TWI801012B - Inspection method and inspection platform for lithography - Google Patents
Inspection method and inspection platform for lithography Download PDFInfo
- Publication number
- TWI801012B TWI801012B TW110144747A TW110144747A TWI801012B TW I801012 B TWI801012 B TW I801012B TW 110144747 A TW110144747 A TW 110144747A TW 110144747 A TW110144747 A TW 110144747A TW I801012 B TWI801012 B TW I801012B
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- TW
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- Prior art keywords
- inspection
- lithography
- platform
- inspection method
- inspection platform
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Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US17/676,534 US20230131662A1 (en) | 2021-10-26 | 2022-02-21 | Inspection method and inspection platform for lithography |
KR1020220034931A KR20230059690A (en) | 2021-10-26 | 2022-03-21 | Inspection method and inspection platform for lithography |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US202163272085P | 2021-10-26 | 2021-10-26 | |
US63/272,085 | 2021-10-26 |
Publications (2)
Publication Number | Publication Date |
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TWI801012B true TWI801012B (en) | 2023-05-01 |
TW202318096A TW202318096A (en) | 2023-05-01 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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TW110144747A TWI801012B (en) | 2021-10-26 | 2021-12-01 | Inspection method and inspection platform for lithography |
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TW (1) | TWI801012B (en) |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6737207B2 (en) * | 2000-04-25 | 2004-05-18 | Nikon Corporation | Method for evaluating lithography system and method for adjusting substrate-processing apparatus |
CN101114128A (en) * | 2006-07-20 | 2008-01-30 | 奇梦达股份公司 | System and method for measuring power of lithographic system |
TWM375866U (en) * | 2009-04-17 | 2010-03-11 | Kun Shan University Of Technology | Automatic measurement system of planar illumination intensity |
TWI440842B (en) * | 2010-11-15 | 2014-06-11 | Nat Univ Kaohsiung | Detection method and device for in situ monitoring resistance of photosensitive or hydrocarbon-containing thin-film materials upon extreme ultraviolet (euv) irradiation using actinic euv light source |
TWI621928B (en) * | 2015-10-09 | 2018-04-21 | Asml荷蘭公司 | Method and system for determining a parameter related to a target, method for manufacturing devices, and non-transitory computer program product |
TW202102949A (en) * | 2019-07-01 | 2021-01-16 | 日商佳能股份有限公司 | Detection apparatus, exposure apparatus, and article manufacturing method |
TWI732058B (en) * | 2016-11-15 | 2021-07-01 | 荷蘭商Asml荷蘭公司 | Radiation analysis systems, and related methods and computer readable medium |
-
2021
- 2021-12-01 TW TW110144747A patent/TWI801012B/en active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6737207B2 (en) * | 2000-04-25 | 2004-05-18 | Nikon Corporation | Method for evaluating lithography system and method for adjusting substrate-processing apparatus |
CN101114128A (en) * | 2006-07-20 | 2008-01-30 | 奇梦达股份公司 | System and method for measuring power of lithographic system |
TWM375866U (en) * | 2009-04-17 | 2010-03-11 | Kun Shan University Of Technology | Automatic measurement system of planar illumination intensity |
TWI440842B (en) * | 2010-11-15 | 2014-06-11 | Nat Univ Kaohsiung | Detection method and device for in situ monitoring resistance of photosensitive or hydrocarbon-containing thin-film materials upon extreme ultraviolet (euv) irradiation using actinic euv light source |
TWI621928B (en) * | 2015-10-09 | 2018-04-21 | Asml荷蘭公司 | Method and system for determining a parameter related to a target, method for manufacturing devices, and non-transitory computer program product |
TWI732058B (en) * | 2016-11-15 | 2021-07-01 | 荷蘭商Asml荷蘭公司 | Radiation analysis systems, and related methods and computer readable medium |
TW202102949A (en) * | 2019-07-01 | 2021-01-16 | 日商佳能股份有限公司 | Detection apparatus, exposure apparatus, and article manufacturing method |
Also Published As
Publication number | Publication date |
---|---|
TW202318096A (en) | 2023-05-01 |
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