙烯酸系或橡膠系的黏著劑。黏著劑層15的厚度可在1μm~50μm的範圍適宜地設定。 As the adhesive constituting the adhesive layer 15, it is possible to use one whose main component is any polymer material selected from the group consisting of acrylic, rubber, urethane, silicone, olefin, and polyester. From the viewpoint of cost reduction, an acrylic or rubber-based adhesive is preferred. The thickness of the adhesive layer 15 can be appropriately set in the range of 1 μm to 50 μm.
在表面保護薄膜14之上，可設置污染對策薄膜23。污染對策薄膜23，至少含有由樹脂材料所構成之樹脂薄膜基材23a，進一步含有配置於該樹脂薄膜基材23a的一面之黏著劑層23b。樹脂薄膜基材23a是透過黏著劑層23b積層於表面保護薄膜14。 On the surface protection film 14, a contamination prevention film 23 may be provided. The anti-contamination film 23 includes at least a resin film base 23a made of a resin material, and further includes an adhesive layer 23b disposed on one side of the resin film base 23a. The resin film base material 23a is laminated on the surface protection film 14 through the adhesive layer 23b.
作為樹脂薄膜基材23a，可使用一般的樹脂薄膜，例如可使用：丙烯酸系樹脂、聚乙烯及聚丙烯等的烯烴系樹脂，或聚對苯二甲酸乙二酯系樹脂等的酯系樹脂等。樹脂薄膜基材23a的厚度較佳為20μm~100μm的範圍。 As the resin film base 23a, a general resin film can be used. For example, acrylic resin, olefin resin such as polyethylene and polypropylene, or ester resin such as polyethylene terephthalate resin can be used. . The thickness of the resin film base material 23a is preferably in the range of 20 μm to 100 μm.
另一方面，作為構成黏著劑層23b之黏著劑，可使用以丙烯酸系、橡膠系、胺酯系、矽氧系及聚酯系的高分子材料之任一個為主成分之材料，該黏著劑層23b的厚度可在1~100μm的範圍適宜地選擇。 On the other hand, as the adhesive constituting the adhesive layer 23b, a material mainly composed of any one of acrylic, rubber, urethane, silicone and polyester polymer materials can be used. The thickness of layer 23b can be appropriately selected in the range of 1 to 100 μm.
污染對策薄膜23，在雷射切割加工工序之後被剝離。因此，構成黏著劑層23b之黏著劑，較佳為對表面保護薄膜14具有弱黏著力者，其黏著力較佳為與所使用的表面保護薄膜14之黏著力同等或更小。若該黏著劑的黏著力比表面保護薄膜14的黏著力更大，當將污染對策薄膜23剝離時，有可能使表面保護薄膜14被剝離，因此並不理想。 The contamination prevention film 23 is peeled off after the laser cutting process. Therefore, the adhesive constituting the adhesive layer 23b is preferably one with weak adhesion to the surface protection film 14, and its adhesion is preferably equal to or smaller than the adhesion of the surface protection film 14 used. If the adhesive force of the adhesive is greater than the adhesive force of the surface protection film 14, the surface protection film 14 may be peeled off when the contamination prevention film 23 is peeled off, which is not preferable.
在本發明中，偏光性光學功能薄膜積層體1A，在透過黏著劑層15將偏光薄膜12貼合於光學顯示面板之前，是藉由雷射切割加工切割成所期望形狀，在該雷射切割加工時產生之熔融物或微粒子等會成為飛濺物而飛散，飛散後的成分有在雷射入射面側之偏光薄膜的主面上污染表層的疑慮。藉由設置污染對策薄膜23，可防止或抑制該污染。 In the present invention, the polarizing optical functional film laminate 1A is cut into a desired shape by laser cutting before the polarizing film 12 is bonded to the optical display panel through the adhesive layer 15. Molten material or fine particles generated during processing will become spatter and scatter. The scattered components may contaminate the surface of the main surface of the polarizing film on the side of the laser incident surface. By providing the contamination countermeasure film 23, this contamination can be prevented or suppressed.
再者，若如此般設置污染對策薄膜，還能抑制可能在切割端面產生之毛邊(burr)。在構成偏光性光學功能薄膜積層體1A之層或薄膜當中，從雷射照射方向觀察位於最表側之層或薄膜，在圖1的例子是構成表面保護薄膜14之樹脂薄膜14b的切割端面上，有以往偏光性光學功能薄膜積層體1A的外部突出的狀態產生毛邊「A」(參照圖5)的情形，藉由設置污染對策薄膜23，在偏光性光學功能薄膜積層體1A之積層方向上可將這樣的毛邊抑制成0~20μm。如此，在切割加工後，當將複數片被切割加工成既定相同形狀之積層體進行積層、集積時，可抑制毛邊之堆疊高度的增大，而能將輸送效率提高。藉由使毛邊成為10μm以下，可將輸送效率進一步提高，藉由使毛邊成為5μm以下，可將輸送效率更加提高。Furthermore, if the contamination prevention film is provided in this way, burrs that may occur on the cutting end surface can be suppressed. Among the layers or films constituting the polarizing optical functional film laminate 1A, the layer or film located on the outermost side when viewed from the laser irradiation direction is the cut end surface of the resin film 14b constituting the surface protection film 14 in the example of FIG. 1 . In the past, burrs "A" (see FIG. 5 ) were sometimes generated when the outside of the polarizing optically functional film laminated body 1A protruded. However, by providing the contamination prevention film 23, the polarizing optically functional film laminated body 1A can be laminated in the direction of lamination. Such burrs are suppressed to 0~20μm. In this way, after the cutting process, when a plurality of sheets are cut and processed into a laminated body of the same predetermined shape and stacked and stacked, the increase in the stacking height of the burrs can be suppressed and the conveying efficiency can be improved. By making the burrs 10 μm or less, the conveying efficiency can be further improved, and by making the burrs 5 μm or less, the conveying efficiency can be further improved.
(雷射切割加工) 圖2顯示將圖1之偏光性光學功能薄膜積層體1A藉由雷射照射以所期望形狀實施切割加工時的狀態之一例，是用與圖1同樣的方法顯示。藉由使用雷射，不僅可將偏光性光學功能薄膜積層體1A輕易地切割成既定的形狀，且隨著該切割加工，可在偏光性光學功能薄膜積層體1A所含之偏光元件10的切割端面形成被覆層。切割加工時，是與偏光薄膜12之與雷射入射面為相反側的主面相對向地配置薄片材17，例如在本實施形態，是與偏光性光學功能薄膜積層體1A之位於剝離襯墊16的外側之面16a相對向地配置薄片材17。以下，將配置有薄片材17之偏光性光學功能薄膜積層體1A稱為「附薄片材積層體」，將其整體用符號「2」表示。(laser cutting processing) FIG. 2 shows an example of a state in which the polarizing optically functional film laminated body 1A of FIG. 1 is cut into a desired shape by laser irradiation, using the same method as that of FIG. 1 . By using a laser, not only can the polarizing optically functional film laminate 1A be easily cut into a predetermined shape, but also with this cutting process, the polarizing element 10 included in the polarizing optically functional film laminate 1A can be cut. A coating layer is formed on the end surface. During the cutting process, the sheet 17 is arranged to face the main surface of the polarizing film 12 that is opposite to the laser incident surface. For example, in this embodiment, it is arranged to face the release liner of the polarizing optical functional film laminate 1A. The thin sheet 17 is arranged to face the outer surface 16a of 16. Hereinafter, the polarizing optical functional film laminated body 1A in which the sheet 17 is disposed will be called a "laminated body with a sheet", and the entire structure will be represented by a symbol "2".
薄片材17，至少含有由樹脂材料所構成之樹脂薄膜基材17a，進一步含有配置於該樹脂薄膜基材17a的一面之黏著劑層17b。樹脂薄膜基材17a，是透過黏著劑層17b可剝離地貼合於剝離襯墊16，又在切割加工後從剝離襯墊16被剝離。 作為構成樹脂薄膜基材17a之樹脂薄膜，可使用一般的樹脂薄膜，例如可使用：丙烯酸系樹脂、聚乙烯及聚丙烯等的烯烴系樹脂，或聚對苯二甲酸乙二酯系樹脂等的酯系樹脂等。樹脂薄膜基材17a較佳為具有5μm~200μm的範圍之厚度。此外，樹脂薄膜基材17a宜為透濕度低的材料所形成，樹脂薄膜基材17a的材料之透濕度，在溫度 40℃、濕度90%RH的氛圍之下，較佳為200g/m2 ･24h以下，更佳為150g/m2 ･24h以下。The sheet 17 includes at least a resin film base 17a made of a resin material, and further includes an adhesive layer 17b disposed on one side of the resin film base 17a. The resin film base material 17a is releasably bonded to the release liner 16 through the adhesive layer 17b, and is peeled off from the release liner 16 after the cutting process. As the resin film constituting the resin film base material 17a, general resin films can be used. For example, acrylic resins, olefin resins such as polyethylene and polypropylene, or polyethylene terephthalate resins can be used. Ester resin, etc. The resin film base material 17a preferably has a thickness in the range of 5 μm to 200 μm. In addition, the resin film base material 17a should be made of a material with low moisture permeability. The moisture permeability of the material of the resin film base material 17a is preferably 200g/m 2 ･ in an atmosphere with a temperature of 40°C and a humidity of 90%RH. 24h or less, preferably 150g/m 2 ･24h or less.
另一方面，黏著劑層17b較佳為，由以丙烯酸系、胺酯系、矽氧系、橡膠系或聚酯系之任一者為主成分之高分子材料所形成。此外，黏著劑層17b，較佳為由具有輕剝離的黏著力之黏著劑所構成，黏著劑層17b之剝離力，較佳為與偏光性光學功能薄膜積層體1A之剝離襯墊16的剝離力同等或更小。這是因為，若薄片材17之黏著劑層17b的剝離力比剝離襯墊16之剝離力更大，在雷射切割加工工序之後將薄片材17剝離時，可能發生剝離襯墊16被一起剝離的問題。通常，在雷射切割加工工序之後將薄片材17剝離時，黏著劑層17b是和樹脂薄膜基材17a一起被除去。On the other hand, the adhesive layer 17b is preferably formed of a polymer material whose main component is any one of acrylic, urethane, silicone, rubber or polyester. In addition, the adhesive layer 17b is preferably composed of an adhesive having light peeling adhesive force, and the peeling force of the adhesive layer 17b is preferably such that it can be peeled off from the release liner 16 of the polarizing optical functional film laminate 1A. The force is equal or smaller. This is because if the peeling force of the adhesive layer 17b of the sheet 17 is greater than the peeling force of the release liner 16, when the sheet 17 is peeled off after the laser cutting process, the release liner 16 may be peeled off together. problem. Normally, when the sheet 17 is peeled off after the laser cutting process, the adhesive layer 17b is removed together with the resin film base 17a.
對於附薄片材積層體2，是從偏光性光學功能薄膜積層體1A之與薄片材17為相反側之另一面，在圖示實施形態是從污染對策薄膜23側的面，沿著偏光性光學功能薄膜積層體1A的厚度方向照射雷射。該「厚度方向」，只要是貫穿構成偏光性光學功能薄膜積層體1A之層的方向即可，不一定要是對於該等層為正交的方向。利用雷射之該切割加工，可在將偏光性光學功能薄膜積層體1A以單板狀態個別化的狀態下進行，但基於高效率地生產之觀點，如隨後詳述般，較佳為以長條帶狀薄膜的狀態進行。因此，附薄片材積層體2較佳為形成為：被捲繞成卷狀之長條帶狀薄膜的形態。For the laminate with sheet 2, it is from the other side of the polarizing optical functional film laminate 1A opposite to the sheet 17. In the illustrated embodiment, it is from the side of the contamination prevention film 23, along the polarizing optical function. The functional thin film laminate 1A is irradiated with laser in the thickness direction. The "thickness direction" may be a direction penetrating the layers constituting the polarizing optical functional film laminated body 1A, and does not necessarily need to be a direction orthogonal to these layers. This cutting process by laser can be performed in a state where the polarizing optical functional film laminate 1A is individualized in a single-plate state. However, from the viewpoint of efficient production, as will be described in detail later, it is preferable to use long-term cutting processes. The state of strip film is carried out. Therefore, the sheet-attached laminated body 2 is preferably in the form of a long strip-shaped film wound into a roll shape.
圖3，是顯示利用雷射照射之切割處理中之附薄片材積層體2的狀態之積層體剖面的示意圖。藉由雷射照射，在附薄片材積層體2之偏光性光學功能薄膜積層體1A，在包含剝離襯墊16之其厚度全體形成切割溝槽2a。如此，藉由讓雷射的照射位置在偏光性光學功能薄膜積層體1A之面內沿著既定形狀移動，可將偏光性光學功能薄膜積層體1A以所期望形狀實施切割。切割，是將構成附薄片材積層體2之偏光性光學功能薄膜積層體1A在厚度方向完全地切割，又切割到保留薄片材的一部分之深度為止。這是為了讓後述的被覆層(特別是被覆層18b)充分地形成，又為了能將薄片材作為載體薄膜進行再利用，又進一步考慮到在後工序之操作性而防止位置偏移。為了防止位置偏移等，該雷射切割加工較佳為，如圖3所示般，將附薄片材積層體2配置在吸附型的固定載台19上，在利用吸引力保持住的狀態下進行。FIG. 3 is a schematic diagram showing a cross-section of the laminate with the sheet material laminated body 2 in a cutting process using laser irradiation. By laser irradiation, the cutting groove 2a is formed in the entire thickness of the polarizing optical functional film laminate 1A with the sheet laminate 2 including the release liner 16. In this way, by moving the laser irradiation position along the predetermined shape within the plane of the polarizing optical functional film laminated body 1A, the polarizing optical functional film laminated body 1A can be cut into a desired shape. Cutting is to completely cut the polarizing optical functional film laminate 1A constituting the sheet-attached laminate 2 in the thickness direction to a depth that retains a part of the sheet. This is to allow the coating layer (especially the coating layer 18b) to be described later to be fully formed, to reuse the sheet as a carrier film, and to prevent positional deviation in consideration of operability in subsequent processes. In order to prevent positional deviation, etc., the laser cutting process is preferably such that, as shown in FIG. 3 , the sheet-attached laminated body 2 is placed on an adsorption-type fixed stage 19 and held in a state using suction force. conduct.
在偏光性光學功能薄膜積層體1A之形狀加工中，藉由使用附薄片材積層體2，在雷射切割加工的同時，可在偏光薄膜12之切割端面、特別是偏光元件10的切割端面形成被覆層18a、18b。藉由形成該等被覆層18a、18b，可減少以下所說明之「消偏光寬度」，換言之，可謀求高溫高濕環境下的可靠性提高。In the shape processing of the polarizing optical functional film laminated body 1A, by using the sheet-attached laminated body 2, it is possible to form on the cut end surface of the polarizing film 12, especially the cut end surface of the polarizing element 10, simultaneously with the laser cutting process. Covering layers 18a, 18b. By forming these coating layers 18a and 18b, the "depolarization width" described below can be reduced. In other words, reliability in a high-temperature and high-humidity environment can be improved.
(消偏光寬度) 偏光薄膜12的主要構成要素之偏光元件10，若在高溫高濕環境之下放置長時間，水分會從被施加熱負荷之偏光薄膜的切割端面出入，因此，會使偏光元件10所含之多碘離子錯合物變質而變得帶有流動性，從偏光元件10逐漸脫離而產生脫色現象。結果，在偏光元件10的端部，造成偏光功能消失，而發生與品質相關的問題。該偏光功能消失稱為消偏光，從切割端面到消偏光的區域之寬度稱為消偏光寬度。圖4A、圖4B所示的光學顯微鏡圖像，係顯示將相對於偏光元件之光吸收軸為直角方向的切割端面在正交偏光鏡的透射照明下俯視之消偏光寬度。圖4A顯示未產生脫色所致的消偏光之偏光薄膜的例子，另一方面，圖4B顯示藉由在高溫高濕環境下實施可靠性試驗而產生了消偏光之偏光薄膜的例子。圖4B中，偏光薄膜12之切割端緣是用符號12a表示，在從該切割端緣12a起算寬度12b的區域，產生脫色。該區域之寬度12b為消偏光寬度。(Depolarization width) If the polarizing element 10, which is the main component of the polarizing film 12, is left in a high-temperature and high-humidity environment for a long time, moisture will enter and exit from the cut end surface of the polarizing film that is subjected to thermal load. Therefore, the polarizing element 10 will contain too much moisture. The iodide ion complex deteriorates and becomes fluid, and gradually detaches from the polarizing element 10 to cause discoloration. As a result, the polarizing function is lost at the end portion of the polarizing element 10, resulting in quality-related problems. The disappearance of this polarizing function is called depolarization, and the width from the cutting end surface to the depolarization area is called the depolarization width. The optical microscope images shown in Figures 4A and 4B show the depolarization width when viewed from above with the cut end surface at right angles to the light absorption axis of the polarizing element under transmitted illumination with a crossed polarizer. FIG. 4A shows an example of a polarizing film in which depolarization does not occur due to discoloration. On the other hand, FIG. 4B shows an example of a polarizing film in which depolarization occurs by conducting a reliability test in a high temperature and high humidity environment. In FIG. 4B , the cut edge of the polarizing film 12 is represented by a symbol 12 a , and discoloration occurs in a region with a width 12 b from the cut edge 12 a . The width 12b of this area is the depolarizing width.
(被覆層18a) 構成偏光薄膜12之保護薄膜11a、11b、還有將偏光元件10和保護薄膜11a、11b黏著之黏著劑(未圖示)，一般而言，是由具有：藉由輸入臨限值以上的紅外線雷射能量會軟化或熔融的性質之樹脂材料所構成。因此，至少與切割溝槽2a鄰接之保護薄膜11a、11b等，在雷射切割加工時藉由雷射的熱能量會熔融，而能形成熔融物。為了方便起見，在圖3僅顯示：由保護薄膜11a和附隨於其之黏著劑所形成的熔融物。在該熔融物，應大量地含有保護薄膜11a、11b的成分，沿著藉由切割加工而外露之偏光元件10的雷射切割端面流動，藉此形成被覆切割端面的一部分或全部之被覆層18a。因此，依據本實施形態，在偏光性光學功能薄膜積層體1A之形狀加工中，在雷射切割加工的同時，可在偏光薄膜12之切割端面、特別是偏光元件10的切割端面形成被覆層18a，而能謀求高溫高濕環境下之可靠性提高。(Coating layer 18a) The protective films 11a and 11b constituting the polarizing film 12 and the adhesive (not shown) that adheres the polarizing element 10 to the protective films 11a and 11b are generally made of: by inputting infrared rays exceeding a threshold value The laser energy softens or melts the resin material. Therefore, at least the protective films 11a, 11b, etc. adjacent to the cutting groove 2a are melted by the thermal energy of the laser during the laser cutting process, and can form a molten material. For convenience, only the melt formed by the protective film 11a and the adhesive attached thereto is shown in FIG. 3 . The melt should contain a large amount of components of the protective films 11a and 11b and flow along the laser-cut end face of the polarizing element 10 exposed by the cutting process, thereby forming a coating layer 18a covering part or all of the cut end face. . Therefore, according to this embodiment, during the shape processing of the polarizing optical functional film laminated body 1A, the coating layer 18a can be formed on the cut end surface of the polarizing film 12, especially the cut end surface of the polarizing element 10, simultaneously with the laser cutting process. , and can seek to improve reliability in high temperature and high humidity environments.
受到雷射的熱能量之影響所形成的區域，沿著該保護薄膜11的面，較佳為從切割端面起算200μm以下的範圍，更佳為100μm以下，特佳為50μm以下。這是因為，若超過200μm，在將偏光薄膜12貼合於顯示面板的狀態下，該熔融區域會超出顯示面板之邊框部，而有減損外觀品質的疑慮。The area formed by the thermal energy of the laser is preferably 200 μm or less from the cut end surface along the surface of the protective film 11, more preferably 100 μm or less, and particularly preferably 50 μm or less. This is because if it exceeds 200 μm, when the polarizing film 12 is bonded to the display panel, the melted area will extend beyond the frame of the display panel, which may impair the appearance quality.
(被覆層18b) 當雷射沿厚度方向貫穿偏光性光學功能薄膜積層體1A而到達薄片材17的情況，藉由雷射的熱能量，使雖不包含於偏光性光學功能薄膜積層體1、1A但存在於其厚度方向的一部分之至少薄片材17的成分，還有雖不包含於偏光性光學功能薄膜積層體1但可存在於其厚度方向的一部分之黏著劑層15及剝離襯墊16的成分，再加上可包含於偏光性光學功能薄膜積層體1之其他成分，成為飛濺物飛散，該飛濺物之至少一部分堆積在形成於偏光元件10之雷射切割端面。結果可形成被覆層18b，被覆層18b係至少含有薄片材17的成分，按照情況會含有黏著劑層15及剝離襯墊16的成分，又進一步含有其他成分，依所形成的被覆層18b之水分阻隔性(疏水性或透濕度)，能期待所期望的效果。此外，與所形成之被覆層的成分或性狀無關，更詳細的說，儘管依所形成的被覆層之水分阻隔性(疏水性或透濕度)，縱使是相同厚度，對於高溫高濕環境下之偏光薄膜12的切割加工端部之可靠性造成的影響程度會改變，藉由在切割端面形成這樣的被覆層18b，至少可期待：在物理上阻隔水分滲入之既定效果。因此，依據本實施形態，在偏光性光學功能薄膜積層體1A之形狀加工中，在雷射切割加工的同時，可在偏光薄膜12之切割端面、特別是偏光元件10之切割端面，除了被覆層18a還形成被覆層18b，能謀求高溫高濕環境下之可靠性提高。(Coating layer 18b) When the laser penetrates the polarizing optically functional film laminated body 1A in the thickness direction and reaches the sheet 17 , the thermal energy of the laser causes the heat energy in the polarizing optically functional film laminated body 1 and 1A to exist therein. At least a part of the sheet material 17 in the thickness direction, and components of the adhesive layer 15 and release liner 16 which are not included in the polarizing optical functional film laminate 1 but may be present in a part of the thickness direction, plus Other components that may be included in the polarizing optical functional film laminate 1 are scattered as spatter, and at least part of the spatter is accumulated on the laser-cut end surface formed on the polarizing element 10 . As a result, the coating layer 18b can be formed. The coating layer 18b contains at least the components of the sheet 17 and, if appropriate, the components of the adhesive layer 15 and the release liner 16, and further contains other components, depending on the moisture content of the formed coating layer 18b. Barrier properties (hydrophobicity or moisture permeability), the desired effect can be expected. In addition, regardless of the composition or properties of the coating layer formed, more specifically, depending on the moisture barrier properties (hydrophobicity or moisture permeability) of the coating layer formed, even if the thickness is the same, the coating layer under high temperature and high humidity environment will The degree of influence on the reliability of the cut end of the polarizing film 12 will change. By forming such a coating layer 18b on the cut end, at least a predetermined effect of physically blocking moisture penetration can be expected. Therefore, according to this embodiment, during the shape processing of the polarizing optical functional film laminated body 1A, at the same time as the laser cutting process, the cutting end surface of the polarizing film 12, especially the cutting end surface of the polarizing element 10, in addition to the coating layer, can be 18a also forms a coating layer 18b, which can improve reliability in high temperature and high humidity environments.
為了使被覆層18b的形成變容易，在薄片材17上產生之切割溝槽2a的寬度較佳為在5μm~300μm的範圍適宜地設定，此外，切割溝槽2a的深度較佳為在5μm~200μm的範圍適宜地設定。In order to facilitate the formation of the coating layer 18b, the width of the cutting groove 2a formed on the sheet 17 is preferably set appropriately in the range of 5 μm to 300 μm. In addition, the depth of the cutting groove 2a is preferably set in the range of 5 μm to 300 μm. The range of 200 μm is appropriately set.
此外，形成於偏光薄膜12的切割端面之被覆層18b的厚度，更詳細的說是與偏光薄膜12之切割端面的面正交的方向上長度，較佳為10μm以下。這是因為，若被覆層18b的厚度超過10μm，可能會對製品之尺寸精度造成影響，有當搭載於目的之顯示面板時發生異常的情形，又有對要搭載於顯示面板時被剝離之表面保護薄膜的剝離性造成影響的疑慮，因此並不理想。In addition, the thickness of the coating layer 18b formed on the cut end surface of the polarizing film 12, more specifically the length in the direction orthogonal to the cut end surface of the polarizing film 12, is preferably 10 μm or less. This is because if the thickness of the coating layer 18b exceeds 10 μm, the dimensional accuracy of the product may be affected, and abnormalities may occur when mounted on the intended display panel, or the surface may be peeled off when mounted on the display panel. There is concern about the releasability of the protective film, so it is not ideal.
此外，薄片材17之黏著劑層17b的成分，會構成形成於偏光薄膜12的切割端面之被覆層18b的成分之一部分或全部，考慮到這點，黏著劑層17b的厚度較佳為1μm~100μm的範圍，更佳為5μm~50μm的範圍。這是因為，當黏著劑層17b之厚度未達1μm的情況，無法獲得充分的黏著力，有在搬運中剝落的疑慮，又若黏著劑層17b的厚度超過100μm，附薄片材積層體2的總厚度變得過厚而使操作性降低。再者，基於有效阻隔高溫高濕環境下之來自外部的水分滲入偏光元件之目的，黏著劑層17b較佳為使用主成分為展現疏水性之矽氧系或橡膠系者，更佳為具有甲基或乙基等的烷基、或苯基等的疏水基者。再者，黏著劑層17b宜由透濕度低的材料所形成，黏著劑層17b的材料之透濕度，在溫度40℃、濕度90%RH的氛圍之下，較佳為200g/m2 ･24h以下，更佳為150g/m2 ･24h以下。然而，如以上所說明般，藉由形成於切割端面之被覆層18b，物理上阻隔水分滲入之一定的效果是可期待的，因此黏著劑層17b的成分等並不限定於上述者。 再者，當雷射貫穿薄片材17之黏著劑層17b而到達樹脂薄膜基材17a的情況，因為樹脂薄膜基材17a的成分是和黏著劑層17b的成分一起構成形成於偏光薄膜12的切割端面之被覆層18b的成分之一部分，基於此觀點，又基於防止處理中發生破損等的觀點，樹脂薄膜基材17a的厚度較佳為10μm~150μm的範圍。In addition, the composition of the adhesive layer 17b of the thin sheet 17 will constitute part or all of the composition of the coating layer 18b formed on the cut end surface of the polarizing film 12. Considering this point, the thickness of the adhesive layer 17b is preferably 1 μm~ The range is 100 μm, and more preferably the range is 5 μm ~ 50 μm. This is because when the thickness of the adhesive layer 17b is less than 1 μm, sufficient adhesion cannot be obtained and there is a concern that it may peel off during transportation. On the other hand, if the thickness of the adhesive layer 17b exceeds 100 μm, the thickness of the adhesive layer 17b may not be sufficient. The total thickness becomes too thick and operability decreases. Furthermore, for the purpose of effectively blocking moisture from the outside from penetrating into the polarizing element in a high temperature and high humidity environment, the adhesive layer 17b is preferably made of silicone or rubber whose main component is hydrophobic, and more preferably has an adhesive layer. alkyl groups such as ethyl or ethyl groups, or hydrophobic groups such as phenyl groups. Furthermore, the adhesive layer 17b should be made of a material with low moisture permeability. The moisture permeability of the material of the adhesive layer 17b is preferably 200g/m 2 ･24h in an atmosphere with a temperature of 40°C and a humidity of 90%RH. or less, preferably 150g/m 2 or less for 24 hours. However, as explained above, a certain effect of physically blocking moisture penetration can be expected by the coating layer 18b formed on the cut end surface, so the components of the adhesive layer 17b are not limited to the above. Furthermore, when the laser penetrates the adhesive layer 17b of the thin sheet 17 and reaches the resin film base material 17a, it is because the components of the resin film base material 17a and the components of the adhesive layer 17b together constitute the cutting edge formed on the polarizing film 12. From this viewpoint and from the viewpoint of preventing damage during handling, the thickness of the resin film base material 17a is preferably in the range of 10 μm to 150 μm.
(被覆層18a與被覆層18b的關係) 根據上述的記載可明白，在被覆層18a應大量地含有保護薄膜11a、11b之熔融物。 另一方面，在被覆層18b應大量地含有：偏光性光學功能薄膜積層體1、1A以外的成分、即至少薄片材17的成分，偏光性光學功能薄膜積層體1以外的成分、即黏著劑層15及剝離襯墊16的成分。 如此般，被覆層18a與被覆層18b，理論上如圖3之示意圖所示般能比較明確地區別，但實際上要將其等明確地區別是困難的。這是因為，例如，依對於所使用的雷射之黏著劑的反應性及加熱時的流動性等之熱特性等，被覆層的狀態會輕易地改變。根據後述實施例等的記載也能明白，實際上，被覆層18a與被覆層18b雙方都是，分別至少含有保護薄膜11a、11b的成分及從薄片材17熔融飛散的成分，又含有從剝離襯墊16、黏著劑層15等熔融飛散的成分。換言之，被覆層18a的成分和被覆層18b的成分處於混合或混和的狀態，因此，無法將被覆層18a的成分和被覆層18b明確地區別，也沒有這樣的必要。這是因為，被覆層18a與被覆層18b雙方都是，在偏光性光學功能薄膜積層體等的形狀加工中，在雷射切割加工的同時形成於偏光薄膜之切割端面，而有助於高溫高濕環境下之可靠性提高。因此，圖3係顯示為了便於說明之單純的概念圖。根據隨後的記載可明白，在實施例等，被覆層18a、18b所含的成分是藉由TOF-SIMS(飛行時間型二次離子質量分析法)或能量色散型X射線分析進行分析。(Relationship between coating layer 18a and coating layer 18b) From the above description, it is clear that the coating layer 18a should contain a large amount of the melt of the protective films 11a and 11b. On the other hand, the coating layer 18 b should contain a large amount of components other than the polarizing optical functional film laminate 1 and 1A, that is, at least the components of the sheet 17 , and components other than the polarizing optical functional film laminate 1 , that is, an adhesive. Composition of layer 15 and release liner 16. In this way, the coating layer 18a and the coating layer 18b can theoretically be distinguished relatively clearly as shown in the schematic diagram of FIG. 3, but in practice it is difficult to clearly distinguish them. This is because, for example, the state of the coating layer can easily change depending on thermal characteristics such as the reactivity of the adhesive to the laser used and fluidity when heated. As will be understood from the description of the examples and the like below, in fact, both the covering layer 18a and the covering layer 18b contain at least the components of the protective films 11a and 11b and the components melted and scattered from the sheet 17, and also contain components from the release liner. The components such as pad 16 and adhesive layer 15 are melted and scattered. In other words, the components of the coating layer 18a and the components of the coating layer 18b are in a mixed or mixed state. Therefore, the components of the coating layer 18a and the coating layer 18b cannot be clearly distinguished, and there is no need to do so. This is because both the coating layer 18a and the coating layer 18b are formed on the cut end surface of the polarizing film simultaneously with the laser cutting process during the shape processing of the polarizing optical functional film laminate, etc., thereby contributing to high temperature and high temperature. Improved reliability in wet environments. Therefore, FIG. 3 is a simple conceptual diagram for convenience of explanation. As will be understood from the following description, in the examples and the like, the components contained in the coating layers 18a and 18b are analyzed by TOF-SIMS (time-of-flight secondary ion mass spectrometry) or energy-dispersive X-ray analysis.
圖5顯示作為實施雷射切割加工後的一例之附薄片材積層體2的切割剖面之SEM圖像。再者，圖6A及圖6B是利用「消偏光寬度」來比較藉由附薄片材積層體2所獲得的效果和藉由先前技術之端銑刀所獲得的效果。圖6A係顯示藉由後述的實施例4所達成之消偏光寬度的一例，圖6B係顯示藉由後述的比較例3所達成之消偏光寬度的一例。 根據圖5所示的圖像雖不一定明白，但考慮到實施例等所示之基於TOF-SIMS的分析結果等，在被覆層(18a)應含有從剝離襯墊16及薄片材17熔融飛散的成分。如此，根據圖6A及圖6B的比較結果可明白，該被覆層(18a)有助於高溫高濕環境下之偏光元件10的切割端面之品質可靠性提高。 又雖顯示設有黏著劑層15的例子，但黏著劑層15不一定是必要的，又縱使在設有黏著劑層15的情況，依對於所使用的雷射之黏著劑的反應性及加熱時的流動性等之熱特性，也會有在被覆層(18a)不含來自該黏著劑層15之熔融物的成分的情形。然而，被覆層18a的成分和被覆層18b的成分處於混合或混和的狀態，因此縱使是那樣的情況，仍能謀求偏光元件10之切割端面的品質可靠性提高。FIG. 5 shows an SEM image of a cut section of the sheet-attached laminated body 2 as an example after laser cutting. Furthermore, FIGS. 6A and 6B use "depolarization width" to compare the effect obtained by attaching the thin sheet laminate 2 to the effect obtained by the end mill of the prior art. FIG. 6A shows an example of the depolarization width achieved by Example 4 described below, and FIG. 6B shows an example of the depolarization width achieved by Comparative Example 3 described below. Although it is not necessarily clear from the image shown in FIG. 5 , considering the analysis results based on TOF-SIMS shown in the Examples, etc., the coating layer ( 18 a ) should contain melted particles from the release liner 16 and the sheet 17 ingredients. In this way, it can be understood from the comparison results of FIG. 6A and FIG. 6B that the coating layer ( 18 a ) helps to improve the quality and reliability of the cut end surface of the polarizing element 10 in a high temperature and high humidity environment. In addition, although an example in which the adhesive layer 15 is provided is shown, the adhesive layer 15 is not necessarily necessary. Even in the case where the adhesive layer 15 is provided, it depends on the reactivity of the adhesive and the heating of the laser used. Depending on the thermal properties such as fluidity, the coating layer ( 18 a ) may not contain a component derived from the melt of the adhesive layer 15 . However, the components of the coating layer 18a and the components of the coating layer 18b are in a mixed or mixed state. Therefore, even in this case, the quality and reliability of the cut end surface of the polarizing element 10 can be improved.
圖7顯示實施雷射切割加工後之本發明的一實施例(相當於後述的實施例1)之附薄片材積層體的偏光薄膜的附近之剖面SEM圖像，更詳細的說是相對於偏光元件之分子配向(光吸收軸)為直角方向之切割端面之剖面SEM圖像；圖8顯示與圖7相同處之EDX(能量色散型X射線分析)圖像；圖9，係在圖7所示的圖像中，將偏光元件的切割端部放大顯示之剖面SEM圖像；圖10係顯示與圖9相同處之EDX圖像。7 shows a cross-sectional SEM image of the vicinity of a polarizing film with a sheet laminate according to one example of the present invention (corresponding to Example 1 to be described later) after laser cutting. More specifically, the polarization The cross-sectional SEM image of the cut end face where the molecular orientation (light absorption axis) of the component is at right angles; Figure 8 shows the same EDX (energy dispersive X-ray analysis) image as Figure 7; Figure 9 is the same as Figure 7 In the image shown, the cut end of the polarizing element is enlarged to show the cross-sectional SEM image; Figure 10 shows the EDX image of the same part as Figure 9.
(偏光元件之脹大) 由含碘之PVA系樹脂所構成的偏光元件10，若被實施雷射切割，在相對於該偏光元件10之光吸收軸方向為垂直方向之切割端面，如圖7~圖10所示般，偏光元件10的厚度相較於切割端面附近以外的厚度會產生脹大(10a)，而使厚度增加到1.1倍~2.5倍。這是因為，含碘之PVA系樹脂藉由雷射能量而接受熱應力，朝PVA系樹脂之拉伸方向、即光吸收軸方向收縮，結果，PVA系樹脂在光吸收軸方向被壓縮，而朝厚度方向膨脹。伴隨此現象，在藉由壓縮所形成的空間，讓軟化或熔融後的保護薄膜11及黏著劑流入，而變得容易形成被覆層(18a)。在與偏光元件10之光吸收軸方向平行的切割端面，則看不到這樣的現象。(Swelling of polarizing elements) If the polarizing element 10 made of iodine-containing PVA-based resin is laser-cut, the cut end surface is perpendicular to the direction of the light absorption axis of the polarizing element 10, as shown in Figures 7 to 10. The thickness of the polarizing element 10 will expand (10a) compared to the thickness outside the vicinity of the cutting end face, so that the thickness increases to 1.1 times to 2.5 times. This is because the iodine-containing PVA-based resin receives thermal stress due to laser energy and shrinks in the stretching direction of the PVA-based resin, that is, the direction of the light absorption axis. As a result, the PVA-based resin is compressed in the direction of the light absorption axis, and Expands in thickness direction. Accompanying this phenomenon, the softened or melted protective film 11 and the adhesive flow into the space formed by compression, making it easier to form the coating layer (18a). Such a phenomenon cannot be seen on the cut end surface parallel to the direction of the light absorption axis of the polarizing element 10 .
(雷射) 作為雷射光源，基於高生產性的觀點，較佳為例如使用：包含雷射光的振盪波長為紅外線區(9~11μm)之CO2 雷射光源之紅外線雷射。紅外線雷射，可輕易地獲得數10W級的功率，又能讓構成偏光性光學功能薄膜積層體1A之薄膜及黏著劑層藉由隨著紅外線吸收之分子振動而高效率地發熱，而能引發伴隨物質的相變之蝕刻。(Laser) As the laser light source, from the viewpoint of high productivity, it is preferable to use, for example, an infrared laser containing a CO 2 laser light source whose oscillation wavelength of laser light is in the infrared region (9~11 μm). Infrared laser can easily obtain power of several 10W level, and allows the film and adhesive layer constituting the polarizing optical functional film laminate 1A to efficiently generate heat through molecular vibrations that absorb infrared rays, thereby causing Etching accompanying the phase change of matter.
本發明並不限定於紅外線雷射，也能使用雷射光之振盪波長為5μm之CO2 雷射光源。The present invention is not limited to infrared laser, and a CO 2 laser light source whose oscillation wavelength of laser light is 5 μm can also be used.
此外，作為雷射光源，只要是脈衝雷射光源，也能使用近紅外線(NIR)光源、可見光(Vis)光源及紫外線(UV)光源。 作為NIR、Vis及UV波長之脈衝雷射光源的例子可列舉：雷射光之振盪波長為1064nm、532nm、355nm、349nm或266nm(以Nd：YAG、Nd：YLF或YVO4為介質之固態雷射光源的高次諧波)者，雷射光的振盪波長為351nm、248nm、222nm、193nm或157nm之準分子雷射光源，雷射光的振盪波長為157nm之F2雷射光源。In addition, as the laser light source, as long as it is a pulse laser light source, a near-infrared (NIR) light source, a visible light (Vis) light source, and an ultraviolet (UV) light source can also be used. Examples of pulsed laser light sources with NIR, Vis and UV wavelengths include: solid-state laser light sources with laser oscillation wavelengths of 1064nm, 532nm, 355nm, 349nm or 266nm (using Nd: YAG, Nd: YLF or YVO4 as the medium) (higher harmonics), excimer laser light sources whose oscillation wavelength of laser light is 351nm, 248nm, 222nm, 193nm or 157nm, and F2 laser light sources whose oscillation wavelength of laser light is 157nm.
作為雷射光源之振盪形態，基於抑制偏光薄膜之熱損傷的觀點，比起連續波(CW)，以脈衝波較佳。在此情況之脈寬可在10飛秒(10-14 秒)~1毫秒(10-3 秒)的範圍適宜地設定。設定2種以上的脈寬進行加工也是可能的。此外，脈衝的時間間隔、即重複頻率較佳為1~1,000kHz，更佳為10~500kHz。As the oscillation form of the laser light source, pulse wave is better than continuous wave (CW) from the viewpoint of suppressing thermal damage to the polarizing film. In this case, the pulse width can be appropriately set in the range of 10 femtoseconds (10 -14 seconds) to 1 millisecond (10 -3 seconds). It is also possible to set two or more pulse widths for processing. In addition, the time interval of the pulses, that is, the repetition frequency, is preferably 1 to 1,000 kHz, more preferably 10 to 500 kHz.
關於雷射光的偏光狀態，沒有特別的限制，可採用直線偏光、圓偏光、隨機偏光。There are no special restrictions on the polarization state of laser light, and linear polarization, circular polarization, and random polarization can be used.
關於雷射光的空間強度分布，也是沒有特別的限制，較佳為顯現良好的聚光性、可小光點(spot)化而能期待生產性提高之高斯光束。亦可為使用繞射光學元件、非球面透鏡等整形為平頂光束者。The spatial intensity distribution of the laser light is not particularly limited, but a Gaussian beam that exhibits good light condensing properties, can be made into a small spot, and can be expected to improve productivity is preferred. It is also possible to use diffractive optical elements, aspherical lenses, etc. to shape the beam into a flat-top beam.
為了以所期望形狀實施切割加工，可將雷射光沿著目的之形狀照射1次，或照射複數次來達成所期望的切割深度。此外，第1次和第2次以後之加工條件可在上述的條件範圍適宜地調整。In order to perform cutting processing in a desired shape, the laser light can be irradiated once along the target shape, or irradiated multiple times to achieve the desired cutting depth. In addition, the processing conditions for the first and second times can be adjusted appropriately within the above-mentioned condition range.
藉由使用XY精密載台等的載台驅動系統、檢流計掃描器及多邊形鏡掃描器等的光掃描系統、或是其等的組合(多軸同步控制)等之一般的掃描裝置，可一邊將作為工件之偏光性光學功能薄膜積層體1A和雷射光的相對位置以既定速度變更，一邊利用機械快門(shutter)機構、或AOM(聲光元件)等將雷射照射進行開閉(ON-OFF)控制，而以所期望形狀實施加工。By using a general scanning device such as a stage driving system such as an XY precision stage, an optical scanning system such as a galvanometer scanner and a polygon mirror scanner, or a combination thereof (multi-axis synchronous control), it is possible to While changing the relative positions of the polarizing optical functional film laminate 1A as the workpiece and the laser light at a predetermined speed, the laser irradiation is turned on and off using a mechanical shutter mechanism or an AOM (acousto-optical device). OFF) control to perform processing in the desired shape.
雷射照射的掃描速度，只要以達成所期望之蝕刻深度的方式適宜地設定即可，所期望之蝕刻深度是將偏光性光學功能薄膜積層體1A沿著厚度方向完全切割，且進一步在薄片材17以充分的深度形成切割溝槽。The scanning speed of laser irradiation can be appropriately set so as to achieve the desired etching depth. The desired etching depth is achieved by completely cutting the polarizing optical functional film laminated body 1A in the thickness direction and further etching the thin sheet. 17 Form the cutting groove with sufficient depth.
藉由Fθ透鏡等的物鏡將雷射光聚光而照射於作為加工對象之偏光性光學功能薄膜積層體1A，基於提高加工效率及抑制熱損傷的觀點是較佳為。 It is preferable from the viewpoint of improving processing efficiency and suppressing thermal damage to condense the laser light through an objective lens such as an Fθ lens and irradiate it onto the polarizing optical functional film laminate 1A to be processed.
雷射光，較佳為設定成能以500μm以下的切割寬度進行加工之聚光點徑，更佳為設定成能以300μm以下的切割寬度進行加工之聚光點徑。 The laser light is preferably set to a focus spot diameter that enables processing with a cutting width of 500 μm or less, and more preferably a focus spot diameter that allows processing with a cutting width of 300 μm or less.
當將相較於峰值強度值衰減到1/e2的強度之點定義為點徑的情況，較佳為設定成200μm以下的聚光點徑，更佳為設定成100μm以下的點徑。當採用檢流計掃描器的情況，為了對工件垂直地照射雷射光，較佳為使用遠心Fθ透鏡。 When the point at which the intensity attenuates to 1/e 2 compared to the peak intensity value is defined as the spot diameter, it is preferably set to a spot diameter of 200 μm or less, and more preferably set to a spot diameter of 100 μm or less. When using a galvanometer scanner, it is preferable to use a telecentric Fθ lens in order to irradiate the workpiece with laser light vertically.
為了獲得所期望的聚光點徑及切割寬度，可在從雷射振盪器之出射端到物鏡的光程途中配置用於調整光束徑之擴束器單元。 In order to obtain the desired focusing spot diameter and cutting width, a beam expander unit for adjusting the beam diameter can be disposed in the optical path from the exit end of the laser oscillator to the objective lens.
雷射功率，只要因應作為加工對象之偏光性光學功能薄膜積層體1A的厚度及性狀適宜地設定即可，例如作為雷射光源是使用CO2雷射的情況，雷射功率較佳為設定在5~300W的範圍，更佳為設定在20~200W的範圍。 The laser power can be set appropriately according to the thickness and properties of the polarizing optical functional film laminate 1A to be processed. For example, when a CO2 laser is used as the laser light source, the laser power is preferably set to The range of 5~300W is better set in the range of 20~200W.
也能將2種以上的雷射同時照射，也能將2種以上的雷射逐次照射。 It is also possible to irradiate two or more types of lasers at the same time, or to irradiate two or more types of lasers one after another.
對於偏光性光學功能薄膜積層體1A之雷射切割加工，可一邊將被捲繞成卷狀之偏光性光學功能薄膜積層體1A連 續放出一邊進行，又對事先切割成既定長度而個片化之偏光性光學功能薄膜積層體1A進行亦可。 For the laser cutting process of the polarizing optical functional film laminated body 1A, the polarizing optical functional film laminated body 1A wound into a roll can be continuously connected. While continuing to release, the process may also be performed on the polarized optical functional film laminate 1A that has been cut into individual pieces in advance to a predetermined length.
當將被捲繞成卷狀之長條帶狀薄膜進行切割加工處理的情況較佳為，藉由所謂卷對卷方式連續或間歇地供給偏光性光學功能薄膜積層體1A，在此期間，為了以所期望的形狀實施加工，一邊讓雷射光相對於偏光性光學功能薄膜積層體進行2維掃描一邊將該積層體切割。在此情況，例如將雷射光源及透鏡或反射鏡等的光學元件載置並固定在XY雙軸可動載台上，藉由驅動XY雙軸可動載台，而將照射於偏光薄膜之雷射光在XY2維平面上的位置改變。此外，也能採用：使用了XY雙軸可動載台之雷射光源的掃描、使用了電流鏡等之雷射光的掃描雙方(所謂協調控制)。雷射處理中，可將長條帶狀的薄膜積層體之搬運停止，亦可一邊將其連續地搬運一邊因應進給速度及位置而進行同步加工。 When the long strip-shaped film wound into a roll is cut and processed, it is preferable to continuously or intermittently supply the polarizing optical functional film laminate 1A by a so-called roll-to-roll method. During this period, in order to Processing is performed into a desired shape, and the polarizing optical functional film laminated body is cut while two-dimensionally scanning the polarizing optical functional film laminated body with laser light. In this case, for example, a laser light source and optical components such as lenses or mirrors are mounted and fixed on an XY biaxial movable stage, and the laser light irradiated on the polarizing film is driven by the XY biaxial movable stage. The position on the XY2-dimensional plane changes. In addition, both scanning using a laser light source using an XY biaxial movable stage and scanning using a laser light using a galvano mirror (so-called coordinated control) can also be adopted. During laser processing, the conveyance of the long strip-shaped thin film laminate can be stopped, or it can be continuously conveyed while simultaneously processing according to the feed speed and position.
又在加工中用於保持附薄片材積層體2之吸附固定載台，有或沒有皆可。 It is also used to hold the adsorption-fixing stage with or without the sheet laminate 2 during processing.
為了抑制加工中產生之無助於被覆層的形成之飛散物附著於製品，較佳為在雷射照射部附近設置集塵機構。 In order to prevent the scattered matter generated during processing that does not contribute to the formation of the coating layer from adhering to the product, it is preferable to install a dust collecting mechanism near the laser irradiation part.
依據本發明，藉由將薄片材的厚度適宜地設定，能使利用雷射切割加工所接受的雷射能量而從該薄片材飛散並附著於偏光薄膜的切割端面之薄片材起因材料的量成為所期望的值。因此，在雷射切割加工的同時，能在偏光薄膜之切割端面形成有助於高溫高濕環境下的可靠性提高之被覆層，而獲得消偏光防止效果。According to the present invention, by appropriately setting the thickness of the sheet, the amount of the sheet-initiating material that is scattered from the sheet by the laser energy received in the laser cutting process and adheres to the cut end surface of the polarizing film can be the desired value. Therefore, during the laser cutting process, a coating layer that helps improve reliability in high temperature and high humidity environments can be formed on the cut end surface of the polarizing film, thereby achieving a depolarizing prevention effect.
圖11係顯示以卷對卷方式連續進行雷射切割加工處理的方法可使用之雷射切割裝置30的一例之概略圖。在該裝置30，與圖1所示之偏光性光學功能薄膜積層體1A同樣結構之積層體31(由表面保護薄膜34、偏光薄膜32、剝離襯墊36所積層而成)，是以形成為長條帶狀的狀態被使用。長條帶狀的積層體31，被捲繞而形成為卷31a，該卷31a是藉由未圖示的卷支承部可旋轉自如地支承。同樣的，與薄片材17同樣的結構之薄片材37，是以形成為長條帶狀的狀態被使用。長條帶狀的薄片材37，被捲繞而形成為卷37a，該卷37a是藉由未圖示的卷支承部可旋轉自如地支承。 從卷31a及卷37a放出之積層體31及薄片材37，以互相重疊的狀態被送入一對的重疊輥40之夾持部(nip)。積層體31及薄片材37，藉由重疊輥40進行積層而成為附薄片材積層體41，被送入下一段之第二重疊輥42的夾持部。在第二重疊輥42之重疊於附薄片材積層體41的表面保護薄膜34之一側，污染對策薄膜43被送入。污染對策薄膜43，是以卷的形態被供給，並藉由未圖示的卷支承部可旋轉自如地支承。第二重疊輥42的作用，是在附薄片材積層體41之表面保護薄膜34上貼合污染對策薄膜43，並將貼合了該污染對策薄膜43後之附薄片材積層體41送入下一段之導輥44的下側。 在第二重疊輥42和導輥44之間配置X-Y雙軸可移動之雷射照射裝置45。雷射照射裝置45，是從污染對策薄膜43之上側對附薄片材積層體41照射雷射光，在此期間，進行X-Y雙軸移動，藉此在污染對策薄膜43及附薄片材積層體41上，如圖11之下側的剖面圖所示般形成切割溝槽46。利用該切割溝槽46，完成所期望圖案的雷射切割加工。如圖11之下側剖面圖所示般，切割溝槽46是將污染對策薄膜43和附薄片材積層體41沿厚度方向切割，且在薄片材37的厚度方向到達某種程度的深度。利用該切割溝槽46，在污染對策薄膜43及附薄片材積層體41形成既定圖案的切割部47。 貼合了污染對策薄膜43後之附薄片材積層體41，在通過一對的污染對策薄膜回收用輥48時，由膠帶所構成之污染對策薄膜回收用帶49是將其黏著面緊壓於污染對策薄膜43，藉此從積層體41的上面將污染對策薄膜43回收。然後，通過導輥44後之附薄片材積層體41，將由切割溝槽46所區劃的製品部分保留在薄片材37上，並將其他成為不需要的部分(不需要材)捲繞而回收。然後，保留有製品部分之附薄片材積層體41，經過一對的導輥50而送往薄片材剝離部51。在薄片材剝離部51具備楔狀的剝離板51a，在該剝離板51a，讓雷射切割加工後之用畢薄片材從成為製品部分之積層體31剝離。留下的積層體31，被送往製品收集部52，成為製品而被收集。到達製品收集部52之積層體31，可在此被呈卷狀地捲繞，而成為製品卷。圖11雖顯示將不要需材和污染對策薄膜分開回收的結構，但並不限定於此，將其等同時回收也是可能的。FIG. 11 is a schematic diagram showing an example of a laser cutting device 30 that can be used in a method of continuously performing laser cutting processing in a roll-to-roll manner. In this device 30, a laminated body 31 having the same structure as the polarizing optical functional film laminated body 1A shown in FIG. 1 (laminated by a surface protection film 34, a polarizing film 32, and a release liner 36) is formed as follows Long ribbon-like states are used. The elongated strip-shaped laminated body 31 is wound to form a roll 31a, and the roll 31a is rotatably supported by a roll support portion (not shown). Similarly, the thin sheet 37 having the same structure as the thin sheet 17 is used in a state of being formed into a long strip shape. The long strip-shaped sheet material 37 is wound to form a roll 37a, and the roll 37a is rotatably supported by a roll support portion (not shown). The laminated body 31 and the sheet 37 unloaded from the roll 31a and the roll 37a are fed into the nip portion (nip) of the pair of overlapping rollers 40 in a state of overlapping each other. The laminated body 31 and the sheet 37 are laminated by the overlapping roller 40 to form the sheet-attached laminated body 41, and are sent to the nip of the second overlapping roller 42 in the next stage. The contamination prevention film 43 is fed to the side of the second stacking roller 42 on which the surface protection film 34 is stacked on the sheet-attached laminated body 41 . The contamination prevention film 43 is supplied in the form of a roll and is rotatably supported by a roll support unit (not shown). The function of the second overlapping roller 42 is to laminate the contamination prevention film 43 on the surface protection film 34 of the sheet-attached laminated body 41, and to send the sheet-attached laminated body 41 to the bottom after laminating the contamination prevention film 43. The lower side of a section of guide roller 44. An X-Y biaxially movable laser irradiation device 45 is disposed between the second overlapping roller 42 and the guide roller 44 . The laser irradiation device 45 irradiates the laser light from the upper side of the contamination control film 43 to the sheet-attached laminated body 41. During this period, it performs X-Y biaxial movement, whereby the contamination control film 43 and the sheet-attached laminated body 41 are , forming the cutting groove 46 as shown in the cross-sectional view on the lower side of FIG. 11 . Using this cutting groove 46, laser cutting processing of a desired pattern is completed. As shown in the lower cross-sectional view of FIG. 11 , the cutting groove 46 cuts the contamination prevention film 43 and the sheet-attached laminated body 41 in the thickness direction, and reaches a certain depth in the thickness direction of the sheet 37 . The cutting grooves 46 are used to form cut portions 47 in a predetermined pattern on the contamination prevention film 43 and the sheet-attached laminated body 41 . When the sheet laminate 41 with the contamination control film 43 laminated thereon passes through a pair of contamination control film recovery rollers 48 , the contamination control film recovery tape 49 composed of an adhesive tape has its adhesive surface pressed against it. The contamination prevention film 43 is recovered from the upper surface of the laminated body 41 . Then, the sheet laminated body 41 attached after passing through the guide roller 44 retains the portion of the product divided by the cutting grooves 46 on the sheet 37, and other unnecessary portions (unnecessary materials) are wound and recovered. Then, the sheet-attached laminated body 41 with the product portion remaining is sent to the sheet peeling part 51 through a pair of guide rollers 50 . The sheet peeling part 51 is provided with a wedge-shaped peeling plate 51a, and the peeling plate 51a peels the used sheet after the laser cutting process from the laminate 31 that becomes the product part. The remaining laminated body 31 is sent to the product collecting part 52, and is collected as a product. The laminated body 31 that has reached the product collection part 52 can be wound up in a roll shape there, and can become a product roll. Although FIG. 11 shows a structure in which unnecessary materials and contamination countermeasure films are collected separately, the structure is not limited to this and it is possible to collect them simultaneously.
(加工形狀) 本發明的偏光性光學功能薄膜積層體所含之偏光薄膜12，可利用於包含汽車儀表顯示部、智慧手錶、智慧眼鏡、智慧型手機、筆記型電腦及平板電腦之液晶顯示裝置，又能利用於有機EL顯示裝置等的光學顯示設備、或電漿顯示面板(PDP)等的光學顯示面板等之許多裝置，因此如圖12A至圖14所例示般，不僅是矩形形狀，是被切割加工成具有曲線狀緣部、孔等的形狀般之各種形狀。在此，圖12A、圖12B係顯示製造從大尺寸的偏光薄膜呈智慧型手機形狀切出的製品的情況之切割加工布局例，圖12A係顯示整體的俯視圖，圖12B係將其一部分放大顯示之俯視圖。圖13A、圖13B係顯示製造從大尺寸的偏光薄膜呈汽車儀表板形狀切出的製品的情況之切割加工布局例，圖13A係顯示整體的俯視圖，圖13B係將其一部分放大顯示之俯視圖，圖14是將呈智慧型手機形狀切出後之偏光薄膜的例子之照片複數張排列顯示。因此，本發明能運用於這些所有的形狀之切割加工。藉由在切割採用雷射，具有曲率半徑(R)小的曲線部之加工也成為可能，也能對應於曲率半徑R為2mm以下的切割。(processed shape) The polarizing film 12 contained in the polarizing optical functional film laminate of the present invention can be used in liquid crystal display devices including automobile instrument display units, smart watches, smart glasses, smart phones, notebook computers, and tablet computers, and can also be used In many devices such as optical display devices such as organic EL display devices or optical display panels such as plasma display panels (PDP), as illustrated in FIGS. 12A to 14 , not only the rectangular shape but also the shape of the It has various shapes such as curved edges and holes. Here, FIGS. 12A and 12B show an example of a cutting processing layout for manufacturing a product cut out of a large-sized polarizing film in the shape of a smartphone. FIG. 12A shows an overall top view, and FIG. 12B shows a part of it enlarged. top view. Figures 13A and 13B show an example of a cutting processing layout for manufacturing products cut out of a large-sized polarizing film in the shape of a car dashboard. Figure 13A shows an overall top view, and Figure 13B is a partially enlarged top view. Figure 14 is an array of photos showing examples of polarizing films cut out into the shape of smartphones. Therefore, the present invention can be applied to cutting processing of all these shapes. By using laser for cutting, it is possible to process curved portions with a small radius of curvature (R), and cutting with a radius of curvature R of 2 mm or less is also possible.
例如，汽車儀表板用的偏光薄膜，有採用為了固定儀表針而形成有貫通孔的結構的情形，也會有形成例如具有0.5mm~100mm的直徑之貫通孔的要求的情形，對於這樣的要求，藉由採用雷射切割技術，變成能夠對應。For example, polarizing films for automobile instrument panels may have a structure with through holes for fixing instrument needles. There may also be a requirement to form through holes with a diameter of 0.5 mm to 100 mm. For such requirements, , by using laser cutting technology, it becomes possible to cope.
本發明的偏光薄膜12之雷射切割加工，並不限定於上述形狀，而能運用於各種形狀。The laser cutting process of the polarizing film 12 of the present invention is not limited to the above shapes, but can be applied to various shapes.
再者，本發明的方法也能應用於：將包含偏光薄膜之長條帶狀薄膜積層體藉由雷射沿長度方向進行切條(slit)切割之工序，藉由運用本發明，在實施切條切割後之長條帶狀薄膜積層體的切割端面可形成基於本發明之被覆層。藉由該被覆層，在長條帶狀薄膜積層體的保存中及輸送中，可抑制從該積層體切割端面讓水分滲入所造成之長條帶狀薄膜積層體之切割端面的劣化。Furthermore, the method of the present invention can also be applied to the process of slit-cutting a long strip-shaped film laminate including a polarizing film in the length direction with a laser. A coating layer based on the present invention can be formed on the cut end surface of the long strip-shaped film laminate after strip cutting. This coating layer can suppress deterioration of the cut end face of the long strip-shaped film laminate caused by penetration of moisture from the cut end face of the long strip-shaped film laminate during storage and transportation.
此外，本發明的方法也能應用於標準尺寸切割工序，標準尺寸切割工序，是將包含偏光薄膜之長條帶狀薄膜積層體，一邊以卷對卷方式搬運，在以既定的進給量搬運之後呈停止的狀態下，朝與搬運方向垂直的方向將長條帶狀薄膜積層體切割。 [實施例等]In addition, the method of the present invention can also be applied to a standard size cutting process. In the standard size cutting process, a long strip-shaped film laminate including a polarizing film is transported in a roll-to-roll manner while being transported at a predetermined feed amount. Then, while the machine is stopped, the long strip-shaped film laminate is cut in a direction perpendicular to the conveyance direction. [Examples, etc.]
以下，參照實施例等將本發明具體地說明。然而，以下所說明的實施例，只是用於幫助本發明的理解而表示本發明可實施之提示，本發明並不限定於該等實施例。Hereinafter, the present invention will be specifically described with reference to Examples and the like. However, the Examples described below are only used to help the understanding of the present invention and to show that the present invention can be implemented, and the present invention is not limited to these Examples.
〔實施例1〕 (偏光性光學功能薄膜積層體) 將以PVA系樹脂為主成分之厚度30μm的高分子薄膜，在下述[1]~[5]之5浴中依序，一邊賦予可朝薄膜長度方向拉伸的張力一邊浸漬，以拉伸倍率6倍(株式會社可樂麗製之高分子薄膜)進行了拉伸。讓該拉伸薄膜乾燥而獲得厚度12μm的偏光元件10。 ＜條件＞ [1]膨潤浴：30℃的純水 [2]染色浴：含有碘及碘化鉀之30℃的水溶液 [3]第1交聯浴：含有碘化鉀及硼酸之40℃的水溶液 [4]第2交聯浴：含有碘化鉀及硼酸之60℃的水溶液 [5]洗淨浴：含有碘化鉀之25℃的水溶液[Example 1] (Polarized optical functional film laminate) A polymer film with a thickness of 30 μm, mainly composed of PVA resin, is immersed in the following five baths [1] to [5] in sequence, while applying a tension that can be stretched in the length direction of the film, and the stretching ratio is Stretched 6 times (polymer film manufactured by Kuraray Co., Ltd.). The stretched film was dried to obtain a polarizing element 10 with a thickness of 12 μm. ＜Conditions＞ [1] Swelling bath: pure water at 30°C [2] Dyeing bath: 30°C aqueous solution containing iodine and potassium iodide [3] First cross-linking bath: 40°C aqueous solution containing potassium iodide and boric acid [4] Second cross-linking bath: 60°C aqueous solution containing potassium iodide and boric acid [5] Cleaning bath: 25°C aqueous solution containing potassium iodide
在上述偏光元件之一側以乾燥後的厚度成為100nm的方式塗布PVA系黏著劑，將長條狀之厚度25μm的TAC薄膜以彼此的長度方向一致的方式進行貼合而成為保護薄膜11a。A PVA-based adhesive is applied to one side of the polarizing element so that the thickness after drying becomes 100 nm, and a long TAC film with a thickness of 25 μm is laminated so that their longitudinal directions are consistent with each other to form a protective film 11a.
接下來，在上述偏光元件之另一側以乾燥後的厚度成為100nm的方式塗布PVA系黏著劑，將長條狀之厚度25μm的TAC薄膜以彼此的長度方向一致的方式進行貼合而成為保護薄膜11b。 依以上手法製作出偏光薄膜12。Next, a PVA-based adhesive is applied to the other side of the polarizing element so that the thickness after drying becomes 100 nm, and a long TAC film with a thickness of 25 μm is laminated so that their length directions are consistent with each other to form a protective layer. Film 11b. The polarizing film 12 is produced according to the above method.
接下來，在一方的TAC薄膜11a之與偏光元件為相反側的主面上，以乾燥後的厚度成為7μm的方式形成硬塗層而成為表面處理層13，進一步在其上方形成表面保護薄膜14。表面保護薄膜14是由聚對苯二甲酸乙二酯基材(厚度38μm)及丙烯酸系黏著劑(厚度23μm)所構成。Next, a hard coat layer is formed on the main surface of one TAC film 11 a on the opposite side to the polarizing element so that the thickness after drying becomes 7 μm to form the surface treatment layer 13 , and a surface protection film 14 is further formed above it. . The surface protection film 14 is composed of a polyethylene terephthalate base material (thickness: 38 μm) and an acrylic adhesive (thickness: 23 μm).
在另一方的TAC薄膜11b之與偏光元件為相反側的主面上，塗布厚度12μm的丙烯酸系黏著劑而形成黏著劑層15，進一步在其上方貼合聚對苯二甲酸乙二酯製之剝離襯墊16。On the main surface of the other TAC film 11b opposite to the polarizing element, an acrylic adhesive with a thickness of 12 μm is applied to form an adhesive layer 15, and a polyethylene terephthalate layer is further attached above it. Release liner 16.
使用由丙烯酸系黏著劑層(厚度20μm)及聚對苯二甲酸乙二酯基材(厚度38μm)所構成之日東電工公司製表面保護薄膜E-MASK作為丙烯酸系黏著劑污染對策薄膜23(43)，並將其貼附於該偏光性光學功能薄膜積層體1A之上述表面保護薄膜14的主面上。As the acrylic adhesive contamination countermeasure film 23 (43 ), and attach it to the main surface of the surface protective film 14 of the polarizing optical functional film laminate 1A.
依此步驟，獲得總厚約180μm之偏光性光學功能薄膜積層體1A，其具有：污染對策薄膜23/表面保護薄膜14/硬塗層13/TAC薄膜11a/PVA系黏著劑/偏光元件10/PVA系黏著劑/TAC薄膜11b/感壓型丙烯酸系黏著劑層15/剝離襯墊16的結構。Following this procedure, a polarizing optical functional film laminate 1A with a total thickness of about 180 μm is obtained, which has: pollution control film 23/surface protection film 14/hard coat layer 13/TAC film 11a/PVA-based adhesive/polarizing element 10/ Structure of PVA adhesive/TAC film 11b/pressure-sensitive acrylic adhesive layer 15/release liner 16.
(雷射) 雷射振盪器，是使用CO2 雷射(科希倫公司製J-3，波長9.4μm，高斯光束，脈衝振盪)，藉由物鏡以使理論點徑(由峰值之1/e2 的強度來規定點徑)成為約90μm的方式進行聚光，將X-Y載台及檢流計掃描器並用，以雷射功率65W、重複頻率30kHz、掃描速度500mm/s的條件，進行1次掃描而切割加工成尺寸80mm×50mm的矩形形狀。(Laser) The laser oscillator uses a CO 2 laser (J-3 manufactured by Cochran, wavelength 9.4 μm, Gaussian beam, pulse oscillation), and uses an objective lens to adjust the theoretical point diameter (from 1/ of the peak value) Focus the light so that the spot diameter is determined by the intensity of e 2 ) to approximately 90 μm, use an XY stage and a galvanometer scanner together, and conduct 1 Scan and cut into a rectangular shape of 80mm×50mm.
(薄片材) 將由矽氧系黏著劑層17b(厚度75μm)及聚對苯二甲酸乙二酯基材17a(三菱化學公司製T100-75S，厚度75μm)所構成之薄片材17，透過上述矽氧系黏著劑層17b貼附於上述偏光性光學功能薄膜積層體1A之剝離襯墊16的主面16a上。(thin sheet) The thin sheet 17 composed of the silicone adhesive layer 17b (thickness: 75 μm) and the polyethylene terephthalate base material 17a (T100-75S manufactured by Mitsubishi Chemical Corporation, thickness: 75 μm) is passed through the silicone adhesive. The layer 17b is attached to the main surface 16a of the release liner 16 of the polarizing optical functional film laminate 1A.
(雷射切割加工) 依上述「雷射」所載之雷射條件，對貼附有薄片材17及污染對策薄膜43之偏光性光學功能薄膜積層體1A實施所期望形狀的雷射切割加工。經確認，藉由該雷射切割加工，偏光性光學功能薄膜積層體1A和薄片材17之矽氧系黏著劑層17b都是在厚度全體被完全切割，另一方面，聚對苯二甲酸乙二酯基材17a並未被完全切割，而以半切割狀態被實施切割加工。(laser cutting processing) According to the laser conditions described in the above "Laser", the polarizing optical functional film laminate 1A to which the sheet 17 and the contamination prevention film 43 are attached is subjected to laser cutting processing in a desired shape. It was confirmed that by this laser cutting process, the polarizing optical functional film laminate 1A and the silicone adhesive layer 17b of the sheet 17 were completely cut through the entire thickness. On the other hand, the polyethylene terephthalate The diester base material 17a is not completely cut, but is cut in a half-cut state.
在該雷射切割加工後將污染對策薄膜43剝離，測定在表面保護薄膜14之切割端面所形成之毛邊高度，結果為3μm，而確認其為充分低的數值。After the laser cutting process, the contamination prevention film 43 was peeled off, and the height of the burrs formed on the cut end surface of the surface protection film 14 was measured. The result was 3 μm, which was confirmed to be a sufficiently low value.
此外，相對於偏光元件10之拉伸方向為垂直方向、亦即相對於PVA系分子的配向方向為垂直方向之切割端面上之偏光元件的厚度，相較於切割端面附近以外之偏光元件的厚度成為1.8倍。In addition, the thickness of the polarizing element on the cut end surface that is perpendicular to the stretching direction of the polarizing element 10, that is, perpendicular to the alignment direction of the PVA molecules, is compared with the thickness of the polarizing element outside the vicinity of the cutting end surface. becomes 1.8 times.
(評價) 從呈矩形形狀實施雷射切割加工後之偏光薄膜的試料將薄片材17及污染對策薄膜43剝離，將切割面用環氧樹脂包埋，將切割剖面的狀態用FE-SEM(掃描型電子顯微鏡，日本電子株式會社製JSM-7001F)觀察，取得SEM圖像(圖7及圖9)。 此外，將偏光元件10之切割端面的狀態、換言之為被覆層的狀態用該FE-SEM從分子配向方向觀察，取得SEM圖像(圖15A)。該圖15A是實施例1之SEM圖像，相當於從圖9的箭頭「C」方向觀察之SEM圖像。為了容易進行比較，在圖15B顯示實施例2之同樣的SEM圖像，進一步在圖15C及圖15D分別顯示比較例1及2之同樣的SEM圖像。 從這些圖像可知，偏光元件10之切割端面是藉由被覆層18a、18b確實地覆蓋。(evaluation) The thin sheet 17 and the contamination prevention film 43 were peeled off from the polarizing film sample that had been laser-cut in a rectangular shape, the cut surface was embedded in epoxy resin, and the cut cross-section was analyzed using FE-SEM (Scanning Electron Microscope) , JSM-7001F manufactured by JEOL Ltd.) was observed and SEM images were obtained (Figures 7 and 9). In addition, the state of the cut end surface of the polarizing element 10, in other words, the state of the coating layer, was observed from the molecular alignment direction using the FE-SEM, and an SEM image was obtained (FIG. 15A). FIG. 15A is an SEM image of Example 1, which corresponds to the SEM image viewed from the direction of arrow “C” in FIG. 9 . For easy comparison, the same SEM image of Example 2 is shown in FIG. 15B , and the same SEM images of Comparative Examples 1 and 2 are shown in FIG. 15C and FIG. 15D respectively. It can be seen from these images that the cut end surface of the polarizing element 10 is reliably covered by the coating layers 18a and 18b.
為了獲得被覆層18a、18b所含的物質之相關資訊，對於與圖9同一處，使用EDX(能量色散型X射線分析，牛津儀器公司製Energy250)實施元素分析(圖8及圖10)。圖8及圖10之EDX圖像，當被覆層18a、18b含有矽的情況，是以使矽發亮顯示的方式進行軟體處理。特別是在圖10可明白，在偏光薄膜之切割端面所形成的被覆層18b，係含有源自構成薄片材17的矽氧系黏著劑層17b之矽(Si元素)。再者，被覆層18b厚度為約2~5μm。In order to obtain information about the substances contained in the coating layers 18a and 18b, elemental analysis was performed using EDX (Energy Dispersive X-ray Analysis, Energy250 manufactured by Oxford Instruments) for the same location as in Figure 9 (Figures 8 and 10). In the EDX images of Figures 8 and 10, when the coating layers 18a and 18b contain silicon, software processing is performed to make the silicon appear brightly. In particular, it is clear from FIG. 10 that the coating layer 18b formed on the cut end surface of the polarizing film contains silicon (Si element) derived from the silicone adhesive layer 17b constituting the thin sheet 17. Furthermore, the thickness of the coating layer 18b is approximately 2 to 5 μm.
為了進一步獲得被覆層18a、18b所含的物質之相關資訊，對於與圖9同一處對應之處，使用ULVAC-PHI株式會社之飛行時間型二次離子質量分析裝置進行基於TOF-SIMS的分析。更詳細的說，著眼於分析所獲得之源自PET之C8 H5 O4 - (m/z 165)(m/z表示質量對電荷比)的離子強度，進行資料映射(data mapping)。圖16係顯示分析結果的圖像。從該圖像可確認，不限於被覆層18b，連在被覆層18a也形成有聚對苯二甲酸乙二酯(PET)的膜。In order to further obtain information about the substances contained in the coating layers 18a and 18b, analysis based on TOF-SIMS was performed using a time-of-flight secondary ion mass spectrometer of ULVAC-PHI Co., Ltd. for the same point as in Figure 9. More specifically, data mapping was performed focusing on the analysis of the obtained ion intensity of C 8 H 5 O 4 - (m/z 165) (m/z represents the mass to charge ratio) derived from PET. Figure 16 is an image showing the analysis results. From this image, it can be confirmed that a film of polyethylene terephthalate (PET) is formed not only on the coating layer 18b but also on the coating layer 18a.
進一步確認剝離後的薄片材之雷射照射部，可確認：寬度40μm、深度100μm左右之藉由雷射能量之切割所形成的切割溝槽17-1a。這表示，至少從該切割溝槽17-1a飛散之薄片材17的成分附著於偏光薄膜12之切割端面而形成被覆層18a、18b(圖17)。Further confirmation of the laser-irradiated portion of the peeled sheet revealed that the cutting groove 17-1a was formed by cutting with laser energy, with a width of 40 μm and a depth of approximately 100 μm. This means that at least the components of the sheet 17 scattered from the cutting groove 17 - 1 a adhere to the cut end surface of the polarizing film 12 to form the coating layers 18 a and 18 b ( FIG. 17 ).
圖18顯示實施例1之被覆層18a、18b所含的材料之成分分析結果。更詳細的說，係顯示圖10的箭頭「B」所指處的EDX元素分析結果，橫軸表示X射線能量(keV)，縱軸表示X射線計數(counts)。如該圖所示般，在本實施例，從被覆層18a、18b除了矽(Si)以外，還有矽(C)及氧(O)被偵測到。如此可知，在偏光元件10之切割端面所形成的被覆層18a,18b，是源自至少偏光薄膜12、黏著劑層15、剝離襯墊16、薄片材之有機成分、與源自薄片材的黏著劑層17b之矽(Si)進行混和而形成之層。FIG. 18 shows the composition analysis results of the materials included in the coating layers 18a and 18b of Example 1. More specifically, the EDX elemental analysis results at the point pointed by arrow "B" in Figure 10 are shown. The horizontal axis represents X-ray energy (keV), and the vertical axis represents X-ray counts (counts). As shown in this figure, in this embodiment, in addition to silicon (Si), silicon (C) and oxygen (O) are detected from the coating layers 18a and 18b. It can be seen from this that the coating layers 18a and 18b formed on the cut end surface of the polarizing element 10 are derived from at least the polarizing film 12, the adhesive layer 15, the release liner 16, the organic components of the thin sheet, and the adhesive originating from the thin sheet. Silicon (Si) in the agent layer 17b is mixed to form a layer.
(高溫高濕環境下之可靠性試驗) 從製作出之矩形形狀的偏光性光學功能薄膜積層體1A之試料將表面保護薄膜14及剝離襯墊16剝離，以使黏著劑層15之面接觸的方式貼合於玻璃板。在此狀態下，將試料放入設定成溫度65℃、濕度90%的環境之烘箱內，進行可靠性試驗。可靠性試驗的條件，是在上述環境的烘箱內將試料保持240小時(10日)，觀測於高溫高濕環境下之加工端面之偏光薄膜12的脫色所致之消偏光。(Reliability test under high temperature and high humidity environment) The surface protective film 14 and the release liner 16 were peeled off from the produced sample of the rectangular polarizing optical functional film laminate 1A, and the adhesive layer 15 was bonded to the glass plate so that the surfaces thereof were in contact. In this state, the sample is placed in an oven set to an environment with a temperature of 65°C and a humidity of 90%, and a reliability test is performed. The conditions for the reliability test are to keep the sample in an oven in the above-mentioned environment for 240 hours (10 days), and observe the depolarization caused by the discoloration of the polarizing film 12 on the processed end surface in a high-temperature and high-humidity environment.
(加工端部可靠性之評價結果確認) 將進行了前述可靠性試驗之樣本使用光學顯微鏡(正交偏光鏡，透過照明)進行觀測，根據與圖4A、圖4B關聯之前述定義，測定從實施雷射切割加工後之切割端部起算之消偏光寬度。(Confirmation of evaluation results of processing end reliability) The sample that has been subjected to the aforementioned reliability test is observed using an optical microscope (crossed polarizer, transmitted illumination), and based on the aforementioned definition associated with Figures 4A and 4B, the distance from the cut end after laser cutting is measured. Depolarizing width.
測定的結果，與偏光元件之光吸收軸平行的切割端面(配向並行面)之消偏光寬度為135μm，與光吸收軸垂直的切割端面(配向分割面)之消偏光寬度為183μm。相較於後述的比較例可知，能抑制消偏光寬度。The measurement results show that the depolarization width of the cut end surface (alignment parallel surface) parallel to the light absorption axis of the polarizing element is 135 μm, and the depolarization width of the cut end surface (alignment split surface) perpendicular to the light absorption axis is 183 μm. Compared with the comparative examples described below, it can be seen that the depolarization width can be suppressed.
〔實施例2〕 在薄片材17中，作為黏著劑層17b是使用丙烯酸系黏著劑層(厚度23μm)，作為樹脂薄膜基材17a是使用聚對苯二甲酸乙二酯基材(厚度38μm)，將雷射功率變更為55W，除此以外是依與實施例1相同的條件實施雷射切割加工、及起因於偏光元件10的脫色之消偏光評價。[Example 2] In the sheet 17, an acrylic adhesive layer (thickness 23 μm) is used as the adhesive layer 17b, and a polyethylene terephthalate base material (thickness 38 μm) is used as the resin film base material 17a. The laser power is Except for changing it to 55 W, the laser cutting process and depolarization evaluation due to discoloration of the polarizing element 10 were carried out under the same conditions as Example 1.
結果，與偏光元件10之光吸收軸平行的切割端面之消偏光寬度為153μm，與光吸收軸垂直的切割端面之消偏光寬度為216μm。相較於後述的比較例可知，能抑制消偏光寬度。As a result, the depolarization width of the cut end surface parallel to the light absorption axis of the polarizing element 10 is 153 μm, and the depolarization width of the cut end surface perpendicular to the light absorption axis is 216 μm. Compared with the comparative examples described below, it can be seen that the depolarization width can be suppressed.
〔實施例3〕 在薄片材17中，作為黏著劑層17b是使用橡膠系黏著劑層(厚度10μm)，作為樹脂薄膜基材17a是使用聚對苯二甲酸乙二酯基材(厚度38μm)，將雷射功率變更為55W，除此以外是依與實施例1相同的條件實施雷射切割加工、及起因於偏光元件10的脫色之消偏光評價。[Example 3] In the sheet 17, a rubber-based adhesive layer (thickness: 10 μm) is used as the adhesive layer 17b, and a polyethylene terephthalate base material (thickness: 38 μm) is used as the resin film base material 17a. The laser power is Except for changing it to 55 W, the laser cutting process and depolarization evaluation due to discoloration of the polarizing element 10 were carried out under the same conditions as Example 1.
結果，與偏光元件之光吸收軸平行的切割端面之消偏光寬度為120μm，與光吸收軸垂直的切割端面之消偏光寬度為191μm。相較於後述的比較例可知，能抑制消偏光寬度。As a result, the depolarization width of the cut end surface parallel to the light absorption axis of the polarizing element was 120 μm, and the depolarization width of the cut end surface perpendicular to the light absorption axis was 191 μm. Compared with the comparative examples described below, it can be seen that the depolarization width can be suppressed.
〔實施例4〕 將偏光元件10的厚度設定為5μm，去除保護薄膜11b而使用矽氧系黏著劑層的厚度為20μm之基材，並將雷射功率變更為35W，除此以外是依與實施例2相同的條件實施雷射切割加工、及起因於偏光元件10的脫色之消偏光評價。圖5是相當於從實施例4的結構將污染對策薄膜去除後之SEM圖像。[Example 4] The thickness of the polarizing element 10 is set to 5 μm, the protective film 11b is removed, and a substrate with a silicone adhesive layer thickness of 20 μm is used, and the laser power is changed to 35W. Other than that, the same procedures are used as in Example 2. Conditions include laser cutting processing and depolarization evaluation due to discoloration of the polarizing element 10 . FIG. 5 is an SEM image corresponding to the structure of Example 4 after removing the contamination prevention film.
結果，與偏光元件之光吸收軸平行的切割端面之消偏光寬度為113μm，與光吸收軸垂直的切割端面之消偏光寬度為103μm。相較於後述的比較例3，能抑制消偏光寬度。As a result, the depolarization width of the cut end surface parallel to the light absorption axis of the polarizing element was 113 μm, and the depolarization width of the cut end surface perpendicular to the light absorption axis was 103 μm. Compared with Comparative Example 3 described below, the depolarization width can be suppressed.
〔比較例1〕 將未使用薄片材及污染對策薄膜23之實施例1記載的偏光性光學功能薄膜積層體1A，使用端銑刀以既定形狀、亦即尺寸80mm×50mm的矩形形狀實施切割加工，除此以外是依與實施例1相同的條件進行評價。[Comparative example 1] The polarizing optical functional film laminate 1A described in Example 1 without using a thin sheet or the contamination prevention film 23 was cut into a predetermined shape, that is, a rectangular shape with dimensions of 80 mm × 50 mm, using an end mill. Other than that, Evaluation was performed under the same conditions as Example 1.
結果，與偏光元件之光吸收軸平行的切割端面之消偏光寬度為182μm，與光吸收軸垂直的切割端面之消偏光寬度為251μm。相較於實施例1及實施例2，消偏光寬度變大。As a result, the depolarization width of the cut end surface parallel to the light absorption axis of the polarizing element was 182 μm, and the depolarization width of the cut end surface perpendicular to the light absorption axis was 251 μm. Compared with Example 1 and Example 2, the depolarization width becomes larger.
〔比較例2〕 除未使用薄片材且將雷射功率變更為55W以外，依與實施例1相同的條件實施雷射切割加工、及起因於偏光元件10的脫色之消偏光評價。在此情況可確認，偏光性光學功能薄膜積層體1A被完全切割，另一方面，剝離襯墊16並未被完全切割，而以半切割狀態被實施切割加工。[Comparative example 2] Laser cutting processing and depolarization evaluation due to discoloration of the polarizing element 10 were performed under the same conditions as Example 1 except that no thin sheet was used and the laser power was changed to 55 W. In this case, it was confirmed that the polarizing optical functional film laminated body 1A was completely cut. On the other hand, the release liner 16 was not completely cut, but was cut in a half-cut state.
結果，與偏光元件之光吸收軸平行的切割端面之消偏光寬度為170μm，與光吸收軸垂直的切割端面之消偏光寬度為231μm。 藉由使用紅外線雷射，產生利用保護薄膜的熔融物被覆偏光元件的端部之效果，相較於比較例1，可看出稍有改善，但比起前述實施例1及實施例2，其抑制消偏光的效果較弱。As a result, the depolarization width of the cut end surface parallel to the light absorption axis of the polarizing element was 170 μm, and the depolarization width of the cut end surface perpendicular to the light absorption axis was 231 μm. By using infrared laser, the effect of coating the end of the polarizing element with the melt of the protective film is produced. Compared with Comparative Example 1, a slight improvement can be seen, but compared with the above-mentioned Example 1 and Example 2, the effect is The effect of suppressing depolarization is weak.
〔比較例3〕 將未使用薄片材及污染對策薄膜23之實施例4記載的偏光性光學功能薄膜積層體1A，依與比較例1相同的條件實施端銑刀加工，進行所獲得的形狀加工樣本之評價。[Comparative example 3] The polarizing optical functional film laminated body 1A described in Example 4 without using the sheet material and the contamination prevention film 23 was subjected to end mill processing under the same conditions as Comparative Example 1, and the obtained shape-processed samples were evaluated.
結果，與偏光元件10之光吸收軸平行的切割端面之消偏光寬度為129μm，與光吸收軸垂直的切割端面之消偏光寬度為177μm。相較於實施例4，消偏光寬度變大。As a result, the depolarization width of the cut end surface parallel to the light absorption axis of the polarizing element 10 is 129 μm, and the depolarization width of the cut end surface perpendicular to the light absorption axis is 177 μm. Compared with Example 4, the depolarization width becomes larger.
〔實施例5〕 未使用污染對策薄膜23，將雷射功率變更為43W且將重複頻率設定為15kHz，除此以外是依與實施例1相同的條件實施雷射切割加工、及起因於偏光元件10的脫色之消偏光評價。 結果，與偏光元件之光吸收軸平行的切割端面之消偏光寬度為122μm，與光吸收軸垂直的切割端面之消偏光寬度為195μm。相較於後述的比較例可知，能抑制消偏光寬度。[Example 5] The contamination prevention film 23 was not used, the laser power was changed to 43W, and the repetition frequency was set to 15kHz. The laser cutting process was performed under the same conditions as in Example 1, and the discoloration caused by the polarizing element 10 was eliminated. Polarization evaluation. As a result, the depolarization width of the cut end surface parallel to the light absorption axis of the polarizing element was 122 μm, and the depolarization width of the cut end surface perpendicular to the light absorption axis was 195 μm. Compared with the comparative examples described below, it can be seen that the depolarization width can be suppressed.
〔實施例6〕 未使用污染對策薄膜23，將雷射功率變更為39W且將重複頻率設定為15kHz，除此以外是依與實施例2相同的條件進行基於TOF-SIMS的分析，並實施雷射切割加工、及起因於偏光元件10的脫色之消偏光評價。 圖19係顯示基於TOF-SIMS的分析結果之圖像。從該圖可確認，不限於被覆層18b，連在被覆層18a也形成有聚對苯二甲酸乙二酯(PET)的膜。 此外，與偏光元件之光吸收軸平行的切割端面之消偏光寬度為132μm，與光吸收軸垂直的切割端面之消偏光寬度為214μm。相較於後述的比較例可知，能抑制消偏光寬度。[Example 6] The contamination prevention film 23 was not used, the laser power was changed to 39 W, and the repetition frequency was set to 15 kHz. Analysis based on TOF-SIMS was performed under the same conditions as in Example 2, and laser cutting was performed. Evaluation of depolarization caused by discoloration of the polarizing element 10 . Figure 19 is an image showing the analysis results based on TOF-SIMS. From this figure, it can be confirmed that not only the coating layer 18b but also the coating layer 18a is formed with a polyethylene terephthalate (PET) film. In addition, the depolarization width of the cut end face parallel to the light absorption axis of the polarizing element is 132 μm, and the depolarization width of the cut end face perpendicular to the light absorption axis is 214 μm. Compared with the comparative examples described below, it can be seen that the depolarization width can be suppressed.
〔實施例7〕 未使用污染對策薄膜23，將雷射功率變更為20W且將重複頻率設定為15kHz，並將掃描次數設定成2次，除此以外是依與實施例2相同的條件進行基於TOF-SIMS的分析，並實施雷射切割加工、及起因於偏光元件10的脫色之消偏光評價。 圖20係顯示基於TOF-SIMS的分析結果之圖像。從該圖可確認，不限於被覆層18b，連在被覆層18a也形成有聚對苯二甲酸乙二酯(PET)的膜。 此外，與偏光元件之光吸收軸平行的切割端面之消偏光寬度為133μm，與光吸收軸垂直的切割端面之消偏光寬度為233μm。相較於後述的比較例可知，能抑制消偏光寬度。 又可明白，藉由將雷射功率減弱並將掃描次數增加，相較於雷射功率強、掃描次數少的情況，可獲得毫不遜色的結果。[Example 7] The contamination prevention film 23 was not used, the laser power was changed to 20 W, the repetition frequency was set to 15 kHz, and the number of scans was set to 2. Analysis based on TOF-SIMS was performed under the same conditions as in Example 2. , and perform laser cutting processing and depolarization evaluation due to discoloration of the polarizing element 10 . Figure 20 is an image showing the analysis results based on TOF-SIMS. From this figure, it can be confirmed that not only the coating layer 18b but also the coating layer 18a is formed with a polyethylene terephthalate (PET) film. In addition, the depolarization width of the cut end face parallel to the light absorption axis of the polarizing element is 133 μm, and the depolarization width of the cut end face perpendicular to the light absorption axis is 233 μm. Compared with the comparative examples described below, it can be seen that the depolarization width can be suppressed. It can also be understood that by weakening the laser power and increasing the number of scans, comparable results can be obtained compared to the case where the laser power is strong and the number of scans is small.
〔比較例4〕 除未使用薄片材且將雷射功率變更為20W以外，是依與實施例5相同的條件進行基於TOF-SIMS的分析，並實施雷射切割加工、及起因於偏光元件10的脫色之消偏光評價。在此情況可確認，偏光性光學功能薄膜積層體1A之剝離襯墊16並未被完全切割，而是以半切割狀態被實施切割加工。 圖21係顯示基於TOF-SIMS的分析結果之圖像。從該圖可確認，在被覆層18a、18b並未形成聚對苯二甲酸乙二酯(PET)的膜。 此外，與偏光元件之光吸收軸平行的切割端面之消偏光寬度為158μm，與光吸收軸垂直的切割端面之消偏光寬度為235μm。相較於實施例5，消偏光寬度變大。[Comparative Example 4] Except that no thin sheet was used and the laser power was changed to 20 W, analysis based on TOF-SIMS was performed under the same conditions as in Example 5, and laser cutting processing and depolarization due to discoloration of the polarizing element 10 were performed. Evaluation. In this case, it was confirmed that the release liner 16 of the polarizing optical functional film laminate 1A was not completely cut but was cut in a half-cut state. Figure 21 is an image showing the analysis results based on TOF-SIMS. It can be confirmed from this figure that a film of polyethylene terephthalate (PET) is not formed on the coating layers 18a and 18b. In addition, the depolarization width of the cut end face parallel to the light absorption axis of the polarizing element is 158 μm, and the depolarization width of the cut end face perpendicular to the light absorption axis is 235 μm. Compared with Example 5, the depolarization width becomes larger.
〔比較例5〕 除未使用薄片材且將雷射功率變更為27W以外，是依與實施例6相同的條件進行基於TOF-SIMS的分析，並實施雷射切割加工、及起因於偏光元件10的脫色之消偏光評價。 可確認，藉由該雷射切割加工，偏光性光學功能薄膜積層體1A被完全地切割，而以完全切割狀態被實施切割加工。在此，因為未設置薄片材，雷射成為沿照射方向完全貫穿的狀態。 圖22係顯示基於TOF-SIMS的分析結果之圖像。從該圖可確認，在被覆層18a、18b並未形成聚對苯二甲酸乙二酯(PET)的膜。 此外，與偏光元件之光吸收軸平行的切割端面之消偏光寬度為163μm，與光吸收軸垂直的切割端面之消偏光寬度為268μm。相較於實施例6，消偏光寬度變大。[Comparative example 5] Except that no thin sheet was used and the laser power was changed to 27 W, analysis based on TOF-SIMS was performed under the same conditions as in Example 6, and laser cutting processing and depolarization due to discoloration of the polarizing element 10 were performed. Evaluation. It was confirmed that the polarizing optical functional film laminated body 1A was completely cut by this laser cutting process, and the cutting process was performed in a completely cut state. Here, since no thin sheet is provided, the laser completely penetrates in the irradiation direction. Figure 22 is an image showing the analysis results based on TOF-SIMS. It can be confirmed from this figure that a film of polyethylene terephthalate (PET) is not formed on the coating layers 18a and 18b. In addition, the depolarization width of the cut end face parallel to the light absorption axis of the polarizing element is 163 μm, and the depolarization width of the cut end face perpendicular to the light absorption axis is 268 μm. Compared with Example 6, the depolarization width becomes larger.
〔參考例1〕 除未使用污染對策薄膜23及表面保護薄膜14以外，是依與實施例1相同的條件進行基於TOF-SIMS之分析。 圖23係顯示基於TOF-SIMS的分析結果之圖像。從該圖可確認，不限於被覆層18b，連在被覆層18a也形成有聚對苯二甲酸乙二酯(PET)的膜。 結果可知，縱使污染對策薄膜23等不存在的情況，在被覆層18a、18b仍形成有聚對苯二甲酸乙二酯(PET)的膜。[Reference Example 1] Analysis based on TOF-SIMS was performed under the same conditions as in Example 1 except that the contamination prevention film 23 and the surface protection film 14 were not used. Figure 23 is an image showing the analysis results based on TOF-SIMS. From this figure, it can be confirmed that not only the coating layer 18b but also the coating layer 18a is formed with a polyethylene terephthalate (PET) film. As a result, it was found that even if the contamination prevention film 23 and the like were not present, the polyethylene terephthalate (PET) film was still formed on the coating layers 18a and 18b.
〔參考例2〕 除不使用剝離襯墊16及薄片材17以外，是依與實施例1相同的條件進行基於TOF-SIMS之分析。藉由實施雷射切割加工，偏光性光學功能薄膜積層體1及黏著劑層15被完全切割。 圖24係顯示基於TOF-SIMS的分析結果之圖像。從該圖可確認，不限於被覆層18b，連在被覆層18a也未形成聚對苯二甲酸乙二酯(PET)的膜。 結果可知，當未使用剝離襯墊及薄片材的情況，縱使有污染對策薄膜23等存在，仍無法在被覆層18a、18b形成聚對苯二甲酸乙二酯(PET)的膜。[Reference Example 2] Analysis based on TOF-SIMS was performed under the same conditions as in Example 1 except that the release liner 16 and the sheet 17 were not used. By performing the laser cutting process, the polarizing optical functional film laminate 1 and the adhesive layer 15 are completely cut. Figure 24 is an image showing the analysis results based on TOF-SIMS. From this figure, it can be confirmed that not only the coating layer 18b but also the coating layer 18a is not formed of a polyethylene terephthalate (PET) film. The results show that when a release liner and a sheet are not used, even if the contamination prevention film 23 and the like are present, a polyethylene terephthalate (PET) film cannot be formed on the coating layers 18a and 18b.
〔考察〕 在被覆層18a、18b包含：至少薄片材17的成分、亦即黏著劑層17b的成分及/或樹脂薄膜基材17a的PET成分。因此，藉由這些薄片材的成分，特別針對黏著劑層17b將其成分適當地選擇，可有效防止通過切割端面而從外部往偏光元件10讓水分滲入，可期待防止脫色、換言之消偏光寬度的減少。 此外，當偏光性光學功能薄膜積層體1是構成包含黏著劑層15及剝離襯墊16之偏光性光學功能薄膜積層體1A的情況，藉由黏著劑層15的成分，進一步藉由源自剝離襯墊16之PET成分，能使被覆層18a、18b變得更厚，而更有效地防止水分滲入。[Inspection] The coating layers 18 a and 18 b contain at least the component of the sheet material 17 , that is, the component of the adhesive layer 17 b and/or the PET component of the resin film base material 17 a. Therefore, by appropriately selecting the components of these thin sheets, especially the components of the adhesive layer 17b, it is possible to effectively prevent moisture from penetrating into the polarizing element 10 from the outside through cutting the end surface, and it is expected to prevent discoloration, in other words, increase the depolarization width. Reduce. In addition, when the polarizing optically functional film laminate 1 constitutes the polarizing optically functional film laminate 1A including the adhesive layer 15 and the release liner 16, further due to the components of the adhesive layer 15, The PET component of the liner 16 can make the coating layers 18a and 18b thicker and prevent moisture from penetrating more effectively.
1,1A:偏光性光學功能薄膜積層體 1,1A: Polarizing optical functional film laminate
2:附薄片材積層體 2: With thin sheet laminated body
2a:切割溝槽 2a: Cutting the groove
10:偏光元件 10:Polarizing element
10a:脹大 10a: Swelling
11,11a,11b:保護薄膜 11,11a,11b: Protective film
12:偏光薄膜 12:Polarizing film
12a:切割端緣 12a: Cutting edge
12b:消偏光寬度 12b:Depolarization width
13:表面處理層(硬塗層) 13: Surface treatment layer (hard coat)
14:表面保護薄膜 14:Surface protection film
14a:黏著劑層 14a: Adhesive layer
14b:樹脂薄膜 14b:Resin film
15:黏著劑層 15: Adhesive layer
16:剝離襯墊 16: Release liner
16a:剝離襯墊的主面 16a: Main side of release liner
17:薄片材 17:Thin sheets
17a:樹脂薄膜基材 17a: Resin film base material
17b:黏著劑層 17b: Adhesive layer
17-1a:切割溝槽 17-1a: Cutting grooves
18,18a,18b:被覆層 18,18a,18b:Coating layer
19:固定載台 19: Fixed carrier
23:污染對策薄膜 23: Pollution Countermeasure Film
23a:樹脂薄膜基材 23a: Resin film base material
23b:黏著劑層 23b: Adhesive layer
30:雷射切割裝置 30:Laser cutting device
31:積層體 31: Laminated body
31a:卷 31a:Volume
32:偏光薄膜 32:Polarizing film
34:表面保護薄膜 34:Surface protection film
36:剝離襯墊 36: Release liner
37:薄片材 37:Thin sheets
37a:卷 37a:Volume
40:重疊輥 40: Overlapping roller
41:附薄片材積層體 41: With thin sheet laminated body
42:第二重疊輥 42: Second overlap roller
43:污染對策薄膜 43: Pollution Countermeasure Film
44:導輥 44: Guide roller
45:雷射照射裝置 45:Laser irradiation device
46:切割溝槽 46: Cutting grooves
47:切割部 47: Cutting Department
48:污染對策薄膜回收用輥 48: Contamination countermeasure film recycling roller
49:污染對策薄膜回收用帶 49: Contamination Countermeasures Film Recycling Tape
50:導輥 50: Guide roller
51:薄片材剝離部 51: Thin sheet peeling part
51a:剝離板 51a: Peel off board
52:製品收集部 52: Product Collection Department
A:毛邊 A: burrs
[圖1]係顯示在本發明的一實施形態之雷射切割加工方法可使用之偏光性光學功能薄膜積層體的一例之概略剖面圖。 [圖2]係顯示藉由雷射照射將圖1的偏光性光學功能薄膜積層體以所期望形狀實施切割加工時的狀態的一例之概略剖面圖。 [圖3]係顯示基於雷射照射之切割處理中之附薄片材積層體的狀態之積層體剖面的示意圖。 [圖4A]係顯示將相對於偏光元件之光吸收軸為直角方向之切割端面在正交偏光鏡的透過照明之下觀察的消偏光之光學顯微鏡圖像，係顯示未產生脫色所致的消偏光之例子。 [圖4B]係顯示將相對於偏光元件之光吸收軸為直角方向之切割端面在正交偏光鏡的透過照明之下觀察之消偏光的光學顯微鏡圖像，係顯示產生脫色所致的消偏光之例子。 [圖5]係顯示實施雷射切割加工後之本發明的附薄片材積層體之切割剖面之SEM圖像的一例。 [圖6A]係顯示藉由使用本發明的一實施例之附薄片材積層體所達成的消偏光寬度之一例。 [圖6B]係顯示藉由使用先前的端銑刀所達成之消偏光寬度的一例。 [圖7]係實施雷射切割加工後之本發明的一實施例之附薄片材積層體之偏光薄膜的附近之剖面SEM圖像。 [圖8]係與圖7為相同處之EDX(能量色散型X射線分析)圖像。 [圖9]係在圖7所示的圖像中，將偏光元件之切割端部放大顯示之剖面SEM圖像。 [圖10]係與圖9相同處之EDX圖像。 [圖11]係將長條帶狀的偏光性光學功能薄膜積層體以卷對卷方式進行雷射切割之雷射形狀加工裝置的概略圖。 [圖12A]係顯示製造從大尺寸的偏光薄膜呈智慧型手機形狀切出的製品的情況之切割加工布局例，係顯示其整體之俯視圖。 [圖12B]係顯示製造從大尺寸的偏光薄膜呈智慧型手機形狀切出的製品的情況之切割加工布局例，係將其一部分放大顯示之俯視圖。 [圖13A]係顯示製造從大尺寸的偏光薄膜呈汽車儀表板形狀切出的製品的情況之切割加工布局例，係顯示其整體的俯視圖。 [圖13B]係顯示製造從大尺寸的偏光薄膜呈汽車儀表板形狀切出的製品的情況之切割加工布局例，係將其一部分放大顯示之俯視圖。 [圖14]係將呈智慧型手機形狀切出後之偏光薄膜的例子之照片複數張排列顯示。 [圖15A]係關於實施例1，將切割端面從分子配向方向觀察之SEM圖像。 [圖15B]係關於實施例2，將切割端面從分子配向方向觀察之SEM圖像。 [圖15C]係關於比較例1，將切割端面從分子配向方向觀察之SEM圖像。 [圖15D]係關於比較例2，將切割端面從分子配向方向觀察之SEM圖像。 [圖16]係顯示實施例1之基於TOF-SIMS的分析結果之圖像。 [圖17]係顯示在雷射切割加工後被剝離之薄片材上所形成之雷射加工溝槽之光學顯微鏡圖像。 [圖18]係顯示實施例1之形成於切割端面之被覆層的元素分析結果。 [圖19]係顯示實施例6之基於TOF-SIMS的分析結果之圖像。 [圖20]係顯示實施例7之基於TOF-SIMS的分析結果之圖像。 [圖21]係顯示比較例4之基於TOF-SIMS的分析結果之圖像。 [圖22]係顯示比較例5之基於TOF-SIMS的分析結果之圖像。 [圖23]係顯示參考例1之基於TOF-SIMS的分析結果之圖像。 [圖24]係顯示參考例2之基於TOF-SIMS的分析結果之圖像。[Fig. 1] is a schematic cross-sectional view showing an example of a polarizing optical functional film laminate that can be used in the laser cutting processing method according to one embodiment of the present invention. [Fig. 2] A schematic cross-sectional view showing an example of a state in which the polarizing optical functional film laminate of Fig. 1 is cut into a desired shape by laser irradiation. [Fig. 3] is a schematic diagram showing a cross-section of a laminated body in a state of a laminated body with a sheet material during cutting processing by laser irradiation. [Figure 4A] is an optical microscope image showing the depolarization of the cut end surface at right angles to the light absorption axis of the polarizing element when observed under transmitted illumination with crossed polarizers. It shows that no depolarization due to decoloration occurs. Example of polarized light. [Fig. 4B] This is an optical microscope image showing the depolarization of the cut end surface at right angles to the light absorption axis of the polarizing element when observed under transmitted illumination with a crossed polarizer. It shows the depolarization caused by discoloration. example. [Fig. 5] shows an example of an SEM image of a cut section of the laminate with a sheet of the present invention after laser cutting. [Fig. 6A] shows an example of the depolarization width achieved by using the sheet-attached laminate according to one embodiment of the present invention. [Fig. 6B] shows an example of the depolarization width achieved by using the previous end mill. [Fig. 7] is a cross-sectional SEM image of the vicinity of the polarizing film with a sheet laminate according to one embodiment of the present invention after laser cutting. [Figure 8] is an EDX (energy dispersive X-ray analysis) image similar to Figure 7. [Fig. 9] A cross-sectional SEM image showing the cut end of the polarizing element in an enlarged manner in the image shown in Fig. 7. [Figure 10] is an EDX image similar to Figure 9. [Fig. 11] This is a schematic diagram of a laser shape processing device for laser cutting a long strip-shaped polarizing optical functional film laminate in a roll-to-roll system. [Fig. 12A] Fig. 12A is an example of a cutting processing layout for manufacturing a product cut out from a large-sized polarizing film in the shape of a smartphone, and is a plan view of the entire structure. [Fig. 12B] Fig. 12B is an example of a cutting processing layout for manufacturing a product cut out from a large-sized polarizing film in the shape of a smartphone, and is a partially enlarged plan view. [Fig. 13A] Fig. 13A is an example of a cutting processing layout for manufacturing a product cut out from a large-sized polarizing film in the shape of a car dashboard, and is an overall plan view. [Fig. 13B] Fig. 13B is an example of a cutting processing layout for manufacturing a product cut out from a large-sized polarizing film in the shape of a car dashboard, and is a partially enlarged plan view. [Figure 14] An array of photos showing examples of polarizing films cut out into the shape of smartphones. [Fig. 15A] Regarding Example 1, it is an SEM image of the cut end surface viewed from the molecular alignment direction. [Fig. 15B] Regarding Example 2, it is an SEM image of the cut end surface viewed from the molecular alignment direction. [Fig. 15C] Regarding Comparative Example 1, it is an SEM image of the cut end surface observed from the molecular alignment direction. [Fig. 15D] Regarding Comparative Example 2, it is an SEM image of the cut end surface observed from the molecular alignment direction. [Fig. 16] An image showing the analysis results based on TOF-SIMS in Example 1. [Figure 17] is an optical microscope image showing the laser-processed grooves formed on the sheet material that was peeled off after the laser cutting process. [Fig. 18] shows the elemental analysis results of the coating layer formed on the cut end surface of Example 1. [Fig. 19] An image showing the analysis results based on TOF-SIMS in Example 6. [Fig. 20] An image showing the analysis results based on TOF-SIMS in Example 7. [Fig. 21] It is an image showing the analysis result based on TOF-SIMS of Comparative Example 4. [Fig. 22] An image showing the analysis results based on TOF-SIMS of Comparative Example 5. [Fig. 23] is an image showing the analysis results based on TOF-SIMS of Reference Example 1. [Fig. 24] is an image showing the analysis results based on TOF-SIMS of Reference Example 2.
1,1A:偏光性光學功能薄膜積層體 1,1A: Polarizing optical functional film laminate
2:附薄片材積層體 2: With thin sheet laminated body
2a:切割溝槽 2a: Cutting the groove
10:偏光元件 10:Polarizing element
11a,11b:保護薄膜 11a,11b: Protective film
12:偏光薄膜 12:Polarizing film
13:表面處理層 13:Surface treatment layer
14:表面保護薄膜 14:Surface protection film
15:黏著劑層 15: Adhesive layer
16:剝離襯墊 16: Release liner
17:薄片材 17:Thin sheets
17a:樹脂薄膜基材 17a: Resin film base material
17b:黏著劑層 17b: Adhesive layer
18a,18b:被覆層 18a,18b:Coating layer
19:固定載台 19: Fixed carrier
23:污染對策薄膜 23: Pollution Countermeasure Film
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| KR20210125127A (en) * | 2020-04-07 | 2021-10-18 | 삼성디스플레이 주식회사 | Method of manufacturing electronic device and electronic device |
| JP7221256B2 (en) * | 2020-09-14 | 2023-02-13 | 日東電工株式会社 | A polarizing plate, a polarizing plate with a retardation layer, and an image display device comprising the polarizing plate or the polarizing plate with the retardation layer |
| CN118040108A (en) * | 2024-04-11 | 2024-05-14 | 宁德时代新能源科技股份有限公司 | Method for manufacturing pole piece |
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